JPH0560251B2 - - Google Patents

Info

Publication number
JPH0560251B2
JPH0560251B2 JP60090899A JP9089985A JPH0560251B2 JP H0560251 B2 JPH0560251 B2 JP H0560251B2 JP 60090899 A JP60090899 A JP 60090899A JP 9089985 A JP9089985 A JP 9089985A JP H0560251 B2 JPH0560251 B2 JP H0560251B2
Authority
JP
Japan
Prior art keywords
substrate
mask
exposed
holding means
transfer member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60090899A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61251031A (ja
Inventor
Junji Isohata
Koichi Matsushita
Sekinori Yamamoto
Makoto Myazaki
Kunitaka Ozawa
Hideki Yoshinari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60090899A priority Critical patent/JPS61251031A/ja
Priority to US06/856,222 priority patent/US4748477A/en
Publication of JPS61251031A publication Critical patent/JPS61251031A/ja
Publication of JPH0560251B2 publication Critical patent/JPH0560251B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60090899A 1985-04-30 1985-04-30 露光方法および装置 Granted JPS61251031A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60090899A JPS61251031A (ja) 1985-04-30 1985-04-30 露光方法および装置
US06/856,222 US4748477A (en) 1985-04-30 1986-04-28 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60090899A JPS61251031A (ja) 1985-04-30 1985-04-30 露光方法および装置

Publications (2)

Publication Number Publication Date
JPS61251031A JPS61251031A (ja) 1986-11-08
JPH0560251B2 true JPH0560251B2 (cs) 1993-09-01

Family

ID=14011246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60090899A Granted JPS61251031A (ja) 1985-04-30 1985-04-30 露光方法および装置

Country Status (1)

Country Link
JP (1) JPS61251031A (cs)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0752712B2 (ja) * 1989-12-27 1995-06-05 株式会社東芝 露光装置

Also Published As

Publication number Publication date
JPS61251031A (ja) 1986-11-08

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term