JPH0566870B2 - - Google Patents

Info

Publication number
JPH0566870B2
JPH0566870B2 JP11436387A JP11436387A JPH0566870B2 JP H0566870 B2 JPH0566870 B2 JP H0566870B2 JP 11436387 A JP11436387 A JP 11436387A JP 11436387 A JP11436387 A JP 11436387A JP H0566870 B2 JPH0566870 B2 JP H0566870B2
Authority
JP
Japan
Prior art keywords
grinding
thermal head
substrate
resistance value
heat generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP11436387A
Other languages
Japanese (ja)
Other versions
JPS63278868A (en
Inventor
Masafumi Nozaki
Shinya Ookubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP11436387A priority Critical patent/JPS63278868A/en
Publication of JPS63278868A publication Critical patent/JPS63278868A/en
Publication of JPH0566870B2 publication Critical patent/JPH0566870B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/345Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads characterised by the arrangement of resistors or conductors

Landscapes

  • Electronic Switches (AREA)

Description

【発明の詳細な説明】 (a) 産業上の利用分野 この発明は、サーマルヘツドの製造方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION (a) Industrial Application Field This invention relates to a method for manufacturing a thermal head.

(b) 従来の技術 熱転写型や感熱紙型のプリンタに使用されるサ
ーマルヘツドを製造する場合、先ず絶縁基板上に
各種電極と発熱抵抗体を形成してサーマルヘツド
原板を製造し、この原板をサーマルヘツド単体に
対応する領域ごとに分断することによつて個々の
サーマルヘツドを製造している。
(b) Conventional technology When manufacturing a thermal head used in a thermal transfer type or thermal paper type printer, first a thermal head original plate is manufactured by forming various electrodes and heating resistors on an insulating substrate, and then this original plate is Individual thermal heads are manufactured by dividing each thermal head into regions corresponding to each individual thermal head.

このようにサーマルヘツド原板から個々のサー
マルヘツドを分断した際、各サーマルヘツドの切
断面にバリ、カケなどが発生し、プリンタなどに
組み込まれた際熱転写リボンの走行に支障をきた
し印字品質に悪影響を与える場合があつた。そこ
で従来はこれを改善する一方法としてサーマルヘ
ツド原板から各サーマルヘツドを分断する際、予
め外形寸法を大きめに分断し、その後基板の端面
を研削工具によつて所定量研削して仕上げるとい
う方法を採用している。
When individual thermal heads are separated from the thermal head original plate in this way, burrs, chips, etc. occur on the cut surfaces of each thermal head, which interferes with the running of the thermal transfer ribbon when installed in a printer, etc., and adversely affects printing quality. There were times when I gave. Conventionally, one method to improve this problem was to divide each thermal head from a thermal head original plate into larger dimensions in advance, and then grind the end face of the substrate by a predetermined amount using a grinding tool to finish it. We are hiring.

第2図Aは分断された単一のサーマルヘツドの
縦断面を表していて、たとえば研削加工前の基板
1の端面はDであり、この端面をCに示す位置ま
で一定量研削することによつて基板端面のバリ、
カケなどの修正と外形寸法の修正を行つている。
FIG. 2A shows a vertical cross section of a single thermal head that has been divided. For example, the end surface of the substrate 1 before grinding is D, and by grinding this end surface a certain amount to the position shown in C. burrs on the edge of the board,
We are making corrections to chips, etc., and to the external dimensions.

(c) 発明が解決しようとする問題点 このような従来のサーマルヘツドの製造方法に
おいては、基板端面を研削加工する際、基板の外
形端面を基準として行われるが、基準とされる外
形端面にバリやカケが存在するため、この影響な
どによつて修正後の外形寸法にバラツキが生じ
る。また、例えば砥石車を研磨材とすれば、砥石
の目づまりなどの表面状態により研削性能が大き
く変動し、定寸定速送りでは表面状態による研削
量の違いを砥石車の送り量にフイードバツクでき
ず、仕上がり面の品質を高めることができない。
なお、第2図AにおいてA−Bに示した電極パタ
ーンを基準として研削量を制御すれば、外形寸法
の精度を高めることができるが、そのためには光
学的測定を行わなければならず、測定と研削を同
時に行うことができず、製造効率が低下するとい
う問題があつた。
(c) Problems to be Solved by the Invention In such a conventional method for manufacturing a thermal head, when grinding the edge of the substrate, the outer edge of the substrate is used as a reference. Due to the presence of burrs and chips, the external dimensions after correction will vary due to this influence. In addition, for example, if a grinding wheel is used as an abrasive material, the grinding performance will vary greatly depending on the surface condition such as clogging of the grinding wheel, and with fixed size and constant speed feed, the difference in the amount of grinding due to the surface condition cannot be fed back to the feed amount of the grinding wheel. Therefore, the quality of the finished surface cannot be improved.
Note that if the amount of grinding is controlled based on the electrode pattern shown in A-B in FIG. There was a problem in that it was not possible to perform grinding and grinding at the same time, reducing manufacturing efficiency.

この発明の目的は、導体パターンを基準として
研削量を制御し、しかも測定と研削を同時に行え
るようにして製造効率を高めたサーマルヘツドの
製造方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a thermal head in which the amount of grinding is controlled based on the conductor pattern and measurement and grinding can be performed simultaneously to improve manufacturing efficiency.

(d) 問題点を解決するための手段 この発明のサーマルヘツドの製造方法は、サー
マルヘツドの基板上で発熱部と、この発熱部近傍
の基板端部との間に検査用導体膜を設け、導電性
の研削工具により上記発熱部近傍の基板端面を内
方へ研削しつつ、上記検査用導体膜と上記研削工
具間の電気抵抗値を測定し、この抵抗値が予め定
めた値に達したとき研削を終了することを特徴と
している。
(d) Means for Solving the Problems The method for manufacturing a thermal head of the present invention includes providing a conductor film for inspection between a heat generating part on a substrate of a thermal head and an edge of the substrate near the heat generating part; While inwardly grinding the end surface of the substrate near the heat generating part with a conductive grinding tool, the electrical resistance value between the inspection conductor film and the grinding tool was measured, and this resistance value reached a predetermined value. It is characterized by finishing the grinding when.

(e) 作用 この発明のサーマルヘツドの製造方法において
はサーマルヘツドの基板上で発熱部と、この発熱
部近傍の基板端部との間に検査用導体膜を設けた
ことにより、導電性の研削工具により上記発熱部
近傍の基板端面を内方へ研削していくことによつ
て、上記検査用導体膜の面積が変化し、これにと
もない研削工具と検査用導体膜間の電気抵抗値が
変化する。したがつてこの抵抗値が予め定めた値
に達したとき研削を終了することによつて、検査
用導体膜を基準とした所定位置まで研削を行うこ
とができる。
(e) Effect In the method for manufacturing a thermal head of the present invention, a conductive film for inspection is provided between the heat generating part on the substrate of the thermal head and the edge of the substrate near the heat generating part, so that conductive grinding is possible. By grinding the end surface of the substrate near the heat generating part inward with the tool, the area of the test conductor film changes, and the electrical resistance value between the grinding tool and the test conductor film changes accordingly. do. Therefore, by finishing the grinding when this resistance value reaches a predetermined value, it is possible to carry out the grinding to a predetermined position with respect to the test conductor film.

(f) 実施例 第1図はこの発明の実施例であるサーマルヘツ
ドの製造方法の概念図である。図において1はサ
ーマルヘツドの基板であり、この上面に検査用電
極10および他の電極が形成されており基板1の
研削すべき端面に砥石車22が当接されて、端面
の研削が行われる。検出部20は検査用電極10
と砥石車22間の電気抵抗値を検出する回路であ
り、制御部21は検出部20の出力信号に応じて
砥石車22の移動制御を行う。
(f) Embodiment FIG. 1 is a conceptual diagram of a method for manufacturing a thermal head according to an embodiment of the present invention. In the figure, reference numeral 1 denotes a substrate of a thermal head, on the upper surface of which an inspection electrode 10 and other electrodes are formed.A grinding wheel 22 is brought into contact with the end surface of the substrate 1 to be ground, and the end surface is ground. . The detection part 20 is the inspection electrode 10
This is a circuit that detects the electrical resistance value between the grinding wheel 22 and the grinding wheel 22, and the control section 21 controls the movement of the grinding wheel 22 according to the output signal of the detection section 20.

第3図、第4図は上記サーマルヘツドの構造を
表す図であり、第3図の上部に縦断面、下部に平
面を表している。また第4図は研削加工される側
の端面付近の縦断面を詳細に表している。第4図
において1はアルミナセラミクスなどの絶縁性基
板であり、基板1の端部付近に蒲鉾状のグレーズ
層2が形成されていて、基板1およびグレーズ層
2の上部に抵抗体層3,4が形成され、その上部
金属層5,6および7が形成され、さらにその表
面に保護膜8が全面に被覆されている。第3図に
示すように金属層6は複数の抵抗体層3を共通に
接続するコモン電極として用いられ、金属層5は
コモン電極6との間で抵抗体層3に対して駆動信
号を供給するリード電極として用いられる。さら
に抵抗体層4とその上部の金属層7は発熱部近傍
の基板端部と発熱部との間にパターン化されてい
て検査用電極として用いられ、基板の他端に外部
接続用端子7aとして引き出されている。このよ
うなサーマルヘツドは次のようにして製造する。
先ず、原板上にグレーズ2をスクリーン印刷し焼
成した後、全面に抵抗体層とAlなどの金属膜を
スパツタリングにより形成し、レジストプロセス
とエツチングプロセスを2度行つて抵抗体層と
Al層をパターン化する。その後、全面に保護膜
をスパツタリングすることによつてサーマルヘツ
ドの原板を製造し、所定のラインで分断すること
によつて個々のサーマルヘツドを得る。
FIGS. 3 and 4 are diagrams showing the structure of the thermal head, with the upper part of FIG. 3 showing a longitudinal section and the lower part showing a plan view. Further, FIG. 4 shows in detail a longitudinal section near the end face on the side to be ground. In FIG. 4, reference numeral 1 denotes an insulating substrate such as alumina ceramics, and a semicircular glaze layer 2 is formed near the edge of the substrate 1, and resistor layers 3 and 4 are formed on the top of the substrate 1 and the glaze layer 2. are formed, upper metal layers 5, 6 and 7 are formed thereon, and the entire surface thereof is further covered with a protective film 8. As shown in FIG. 3, the metal layer 6 is used as a common electrode to commonly connect a plurality of resistor layers 3, and the metal layer 5 supplies a drive signal to the resistor layer 3 between the common electrode 6 and the metal layer 6. It is used as a lead electrode. Furthermore, the resistor layer 4 and the metal layer 7 above it are patterned between the end of the substrate near the heat generating part and the heat generating part, and are used as test electrodes, and are attached to the other end of the board as external connection terminals 7a. It's being pulled out. Such a thermal head is manufactured as follows.
First, after screen printing glaze 2 on the original plate and baking it, a resistor layer and a metal film such as Al are formed on the entire surface by sputtering, and a resist process and an etching process are performed twice to form the resistor layer.
Pattern the Al layer. Thereafter, a protective film is sputtered over the entire surface to produce a thermal head original plate, and the original plate is cut along a predetermined line to obtain individual thermal heads.

その後第1図に示したように基板端面を研削加
工するが、第3図においてL1〜L2までは検査
用電極7と砥石車との導通はなく、砥石車がL2
まで達して検査用電極7と接したとき抵抗値が急
激に減少する。さらに、L3まで削り込むと、砥
石車と検査用電極との接触面積が減少し、これに
ともない抵抗値が急激に上昇する。このように抵
抗値の減少および増大を検出することによつて砥
石車がL1〜L2,L2〜L3あるいはL3より
内方の何れの位置にあるかを判別することがで
き、L2あるいはL3の何れかの位置を端面とし
て仕上げることができる。
Thereafter, the end surface of the substrate is ground as shown in FIG. 1, but in FIG.
When it reaches this point and comes into contact with the inspection electrode 7, the resistance value decreases rapidly. Furthermore, when grinding down to L3, the contact area between the grinding wheel and the inspection electrode decreases, and the resistance value sharply increases accordingly. By detecting the decrease and increase in the resistance value in this way, it is possible to determine whether the grinding wheel is located at L1-L2, L2-L3, or inward from L3, and whether it is L2 or L3. This position can be finished as an end face.

なお、基板端面を研削加工する際、第2図Aに
示したように基板の側面を平行に研削加工する場
合に限らず、同図BあるいはCに示すように熱転
写リボンの摺動部分のみについて稜整形を行うこ
とも可能である。
Note that when grinding the edge surface of the substrate, it is not limited to grinding the side surface of the substrate in parallel as shown in Fig. 2A, but only on the sliding part of the thermal transfer ribbon as shown in Fig. It is also possible to perform edge shaping.

第5図〜第9図は他の実施例にかかるサーマル
ヘツドの電極形状を表している。第5図と第6図
に示す例は発熱部と基板端部との間にテーパー状
の検査用電極7を形成した例であり、この場合も
砥石車による研削位置と抵抗値に対応関係があ
り、この関係を利用してテーパー部分の何れかの
位置を端面として仕上げることができる。第7図
は検査用電極7をコモン電極6と共通接続して一
部兼用した例である。この場合、コモン電極と砥
石車間の抵抗値を測定することによつて第3図に
示した場合と同様に処理を行うことができる。第
8図と第9図はコモン電極の一部に検査用電極7
を付加した例であり、第8図は検査用電極をテー
パー状に形成し、第9図は検査用電極を階段状に
形成した例である。この場合もコモン電極6と砥
石車との抵抗値を測定し、所定の値となつたとき
に研削を終了することによつて所定位置まで研削
加工を行うことができる。
5 to 9 show electrode shapes of thermal heads according to other embodiments. The example shown in FIGS. 5 and 6 is an example in which a tapered inspection electrode 7 is formed between the heat generating part and the edge of the substrate, and in this case as well, there is a correspondence between the grinding position by the grinding wheel and the resistance value. By using this relationship, any position of the tapered portion can be finished as an end surface. FIG. 7 shows an example in which the inspection electrode 7 and the common electrode 6 are connected in common and are used partially. In this case, the same process as shown in FIG. 3 can be performed by measuring the resistance value between the common electrode and the grinding wheel. Figures 8 and 9 show the test electrode 7 as part of the common electrode.
FIG. 8 shows an example in which the test electrodes are formed in a tapered shape, and FIG. 9 shows an example in which the test electrodes are formed in a stepped shape. In this case as well, by measuring the resistance value between the common electrode 6 and the grinding wheel and terminating the grinding when it reaches a predetermined value, the grinding process can be carried out to a predetermined position.

以上の実施例はすべて検査用導体膜として金属
層を用いた例であつたが、その他に抵抗体層を用
いることもできる。第10図と第11図はその場
合の二つの例について表している。第10図上部
の断面図に示すように、通常はエツチングにより
除去する基板端部の抵抗体層4をそのまま残して
おくことにより、研削の進行に伴う抵抗体層の残
量で研削量を検出することができる。したがつて
コモン電極6と砥石車22間の抵抗値を測定しつ
つ研削することにより、所定位置まで研削加工す
ることができる。
All of the above embodiments are examples in which a metal layer is used as the test conductor film, but a resistor layer may also be used. FIGS. 10 and 11 show two examples of such cases. As shown in the cross-sectional view at the top of Figure 10, by leaving the resistor layer 4 at the edge of the substrate, which is normally removed by etching, the amount of grinding can be detected from the remaining amount of the resistor layer as the grinding progresses. can do. Therefore, by grinding while measuring the resistance value between the common electrode 6 and the grinding wheel 22, it is possible to grind to a predetermined position.

また第11図に示すように、抵抗体層4をコモ
ン電極6の近傍にパターン化しておくことによ
り、コモン電極と砥石車との導通の有無および抵
抗値の変化により同様に研削量を制御することが
できる。
Furthermore, as shown in FIG. 11, by patterning the resistor layer 4 in the vicinity of the common electrode 6, the amount of grinding can be similarly controlled by the presence or absence of continuity between the common electrode and the grinding wheel and by changes in resistance value. be able to.

(g) 発明の効果 以上のようにこの発明によれば、基板上に形成
した導体膜を基準として研削量を制御するため、
外形寸法の精度および仕上がり面の品質を高める
ことができる。さらに光学的測定などを必要とせ
ず研削量を測定しながら加工をできるため、削り
過ぎや削り不足による良品率の悪化および作業時
間の増加を防止することができる。
(g) Effects of the Invention As described above, according to the present invention, since the amount of grinding is controlled based on the conductor film formed on the substrate,
Accuracy of external dimensions and quality of finished surface can be improved. Furthermore, since machining can be performed while measuring the amount of grinding without the need for optical measurement, it is possible to prevent a deterioration in the yield rate and an increase in working time due to over-shaving or under-shaving.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の実施例にかかるサーマルヘ
ツドの製造方法の概念図、第2図A〜Cは研削加
工の例を表す図、第3図と第4図は上記実施例で
用いられるサーマルヘツドの構造を表す図、第5
図〜第11図は他の実施例にかかるサーマルヘツ
ドの構造を表す図である。 1……基板、2……グレーズ層、3……抵抗体
層、4……抵抗体層(検査用導体膜)、5……リ
ード電極、6……コモン電極、7……検査用電
極、8……保護膜。
FIG. 1 is a conceptual diagram of a method for manufacturing a thermal head according to an embodiment of the present invention, FIGS. 2A to C are diagrams showing an example of grinding, and FIGS. Diagram showing the structure of the head, No. 5
Figures 1 to 11 are diagrams showing the structure of a thermal head according to another embodiment. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Glaze layer, 3... Resistor layer, 4... Resistor layer (conductor film for inspection), 5... Lead electrode, 6... Common electrode, 7... Electrode for inspection, 8...Protective film.

Claims (1)

【特許請求の範囲】[Claims] 1 サーマルヘツドの基板上で発熱部と、この発
熱部近傍の基板端部との間に検査用導体膜を設
け、導電性の研削工具により上記発熱部近傍の基
板端面を内方へ研削しつつ、上記検査用導体膜と
上記研削工具間の電気抵抗値を測定し、この抵抗
値が予め定めた値に達したとき研削を終了するこ
とを特徴とするサーマルヘツドの製造方法。
1. A conductive film for inspection is provided on the substrate of the thermal head between the heat generating part and the edge of the board near the heat generating part, and while grinding the end surface of the board near the heat generating part inward using a conductive grinding tool. . A method for manufacturing a thermal head, comprising: measuring an electrical resistance value between the inspection conductor film and the grinding tool; and terminating the grinding when the resistance value reaches a predetermined value.
JP11436387A 1987-05-11 1987-05-11 Production of thermal head Granted JPS63278868A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11436387A JPS63278868A (en) 1987-05-11 1987-05-11 Production of thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11436387A JPS63278868A (en) 1987-05-11 1987-05-11 Production of thermal head

Publications (2)

Publication Number Publication Date
JPS63278868A JPS63278868A (en) 1988-11-16
JPH0566870B2 true JPH0566870B2 (en) 1993-09-22

Family

ID=14635846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11436387A Granted JPS63278868A (en) 1987-05-11 1987-05-11 Production of thermal head

Country Status (1)

Country Link
JP (1) JPS63278868A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4793895A (en) * 1988-01-25 1988-12-27 Ibm Corporation In situ conductivity monitoring technique for chemical/mechanical planarization endpoint detection
JP2818498B2 (en) * 1991-03-29 1998-10-30 京セラ株式会社 Thermal head
CN106041667A (en) * 2016-05-20 2016-10-26 京东方科技集团股份有限公司 Base plate and edging detection method, alignment method and device thereof

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