JPH0529473Y2 - - Google Patents
Info
- Publication number
- JPH0529473Y2 JPH0529473Y2 JP1986036143U JP3614386U JPH0529473Y2 JP H0529473 Y2 JPH0529473 Y2 JP H0529473Y2 JP 1986036143 U JP1986036143 U JP 1986036143U JP 3614386 U JP3614386 U JP 3614386U JP H0529473 Y2 JPH0529473 Y2 JP H0529473Y2
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- film
- mask
- pellicle body
- antireflection layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986036143U JPH0529473Y2 (cs) | 1986-03-14 | 1986-03-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986036143U JPH0529473Y2 (cs) | 1986-03-14 | 1986-03-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62149043U JPS62149043U (cs) | 1987-09-21 |
| JPH0529473Y2 true JPH0529473Y2 (cs) | 1993-07-28 |
Family
ID=30846274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986036143U Expired - Lifetime JPH0529473Y2 (cs) | 1986-03-14 | 1986-03-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0529473Y2 (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE122477T1 (de) * | 1989-09-06 | 1995-05-15 | Du Pont | Nichtreflektierende filmabdeckung. |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60237450A (ja) * | 1984-05-11 | 1985-11-26 | Asahi Chem Ind Co Ltd | 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 |
-
1986
- 1986-03-14 JP JP1986036143U patent/JPH0529473Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62149043U (cs) | 1987-09-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2024618A1 (en) | Amorphous fluoropolymer pellicle films | |
| JPH0529473Y2 (cs) | ||
| JPH0529474Y2 (cs) | ||
| JPS6344824Y2 (cs) | ||
| JP2550281Y2 (ja) | ペリクル用フレーム | |
| EP0517923A4 (en) | Method of forming minute resist pattern | |
| JP2000305255A (ja) | フッ素エキシマレーザーリソグラフィー用ペリクル | |
| JPH049061A (ja) | 高光線透過性防塵体 | |
| JP4492892B2 (ja) | ホログラムの製造方法 | |
| JPH03263046A (ja) | フォトマスク用ペリクル | |
| JPS5570845A (en) | Projection type mask transfer method and mask used for said method | |
| JPH09319071A (ja) | リソグラフィー用ペリクル | |
| JPS6250758A (ja) | パタ−ン形成方法 | |
| JPH0493945A (ja) | フォトマスク | |
| JPS6381352A (ja) | 光学マスク | |
| JPS5655950A (en) | Photographic etching method | |
| JPS61137948U (cs) | ||
| JPS6154211B2 (cs) | ||
| JPS5550627A (en) | Mask for lithography | |
| JPS6326821Y2 (cs) | ||
| JPH03276154A (ja) | 高光線透過性防塵体の製造方法 | |
| JPS63309954A (ja) | 半導体装置製造用マスク | |
| JPS57124485A (en) | Solid image pickup element | |
| JPS60104840U (ja) | フオトマスク | |
| JPH02166449A (ja) | 露光用マスク |