JPH0548062A - Method for cutting substrate end sections of image sensor substrate - Google Patents

Method for cutting substrate end sections of image sensor substrate

Info

Publication number
JPH0548062A
JPH0548062A JP3229675A JP22967591A JPH0548062A JP H0548062 A JPH0548062 A JP H0548062A JP 3229675 A JP3229675 A JP 3229675A JP 22967591 A JP22967591 A JP 22967591A JP H0548062 A JPH0548062 A JP H0548062A
Authority
JP
Japan
Prior art keywords
substrate
cutting
blade
image sensor
light receiving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3229675A
Other languages
Japanese (ja)
Inventor
Keiji Fujimagari
啓志 藤曲
Masao Funada
雅夫 舟田
Junji Okada
純二 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Priority to JP3229675A priority Critical patent/JPH0548062A/en
Publication of JPH0548062A publication Critical patent/JPH0548062A/en
Pending legal-status Critical Current

Links

Landscapes

  • Facsimile Heads (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Dicing (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

PURPOSE:To improve the cutting accuracy by forming the groove section on the upper side of translucent substrate or the lower side of insulation substrate by means of the first blade and then cutting the translucent and insulation substrates from the bottom face of the groove section by means of the second cutting blade that is smaller in blade width than the first cutting blade. CONSTITUTION:A groove section is formed by using a dicing blade 31 in the direction crossing orthogonally the lengthwise direction of transparent substrate 2 between the formation side of warp filter 21 on the substrate 2 in a color image sensor and the right above position of a light receiving element 10a in an insulation substrate 1 end section. Next, while the stage with a color image sensor mounted is being inclined by 5 to 10 degrees, the remaining section of the substrate 2 and the substrate 1 are cut off along the cutting mark line 15 prepared just when respective electrodes comprising the element 10a are subject to patterning, from the bottom section by means of a dicing blade 32 smaller in blade width than that of the blade 31 in such a way that a cutting edge face will be inclined inward. Thus, both sides on which the elements 10 are formed can be cut off at optional positions.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はイメージセンサ基板の端
部の切断方法に関し、例えば多数の受光素子をライン状
に形成した絶縁基板上に、カラーフィルタ等が積層され
た透光性基板を配置して成るイメージセンサ基板の切断
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of cutting an end portion of an image sensor substrate, for example, a translucent substrate having a color filter or the like laminated on an insulating substrate having a large number of light receiving elements formed in a line. The present invention relates to a method for cutting an image sensor substrate.

【0002】[0002]

【従来の技術】従来、ファクシミリ等に使用される固体
撮像素子には、例えば、絶縁基板上に複数の個別電極,
光電変換層,共通電極を順次積層して受光素子アレイを
形成する薄膜構造とし、原稿等の画像情報を1対1に投
影して電気信号に変換するものが提案されている。薄膜
構造の受光素子アレイの幅は、金属膜や半導体膜を着膜
する着膜装置により制限されるので、例えば幅の広い原
稿を読み取り可能とするためには、受光素子アレイが形
成された複数のセンサ基板を連結接続するように配置
し、1本の長尺状受光素子アレイを得ている。複数のセ
ンサ基板を連結する場合、連結接続箇所においての隣接
受光素子の画素ピッチが受光素子アレイの画素ピッチと
均一になるよう切断精度を高める必要がある。
2. Description of the Related Art Conventionally, a solid-state image pickup device used in a facsimile or the like has, for example, a plurality of individual electrodes on an insulating substrate.
There is proposed a thin film structure in which a photoelectric conversion layer and a common electrode are sequentially laminated to form a light receiving element array, and image information of a document or the like is projected one-to-one and converted into an electric signal. The width of the thin-film light-receiving element array is limited by the film deposition device that deposits a metal film or a semiconductor film. Therefore, in order to be able to read a wide original, for example, a plurality of light-receiving element arrays formed Are arranged so as to be connected and connected to each other to obtain one long light receiving element array. When connecting a plurality of sensor substrates, it is necessary to increase the cutting accuracy so that the pixel pitch of the adjacent light receiving elements at the connection connection point becomes uniform with the pixel pitch of the light receiving element array.

【0003】従来、図4に示すように、絶縁基板1上に
離散的に形成された金属膜から成る個別電極11,図の
左右方向に帯状となる半導体膜からなる光電変換層1
2,透明導電膜から成る帯状の共通電極13を順次積層
して多数の受光素子10が一列に配列された受光素子ア
レイを形成し、更に保護膜14を被覆して成るセンサ基
板を切断する場合、例えば個別電極11のパターニング
時に同時に形成された切断マーク線15にセンサ基板上
方から切断刃16を合せ、前記切断マーク線15に沿っ
て切断することにより、センサ基板の端部受光素子10
aから所望の距離(画素ピッチの1/2)の位置で切断
することができる。
Conventionally, as shown in FIG. 4, an individual electrode 11 made of a metal film discretely formed on an insulating substrate 1 and a photoelectric conversion layer 1 made of a semiconductor film striped in the left-right direction in the drawing.
2. When a band-shaped common electrode 13 made of a transparent conductive film is sequentially laminated to form a light-receiving element array in which a large number of light-receiving elements 10 are arranged in a row, and a sensor substrate formed by coating a protective film 14 is cut off. For example, by aligning the cutting blade 16 from above the sensor substrate with the cutting mark line 15 formed at the same time as the patterning of the individual electrode 11 and cutting along the cutting mark line 15, the edge light receiving element 10 of the sensor substrate is obtained.
It can be cut at a desired distance (1/2 of the pixel pitch) from a.

【0004】[0004]

【発明が解決しようとする課題】近年、カラーの画像を
読み取り可能なイメージセンサの開発にともない、例え
ば図5に示すように、赤色,緑色又は青色のフィルタ2
1を透明基板2上に形成し、フィルタ21が各受光素子
10上に対応するように前記透明基板2を絶縁基板1上
に接着剤17を介して配置した構造のカラーイメージセ
ンサが提案されている。しかしながら、上記構造のカラ
ーイメージセンサ基板の端部を上記従来方法で切断しよ
うとすると、切断が必要な厚みが透明基板2のぶんだけ
厚くなるので、切断刃の受ける応力が増加し、図5のよ
うに切断面が傾いてしまう場合がある。その結果、絶縁
基板1の最下面が受光素子アレイの端面より長くなった
り、透明基板2の最上面が受光アレイの端面より長くな
ったりして切断精度が低下するという問題点があった。
Recently, with the development of an image sensor capable of reading a color image, for example, as shown in FIG. 5, a red, green or blue filter 2 is provided.
A color image sensor having a structure in which 1 is formed on a transparent substrate 2 and the transparent substrate 2 is arranged on an insulating substrate 1 via an adhesive 17 so that the filter 21 corresponds to each light receiving element 10 is proposed. There is. However, if the end portion of the color image sensor substrate having the above structure is to be cut by the above-mentioned conventional method, the thickness required to be cut is increased by the thickness of the transparent substrate 2, so that the stress applied to the cutting blade is increased, and as shown in FIG. The cut surface may tilt like this. As a result, the lowermost surface of the insulating substrate 1 becomes longer than the end surface of the light receiving element array, and the uppermost surface of the transparent substrate 2 becomes longer than the end surface of the light receiving array.

【0005】このようなカラーイメージセンサ基板同士
をセンサ支持基板3上で接着剤18を介して連結接続す
る場合、図6に示すように、接続部分における画素ピッ
チが変動し、連結部分においての接続精度が悪化して受
光素子アレイ中の画素ピッチと均一な画素ピッチが得ら
れない。特に、カラーイメージセンサにおいては一般に
受光素子が高密度であるので、より高精度の切断精度が
要求されていた。
When such color image sensor substrates are connected and connected to each other on the sensor support substrate 3 with the adhesive 18, as shown in FIG. 6, the pixel pitch in the connection portion changes and the connection in the connection portion is changed. The accuracy deteriorates and the pixel pitch in the light receiving element array cannot be uniform. Particularly, in a color image sensor, since the light receiving elements are generally high in density, higher cutting accuracy has been required.

【0006】本発明は上記実情に鑑みてなされたもの
で、多数の受光素子をライン状に形成した絶縁基板上に
透光性基板を配置して成るイメージセンサ基板の基板端
部の切断に際し、切断精度の向上を図ることができる切
断方法を提供することを目的としている。
The present invention has been made in view of the above circumstances, and when cutting a substrate end portion of an image sensor substrate formed by arranging a transparent substrate on an insulating substrate having a large number of light receiving elements formed in a line, An object of the present invention is to provide a cutting method capable of improving the cutting accuracy.

【0007】[0007]

【課題を解決するための手段】上記従来例の問題点を解
決するため本発明方法は、多数の受光素子をライン状に
形成した絶縁基板上に透光性基板を配置して成るイメー
ジセンサ基板の基板端部の切断方法において、前記透光
性基板の上方側又は前記絶縁基板の下方側に第1の切断
刃により溝部を形成する溝部形成工程と、前記第1の切
断刃より刃幅の狭い第2の切断刃により前記溝部に沿っ
て透光性基板及び絶縁基板を切断する基板切断工程と、
を具備することを特徴としている。
In order to solve the above-mentioned problems of the conventional example, the method of the present invention is an image sensor substrate in which a light-transmissive substrate is arranged on an insulating substrate having a large number of light receiving elements formed in a line. In the method of cutting a substrate end part, a groove portion forming step of forming a groove portion with a first cutting blade on the upper side of the translucent substrate or the lower side of the insulating substrate; A substrate cutting step of cutting the translucent substrate and the insulating substrate along the groove with a narrow second cutting blade;
It is characterized by having.

【0008】[0008]

【作用】本発明方法によれば、溝部形成工程により透光
性基板の上方側又は前記絶縁基板の下方側に第1の切断
刃により溝部を形成し、前記第1の切断刃より刃幅の狭
い第2の切断刃により前記溝部の底面から透光性基板及
び絶縁基板を切断するので、第1の切断刃及び第2の切
断刃による切断厚を、切断刃が受ける応力により切断面
が傾かない程度にすることができ、切断精度の向上を図
ることができる。
According to the method of the present invention, the groove is formed by the first cutting blade on the upper side of the translucent substrate or the lower side of the insulating substrate in the groove forming step, and the width of the blade is narrower than that of the first cutting blade. Since the translucent substrate and the insulating substrate are cut from the bottom surface of the groove by the narrow second cutting blade, the cutting thickness of the first cutting blade and the second cutting blade is inclined by the stress received by the cutting blade. The cutting accuracy can be improved.

【0009】[0009]

【実施例】本発明方法の一実施例について図1(a)な
いし(c)を参照しながら説明する。カラーイメージセ
ンサは、離散的に形成された個別電極,光電変換層,共
通電極を積層して構成される受光素子10をガラスから
成る絶縁基板1上に形成したセンサ基板と、赤色,緑色
又は青色のフィルタ21が形成された透明基板2とを、
各フィルタ21が各受光素子10上に対応するように接
着剤30を介在させて配置して構成されている。従来例
を示す図4と構成が同一の部分は同一符号を付してい
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the method of the present invention will be described with reference to FIGS. The color image sensor includes a sensor substrate in which a light receiving element 10 formed by laminating discrete electrodes, a photoelectric conversion layer, and a common electrode that are discretely formed is formed on an insulating substrate 1 made of glass, and a red, green, or blue color. And the transparent substrate 2 on which the filter 21 of
Each filter 21 is arranged so as to correspond to each light receiving element 10 with an adhesive 30 interposed therebetween. The same parts as those in FIG. 4 showing the conventional example are designated by the same reference numerals.

【0010】そして、カラーイメージセンサの透明基板
2の反フィルター21形成側より、ダイシングブレード
(切断刃)31を用いて、絶縁基板1端部の受光素子1
0aの直上にかかる位置まで透明基板2の長尺方向と直
交する方向に溝部40を形成する。次に、カラーイメー
ジセンサが載置されたステージ(図示せず)を5〜10
度傾け、ダイシングブレード31より刃幅の薄いダイシ
ングブレード32により前記溝部40の底部から、受光
素子10を構成する個別電極のパターニング時に同時に
形成された切断マーク線15に沿って切断先端面が内側
に傾斜するように透明基板2の残り部分及び絶縁基板1
を切断する。この切断により、受光素子10が形成され
た面側は、端部受光素子10aから所望の距離(画素間
距離の1/2)の位置で切断することができる。また、
絶縁基板1の下面側は、受光素子10が形成された面の
長さより短くすることができる。上記切断方法では、透
明基板2側に溝部40を形成したが、図1における絶縁
基板1の裏面側に溝部を設けてから切断してもよい。
Then, a dicing blade (cutting blade) 31 is used from the side opposite to the filter 21 forming side of the transparent substrate 2 of the color image sensor, and the light receiving element 1 at the end of the insulating substrate 1 is used.
The groove 40 is formed in a direction orthogonal to the lengthwise direction of the transparent substrate 2 up to a position directly above 0a. Next, the stage (not shown) on which the color image sensor is mounted is replaced by 5 to 10
The dicing blade 32, which has a smaller blade width than the dicing blade 31, tilts inward from the bottom of the groove 40 along the cutting mark line 15 formed at the same time when the individual electrodes constituting the light receiving element 10 are patterned. The remaining portion of the transparent substrate 2 and the insulating substrate 1 are inclined.
Disconnect. By this cutting, the surface side on which the light receiving element 10 is formed can be cut at a position at a desired distance (1/2 of the distance between pixels) from the end light receiving element 10a. Also,
The lower surface side of the insulating substrate 1 can be made shorter than the length of the surface on which the light receiving element 10 is formed. In the above cutting method, the groove 40 is formed on the transparent substrate 2 side, but the groove may be provided on the back surface side of the insulating substrate 1 in FIG. 1 and then cut.

【0011】上記方法によれば、ダイシングブレード3
1による切断に際しての切断厚は、透明基板2の厚さよ
り薄いものであり、また、ダイシングブレード32によ
る切断厚は、絶縁基板1の厚さに透明基板2の厚さから
溝部40の深さ分を差し引いたものであるので、ダイシ
ングブレード31,32が切断の際に受ける応力を従来
に比較して少なくすることができ、所望の切断面から傾
くことなく切断可能となり切断精度の向上を図ることが
できる。
According to the above method, the dicing blade 3
The cutting thickness at the time of cutting by 1 is thinner than the thickness of the transparent substrate 2, and the cutting thickness by the dicing blade 32 is the thickness of the insulating substrate 1 from the thickness of the transparent substrate 2 to the depth of the groove portion 40. Therefore, the stress applied to the dicing blades 31 and 32 at the time of cutting can be reduced as compared with the conventional method, and the dicing blades 31 and 32 can be cut without inclining from a desired cutting surface to improve the cutting accuracy. You can

【0012】次に、以上の工程で切断した複数のカラー
イメージセンサを連結接続する仕方を説明する。センサ
支持基板3上に接着剤50を塗布し、各カラーイメージ
センサをその切断面同士が対峙するように配置するとと
もに、カラーイメージセンサ同士の切断面間のくさび形
空間60にも前記接着剤50を充填する。従って、カラ
ーイメージセンサ同士間にくさび形空間60を存しさせ
たので、カラーイメージセンサの切断部分にバリ等が生
じても、バリの影響を受けず接続精度の低下を防止する
ことができる。
Next, a method of connecting and connecting a plurality of color image sensors cut in the above steps will be described. The adhesive 50 is applied on the sensor support substrate 3, the color image sensors are arranged so that their cut surfaces face each other, and the adhesive 50 is also applied to the wedge-shaped space 60 between the cut surfaces of the color image sensors. To fill. Therefore, since the wedge-shaped space 60 is provided between the color image sensors, even if burrs or the like occur at the cut portions of the color image sensors, the influence of the burrs is not affected and the deterioration of the connection accuracy can be prevented.

【0013】また、カラーイメージセンサ同士の各溝部
40間に形成される凹部61及び透明基板2上にも接着
剤50を充填及び塗布し、連結接続されたカラーイメー
ジセンサ上に透明部材4を配置する。この透明部材4を
配置したことにより、接続部分での接着剤50を平坦化
させる。すなわち、透明部材4がない場合、図3に示す
ように、接続部分に接着剤50のはみ出しが生じ、この
はみ出し部分により入射光が乱反射し、接続部近傍での
受光素子の感度にバラツキを生じさせる。本実施例で
は、接続部分での接着剤50のはみ出しを平坦化させる
ことにより、前記感度のバラツキを防止することができ
る。前記くさび形空間60及び凹部61に充填される接
着剤50、透明基板2上に配置する透明部材4は、それ
ぞれ絶縁基板1及び透明基板2と略同じ屈折率を有する
樹脂やガラス板を使用することにより、この部分を透過
する光が大きく屈折することを防止して接続部近傍での
受光素子の感度のバラツキが生じないようにしている。
くさび形空間60に充填される接着剤も絶縁基板1の屈
折率と同じにしたのは、受光素子10間を透過して絶縁
基板1の下面で反射するフレア光を各受光素子10に均
等に入射させて感度のバラツキを防止するためである。
Further, the adhesive 50 is filled and applied also on the recesses 61 formed between the respective groove portions 40 of the color image sensors and on the transparent substrate 2, and the transparent member 4 is arranged on the color image sensors connected and connected. To do. By disposing the transparent member 4, the adhesive 50 at the connecting portion is flattened. That is, in the case where the transparent member 4 is not provided, as shown in FIG. 3, the adhesive 50 squeezes out at the connecting portion, and incident light is diffusely reflected by the protruding portion, resulting in variations in the sensitivity of the light receiving element in the vicinity of the connecting portion. Let In this embodiment, the unevenness of the sensitivity can be prevented by flattening the protrusion of the adhesive 50 at the connection portion. As the adhesive 50 filled in the wedge-shaped space 60 and the recess 61, and the transparent member 4 arranged on the transparent substrate 2, a resin or glass plate having substantially the same refractive index as the insulating substrate 1 and the transparent substrate 2 is used. As a result, the light transmitted through this portion is prevented from being greatly refracted so that variations in the sensitivity of the light receiving element in the vicinity of the connection portion do not occur.
The adhesive that fills the wedge-shaped space 60 has the same refractive index as that of the insulating substrate 1 because the flare light transmitted between the light receiving elements 10 and reflected by the lower surface of the insulating substrate 1 is evenly distributed to each light receiving element 10. This is to prevent variations in sensitivity by making the light incident.

【0014】上記実施例ではカラーフィルタ21が形成
された透明基板2を絶縁基板1上に載置することによ
り、センサ基板の厚さが増加した場合の切断方法につい
て説明したが、カラーフィルタの他に、赤外線遮断や紫
外線遮断のためのフィルタを設けた保護基板を載置した
場合に適用することができる。
In the above embodiment, the method of cutting when the thickness of the sensor substrate is increased by placing the transparent substrate 2 on which the color filter 21 is formed on the insulating substrate 1 has been described. It can be applied to the case where a protective substrate provided with a filter for blocking infrared rays or ultraviolet rays is mounted on the.

【0015】[0015]

【発明の効果】本発明方法によれば、溝部形成工程によ
り透光性基板の上方側又は前記絶縁基板の下方側に第1
の切断刃により溝部を形成し、前記第1の切断刃より刃
幅の狭い第2の切断刃により前記溝部の底面から透光性
基板及び絶縁基板を切断するので、第1の切断刃及び第
2の切断刃による切断厚を、切断刃が受ける応力により
切断面が傾かない程度にすることができるので、基板の
切断に際して所望の切断面から傾くことを防いで切断精
度の向上を図ることができる。
According to the method of the present invention, the first groove is formed on the upper side of the transparent substrate or the lower side of the insulating substrate by the groove forming step.
The groove portion is formed by the first cutting blade and the second cutting blade having a narrower blade width than the first cutting blade cuts the transparent substrate and the insulating substrate from the bottom surface of the groove portion. Since the cutting thickness of the second cutting blade can be set so that the cutting surface does not tilt due to the stress received by the cutting blade, it is possible to prevent the cutting surface from tilting from a desired cutting surface and improve the cutting accuracy. it can.

【図面の簡単な説明】[Brief description of drawings]

【図1】 (a)ないし(c)は本発明方法の一実施例
を示すプロセスの説明図である。
1 (a) to 1 (c) are explanatory views of a process showing an embodiment of the method of the present invention.

【図2】 本実施例で切断したカラーイメージセンサの
連結接続状態を示す断面説明図である。
FIG. 2 is an explanatory cross-sectional view showing a connected connection state of the color image sensor cut in this embodiment.

【図3】 図2において透明部材を設置しない場合の連
結接続状態を示す断面説明図である。
FIG. 3 is a cross-sectional explanatory view showing a connected state when a transparent member is not installed in FIG.

【図4】 従来のセンサ基板の切断方法を説明する断面
説明図である。
FIG. 4 is a cross-sectional explanatory diagram illustrating a conventional method for cutting a sensor substrate.

【図5】 図4の方法による切断状態を示す断面説明図
である。
5 is a cross-sectional explanatory view showing a cut state by the method of FIG.

【図6】 従来のカラーイメージセンサの連結接続状態
を示す断面説明図である。
FIG. 6 is an explanatory cross-sectional view showing a connected state of a conventional color image sensor.

【符号の説明】[Explanation of symbols]

1…絶縁基板、 2…透明基板、 3…センサ支持基
板、 4…透明部材、10…受光素子、 21…フィル
タ、 31…ダイシングブレード(第1の切断刃)、
32…ダイシングブレード(第2の切断刃)、 40…
溝部、 50…接着剤 60…くさび形空間、 61…
凹部
DESCRIPTION OF SYMBOLS 1 ... Insulating substrate, 2 ... Transparent substrate, 3 ... Sensor support substrate, 4 ... Transparent member, 10 ... Light receiving element, 21 ... Filter, 31 ... Dicing blade (first cutting blade),
32 ... Dicing blade (second cutting blade), 40 ...
Groove, 50 ... Adhesive 60 ... Wedge-shaped space, 61 ...
Recess

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 多数の受光素子をライン状に形成した絶
縁基板上に透光性基板を配置して成るイメージセンサ基
板の基板端部の切断方法において、前記透光性基板の上
方側又は前記絶縁基板の下方側に第1の切断刃により溝
部を形成する溝部形成工程と、前記第1の切断刃より刃
幅の狭い第2の切断刃により前記溝部に沿って透光性基
板及び絶縁基板を切断する基板切断工程と、を具備する
イメージセンサ基板の基板端部の切断方法。
1. A method of cutting a substrate end portion of an image sensor substrate, comprising a transparent substrate arranged on an insulating substrate having a large number of light-receiving elements formed in a line, wherein the upper side of the transparent substrate or the transparent substrate is cut off. A groove forming step of forming a groove on the lower side of the insulating substrate by a first cutting blade, and a translucent substrate and an insulating substrate along the groove by a second cutting blade having a blade width narrower than that of the first cutting blade. And a substrate cutting step of cutting the substrate.
JP3229675A 1991-08-16 1991-08-16 Method for cutting substrate end sections of image sensor substrate Pending JPH0548062A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3229675A JPH0548062A (en) 1991-08-16 1991-08-16 Method for cutting substrate end sections of image sensor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3229675A JPH0548062A (en) 1991-08-16 1991-08-16 Method for cutting substrate end sections of image sensor substrate

Publications (1)

Publication Number Publication Date
JPH0548062A true JPH0548062A (en) 1993-02-26

Family

ID=16895927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3229675A Pending JPH0548062A (en) 1991-08-16 1991-08-16 Method for cutting substrate end sections of image sensor substrate

Country Status (1)

Country Link
JP (1) JPH0548062A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH104664A (en) * 1997-03-13 1998-01-06 Denso Corp Ac generator
JP2005026314A (en) * 2003-06-30 2005-01-27 Sanyo Electric Co Ltd Method of manufacturing solid-state imaging device
CN110877893A (en) * 2018-09-06 2020-03-13 三菱电机株式会社 Method for manufacturing physical quantity detection sensor, and physical quantity detection sensor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH104664A (en) * 1997-03-13 1998-01-06 Denso Corp Ac generator
JP2005026314A (en) * 2003-06-30 2005-01-27 Sanyo Electric Co Ltd Method of manufacturing solid-state imaging device
CN110877893A (en) * 2018-09-06 2020-03-13 三菱电机株式会社 Method for manufacturing physical quantity detection sensor, and physical quantity detection sensor
CN110877893B (en) * 2018-09-06 2024-01-09 三菱电机株式会社 Method for manufacturing physical quantity detection sensor, and physical quantity detection sensor

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