JPH0548610B2 - - Google Patents
Info
- Publication number
- JPH0548610B2 JPH0548610B2 JP5721885A JP5721885A JPH0548610B2 JP H0548610 B2 JPH0548610 B2 JP H0548610B2 JP 5721885 A JP5721885 A JP 5721885A JP 5721885 A JP5721885 A JP 5721885A JP H0548610 B2 JPH0548610 B2 JP H0548610B2
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- light
- reduction projection
- mask
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005286 illumination Methods 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 7
- 230000000694 effects Effects 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 101700004678 SLIT3 Proteins 0.000 description 2
- 102100027339 Slit homolog 3 protein Human genes 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60057218A JPS61216324A (ja) | 1985-03-20 | 1985-03-20 | 縮小投影式露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60057218A JPS61216324A (ja) | 1985-03-20 | 1985-03-20 | 縮小投影式露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61216324A JPS61216324A (ja) | 1986-09-26 |
JPH0548610B2 true JPH0548610B2 (US06653308-20031125-C00199.png) | 1993-07-22 |
Family
ID=13049387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60057218A Granted JPS61216324A (ja) | 1985-03-20 | 1985-03-20 | 縮小投影式露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61216324A (US06653308-20031125-C00199.png) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2649543B2 (ja) * | 1988-06-03 | 1997-09-03 | キヤノン株式会社 | 露光装置 |
US6734445B2 (en) | 2001-04-23 | 2004-05-11 | Intel Corporation | Mechanized retractable pellicles and methods of use |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5068066A (US06653308-20031125-C00199.png) * | 1973-10-17 | 1975-06-07 | ||
JPS57117238A (en) * | 1981-01-14 | 1982-07-21 | Nippon Kogaku Kk <Nikon> | Exposing and baking device for manufacturing integrated circuit with illuminometer |
JPS59149024A (ja) * | 1983-02-16 | 1984-08-25 | Hitachi Ltd | 露光装置 |
-
1985
- 1985-03-20 JP JP60057218A patent/JPS61216324A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5068066A (US06653308-20031125-C00199.png) * | 1973-10-17 | 1975-06-07 | ||
JPS57117238A (en) * | 1981-01-14 | 1982-07-21 | Nippon Kogaku Kk <Nikon> | Exposing and baking device for manufacturing integrated circuit with illuminometer |
JPS59149024A (ja) * | 1983-02-16 | 1984-08-25 | Hitachi Ltd | 露光装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS61216324A (ja) | 1986-09-26 |
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