JPH0547920B2 - - Google Patents

Info

Publication number
JPH0547920B2
JPH0547920B2 JP22776082A JP22776082A JPH0547920B2 JP H0547920 B2 JPH0547920 B2 JP H0547920B2 JP 22776082 A JP22776082 A JP 22776082A JP 22776082 A JP22776082 A JP 22776082A JP H0547920 B2 JPH0547920 B2 JP H0547920B2
Authority
JP
Japan
Prior art keywords
data
memory cell
output
nonvolatile semiconductor
reading
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP22776082A
Other languages
Japanese (ja)
Other versions
JPS59121696A (en
Inventor
Hideki Sumihara
Hiroshi Iwahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57227760A priority Critical patent/JPS59121696A/en
Publication of JPS59121696A publication Critical patent/JPS59121696A/en
Publication of JPH0547920B2 publication Critical patent/JPH0547920B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C17/00Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards

Landscapes

  • Read Only Memory (AREA)
  • Non-Volatile Memory (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔発明の技術分野〕 本発明は1メモリセルに複数ビツト分のデータ
を有する不揮発性メモリセルに関する。 〔発明の技術的背景とその問題点〕 従来、半導体メモリ特にROM(Read Only
Memory)においては、例えばメモリセルのしき
い値電圧を4種に区別することにより、1セルに
2ビツト分のデータを記憶する方式のものが提案
されている、これは、1セルに2ビツト分のデー
タを記憶することにより、セルの占有面積を半分
にできるという利点がある。2ビツト分のデータ
は“0”,“0”;“1”,“0”;“0”,“1”;
“1”,
“1”の4つの組み合わせがあるが、これをその
しきい値電圧に対応させ、そのメモリセルが選択
された時のデータ線の電位により、4つのデータ
のどれかを区別し、2ビツト分のデータを読み出
すものである。 しかしながら従来、メモリセルのしきい値コン
トロールは、ゲート電圧やドレイン電圧を変える
ことによりなされていた。このためこの方法で
は、セルのゲート長のばらつきとか酸化膜の膜厚
のばらつきなどから、しきい値電圧をコントロー
ルすることが難しく、同一の電圧条件で書き込み
を行なつても、しきい値電圧は同一にはならずに
ばらついてしまい、歩留低下の原因となるもので
ある。 〔発明の目的〕 本発明は上記実情に鑑みてなされたもので、1
つのメモリーセルのしきい値に重みをつけ、複数
ビツト分のデータを記憶する不揮発性メモリにお
いて、メモリーセルのしきい値のコントロールを
容易にできる不揮発性半導体メモリを提供しよう
とするものである。 〔発明の概要〕 本発明は上記目的を達成するために、1メモリ
セルの設定すべきしきい値電圧の大きさに応じて
入力データを設定し、書き込まれたしきい値電圧
に応じた複数ビツトの出力をフイードバツクし
て、出力の複数ビツトと入力データの複数ビツト
が互に一致するまでメモリセルのしきい値を変化
させるようにしたものである。 〔発明の実施例〕 以下図面を参照して本発明の一実施例を説明す
る。第1図において1は書き込み入力データ
Din0,Din1が供給されるアンド回路、2はトラ
ンジスタ3を制御して高電圧Vp(約20V)をa点
に供給するノア回路、4はフリツプフロツプ、5
はインバータ、6はナンド回路、7,8は前記入
力データと後述の出力データを比較する比較器、
9はカラム選択用トランジスタ、10は書き込み
により電子が注入されしきい値電圧が変わるメモ
リセル、11,12はメモリセル10のドレイン
電圧を下げてデータ読み出し時の誤書き込みを防
止するトランジスタ、13は負荷用トランジス
タ、14〜16は基準電圧C1〜C3(C1>C2>C3
とトランジスタ12を介したa点電圧を入力とす
るセンスアンプ、17はセンスアンプ出力D1
D2を入力としこれをもとに作成した出力Dout0,
Dout1を導出する変換回路で、出力Dout0と
Dout1は比較器7と8にフイードバツクされてい
る。 第1図において一点鎖線で囲われた部分18
は、メモリセルのしきい値電圧によつて変化する
b点の電位をC1,C2,C3なる3つの基準電圧レ
ベルと比較することにより、下記の第1表のよう
な2ビツトの出力Dout0,Dout1の4種の組み合
わせの1つを出す回路である。
[Technical Field of the Invention] The present invention relates to a nonvolatile memory cell having data for a plurality of bits in one memory cell. [Technical background of the invention and its problems] Conventionally, semiconductor memory, especially ROM (Read Only
For example, a method has been proposed for storing 2 bits of data in one cell by differentiating the threshold voltage of the memory cell into four types. There is an advantage that the area occupied by the cell can be halved by storing data for 20 minutes. The data for 2 bits is “0”, “0”; “1”, “0”; “0”, “1”;
“1”,
There are four combinations of "1", and this is made to correspond to its threshold voltage, and one of the four data is distinguished depending on the potential of the data line when that memory cell is selected, and 2 bits of data are The data is read out. However, conventionally, the threshold voltage of a memory cell has been controlled by changing the gate voltage or drain voltage. Therefore, with this method, it is difficult to control the threshold voltage due to variations in cell gate length and oxide film thickness, and even if writing is performed under the same voltage conditions, the threshold voltage are not the same but vary, which causes a decrease in yield. [Object of the invention] The present invention has been made in view of the above circumstances, and has the following features:
An object of the present invention is to provide a nonvolatile semiconductor memory which weights the threshold values of one memory cell and stores data of a plurality of bits, in which the threshold values of the memory cells can be easily controlled. [Summary of the Invention] In order to achieve the above object, the present invention sets input data according to the magnitude of the threshold voltage to be set for one memory cell, and sets input data according to the magnitude of the threshold voltage to be set for one memory cell. The bit output is fed back to change the threshold value of the memory cell until a plurality of output bits and a plurality of input data bits match each other. [Embodiment of the Invention] An embodiment of the present invention will be described below with reference to the drawings. In Figure 1, 1 is write input data
An AND circuit to which Din0 and Din1 are supplied; 2 is a NOR circuit that controls transistor 3 and supplies high voltage Vp (approximately 20 V) to point a; 4 is a flip-flop; 5
is an inverter, 6 is a NAND circuit, 7 and 8 are comparators that compare the input data and output data, which will be described later.
9 is a column selection transistor; 10 is a memory cell in which electrons are injected by writing and the threshold voltage changes; 11 and 12 are transistors that lower the drain voltage of the memory cell 10 to prevent erroneous writing when reading data; Load transistors, 14 to 16 are reference voltages C 1 to C 3 (C 1 > C 2 > C 3 )
and a sense amplifier which inputs the voltage at point A via the transistor 12, and 17 is the sense amplifier output D 1 ~
Output Dout0 created based on D 2 as input,
This is a conversion circuit that derives Dout1, and the output Dout0 and
Dout1 is fed back to comparators 7 and 8. The part 18 surrounded by the dashed-dotted line in Fig. 1
By comparing the potential at point b, which changes depending on the threshold voltage of the memory cell, with three reference voltage levels, C 1 , C 2 , and C 3 , the 2-bit data as shown in Table 1 below is obtained. This is a circuit that outputs one of four combinations of outputs Dout0 and Dout1.

〔発明の効果〕〔Effect of the invention〕

以上説明した如く本発明によれば、1つのメモ
リセルのしきい値に重みをつけ、複数ビツト分の
データを記憶してメモリセルの占有面積を縮小化
する不揮発性メモリにおいて、書き込み信号と読
み出し信号により、メモリセルへの書き込み量を
順次読み出してモニタし、複数種のしきい値のう
ちのどれか1つに制御性よく設定できるため、歩
留が向上した不揮発性半導体メモリが提供できる
ものである。
As explained above, according to the present invention, in a nonvolatile memory that weights the threshold value of one memory cell and stores data for multiple bits to reduce the area occupied by the memory cell, write signals and read signals can be A nonvolatile semiconductor memory with improved yield can be provided because the amount of data written to memory cells can be sequentially read and monitored using signals, and one of multiple threshold values can be set with good controllability. It is.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の構成図、第2図は
同構成の動作を示すタイミングチヤートである。 1,6……アンド回路、2……ノア回路、3,
9〜13……トランジスタ、4……フリツプフロ
ツプ、6……ナンド回路、7,8……比較器、1
4〜16……センスアンプ、17……変換回路。
FIG. 1 is a configuration diagram of an embodiment of the present invention, and FIG. 2 is a timing chart showing the operation of the same configuration. 1, 6...AND circuit, 2...NOR circuit, 3,
9-13...Transistor, 4...Flip-flop, 6...NAND circuit, 7, 8...Comparator, 1
4 to 16...Sense amplifier, 17...Conversion circuit.

Claims (1)

【特許請求の範囲】 1 不揮発性半導体メモリセルと、このメモリセ
ルにデータを書き込む手段と、前記メモリセルに
記憶されているデータを読み出す手段と、前記メ
モリセルのしきい値電圧を、前記読み出されたデ
ータにより生じる、前記メモリセルと負荷素子と
の接続点の電圧から検知し、また各基準電圧レベ
ルと比較して論理出力を得るデータ書き込みとデ
ータ読み出しに兼用する複数のセンスアンプと、
このセンスアンプの論理出力をもとに、そのとき
の前記メモリセルのしきい値電圧に相当する論理
出力を送出する変換回路と、この変換回路の出力
が、複数種設定すべき入力データのそれぞれ対応
したものに該当するまで、前記データの書き込み
と前記データの読み出しを繰り返す論理回路とを
具備したことを特徴とする不揮発性半導体メモ
リ。 2 前記不揮発性半導体メモリセルは、電子の注
入に応じてしきい値電圧が決められるものである
特許請求の範囲第1項に記載の不揮発性半導体メ
モリ。
[Scope of Claims] 1. A nonvolatile semiconductor memory cell, means for writing data into the memory cell, means for reading data stored in the memory cell, and a means for reading data stored in the memory cell; a plurality of sense amplifiers that are used for both data writing and data reading, detecting the voltage at the connection point between the memory cell and the load element caused by the output data, and comparing it with each reference voltage level to obtain a logical output;
Based on the logic output of this sense amplifier, there is a conversion circuit that sends out a logic output corresponding to the threshold voltage of the memory cell at that time, and the output of this conversion circuit is the input data to be set for multiple types. A nonvolatile semiconductor memory comprising: a logic circuit that repeats writing of the data and reading of the data until the data corresponds to the corresponding one. 2. The nonvolatile semiconductor memory according to claim 1, wherein the nonvolatile semiconductor memory cell has a threshold voltage determined according to injection of electrons.
JP57227760A 1982-12-28 1982-12-28 Non-volatile semiconductor memory Granted JPS59121696A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57227760A JPS59121696A (en) 1982-12-28 1982-12-28 Non-volatile semiconductor memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57227760A JPS59121696A (en) 1982-12-28 1982-12-28 Non-volatile semiconductor memory

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP14416892A Division JP2502008B2 (en) 1992-06-04 1992-06-04 Non-volatile semiconductor memory

Publications (2)

Publication Number Publication Date
JPS59121696A JPS59121696A (en) 1984-07-13
JPH0547920B2 true JPH0547920B2 (en) 1993-07-20

Family

ID=16865941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57227760A Granted JPS59121696A (en) 1982-12-28 1982-12-28 Non-volatile semiconductor memory

Country Status (1)

Country Link
JP (1) JPS59121696A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61165892A (en) * 1985-01-17 1986-07-26 Matsushita Electric Ind Co Ltd Writing circuit of nonvolatile memory
DE69033262T2 (en) 1989-04-13 2000-02-24 Sandisk Corp., Santa Clara EEPROM card with replacement of faulty memory cells and buffer
US7190617B1 (en) 1989-04-13 2007-03-13 Sandisk Corporation Flash EEprom system
KR100473308B1 (en) 1995-01-31 2005-03-14 가부시끼가이샤 히다치 세이사꾸쇼 Nonvolatile memory device
US6320785B1 (en) 1996-07-10 2001-11-20 Hitachi, Ltd. Nonvolatile semiconductor memory device and data writing method therefor
JP3062730B2 (en) 1996-07-10 2000-07-12 株式会社日立製作所 Nonvolatile semiconductor memory device and writing method
JP3629144B2 (en) * 1998-06-01 2005-03-16 株式会社東芝 Nonvolatile semiconductor memory device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5146841A (en) * 1974-10-21 1976-04-21 Tokyo Shibaura Electric Co
JPS54161853A (en) * 1978-06-12 1979-12-21 Seiko Epson Corp Read-only memory

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5146841A (en) * 1974-10-21 1976-04-21 Tokyo Shibaura Electric Co
JPS54161853A (en) * 1978-06-12 1979-12-21 Seiko Epson Corp Read-only memory

Also Published As

Publication number Publication date
JPS59121696A (en) 1984-07-13

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