JPH05288925A - Production of color filter - Google Patents

Abstract

PURPOSE:To provide the process for production of the color filter by which the high-resolution color filter to be used for a flat display of a liquid crystal display, etc., an imager, such as CCD or a color sensor, etc., can be obtained with good efficiency. CONSTITUTION:A photosensitive layer 13 formed on a transparent substrate 12 is exposed via a photomask 5 having patterns for a black matrix disposed in the state of tight contact with this photosensitive layer 13 to develop tacky adhesiveness in exposed parts 13a. A concealing powder material is stuck to the exposed parts 13a to form a black matrix 14. The photosensitive layer 13 is thereafter exposed via a photomask 6R having prescribed patterns from the rear surface of the transparent substrate 12 to develop the tacky adhesiveness in the exposed parts 13a. A colored powder material is then stuck to the exposed parts 13a to form the colored patterns. The color filter having the colored layers consisting of required plural colors of the colored patterns is obtd. by repeating the above-mentioned operations.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter, and more particularly to a color filter used in a flat display such as a liquid crystal display, an imager such as a CCD, or a color sensor with high accuracy and efficiency. The present invention relates to a well-obtained color filter manufacturing method.

[0002]

2. Description of the Related Art For example, an image pickup tube of a color video camera is equipped with a color filter having fine stripes of a plurality of colors formed on a transparent substrate.

Also in liquid crystal displays (LCDs), color filters are used in both the active matrix system and the simple matrix system in order to meet recent demands for colorization. For example, in an active matrix type liquid crystal display using thin film transistors (TFTs), three primary colors of red (R), green (G) and blue (B) are used as color filters, and R, G and B pixels are used. The liquid crystal operates as a shutter by turning on and off the electrodes corresponding to, and light is transmitted through each of the R, G, and B pixels to perform color display. Then, color mixing is visually performed on the retina based on the principle of additive color mixing in which liquid crystal shutters corresponding to pixels of two or more colors are opened and colors are mixed to make another color appear.

The color filter used as described above has hitherto been manufactured by using a method such as a dyeing method or a dispersion method. Here, the color filter is manufactured by the dyeing method, for example, as follows.

That is, a coating solution prepared by adding a photosensitizer such as dichromate to a hydrophilic resin such as gelatin, casein or polyvinyl alcohol is coated on a transparent glass substrate by a spin coating method or the like, and then a predetermined pattern is formed. The mask is used for exposure and development, and then dyed with a dye to form a first colored layer. After that, a dye-proof layer is provided on the first colored layer to prevent double dyeing, and then the second colored layer and the third colored layer are respectively formed in the same manner as the formation of the first colored layer. As a result, R, G,
It is possible to obtain a color filter provided with each colored layer of B.

Further, the manufacture of a color filter using the dispersion method is performed, for example, as follows. That is,
A photosensitive liquid in which a colorant such as an organic pigment or an inorganic pigment is dispersed in a transparent photosensitive resin is applied on a transparent glass substrate to form a photosensitive resin layer. Next, a mask having an opening pattern of a predetermined shape is placed on this photosensitive resin layer, and exposure and development are performed to form a first colored layer. Similarly, a second color layer and a third color layer are formed to obtain a color filter having R, G, and B color layers.

[0007]

However, in the dyeing method, a color filter having a wide variety of color tones and excellent in resolution can be obtained, but on the other hand, dyeing is performed so that the already colored portion is not dyed twice during dyeing. There is a problem that the process is complicated and the manufacturing cost is increased because it is necessary to take measures. Further, since a dye is used as the colorant, there is a problem that heat resistance, chemical resistance, light resistance and the like are poor.

Further, in the dispersion method, a fine pattern having high heat resistance and light resistance can be formed, but on the other hand, it is necessary to perform a photolithography process each time a color is changed, and the process is complicated. There is a problem that it is difficult to reduce the manufacturing cost.

From such a background, a printing method has been proposed as a method of manufacturing a color filter which enables cost reduction and mass production at the same time and also enables a large screen. Conventionally proposed printing methods include offset methods such as planographic offset printing and intaglio offset printing, screen printing methods, flexographic printing methods, and the like.

However, the printing method has a problem that the print shape is deteriorated due to the thickening and thinning of pixels, the generation of pinholes, and the like, and it is particularly difficult to reproduce a fine pattern. Also, especially because the thickness of the thin wire cannot be taken sufficiently,
For example, it is not suitable for manufacturing a color filter having a colored pattern such as a black matrix which is required to have a light shielding property. Therefore, when manufacturing a color filter having a high-quality black matrix,
It was necessary to form the black matrix by a costly chromium deposition method or the like. Furthermore, in the conventional printing method, when the ink is transferred from the blanket to the glass substrate, only a part of the ink is transferred, so that the splitting occurs in the ink layer and the ink surface after printing is not smooth. was there. Furthermore, since the process is unstable, there is a problem that when printing is continued, the print film thickness changes and the print shape deteriorates.

The present invention has been made in view of the above circumstances, and efficiently obtains a high-resolution color filter used for a flat display such as a liquid crystal display, an imager such as a CCD, or a color sensor. An object of the present invention is to provide a method of manufacturing a color filter that can be manufactured.

[0012]

In order to achieve such an object, the present invention develops tackiness by exposure in a method for producing a color filter comprising a colored layer having a colored pattern of a plurality of colors and a black matrix. After forming a photosensitive layer by applying a photosensitive substance to a transparent substrate, the photosensitive layer is exposed through a photomask having a black matrix pattern arranged so as to be in close contact with the photosensitive layer. A masking powder substance is attached to the exposed portion to form a black matrix, and then the photosensitive layer is exposed through a photomask having a predetermined pattern from the side opposite to the side of the transparent substrate where the photosensitive layer is formed. The step of forming a colored pattern by adhering a colored powder substance to the above was repeated for the required number of colors to form a colored layer.

[0013]

A photomask having a black matrix pattern is arranged in close contact with the photosensitive layer formed on the transparent substrate, and the photomask is exposed through the photomask to develop tackiness in the exposed portion. A black matrix is formed by attaching a masking powder substance to the exposed portion, and then the photosensitive layer is exposed from the back surface of the transparent substrate through a photomask having a predetermined pattern to develop tackiness in the exposed portion, A colored powder substance is adhered to the exposed portion to form a colored pattern, and by repeating this, a color filter having a colored layer having a required colored pattern of a plurality of colors is obtained. As described above, in forming the black matrix, since the photomask for the black matrix is brought into close contact with the photosensitive layer and exposed, the resolution of the formed black matrix is extremely good, and the formation of each colored pattern thereafter is performed. In this case, since the photomask is arranged on the back surface side of the transparent substrate and the exposure is performed from the back surface of the transparent substrate, the masking powder substance constituting the black matrix or the photomask for the coloring pattern in the tackiness developing portion of the photosensitive layer is formed. It is effectively prevented from adhering to the photomask, and the photomask for colored pattern can be protected. Then, it becomes possible to manufacture a color filter having a high resolution, and the manufacturing process can be simplified by reducing the manufacturing process of the color filter.

[0014]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view showing an example of an active matrix type liquid crystal display (LCD) using a color filter manufactured according to the present invention, and FIG. 2 is a schematic sectional view of the same. 1 and 2, the LCD 1 is a color filter 10 and a transparent glass substrate 2.
0 are opposed to each other with a sealant 30 interposed therebetween, and a liquid crystal layer 40 of twisted nematic (TN) liquid crystal having a thickness of about 5 to 10 μm is formed therebetween, and the color filter 10 is further provided.
The polarizing plates 50 and 51 are arranged outside the transparent glass substrate 20.

FIG. 3 is an enlarged partial sectional view of the color filter 10. The color filter 10 includes a transparent substrate 12 and a black matrix 14 formed on the transparent substrate 12.
A colored layer 16, a protective layer 18 provided so as to cover the black matrix 14 and the colored layer 16, and a transparent common electrode 19. The color filter 10 is arranged such that the transparent common electrode 19 is located on the liquid crystal layer 40 side. The colored layer 16 is composed of a red pattern 16R, a green pattern 16G, and a blue pattern 16B, and the array of each colored pattern is a mosaic array as shown in FIG. The arrangement of the coloring pattern is not limited to this, and may be a triangular arrangement, a stripe arrangement, or the like.

Display electrodes 22 are provided on the transparent glass substrate 20 so as to correspond to the respective colored patterns 16R, 16G and 16B, and each display electrode 22 has a thin film transistor (TFT) 24. A scanning line (gate electrode busbar) 26a and a data line 26b are arranged between the display electrodes 22 so as to correspond to the black matrix 14.

In the LCD 1 as described above, each of the colored patterns 16R, 16G and 16B constitutes a pixel, and the display electrode corresponding to each pixel is turned on and off while the illumination light is irradiated from the polarizing plate 51 side. The layer 40 operates as a shutter, and light is transmitted through each pixel of the colored patterns 16R, 16G, and 16B to perform color display.

The transparent substrate 12 of the color filter 10 is a rigid material such as quartz glass, Pyrex glass, or synthetic quartz plate, or a transparent resin film.
A flexible material having flexibility such as an optical resin plate can be used. Of these, Corning 7
059 glass is a material with a small coefficient of thermal expansion, has excellent dimensional stability and workability in high-temperature heat treatment, and since it is an alkali-free glass that does not contain an alkali component in the glass, it is a color filter for LCDs using an active matrix method. Suitable for

An example of manufacturing the color filter according to the present invention will be described with reference to FIGS. 4 and 5. First, a photosensitive material is coated on the transparent substrate 12 to have a thickness of 0.5 to 5 μm.
The photosensitive layer 13 having a certain degree is formed (FIG. 4A). next,
The photomask 5 for the black matrix is used as the photosensitive layer 1
3 is placed in close contact with the photosensitive layer 3, and the photosensitive layer 13 is exposed through the photomask 5 to develop the adhesiveness in the exposed portion 13a (FIG. 4 (B)). Then, after removing the photomask 5, a masking powder substance is sprayed on the photosensitive layer 13 to adhere the masking powder substance (FIG. 4C), and the masking powder substance is adhered to the exposed portion 13a as well as the excess powder substance. The hiding powder substance is blown off to form the black matrix 14 (FIG. 4 (D)).

Next, a photomask 6R for a red pattern is arranged on the back surface of the transparent substrate 12, and the photomask 6R is formed.
The photosensitive layer 13 is exposed to light to expose the exposed portion 13b (FIG. 4 (E)). Then, the red powder substance is sprayed on the photosensitive layer 13 to adhere the red powder substance (FIG. 5 (A)), and the red powder substance is adhered to the exposed portion 13b and the excess red powder substance is blown off. A red pattern 16R is formed (FIG. 5 (B)). Similarly, a photomask 6G for a green pattern is formed on the back surface of the transparent substrate 12.
And is exposed through this photomask 6G (see FIG.
(C)), a green pattern 16 is formed by applying a green powder substance.
G is formed (FIG. 5D). Furthermore, the transparent substrate 12
Arrange a blue pattern photomask 6B on the back surface of
Exposure through this photomask 6B (FIG. 5E),
A blue powder substance is deposited to form a blue pattern 16B (FIG. 5 (F)).

As described above, in the present invention, since the photomask 5 for the black matrix is brought into close contact with the photosensitive layer 13 and exposed when forming the black matrix 14, the resolution of the formed black matrix 14 is very good. Will be things. If the black matrix 14 is formed in a high resolution state, the resolution of the entire color filter is maintained in a high state even if the resolution of each color pattern formed thereafter is slightly reduced. Therefore, in forming each colored pattern, the photomask 6 is arranged on the back surface side of the transparent substrate 12, and the photosensitive layer 13 is exposed through the transparent substrate 12, whereby the concealing powder forming the black matrix 14 is formed. It is possible to effectively prevent the substance, or the tackiness-developing portion of the photosensitive layer, from adhering to the photomask 6 for coloring pattern, and the photomask 6 for coloring pattern can be protected.

In the above embodiment, the black matrix 1
Although the formation of 4 and the formation of the colored layer 16 are performed by the powder substance adhesion once, the powder substance adhesion may be performed twice or more.

The 1,4-dihydropyridine compounds shown below can be used as the photosensitive substance which exhibits tackiness upon exposure to light. 1,4-dihydropyridine compound: 2,6-dimethyl-4- (2'-nitrophenyl) -1,4-dihydropyridine-3,5-dicarboxylic acid dimethyl ester;
2,6-Dimethyl-4- (2'-nitrophenyl)-
1,4-Dihydropyridine-3,5-dicarboxylic acid diethyl ester; 2,6-dimethyl-4- (2'-nitro-4 ', 5'-dimethoxyphenyl) -1,4-dihydropyridine-3,5-dicarboxylic acid Acid diethyl ester; 2,6-dimethyl-4- (2'-nitrophenyl) -1,4-dihydropyridine-3,5-dicarboxylic acid diisopropyl ester; 2,6-dimethyl-4-
(2′-Nitrophenyl) -1,4-dihydropyridine-3,5-dicarboxylic acid di (β-ethoxyethyl) ester; 2,6-dimethyl-4- (2′-nitrophenyl) -1,4-dihydropyridine -3,5-Dicarboxylic acid 3-methyl-5-ethyl ester; 2,6-Dimethyl-4- (2'-nitrophenyl) -1,4-dihydropyridine-3,5-dicarboxylic acid 3-isopropyl-5
-Methyl ester; 2,6-dimethyl-4- (2'-
Nitrophenyl) -3-aceto-1,4-dihydropyridine-5-carboxylic acid ethyl ester; 2,6-dimethyl-4- (2'-nitrophenyl) -3,5-diaceto-1,4-dihydropyridine and 2 , 6-Dimethyl-4- (2'-nitrophenyl) -3,5-dicyano-
1,4-dihydropyridine.

Such a 1,4-dihydropyridine compound is, for example, 1 mol of an aliphatic or aromatic aldehyde,
It can be produced from 1 mol of ammonia and 2 mol of β-ketocarboxylic acid ester, β-ketocarboxylic acid nitrile or β-diketone according to the Hantzsch synthesis method.

As the photosensitive substance, in addition to the 1,4-dihydropyridine compound as shown above, various photosensitive diazonium salts such as DDMA represented by the following chemical formula can be used. it can.

[0026]

[Chemical 1] However, when a photosensitive diazonium salt is used as the photosensitive substance, the uniform distribution of the concealing powder substance or the colored powder substance in the exposed area is realized only when the exposure and the powder substance dispersion are performed in the presence of a fixed amount of water. It is possible. This requires expensive equipment to establish and control the humidity in the room and the time the air is exposed to the room.

The above-mentioned photosensitive substances may be used alone to form the photosensitive layer 13, or may be used by mixing with a binder. The mixing ratio with the binder is preferably about 0.2 to 9 parts by weight with respect to 1 part by weight of the binder. Binders used include polyacrylic acid esters and / or polymethacrylic acid esters, acrylic acid and / or methacrylic acid or copolymers of other acrylic monomers and / or vinyl monomers;
Copolymers of maleic anhydride, maleic acid and / or its styrene, or di- or semiesters of other vinyl monomers; polyvinyl chloride, its chlorinated products, polyvinylidene chloride, chlorinated polyethylene, etc. Chlorine-containing vinyl polymer or copolymer; styrene copolymer with polystyrene and maleic acid,
Ethylene copolymers with polyethylene and maleic acid, etc .; Synthetic rubbers based on butadiene, chloroprene, etc. and their copolymers with styrene, acrylonitrile, etc .; and high molecular weight polyethylene oxides or polyethers such as polyepichlorohydrin.

Further, the photosensitive material may contain a sensitizer, a stabilizer and the like. To apply the above-mentioned photosensitive substance on the transparent substrate 12, a known method such as a spin coating method can be used. The light source used for exposing the photosensitive layer 13 may be an ultra-high pressure mercury lamp, a xenon lamp, a fluorescent lamp or the like. Exposure dose is 50
It is preferably about 300 mJ / cm ² .

The concealing powder substance and the coloring powder substance include titanium oxide (TiO ₂ ), SiO ₂ , glass powder, carbon black, graphite, copper-phthalocyanines, azo dyes, metal powders such as aluminum, copper and iron or metal oxides. It is possible to use fine particles having a mean particle size of 30 μm or less, preferably 10 μm or less, using a binder.

As the binder, polystyrene homopolymer, hydrogenated styrene resin, styrene-isobutylene copolymer, styrene-butadiene copolymer, ABS
(Acrylonitrile / butadiene / styrene terpolymer), ASA or AAS (acrylonitrile / styrene / acrylate terpolymer), AS or S
AN (styrene-acrylonitrile copolymer), AAS
(Acrylonitrile / acrylic rubber / styrene terpolymer), ACS (acrylonitrile / chlorinated polyethylene / styrene terpolymer), AES (acrylonitrile / EVA / styrene terpolymer), styrene / P-chlorostyrene copolymer Polymer, styrene / propylene copolymer, styrene / butadiene crosslinked polymer, styrene / allyl alcohol copolymer, styrene / butadiene rubber emulsion, styrene / maleic acid ester copolymer,
Styrene / isobutylene copolymer (self-crosslinking type), styrene / maleic anhydride copolymer, styrene-3-N, N
Polystyrene resin such as propyl diethylaminoacrylate copolymer; polymethylmethacrylate, ethylmethacrylate, n-butylmethacrylate, glycidylmethacrylate, fluorine-containing acrylate, methylenemethacrylate / butylmethacrylate copolymer, acrylic acid Acrylic resin such as ethyl / acrylic acid copolymer; styrene / acrylic copolymer, styrene / diethylamino / ethyl methacrylate copolymer,
Styrene / butadiene / acrylic acid ester copolymer,
Styrene / butadiene copolymer, styrene / butadiene / chlorinated paraffin copolymer, styrene / methyl methacrylate copolymer, styrene / methyl methacrylate copolymer / styrene butyl methacrylate blend, styrene / n-butyl methacrylate , Styrene / diethylamino / ethyl methacrylate, styrene / methyl methacrylate / n-butyl acrylate (75: 5: 20), styrene / methyl methacrylate / butyl acrylate-N- (ethoxymethyl) acrylamide, styrene / glycidyl methacrylate,
Styrene / dimethylamino / ethyl methacrylate,
Styrene / butadiene / dimethyl / aminoethylmethacrylate (60: 26: 4), styrene / acrylic acid ester / maleic acid ester (terpolymer), styrene / methyl methacrylate / 2-ethylhexyl acrylate copolymer , Styrene / n-butyl acrylate /
Ethyl glycol methacrylate, styrene / n-butyl methacrylate / acrylic acid copolymer (59: 4)
0: 1), styrene / n-butyl methacrylate / maleic anhydride resin, styrene / butyl acrylate / isobutyl maleic acid half ester / divinylbenzene copolymer, styrene / n-butyl acrylate-4-hexafluorobutyl methacrylate copolymer Polymer, styrene-butadiene-acrylate copolymer (59:36:
A styrene / (meth) acrylic acid ester copolymer such as the emulsion of 5) can be used.

Additives such as wetting agents and antistatic agents may be added to the binder. The hiding powder substance may be powder of metal, carbon black, graphite or the like directly without using a binder. in this case,
The metal powder preferably has an average particle size of 1 μm or less, and the carbon black powder and the graphite powder preferably have an average particle size of 3 μm or less.

Further, heat treatment (150 ° C. or higher, preferably 250 ° C. or higher) may be performed after the black matrix 14 and the colored layer 16 are formed. By such heat treatment, the photosensitive substance of the photosensitive layer 13 is removed by sublimation, and the surface smoothness of the black matrix 14 and the coloring layer 16 is improved. In particular, when the photosensitive layer 13 is provided on the entire surface of the transparent substrate 12 to form the black matrix 14 and the colored layer 16, the photosensitive layer 13 is also present in the peripheral portion of the obtained color filter. Peeling may occur from the part. In such a case, it is extremely effective to sublimate and remove the photosensitive substance of the photosensitive layer 13 by the above heat treatment.

A protective layer 18 provided so as to cover the black matrix 14 and the colored layer 16 of the color filter 10.
Is for smoothing the surface of the color filter 10, improving reliability,
Also, the purpose is to prevent contamination of the liquid crystal layer 40 and the like, and it can be formed using a transparent resin such as an acrylic resin, an epoxy resin, a polyimide resin, or a transparent inorganic compound such as silicon dioxide. .. The thickness of the protective layer is preferably about 0.2 to 50 μm.

As the transparent common electrode 19, an indium tin oxide (ITO) film can be used. The ITO film can be formed by a known method such as a vapor deposition method or a sputtering method, and the thickness thereof is preferably about 200 to 2000Å.

Next, the present invention will be described in more detail with reference to experimental examples. (Experimental example 1) First, in 2-butanone 200 cm ³ ,
6-dimethyl-4- (2'-nitrophenyl) -1,4
-7.5 g of dimethyl ester of dihitropyridine-3,5-dicarboxylic acid and 2,6-dimethyl-4- (2'-
Nilophenyl) -1,4-dihydropyridine-3,5-
7.5 g of diethyl ester of dicarboxylic acid was dissolved to prepare a photosensitive substance that exhibits tackiness by exposure. Then, using Corning 7059 glass (thickness = 1.1 mm) as a transparent substrate, the above-mentioned photosensitive substance is applied onto the transparent substrate by a spin coating method (rotation speed = 500 rpm) to form a photosensitive layer ( Thickness = 1.5 μm).

Next, a photomask for a black matrix was brought into close contact with the photosensitive layer, and UV exposure was performed through this photomask. An ultra-high pressure mercury lamp was used as a light source for exposure, and the irradiation amount was 200 mJ at a wavelength of 365 nm.
/ Cm ² . It was confirmed that such an ultraviolet exposure exposed the adhesive to the region of the photosensitive layer that was exposed to the ultraviolet.

Next, after removing the photomask for the black matrix, black toner (MB-15 Black SHC-15 (Sekisui Kasei Kogyo MB-15 Black SHC-15 (sample), average particle size = 14.2 μm) is formed on the entire surface of the photosensitive layer. ) Was sprayed, and the black toner in the non-adhesive portion was blown off by compressed air. As a result, the black toner adhered only to the region where the tackiness was developed by the above-mentioned UV exposure, and the black matrix pattern was formed. The black toner blown off (removed) by the compressed air in this step is
It can be recovered and used again. The resolution at this time was 10 μm in line and space.

Next, a photomask for a red pattern was disposed in close contact with the back surface of the transparent substrate, and UV exposure was performed from the transparent substrate side to a predetermined position through the photomask.
The ultraviolet exposure conditions were the same as the above exposure. Then, as in the case of the black toner, the red toner (MB-8 Red 50 manufactured by Sekisui Plastics Co., Ltd. (sample), average particle size = 8.7).
micron), and the red toner in the non-adhesive portion was blown off by compressed air to form a red pattern.

Next, a photomask for a green pattern is arranged in close contact with the back surface of the transparent substrate on which the black toner and the red toner are adhered, and the transparent substrate side is exposed to ultraviolet rays through the photomask. The green toner (MB-8 Green HC manufactured by Sekisui Plastics Co., Ltd. (sample),
A green pattern was formed by adhering a green toner using the average particle diameter = 8.1 μm).

Further, a photomask for a blue pattern is disposed in close contact with the back surface of the transparent substrate on which the black toner, the red toner and the green toner are attached, and the photomask is placed at a predetermined position from the transparent substrate side through this photomask. UV exposure is performed and blue toner (MB-8 Blue H manufactured by Sekisui Plastics Co., Ltd.
C (sample), average particle size = 8.9 μm) was used to adhere blue toner to form a blue pattern. As a result, a colored layer having a colored pattern of red (R), green (G), and blue (B) was formed.

No toner adhesion or photosensitive layer adhesion was found on the photomask for each colored pattern used in the above steps, and repeated use was possible. next,
A protective layer was formed so as to cover such a colored layer. This protective layer was formed by spin coating using Optomer SS manufactured by Japan Synthetic Rubber Co., Ltd., and had a thickness of about 25 μm. Further, a thickness of about 2 is formed on the protective layer by the sputtering method.
A 20 Å transparent common electrode (ITO film) was formed to obtain a color filter. (Experimental Example 2) In the same manner as in Experimental Example 1, a black matrix and a colored layer having a red (R), green (G), and blue (B) colored pattern were formed, and then heat treatment was performed at 270 ° C for 30 minutes. After that, a protective layer and a transparent common electrode (ITO film) were formed in the same manner as in Experimental Example 1 to obtain a color filter. In this color filter, the photosensitive layer was removed by sublimation, and the surface smoothness of the black matrix and the coloring layer was more improved than that of the color filter obtained in Experimental Example 1 above. (Comparative Experimental Example 1) A color filter was obtained in the same manner as in Experimental Example 1 except that the exposure was performed while the photomask was brought into close contact with the photosensitive layer in forming the colored layer. In this case, the toner and the photosensitive layer adhered to the photomask for each colored pattern. (Comparative Experimental Example 2) A color filter was obtained in the same manner as in Experimental Example 1 except that a photomask for a black matrix was arranged in close contact with the back surface of the transparent substrate and exposure was performed from the back surface side of the transparent substrate. In this case, the resolution of the obtained black matrix was 50 μm in line and space, which was inferior to the color filter obtained in Experimental Example 1.

[0042]

As described above in detail, according to the present invention, a photomask for a black matrix is brought into close contact with a photosensitive layer for exposure in the formation of a black matrix. Therefore, the resolution of the formed black matrix is very good. In the subsequent formation of each colored pattern, since a photomask is arranged on the back surface side of the transparent substrate and the back surface of the transparent substrate is exposed, the masking powder substance or the photosensitive layer forming the black matrix is formed. It is possible to effectively prevent the tackiness developing part of the film from adhering to the photomask for the coloring pattern, and it becomes possible to protect the photomask for the coloring pattern. Furthermore, it becomes possible to manufacture a color filter with high resolution, and at the same time, the color filter The process can be simplified and the manufacturing cost can be reduced.

[Brief description of drawings]

FIG. 1 is a perspective view showing an example of an active matrix liquid crystal display using a color filter manufactured according to the present invention.

FIG. 2 is a schematic cross-sectional view of the liquid crystal display shown in FIG.

FIG. 3 is an enlarged partial sectional view of a color filter used in the liquid crystal display shown in FIG.

FIG. 4 is a process drawing for explaining the method of manufacturing a color filter according to the present invention.

FIG. 5 is a process drawing for explaining the manufacturing method of the color filter according to the present invention.

[Explanation of symbols]

 5 ... Photomask for black matrix 6 ... Photomask for coloring pattern 10 ... Color filter 12 ... Transparent substrate 13 ... Photosensitive layer 14 ... Black matrix 16 ... Coloring layer 16R, 16G, 16B ... Coloring pattern

Claims (3)

[Claims] 1. A method for producing a color filter comprising a colored layer having a colored pattern of a plurality of colors and a black matrix, wherein a photosensitive substance exhibiting adhesiveness upon exposure is applied onto a transparent substrate to form a photosensitive layer. After that, the photosensitive layer is exposed through a photomask having a black matrix pattern arranged so as to be in close contact with the photosensitive layer, and a masking powder substance is attached to the exposed portion to form a black matrix, and , A step of forming a colored pattern by exposing the photosensitive layer from the side opposite to the photosensitive layer forming side of the transparent substrate through a photomask having a predetermined pattern and adhering a colored powder substance to the exposed portion to form a colored pattern. A method for producing a color filter, which comprises repeatedly forming a colored layer for several minutes. 2. The method for producing a color filter according to claim 1, wherein heat treatment is performed after the black matrix and the colored layer are formed. 3. The method of manufacturing a color filter according to claim 1, wherein the photosensitive material is a 1,4-dihydropyridine compound.