JPH0534800B2 - - Google Patents
Info
- Publication number
- JPH0534800B2 JPH0534800B2 JP58028196A JP2819683A JPH0534800B2 JP H0534800 B2 JPH0534800 B2 JP H0534800B2 JP 58028196 A JP58028196 A JP 58028196A JP 2819683 A JP2819683 A JP 2819683A JP H0534800 B2 JPH0534800 B2 JP H0534800B2
- Authority
- JP
- Japan
- Prior art keywords
- output
- circuit
- voltage
- oscillator
- power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Plasma Technology (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58028196A JPS59154800A (ja) | 1983-02-22 | 1983-02-22 | プラズマ発生用高周波発振器 |
| US06/580,853 US4577165A (en) | 1983-02-22 | 1984-02-16 | High-frequency oscillator with power amplifier and automatic power control |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58028196A JPS59154800A (ja) | 1983-02-22 | 1983-02-22 | プラズマ発生用高周波発振器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59154800A JPS59154800A (ja) | 1984-09-03 |
| JPH0534800B2 true JPH0534800B2 (enExample) | 1993-05-24 |
Family
ID=12241915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58028196A Granted JPS59154800A (ja) | 1983-02-22 | 1983-02-22 | プラズマ発生用高周波発振器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59154800A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0235722A (ja) * | 1988-07-26 | 1990-02-06 | Matsushita Electric Ind Co Ltd | 反応性イオンエッチング装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6011109B2 (ja) * | 1980-12-11 | 1985-03-23 | 株式会社東芝 | ドライエツチング方法及び装置 |
| JPS5864030A (ja) * | 1981-10-13 | 1983-04-16 | Nec Kyushu Ltd | プラズマエツチング装置 |
| JPS58163435A (ja) * | 1982-03-25 | 1983-09-28 | Semiconductor Energy Lab Co Ltd | プラズマ反応用装置 |
-
1983
- 1983-02-22 JP JP58028196A patent/JPS59154800A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59154800A (ja) | 1984-09-03 |
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