JPH0563899B2 - - Google Patents
Info
- Publication number
- JPH0563899B2 JPH0563899B2 JP3518272A JP51827291A JPH0563899B2 JP H0563899 B2 JPH0563899 B2 JP H0563899B2 JP 3518272 A JP3518272 A JP 3518272A JP 51827291 A JP51827291 A JP 51827291A JP H0563899 B2 JPH0563899 B2 JP H0563899B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- vacuum chamber
- discharge
- glow discharge
- analysis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000523 sample Substances 0.000 description 217
- 238000004458 analytical method Methods 0.000 description 47
- 150000002500 ions Chemical class 0.000 description 33
- 238000000034 method Methods 0.000 description 27
- 239000004020 conductor Substances 0.000 description 26
- 239000007787 solid Substances 0.000 description 24
- 239000000463 material Substances 0.000 description 22
- 239000007789 gas Substances 0.000 description 21
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- 238000004544 sputter deposition Methods 0.000 description 18
- 230000003287 optical effect Effects 0.000 description 17
- 238000007789 sealing Methods 0.000 description 17
- 239000000843 powder Substances 0.000 description 16
- 230000005284 excitation Effects 0.000 description 14
- 230000006870 function Effects 0.000 description 14
- 238000001228 spectrum Methods 0.000 description 14
- 239000011159 matrix material Substances 0.000 description 12
- 239000010949 copper Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 11
- 239000011261 inert gas Substances 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 238000000926 separation method Methods 0.000 description 10
- 125000006850 spacer group Chemical group 0.000 description 10
- 238000000889 atomisation Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 238000005070 sampling Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 238000001036 glow-discharge mass spectrometry Methods 0.000 description 8
- 238000004949 mass spectrometry Methods 0.000 description 8
- 239000010935 stainless steel Substances 0.000 description 8
- 229910001220 stainless steel Inorganic materials 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- 239000010406 cathode material Substances 0.000 description 6
- 238000011109 contamination Methods 0.000 description 5
- 239000002826 coolant Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 239000000615 nonconductor Substances 0.000 description 5
- 239000002699 waste material Substances 0.000 description 5
- 229910000952 Be alloy Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000000295 emission spectrum Methods 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000001360 synchronised effect Effects 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000012491 analyte Substances 0.000 description 3
- 238000001593 atomic mass spectrometry Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000003780 insertion Methods 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- 238000001819 mass spectrum Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 2
- 238000001636 atomic emission spectroscopy Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007123 defense Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000012777 electrically insulating material Substances 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000004043 responsiveness Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 229910000314 transition metal oxide Inorganic materials 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- 238000001391 atomic fluorescence spectroscopy Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 238000001336 glow discharge atomic emission spectroscopy Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000000155 isotopic effect Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000005173 quadrupole mass spectroscopy Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000001877 single-ion monitoring Methods 0.000 description 1
- 238000012306 spectroscopic technique Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/67—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using electric arcs or discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
- H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/591,544 US5086226A (en) | 1989-05-31 | 1990-10-01 | Device for radio frequency powered glow discharge spectrometry with external sample mount geometry |
| US591,544 | 1990-10-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05501636A JPH05501636A (ja) | 1993-03-25 |
| JPH0563899B2 true JPH0563899B2 (en, 2012) | 1993-09-13 |
Family
ID=24366901
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3518272A Granted JPH05501636A (ja) | 1990-10-01 | 1991-09-30 | サンプル外部支持ジオメトリーを備えた無線周波駆動のグロー放電分光測定装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5086226A (en, 2012) |
| EP (1) | EP0503058B1 (en, 2012) |
| JP (1) | JPH05501636A (en, 2012) |
| DE (1) | DE69128342T2 (en, 2012) |
| WO (1) | WO1992006487A1 (en, 2012) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5325021A (en) * | 1992-04-09 | 1994-06-28 | Clemson University | Radio-frequency powered glow discharge device and method with high voltage interface |
| EP0711993A4 (en) * | 1993-07-26 | 1997-09-10 | Kawasaki Steel Co | DEVICE AND METHOD FOR THE SPECTRAL ANALYSIS OF AN EMISSION |
| US5408315A (en) * | 1993-07-28 | 1995-04-18 | Leco Corporation | Glow discharge analytical instrument for performing excitation and analyzation on the same side of a sample |
| GB2296369A (en) * | 1994-12-22 | 1996-06-26 | Secr Defence | Radio frequency ion source |
| US6124675A (en) * | 1998-06-01 | 2000-09-26 | University Of Montreal | Metastable atom bombardment source |
| AU6045400A (en) * | 1999-02-25 | 2000-10-04 | Clemson University | Sampling and analysis of airborne particulate matter by glow discharge atomic emission and mass spectrometries |
| US6157546A (en) | 1999-03-26 | 2000-12-05 | Ericsson Inc. | Shielding apparatus for electronic devices |
| US6465776B1 (en) | 2000-06-02 | 2002-10-15 | Board Of Regents, The University Of Texas System | Mass spectrometer apparatus for analyzing multiple fluid samples concurrently |
| EP1363722A1 (en) * | 2001-01-29 | 2003-11-26 | Clemson University Research Foundation | Atmospheric pressure, glow discharge, optical emission source for the direct sampling of liquid media |
| FR2826121B1 (fr) * | 2001-06-18 | 2004-02-20 | Jobin Yvon Sas | Dispositif et procede de positionnement d'un echantillon monte sur un spectrometre a decharge luminescente |
| US7298091B2 (en) * | 2002-02-01 | 2007-11-20 | The Regents Of The University Of California | Matching network for RF plasma source |
| DE102006016229B4 (de) * | 2006-03-29 | 2010-05-27 | Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. | Verfahren und Vorrichtung zur Ermittlung von Zusammensetzungen einer Festkörperprobe mittels Glimmentladungsspektroskopie und zur Ermittlung von Höhenunterschieden simultan dazu |
| JP5771458B2 (ja) * | 2011-06-27 | 2015-09-02 | 株式会社日立ハイテクノロジーズ | 質量分析装置及び質量分析方法 |
| US20130255877A1 (en) * | 2012-03-20 | 2013-10-03 | Flextronics Ap, Llc | Multifunctional thermo-vacuum-air pressurized forming machine |
| US9536725B2 (en) | 2013-02-05 | 2017-01-03 | Clemson University | Means of introducing an analyte into liquid sampling atmospheric pressure glow discharge |
| WO2016037034A1 (en) | 2014-09-04 | 2016-03-10 | Leco Corporation | Soft ionization based on conditioned glow discharge for quantitative analysis |
| US10281405B2 (en) | 2016-01-08 | 2019-05-07 | Clemson University Research Foundation | Ambient desorption-optical emission spectroscopy using a microplasma desorption/excitation source |
| EP3485294A4 (en) * | 2016-07-17 | 2020-02-26 | B.G. Negev Technologies and Applications Ltd., at Ben-Gurion University | ASCENDING CONVERSION SYSTEM FOR IMAGING AND COMMUNICATION |
| JP6765328B2 (ja) * | 2017-03-15 | 2020-10-07 | 株式会社堀場製作所 | 作成方法、グロー放電発光分析方法、器具、及びグロー放電発光分析装置 |
| GB2583897A (en) * | 2019-04-05 | 2020-11-18 | Servomex Group Ltd | Glow plasma stabilisation |
| CA3063389C (en) | 2019-12-02 | 2021-03-30 | 2S Water Incorporated | Solution electrode glow discharge apparatus |
| CA3068769A1 (en) | 2020-01-20 | 2021-07-20 | 2S Water Incorporated | Liquid electrode tip |
| RU206533U1 (ru) * | 2021-03-09 | 2021-09-15 | Александр Михайлович Панин | Фотометр для спектрального анализа |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3588601A (en) * | 1968-12-27 | 1971-06-28 | Westinghouse Electric Corp | Radio frequency spectral emission and detector device |
| DE1910461B2 (de) * | 1969-03-01 | 1971-09-23 | Glimmentladungsroehre zur analyse von draehten und drahtfoer migen metallischen koerpern | |
| US4128336A (en) * | 1975-08-21 | 1978-12-05 | The South African Inventions Development Corporation | Spectroscopic apparatus and method |
| GB8614177D0 (en) * | 1986-06-11 | 1986-07-16 | Vg Instr Group | Glow discharge mass spectrometer |
| FR2616545B1 (fr) * | 1987-06-09 | 1990-05-11 | Renault | Procede et dispositif d'analyse de surfaces non conductrices |
| GB8804290D0 (en) * | 1988-02-24 | 1988-03-23 | Vg Instr Group | Glow discharge spectrometer |
| US5006706A (en) * | 1989-05-31 | 1991-04-09 | Clemson University | Analytical method and apparatus |
-
1990
- 1990-10-01 US US07/591,544 patent/US5086226A/en not_active Expired - Lifetime
-
1991
- 1991-09-30 WO PCT/US1991/007178 patent/WO1992006487A1/en active IP Right Grant
- 1991-09-30 JP JP3518272A patent/JPH05501636A/ja active Granted
- 1991-09-30 DE DE69128342T patent/DE69128342T2/de not_active Expired - Fee Related
- 1991-09-30 EP EP91919679A patent/EP0503058B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0503058A1 (en) | 1992-09-16 |
| EP0503058A4 (en) | 1993-05-05 |
| DE69128342T2 (de) | 1998-03-26 |
| JPH05501636A (ja) | 1993-03-25 |
| US5086226A (en) | 1992-02-04 |
| DE69128342D1 (de) | 1998-01-15 |
| WO1992006487A1 (en) | 1992-04-16 |
| EP0503058B1 (en) | 1997-12-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0563899B2 (en, 2012) | ||
| US5325021A (en) | Radio-frequency powered glow discharge device and method with high voltage interface | |
| Duckworth et al. | Radio frequency powered glow discharge atomization/ionization source for solids mass spectrometry | |
| EP0437358B1 (en) | Glow discharge spectrometry | |
| US5006706A (en) | Analytical method and apparatus | |
| JP3676298B2 (ja) | 化学物質の検出装置および化学物質の検出方法 | |
| Lazik et al. | Electrical and optical characteristics of a radio frequency glow discharge atomic emission source with dielectric sample atomization | |
| Harrison et al. | Temporal considerations with a microsecond pulsed glow discharge | |
| US3939344A (en) | Prefilter-ionizer apparatus for use with quadrupole type secondary-ion mass spectrometers | |
| GB1567490A (en) | Positive and negative ion recording system for mass spectrometer | |
| Pan et al. | Time-resolved studies of ionized sputtered atoms in pulsed radio frequency powered glow discharge mass spectrometry | |
| Agostini et al. | Electron spectroscopy at thresholds in single and double multiphoton ionization of strontium | |
| Saprykin et al. | Optimization of an rf-powered magnetron glow discharge for the trace analysis of glasses and ceramics | |
| US4816685A (en) | Ion volume ring | |
| Heintz et al. | Radio-frequency-powered planar-magnetron glow discharge as a source for time-of-flight elemental mass spectrometry | |
| Su et al. | Study of a pulsed glow discharge ion source for time-of-flight mass spectrometry | |
| Behera et al. | A 22-pole radiofrequency ion trap setup for laboratory astrophysical studies | |
| JP3345490B2 (ja) | グロー放電発光分光分析装置 | |
| Nickenig et al. | Direct observation of high frequency emissions from a critical velocity rotating plasma | |
| JP2610035B2 (ja) | 表面分析装置 | |
| Sullivan et al. | Fast atom and ion surface studies leading to the development of a time of flight fast atom scattering spectrometer | |
| Tanguay et al. | Ion bombardment magnetron furnace for atomic spectroscopy | |
| Kingston et al. | Photodissociation of ions within the source of a double-focusing mass spectrometer | |
| GB2091937A (en) | Mass analysis sample ionisation | |
| Yorozu et al. | Detection of hydrogen isotope atoms by mass spectrometry combined with resonant ionization |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20070913 Year of fee payment: 14 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080913 Year of fee payment: 15 |
|
| LAPS | Cancellation because of no payment of annual fees |