JPH05326625A - Lsi mounting structure - Google Patents

Lsi mounting structure

Info

Publication number
JPH05326625A
JPH05326625A JP8381592A JP8381592A JPH05326625A JP H05326625 A JPH05326625 A JP H05326625A JP 8381592 A JP8381592 A JP 8381592A JP 8381592 A JP8381592 A JP 8381592A JP H05326625 A JPH05326625 A JP H05326625A
Authority
JP
Japan
Prior art keywords
lsi
chip
carrier
solder
sealant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8381592A
Other languages
Japanese (ja)
Inventor
Yuichi Miyazaki
裕一 宮崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP8381592A priority Critical patent/JPH05326625A/en
Priority to CA 2093409 priority patent/CA2093409A1/en
Publication of JPH05326625A publication Critical patent/JPH05326625A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16152Cap comprising a cavity for hosting the device, e.g. U-shaped cap

Abstract

PURPOSE:To realize hermetic sealing of LSI and relaxation of thermal stress by filling the gap between the LSI and a carrier board with sealant. CONSTITUTION:Sealant 4 is filled in the gap between an LSI 8 and a carrier board 5, between all bumps A15, and at the side face of the LSI 8 thus hermetically sealing the circuit surface of the LSI 8. A silicon based resin having alpharay blocking effect is employed as the filler 4. The filler 4 relaxes thermal stress caused by repeated operation of the device, thus preventing failure of the device due to crack. A heat spreader 1 is die bonded through an adhesive 2 entirely to the rear surface of the LSI 8. Since the adhesive 2 has high thermal conductivity, heat transferred to the rear of the LSI 8 spreads sufficiently resulting in high heat dissipation effect to the outside of carrier.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はLSI実装構造に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an LSI packaging structure.

【0002】[0002]

【従来の技術】図3は従来の第1の例を示す断面図であ
る。(40th ELECTRONIC COMPON
ENT & TECHNOLOGY CONFEREN
CE(ECTC:PP.613−619,1990参
照)この技術では、バンプ16を表面全面に有するLS
I8がフェースダウンで配線基板13上に半田付けされ
た構造となっている。LSI8の表面で発生した熱は、
裏面側に直接接触したピストン18に伝わった後、冷却
部材外へ排熱される。また、チップの電源供給、信号入
出力は、バンプ16から配線基板13を介して装置外と
接続されて行われている。ピストン18は、LSI8の
傾き、各LSI8間の高さバラツキを考慮して、高さの
調整が行えるようになっている。
2. Description of the Related Art FIG. 3 is a sectional view showing a first conventional example. (40th ELECTRONIC COMPON
ENT & TECHNOLOGY CONFEREN
CE (see ECTC: PP. 613-619, 1990) In this technique, an LS having bumps 16 on the entire surface is used.
The structure is that I8 is soldered face down on the wiring substrate 13. The heat generated on the surface of the LSI8 is
After being transmitted to the piston 18 that is in direct contact with the back side, heat is exhausted to the outside of the cooling member. The chip power supply and signal input / output are performed by connecting the bumps 16 to the outside of the device via the wiring board 13. The height of the piston 18 can be adjusted in consideration of the inclination of the LSI 8 and the height variation among the LSIs 8.

【0003】図4は従来の第2の例を示す断面図であ
る。(41th ECTC:PP.693−703,1
991参照)回路面に半田バンプB25を有するLSI
チップ19がフェースダウンでベース基板21に実装さ
れている。キャップ22は半田D23でLSIチップ1
9の裏面に、半田C20でベース基板にそれぞれ接着さ
れている。これによって、LSIチップを気密封止する
事が可能となる。LSIチップ19で発生した熱は、L
SIチップ19自身を伝わって裏面のキャップ22から
キャリア外へ排熱される。
FIG. 4 is a sectional view showing a second conventional example. (41th ECTC: PP.693-703,1
991) LSI having solder bumps B25 on the circuit surface
The chip 19 is mounted face down on the base substrate 21. The cap 22 is the solder D23 and the LSI chip 1
The back surface of 9 is bonded to the base substrate with solder C20. As a result, the LSI chip can be hermetically sealed. The heat generated in the LSI chip 19 is L
Heat is transmitted to the outside of the carrier from the cap 22 on the back surface through the SI chip 19 itself.

【0004】[0004]

【発明が解決しようとする課題】上述した従来のLSI
チップ実装構造において次のような問題があった。
DISCLOSURE OF THE INVENTION The conventional LSI described above
There are the following problems in the chip mounting structure.

【0005】図3において、LSI8の発熱量が多くな
ってきたため、従来の技術では装置外への十分な排熱が
困難になってきた。また、バンプ16がむき出しの状態
なため、耐湿性、気密性が無いといったLSIの信頼性
が低いという問題もあった。
In FIG. 3, since the amount of heat generated by the LSI 8 has increased, it has become difficult to exhaust sufficient heat to the outside of the device by the conventional technique. Further, since the bumps 16 are exposed, there is a problem that the reliability of the LSI is low, such as lack of moisture resistance and airtightness.

【0006】また、図4の技術においては、半田付けが
非常に多く、材料、組立の面で非常に煩雑となり、コス
トも高くなってしまう。更に、LSIチップ19にキャ
ップ22をとりつける際に、LSIチップ19が傾いて
いると、キャップ22とLSIチップ19とのギャップ
が広がってしまい、良好な熱抵抗が得られない。また、
LSIチップ19とキャップ22とが接触して、LSI
チップ19を破壊してしまう等、安定した組立が行えな
かった。
Further, in the technique of FIG. 4, soldering is very much, which is very complicated in terms of material and assembly, and the cost is high. Further, when the cap 22 is attached to the LSI chip 19, if the LSI chip 19 is tilted, the gap between the cap 22 and the LSI chip 19 is widened, and good thermal resistance cannot be obtained. Also,
When the LSI chip 19 and the cap 22 are in contact with each other, the LSI
Stable assembly could not be performed because the chip 19 was destroyed.

【0007】さらに、装置の動作、非動作による熱応力
が半田バンプB25部分に強く作用してしまい、不良の
原因となっていた。また、この熱応力を緩和するため
に、LSIチップ19との熱膨張率の差がほとんど無い
ようなベース基板を選ぶ必要があり、材料が限定される
という欠点があった。
Further, the thermal stress due to the operation and non-operation of the device strongly acts on the solder bump B25 portion, causing a defect. Further, in order to alleviate this thermal stress, it is necessary to select a base substrate that has almost no difference in the coefficient of thermal expansion from the LSI chip 19, and there is a drawback that the material is limited.

【0008】[0008]

【課題を解決するための手段】以上のような問題を解決
するため、本発明によるLSI実装構造では、キャリア
基板とLSIチップとの間隙部分を封止剤で充填し、尚
且つ、LSIチップ裏面にヒートスプレッダを具備した
構造となっている。
In order to solve the above problems, in the LSI mounting structure according to the present invention, the gap between the carrier substrate and the LSI chip is filled with a sealant, and the back surface of the LSI chip is filled. The structure is equipped with a heat spreader.

【0009】[0009]

【実施例】次に本発明について、図面を参照して説明す
る。
The present invention will be described below with reference to the drawings.

【0010】図1は、本発明の第1の実施例を示す断面
図である。LSI8の回路面ではバンプA15が外部接
続端子として設置されており、このバンプA15を、キ
ャリア基板5上にバンプA15と1対1配置されたパッ
ドA9へ半田A3により接合することで、LSI8とキ
ャリア基板5とを電気的に接続している。キャリア基板
5内には配線6が施されており、このキャリア内配線6
がLSI8の実装されない側の面へ達した部分には、キ
ャリア外部との接続端子としてのバンプB7が具備され
ている。従って、装置の電気信号は、LSI8とキャリ
ア基板5の裏面に設けられたバンプB7とが接続されて
いるので、キャリア基板5外との入出力が可能である。
キャリア基板5には、キャリア内配線6との同時焼成が
可能で誘電率が低く、LSI8と熱膨張率の近いもの
(例えば、ムライト、アルミナ、AlN等)が用いられ
る。
FIG. 1 is a sectional view showing a first embodiment of the present invention. Bumps A15 are installed as external connection terminals on the circuit surface of the LSI8. By bonding the bumps A15 to the pads A9 arranged one-to-one with the bumps A15 on the carrier substrate 5 by the solder A3, the LSIs 8 and the carrier The substrate 5 is electrically connected. Wiring 6 is provided in the carrier substrate 5.
A bump B7 as a connection terminal to the outside of the carrier is provided in a portion reaching the surface on which the LSI is not mounted. Therefore, since the LSI 8 and the bump B7 provided on the back surface of the carrier substrate 5 are connected to each other, the electric signal of the device can be input / output to / from the outside of the carrier substrate 5.
For the carrier substrate 5, a material that can be co-fired with the in-carrier wiring 6 and has a low dielectric constant and a thermal expansion coefficient close to that of the LSI 8 (for example, mullite, alumina, AlN, etc.) is used.

【0011】一方、LSI8とキャリア基板5との間
隙、全バンプA15間及びLSI8の側面には、封止剤
4が充填されており、LSI8の回路面は完全に気密封
止されている。また、LSI8の裏面全面には、ヒート
スプレッダ1が接合剤2によってダイボンディングされ
ている。このキャリアの組立方法としては、まず、LS
I8をキャリア基板5に半田A3にて半田付けし、その
後、封止剤4を充填し、最後にヒートスプレッダ1を取
り付けるといったことが行われる。この際、封止剤4、
接合剤2は、気泡を含まないよう注意する必要がある。
On the other hand, the gap between the LSI 8 and the carrier substrate 5, the space between all the bumps A15, and the side surface of the LSI 8 are filled with the sealant 4, and the circuit surface of the LSI 8 is completely hermetically sealed. The heat spreader 1 is die-bonded with the bonding agent 2 on the entire back surface of the LSI 8. As a method of assembling this carrier, first, LS
I8 is soldered to the carrier substrate 5 with solder A3, then the sealant 4 is filled, and finally the heat spreader 1 is attached. At this time, the sealant 4,
It is necessary to take care so that the bonding agent 2 does not contain bubbles.

【0012】充填剤4には、例えば、シリコーン系の樹
脂が用いられる。このシリコーン系樹脂に、LSI8の
誤動作を引き起こすα線を防御する効果のあるものを用
いれば、対α線の信頼性も得られる。また、LSI8は
非常に大きな消費電力を必要とするため、装置の動作、
非動作により装置内にかなりの温度差が生じてしまう。
そのため、LSI8やバンプA15、キャリア基板5の
熱膨張率の差から、大きな熱応力が発生してしまい、L
SI8は半田A3、キャリア基板5にクラックを発生さ
せたり、キャリア基板配線6やLSI8内の配線を切断
したりショートさせたりしてしまう危険性がある。しか
し、封止剤4をLSI8とキャリア基板5の間隙、全バ
ンプA15間に隙間無く充填することにより、装置の動
作、非動作による熱応力を充填剤4が緩和するため、ク
ラック等による装置の故障が発生しなくなり、装置の信
頼性を格段に高めることができる。また、封止剤4を充
填することにより、LSI8の回路面が外部に露出する
ことがなくなるため、結露、ゴミ、外部からの接触等か
らLSI8の回路面を保護することが可能である。
For the filler 4, for example, a silicone resin is used. If a silicone resin having an effect of protecting α rays which causes malfunction of the LSI 8 is used, reliability against α rays can also be obtained. Moreover, since the LSI 8 requires very large power consumption,
Non-operation causes a considerable temperature difference within the device.
Therefore, a large thermal stress is generated due to the difference in the coefficient of thermal expansion between the LSI 8, the bump A15, and the carrier substrate 5, and L
SI8 has a risk of causing cracks in the solder A3 and the carrier substrate 5, and cutting or short-circuiting the carrier substrate wiring 6 and the wiring in the LSI 8. However, by filling the sealant 4 with no gaps between the LSI 8 and the carrier substrate 5 and all the bumps A15, the filler 4 alleviates the thermal stress caused by the operation and non-operation of the device, so that the device may be damaged by cracks or the like. The failure does not occur, and the reliability of the device can be significantly improved. In addition, since the circuit surface of the LSI 8 is not exposed to the outside by filling the sealing agent 4, it is possible to protect the circuit surface of the LSI 8 from dew condensation, dust, external contact, and the like.

【0013】LSI8の回路面から発生した熱は、LS
I8自身を伝わった後、LSI8の裏面まで達する。こ
のとき、ヒートスプレッダ1が、LSI8裏面に熱伝導
の良好な接合剤2にてダイボンディングされているた
め、LSI8裏面に到達した熱は十分に広がることがで
き、キャリア外部への高い放熱効果が得られることにな
る。また、ヒートスプレッダ1をLSI8に取り付けた
ことから、LSI8の裏面側に冷却部材を設置したとき
のLSI8への機械的衝撃を緩和するこができる。ヒー
トスプレッダ1としては、熱伝導率が大きく、LSIチ
ップの熱膨張率に近い材料(例えば、SiC、AlN、
Cu/W等)が使用される。また、接合剤2にも高い熱
伝導性を有する材料(例えば、Ag入りエポキシ系接着
剤、ダイヤモンド入りエポキシ接着剤、半田合金等)を
使用することで、装置の熱抵抗を大きく下げることが可
能である。
The heat generated from the circuit surface of the LSI 8 is LS
After reaching the I8 itself, it reaches the back side of the LSI8. At this time, since the heat spreader 1 is die-bonded to the back surface of the LSI 8 with the bonding agent 2 having good heat conduction, the heat reaching the back surface of the LSI 8 can be sufficiently spread, and a high heat dissipation effect to the outside of the carrier can be obtained. Will be Further, since the heat spreader 1 is attached to the LSI 8, it is possible to reduce mechanical impact on the LSI 8 when the cooling member is installed on the back surface side of the LSI 8. The heat spreader 1 has a large thermal conductivity and is close to the thermal expansion coefficient of the LSI chip (for example, SiC, AlN,
Cu / W) is used. Further, by using a material having high thermal conductivity for the bonding agent 2 (eg, epoxy adhesive containing Ag, epoxy adhesive containing diamond, solder alloy, etc.), the thermal resistance of the device can be greatly reduced. Is.

【0014】図2は本発明の第2の実施例を示す断面図
である。配線基板13は、表面にバンプ7と同一ピッチ
で設けられたバッドB11とI/Oピン14とを電気的
につなげるための接続を行うI/Oピン14と、パッド
B11とI/Oピン14とを電気的につなげるための層
内配線12とを有している。キャリア基板5と配線基板
3とは、配線基板13上にバンプB7と同様なピッチで
配置されたパッドB11とバンプB7とを半田B10に
よって接合することで、電気的に接続されている。この
際、半田B10は、キャリア基板5とLSI8との接続
に用いた半田A3の融点よりも低いものを用いる。例え
ば、半田A3にAu/Sn半田(80/20WT%)を
使用した場合は、半田B10にはSn/Pb半田(63
/37WT%)を使用する。配線基板13としては、電
気特性に優れ、キャリア基板5と熱膨張率が近いもの
で、さらに導体との同時焼成の可能な材料が選ばれる。
例えばAlN、Cu,Ag,Auが使用される。
FIG. 2 is a sectional view showing a second embodiment of the present invention. The wiring board 13 has an I / O pin 14 for making a connection for electrically connecting the pad B11 and the I / O pin 14 provided on the surface with the same pitch as the bump 7, and the pad B11 and the I / O pin 14 for connection. And an in-layer wiring 12 for electrically connecting and. The carrier substrate 5 and the wiring substrate 3 are electrically connected to each other by joining the pads B11 and the bumps B7 arranged on the wiring substrate 13 at the same pitch as the bumps B7 with the solder B10. At this time, the solder B10 used is lower than the melting point of the solder A3 used for connecting the carrier substrate 5 and the LSI 8. For example, when Au / Sn solder (80/20 WT%) is used for the solder A3, Sn / Pb solder (63
/ 37WT%). As the wiring board 13, a material having excellent electric characteristics, a thermal expansion coefficient close to that of the carrier board 5, and a material capable of being co-fired with the conductor is selected.
For example, AlN, Cu, Ag and Au are used.

【0015】配線基板13条には図1に示す複数のキャ
リア17が搭載される。搭載する際に、キャリア17と
キャリア17との間隔を狭くして、キャリア搭載の密度
を上げることで、LSI8の接続配線長を短くする事が
可能となり、従って、装置の処理能力を向上することが
できる。
A plurality of carriers 17 shown in FIG. 1 are mounted on the strip 13 of the wiring board. At the time of mounting, by narrowing the space between the carriers 17 and increasing the density of mounting the carriers, it is possible to shorten the connection wiring length of the LSI 8, thus improving the processing capability of the device. You can

【0016】[0016]

【発明の効果】以上のように、LSIとキャリア基板と
の間隙に封止剤を充填することによって、LSIの気密
封止および熱応力の緩和が可能となり、装置の信頼性を
向上することができ、また、キャリア基板の材料選定に
も制限がなくなる。また、LSIの高さバラツキを考慮
する必要がなくなり、半田の種類も少なくなるため、組
立性に優れ、製造コストの低いキャリアが得られる。さ
らに、ヒートスプレッダの取り付けの効果によって、装
置の熱抵抗の低下が大幅に達成されるという効果があ
る。
As described above, by filling the gap between the LSI and the carrier substrate with the sealant, the LSI can be hermetically sealed and the thermal stress can be relaxed, and the reliability of the device can be improved. Moreover, there is no limitation in selecting the material of the carrier substrate. Further, since it is not necessary to consider the height variation of the LSI and the number of kinds of solder is reduced, a carrier having excellent assembling ability and low manufacturing cost can be obtained. Furthermore, the effect of mounting the heat spreader has the effect of significantly reducing the thermal resistance of the device.

【0017】また、配線基板に搭載することで、実装密
度の高い装置が得られるので、装置の情報処理能力を格
段に高めることができる。
Further, by mounting the device on the wiring board, a device having a high packing density can be obtained, so that the information processing capability of the device can be remarkably enhanced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例の示す断面図である。FIG. 1 is a sectional view showing a first embodiment of the present invention.

【図2】本発明の第2の実施例を示す断面図である。FIG. 2 is a sectional view showing a second embodiment of the present invention.

【図3】従来の第1の例を示す断面図である。FIG. 3 is a cross-sectional view showing a first conventional example.

【図4】従来の第2の例を示す断面図である。FIG. 4 is a sectional view showing a second conventional example.

【符号の説明】[Explanation of symbols]

1 ヒートスプレッダ 2 接合材 3 半田A 4 封止剤 5 キャリア基板 6 キャリア内配線 7 バンプB 8 LSI 9 パッドA 10 半田B 11 パッドB 12 層内配線 13 配線基板 14 I/Oピン 15 バンプA 16 バンプ 17 キャリア 18 ピストン 19 LSIチップ 20 半田C 21 ベース基板 22 キャップ 23 半田D 24 半田バンプA 25 半田バンプB 1 Heat Spreader 2 Bonding Material 3 Solder A 4 Sealant 5 Carrier Substrate 6 Carrier Internal Wiring 7 Bump B 8 LSI 9 Pad A 10 Solder B 11 Pad B 12 Layer Internal Wiring 13 Wiring Board 14 I / O Pin 15 Bump A 16 Bump 17 Carrier 18 Piston 19 LSI Chip 20 Solder C 21 Base Substrate 22 Cap 23 Solder D 24 Solder Bump A 25 Solder Bump B

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 接続端子を回路面全面に有するLSIチ
ップと、前記LSIチップをフェイスダウンで搭載する
チップキャリア基板とからなる半導体装置のLSI実装
構造において、前記LSIチップの裏面側にヒートスプ
レッダを具備し、前記LSIチップと前記チップキャリ
ア基板との間隙に、封止剤を充填して前記LSIチップ
を封止する事を特徴とするLSI実装構造。
1. An LSI mounting structure of a semiconductor device comprising an LSI chip having connection terminals on the entire circuit surface and a chip carrier substrate on which the LSI chip is mounted face down, and a heat spreader is provided on the back surface side of the LSI chip. An LSI mounting structure is characterized in that a gap between the LSI chip and the chip carrier substrate is filled with a sealant to seal the LSI chip.
【請求項2】 前記チップキャリアを配線基板に搭載し
てなる請求項1記載のLSI実装構造。
2. The LSI mounting structure according to claim 1, wherein the chip carrier is mounted on a wiring board.
JP8381592A 1992-04-06 1992-04-06 Lsi mounting structure Pending JPH05326625A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8381592A JPH05326625A (en) 1992-04-06 1992-04-06 Lsi mounting structure
CA 2093409 CA2093409A1 (en) 1992-04-06 1993-04-05 Integrated circuit chip carrier and its packaging

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8381592A JPH05326625A (en) 1992-04-06 1992-04-06 Lsi mounting structure

Publications (1)

Publication Number Publication Date
JPH05326625A true JPH05326625A (en) 1993-12-10

Family

ID=13813184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8381592A Pending JPH05326625A (en) 1992-04-06 1992-04-06 Lsi mounting structure

Country Status (1)

Country Link
JP (1) JPH05326625A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08124967A (en) * 1994-10-21 1996-05-17 Nec Corp Semiconductor device
WO1997008748A1 (en) * 1995-08-22 1997-03-06 Hitachi, Ltd. Chip-size package, method of manufacturing same, and second level packaging
US6404049B1 (en) 1995-11-28 2002-06-11 Hitachi, Ltd. Semiconductor device, manufacturing method thereof and mounting board
US6574106B2 (en) 1998-06-10 2003-06-03 Nec Corporation Mounting structure of semiconductor device
US7193306B2 (en) 1998-08-28 2007-03-20 Micron Technology, Inc. Semiconductor structure having stacked semiconductor devices

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63239827A (en) * 1987-03-27 1988-10-05 Hitachi Ltd Semiconductor device
JPH0196952A (en) * 1987-10-09 1989-04-14 Hitachi Ltd Hermetically sealed chip carrier
JPH0269945A (en) * 1988-09-05 1990-03-08 Hitachi Ltd Semiconductor device and manufacture thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63239827A (en) * 1987-03-27 1988-10-05 Hitachi Ltd Semiconductor device
JPH0196952A (en) * 1987-10-09 1989-04-14 Hitachi Ltd Hermetically sealed chip carrier
JPH0269945A (en) * 1988-09-05 1990-03-08 Hitachi Ltd Semiconductor device and manufacture thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08124967A (en) * 1994-10-21 1996-05-17 Nec Corp Semiconductor device
WO1997008748A1 (en) * 1995-08-22 1997-03-06 Hitachi, Ltd. Chip-size package, method of manufacturing same, and second level packaging
US6404049B1 (en) 1995-11-28 2002-06-11 Hitachi, Ltd. Semiconductor device, manufacturing method thereof and mounting board
US6563212B2 (en) 1995-11-28 2003-05-13 Hitachi, Ltd. Semiconductor device
US6621160B2 (en) 1995-11-28 2003-09-16 Hitachi, Ltd. Semiconductor device and mounting board
US6574106B2 (en) 1998-06-10 2003-06-03 Nec Corporation Mounting structure of semiconductor device
US7193306B2 (en) 1998-08-28 2007-03-20 Micron Technology, Inc. Semiconductor structure having stacked semiconductor devices

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