JPH05315727A - Method of treating circuit conductor - Google Patents

Method of treating circuit conductor

Info

Publication number
JPH05315727A
JPH05315727A JP13973892A JP13973892A JPH05315727A JP H05315727 A JPH05315727 A JP H05315727A JP 13973892 A JP13973892 A JP 13973892A JP 13973892 A JP13973892 A JP 13973892A JP H05315727 A JPH05315727 A JP H05315727A
Authority
JP
Japan
Prior art keywords
conductor
layer
circuit
circuit board
conductor layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13973892A
Other languages
Japanese (ja)
Inventor
Hideki Shibuya
秀樹 渋谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemi Con Corp
Original Assignee
Nippon Chemi Con Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemi Con Corp filed Critical Nippon Chemi Con Corp
Priority to JP13973892A priority Critical patent/JPH05315727A/en
Publication of JPH05315727A publication Critical patent/JPH05315727A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To provide a method of treating a circuit conductor prevented from lowering of soldering strength by removing hydrogen in a conductor layer formed by electroless plating. CONSTITUTION:This treatment method includes a process forming a conductor layer (copper layer 14) constituting a prescribed circuit by an electroless plating on the surface of a circuit board 2 and a process of heating (heating source 16) the conductor layer formed on the surface of the circuit board.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、回路基板の表面に無電
解めっきによって形成される回路導体の処理方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating a circuit conductor formed on a surface of a circuit board by electroless plating.

【0002】[0002]

【従来の技術】従来、混成集積回路装置では、アルミナ
やセラミック等の絶縁材料で形成された回路基板の表面
にめっきレジストによって所望の回路パターンを印刷し
た後、これをめっき液に浸漬させて導体層を無電解めっ
き処理で形成する方法が取られている。導体層には例え
ば、銅層が用いられている。このような無電解めっきに
よって形成された導体層、即ち銅層は、安定した回路導
体を構成し、半田付けにも適する等、広く用いられてい
る。
2. Description of the Related Art Conventionally, in a hybrid integrated circuit device, a desired circuit pattern is printed with a plating resist on the surface of a circuit board formed of an insulating material such as alumina or ceramic, and then immersed in a plating solution to form a conductor. A method of forming the layer by an electroless plating process has been adopted. For example, a copper layer is used as the conductor layer. The conductor layer formed by such electroless plating, that is, the copper layer constitutes a stable circuit conductor and is widely used because it is suitable for soldering.

【0003】[0003]

【発明が解決しようとする課題】ところで、図2に示す
ように、回路基板2に無電解めっき処理で形成された銅
層4に対して、半田付け処理で半田層6が形成された場
合、半田層6と銅層4との機械的な強度に問題があると
の指摘がある。即ち、銅層4の表面に形成された半田層
6には、その成分である錫が含まれているので、この錫
と銅層を成す銅とが化合し、この化合の結果、錫−銅間
化合物8が形成され、この錫−銅間化合物8は脆化する
ことが知られている。これが半田層と銅層との固着強度
を低下させ、必要な機械的な強度を維持することができ
ない原因となっている。
By the way, as shown in FIG. 2, when the solder layer 6 is formed by the soldering process on the copper layer 4 formed on the circuit board 2 by the electroless plating process, It is pointed out that there is a problem in the mechanical strength of the solder layer 6 and the copper layer 4. That is, since the solder layer 6 formed on the surface of the copper layer 4 contains tin as its component, this tin and copper forming the copper layer are combined, and as a result of this combination, tin-copper is formed. It is known that intermetallic compound 8 is formed and this tin-copper intermetallic compound 8 becomes brittle. This reduces the bonding strength between the solder layer and the copper layer, and is the reason why the required mechanical strength cannot be maintained.

【0004】そして、錫−銅間化合物の脆化は、無電解
めっきによる銅層中に含まれる水素と、銅層中の結晶欠
陥が原因である。
The embrittlement of the tin-copper compound is due to hydrogen contained in the copper layer due to electroless plating and crystal defects in the copper layer.

【0005】そこで、本発明は、無電解めっき処理で形
成される導体層中の水素を除去することにより、半田付
け強度の低下を防止した回路導体の処理方法を提供する
ことを目的とする。
Therefore, it is an object of the present invention to provide a method for treating a circuit conductor which prevents a decrease in soldering strength by removing hydrogen in a conductor layer formed by electroless plating.

【0006】[0006]

【課題を解決するための手段】そこで、本発明の導体層
の処理方法は、回路基板(2)の表面に無電解めっき処
理によって所定の回路パターン(12)を成す導体層
(銅層14)を形成する工程と、前記回路基板の表面に
形成された導体層を加熱(加熱源16)する工程とを含
むことを特徴とする。
Therefore, according to the method for treating a conductor layer of the present invention, a conductor layer (copper layer 14) forming a predetermined circuit pattern (12) on the surface of a circuit board (2) by electroless plating treatment. And a step of heating (heating source 16) the conductor layer formed on the surface of the circuit board.

【0007】[0007]

【作用】無電解めっき処理で導体層を形成した後、回路
基板とともに導体層を加熱すると、その加熱処理で導体
層中の水素が発散するとともに、導体層中の結晶欠陥が
再結晶によって補完される。この結果、導体層は、半田
付けに強い回路導体に処理される。
[Function] When the conductor layer is formed by electroless plating and then the conductor layer is heated together with the circuit board, hydrogen in the conductor layer is diffused by the heat treatment and the crystal defects in the conductor layer are complemented by recrystallization. It As a result, the conductor layer is processed into a circuit conductor resistant to soldering.

【0008】[0008]

【実施例】以下、本発明を図面に示した実施例を参照し
て詳細に説明する。
The present invention will be described in detail below with reference to the embodiments shown in the drawings.

【0009】図1は、本発明の回路導体の処理方法の一
実施例を示している。図1の(A)に示すように、回路
基板2はアルミナ、セラミック等の絶縁材料で形成さ
れ、その表面には、めっきレジスト層10によって所定
の回路パターン12が印刷される。回路パターン12の
部分には、回路基板2の表面が露出しており、この露出
面がめっき処理面である。
FIG. 1 shows an embodiment of the method for treating a circuit conductor of the present invention. As shown in FIG. 1A, the circuit board 2 is formed of an insulating material such as alumina or ceramics, and a predetermined circuit pattern 12 is printed on the surface thereof by the plating resist layer 10. The surface of the circuit board 2 is exposed at the portion of the circuit pattern 12, and this exposed surface is the plated surface.

【0010】次に、この回路基板2をめっき液に浸漬
し、めっきレジスト層10から露出している回路基板2
の表面に無電解めっき処理で導体層としての銅層14を
形成する。即ち、回路パターン12はこの銅層14によ
って形成されることになる。
Next, this circuit board 2 is immersed in a plating solution to expose the circuit board 2 from the plating resist layer 10.
A copper layer 14 as a conductor layer is formed on the surface of the above by electroless plating. That is, the circuit pattern 12 is formed by this copper layer 14.

【0011】次に、図1の(B)に示すように、めっき
レジスト層10を除去すると、回路基板2の表面には銅
層14のみが残留し、この銅層14を以て回路パターン
12が構成されることになる。
Next, as shown in FIG. 1B, when the plating resist layer 10 is removed, only the copper layer 14 remains on the surface of the circuit board 2, and the circuit pattern 12 is constituted by this copper layer 14. Will be done.

【0012】次に、図1の(C)に示すように、回路基
板2とともに銅層14を加熱源16を以て加熱する。こ
の加熱処理で銅層14中に含まれる水素が気化して除去
されるとともに、再結晶処理も同時に進行し、銅層14
中の結晶欠陥が再結晶によって補完される。この場合、
銅層14のみを選択的に加熱するようにしても良い。
Next, as shown in FIG. 1C, the circuit board 2 and the copper layer 14 are heated by a heating source 16. By this heat treatment, the hydrogen contained in the copper layer 14 is vaporized and removed, and at the same time, the recrystallization treatment is also progressed.
The crystal defects therein are complemented by recrystallization. in this case,
Alternatively, only the copper layer 14 may be selectively heated.

【0013】このような処理方法によれば、回路基板2
の表面に無電解めっきで形成された導体層中の水素の除
去とともに結晶欠陥を補完でき、半田付けしても半田中
に含まれる錫との化合物の脆化はなく、機械的な固着強
度の低下を確実に防止でき、半田付けによる電気的な接
続の信頼性を高めることができる。
According to such a processing method, the circuit board 2
The crystal defects can be complemented with the removal of hydrogen in the conductor layer formed by electroless plating on the surface of the, and even when soldering, the compound with tin contained in the solder does not become brittle, and the mechanical bond strength It is possible to surely prevent the deterioration, and it is possible to enhance the reliability of the electrical connection by soldering.

【0014】なお、実施例では、導体層として銅層を例
に取って説明したが、本発明は、銅化合物等を導体層と
する場合等に適用して各種の導体層の半田付け強度を改
善できるので、銅層に限定されるものではない。
In the examples, the copper layer was used as an example of the conductor layer for explanation. However, the present invention is applied to the case where a copper compound or the like is used as the conductor layer and the soldering strength of various conductor layers is improved. It is not limited to the copper layer as it can be improved.

【0015】[0015]

【発明の効果】以上説明したように、本発明によれば、
加熱処理で導体層中の水素を除去できるとともに、導体
層中の結晶欠陥を再結晶によって補完できるので、半田
付け強度を高くでき、信頼性の高い回路導体を提供する
ことができる。
As described above, according to the present invention,
Since hydrogen in the conductor layer can be removed by the heat treatment and crystal defects in the conductor layer can be complemented by recrystallization, the soldering strength can be increased and a highly reliable circuit conductor can be provided.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の回路導体の処理方法の一実施例を示す
断面図である。
FIG. 1 is a cross-sectional view showing an embodiment of a method for treating a circuit conductor of the present invention.

【図2】従来の回路導体として形成された銅層と半田層
とで形成された錫−銅間化合物の生成を示す断面図であ
る。
FIG. 2 is a cross-sectional view showing the formation of a tin-copper compound formed of a copper layer and a solder layer formed as a conventional circuit conductor.

【符号の説明】[Explanation of symbols]

2 回路基板 12 回路パターン 14 銅層(導体層) 16 加熱源 2 circuit board 12 circuit pattern 14 copper layer (conductor layer) 16 heating source

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 回路基板の表面に無電解めっき処理によ
って所定の回路パターンを成す導体層を形成する工程
と、 前記回路基板の表面に形成された導体層を加熱する工程
と、 を含むことを特徴とする回路導体の処理方法。
1. A step of forming a conductor layer forming a predetermined circuit pattern on the surface of the circuit board by electroless plating, and a step of heating the conductor layer formed on the surface of the circuit board. A characteristic circuit conductor processing method.
JP13973892A 1992-05-01 1992-05-01 Method of treating circuit conductor Pending JPH05315727A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13973892A JPH05315727A (en) 1992-05-01 1992-05-01 Method of treating circuit conductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13973892A JPH05315727A (en) 1992-05-01 1992-05-01 Method of treating circuit conductor

Publications (1)

Publication Number Publication Date
JPH05315727A true JPH05315727A (en) 1993-11-26

Family

ID=15252229

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13973892A Pending JPH05315727A (en) 1992-05-01 1992-05-01 Method of treating circuit conductor

Country Status (1)

Country Link
JP (1) JPH05315727A (en)

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