JPH05335747A - Ceramic multilayer board - Google Patents

Ceramic multilayer board

Info

Publication number
JPH05335747A
JPH05335747A JP4135284A JP13528492A JPH05335747A JP H05335747 A JPH05335747 A JP H05335747A JP 4135284 A JP4135284 A JP 4135284A JP 13528492 A JP13528492 A JP 13528492A JP H05335747 A JPH05335747 A JP H05335747A
Authority
JP
Japan
Prior art keywords
vias
ceramic multilayer
multilayer board
flip
solder bumps
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4135284A
Other languages
Japanese (ja)
Inventor
Norio Fujiwara
規夫 藤原
Tsuneharu Katada
恒春 片田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP4135284A priority Critical patent/JPH05335747A/en
Publication of JPH05335747A publication Critical patent/JPH05335747A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To simplify management of reflow processes for solder bumps by means of a ceramic multilayer board on which semiconductor elements that can be used for every electronic equipment such as a computer, a video and a TV, or the like, are mounted in the manner of a flip-chip, and to obtain a ceramic multilayer board which enables a high density of packaging to be realized by reducing pitches between terminals. CONSTITUTION:In a ceramic multilayer board, no interconnection electrode is disposed at least at the area, where a flip-chip is to be mounted, of vias 1 on the uppermost layer and vias 2 on the lowermost layer. Only the via at this area is constituted of Al2O3-free material that solely contains Cu. The other vias are composed of a composite material containing 10-20wt.% Al2O3 with the balance being Cu.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はコンピュータ、ビデオ、
テレビ等あらゆる電子機器に利用できるセラミック多層
基板に関する。
BACKGROUND OF THE INVENTION The present invention relates to a computer, video,
The present invention relates to a ceramic multilayer substrate that can be used in various electronic devices such as televisions.

【0002】[0002]

【従来の技術】近年、コンピュータ等の電子機器の可搬
性および利便性に対する要求が益々強まり、よりポータ
ブルで高性能なコンピユータ等の電子機器の出現が期待
されている。その中で、はんだバンプ等の突起電極を用
いたフリップチップ実装法は、高性能で高密度の実装方
法として注目を浴びている。
2. Description of the Related Art In recent years, demands for portability and convenience of electronic devices such as computers have become stronger and stronger, and electronic devices such as more portable and high-performance computers are expected to appear. Among them, the flip-chip mounting method using a protruding electrode such as a solder bump has attracted attention as a high-performance and high-density mounting method.

【0003】フリップチップ実装とは、はんだバンプ等
の突起電極の形成された半導体素子をセラミック多層基
板の配線電極に直接接合するものである。このとき、一
般的には図3のように、セラミック多層基板の配線電極
9は、最上層ビア10及び最下層ビア11の内少なくともど
ちらか一方のビアの上にCu等の材料をパターン印刷
し、焼成して形成する。最上層および最下層のビア10、
11はビア材料と基材の収縮を合わせるために、10〜2
0wt%のAl23 と残部Cuとの複合材料で形成さ
れている。中間層ビア12も、最上層および最下層のビア
10、11と同様に、10〜20wt%のAl23 と残部
Cuとの複合材料で形成されている。そして、その配線
電極9上に半導体素子13に形成されたはんだバンプ14を
固定し、リフローすることによって、はんだバンプ14と
配線電極9を結合している。
Flip-chip mounting is a method of directly bonding a semiconductor element having a protruding electrode such as a solder bump to a wiring electrode of a ceramic multilayer substrate. At this time, generally, as shown in FIG. 3, the wiring electrode 9 of the ceramic multilayer substrate has a pattern printed with a material such as Cu on at least one of the uppermost layer via 10 and the lowermost layer via 11. Formed by firing. Top and bottom vias 10,
11 is 10 to 2 to match the shrinkage of the via material and the base material.
It is formed of a composite material of 0 wt% Al 2 O 3 and the balance Cu. The middle layer via 12 is also the top and bottom vias.
Like 10 and 11, it is made of a composite material of 10 to 20 wt% Al 2 O 3 and the balance Cu. Then, the solder bumps 14 formed on the semiconductor element 13 are fixed on the wiring electrodes 9 and reflowed to bond the solder bumps 14 to the wiring electrodes 9.

【0004】[0004]

【発明が解決しようとする課題】しかし、従来のフリッ
プチップ技術では、セラミック多層基板の配線電極9が
平坦であるため、はんだバンプ14をリフローして接合す
るとき、はんだバンプの形状がくずれやすいという問題
がある。このため、はんだバンプ14のリフロー条件が非
常に厳しく、安定してリフローするのが難しく、また、
はんだバンプの形状がくずれるということは、隣の端子
とショートし易いということであるため、端子間のピッ
チを小さくすることが難しい等の問題があった。
However, in the conventional flip chip technology, since the wiring electrodes 9 of the ceramic multilayer substrate are flat, when the solder bumps 14 are reflowed to be joined, the shape of the solder bumps is likely to collapse. There's a problem. Therefore, the reflow condition of the solder bump 14 is very strict, and it is difficult to stably reflow, and
The collapse of the shape of the solder bump means that it is easy to short-circuit with the adjacent terminal, so that there is a problem that it is difficult to reduce the pitch between the terminals.

【0005】本発明の目的は上記のような問題点を解消
し、半導体素子をフリップチップ実装する場合に、はん
だバンプのリフロー工程の管理を簡素化し、端子間のピ
ッチを小さくすることができ高密度化したセラミック多
層基板を提供しようとするものである。
The object of the present invention is to solve the above problems, to simplify the management of the solder bump reflow process and to reduce the pitch between terminals when flip chip mounting a semiconductor element. It is intended to provide a densified ceramic multilayer substrate.

【0006】[0006]

【課題を解決するための手段】本発明は上記目的を達成
するため、半導体素子をはんだバンプを介してセラミッ
ク多層基板に直接接合したセラミック多層基板におい
て、最上層ビアと最下層ビアの内少なくともフリップチ
ップ実装する部分には配線電極を設けることなく、この
部分のビアだけをAl23 を含まないCuのみの材料
で構成し、それ以外の中間層のビアは10〜20wt%
のAl23 と残部Cuとの複合材料で構成したセラミ
ック多層基板とした。
In order to achieve the above object, the present invention provides a ceramic multi-layer substrate in which a semiconductor element is directly bonded to a ceramic multi-layer substrate via solder bumps, and at least a flip between the uppermost layer via and the lowermost layer via. Wiring electrodes are not provided in the part where the chip is mounted, only the vias in this part are made of a Cu-only material that does not contain Al 2 O 3 , and the other intermediate layer vias are 10 to 20 wt%.
Was used as a ceramic multilayer substrate composed of a composite material of Al 2 O 3 and the balance Cu.

【0007】[0007]

【作用】本発明によれば、最上層と最下層のビアの内少
なくともフリップチップ実装する部分には配線電極を設
けることなく、この部分のビアだけをAl23 を含ま
ないCuのみの材料で構成しているので、Cuが基材の
ガラスセラミックよりも収縮が大きく、くぼみのあるビ
アとなっている。そして、このビアそのものを実装する
半導体素子のはんだバンプに対する取出電極として使用
している。従って、球状のはんだバンプがこのくぼみに
すっぽりと覆われるように固定され、はんだバンプの形
状がくずれにくい。このようにすることによってはんだ
バンプのリフロー条件の範囲も大きくとれ、はんだバン
プのリフローが容易になる。また、はんだバンプがビア
のくぼみから外へ出ることはないので、基本的にはビア
のピッチを小さくしていけばいくらでも端子間のピッチ
も小さくすることができる。
According to the present invention, a wiring electrode is not provided in at least the flip-chip mounting portion of the vias in the uppermost layer and the lowermost layer, and only the vias in this portion are made of a Cu-only material containing no Al 2 O 3. Therefore, Cu has a larger shrinkage than the glass-ceramic of the base material, and is a via with a depression. Then, it is used as an extraction electrode for the solder bump of the semiconductor element mounting the via itself. Therefore, the spherical solder bumps are fixed so as to be completely covered in the depressions, and the shape of the solder bumps is unlikely to collapse. By doing so, the range of reflow conditions for the solder bumps can be widened, and the reflow of the solder bumps can be facilitated. In addition, since the solder bump does not go out from the recess of the via, the pitch between the terminals can be basically reduced by decreasing the pitch of the via.

【0008】[0008]

【実施例】以下、本発明の一実施例におけるセラミック
多層基板について、図面を参照しながら説明する。図1
は本実施例で用いた7層ビア、6層内層ライン、最上層
および最下層に配線電極のない構成のセラミック基板の
断面図である。1は最上層ビア、2は最下層ビアで、A
23 を含まないCuのみの材料を用いている。3は
中間層ビアで、この中間層ビア3(2層ビア〜6層ビ
ア)はビア材料とセラミック基板の収縮を合わせるため
に、10〜20wt%のAl23 と残部Cuとの複合
材料で構成されている。最上層ビア1および最下層ビア
2にはCuがセラミック基材のガラスセラミックよりも
収縮が大きいことを利用して、くぼみ4のあるビアとな
っている。この最上層ビア1および最下層ビア2上には
従来のような配線電極は設けず、これらのビア1、2そ
のものを実装する半導体素子のはんだバンプに対する取
出電極として使用している。5は内層ラインで、Cuの
みで形成されている。6は基材で、ガラス−アルミナ基
板である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A ceramic multilayer substrate according to an embodiment of the present invention will be described below with reference to the drawings. Figure 1
FIG. 4 is a cross-sectional view of a ceramic substrate used in this example, which has a structure in which there are no 7-layer vias, 6-layer inner layer lines, and wiring electrodes in the uppermost and lowermost layers. 1 is the top layer via, 2 is the bottom layer via, A
A Cu-only material containing no l 2 O 3 is used. Reference numeral 3 denotes an intermediate layer via, and this intermediate layer via 3 (2 layer to 6 layer vias) is a composite material of 10 to 20 wt% Al 2 O 3 and the balance Cu in order to match the shrinkage of the via material and the ceramic substrate. It is composed of. The uppermost via 1 and the lowermost via 2 are vias having the recesses 4 by utilizing the fact that Cu shrinks more than the glass-ceramic of the ceramic base material. No wiring electrodes are provided on the uppermost layer via 1 and the lowermost layer via 2 as in the prior art, and the vias 1 and 2 themselves are used as lead electrodes for solder bumps of a semiconductor element on which they are mounted. Reference numeral 5 denotes an inner layer line, which is made of only Cu. Reference numeral 6 is a base material, which is a glass-alumina substrate.

【0009】図2に、本発明のセラミック多層基板上
に、はんだバンプの形成された導通試験用半導体素子を
フリップチップ実装した時の断面図を示す。図中の番号
1〜6は図1の場合と同様なので説明は省略する。7は
はんだバンプで、このはんだバンプのピッチは150μ
mである。8は半導体素子を示す。このようにセラミッ
ク多層基板上にフリップチップ実装した実装構造体を、
耐湿性を確保するために、半導体素子と回路基板の隙間
に樹脂を充填硬化した後、ヒートショック試験、THB
試験、高温保持試験、低温保持試験を行なったところ、
どの試験においても、はんだバンプによる接続部の導通
抵抗は数mΩと安定で、全端子とも導通不良はみられず
良好な結果が得られた。
FIG. 2 shows a cross-sectional view of a semiconductor element for continuity test having solder bumps formed thereon, which is flip-chip mounted on the ceramic multilayer substrate of the present invention. The numbers 1 to 6 in the figure are the same as those in FIG. 7 is a solder bump, and the pitch of this solder bump is 150μ.
m. Reference numeral 8 represents a semiconductor element. In this way, the mounting structure flip-chip mounted on the ceramic multilayer substrate,
In order to secure the moisture resistance, after filling the resin in the gap between the semiconductor element and the circuit board and hardening it, heat shock test, THB
When a test, a high temperature holding test and a low temperature holding test were performed,
In all the tests, the conduction resistance of the connection portion by the solder bumps was as stable as several mΩ, and no conduction failure was observed in all terminals, and good results were obtained.

【0010】[0010]

【発明の効果】本発明によれば、最上層と最下層ビアの
くぼみを直接取出電極として用いるので、はんだバンプ
の形状がくずれにくく、はんだバンプのリフロー条件の
範囲も大きくとれ、リフローが容易になる。これにより
リフロー工程の管理が簡素化されるのでコスト低減につ
ながり、また、はんだバンプがビアのくぼみから外へ出
ることはないので、端子間のピッチも小さくすることが
でき、実装の高密度化が実現できるようになった。
According to the present invention, since the depressions of the vias of the uppermost layer and the lowermost layer are directly used as the extraction electrodes, the shape of the solder bumps is not easily deformed, the reflow condition range of the solder bumps is wide, and the reflow is easy. Become. This simplifies the management of the reflow process, which leads to cost reduction, and because the solder bumps do not go out from the recesses of the vias, the pitch between the terminals can also be made smaller and the packaging density can be increased. Has come to be realized.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例を示すセラミック多層基板の断
面図
FIG. 1 is a sectional view of a ceramic multilayer substrate showing an embodiment of the present invention.

【図2】本発明の実施例を示すセラミック多層基板上に
フリップチップ実装した実装構造体の断面図
FIG. 2 is a sectional view of a mounting structure flip-chip mounted on a ceramic multilayer substrate showing an embodiment of the present invention.

【図3】従来のセラミック多層基板上にフリップチップ
実装した実装構造体の断面図
FIG. 3 is a cross-sectional view of a mounting structure that is flip-chip mounted on a conventional ceramic multilayer substrate.

【符号の説明】[Explanation of symbols]

1 最上層ビア 2 最下層ビア 3 中間層ビア 7 はんだバンプ 8 半導体素子 1 Top layer via 2 Bottom layer via 3 Intermediate layer via 7 Solder bump 8 Semiconductor element

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 半導体素子をはんだバンプを介してセラ
ミック多層基板に直接接合したセラミック多層基板にお
いて、最上層ビアと最下層ビアの内少なくともフリップ
チップ実装する部分には配線電極を設けることなく、こ
の部分のビアだけをAl23 を含まないCuのみの材
料で構成し、それ以外の中間層のビアは10〜20wt
%のAl23 と残部Cuとの複合材料で構成したこと
を特徴とするセラミック多層基板。
1. In a ceramic multi-layer substrate in which a semiconductor element is directly bonded to a ceramic multi-layer substrate via solder bumps, a wiring electrode is not provided in at least a flip chip mounting portion of the uppermost layer via and the lowermost layer via. Only part of the vias is made of a Cu-only material that does not contain Al 2 O 3 , and the other intermediate vias are 10 to 20 wt.
% Of Al 2 O 3 and the balance Cu made of a composite material.
JP4135284A 1992-05-27 1992-05-27 Ceramic multilayer board Pending JPH05335747A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4135284A JPH05335747A (en) 1992-05-27 1992-05-27 Ceramic multilayer board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4135284A JPH05335747A (en) 1992-05-27 1992-05-27 Ceramic multilayer board

Publications (1)

Publication Number Publication Date
JPH05335747A true JPH05335747A (en) 1993-12-17

Family

ID=15148108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4135284A Pending JPH05335747A (en) 1992-05-27 1992-05-27 Ceramic multilayer board

Country Status (1)

Country Link
JP (1) JPH05335747A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006100361A (en) * 2004-09-28 2006-04-13 Kyocera Corp High-frequency module
EP2056457A1 (en) * 2006-08-21 2009-05-06 Murata Manufacturing Co. Ltd. High frequency module
US11075092B2 (en) 2016-10-27 2021-07-27 Murata Manufacturing Co., Ltd. Multi-layer substrate

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006100361A (en) * 2004-09-28 2006-04-13 Kyocera Corp High-frequency module
JP4583123B2 (en) * 2004-09-28 2010-11-17 京セラ株式会社 High frequency module
EP2056457A1 (en) * 2006-08-21 2009-05-06 Murata Manufacturing Co. Ltd. High frequency module
EP2056457A4 (en) * 2006-08-21 2012-02-15 Murata Manufacturing Co High frequency module
USRE43957E1 (en) 2006-08-21 2013-02-05 Murata Manufacturing Co., Ltd. High-frequency module including connection terminals arranged at a small pitch
US11075092B2 (en) 2016-10-27 2021-07-27 Murata Manufacturing Co., Ltd. Multi-layer substrate

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