JPH05299402A - Method of cleaning electronic conponent - Google Patents
Method of cleaning electronic conponentInfo
- Publication number
- JPH05299402A JPH05299402A JP4100010A JP10001092A JPH05299402A JP H05299402 A JPH05299402 A JP H05299402A JP 4100010 A JP4100010 A JP 4100010A JP 10001092 A JP10001092 A JP 10001092A JP H05299402 A JPH05299402 A JP H05299402A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- laser beams
- pga
- electronic components
- excimer laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は、電子部品の清浄化方
法に関するものである。さらに詳しくは、この発明は、
PGA金メッキボンディング等の電子部品構成部位の清
浄化に有用な、フロン洗浄剤を使用することのない優れ
た性能のクリーニングを可能とする新しい清浄化方法に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning electronic parts. More specifically, the present invention is
The present invention relates to a new cleaning method which is useful for cleaning electronic component parts such as PGA gold plating bonding and enables excellent performance cleaning without using a CFC cleaner.
【0002】[0002]
【従来の技術】半導体、集積回路等の電子デバイスの高
性能化と、これら部品の高密度実装、高集積化が進展す
るにともなって、電子部品の清浄化への要求は一層高ま
っており、超清浄化表面の実現が強く求められている。
従来、このような清浄化のために、いわゆるフロン洗浄
剤が使用されてきたが、このフロン洗浄剤の使用はオゾ
ン層の破壊をはじめとする地球環境への悪作用が避けら
れないために、その使用が国際的に規制対象となってき
ている。しかしながら、この従来のフロン洗浄剤の洗浄
化作用は非常に優れているために、なかなかフロン洗浄
剤に代替することのできる洗浄化手段が見出されていな
いのが実情である。2. Description of the Related Art As the performance of electronic devices such as semiconductors and integrated circuits increases, and as the density and packaging of these parts progress, the demand for cleaning of electronic parts is increasing. There is a strong demand for the realization of ultra-clean surfaces.
Conventionally, so-called CFC cleaning agents have been used for such cleaning, but the use of CFC cleaning agents cannot avoid the harmful effects on the global environment including the destruction of the ozone layer. Its use has become internationally regulated. However, since the cleaning effect of this conventional CFC cleaning agent is very excellent, it is the actual situation that no cleaning means capable of substituting for the CFC cleaning agent has been found.
【0003】[0003]
【発明が解決しようとする課題】だが、電子部品の高性
能化にともなって、超清浄表面等のクリーンな状態の実
現は欠かせないものとなっている。たとえば、図2に例
示した金(Au)メッキキャビティを有するPGAの場
合にも、汚染物付着による外観不良が避けられず、ワイ
ヤーボンディング時の信頼性が損われるという重大な問
題があった。However, the realization of a clean state such as an ultra-clean surface is indispensable as the performance of electronic parts is improved. For example, even in the case of the PGA having the gold (Au) plating cavity illustrated in FIG. 2, there is a serious problem that the defective appearance due to the adherence of contaminants cannot be avoided and the reliability during wire bonding is impaired.
【0004】このため、前記の通りのフロン洗浄剤を使
用することなく、PGA等の各種電子部品の汚染表面を
優れた品質で清浄化することのできる新しい手段の実現
が強く望まれていた。この発明は、以上の通りの事情に
鑑みてなされたものであり、従来のフロン洗浄に代替す
ることができ、かつ、汚染表面等を優れた品質で清浄化
することのできるノンフロンの新しい清浄化方法を提供
することを目的としている。Therefore, it has been strongly desired to realize a new means capable of cleaning the contaminated surface of various electronic components such as PGA with excellent quality without using the CFC cleaning agent as described above. The present invention has been made in view of the above circumstances, and is a new non-CFC cleaning method that can replace conventional CFC cleaning and can clean contaminated surfaces and the like with excellent quality. It is intended to provide a way.
【0005】[0005]
【課題を解決するための手段】この発明は、上記の課題
を解決するものとして、電子部品の汚染部位にエキシマ
レーザ光を照射して清浄化することを特徴とする電子部
品の清浄化方法を提供する。In order to solve the above problems, the present invention provides a method for cleaning electronic parts, which comprises irradiating a contaminated part of an electronic part with excimer laser light for cleaning. provide.
【0006】[0006]
【作用】すなわち、この発明は、前記のPGAのように
フラックス、タルク(レジスト切断層等の無機物)、レ
ジスト有機物等による汚染が問題となる場合や、リード
表面の汚染、錆等によって性能品質、信頼性が損われる
場合等において、それらの不都合な部位等にエキシマレ
ーザ光を照射して、汚染物の除去、そしてその表面性状
の改善をも可能とするものである。In other words, the present invention is applicable to the case where contamination due to flux, talc (inorganic substance such as resist cutting layer), resist organic substance, etc. as in the case of the above-mentioned PGA becomes a problem, contamination of the lead surface, rust, etc. In the case where the reliability is impaired, excimer laser light is applied to those inconvenient parts to remove contaminants and improve the surface quality.
【0007】このエキシマレーザ光の照射に際しては、
対象部位の種類、その構成、さらには汚染物の種類や汚
染状況等に応じてレーザパワーを制御して最適な清浄化
を実現することができる。また、このレーザ光の照射に
は雰囲気制御を行って、さらに高品質、高品位な清浄化
も可能となる。しかもまた、この発明のエキシマレーザ
光照射による清浄化においては、従来のフロン洗浄剤で
は除去し得ないコンタミネーションの除去も可能とな
る。When irradiating the excimer laser light,
Optimum cleaning can be achieved by controlling the laser power according to the type of the target site, its configuration, and the type and state of contamination. Further, the atmosphere is controlled for the irradiation of the laser light, and it becomes possible to perform cleaning with higher quality and higher quality. Moreover, in the cleaning by the excimer laser light irradiation of the present invention, it becomes possible to remove the contamination which cannot be removed by the conventional CFC cleaner.
【0008】以下、実施例を例示し、さらに詳しくこの
発明の清浄化方法について説明する。Hereinafter, the cleaning method of the present invention will be described in more detail with reference to examples.
【0009】[0009]
【実施例】図1は、この発明の清浄化方法として、PG
Aの清浄化を例示した構成図である。たとえばこの図1
に例示したように、PGA等の対象電子部品の所要清浄
化部位にレーザ光を照射するために、エキシマレーザ発
振装置からレーザ光を放射させ、このレーザ光を所要の
マスクを通過させた後にミラーおよびレンズを介して所
要部位へと導く。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a PG as a cleaning method of the present invention.
It is a block diagram which illustrated the cleaning of A. For example, this figure 1
In order to irradiate a required cleaning portion of a target electronic component such as PGA with a laser beam, a laser beam is emitted from an excimer laser oscillating device, and the laser beam is passed through a required mask as shown in FIG. And lead to the required site through the lens.
【0010】この時、レーザ光の強度、照射面積、照射
時間、雰囲気条件等を適宜に制御する。たとえば、PG
Aの場合には空気の加圧もしくは流通下においてエキシ
マレーザ光を照射する。不活性ガス、あるいは減圧雰囲
気であってもよい。各種の電子部品の表面汚染物の除去
には、エキシマレーザ光の強度は一般的に0.10J/
cm2 以上とすることができ、金属の表面性状をも改善
する場合には、0.5〜0.7J/cm2 程度のパワー
を採用することができる。もちろん、このような強度
は、対象部位や清浄化の目的、条件によって当然にも適
宜に変更すべきである。At this time, the intensity of the laser beam, the irradiation area, the irradiation time, the atmospheric conditions, etc. are controlled appropriately. For example, PG
In the case of A, the excimer laser light is irradiated under pressure or circulation of air. It may be an inert gas or a reduced pressure atmosphere. In order to remove surface contaminants from various electronic parts, the intensity of excimer laser light is generally 0.10 J /
The power may be 0.5 cm 2 or more, and a power of about 0.5 to 0.7 J / cm 2 can be adopted when improving the surface properties of the metal. Of course, such strength should be appropriately changed according to the target site, the purpose of cleaning, and the conditions.
【0011】清浄化処理例 実際、図1の構成において、照射エリア約3×2mm、
空気2kg/cm2 の雰囲気で、PGAの清浄化を行っ
た。PGAの汚染物は、 ・フラックス 70% ・タルク 20% ・レジスト有機物等 10% の構成を有していた。 Example of cleaning process Actually, in the configuration of FIG. 1, the irradiation area is about 3 × 2 mm,
The PGA was cleaned in an atmosphere of 2 kg / cm 2 of air. The PGA contaminants consisted of: flux 70%, talc 20%, resist organic matter 10%, etc.
【0012】エキシマレーザ光の強度を0.23J/c
m2 としてインナーリード、キャビティおよびバックア
ップへの照射を行った。その結果、表面の汚染物は効果
的に除去され、外観の目視観察によって汚染サンプル1
00個中の約75%に高品位の改善が認められた。レー
ザ光強度を0.32J/cm2 とすると、金(Au)極
表面層が除去され、また0.64J/cm2 の強度で
は、金(Au)表面の光沢に変化が認められ、ほぼ10
0%の清浄化が実現された。The excimer laser light intensity is set to 0.23 J / c.
The inner lead, the cavity and the backup were irradiated with m 2 . As a result, contaminants on the surface are effectively removed, and the contaminated sample 1 is visually observed by visual observation.
Approximately 75% of the 00 pieces were improved in high quality. When the laser light intensity was 0.32 J / cm 2 , the gold (Au) electrode surface layer was removed, and when the intensity was 0.64 J / cm 2 , the gloss of the gold (Au) surface was observed to change to almost 10
A 0% cleaning was achieved.
【0013】この結果から、エキシマレーザ光の照射に
よって、 1)汚染物の除去 有機物のアブレーション 2)ボンディング性向上 拡散層の形成 表面粗さの改善 が実現されることがわかった。From these results, it was found that the irradiation of the excimer laser light realizes 1) removal of contaminants, ablation of organic substances, 2) improvement of bondability, formation of diffusion layer, and improvement of surface roughness.
【0014】もちろん、この発明の方法は、以上の例に
よって限定されるものではない。その細部の態様におい
てさらに様々な構成が可能であることは言うまでもな
い。Of course, the method of the present invention is not limited to the above examples. It goes without saying that further various configurations are possible in the aspect of the details.
【0015】[0015]
【発明の効果】この発明は、以上の通り、PGAをはじ
めとする各種の電子部品のノンフロン清浄化として優れ
た品質の清浄化を可能とし、電子部品の性能信頼性を大
きく向上させることができる。As described above, the present invention enables the cleaning of excellent quality as non-CFC cleaning of various electronic parts such as PGA, and can greatly improve the performance reliability of the electronic parts. ..
【図1】この発明の実施例を例示した構成図である。FIG. 1 is a configuration diagram illustrating an embodiment of the present invention.
【図2】電子部品の一例としてのPGAを示した斜視図
である。FIG. 2 is a perspective view showing a PGA as an example of an electronic component.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 // H01G 13/00 9174−5E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location // H01G 13/00 9174-5E
Claims (1)
を照射して清浄化することを特徴とする電子部品の清浄
化方法。1. A method for cleaning an electronic component, which comprises irradiating a contaminated portion of the electronic component with excimer laser light for cleaning.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4100010A JPH05299402A (en) | 1992-04-20 | 1992-04-20 | Method of cleaning electronic conponent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4100010A JPH05299402A (en) | 1992-04-20 | 1992-04-20 | Method of cleaning electronic conponent |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05299402A true JPH05299402A (en) | 1993-11-12 |
Family
ID=14262594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4100010A Pending JPH05299402A (en) | 1992-04-20 | 1992-04-20 | Method of cleaning electronic conponent |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05299402A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09161931A (en) * | 1995-12-12 | 1997-06-20 | Hitachi Chem Co Ltd | Reworking method |
JP2007181830A (en) * | 1996-08-14 | 2007-07-19 | Commiss Energ Atom | Process and apparatus for cleaning or decontaminating object by ultraviolet laser beam |
JP2009021595A (en) * | 2008-07-08 | 2009-01-29 | Hitachi Chem Co Ltd | Rework method |
-
1992
- 1992-04-20 JP JP4100010A patent/JPH05299402A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09161931A (en) * | 1995-12-12 | 1997-06-20 | Hitachi Chem Co Ltd | Reworking method |
JP2007181830A (en) * | 1996-08-14 | 2007-07-19 | Commiss Energ Atom | Process and apparatus for cleaning or decontaminating object by ultraviolet laser beam |
JP2009021595A (en) * | 2008-07-08 | 2009-01-29 | Hitachi Chem Co Ltd | Rework method |
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