JPH0542613Y2 - - Google Patents

Info

Publication number
JPH0542613Y2
JPH0542613Y2 JP11453188U JP11453188U JPH0542613Y2 JP H0542613 Y2 JPH0542613 Y2 JP H0542613Y2 JP 11453188 U JP11453188 U JP 11453188U JP 11453188 U JP11453188 U JP 11453188U JP H0542613 Y2 JPH0542613 Y2 JP H0542613Y2
Authority
JP
Japan
Prior art keywords
nozzle
inductively coupled
coupled plasma
frequency inductively
mass spectrometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11453188U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0319248U (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11453188U priority Critical patent/JPH0542613Y2/ja
Publication of JPH0319248U publication Critical patent/JPH0319248U/ja
Application granted granted Critical
Publication of JPH0542613Y2 publication Critical patent/JPH0542613Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Electron Tubes For Measurement (AREA)
JP11453188U 1988-08-31 1988-08-31 Expired - Lifetime JPH0542613Y2 (enrdf_load_html_response)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11453188U JPH0542613Y2 (enrdf_load_html_response) 1988-08-31 1988-08-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11453188U JPH0542613Y2 (enrdf_load_html_response) 1988-08-31 1988-08-31

Publications (2)

Publication Number Publication Date
JPH0319248U JPH0319248U (enrdf_load_html_response) 1991-02-26
JPH0542613Y2 true JPH0542613Y2 (enrdf_load_html_response) 1993-10-27

Family

ID=31662892

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11453188U Expired - Lifetime JPH0542613Y2 (enrdf_load_html_response) 1988-08-31 1988-08-31

Country Status (1)

Country Link
JP (1) JPH0542613Y2 (enrdf_load_html_response)

Also Published As

Publication number Publication date
JPH0319248U (enrdf_load_html_response) 1991-02-26

Similar Documents

Publication Publication Date Title
Jin et al. A microwave plasma torch assembly for atomic emission spectrometry
Beenakker et al. An assessment of a microwave-induced plasma generated in argon with a cylindrical TM010 cavity as an excitation source for emission spectrometric analysis of solutions
Kniseley et al. Application of inductively-coupled plasma excitation sources to the determination of trace metals in microliter volumes of biological fluids
JP2017188476A (ja) 耐酸化性誘導装置
JP5427178B2 (ja) 水素炎イオン化検出器
Genna et al. Modified inductively coupled plasma arrangement for easy ignition and low gas consumption
US4794230A (en) Low-pressure water-cooled inductively coupled plasma torch
JPH0542613Y2 (enrdf_load_html_response)
Al Hejami et al. A total consumption (up to 75 μL min− 1) infrared-heated sample introduction system for inductively coupled plasma optical emission spectrometry
EP2984908B1 (en) Capacitively coupled devices
Zheng et al. Analytical characterization of a solution cathode glow discharge with an interference filter wheel for spectral discrimination
Nickel et al. A new electrothermal vaporization device for direct sampling of ceramic powders for inductively coupled plasma optical emission spectrometry
Brown et al. Moderate-power argon microwave-induced plasma for the detection of metal ions in aqueous samples of complex matrix
JPH0542611Y2 (enrdf_load_html_response)
JP2005251546A (ja) 高融点マトリックスサンプル用icp−msプラズマインターフェース
TWI865755B (zh) 氣體分析裝置、其控制方法及含有其之製程監控裝置
JP2836190B2 (ja) 高周波誘導結合プラズマ分析装置
Gordon et al. Use of a water-cooled low-flow torch in inductively coupled plasma mass spectrometry
Duan et al. Electrothermal vaporization for sample introduction in microwave-induced plasma atomic absorption spectrometry
JPH07161335A (ja) プラズマイオン質量分析装置
JPH08287865A (ja) 高周波誘導結合プラズマ質量分析計
JPH08115702A (ja) 高周波誘導結合プラズマ質量分析装置用ノズル及びスキマー
Kitagawa et al. A heated-electrode discharge lamp for trace analysis by atomic emission spectroscopy
JPH0638371Y2 (ja) 試料導入装置
JPH0320952A (ja) 誘導結合プラズマ質量分析方法