JPH0528920A - Polishing device for cathode-ray tube - Google Patents

Polishing device for cathode-ray tube

Info

Publication number
JPH0528920A
JPH0528920A JP18127091A JP18127091A JPH0528920A JP H0528920 A JPH0528920 A JP H0528920A JP 18127091 A JP18127091 A JP 18127091A JP 18127091 A JP18127091 A JP 18127091A JP H0528920 A JPH0528920 A JP H0528920A
Authority
JP
Japan
Prior art keywords
polishing
ray tube
cathode
buff
cathode ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18127091A
Other languages
Japanese (ja)
Inventor
Minoru Nomichi
穣 野道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP18127091A priority Critical patent/JPH0528920A/en
Publication of JPH0528920A publication Critical patent/JPH0528920A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a cathode-ray tube polishing device whose maintainance is so easy that workability and economicity are enhanced. CONSTITUTION:A rotary polishing jig 3 and a pressurizing mechanism 4 are on the respective portions of the base 2 of a polishing machine 1. A polishing buff 7 is freely rotatably mounted on the rotary polishing jig 3 via a shaft 5 and a joint mechanism 6. The polishing buff 7 is formed by stainless felt. A conveying mechanism 8 is disposed below the polishing buff 7. The conveying mechanism 8 has an opening for positioning and holding and a cathode-ray tube T is held in the opening with the panel surface P of the cathode-ray tube T upward and a funnel F downward. An explosion-proof reinforcing band B is provided around the cathode-ray tube T. The polishing buff 7 impregnated with an aqueous solution of abrasives is lowered until it is made to abut on the panel surface P of the cathode-ray tube T on the conveying mechanism 8 by the pressurizing mechanism 4, and the cathode-ray tube is pressurized and polished while the buff 7 is brought into sealing contact therewith by the joint mechanism 6.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ブラウン管の製造工程
において、ブラウン管のパネル表面を研磨するブラウン
管の研磨装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cathode ray tube polishing apparatus for polishing a panel surface of a cathode ray tube in a cathode ray tube manufacturing process.

【0002】[0002]

【従来の技術】ブラウン管のパネル表面に、たとえば反
射防止膜、帯電防止膜などの導電性被膜を被膜形成する
場合、あるいは、安全ガラスを接着する場合に、あらか
じめブラウン管のパネル表面を洗浄して汚れのない状態
にする必要がある。
2. Description of the Related Art When a conductive film such as an antireflection film or an antistatic film is formed on the surface of a cathode ray tube, or when a safety glass is adhered, the surface of the cathode ray tube is cleaned and dirty in advance. Need to be free.

【0003】このように、ブラウン管の表面を洗浄する
装置としては、たとえば特公平3−30237号公報記
載の構成が知られている。この特公平3−30237号
公報記載の装置は、パネルを下方に向けた状態でブラウ
ン管を保持し、複数の研磨治具である動植物製のバフで
ブラウン管のパネルを洗浄し、パネル全面を均一に洗浄
するとともに、洗浄液がブラウン管のファンネルに回り
込まないようにしたものである。
As a device for cleaning the surface of the cathode ray tube as described above, for example, the structure described in Japanese Patent Publication No. 30237/1990 is known. The device disclosed in this Japanese Patent Publication No. 3-30237 holds a cathode ray tube with the panel facing downward, and cleans the cathode ray tube panel with a plurality of polishing jigs of animal and plant buffs to make the entire panel uniform. The cleaning solution is used to prevent the cleaning solution from flowing into the funnel of the cathode ray tube.

【0004】そして、一般に、酸化セリウムなどの光学
ガラス用研磨剤に、水、または、水、界面活性剤および
薬品などを加えて研磨液を作成し、この研磨液を処理
面、または、バフに塗布して研磨を行なっている。
Then, generally, water, or water, a surfactant and chemicals are added to an abrasive for optical glass such as cerium oxide to prepare a polishing liquid, and the polishing liquid is applied to a treated surface or a buff. It is applied and polished.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上述の
装置の場合、バフは動植物製であるため磨耗による耐久
性が低く交換頻度が高いため、メインテナンスが煩雑で
作業性、経済性が悪い問題を有している。
However, in the case of the above-mentioned device, since the buff is made of plants and animals, it has a low durability due to abrasion and a high replacement frequency. Therefore, there is a problem that maintenance is complicated and workability and economy are poor. is doing.

【0006】本発明は、上記問題点に鑑みなされたもの
で、メインテナンスが容易で作業性、経済性が向上する
ブラウン管の研磨装置を提供することを目的とする。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a CRT polisher which is easy to maintain and improves workability and economy.

【0007】[0007]

【課題を解決するための手段】本発明は、ブラウン管の
パネル表面を回転式研磨治具にて研磨するブラウン管の
研磨装置において、前記回転式研磨治具は、光学ガラス
用研磨剤の水溶液を含浸させたステンレス製フェルトに
て形成した研磨手段を有するものである。
According to the present invention, there is provided an apparatus for polishing a cathode ray tube for polishing a panel surface of a cathode ray tube with a rotary polishing jig, wherein the rotary polishing jig is impregnated with an aqueous solution of an abrasive for optical glass. It has a polishing means formed from the above-mentioned stainless steel felt.

【0008】[0008]

【作用】本発明は、回転式研磨治具の研磨手段をステン
レス製フェルトにて構成することにより、耐久性を向上
させて交換頻度を低くし、光学ガラス用研磨剤の水溶液
をステンレス性のフェルトに含浸させることにより、水
溶液の液だれを防止し、メインテナンスが容易で、作業
性、経済性が向上する。
According to the present invention, the polishing means of the rotary polishing jig is made of stainless steel felt to improve durability and reduce the frequency of replacement, and the aqueous solution of the polishing agent for optical glass is made of stainless steel felt. By impregnating the solution with water, dripping of the aqueous solution is prevented, maintenance is easy, and workability and economy are improved.

【0009】[0009]

【実施例】以下、本発明のブラウン管の研磨装置の一実
施例を図面を参照して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a cathode ray tube polishing apparatus of the present invention will be described below with reference to the drawings.

【0010】図1および図2において、1は研磨機で、
この研磨機1の基体2には、回転式研磨治具3および加
圧機構4が取り付けられている。そして、回転式研磨治
具3には、シャフト5およびジョイント機構6を介して
研磨手段としての研磨バフ7が回転自在に取り付けられ
ている。なお、この研磨バフ7は、ステンレス製フェル
トにて形成されている。
In FIGS. 1 and 2, 1 is a polishing machine,
A rotary polishing jig 3 and a pressure mechanism 4 are attached to a base 2 of the polishing machine 1. A polishing buff 7 as polishing means is rotatably attached to the rotary polishing jig 3 via a shaft 5 and a joint mechanism 6. The polishing buff 7 is made of stainless felt.

【0011】さらに、研磨バフ7の下方には、搬送機構
8が配設されている。この搬送機構8は、位置決め保持
用の開口が形成され、この開口にはブラウン管Tがパネ
ル表面Pを上方に向け、ファンネルFを下方に向けて保
持されており、このブラウン管Tの周囲には、防爆用補
強バンドBが設けられている。
Further, a transfer mechanism 8 is arranged below the polishing buff 7. An opening for positioning and holding is formed in the transport mechanism 8, and a cathode ray tube T is held in this opening with the panel surface P facing upward and the funnel F facing downward, and around the cathode ray tube T. An explosion-proof reinforcing band B is provided.

【0012】また、図3において、11は含浸機構で、こ
の含浸機構11は研磨バフ7に研磨剤の水溶液を含浸させ
る上方が開口された受皿12を有している。この研磨剤の
水溶液は、酸化セリウムなどの光学ガラス用研磨剤に、
水、または、水、界面活性剤および薬品などを加えたも
のを用いる。受皿12の下面には、開口部13が形成され、
この開口部13には供給用の配管14が背面に接続されてい
る。一方、15はタンクで、このタンク15には撹拌機構16
が設けられ、このタンク15はバルブ17および定量供給用
のチュービングポンプ18を介して配管14に接続されてい
る。
Further, in FIG. 3, 11 is an impregnation mechanism, and this impregnation mechanism 11 has a tray 12 having an upper opening for impregnating the polishing buff 7 with an aqueous solution of an abrasive. An aqueous solution of this polishing agent can be used as a polishing agent for optical glass such as cerium oxide.
Use water or one to which water, a surfactant and chemicals have been added. An opening 13 is formed on the lower surface of the saucer 12,
A supply pipe 14 is connected to the rear surface of the opening 13. On the other hand, 15 is a tank, and this tank 15 has a stirring mechanism 16
This tank 15 is connected to the pipe 14 via a valve 17 and a tubing pump 18 for constant quantity supply.

【0013】さらに、図4において、21は拭取り装置
で、この拭取り装置21は、対向して配置されたエアブロ
ー機構22,23を有しており、一方のエアブロー機構22は
複数のノズル24を備え、これらノズル24の先端から高圧
の空気を、ブラウン管Tのパネル表面Pに噴出するよう
になっている。また、他方のエアブロー機構23は、パイ
プ25に複数の空気噴出孔26が穿孔され、この空気噴出孔
26からノズル24に対向する方向からブラウン管Tのパネ
ル表面Pに高圧の空気を噴出する。
Further, in FIG. 4, reference numeral 21 is a wiping device, and this wiping device 21 has air blow mechanisms 22 and 23 arranged to face each other, and one air blow mechanism 22 has a plurality of nozzles 24. The high-pressure air is jetted from the tip of these nozzles 24 to the panel surface P of the cathode ray tube T. In the other air blow mechanism 23, a plurality of air ejection holes 26 are formed in the pipe 25, and the air ejection holes 26
High-pressure air is jetted from 26 toward the panel surface P of the cathode ray tube T from the direction facing the nozzle 24.

【0014】そして、他方のエアブロー機構23は、移動
板31に取り付けられ、この移動板31は吸引用の開口32を
有し、この開口32の上部には、下面が開口32に対応する
開口が形成された箱状の真空吸引フード33が取り付けら
れ、この真空吸引フード33内の空気は排気口34から排気
され、開口32から負圧により吸引するようになってい
る。
The other air blow mechanism 23 is attached to a moving plate 31, and this moving plate 31 has an opening 32 for suction, and an opening whose lower surface corresponds to the opening 32 is provided above the opening 32. The formed box-shaped vacuum suction hood 33 is attached, and the air in the vacuum suction hood 33 is exhausted from the exhaust port 34 and sucked from the opening 32 by negative pressure.

【0015】また、開口32に臨んで回転自在の素線径
0.3mmのナイロン製のロールブラシ35が設けられてい
る。このロールブラシ35はエアーモータ36から駆動機構
37を介して回転され、さらに、スイング機構38により上
下動自在になっている。なお、このロールブラシ35は、
研磨剤の付着を防止するため、帯電防止剤を20%含有
したものを用いている。
A roll brush 35 made of nylon and having a diameter of 0.3 mm is rotatably provided facing the opening 32. This roll brush 35 is driven by an air motor 36.
It is rotated via 37 and can be moved up and down by a swing mechanism 38. In addition, this roll brush 35,
In order to prevent the adherence of the abrasive, the one containing 20% of the antistatic agent is used.

【0016】そしてまた、移動板31は、モータ39により
ギア機構40を介して進退自在になっている。
Further, the moving plate 31 can be moved back and forth by a motor 39 via a gear mechanism 40.

【0017】次に、上記実施例の動作について説明す
る。
Next, the operation of the above embodiment will be described.

【0018】まず、図3に示すように、研磨バフ7を含
浸機構11の受皿12に挿入し、タンク15からチュービング
ポンプ18を介して、受皿12の下部の開口部13から研磨剤
の水溶液を所定量供給し、研磨バフ7に研磨剤の水溶液
を含浸させる。
First, as shown in FIG. 3, the polishing buff 7 is inserted into the tray 12 of the impregnation mechanism 11, and the aqueous solution of the abrasive is supplied from the tank 15 through the tubing pump 18 through the opening 13 at the bottom of the tray 12. A predetermined amount is supplied and the polishing buff 7 is impregnated with the aqueous solution of the polishing agent.

【0019】この研磨剤の水溶液を含浸させた状態の研
磨バフ7は、図1に示すように、加圧機構4により搬送
機構8上のブラウン管Tのパネル表面Pに当接するまで
下降させる。なお、このときの加圧力は、研磨バフ7の
直径が100mmの場合、全体で3〜10kgとする。そし
て、ジョイント機構6により常に研磨バフ7をパネル表
面Pの曲面に合わせた状態で密着させた状態で、回転式
研磨治具3を回転させてパネル表面Pを加圧研磨する。
この研磨に際しては、研磨機1をたとえば図5に示すよ
うに、まず、前後方向に順次移動させ、次に、左右方向
に順次移動させ、最後に周回方向に移動させる。そし
て、終了すると加圧機構4により、研磨バフ7を上昇さ
せ、搬送機構8によりブラウン管Tを移動させる。
As shown in FIG. 1, the polishing buff 7 impregnated with the aqueous solution of the polishing agent is lowered by the pressing mechanism 4 until it comes into contact with the panel surface P of the cathode ray tube T on the transport mechanism 8. In addition, the pressing force at this time is 3 to 10 kg as a whole when the polishing buff 7 has a diameter of 100 mm. Then, the rotary buff 7 is always brought into close contact with the curved surface of the panel surface P by the joint mechanism 6, and the rotary polishing jig 3 is rotated to pressure-polish the panel surface P.
At the time of this polishing, as shown in FIG. 5, for example, the polishing machine 1 is first sequentially moved in the front-back direction, then sequentially moved in the left-right direction, and finally in the circumferential direction. Then, when completed, the pressing mechanism 4 raises the polishing buff 7, and the transport mechanism 8 moves the cathode ray tube T.

【0020】次に、拭取り装置21で、残留した研磨剤の
水溶液を拭き取る。
Next, the wiping device 21 wipes off the remaining aqueous solution of the abrasive.

【0021】まず、対向するエアブロー機構22,23から
圧縮空気を噴出し、ブラウン管Tのパネル表面Pの残留
した研磨剤の水溶液gを乾燥させる。そして、モータ39
により移動板31を移動させ、エアーモータ36によりロー
ルブラシ35を回転させる。なお、このときスイング機構
38により、ロールブラシ35をブラウン管Tのパネル表面
Pの曲面に押圧し、常に、ロールブラシ35がパネル表面
Pに密着するようにしておく。そして、ロールブラシ35
の回転によりパネル表面Pの乾燥された研磨剤を拭取
り、真空吸引フード33で研磨剤を吸引し、排気口34から
排出する。
First, compressed air is jetted from the opposing air blow mechanisms 22 and 23 to dry the aqueous solution g of the polishing agent remaining on the panel surface P of the cathode ray tube T. And the motor 39
The moving plate 31 is moved by, and the roll brush 35 is rotated by the air motor 36. At this time, the swing mechanism
The roll brush 35 is pressed against the curved surface of the panel surface P of the cathode ray tube T by the 38 so that the roll brush 35 is always in close contact with the panel surface P. And the roll brush 35
The dried abrasive on the surface P of the panel is wiped by the rotation of, and the abrasive is sucked by the vacuum suction hood 33 and discharged from the exhaust port 34.

【0022】上記実施例によれば、研磨バフ7にステン
レス製フェルトを用いているので、従来の樹脂製のもの
に比べ磨耗が少なく耐久性が上昇して、交換頻度が減少
し、効率が向上する。また、研磨バフ7に所定量の研磨
剤の水溶液を含浸させたので、ブラウン管Tと防爆用補
強バンドBとの間に入り込む不要の研磨剤の水溶液の入
り込みを防止できる。
According to the above-mentioned embodiment, since the felt made of stainless steel is used for the polishing buff 7, the wear is less than that of the conventional resin buff, the durability is increased, the replacement frequency is reduced, and the efficiency is improved. To do. Further, since the polishing buff 7 is impregnated with a predetermined amount of the aqueous solution of the polishing agent, it is possible to prevent the unnecessary aqueous solution of the polishing agent from entering between the cathode ray tube T and the explosion-proof reinforcing band B.

【0023】さらに、乾燥された研磨剤を真空吸引フー
ド33により吸引し、排気口34から排出するので、工程内
のクリーン度を向上することができる。
Furthermore, since the dried abrasive is sucked by the vacuum suction hood 33 and discharged from the exhaust port 34, the cleanliness in the process can be improved.

【0024】[0024]

【発明の効果】本発明のブラウン管の研磨装置によれ
ば、回転式研磨治具をステンレス製フェルトにて構成す
ることにより、耐久性を向上させて交換頻度を低くする
ことができ、光学ガラス用研磨剤の水溶液をステンレス
性のフェルトに含浸させることにより、水溶液の液だれ
を防止できるので、メインテナンスが容易で、作業性、
経済性を向上することができる。
According to the polishing apparatus for a cathode ray tube of the present invention, the rotary polishing jig is made of stainless felt, so that the durability can be improved and the frequency of replacement can be reduced. By impregnating a stainless felt with an aqueous solution of an abrasive, dripping of the aqueous solution can be prevented, so maintenance is easy and workability is improved.
Economic efficiency can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のブラウン管の研磨装置の一実施例の研
磨機を示す正面図である。
FIG. 1 is a front view showing a polishing machine of an embodiment of a polishing apparatus for a cathode ray tube according to the present invention.

【図2】同上側面図である。FIG. 2 is a side view of the same.

【図3】同上含浸機構を示す斜視図である。FIG. 3 is a perspective view showing the same impregnation mechanism.

【図4】同上拭取り装置を示す斜視図である。FIG. 4 is a perspective view showing the same wiping device.

【図5】同上研磨バフの研磨の軌跡を示す説明図であ
る。
FIG. 5 is an explanatory view showing a locus of polishing by the same polishing buff.

【符号の説明】[Explanation of symbols]

3 回転式研磨治具 7 研磨手段としての研磨バフ P パネル表面 T ブラウン管 3 Rotary polishing jig 7 Polishing buff as polishing means P Panel surface T CRT

Claims (1)

【特許請求の範囲】 【請求項1】 ブラウン管のパネル表面を回転式研磨治
具にて研磨するブラウン管の研磨装置において、 前記回転式研磨治具は、光学ガラス用研磨剤の水溶液を
含浸させたステンレス製フェルトにて形成した研磨手段
を有することを特徴としたブラウン管の研磨装置。
Claim: What is claimed is: 1. A cathode ray tube polishing apparatus for polishing a panel surface of a cathode ray tube with a rotary polishing jig, wherein the rotary polishing jig is impregnated with an aqueous solution of an abrasive for optical glass. A cathode ray tube polishing apparatus having polishing means formed of stainless steel felt.
JP18127091A 1991-07-22 1991-07-22 Polishing device for cathode-ray tube Pending JPH0528920A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18127091A JPH0528920A (en) 1991-07-22 1991-07-22 Polishing device for cathode-ray tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18127091A JPH0528920A (en) 1991-07-22 1991-07-22 Polishing device for cathode-ray tube

Publications (1)

Publication Number Publication Date
JPH0528920A true JPH0528920A (en) 1993-02-05

Family

ID=16097762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18127091A Pending JPH0528920A (en) 1991-07-22 1991-07-22 Polishing device for cathode-ray tube

Country Status (1)

Country Link
JP (1) JPH0528920A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4810190A (en) * 1979-02-28 1989-03-07 Maerz Ofenbau Ag Method and apparatus calcining mineral raw materials utilizing solid fuel
KR20010019607A (en) * 1999-08-28 2001-03-15 서두칠 Apparatus for lapping crt panel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4810190A (en) * 1979-02-28 1989-03-07 Maerz Ofenbau Ag Method and apparatus calcining mineral raw materials utilizing solid fuel
KR20010019607A (en) * 1999-08-28 2001-03-15 서두칠 Apparatus for lapping crt panel

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