JPH0532807B2 - - Google Patents
Info
- Publication number
- JPH0532807B2 JPH0532807B2 JP59269348A JP26934884A JPH0532807B2 JP H0532807 B2 JPH0532807 B2 JP H0532807B2 JP 59269348 A JP59269348 A JP 59269348A JP 26934884 A JP26934884 A JP 26934884A JP H0532807 B2 JPH0532807 B2 JP H0532807B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- metal thin
- ferromagnetic metal
- film layer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005294 ferromagnetic effect Effects 0.000 claims description 70
- 229910052751 metal Inorganic materials 0.000 claims description 70
- 239000002184 metal Substances 0.000 claims description 70
- 239000010409 thin film Substances 0.000 claims description 66
- 230000005291 magnetic effect Effects 0.000 claims description 27
- 230000003647 oxidation Effects 0.000 claims description 25
- 238000007254 oxidation reaction Methods 0.000 claims description 25
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 93
- 230000007797 corrosion Effects 0.000 description 18
- 238000005260 corrosion Methods 0.000 description 18
- 238000001771 vacuum deposition Methods 0.000 description 17
- 239000003302 ferromagnetic material Substances 0.000 description 14
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 12
- 229910001882 dioxygen Inorganic materials 0.000 description 12
- 239000010408 film Substances 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 9
- 238000009826 distribution Methods 0.000 description 9
- 229920006267 polyester film Polymers 0.000 description 9
- 229910020630 Co Ni Inorganic materials 0.000 description 7
- 229910002440 Co–Ni Inorganic materials 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 238000009832 plasma treatment Methods 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 230000005415 magnetization Effects 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 240000002989 Euphorbia neriifolia Species 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Description
【発明の詳細な説明】
〔技術分野〕
この発明は強磁性金属薄膜層を記録層とする磁
気記録媒体に関し、さらに詳しくは２層以上の強
磁性金属薄膜層を積層し、隣接する各強磁性金属
薄膜層の界面および最上層の強磁性金属薄膜層表
面に、強磁性金属薄膜層中に含まれる平均酸素原
子濃度より高い酸素原子濃度を有するプラズマ酸
化境界層を設けた前記の磁気記録媒体に関する。[Detailed Description of the Invention] [Technical Field] The present invention relates to a magnetic recording medium having a ferromagnetic metal thin film layer as a recording layer, and more specifically, it relates to a magnetic recording medium in which two or more ferromagnetic metal thin film layers are laminated, and each adjacent ferromagnetic The above-mentioned magnetic recording medium includes a plasma oxidation boundary layer having an oxygen atom concentration higher than the average oxygen atom concentration contained in the ferromagnetic metal thin film layer at the interface of the metal thin film layer and the surface of the uppermost ferromagnetic metal thin film layer. .
強磁性金属薄膜層を記録層とする磁気記録媒体
は、通常、金属もしくはそれらの合金などを真空
蒸着等によつてポリエステルフイルム等の基体上
に被着してつくられ、高密度記録に適した特性を
有するが、反面空気中の酸素によつて酸化され易
く、この酸化によつて飽和磁化などの磁気特性が
劣化するなどの難点がある。
Magnetic recording media with a ferromagnetic metal thin film layer as a recording layer are usually made by depositing metals or their alloys on a substrate such as a polyester film by vacuum deposition, etc., and are suitable for high-density recording. However, it has the disadvantage that it is easily oxidized by oxygen in the air, and this oxidation deteriorates magnetic properties such as saturation magnetization.
このため、従来から酸素ガス雰囲気下で真空蒸
着を行い強磁性金属薄膜層の表面を酸化する（特
開昭58−41439号）などして耐食性を改善するこ
とが行われている。ところが、この種の従来の方
法で得られる強磁性金属薄膜層は、表面層におい
てのみ酸化膜保護層が形成されるものであるた
め、腐食等によつて強磁性金属薄膜層表面の酸化
膜保護層が損傷された場合、強磁性金属薄膜層の
内部まで腐食が容易に進行していくという難点が
あり、耐食性の改善は未だ充分に満足できるもの
ではない。 For this reason, corrosion resistance has conventionally been improved by oxidizing the surface of the ferromagnetic metal thin film layer by performing vacuum deposition in an oxygen gas atmosphere (Japanese Patent Application Laid-Open No. 41439/1983). However, in the ferromagnetic metal thin film layer obtained by this type of conventional method, a protective oxide film is formed only on the surface layer, so the protective oxide film on the surface of the ferromagnetic metal thin film layer is damaged by corrosion etc. If the layer is damaged, corrosion easily progresses to the inside of the ferromagnetic metal thin film layer, so the improvement in corrosion resistance is still not fully satisfactory.
この発明は、かかる現状に鑑み、たとえ、腐食
等によつて強磁性金属薄膜層表面の酸化膜保護層
が損傷された場合でも、強磁性金属薄膜層の内部
にまで腐食が容易に進行していくということのな
い、耐食性に優れた強磁性金属薄膜層を有する磁
気記録媒体を提供することを目的としてなされた
もので、基体上に２層以上の強磁性金属薄膜層を
積層し、隣接する各強磁性金属薄膜層の界面およ
び最上層の強磁性金属薄膜層表面に、強磁性金属
薄膜層中に含まれる平均酸素原子濃度より高い酸
素原子濃度を有するプラズマ酸化境界層を設ける
ことによつて、所期の目的を達成したものであ
る。
In view of the current situation, the present invention was developed because even if the protective oxide film on the surface of the ferromagnetic metal thin film layer is damaged due to corrosion etc., the corrosion easily progresses to the inside of the ferromagnetic metal thin film layer. This technology was developed with the aim of providing a magnetic recording medium having a ferromagnetic metal thin film layer with excellent corrosion resistance, which does not cause corrosion. By providing a plasma oxidation boundary layer having an oxygen atom concentration higher than the average oxygen atom concentration contained in the ferromagnetic metal thin film layer at the interface of each ferromagnetic metal thin film layer and on the surface of the top ferromagnetic metal thin film layer. , the intended purpose has been achieved.
この発明は、基体上に、２層以上の強磁性金属
薄膜層を積層し、隣接する各強磁性金属薄膜層の
界面および最上層の強磁性金属薄膜層表面に、強
磁性金属薄膜層中に含まれる平均酸素原子濃度よ
り高い酸素原子濃度を有するプラズマ酸化境界層
を設けることを特徴とするもので、これらの強磁
性金属薄膜層中に含まれる平均酸素原子濃度より
高い酸素原子濃度を有するプラズマ酸化境界層
を、２層以上積層して形成した強磁性金属薄膜層
の最上層表面および内部に多段式に設けることに
よつて、たとえ、腐食等によつて強磁性金属薄膜
層の最上層表面のプラズマ酸化境界層が損傷され
た場合でも、強磁性金属薄膜層の内部に多段式に
設けたプラズマ酸化境界層によつてそれ以上の浸
食を有効に防止し、強磁性金属薄膜層の耐食性を
充分に向上させたものである。
This invention consists of laminating two or more ferromagnetic metal thin film layers on a substrate, and applying the ferromagnetic metal thin film layer to the interface of each adjacent ferromagnetic metal thin film layer and the surface of the topmost ferromagnetic metal thin film layer. A plasma characterized by providing a plasma oxidation boundary layer having an oxygen atom concentration higher than the average oxygen atom concentration contained in these ferromagnetic metal thin film layers, and a plasma having an oxygen atom concentration higher than the average oxygen atom concentration contained in these ferromagnetic metal thin film layers. By providing an oxidation boundary layer in multiple stages on the surface and inside of the top layer of a ferromagnetic metal thin film layer formed by stacking two or more layers, it is possible to prevent the surface of the top layer of the ferromagnetic metal thin film layer from being damaged by corrosion or the like. Even if the plasma oxidation boundary layer of the ferromagnetic metal thin film layer is damaged, the plasma oxidation boundary layer provided in multiple stages inside the ferromagnetic metal thin film layer effectively prevents further erosion and improves the corrosion resistance of the ferromagnetic metal thin film layer. This is a sufficient improvement.
この発明において、２層以上の強磁性金属薄膜
層を積層した後、隣接する各強磁性金属薄膜層の
界面および最上層の強磁性金属薄膜層表面に形成
する境界層は、強磁性材を真空蒸着して１層の強
磁性金属薄膜層を形成する毎に、この強磁性金属
薄膜層表面をプラズマ酸化によつて酸化し、これ
を必要に応じて繰り返すことによつて形成され
る。 In this invention, after two or more ferromagnetic metal thin film layers are laminated, the boundary layer formed at the interface of each adjacent ferromagnetic metal thin film layer and the surface of the topmost ferromagnetic metal thin film layer is formed by depositing the ferromagnetic material under vacuum. Each time one ferromagnetic metal thin film layer is formed by vapor deposition, the surface of this ferromagnetic metal thin film layer is oxidized by plasma oxidation, and this process is repeated as necessary.
第１図は、このように強磁性金属薄膜層中に含
まれる平均酸素原子濃度より高い酸素原子濃度を
有するプラズマ酸化境界層を、隣接する各強磁性
金属薄膜層の界面および最上層の強磁性金属薄膜
層表面に多段式に形成する際に使用する、真空蒸
着兼プラズマ処理装置の１例の概略断面図を示し
たものであり、以下、この図面を参照しながら説
明する。 Figure 1 shows that a plasma oxidized boundary layer having an oxygen atom concentration higher than the average oxygen atom concentration contained in the ferromagnetic metal thin film layer is formed at the interface of each adjacent ferromagnetic metal thin film layer and at the ferromagnetic layer of the top layer. This is a schematic cross-sectional view of an example of a vacuum evaporation/plasma processing apparatus used to form a multi-stage metal thin film layer on the surface of the metal thin film layer, and the following description will be made with reference to this drawing.
図において、１および２は隣接して連結された
真空槽であり、これら真空槽１および２の内部は
それぞれ隔壁３および４，５および６で区画さ
れ、それぞれ真空槽１および２の中央部に配設さ
れた円筒状キヤン７および８が跨るように真空蒸
着室９とプラズマ処理室１０、また真空蒸着室１
１とプラズマ処理室１２が分離形成されている。
ポリエステルフイルム等の基体１３は、真空槽１
内の原反ロール１４より円筒状キヤン７の周側面
に沿つて移動し、ガイドロール１５を介して隣接
する真空槽２に送り込まれ、さらにガイドロール
１６を介して円筒状キヤン８の周側面に沿つて移
動し、巻き取りロール１７に巻き取られる。この
間真空槽１内の円筒状キヤン７の周側面に沿つて
移動する基体１３に対向して、真空蒸着室９の下
部に配設された強磁性材蒸発源１８で強磁性材１
９が加熱蒸発されて、強磁性材１９からなる強磁
性金属薄膜層が形成され、引き続いて隣接するプ
ラズマ処理室１０で、酸素ガス導入管２０から酸
素ガスが導入されて電極板２１によりプラズマ酸
化が行われ、強磁性金属薄膜層上に強磁性金属の
酸化膜からなる界面層が形成される。 In the figure, 1 and 2 are adjacently connected vacuum chambers, and the insides of these vacuum chambers 1 and 2 are partitioned by partition walls 3 and 4, 5 and 6, respectively. The vacuum deposition chamber 9 and the plasma processing chamber 10, and the vacuum deposition chamber 1, are arranged so that the cylindrical cans 7 and 8 straddle them.
1 and a plasma processing chamber 12 are formed separately.
A substrate 13 such as a polyester film is placed in a vacuum chamber 1.
The material is moved along the circumferential side of the cylindrical can 7 from the inner fabric roll 14, is sent to the adjacent vacuum chamber 2 via the guide roll 15, and is further transferred to the circumferential side of the cylindrical can 8 via the guide roll 16. It moves along the same line and is wound up on a winding roll 17. During this time, a ferromagnetic material evaporation source 18 disposed at the lower part of the vacuum deposition chamber 9 is used to evaporate the ferromagnetic material 13, facing the substrate 13 moving along the circumferential side of the cylindrical can 7 in the vacuum chamber 1.
9 is heated and evaporated to form a ferromagnetic metal thin film layer made of the ferromagnetic material 19. Subsequently, in the adjacent plasma processing chamber 10, oxygen gas is introduced from the oxygen gas introduction pipe 20 and plasma oxidized by the electrode plate 21. is performed, and an interface layer consisting of a ferromagnetic metal oxide film is formed on the ferromagnetic metal thin film layer.
次いで、表面に強磁性金属の酸化膜からなる界
面層が形成された強磁性金属薄膜層を有する基体
１３は、真空槽２内のガイドロール１６を介して
円筒状キヤン８の周側面に沿つて移動し、この
間、真空蒸着室１１の下部に配設された強磁性材
蒸発源２２で強磁性材２３が加熱蒸発されて、強
磁性材２３からなる強磁性金属薄膜層が形成さ
れ、さらに引続いてプラズマ処理室１２で酸素ガ
ス導入管２４から酸素ガスが導入されて、電極板
２５によりプラズマ酸化が行われ、強磁性金属の
酸化膜からなる界面層が形成される。２６および
２７はそれぞれ真空槽１および２に連結された排
気系、２８および２９はそれぞれ真空蒸着室９お
よび１１に連結された排気系、３０および３１は
それぞれプラズマ処理室１０および１２に連結さ
れた排気系であり、これらの排気系によつて真空
槽１，２、真空蒸着室９，１１およびプラズマ処
理室１０，１２はそれぞれ所定の真空度に真空排
気される。 Next, the base body 13 having a ferromagnetic metal thin film layer on the surface of which an interface layer made of a ferromagnetic metal oxide film is formed is moved along the circumferential side of the cylindrical can 8 via a guide roll 16 in the vacuum chamber 2. During this time, the ferromagnetic material 23 is heated and evaporated by the ferromagnetic material evaporation source 22 disposed at the lower part of the vacuum deposition chamber 11, forming a ferromagnetic metal thin film layer made of the ferromagnetic material 23, and further attracted. Next, in the plasma processing chamber 12, oxygen gas is introduced from the oxygen gas introduction pipe 24, and plasma oxidation is performed by the electrode plate 25, thereby forming an interface layer made of a ferromagnetic metal oxide film. 26 and 27 are exhaust systems connected to vacuum chambers 1 and 2, respectively, 28 and 29 are exhaust systems connected to vacuum deposition chambers 9 and 11, respectively, and 30 and 31 are connected to plasma processing chambers 10 and 12, respectively. These exhaust systems evacuate the vacuum chambers 1 and 2, the vacuum deposition chambers 9 and 11, and the plasma processing chambers 10 and 12 to a predetermined degree of vacuum, respectively.
このように強磁性金属薄膜層の形成と強磁性金
属薄膜層表面のプラズマ酸化が繰り返し行われる
と、積層される強磁性金属薄膜層の界面および最
上層の強磁性金属薄膜層表面に、強磁性金属薄膜
層中に含まれる平均酸素原子濃度より高い酸素原
子濃度を有するプラズマ酸化境界層が形成され
る。従つて、たとえ、最上層の強磁性金属薄膜層
表面の強磁性金属の酸化膜からなるプラズマ酸化
境界層が腐食等によつて損傷されても、腐食は強
磁性金属薄膜層中に多段式に形成された強磁性金
属の酸化膜からなるプラズマ酸化境界層のところ
で、食い止められ、強磁性金属薄膜層の耐食性が
充分に向上される。なお、強磁性金属薄膜層中に
含まれる平均酸素原子濃度より高い酸素原子濃度
を有するプラズマ酸化境界層は、少なくとも１層
以上適宜に設ければよく、このプラズマ酸化境界
層の数が多いほど強磁性金属薄膜層の耐食性はよ
り良好なものとなる。 When the formation of the ferromagnetic metal thin film layer and the plasma oxidation of the ferromagnetic metal thin film layer surface are repeated in this way, ferromagnetic A plasma oxidation boundary layer is formed having an oxygen atomic concentration higher than the average oxygen atomic concentration contained in the metal thin film layer. Therefore, even if the plasma oxidation boundary layer consisting of a ferromagnetic metal oxide film on the surface of the topmost ferromagnetic metal thin film layer is damaged by corrosion, corrosion will occur in multiple stages within the ferromagnetic metal thin film layer. The plasma oxidation is stopped at the formed plasma oxidation boundary layer consisting of a ferromagnetic metal oxide film, and the corrosion resistance of the ferromagnetic metal thin film layer is sufficiently improved. Note that at least one plasma oxidation boundary layer having an oxygen atom concentration higher than the average oxygen atom concentration contained in the ferromagnetic metal thin film layer may be appropriately provided, and the greater the number of plasma oxidation boundary layers, the stronger the plasma oxidation boundary layer. The corrosion resistance of the magnetic metal thin film layer becomes better.
強磁性金属薄膜層のプラズマ酸化を行う際のプ
ラズマ処理室１０および１２における酸素ガスの
ガス圧は、５×10-1トール〜１×10-2トールの範
囲内にするのが好ましく、酸素ガス圧を１×10-2
トールより低くするとプラズマ密度が低すぎ、５
×10-1トールより高くするとプラズマ放電が発生
しない。 The gas pressure of oxygen gas in the plasma processing chambers 10 and 12 when performing plasma oxidation of the ferromagnetic metal thin film layer is preferably within the range of 5 × 10 -1 Torr to 1 × 10 -2 Torr. Pressure 1×10 -2
If it is lower than Thor, the plasma density is too low, and 5
If the temperature is higher than ×10 -1 Torr, no plasma discharge will occur.
このように、２層以上積層形成した強磁性金属
薄膜層の界面および最上層の強磁性金属薄膜層表
面に、プラズマ酸化によつて形成される境界層に
おける酸素原子濃度は、強磁性金属薄膜層中に含
まれる平均酸素原子濃度より５％以上高いことが
好ましく、これより少なくては強磁性金属薄膜層
の耐食性が充分に改善されない。またこのように
して形成されるプラズマ酸化境界層の層厚は、20
〜100Åの範囲内であることが好ましく、20Åよ
り薄くては耐食性が充分に改善されず、100Åよ
り厚くすると強磁性金属薄膜層がもろくなり耐久
性が低下する。 In this way, the oxygen atom concentration in the boundary layer formed by plasma oxidation on the interface of two or more ferromagnetic metal thin film layers and on the surface of the uppermost ferromagnetic metal thin film layer is It is preferable that the concentration is 5% or more higher than the average oxygen atom concentration contained therein, and if it is less than this, the corrosion resistance of the ferromagnetic metal thin film layer will not be sufficiently improved. The thickness of the plasma oxidation boundary layer formed in this way is 20
The thickness is preferably within the range of ~100 Å; if it is thinner than 20 Å, the corrosion resistance will not be sufficiently improved, and if it is thicker than 100 Å, the ferromagnetic metal thin film layer will become brittle and its durability will decrease.
強磁性材としては、Co、Fe、Ni、Co−Ni合
金、Co−Cr合金、Co−Ｐ合金、Co−Ni−Ｐ合
金など一般に真空蒸着に使用される強磁性材がい
ずれも使用される。 The ferromagnetic materials used include Co, Fe, Ni, Co-Ni alloy, Co-Cr alloy, Co-P alloy, Co-Ni-P alloy, and other ferromagnetic materials commonly used in vacuum deposition. .
また、基体としては、ポリエステル、ポリイミ
ド、ポリアミド等一般に使用されている高分子成
形物からなるプラスチツクフイルム、および銅な
どの非磁性金属からなる金属フイルムが使用され
る。 Further, as the substrate, a plastic film made of a commonly used polymer molded product such as polyester, polyimide, or polyamide, and a metal film made of a nonmagnetic metal such as copper are used.
次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.
実施例 １
第１図に示す真空蒸着装置を使用し、厚さ10μ
のポリエステルフイルム１３を原反ロール１４よ
り円筒状キヤン７の周側面に沿つて移動させ、さ
らにガイドロール１５および１６を介して円筒状
キヤン８の周側面に沿つて移動させ、巻き取りロ
ール１７に巻き取るようにセツトした。同時に真
空蒸着室９内の強磁性材蒸発源１８および真空蒸
着室１１内の強磁性材蒸発源２２にCo−Ni合金
（重量比８：２）１９および２３をセツトした。
次に、排気系２６および２７で真空槽１および２
を真空排気するとともに、排気系２６および２９
で真空蒸着室９および１１を１×10-5トールまで
真空排気し、排気系３０および３１でプラズマ処
理室１０および１２を0.1トールまで真空排気し
た。次いで、強磁性材蒸発源１８内のCo−Ni合
金１９を加熱蒸発してポリエステルフイルム１３
上にCo−Ni合金からなる約600Å厚の強磁性金属
薄膜層を形成し、引続きプラズマ処理室１０内に
酸素ガス導入管２０から酸素ガスを導入し、酸素
ガス圧１×10-1トールで、電極板２１と円筒状キ
ヤン７との間に1.2KW／m2の電場を生じさせて
プラズマ酸化を行つた。次いで、強磁性材蒸発源
２２内のCo−Ni合金２３を加熱蒸発して前記の
表面をプラズマ酸化した強磁性金属薄膜層上に、
さらにCo−Ni合金からなる約600Å厚の強磁性金
属薄膜層を形成し、引き続いて、プラズマ処理室
１２内に酸素ガス導入管２４から酸素ガスを導入
し、酸素ガス圧１×10-1トールで、電極板２５を
円筒状キヤン８との間に1.2KW／m2の電場を生
じさせてプラズマ酸化を行つた。しかる後、所定
の巾に裁断して第２図に示すように、ポリエステ
ルフイルム１３上に、強磁性金属薄膜層３２、プ
ラズマ酸化境界層３３、強磁性金属薄膜層３４お
よびプラズマ酸化境界層３５を順次に積層形成し
た磁気テープをつくつた。このようにして得られ
た磁気テープの強磁性金属薄膜層中のCo−Cr合
金および酸素原子の濃度分布をオージエ電子分光
計によつて調べた結果、第３図の曲線Ａに示され
るように、表面および中央部で濃度の高い酸素原
子の濃度分布が検知された。なお、第３図におい
て曲線ＢはCoの濃度分布であり、曲線ＣはNiの
濃度分布である。また１３はポリエステルフイル
ムである。Example 1 Using the vacuum evaporation equipment shown in Figure 1, a film with a thickness of 10 μm was deposited.
The polyester film 13 is moved along the circumferential side of the cylindrical can 7 from the raw roll 14, further moved along the circumferential side of the cylindrical can 8 via guide rolls 15 and 16, and then transferred to the take-up roll 17. I set it to wind up. At the same time, Co--Ni alloys (weight ratio 8:2) 19 and 23 were set in the ferromagnetic material evaporation source 18 in the vacuum deposition chamber 9 and the ferromagnetic material evaporation source 22 in the vacuum deposition chamber 11.
Next, the vacuum chambers 1 and 2 are
At the same time, the exhaust systems 26 and 29
The vacuum deposition chambers 9 and 11 were evacuated to 1×10 -5 Torr, and the plasma processing chambers 10 and 12 were evacuated to 0.1 Torr using exhaust systems 30 and 31. Next, the Co-Ni alloy 19 in the ferromagnetic material evaporation source 18 is heated and evaporated to form the polyester film 13.
A ferromagnetic metal thin film layer of about 600 Å thick made of Co-Ni alloy is formed on top, and then oxygen gas is introduced into the plasma processing chamber 10 from the oxygen gas introduction pipe 20 at an oxygen gas pressure of 1×10 -1 Torr. An electric field of 1.2 KW/m 2 was generated between the electrode plate 21 and the cylindrical can 7 to perform plasma oxidation. Next, the Co--Ni alloy 23 in the ferromagnetic material evaporation source 22 is heated and evaporated onto the ferromagnetic metal thin film layer whose surface is plasma-oxidized.
Furthermore, a ferromagnetic metal thin film layer of about 600 Å thick made of Co-Ni alloy is formed, and then oxygen gas is introduced into the plasma processing chamber 12 from the oxygen gas introduction pipe 24, and the oxygen gas pressure is 1×10 -1 Torr. Then, an electric field of 1.2 KW/m 2 was generated between the electrode plate 25 and the cylindrical can 8 to perform plasma oxidation. Thereafter, the polyester film 13 is cut into a predetermined width, and as shown in FIG. A magnetic tape was created by sequentially laminating layers. The concentration distribution of Co-Cr alloy and oxygen atoms in the ferromagnetic metal thin film layer of the thus obtained magnetic tape was investigated using an Auger electron spectrometer. , a high concentration distribution of oxygen atoms was detected at the surface and center. In addition, in FIG. 3, curve B is the concentration distribution of Co, and curve C is the concentration distribution of Ni. Further, 13 is a polyester film.
実施例 ２
実施例１において、強磁性材蒸発源１８および
２２内に、Co−Ni合金（重量比８：２）１９お
よび２３に代えて、Co１９および２３をセツト
した以外は実施例１と同様にして磁気テープをつ
くつた。得られた磁気テープの強磁性金属薄膜層
中のCoおよび酸素の濃度分布をオージエ電子分
光計によつて調べた結果、第４図の曲線Ａに示さ
れるように、表面および中央部で濃度の高い酸素
原子の濃度分布が検知された。なお、第４図にお
いて曲線ＢはCoの濃度分布であり、１３はポリ
エステルフイルムである。Example 2 Same as Example 1 except that Co-Ni alloy (weight ratio 8:2) 19 and 23 were set in the ferromagnetic material evaporation sources 18 and 22 instead of Co-Ni alloy (weight ratio 8:2) 19 and 23. He used it to make magnetic tape. The concentration distribution of Co and oxygen in the ferromagnetic metal thin film layer of the obtained magnetic tape was investigated using an Auger electron spectrometer. As shown by curve A in Figure 4, the concentration distribution was found to be large at the surface and center. A high concentration distribution of oxygen atoms was detected. In addition, in FIG. 4, curve B is the concentration distribution of Co, and 13 is the polyester film.
比較例 １
実施例１において、真空蒸着室１１内での真空
蒸着およびプラズマ処理室１２内でのプラズマ処
理を省き、真空蒸着室９内で形成する強磁性金属
薄膜層の厚みを約600Åから約1200Åに変更した
以外は、実施例１と同様にして第５図に示すよう
にポリエステルフイルム１３上に、Co−Ni合金
からなる強磁性金属薄膜層３６およびプラズマ酸
化境界層３７を、順次積層形成した磁気テープを
つくつた。Comparative Example 1 In Example 1, the vacuum deposition in the vacuum deposition chamber 11 and the plasma treatment in the plasma treatment chamber 12 were omitted, and the thickness of the ferromagnetic metal thin film layer formed in the vacuum deposition chamber 9 was reduced from about 600 Å to about 600 Å. A ferromagnetic metal thin film layer 36 made of a Co-Ni alloy and a plasma oxidation boundary layer 37 were sequentially laminated on a polyester film 13 as shown in FIG. 5 in the same manner as in Example 1 except that the thickness was changed to 1200 Å. created magnetic tape.
比較例 ２
実施例１において、プラズマ処理室１０内での
プラズマ処理、真空蒸着室１１内での真空蒸着お
よびプラズマ処理室１２内でのプラズマ処理を省
いた以外は、実施例１と同様にして表面に境界層
のない磁気テープをつくつた。Comparative Example 2 The same procedure as in Example 1 was carried out except that the plasma treatment in the plasma treatment chamber 10, the vacuum deposition in the vacuum deposition chamber 11, and the plasma treatment in the plasma treatment chamber 12 were omitted. Created a magnetic tape with no boundary layer on its surface.
各実施例および各比較例で得られた磁気テープ
を60℃、90％RHの条件下に放置し、時間の経過
に伴う飽和磁化の劣化率を、放置前の磁気テープ
の飽和磁化を100％として測定し、耐食性を調べ
た。第６図はその飽和磁化の劣化率の変化をグラ
フで表したもので、グラフＡは実施例１で得られ
た磁気テープ、グラフＢは実施例２で得られた磁
気テープ、グラフＣは比較例１で得られた磁気テ
ープ、グラフＤは比較例２で得られた磁気テープ
を示す。 The magnetic tapes obtained in each example and each comparative example were left under conditions of 60°C and 90% RH, and the deterioration rate of saturation magnetization over time was determined to be 100%. The corrosion resistance was investigated. Figure 6 is a graph showing the change in the deterioration rate of saturation magnetization, where graph A is the magnetic tape obtained in Example 1, graph B is the magnetic tape obtained in Example 2, and graph C is the comparison. Graph D shows the magnetic tape obtained in Example 1, and graph D shows the magnetic tape obtained in Comparative Example 2.
第６図に示すグラフから明らかなように、比較
例１および２で得られた磁気テープは、時間の経
過に伴つて劣化率が非常に大きくなるが、この発
明で得られた磁気テープ（実施例１および２）は
いずれも時間が経過してもそれほど劣化率が大き
くならず、このことからこの発明によつて得られ
る磁気記録媒体は耐食性に優れていることがわか
る。
As is clear from the graph shown in FIG. 6, the deterioration rate of the magnetic tapes obtained in Comparative Examples 1 and 2 becomes extremely large over time, whereas the magnetic tapes obtained according to the present invention (implemented) In both Examples 1 and 2), the deterioration rate did not increase significantly over time, and this shows that the magnetic recording medium obtained by the present invention has excellent corrosion resistance.
第１図はこの発明の磁気記録媒体を製造するの
に使用する真空蒸着兼プラズマ処理装置の１例を
示す概略断面図、第２図はこの発明で得られた磁
気テープの部分拡大断面図、第３図および第４図
はこの発明で得られた磁気テープの強磁性金属薄
膜層中における強磁性金属および酸素の分布状態
をオージエ電子分光計によつて調べた結果を示す
説明図、第５図は比較例１で得られた磁気テープ
の部分拡大断面図、第６図は各実施例および比較
例で得られた磁気テープの飽和磁化の劣化率と経
過時間との関係図である。
１３……ポリエステルフイルム（基体）、３２，
３４……強磁性金属薄膜層、３３，３５……プラ
ズマ酸化境界層。
FIG. 1 is a schematic sectional view showing an example of a vacuum evaporation/plasma processing apparatus used to manufacture the magnetic recording medium of the present invention, and FIG. 2 is a partially enlarged sectional view of the magnetic tape obtained by the present invention. 3 and 4 are explanatory diagrams showing the results of examining the distribution state of ferromagnetic metal and oxygen in the ferromagnetic metal thin film layer of the magnetic tape obtained by the present invention using an Auger electron spectrometer; The figure is a partially enlarged cross-sectional view of the magnetic tape obtained in Comparative Example 1, and FIG. 6 is a diagram showing the relationship between the deterioration rate of saturation magnetization and elapsed time of the magnetic tape obtained in each Example and Comparative Example. 13... Polyester film (substrate), 32,
34...Ferromagnetic metal thin film layer, 33, 35...Plasma oxidation boundary layer.
Claims (1)
層し、隣接する各強磁性金属薄膜層の界面および
最上層の強磁性金属薄膜層表面に、強磁性金属薄
膜層中に含まれる平均酸素原子濃度より高い酸素
原子濃度を有するプラズマ酸化境界層を設けたこ
とを特徴とする磁気記録媒体。1. Two or more ferromagnetic metal thin film layers are laminated on a substrate, and the average amount contained in the ferromagnetic metal thin film layer is stacked on the interface of each adjacent ferromagnetic metal thin film layer and on the surface of the topmost ferromagnetic metal thin film layer. A magnetic recording medium characterized in that a plasma oxidation boundary layer having an oxygen atom concentration higher than that of oxygen atom is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26934884A JPS61145722A (en) | 1984-12-20 | 1984-12-20 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26934884A JPS61145722A (en) | 1984-12-20 | 1984-12-20 | Magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61145722A JPS61145722A (en) | 1986-07-03 |
| JPH0532807B2 true JPH0532807B2 (en) | 1993-05-18 |
Family
ID=17471121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26934884A Granted JPS61145722A (en) | 1984-12-20 | 1984-12-20 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61145722A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07107734B2 (en) * | 1986-07-03 | 1995-11-15 | ティーディーケイ株式会社 | Magnetic recording medium |
| JP2566134B2 (en) * | 1986-09-19 | 1996-12-25 | ティーディーケイ株式会社 | Magnetic recording media |
| JPH0760482B2 (en) * | 1986-07-02 | 1995-06-28 | ティーディーケイ株式会社 | Magnetic recording method |
| JP2566135B2 (en) * | 1986-09-22 | 1996-12-25 | ティーディーケイ株式会社 | Magnetic recording media |
| JP2562306B2 (en) * | 1986-09-18 | 1996-12-11 | ティーディーケイ株式会社 | Magnetic recording media |
| JP2562308B2 (en) * | 1986-09-25 | 1996-12-11 | ティーディーケイ株式会社 | Magnetic recording media |
| JPS6386110A (en) * | 1986-09-29 | 1988-04-16 | Tdk Corp | Magnetic recording medium |
| JPH0795367B2 (en) * | 1987-08-25 | 1995-10-11 | コニカ株式会社 | Magnetic recording medium |
| JP2558770B2 (en) * | 1987-12-29 | 1996-11-27 | 松下電器産業株式会社 | Magnetic recording media |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5720920A (en) * | 1980-07-14 | 1982-02-03 | Sekisui Chem Co Ltd | Magnetic recording medium and its manufacture |
| JPS5798133A (en) * | 1980-12-05 | 1982-06-18 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
-
1984
- 1984-12-20 JP JP26934884A patent/JPS61145722A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5720920A (en) * | 1980-07-14 | 1982-02-03 | Sekisui Chem Co Ltd | Magnetic recording medium and its manufacture |
| JPS5798133A (en) * | 1980-12-05 | 1982-06-18 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61145722A (en) | 1986-07-03 |
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