JPH0533013Y2 - - Google Patents
Info
- Publication number
- JPH0533013Y2 JPH0533013Y2 JP13031188U JP13031188U JPH0533013Y2 JP H0533013 Y2 JPH0533013 Y2 JP H0533013Y2 JP 13031188 U JP13031188 U JP 13031188U JP 13031188 U JP13031188 U JP 13031188U JP H0533013 Y2 JPH0533013 Y2 JP H0533013Y2
- Authority
- JP
- Japan
- Prior art keywords
- tweezers
- gripping
- sic
- cvd
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003746 surface roughness Effects 0.000 claims description 8
- 238000005229 chemical vapour deposition Methods 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 23
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 19
- 235000012431 wafers Nutrition 0.000 description 13
- 239000000758 substrate Substances 0.000 description 12
- 230000007797 corrosion Effects 0.000 description 9
- 238000005260 corrosion Methods 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 8
- 230000003068 static effect Effects 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 230000005611 electricity Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Landscapes
- Gripping Jigs, Holding Jigs, And Positioning Jigs (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13031188U JPH0533013Y2 (enrdf_load_stackoverflow) | 1988-10-04 | 1988-10-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13031188U JPH0533013Y2 (enrdf_load_stackoverflow) | 1988-10-04 | 1988-10-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0252344U JPH0252344U (enrdf_load_stackoverflow) | 1990-04-16 |
| JPH0533013Y2 true JPH0533013Y2 (enrdf_load_stackoverflow) | 1993-08-23 |
Family
ID=31385367
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13031188U Expired - Lifetime JPH0533013Y2 (enrdf_load_stackoverflow) | 1988-10-04 | 1988-10-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0533013Y2 (enrdf_load_stackoverflow) |
-
1988
- 1988-10-04 JP JP13031188U patent/JPH0533013Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0252344U (enrdf_load_stackoverflow) | 1990-04-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4278441B2 (ja) | 半導体ウエハ処理用部材 | |
| JPH0790590A (ja) | 基板キャリア | |
| CN108140541B (zh) | SiC复合基板的制造方法 | |
| US9308714B2 (en) | Method for improving surface quality of spalled substrates | |
| JP4330363B2 (ja) | 石英ガラスルツボ | |
| US20170040205A1 (en) | High-hardness-material-powder infused elastomer for high friction and compliance for silicon wafer transfer | |
| JPH0686662B2 (ja) | Ｃｖｄ用サセプター | |
| JPH0533013Y2 (enrdf_load_stackoverflow) | ||
| JP4071919B2 (ja) | ＳｉＣ被覆黒鉛部材およびその製造方法 | |
| JPH08188408A (ja) | 化学蒸着法による炭化ケイ素成形体及びその製造方法 | |
| US5882418A (en) | Jig for use in CVD and method of manufacturing jig for use in CVD | |
| JP2004200436A (ja) | サセプタ及びその製造方法 | |
| US4238436A (en) | Method of obtaining polycrystalline silicon | |
| JP2000302576A (ja) | 炭化珪素被覆黒鉛材 | |
| JP2531572B2 (ja) | 石英ガラスの酸窒化方法および表面処理方法 | |
| JP3956291B2 (ja) | 半導体処理用部材 | |
| EP1351282A3 (en) | Method for preventing contamination during the fabrication of a semiconductor device | |
| KR101983751B1 (ko) | 실리콘 단결정 인상 장치 내의 부재의 재생 방법 | |
| JPH10251062A (ja) | 炭化珪素成形体の製造方法 | |
| JPH03187954A (ja) | 耐火材料及びその製造方法 | |
| JPS61213374A (ja) | 治具 | |
| JPH06236913A (ja) | ウェハーフォーク | |
| JP4437365B2 (ja) | 半導体工業用シリカガラス治具およびその製造方法 | |
| JP3617676B2 (ja) | 炭化珪素成形体の製造方法 | |
| JP3467723B2 (ja) | 炭化珪素焼結体部材の製造方法 |