JPH0561029A - Production of color liquid crystal display element - Google Patents

Production of color liquid crystal display element

Info

Publication number
JPH0561029A
JPH0561029A JP3223908A JP22390891A JPH0561029A JP H0561029 A JPH0561029 A JP H0561029A JP 3223908 A JP3223908 A JP 3223908A JP 22390891 A JP22390891 A JP 22390891A JP H0561029 A JPH0561029 A JP H0561029A
Authority
JP
Japan
Prior art keywords
substrate
color filter
film
liquid crystal
color
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3223908A
Other languages
Japanese (ja)
Other versions
JP2721279B2 (en
Inventor
Takeshi Kato
剛 加藤
Shigemitsu Mizushima
繁光 水嶋
Toshio Fujii
利夫 藤井
Masakazu Okanishi
理量 岡西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP3223908A priority Critical patent/JP2721279B2/en
Publication of JPH0561029A publication Critical patent/JPH0561029A/en
Application granted granted Critical
Publication of JP2721279B2 publication Critical patent/JP2721279B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To improve the adhesive power of color filter films and a substrate and to suppress the peeling of the films so as to improve reliability by subjecting the residual films of the color filters generated on the substrate surface exclusive of the color filter regions to a partial polishing treatment. CONSTITUTION:The residual films 2 of the color filters generated on the surface of the substrate exclusive of the color filter regions are subjected to the partial polishing treatment in the process for production of the color liquid crystal display element constituted by applying a photosensitive base material 1 on the substrate surface and selectively providing the color filter regions by utilizing photolithography, then forming the film having the adhesive power to the substrate 3. The residual films 2 of the photosensitive base material generated in the positions exclusive of the color filter regions are partially polished, by which the residual films 2 interposed between the substrate 3 and the film having the adhesive power to this substrate 3 are partially removed. Then, the substrate 1 and the film having the adhesive power to the substrate 1 are in direct contact with each other in the parts where the residual films 2 are removed and, therefore, the adhesive power of the film having the adhesive power to the substrate 1 and the substrate 1 is improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、基板にカラーフィルタ
を設けてなるカラー液晶表示素子の製造方法に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a color liquid crystal display device having a substrate provided with a color filter.

【0002】[0002]

【従来の技術】液晶を用いたカラー表示には、以前から
各種の方式が提案されている。例えば、2色性色素を液
晶に混入して用いるGH(Guest Host)方式、液晶の複屈
折を利用するECB(Electrically Controlled Birefri
ngence)方式、カラーフィルタと液晶表示素子を組合わ
せた光シャッタ方式等がある。
2. Description of the Related Art Various systems have been proposed for color display using liquid crystals. For example, a GH (Guest Host) method in which a dichroic dye is mixed in a liquid crystal, an ECB (Electrically Controlled Birefri) in which the birefringence of the liquid crystal is used.
ngence) method, an optical shutter method in which a color filter and a liquid crystal display element are combined.

【0003】光シャッタ方式は、フルカラー表示にも対
応できるので、最も多く利用されている。この光シャッ
タ方式では、赤、緑、青の3原色のカラーフィルタと、
液晶表示素子による透過光量の制御の組み合わせによ
り、加法混色方式を利用してフルカラー表示を行ってい
る。
The optical shutter system is most widely used because it can be used for full-color display. With this optical shutter system, color filters of the three primary colors of red, green, and blue,
Full color display is performed by using the additive color mixing method by combining the control of the amount of transmitted light by the liquid crystal display element.

【0004】上記カラーフィルタは、通常基板上の各画
素に対応して赤、緑、青の各着色層をモザイク状、ある
いはストライプ状に微細加工して形成される。このカラ
ーフィルタの形成方法には、染色法、電着法、蒸着法、
印刷法等があるが、中でも染色法は、微細パターンの加
工精度が高く、染料を行う色の選択幅が広いのでフルカ
ラー表示用として、最も多く用いられている。
The color filter is usually formed by finely processing red, green, and blue colored layers corresponding to each pixel on the substrate into a mosaic shape or a stripe shape. The method for forming this color filter includes a dyeing method, an electrodeposition method, a vapor deposition method,
Among them, there are printing methods and the like. Among them, the dyeing method is most often used for full-color display because it has high processing accuracy for fine patterns and has a wide selection range of colors for dyeing.

【0005】上記染色法によるカラーフィルタの一般的
な作製方法は、フォトリソグラフィーを応用して、図3
に示すように、ガラス基板21上に感光性基材22より
なるカラーフィルタ領域を選択的に形成する。すなわ
ち、上記ガラス基板21の表面に、例えば、ゼラチン、
アクリル、あるいはポリイミド等からなる感光性基材2
2を塗布し、この感光性基材22に紫外線等を照射して
所定のパターンに露光した後、現像液を用いて現像する
ことにより、所定の微細パターンを形成する。
A general method for producing a color filter by the above dyeing method is shown in FIG.
As shown in FIG. 3, a color filter region made of the photosensitive base material 22 is selectively formed on the glass substrate 21. That is, on the surface of the glass substrate 21, for example, gelatin,
Photosensitive substrate 2 made of acrylic or polyimide
2 is applied, the photosensitive substrate 22 is irradiated with ultraviolet rays or the like to expose a predetermined pattern, and then developed with a developing solution to form a predetermined fine pattern.

【0006】次に、上記感光性基材22を染料を用いて
染色する。そして、上記フォトリソグラフィー工程およ
び染色工程を3回繰り返すことにより、赤、緑、青の各
着色層が形成され、さらに、例えば、アクリル、SiO
2 、エポキシ、またはウレタン等からなる保護膜23が
成膜されて、カラーフィルタが得られる。
Next, the photosensitive substrate 22 is dyed with a dye. Then, the photolithography process and the dyeing process are repeated three times to form the red, green, and blue colored layers, and further, for example, acrylic and SiO.
2 , a protective film 23 made of epoxy, urethane, or the like is formed to obtain a color filter.

【0007】その後、図示しない透明電極、配向膜等が
設けられ、ガラス基板21の周縁部には、もう一枚のガ
ラス基板(図示せず)と貼合わせるための、例えば、エ
ポキシ等の接着剤からなるシール部24が形成される。
図3においては、上記保護膜23はガラス基板21の全
面に成膜され、シール部24は保護膜23を介してガラ
ス基板21上に設けられているが、シール部が設けられ
るガラス基板の周縁部以外の領域に保護膜が成膜され、
ガラス基板上に直接シール部が形成される場合もある。
Thereafter, a transparent electrode, an alignment film, etc., which are not shown, are provided, and an adhesive agent such as epoxy for bonding with another glass substrate (not shown) is provided on the peripheral portion of the glass substrate 21. The seal portion 24 is formed.
In FIG. 3, the protective film 23 is formed on the entire surface of the glass substrate 21, and the seal portion 24 is provided on the glass substrate 21 via the protective film 23. However, the periphery of the glass substrate on which the seal portion is provided is shown. A protective film is formed on the area other than
In some cases, the seal portion may be directly formed on the glass substrate.

【0008】[0008]

【発明が解決しようとする課題】ところが、ガラス基板
21の表面に選択的にカラーフィルタ領域を形成する
際、感光性基材22を現像した後、カラーフィルタ領域
以外の除去されるべき部分に分子レベルで残膜25が生
じることがある。この場合、カラーフィルタの保護膜2
3とガラス基板20との間には、上記残膜25が介在す
ることとなり、残膜25の種類及び性質によっては、上
記保護膜23とガラス基板との接着力が低下し、保護膜
23が剥離し易くなり、特に、接着力が低下しやすい高
温下においては、信頼性が低下するという問題が生じて
いる。
However, when the color filter region is selectively formed on the surface of the glass substrate 21, after the photosensitive substrate 22 is developed, the molecule is formed on the portion other than the color filter region to be removed. A residual film 25 may occur at the level. In this case, the protective film 2 of the color filter
3 will be interposed between the glass substrate 20 and the glass substrate 20, and depending on the type and properties of the residual film 25, the adhesive force between the protective film 23 and the glass substrate will decrease, and the protective film 23 will There is a problem in that reliability is deteriorated at a high temperature where peeling easily occurs and the adhesive force tends to decrease.

【0009】一方、ガラス基板の周縁部に、直接シール
部を形成した場合においても、保護膜を形成した場合と
同様に、ガラス基板とシール部との間に、カラーフィル
タの残膜が介在することとなり、上記シール部のガラス
基板に対する接着力が低下する。
On the other hand, even when the seal portion is directly formed on the peripheral portion of the glass substrate, the residual film of the color filter is interposed between the glass substrate and the seal portion as in the case where the protective film is formed. As a result, the adhesive strength of the seal portion to the glass substrate is reduced.

【0010】[0010]

【課題を解決するための手段】本発明のカラー液晶表示
素子の製造方法は、上記課題を解決するために、基板表
面に感光性基材を塗布し、フォトリソグラフィーを利用
して選択的にカラーフィルタ領域を設けた後、上記基板
との接着力を有する膜を形成してなるカラー液晶表示素
子の製造方法において、上記カラーフィルタ領域以外の
基板表面に生じたカラーフィルタの残膜に対し、部分研
磨処理を行うことを特徴としている。
In order to solve the above-mentioned problems, a method for manufacturing a color liquid crystal display device according to the present invention comprises applying a photosensitive base material to the surface of a substrate and selectively photo-coloring using photolithography. In a method of manufacturing a color liquid crystal display element, which comprises forming a film having adhesive force with the substrate after providing a filter region, a portion of the residual film of the color filter generated on the substrate surface other than the color filter region is partially It is characterized by performing a polishing process.

【0011】[0011]

【作用】上記の構成によれば、カラーフィルタ領域以外
の位置に生じた感光性基材の残膜を部分的に研磨するこ
とにより、基板と、この基板との接着力を有する膜との
間に介在する上記残膜が部分的に除去される。したがっ
て、残膜が除去された部分では、上記基板と、基板との
接着力を有する膜とが直接密着していることになる。こ
の結果、上記基板との接着力を有する膜と、基板との接
着力が向上し、上記膜の剥離が抑制される。
According to the above construction, by partially polishing the residual film of the photosensitive base material generated at the position other than the color filter region, the space between the substrate and the film having the adhesive force with the substrate is formed. The residual film intervening in is partially removed. Therefore, in the portion where the residual film is removed, the above-mentioned substrate and the film having the adhesive force with the substrate are in direct contact with each other. As a result, the adhesive force between the film having the adhesive force with the substrate and the substrate is improved, and the peeling of the film is suppressed.

【0012】[0012]

【実施例】本発明の一実施例について図1及び図2に基
づいて説明すれば、以下の通りである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The following will describe one embodiment of the present invention with reference to FIGS. 1 and 2.

【0013】本実施例のカラー液晶表示素子は、ガラス
基板上に赤、緑、青の各3原色のカラーフィルタが、モ
ザイク状、あるいはストライプ状にそれぞれ形成されて
いる。上記カラーフィルタは、例えば、ゼラチン、アク
リル、あるいはポリイミド等からなる感光性基材を用い
るフォトリソグラフィーにより形成される。このフォト
リソグラフィー工程においては、まず、ガラス基板の表
面に、上記感光性基材が塗布された後、この感光性基材
中の溶剤成分を揮発させるプリベークが行われる。
In the color liquid crystal display element of the present embodiment, color filters of three primary colors of red, green and blue are formed on a glass substrate in a mosaic shape or a stripe shape, respectively. The color filter is formed by photolithography using a photosensitive substrate made of gelatin, acrylic, polyimide, or the like. In the photolithography step, first, the surface of the glass substrate is coated with the above-mentioned photosensitive base material, and then prebaking is performed to volatilize the solvent component in the photosensitive base material.

【0014】次に、上記ガラス基板上にマスクプレート
を載せて、位置合わせを行った後、紫外線を照射し、所
定のパターンを焼付けることにより、露光を行う。露光
に用いられる光源としては、紫外域に分光エネルギー分
布のピークを多くもつ超高圧水銀灯や、キセノンラン
プ、カーボンアーク灯等が用いられる。次いで、専用の
現像液を用いて、上記感光性基材を現像し、ガラス基板
表面に微細パターンを形成する。その後、微細パターン
の形成されたガラス基板は、さらに熱処理が施され、上
記感光性基材の乾燥及び硬化が行われる。
Next, a mask plate is placed on the glass substrate to perform alignment, and then ultraviolet rays are radiated to expose a predetermined pattern for exposure. As a light source used for exposure, an ultra-high pressure mercury lamp having many peaks of spectral energy distribution in the ultraviolet region, a xenon lamp, a carbon arc lamp or the like is used. Then, the above-mentioned photosensitive base material is developed using a dedicated developer to form a fine pattern on the surface of the glass substrate. Then, the glass substrate on which the fine pattern is formed is further heat-treated, and the photosensitive substrate is dried and cured.

【0015】続いて、パターン化された上記感光性基材
を所定の染料で染色し、上記フォトリソグラフィー工程
及び染色工程を赤、緑、青の3原色についてそれぞれ行
うことにより、上記3原色のカラーフィルタが液晶表示
素子の各画素ごとに形成される。
Subsequently, the patterned photosensitive substrate is dyed with a predetermined dye, and the photolithography process and the dyeing process are performed for each of the three primary colors of red, green, and blue to obtain the three primary colors. A filter is formed for each pixel of the liquid crystal display element.

【0016】上記の工程により、図1(a)に示すよう
に、ガラス基板3の表面に選択的に感光性基材1からな
るカラーフィルタ領域を作製すると、ガラス基板3の表
面におけるカラーフィルタ領域以外の領域には、上記現
像液だけでは、感光性基材1の除去が十分に行われず、
感光性基材1の残膜2が分子レベルで生じることがあ
る。
By the above steps, as shown in FIG. 1A, when the color filter region selectively made of the photosensitive substrate 1 is formed on the surface of the glass substrate 3, the color filter region on the surface of the glass substrate 3 is formed. In the area other than the above, the photosensitive base material 1 is not sufficiently removed by the developer alone,
The residual film 2 of the photosensitive substrate 1 may occur at the molecular level.

【0017】そこで、図1(b)に示すように、バフ付
ドリル4(直径約50mm、幅約10mm、回転数60
0rpm、加重0.8〜1.0kg/cm2 )を用い、上記
残膜2に対して部分的に研磨処理を行う。このバフ付ド
リル4は、ハンドドリル5に円板状のバフ6が取付けら
れたもので、バフ6を回転させながら上記残膜2の所定
位置に当接させることにより、上記残膜2を研磨する。
Therefore, as shown in FIG. 1B, a buffed drill 4 (diameter of about 50 mm, width of about 10 mm, rotation speed of 60)
The residual film 2 is partially polished by using 0 rpm and a weight of 0.8 to 1.0 kg / cm 2 ). This buffed drill 4 has a disc-shaped buff 6 attached to a hand drill 5. The buff 6 is rotated and brought into contact with a predetermined position of the residual film 2 to polish the residual film 2. To do.

【0018】このとき、上記残膜2の全面にわたって、
この研磨処理を行うと、カラーフィルタの表示画素膜に
損傷を与える恐れがある。したがって、図1(c)に示
すように、上記残膜2の研磨処理は、部分的に行われ、
研磨処理が行われた部分7のみ、残膜2が除去される。
尚、上記研磨後は、純水によるガラス基板3の洗浄が超
音波洗浄器(図示せず)を使用して行われ、研磨処理に
より生じたダストが除去される。
At this time, over the entire surface of the residual film 2,
If this polishing process is performed, the display pixel film of the color filter may be damaged. Therefore, as shown in FIG. 1C, the polishing process of the residual film 2 is partially performed,
The residual film 2 is removed only in the portion 7 where the polishing process has been performed.
After the polishing, the glass substrate 3 is washed with pure water using an ultrasonic cleaner (not shown) to remove dust generated by the polishing process.

【0019】次に、図1(d)に示すように、キズ及び
カラーフィルタからの異物の溶出を防ぐために、例えば
アクリル、SiO2 、エポキシ、あるいはウレタン等か
らなる保護膜8が、ガラス基板3の全面を覆うように成
膜される。続いて、図示しない透明電極が形成され、さ
らに、液晶材料の液晶分子を配向させる、例えばポリイ
ミド等からなる配向膜(図示せず)が塗布される。上記
配向膜には、ラビング法等による配向膜処理が施され
る。
Next, as shown in FIG. 1D, a protective film 8 made of, for example, acrylic, SiO 2 , epoxy, urethane or the like is formed on the glass substrate 3 in order to prevent scratches and elution of foreign matters from the color filter. Is formed so as to cover the entire surface of. Subsequently, a transparent electrode (not shown) is formed, and an alignment film (not shown) made of, for example, polyimide or the like for orienting the liquid crystal molecules of the liquid crystal material is further applied. The alignment film is subjected to an alignment film treatment such as a rubbing method.

【0020】その後、図2に示すように、ガラス基板3
における研磨処理が行われた部分7に、例えば、エポキ
シ等の接着剤からなるシール部9が形成される。そし
て、図示しないスペーサが上記配向膜上に散布され、透
明電極や配向膜が形成されたもう一枚のガラス基板(図
示せず)と上記ガラス基板3とを、それぞれ各配向膜同
士を対面させた状態で貼合わせる。次いで、上記一対の
ガラス基板間に、液晶材料が充填され、ガラス基板の周
囲が封止されて、カラー液晶表示素子が作製される。
Thereafter, as shown in FIG. 2, the glass substrate 3
A seal portion 9 made of an adhesive such as epoxy is formed on the portion 7 that has been subjected to the polishing process in 1. Then, spacers (not shown) are scattered on the alignment film, and another glass substrate (not shown) on which a transparent electrode or an alignment film is formed and the glass substrate 3 are made to face each other. Stuck together. Then, a liquid crystal material is filled between the pair of glass substrates, and the periphery of the glass substrate is sealed to produce a color liquid crystal display element.

【0021】上記のように作製されたカラー液晶表示素
子には、さらに、蛍光管等のバックライトが設けられ、
必要に応じて液晶表示素子の赤、緑、青の各原色の透過
光量が調整されることにより、フルカラーの表示が得ら
れる。
The color liquid crystal display element manufactured as described above is further provided with a backlight such as a fluorescent tube.
A full-color display can be obtained by adjusting the amount of transmitted light of each of the red, green, and blue primary colors of the liquid crystal display element as needed.

【0022】以上のように、本実施例においては、カラ
ーフィルタ領域以外に生じた感光性基材1の残膜2が、
バフ付ドリル4を用いて部分的に研磨され、除去されて
いる。これにより、保護膜8とガラス基板4とは、研磨
処理が行われた部分7では、直接密着することになる。
As described above, in this embodiment, the residual film 2 of the photosensitive substrate 1 generated in the area other than the color filter area is
It is partially polished and removed using a buffing drill 4. As a result, the protective film 8 and the glass substrate 4 are in direct contact with each other at the portion 7 where the polishing process has been performed.

【0023】したがって、上記保護膜8とガラス基板3
との接着力が向上し、保護膜8の剥離が抑制される。こ
の結果、特に、接着力が低下しやすい高温下において、
信頼性の向上を図ることができる。
Therefore, the protective film 8 and the glass substrate 3 are formed.
The adhesive force with and is improved, and peeling of the protective film 8 is suppressed. As a result, especially under high temperature where the adhesive force is likely to decrease,
It is possible to improve reliability.

【0024】一方、ガラス基板上に直接シール部が設け
られる場合においても、感光性基材の残膜を研磨して除
去することにより、上記シール部とガラス基板との接着
力が向上し、シール部の剥離が抑制される。
On the other hand, even when the seal portion is directly provided on the glass substrate, by polishing and removing the residual film of the photosensitive substrate, the adhesive force between the seal portion and the glass substrate is improved and the seal is improved. The peeling of the part is suppressed.

【0025】尚、本実施例では、カラーフィルタを形成
する方法として、染色法を例に挙げ説明したが、基板表
面に感光性基材を塗布する工程を有する他のカラーフィ
ルタの作製方法においても、本発明の適用が可能であ
る。
In this embodiment, the dyeing method has been described as an example of the method of forming the color filter, but the method of producing another color filter having a step of applying a photosensitive base material on the surface of the substrate is also applicable. The present invention can be applied.

【0026】[0026]

【発明の効果】本発明のカラー液晶表示素子の製造方法
は、以上のように、カラーフィルタ領域以外の基板表面
に生じたカラーフィルタの残膜に対し、部分研磨処理を
行う構成である。
As described above, the method of manufacturing a color liquid crystal display device of the present invention is configured such that the residual film of the color filter formed on the substrate surface other than the color filter region is partially polished.

【0027】それゆえ、残膜が研磨された部分では、基
板と、この基板上に形成された膜とが直接密着すること
となり、上記膜と基板との接着力が向上するため、剥離
が抑制される。したがって、特に、接着力が低下しやす
い高温下において、信頼性が向上するという効果を奏す
る。
Therefore, in the portion where the residual film is polished, the substrate and the film formed on this substrate are brought into direct contact with each other, and the adhesive force between the film and the substrate is improved, so that peeling is suppressed. To be done. Therefore, there is an effect that the reliability is improved especially at a high temperature where the adhesive force is apt to decrease.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例におけるカラー液晶表示素子
の製造工程を示す説明図である。
FIG. 1 is an explanatory diagram showing a manufacturing process of a color liquid crystal display element according to an embodiment of the present invention.

【図2】上記カラー液晶表示素子の製造工程により作製
された液晶表示素子の要部断面図である。
FIG. 2 is a cross-sectional view of a main part of a liquid crystal display element manufactured by the manufacturing process of the color liquid crystal display element.

【図3】従来のカラー液晶表示素子の製造方法により作
製されたカラー液晶表示素子の要部断面図である。
FIG. 3 is a cross-sectional view of a main part of a color liquid crystal display element manufactured by a conventional method for manufacturing a color liquid crystal display element.

【符号の説明】[Explanation of symbols]

1 感光性基材 2 残膜 3 ガラス基板(基板) 1 Photosensitive Substrate 2 Residual Film 3 Glass Substrate (Substrate)

───────────────────────────────────────────────────── フロントページの続き (72)発明者 岡西 理量 大阪府大阪市阿倍野区長池町22番22号 シ ヤープ株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Osamu Osamu 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Inside Sharp Corporation

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】基板表面に感光性基材を塗布し、フォトリ
ソグラフィーを利用して選択的にカラーフィルタ領域を
設けた後、上記基板との接着力を有する膜を形成してな
るカラー液晶表示素子の製造方法において、 上記カラーフィルタ領域以外の基板表面に生じたカラー
フィルタの残膜に対し、部分研磨処理を行うことを特徴
とするカラー液晶表示素子の製造方法。
1. A color liquid crystal display in which a photosensitive base material is applied to the surface of a substrate, a color filter region is selectively provided by utilizing photolithography, and then a film having an adhesive force to the substrate is formed. A method for manufacturing a color liquid crystal display element, which comprises partially polishing a residual film of a color filter formed on a surface of a substrate other than the color filter region in the element manufacturing method.
JP3223908A 1991-09-04 1991-09-04 Method for manufacturing color liquid crystal display element Expired - Lifetime JP2721279B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3223908A JP2721279B2 (en) 1991-09-04 1991-09-04 Method for manufacturing color liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3223908A JP2721279B2 (en) 1991-09-04 1991-09-04 Method for manufacturing color liquid crystal display element

Publications (2)

Publication Number Publication Date
JPH0561029A true JPH0561029A (en) 1993-03-12
JP2721279B2 JP2721279B2 (en) 1998-03-04

Family

ID=16805599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3223908A Expired - Lifetime JP2721279B2 (en) 1991-09-04 1991-09-04 Method for manufacturing color liquid crystal display element

Country Status (1)

Country Link
JP (1) JP2721279B2 (en)

Also Published As

Publication number Publication date
JP2721279B2 (en) 1998-03-04

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