JPH05277413A - Ultrasonic atomizing device - Google Patents

Ultrasonic atomizing device

Info

Publication number
JPH05277413A
JPH05277413A JP10861692A JP10861692A JPH05277413A JP H05277413 A JPH05277413 A JP H05277413A JP 10861692 A JP10861692 A JP 10861692A JP 10861692 A JP10861692 A JP 10861692A JP H05277413 A JPH05277413 A JP H05277413A
Authority
JP
Japan
Prior art keywords
piezoelectric vibrator
intermittent
circuit
thin plate
atomizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10861692A
Other languages
Japanese (ja)
Other versions
JP2696455B2 (en
Inventor
Minoru Takahashi
実 高橋
Makoto Ono
小野  誠
Asako Yamamichi
朝子 山道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP4108616A priority Critical patent/JP2696455B2/en
Priority to EP92420449A priority patent/EP0546964B1/en
Priority to DE69218901T priority patent/DE69218901T2/en
Priority to US07/986,690 priority patent/US5312281A/en
Publication of JPH05277413A publication Critical patent/JPH05277413A/en
Application granted granted Critical
Publication of JP2696455B2 publication Critical patent/JP2696455B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0638Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced by discharging the liquid or other fluent material through a plate comprising a plurality of orifices
    • B05B17/0646Vibrating plates, i.e. plates being directly subjected to the vibrations, e.g. having a piezoelectric transducer attached thereto

Abstract

PURPOSE:To atomize a liquid by small power and to variably control the particle size of atomized particles by providing an exciting circuit for intermittently exciting a piezoelectric vibrator in duty of 70% or less to atomize a liquid by the intermittent ultrasonic vibration of the piezoelectric vibrator and providing a control circuit making the intermittent frequency of the exciting circuit variable. CONSTITUTION:An ultrasonic atomizing device is constituted by arranging a perforated or reticulated thin plate on the atomizing action surface of a piezoelectric vibrator TD so as to form a fine gap between at least a part of the thin plate and the atomizing action surface. An intermittent oscillation circuit 1 is provided as an exciting circuit intermittently exciting the piezoelectric vibrator TD in duty of 70% or less and the liquid spreading throughout the fine gap between the atomizing action surface and the thin plate is atomized by the intermittent ultrasonic vibration of the piezoelectric vibrator and the intermittent frequency of the intermittent oscillation circuit 1 is made variable by a control circuit 3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、小電力で小霧化量の吸
入器等の用途に適した超音波霧化装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrasonic atomizer suitable for use as an inhaler with a small amount of electric power and a small amount of atomization.

【0002】[0002]

【従来の技術】従来、図5に示すように、振動体 (ホー
ン)30の先端面に網状薄板31を載置し、振動体30
と網状薄板31の隙間に広がった液体を振動体30の超
音波振動で霧化する構成が、本出願人提案の実開平3−
15674号で示されている。この場合、振動体30の
振動周波数は20乃至200kHzであり (ランジュバン
型振動子と類似の構造であるため)、網状薄板31がな
い場合の理論発生粒径は約20〜40μmであるが、そ
の網状薄板31に形成された穴32の穴径を前記理論発
生粒径よりも小さく5〜30μmとして当該網状薄板3
1を発生粒径の小径化に利用していた。なお、理論発生
粒径dは次式(1)で示される。 d=0.34×(8πT/ρF2)1/3 …(1) (但し、T:液体の表面張力、ρ:液体の密度、F:駆動周波数)
2. Description of the Related Art Conventionally, as shown in FIG. 5, a reticulated thin plate 31 is placed on the front end surface of a vibrating body (horn) 30 to form a vibrating body 30.
The liquid spread in the gap between the mesh plate 31 and the net-like thin plate 31 is atomized by ultrasonic vibration of the vibrating body 30, which is proposed by the applicant.
No. 15674. In this case, the vibration frequency of the vibrating body 30 is 20 to 200 kHz (because it has a structure similar to that of the Langevin type vibrator), and the theoretical generated particle diameter without the mesh thin plate 31 is about 20 to 40 μm. The net diameter of the holes 32 formed in the net-like thin plate 31 is set to 5 to 30 μm which is smaller than the theoretically generated particle size.
1 was used to reduce the size of the generated particles. The theoretical particle size d is expressed by the following equation (1). d = 0.34 × (8πT / ρF 2 ) 1/3 (1) (where T: surface tension of liquid, ρ: density of liquid, F: drive frequency)

【0003】[0003]

【発明が解決しようとする課題】ところで、超音波霧化
装置を医療用吸入器として使用する場合、体の部位によ
り到達できる霧径が異なるが、従来の超音波霧化装置に
よる霧径は、振動体の振動周波数あるいは網状薄板の穴
径で固定的に決まってしまうため、要求される霧径が異
なる時は装置を変更又は交換する必要があった。
By the way, when the ultrasonic atomizer is used as a medical inhaler, the mist diameter that can be reached differs depending on the body part. Since the vibration frequency of the vibrating body or the hole diameter of the mesh thin plate is fixedly determined, it is necessary to change or replace the device when the required fog diameter is different.

【0004】本発明は、上記の点に鑑み、小電力で液体
の霧化が可能で、霧化粒子の粒径を可変制御可能な、吸
入器等の用途に適した超音波霧化装置を提供することを
目的とする。
In view of the above points, the present invention provides an ultrasonic atomizing device suitable for use as an inhaler, which is capable of atomizing a liquid with a small amount of electric power and variably controlling the particle size of atomized particles. The purpose is to provide.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するため
に、本発明の超音波霧化装置は、多孔乃至網状薄板を、
圧電振動子の霧化作用面側に配し、少なくとも前記薄板
の一部分と前記霧化作用面間に微小間隙が形成されるよ
うにし、前記圧電振動子をデューティー70%以下で間
欠に励振する励振回路を設けて前記霧化作用面と前記薄
板間の前記微小間隙に広がった液体を前記圧電振動子の
間欠的な超音波振動によって霧化するとともに、前記励
振回路の間欠周波数を可変とする制御回路を設けた構成
としている。
In order to achieve the above-mentioned object, an ultrasonic atomizing device of the present invention comprises a porous or reticulated thin plate,
An excitation for arranging the piezoelectric vibrator on the side of the atomizing surface so that a minute gap is formed at least between a part of the thin plate and the surface for atomizing, and exciting the piezoelectric vibrator intermittently at a duty of 70% or less. A circuit is provided to atomize the liquid spread in the minute gap between the atomizing surface and the thin plate by intermittent ultrasonic vibration of the piezoelectric vibrator, and to make the intermittent frequency of the excitation circuit variable. The circuit is provided.

【0006】[0006]

【作用】本発明の超音波霧化装置においては、励振回路
によって圧電振動子をデューティー70%以下で間欠励
振するので、圧電振動子の霧化作用面と多数の小径穴が
開口した薄板との間の微小間隙に広がった水等の液体を
霧化するのに必要十分な振幅の高周波電圧で圧電振動子
を駆動できる。また、間欠駆動であるため、単位時間当
たりの圧電振動子への入力電力を削減でき、圧電振動子
の発熱による劣化を回避することができる。さらに、制
御回路で前記励振回路の間欠周波数(例えば数Hz乃至数
10kHzの範囲)を変化させることで霧化粒子の粒径を
変えることができる。
In the ultrasonic atomizing device of the present invention, since the piezoelectric vibrator is intermittently excited by the exciting circuit at a duty of 70% or less, the atomizing surface of the piezoelectric vibrator and a thin plate having a large number of small diameter holes opened. The piezoelectric vibrator can be driven with a high-frequency voltage having an amplitude necessary and sufficient for atomizing a liquid such as water spread in a minute gap between them. Further, since the driving is intermittent, it is possible to reduce the input power to the piezoelectric vibrator per unit time and avoid deterioration due to heat generation of the piezoelectric vibrator. Furthermore, the particle size of atomized particles can be changed by changing the intermittent frequency (for example, in the range of several Hz to several tens kHz) of the excitation circuit by the control circuit.

【0007】[0007]

【実施例】以下、本発明に係る超音波霧化装置の実施例
を図面に従って説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of an ultrasonic atomizing device according to the present invention will be described below with reference to the drawings.

【0008】図1は本発明の実施例の回路構成を示し、
図2はこの実施例にて用いる圧電振動子の構造を示す。
これらの図において、1は圧電振動子TDを間欠的に励
振する励振回路としての間欠発振回路、2はDC−DC
コンバータであり、該DC−DCコンバータ2は3V乃
至6V程度の電池電源である直流電源Eの電圧を数十V
(例えば30V)程度に昇圧し、正側ラインP及び負側
ラインNを介して前記間欠発振回路1に供給するもので
ある。3は間欠発振回路の間欠周波数を可変とするため
の制御回路である。
FIG. 1 shows a circuit configuration of an embodiment of the present invention,
FIG. 2 shows the structure of the piezoelectric vibrator used in this embodiment.
In these figures, 1 is an intermittent oscillation circuit as an excitation circuit for intermittently exciting the piezoelectric vibrator TD, and 2 is DC-DC.
The DC-DC converter 2 is a converter, and the voltage of the DC power supply E, which is a battery power supply of about 3V to 6V, is several tens of
The voltage is boosted to about 30 V, for example, and is supplied to the intermittent oscillation circuit 1 via the positive side line P and the negative side line N. Reference numeral 3 is a control circuit for varying the intermittent frequency of the intermittent oscillation circuit.

【0009】前記間欠発振回路1はコレクタ接地型のト
ランジスタ発振回路であって、発振用トランジスタQ1
と、該トランジスタのベースバイアス電流を流すための
抵抗R1、可変抵抗VR及びスイッチ用トランジスタQ
2と、DC−DCコンバータ2の負側ラインNとトラン
ジスタQ1のエミッタとを結ぶインダクタL1,L2
と、正側及び負側ラインP,N間に接続されたコンデン
サC1と、インダクタL1,L2の接続点とトランジス
タQ1のコレクタ間に接続されたコンデンサC2と、イ
ンダクタL1,L2の接続点とトランジスタQ1のベー
ス間に接続されたコンデンサC3とを備え、圧電振動子
TDはコンデンサC4を介しトランジスタQ1のコレク
タ、ベース間に接続されている。
The intermittent oscillating circuit 1 is a collector grounded transistor oscillating circuit, and includes an oscillating transistor Q1.
And a resistor R1 for flowing a base bias current of the transistor, a variable resistor VR, and a switching transistor Q.
2 and inductors L1 and L2 connecting the negative line N of the DC-DC converter 2 and the emitter of the transistor Q1.
A capacitor C1 connected between the positive and negative lines P and N, a connection point between the inductors L1 and L2 and the collector of the transistor Q1, a connection point between the inductors L1 and L2 and a transistor The piezoelectric vibrator TD is connected between the collector and the base of the transistor Q1 via the capacitor C4.

【0010】前記制御回路3は、前記スイッチ用トラン
ジスタQ2に方形波のゲートパルスGPを印加するゲー
トパルス発生回路4、ゲートパルスGPのデューティー
を変化させるデューティー可変回路5及びゲートパルス
GPの周波数を変化させる周波数可変回路6を具備して
いる。この制御回路3は、前記周波数可変回路6の設定
を変化させることによって数Hz乃至数10Hzの周波数
のゲートパルスGPを発生でき、前記デューティー可変
回路5の設定を変化させることで数%乃至70%範囲で
前記ゲートパルスGPのデューティーを変化させること
ができる。
The control circuit 3 changes the frequency of the gate pulse generation circuit 4 for applying a square wave gate pulse GP to the switching transistor Q2, the duty variable circuit 5 for changing the duty of the gate pulse GP, and the gate pulse GP. The frequency variable circuit 6 is provided. The control circuit 3 can generate a gate pulse GP having a frequency of several Hz to several tens of Hz by changing the setting of the frequency variable circuit 6, and several% to 70% by changing the setting of the duty variable circuit 5. The duty of the gate pulse GP can be changed within the range.

【0011】前記間欠発振回路1は、前記制御回路3か
らのゲートパルスGPで前記スイッチ用トランジスタQ
2が導通している期間中、該スイッチ用トランジスタQ
2、可変抵抗VR及び抵抗R1の経路でベースバイアス
電流が発振用トランジスタQ1に流れ、圧電振動子TD
の共振点近傍の圧電振動子が誘導性となる周波数(例え
ば1.6MHzや2.4MHz)で自励発振可能なものであ
る。
The intermittent oscillation circuit 1 receives the gate pulse GP from the control circuit 3 and switches the switching transistor Q.
2 is conducting, the switching transistor Q
2, the base bias current flows to the oscillation transistor Q1 through the path of the variable resistor VR and the resistor R1, and the piezoelectric vibrator TD
The piezoelectric vibrator near the resonance point can self-oscillate at a frequency at which the piezoelectric vibrator becomes inductive (for example, 1.6 MHz or 2.4 MHz).

【0012】図3は前記間欠発振回路1の間欠発振波形
の1例を示す。この図において、間欠周期Dに対する発
振期間Donの比がデューティー (Don/D)となり、間
欠周波数 (1/D)をf、発振の振幅をAとしたとき、
圧電振動子TDへの入力電力Pは、理論的には f・ (Don/D)・A に正比例する。従って、間欠周波数f、デューティー
(Don/D)、入力電力Pを適切に設定することで、入
力電力Pを小さくし、かつ霧化に必要な振幅Aを確保す
ることができる。なお、前記制御回路3のゲートパルス
GPの周波数が間欠発振回路1の間欠発振波形の間欠周
波数(1/D)となり、ゲートパルスのデューティーと
Don/Dとが一致する。
FIG. 3 shows an example of the intermittent oscillation waveform of the intermittent oscillation circuit 1. In this figure, when the ratio of the oscillation period Don to the intermittent cycle D is duty (Don / D), the intermittent frequency (1 / D) is f, and the oscillation amplitude is A,
The input power P to the piezoelectric vibrator TD is theoretically directly proportional to f · (Don / D) · A. Therefore, intermittent frequency f, duty
By appropriately setting (Don / D) and the input power P, the input power P can be reduced and the amplitude A required for atomization can be secured. The frequency of the gate pulse GP of the control circuit 3 becomes the intermittent frequency (1 / D) of the intermittent oscillation waveform of the intermittent oscillation circuit 1, and the duty of the gate pulse and Don / D match.

【0013】前記圧電振動子TDは、図2に示すよう
に、圧電磁器の厚さ方向の共振による超音波振動を利用
するもので、円板状圧電磁器10の主面11及び反対面
12にそれぞれ電極13,14を形成したものである。
該圧電振動子TDはホルダ15に固定された弾性環状支
持体16で弾性支持される。圧電振動子TDの霧化作用
面 (主面上に電極を形成した面)20上には多数の微小
穴23が開口した多孔乃至網状薄板21が配設され、該
多孔乃至網状薄板21の端部は取付具22を介してホル
ダ15に固定されている。多数の微小穴23を有する多
孔乃至網状薄板21は少なくとも部分的に前記霧化作用
面20に対して微小間隙で対向するように湾曲した部分
で圧電振動子TDの前記霧化作用面20に接している。
このような多孔乃至網状薄板21は厚さ数10μm乃至
100μmのステンレス等の金属薄板であり、微小穴2
3の穴径は数μm乃至50μmである。なお、薄板21
の厚みが200μmを越えると、微小穴の加工が面倒で
あるし、霧化効率の点でも望ましくない。また、微小穴
23の径が80μmを越えると、霧化効率が低下すると
ともに霧化状態が不安定となり好ましくない。
As shown in FIG. 2, the piezoelectric vibrator TD utilizes ultrasonic vibration due to resonance in the thickness direction of the piezoelectric ceramic. The piezoelectric vibrator TD has a main surface 11 and an opposite surface 12 of the disk-shaped piezoelectric ceramic 10. The electrodes 13 and 14 are formed, respectively.
The piezoelectric vibrator TD is elastically supported by an elastic annular support 16 fixed to the holder 15. A perforated or reticulated thin plate 21 having a large number of minute holes 23 is disposed on an atomization surface 20 (a surface on which an electrode is formed on the main surface) of the piezoelectric vibrator TD, and an end of the perforated or reticulated thin plate 21. The part is fixed to the holder 15 via a fixture 22. The porous or reticulated thin plate 21 having a large number of minute holes 23 is in contact with the atomizing action surface 20 of the piezoelectric vibrator TD at a portion curved at least partially so as to face the atomizing action surface 20 with a minute gap. ing.
Such a porous or mesh thin plate 21 is a thin metal plate such as stainless steel having a thickness of several tens of μm to 100 μm, and has a small hole 2
The hole diameter of 3 is several μm to 50 μm. The thin plate 21
If the thickness exceeds 200 μm, the processing of fine holes is troublesome and it is not desirable in terms of atomization efficiency. If the diameter of the fine holes 23 exceeds 80 μm, the atomization efficiency decreases and the atomization state becomes unstable, which is not preferable.

【0014】なお、前記圧電振動子TDの霧化作用面2
0と多孔乃至網状薄板21間の微小間隙に霧化すべき液
体を適量供給するために給液手段 (液体を滴下する細管
や液体を毛細管現象で吸い上げて供給する吸液部材等)
25が設けられている。
The atomizing surface 2 of the piezoelectric vibrator TD
0 and a small amount of liquid to be atomized into the minute gap between the porous or net-like thin plate 21 (a thin tube for dropping the liquid or a liquid absorbing member for sucking up and supplying the liquid by a capillary phenomenon).
25 are provided.

【0015】以上の実施例の構成において、前記間欠発
振回路1のベースバイアス回路の可変抵抗VRを適切な
値に設定し、DC−DCコンバータ2の正、負側ライン
P,N間の出力直流電圧を、霧化動作が可能となるよう
な発振電圧波形の振幅Aを確保できる値にする (振幅A
がある程度以下では圧電振動子の霧化作用面での霧化が
全然行われなくなる)。このように間欠発振回路1の動
作状態を適切に設定し、制御回路3からデューティー7
0%以下のゲートパルスGPを印加すれば、間欠発振回
路1はゲートパルスで規定された間欠周波数及びデュー
ティーで間欠発振を行い、これにより圧電振動子TDの
圧電磁器10は厚み方向の共振による超音波振動を間欠
的に起こし、給液手段25から供給されて霧化作用面2
0と多孔乃至網状薄板21間の微小間隙に広がりさらに
各微小穴23に入った液体は、霧化作用面20の間欠的
な超音波振動にて霧化されて (微粒子となって)空中に
放出される。
In the configuration of the above embodiment, the variable resistance VR of the base bias circuit of the intermittent oscillation circuit 1 is set to an appropriate value, and the DC output between the positive and negative lines P, N of the DC-DC converter 2 is set. Set the voltage to a value that can secure the amplitude A of the oscillation voltage waveform that enables atomization (Amplitude A
There is no atomization on the atomizing surface of the piezoelectric vibrator below a certain level). In this way, the operating state of the intermittent oscillation circuit 1 is set appropriately, and the control circuit 3 sets the duty 7
When the gate pulse GP of 0% or less is applied, the intermittent oscillation circuit 1 intermittently oscillates at the intermittent frequency and the duty specified by the gate pulse, whereby the piezoelectric ceramic 10 of the piezoelectric vibrator TD is superposed by resonance in the thickness direction. Sonic vibration is caused intermittently, and the atomizing surface 2 is supplied by the liquid supply means 25.
0 and the liquid that has spread into the minute gap between the porous or mesh thin plate 21 and has entered each minute hole 23 is atomized by the intermittent ultrasonic vibration of the atomizing surface 20 (becomes fine particles) and goes into the air. Is released.

【0016】その際、間欠周波数(1/D)と空中に放
出された霧化粒子の平均粒径との関係は、実験の結果、
以下の表1の如くなった(但し、多孔乃至網状薄板21
の厚さ:40μm、穴径30μm)。
At that time, the relationship between the intermittent frequency (1 / D) and the average particle size of the atomized particles emitted in the air was found to be as a result of experiments.
The results are shown in Table 1 below (however, the porous or reticulated thin plate 21
Thickness: 40 μm, hole diameter 30 μm).

【0017】 このように、制御回路3のゲートパルスGPの周波数を
変化させて圧電振動子TDの間欠周波数を可変すること
で、発生する霧化粒子の粒径を可変制御できる。
[0017] In this way, the frequency of the gate pulse GP of the control circuit 3
Changing the intermittent frequency of the piezoelectric vibrator TD by changing it
Thus, the particle size of the atomized particles generated can be variably controlled.

【0018】図4は間欠発振回路1の出力波形のデュー
ティーと霧化動作中の圧電振動子TDの温度との関係を
示す。デューティーが70%以下であれば、圧電振動子
TDの温度は常に100℃を下まわるが、デューティー
が70%を越えると100℃に接近乃至これを上まわる
ようになり、圧電振動子TDの劣化現象が発生する恐れ
がでてくる。
FIG. 4 shows the relationship between the duty of the output waveform of the intermittent oscillation circuit 1 and the temperature of the piezoelectric vibrator TD during the atomizing operation. When the duty is 70% or less, the temperature of the piezoelectric vibrator TD always falls below 100 ° C., but when the duty exceeds 70%, it approaches or exceeds 100 ° C., and the piezoelectric vibrator TD deteriorates. There is a fear that a phenomenon will occur.

【0019】[0019]

【発明の効果】以上説明したように、本発明の超音波霧
化装置によれば、励振回路によって圧電振動子をデュー
ティー70%以下で間欠に励振して、圧電振動子と多孔
乃至網状薄板間の微小間隙に広がった液体を霧化する構
成としたので、圧電振動子を劣化させない程度の小さな
入力電力とした場合でも、圧電振動子に印加する間欠発
振出力電圧の振幅は霧化動作をするのに充分な大きさと
することが可能となり、小電力で効率的な霧化動作が可
能である。また、励振回路の間欠発振の間欠周波数を可
変制御するための制御回路を設けて、励振回路の間欠周
波数を変化させることにより、発生する霧化粒子の粒径
を可変制御可能であり、医療用吸入器等に使用すれば効
果が大きい。
As described above, according to the ultrasonic atomizing device of the present invention, the piezoelectric vibrator is intermittently excited by the exciting circuit at a duty of 70% or less, and the piezoelectric vibrator and the porous or mesh thin plate are separated. Since the liquid spread in the minute gap is atomized, the amplitude of the intermittent oscillation output voltage applied to the piezoelectric oscillator causes atomization even when the input power is small enough not to deteriorate the piezoelectric oscillator. Therefore, the size can be made sufficiently large, and the atomization operation can be efficiently performed with a small electric power. Further, by providing a control circuit for variably controlling the intermittent frequency of the intermittent oscillation of the excitation circuit and changing the intermittent frequency of the excitation circuit, the particle size of the atomized particles generated can be variably controlled. It is very effective when used as an inhaler.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る超音波霧化装置の実施例の回路構
成を示す回路図である。
FIG. 1 is a circuit diagram showing a circuit configuration of an embodiment of an ultrasonic atomizing device according to the present invention.

【図2】実施例における圧電振動子及び多孔乃至網状薄
板の配置を示す正断面図である。
FIG. 2 is a front sectional view showing the arrangement of a piezoelectric vibrator and a porous or net-like thin plate in an example.

【図3】間欠発振波形の1例を示す説明図である。FIG. 3 is an explanatory diagram showing an example of an intermittent oscillation waveform.

【図4】間欠発振波形のデューティーと霧化動作中の圧
電振動子の温度との関係を示すグラフである。
FIG. 4 is a graph showing the relationship between the duty of the intermittent oscillation waveform and the temperature of the piezoelectric vibrator during the atomizing operation.

【図5】従来の超音波霧化装置の要部構成を示す断面図
である。
FIG. 5 is a cross-sectional view showing a main configuration of a conventional ultrasonic atomizing device.

【符号の説明】[Explanation of symbols]

1 間欠発振回路 2 DC−DCコンバータ 3 制御回路 4 ゲートパルス発生回路 5 デューティー可変回路 6 周波数可変回路 10 圧電磁器 20 霧化作用面 21 多孔乃至網状薄板 23 微小穴 25 給液手段 C1乃至C4 コンデンサ L1,L2 インダクタ Q1,Q2 トランジスタ R1 抵抗 VR 可変抵抗 TD 圧電振動子 DESCRIPTION OF SYMBOLS 1 Intermittent oscillation circuit 2 DC-DC converter 3 Control circuit 4 Gate pulse generation circuit 5 Duty variable circuit 6 Frequency variable circuit 10 Piezoelectric ceramic 20 Atomizing action surface 21 Porous or mesh thin plate 23 Micro hole 25 Liquid supply means C1 to C4 Capacitor L1 , L2 inductor Q1, Q2 transistor R1 resistance VR variable resistance TD piezoelectric vibrator

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 多孔乃至網状薄板を、圧電振動子の霧化
作用面側に配し、少なくとも前記薄板の一部分と前記霧
化作用面間に微小間隙が形成されるようにし、前記圧電
振動子をデューティー70%以下で間欠に励振する励振
回路を設けて前記霧化作用面と前記薄板間の前記微小間
隙に広がった液体を前記圧電振動子の間欠的な超音波振
動によって霧化するとともに、前記励振回路の間欠周波
数を可変とする制御回路を設けたことを特徴とする超音
波霧化装置。
1. A piezoelectric or vibrator, wherein a porous or mesh thin plate is arranged on the atomizing surface side of a piezoelectric vibrator so that a minute gap is formed between at least a part of the thin plate and the atomizing surface. Is provided with an excitation circuit that excites intermittently at a duty of 70% or less to atomize the liquid spread in the minute gap between the atomizing surface and the thin plate by intermittent ultrasonic vibration of the piezoelectric vibrator, An ultrasonic atomizing device, comprising a control circuit for varying the intermittent frequency of the excitation circuit.
JP4108616A 1991-12-10 1992-04-01 Ultrasonic atomizer Expired - Fee Related JP2696455B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP4108616A JP2696455B2 (en) 1992-04-01 1992-04-01 Ultrasonic atomizer
EP92420449A EP0546964B1 (en) 1991-12-10 1992-12-07 An ultrasonic wave nebulizer
DE69218901T DE69218901T2 (en) 1991-12-10 1992-12-07 Ultrasonic atomizer
US07/986,690 US5312281A (en) 1991-12-10 1992-12-08 Ultrasonic wave nebulizer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4108616A JP2696455B2 (en) 1992-04-01 1992-04-01 Ultrasonic atomizer

Publications (2)

Publication Number Publication Date
JPH05277413A true JPH05277413A (en) 1993-10-26
JP2696455B2 JP2696455B2 (en) 1998-01-14

Family

ID=14489316

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4108616A Expired - Fee Related JP2696455B2 (en) 1991-12-10 1992-04-01 Ultrasonic atomizer

Country Status (1)

Country Link
JP (1) JP2696455B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999017888A1 (en) * 1997-10-06 1999-04-15 Omron Corporation Spray
WO2004075706A1 (en) * 2003-02-25 2004-09-10 Matsushita Electric Works, Ltd. Ultrasonic washing device
JP2007178082A (en) * 2005-12-28 2007-07-12 Matsushita Electric Ind Co Ltd Refrigerator
JP2008049230A (en) * 2006-08-22 2008-03-06 Tamura Seisakusho Co Ltd Atomizer
JP2013004383A (en) * 2011-06-17 2013-01-07 Fujikin Inc Electrochemical element
JP2014158965A (en) * 2007-08-31 2014-09-04 Pari Pharma Gmbh Pharmaceutical aerosols for nasal sinus drug delivery
JP2014212469A (en) * 2013-04-19 2014-11-13 東京計器株式会社 Microwave power oscillator and output control method

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5350512A (en) * 1976-10-19 1978-05-09 Tdk Electronics Co Ltd Method of atomization control in ultrasonic liquid atomizers
JPS53108613U (en) * 1977-02-07 1978-08-31
JPS54137320A (en) * 1978-04-18 1979-10-25 Matsushita Electric Ind Co Ltd Ultrasonic liquid atomizer
JPS5862411A (en) * 1981-10-12 1983-04-13 Matsushita Electric Ind Co Ltd Atomizer
JPS60227860A (en) * 1984-04-26 1985-11-13 Matsushita Electric Ind Co Ltd Atomizer
JP3015674U (en) * 1995-03-10 1995-09-05 浜須 秀夫 Potential therapy device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5350512A (en) * 1976-10-19 1978-05-09 Tdk Electronics Co Ltd Method of atomization control in ultrasonic liquid atomizers
JPS53108613U (en) * 1977-02-07 1978-08-31
JPS54137320A (en) * 1978-04-18 1979-10-25 Matsushita Electric Ind Co Ltd Ultrasonic liquid atomizer
JPS5862411A (en) * 1981-10-12 1983-04-13 Matsushita Electric Ind Co Ltd Atomizer
JPS60227860A (en) * 1984-04-26 1985-11-13 Matsushita Electric Ind Co Ltd Atomizer
JP3015674U (en) * 1995-03-10 1995-09-05 浜須 秀夫 Potential therapy device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999017888A1 (en) * 1997-10-06 1999-04-15 Omron Corporation Spray
US6273342B1 (en) 1997-10-06 2001-08-14 Omron Corporation Atomizer
WO2004075706A1 (en) * 2003-02-25 2004-09-10 Matsushita Electric Works, Ltd. Ultrasonic washing device
US7549429B2 (en) 2003-02-25 2009-06-23 Panasonic Electric Works Co., Ltd. Ultrasonic washing device
JP2007178082A (en) * 2005-12-28 2007-07-12 Matsushita Electric Ind Co Ltd Refrigerator
JP2008049230A (en) * 2006-08-22 2008-03-06 Tamura Seisakusho Co Ltd Atomizer
JP2014158965A (en) * 2007-08-31 2014-09-04 Pari Pharma Gmbh Pharmaceutical aerosols for nasal sinus drug delivery
JP2013004383A (en) * 2011-06-17 2013-01-07 Fujikin Inc Electrochemical element
JP2014212469A (en) * 2013-04-19 2014-11-13 東京計器株式会社 Microwave power oscillator and output control method

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