JPH0554272B2 - - Google Patents
Info
- Publication number
- JPH0554272B2 JPH0554272B2 JP56112572A JP11257281A JPH0554272B2 JP H0554272 B2 JPH0554272 B2 JP H0554272B2 JP 56112572 A JP56112572 A JP 56112572A JP 11257281 A JP11257281 A JP 11257281A JP H0554272 B2 JPH0554272 B2 JP H0554272B2
- Authority
- JP
- Japan
- Prior art keywords
- type
- layer
- amorphous silicon
- amorphous semiconductor
- amorphous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
- H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56112572A JPS5814583A (ja) | 1981-07-17 | 1981-07-17 | アモルフアス半導体およびアモルフアス半導体/アモルフアスシリコン・ヘテロ接合光起電力素子 |
DE8282106293T DE3280112D1 (de) | 1981-07-17 | 1982-07-14 | Amorpher halbleiter und photovoltaische einrichtung aus amorphem silizium. |
DE8888117644T DE3280418T2 (de) | 1981-07-17 | 1982-07-14 | Amorpher halbleiter und photovoltaische vorrichtung aus amorphem silizium. |
EP88117644A EP0309000B1 (en) | 1981-07-17 | 1982-07-14 | Amorphous semiconductor and amorphous silicon photovoltaic device |
EP82106293A EP0070509B2 (en) | 1981-07-17 | 1982-07-14 | Amorphous semiconductor and amorphous silicon photovoltaic device |
US06/399,312 US4450316A (en) | 1981-07-17 | 1982-07-19 | Amorphous silicon photovoltaic device having two-layer transparent electrode |
US06/552,951 US4499331A (en) | 1981-07-17 | 1983-11-17 | Amorphous semiconductor and amorphous silicon photovoltaic device |
US06/552,952 US4491682A (en) | 1981-07-17 | 1983-11-17 | Amorphous silicon photovoltaic device including a two-layer transparent electrode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56112572A JPS5814583A (ja) | 1981-07-17 | 1981-07-17 | アモルフアス半導体およびアモルフアス半導体/アモルフアスシリコン・ヘテロ接合光起電力素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5814583A JPS5814583A (ja) | 1983-01-27 |
JPH0554272B2 true JPH0554272B2 (en, 2012) | 1993-08-12 |
Family
ID=14590063
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56112572A Granted JPS5814583A (ja) | 1981-07-17 | 1981-07-17 | アモルフアス半導体およびアモルフアス半導体/アモルフアスシリコン・ヘテロ接合光起電力素子 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5814583A (en, 2012) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0853201A (ja) * | 1994-08-10 | 1996-02-27 | Hiromi Hatakeyama | ダストボックス |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61232685A (ja) * | 1985-04-09 | 1986-10-16 | Agency Of Ind Science & Technol | アモルフアスシリコン太陽電池およびその製造方法 |
JPH0689843B2 (ja) * | 1985-10-07 | 1994-11-14 | トヨタ自動車株式会社 | 自動変速機のトルクコンバータ出力軸回転数検出方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1123525A (en) * | 1977-10-12 | 1982-05-11 | Stanford R. Ovshinsky | High temperature amorphous semiconductor member and method of making same |
JPS5513938A (en) * | 1978-07-17 | 1980-01-31 | Shunpei Yamazaki | Photoelectronic conversion semiconductor device and its manufacturing method |
-
1981
- 1981-07-17 JP JP56112572A patent/JPS5814583A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0853201A (ja) * | 1994-08-10 | 1996-02-27 | Hiromi Hatakeyama | ダストボックス |
Also Published As
Publication number | Publication date |
---|---|
JPS5814583A (ja) | 1983-01-27 |
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