JPH0562419B2 - - Google Patents
Info
- Publication number
- JPH0562419B2 JPH0562419B2 JP61012785A JP1278586A JPH0562419B2 JP H0562419 B2 JPH0562419 B2 JP H0562419B2 JP 61012785 A JP61012785 A JP 61012785A JP 1278586 A JP1278586 A JP 1278586A JP H0562419 B2 JPH0562419 B2 JP H0562419B2
- Authority
- JP
- Japan
- Prior art keywords
- mass separator
- ion beam
- mass
- voltage
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 33
- 230000005684 electric field Effects 0.000 claims description 14
- 150000002500 ions Chemical group 0.000 description 20
- 239000000523 sample Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 7
- 230000001133 acceleration Effects 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000284 extract Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1278586A JPS62172650A (ja) | 1986-01-23 | 1986-01-23 | 集束イオンビ−ム装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1278586A JPS62172650A (ja) | 1986-01-23 | 1986-01-23 | 集束イオンビ−ム装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62172650A JPS62172650A (ja) | 1987-07-29 |
| JPH0562419B2 true JPH0562419B2 (de) | 1993-09-08 |
Family
ID=11815048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1278586A Granted JPS62172650A (ja) | 1986-01-23 | 1986-01-23 | 集束イオンビ−ム装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62172650A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6330800A (ja) * | 1986-07-24 | 1988-02-09 | 日電アネルバ株式会社 | Ｅｘｂ速度選別器 |
| JPH0195458A (ja) * | 1987-10-06 | 1989-04-13 | Yokogawa Electric Corp | 四重極質量分析器を用いたイオン注入装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158852A (ja) * | 1982-03-17 | 1983-09-21 | Jeol Ltd | 荷電粒子フイルタ |
| JPS6074249A (ja) * | 1983-09-29 | 1985-04-26 | Jeol Ltd | イオンビ−ム装置 |
-
1986
- 1986-01-23 JP JP1278586A patent/JPS62172650A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158852A (ja) * | 1982-03-17 | 1983-09-21 | Jeol Ltd | 荷電粒子フイルタ |
| JPS6074249A (ja) * | 1983-09-29 | 1985-04-26 | Jeol Ltd | イオンビ−ム装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62172650A (ja) | 1987-07-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4649316A (en) | Ion beam species filter and blanker | |
| US7579605B2 (en) | Multi-purpose electrostatic lens for an ion implanter system | |
| US4687940A (en) | Hybrid focused-flood ion beam system and method | |
| JPS5871545A (ja) | 可変成形ビ−ム電子光学系 | |
| US7135677B2 (en) | Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system | |
| US5099130A (en) | Apparatus and methods relating to scanning ion beams | |
| US4563587A (en) | Focused ion beam microfabrication column | |
| US5369279A (en) | Chromatically compensated particle-beam column | |
| US4835399A (en) | Charged particle beam apparatus | |
| US20010052744A1 (en) | Monochrometer for electron beam | |
| US20040188630A1 (en) | Deflection system for a particle beam device | |
| JP4421780B2 (ja) | イオン注入装置内でイオンビームを監視および調整するための装置及び方法 | |
| JP2000133183A (ja) | 荷電粒子線装置 | |
| EP0079931B1 (de) | Fokussierte ionenstrahl mikroherstellungssäule | |
| EP1067576B1 (de) | Energiefilter und seine Verwendung in einem Elektronenmikroskop | |
| JPH0562419B2 (de) | ||
| EP0150941A1 (de) | Optische Systeme für geladene Teilchen | |
| RU2144237C1 (ru) | Оптическая колонка для излучения частиц | |
| JP3790646B2 (ja) | 低エネルギー反射電子顕微鏡 | |
| JPS62160648A (ja) | 集束イオンビ−ム装置 | |
| JPS6266551A (ja) | 集束イオンビ−ム装置 | |
| JPH0535540B2 (de) | ||
| JPS62177849A (ja) | 集束イオンビ−ム装置 | |
| JPS61114453A (ja) | 荷電粒子線装置 | |
| JPS6313250A (ja) | イオンビ−ム装置 |