JPH05269308A - Equipment for clarifying and circulating liquid - Google Patents

Equipment for clarifying and circulating liquid

Info

Publication number
JPH05269308A
JPH05269308A JP10158592A JP10158592A JPH05269308A JP H05269308 A JPH05269308 A JP H05269308A JP 10158592 A JP10158592 A JP 10158592A JP 10158592 A JP10158592 A JP 10158592A JP H05269308 A JPH05269308 A JP H05269308A
Authority
JP
Japan
Prior art keywords
chamber
liquid
pores
foreign matter
partition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10158592A
Other languages
Japanese (ja)
Inventor
Tadashi Komachiya
正 小町谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP10158592A priority Critical patent/JPH05269308A/en
Publication of JPH05269308A publication Critical patent/JPH05269308A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To circulate clarified water while removing dust and a foreign matter such as a chip which are contained in used liquid. CONSTITUTION:The inside of a circulation tank 1 is partitioned into a plurality of chambers 4, 5 by a partition 2. A plurality of pores 7 are provided in the partition 2. Dirty liquid 3 containing dust and a foreign matter such as a chip is supplied to the chamber 4 through a dirty liquid feed pipe 8. Dirty liquid 3 in the chamber 4 is passed through the pores 7 of the partition 2 and flows into the chamber 5. At this time, the foreign matter in dirty liquid 3 is not passed through the pores 7 and remains in the chamber 4 as precipitate 11. The clarified liquid wherein the foreign matter has been removed flows into the chamber 5. The clarified liquid in the chamber 5 is sucked by a liquid feed pump 10 and sent to a working part through a liquid feed pipe 13.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、使用後の液体中に含ま
れる水分、塵埃、切粉等の異物を除去し、清浄した液体
を再び加工部に供給する液清浄循環装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid cleaning / circulating apparatus for removing foreign matters such as water, dust and chips contained in a used liquid and supplying the cleaned liquid again to a processing section.

【0002】[0002]

【従来の技術】従来、循環槽内を隔壁で複数の沈澱室に
区分し、沈澱室に液体を順次通過させて液体を清浄する
循環装置には、オーバーフロー方式及びオーバーフロー
とアンダーフローの組合わせ方式がある。図7は、新編
レンズプリズムの工作技術(中央化学社、昭和48年7
月1日、第2版発行)に記載されたオーバーフロー方式
のクーラントタンク40を示すもので、タンク40内
は、上部が空間を有するようにセパレーター41によっ
て、第1室から第4室42,43,44,45の沈澱室
に区切られている。そして、第1室42の上方に設けた
ドレーンパイプ46で運ばれたきた使用後の研削液は、
第1室でガラス切粉等の異物を沈澱させて第2室43に
入る。以後、ガラス切粉を沈澱させながら第3室44,
第4室(最終室)45に入り、ほぼ清浄された研削液4
7は、第4室45の上方に設けたクーラントポンプ48
によって、供給口49を経て再び研削面に運ばれる。図
8は、特公昭61−3626号公報に記載されたオーバ
ーフローとアンダーフローの組合せ方式の油循環装置5
0を示すもので、循環槽51内には、上下交互に空間を
有するように隔壁52が4枚設けられ、3室の沈澱室5
3,54,55が形成されている。そして、沈澱室53
の上方に設けた油入口56から入り、沈澱室53,5
4,55を順次通って塵埃等の異物を沈澱させた油57
は、沈澱室55の上方に設けたポンプ58に吸出されて
供給口59を経て再び加工部に供給される。
2. Description of the Related Art Conventionally, an overflow system or a combination of overflow and underflow systems has been used for a circulation system in which a circulation tank is divided into a plurality of precipitation chambers by partition walls and liquids are sequentially passed through the precipitation chambers to clean the liquids. There is. Figure 7 shows the new technology for lens prism fabrication (Chuo Kagaku, 7/48
1st month, 2nd edition issued), showing an overflow type coolant tank 40. Inside the tank 40, a separator 41 is provided so as to have a space in the upper part, from the first chamber to the fourth chamber 42, 43. , 44, 45 precipitation chambers. Then, the used grinding fluid carried by the drain pipe 46 provided above the first chamber 42 is
Foreign substances such as glass chips are precipitated in the first chamber and enter the second chamber 43. Thereafter, while precipitating the glass chips, the third chamber 44,
The fourth chamber (final chamber) 45 enters the grinding liquid 4 which is almost cleaned.
7 is a coolant pump 48 provided above the fourth chamber 45.
Is again conveyed to the grinding surface via the supply port 49. FIG. 8 shows an oil circulation device 5 of a combination type of overflow and underflow described in Japanese Patent Publication No. 61-2626.
In the circulation tank 51, four partition walls 52 are provided so as to alternately have upper and lower spaces, and three precipitation chambers 5 are provided.
3, 54, 55 are formed. And the precipitation chamber 53
The oil enters from the oil inlet 56 provided above the sedimentation chamber 53, 5
Oil 57 that has passed through 4, 55 in order to settle foreign substances such as dust
Is sucked out by the pump 58 provided above the precipitation chamber 55, and is again supplied to the processing section through the supply port 59.

【0003】[0003]

【発明が解決しようとする課題】しかし、上記オーバー
フロー方式は、研削液47の流速によって沈澱しようと
している異物を攪拌してしまい、次の沈澱室へ流入させ
てしまう。さらに、流入時に発生する気泡に異物が含ま
れる場合、気泡と共に異物が次の沈澱室に流入してしま
う。また、オーバーフローとアンダーフローの組合せ
は、気泡に含まれる異物がアンダーフロー部により次の
沈澱室へ流入することが少なくなるが、油57の流速に
よって沈澱したり、沈澱しようとしている異物を攪拌し
て、次の沈澱室へ流入させてしまう。このように、従来
の両方式とも、本来の目的である液体中に含まれる水
分、塵埃、切粉等の異物を加工部へ供給しないための分
離、清浄が充分に行なえない問題点があった。本発明
は、上記従来技術の問題点に鑑みてなされたもので、加
工部に供給する液から水分、塵埃、切粉等の異物を簡単
かつ安価に分離除去し確実に清浄できる液清浄循環装置
を提供すること目的とする。
However, according to the above-mentioned overflow method, the foreign matter which is about to be precipitated is agitated by the flow velocity of the grinding fluid 47 and is allowed to flow into the next precipitation chamber. Furthermore, when foreign matter is contained in the bubbles generated at the time of inflow, the foreign matter flows into the next precipitation chamber together with the bubbles. In addition, the combination of overflow and underflow makes it less likely that the foreign matter contained in the bubbles will flow into the next settling chamber due to the underflow portion, but will settle due to the flow rate of the oil 57 or stir the foreign matter that is about to settle. And flow into the next settling chamber. As described above, both of the conventional methods have a problem that the original purpose, that is, separation and cleaning cannot be performed sufficiently because foreign matter such as water, dust, and chips contained in the liquid is not supplied to the processing portion. .. The present invention has been made in view of the above-mentioned problems of the prior art, and a liquid cleaning / circulating apparatus capable of separating and removing foreign matter such as water, dust, and cutting chips from a liquid supplied to a processing section easily and inexpensively and reliably. The purpose is to provide.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
に、本発明の液清浄循環装置は、図1の概念図で示すよ
うに、循環槽1内に隔壁2が設けられ、循環槽1内部を
気泡、塵埃等の異物を含んだ汚液3を注入する第1室4
と清浄液5を溜める第2室6とに分室している。隔壁2
には、第1室4と第2室6とを連通する複数の細孔7が
形成され、汚液3中に含まれる異物の通過を遮ってい
る。細孔7の大きさは、汚液3中に含まれる気泡の大き
さが概ね0.5mm程度なので、0.5mm未満が望ま
しい。循環槽1上には、汚液送液パイプ8を配設するた
めの穴9aと清浄液5を送液する送液ポンプ10を配設
するための穴9bを形成した蓋9が設けられている。穴
9aは第1室4上に設けられ、送液パイプ8が穴9aを
介して第1室3内に外部から導入されている。一方、穴
9bは第2室6上に設けられ、送液ポンプ10の吸液口
が穴9bを介して第2室6内に導入されている。
In order to achieve the above object, the liquid cleaning and circulating apparatus of the present invention is provided with a partition 2 in a circulation tank 1 as shown in the conceptual diagram of FIG. The first chamber 4 into which the sewage 3 containing foreign matters such as bubbles and dust is injected
And a second chamber 6 in which the cleaning liquid 5 is stored. Partition 2
A plurality of pores 7 that connect the first chamber 4 and the second chamber 6 are formed in the inner wall of the inner wall to block passage of foreign matter contained in the waste liquid 3. The size of the pores 7 is preferably less than 0.5 mm because the size of the bubbles contained in the waste liquid 3 is about 0.5 mm. On the circulation tank 1, there is provided a lid 9 having a hole 9a for arranging the contaminated liquid supply pipe 8 and a hole 9b for arranging a liquid feed pump 10 for feeding the cleaning liquid 5. There is. The hole 9a is provided on the first chamber 4, and the liquid supply pipe 8 is introduced into the first chamber 3 from the outside through the hole 9a. On the other hand, the hole 9b is provided on the second chamber 6, and the liquid suction port of the liquid feed pump 10 is introduced into the second chamber 6 through the hole 9b.

【0005】[0005]

【作用】上記構成によれば、汚液3が汚液送液パイプ8
を通り循環槽1の第1室4に入る。導入された汚液3
は、第1室4と第2室6との水頭差等により、第2室6
に入るべく隔壁2の細孔7を通過しようとする。この
時、汚液3に含まれる気泡、塵埃等の異物は、細孔7に
より通過を妨げられ分別される。すなわち、細孔7より
大きな異物は、第1室4内に沈澱物11として残り、ま
た、気泡は浮遊してくっつき合って大きな泡12(図2
参照)となり第1室4内に残る。このため、気泡、塵埃
等の異物は第2室6内に流れ込まず、清浄となった液5
が第2室6内に溜まる。そして、第2室6内に溜まった
清浄液5は、送液ポンプ10により吸引され、送液ポン
プ10に設けた送液パイプ13により、加工部へ供給さ
れる。
According to the above construction, the sewage liquid 3 transfers the sewage liquid supply pipe 8
And enters the first chamber 4 of the circulation tank 1. Sewage introduced 3
Due to the head difference between the first chamber 4 and the second chamber 6, etc.
It tries to pass through the pores 7 of the partition wall 2 in order to enter. At this time, foreign matters such as air bubbles and dust contained in the waste liquid 3 are blocked by the pores 7 and separated. That is, foreign matter larger than the pores 7 remains as a precipitate 11 in the first chamber 4, and the bubbles float and stick to each other to form a large bubble 12 (see FIG. 2).
(See) and remains in the first chamber 4. Therefore, foreign matters such as bubbles and dust do not flow into the second chamber 6 and the cleaned liquid 5
Accumulates in the second chamber 6. Then, the cleaning liquid 5 accumulated in the second chamber 6 is sucked by the liquid feeding pump 10 and is supplied to the processing section by the liquid feeding pipe 13 provided in the liquid feeding pump 10.

【0006】[0006]

【実施例1】図3は、本発明の実施例1の液清浄循環装
置を示す断面図である。図において15は、汚液3を清
浄液5に清浄する循環槽で、循環槽15内には、隔壁1
6及び仕切り板17,18,19が設けられ、循環槽1
5の内部を図において右側から第1室20,第2室2
1,第3室22,第4室23及び第5室24と分室して
ある。第1室20と第2室21を仕切る隔壁16には、
第1室20の汚液3を第2室21に流し込むための細孔
25が複数開けられている。一方、第2室21から第5
室24を仕切るそれぞれの仕切り板17,18,19に
は、細孔が設けられておらず、仕切り板17,18,1
9の上面から液体がオーバーフローして次室に流れ込む
ようになっている。そのため、隔壁16の高さは、汚液
3のオーバーフローを防止のために循環槽15の深さと
略同一に設定されており、仕切り板17,18,19の
高さは、仕切り板17>仕切り板18>仕切り板19と
なるように高低差が設けられている。
[Embodiment 1] FIG. 3 is a sectional view showing a liquid cleaning and circulating apparatus according to Embodiment 1 of the present invention. In the figure, 15 is a circulation tank for cleaning the waste liquid 3 into the cleaning liquid 5, and the partition wall 1 is provided in the circulation tank 15.
6 and partition plates 17, 18, and 19 are provided, and the circulation tank 1
The inside of 5 is the first chamber 20 and the second chamber 2 from the right side in the drawing.
1, the third chamber 22, the fourth chamber 23 and the fifth chamber 24 are divided. In the partition wall 16 that partitions the first chamber 20 and the second chamber 21,
A plurality of pores 25 for pouring the waste liquid 3 in the first chamber 20 into the second chamber 21 are opened. On the other hand, from the second chamber 21 to the fifth
The partition plates 17, 18, 19 for partitioning the chamber 24 are not provided with pores, and the partition plates 17, 18, 1 are not provided.
Liquid overflows from the upper surface of 9 and flows into the next chamber. Therefore, the height of the partition wall 16 is set to be substantially the same as the depth of the circulation tank 15 in order to prevent the overflow of the waste liquid 3, and the height of the partition plates 17, 18, 19 is the partition plate 17> the partition plate. The height difference is provided so that plate 18> partition plate 19.

【0007】循環槽15上には、汚液送液パイプ8及び
清浄液を送り出す送液ポンプ10を配設した蓋9が乗せ
られている。蓋9には、穴9a,9bが形成されてい
る。穴9aは第1室20の上方に設けられ、この穴9a
を挿通して汚液送液パイプ8の排液口が外部から第1室
20の上部に導入配置されている。一方、穴9bは第5
室24の上方に設けられ、この穴9bを挿通して送液ポ
ンプ10の吸液口が第5室24の液面下に導入配置され
ている。送液ポンプ10には、第5室24から吸い上げ
た清浄液5を加工部に供給する送液パイプ13が接続さ
れている。
On the circulation tank 15, there is placed a lid 9 on which a sewage liquid supply pipe 8 and a liquid supply pump 10 for supplying a cleaning liquid are arranged. The lid 9 is formed with holes 9a and 9b. The hole 9a is provided above the first chamber 20.
The drainage port of the sewage liquid sending pipe 8 is introduced from the outside into the upper part of the first chamber 20 and is disposed. On the other hand, the hole 9b is the fifth
It is provided above the chamber 24, and the liquid inlet of the liquid feeding pump 10 is inserted and inserted below the liquid surface of the fifth chamber 24 through the hole 9b. The liquid feed pump 10 is connected to a liquid feed pipe 13 that supplies the processing liquid with the clean liquid 5 sucked up from the fifth chamber 24.

【0008】次に、本実施例の作用を説明する。汚液3
が汚液送液パイプ8により循環槽15内の第1室20に
供給されると、汚液3は、隔壁16に設けた細孔25を
通り、隣接した第2室21に流れ込む。この時、第2室
21に流れ込む汚液3の流速は、細孔25により押さえ
られ減速される。汚液3中に含まれる細孔25より大き
い知り埃等の異物は、細孔25によって第2室21への
流れ込みが防止され、第1室に沈澱物11となって残
る。一方、汚液送液パイプ8を通り送られてきた汚液3
中に含まれる気泡と第1室20内に供給される際に発生
した気泡は、細孔25より大きい場合、第2室21へ流
れ込まない。このため、気泡中に含まれた塵埃等の異物
は第2室21へ流れ込まない。
Next, the operation of this embodiment will be described. Dirty liquid 3
When sewage is supplied to the first chamber 20 in the circulation tank 15 by the sewage liquid sending pipe 8, the sewage 3 passes through the pores 25 provided in the partition wall 16 and flows into the adjacent second chamber 21. At this time, the flow velocity of the waste liquid 3 flowing into the second chamber 21 is suppressed by the pores 25 and is decelerated. Foreign substances such as dust particles larger than the pores 25 contained in the waste liquid 3 are prevented from flowing into the second chamber 21 by the pores 25, and remain as the precipitate 11 in the first chamber. On the other hand, the waste liquid 3 sent through the waste liquid sending pipe 8
The bubbles contained therein and the bubbles generated when being supplied into the first chamber 20 do not flow into the second chamber 21 when they are larger than the pores 25. Therefore, foreign matter such as dust contained in the bubbles does not flow into the second chamber 21.

【0009】第2室21に流れ込んだ液は、仕切り板1
7をオーバーフローして隣接した第3室22へ流れ込ん
でいく。この時、第3室22へ流れ込む流速は押さえら
れ、隔壁16の孔25を通ってきた異物は第2室21内
に沈澱する。そして、第3室22に流れ込んだ液は、仕
切り板18をオーバーフローして隣接した第4室23へ
流れ込む。この時、上記と同様に、第4室へ流れ込む流
速は押さえられ、第2室21から流れ込んだ異物は第3
室22内に沈澱する。さらに、第4室に流れ込んだ液
は、仕切り板19をオーバーフローして隣接した最終室
である第5室24へ流速を押さえられつつ流れ込み、第
3室23内に沈澱する。これらの工程により、第4室2
3から第5室24へは清浄された液がオーバーフロー
し、第5室24内に清浄液5が溜まる。そして、第5室
24内の清浄液5は、送液ポンプ10により吸引され、
送液パイプ13を通って所要箇所に供給される。
The liquid flowing into the second chamber 21 is the partition plate 1
7 overflows and flows into the adjacent third chamber 22. At this time, the flow velocity flowing into the third chamber 22 is suppressed, and the foreign matter that has passed through the holes 25 of the partition 16 is deposited in the second chamber 21. Then, the liquid flowing into the third chamber 22 overflows the partition plate 18 and flows into the adjacent fourth chamber 23. At this time, similarly to the above, the flow velocity flowing into the fourth chamber is suppressed, and the foreign matter flowing from the second chamber 21 becomes the third foreign substance.
Settles in chamber 22. Furthermore, the liquid that has flowed into the fourth chamber overflows the partition plate 19 and flows into the adjacent fifth chamber 24, which is the final chamber, while suppressing the flow velocity, and precipitates in the third chamber 23. By these steps, the fourth chamber 2
The purified liquid overflows from 3 to the fifth chamber 24, and the cleaning liquid 5 is accumulated in the fifth chamber 24. Then, the clean liquid 5 in the fifth chamber 24 is sucked by the liquid feed pump 10,
It is supplied to a required place through the liquid sending pipe 13.

【0010】本実施例にば、汚水3を細孔25に通過さ
せることで、第1室20からの大きな異物と気泡の流れ
出しが防止できる。また、細孔25を通過した異物は、
液が第2室21,第3室22及び第4室23をオーバー
フローする際に各室21,22,23内に沈澱され、か
つ、オーバーフロー方式の時に問題となる気泡は第1室
20でその流出が遮ぎられているので、汚液3の清浄化
を効率良く行なうことができる。
According to this embodiment, by passing the dirty water 3 through the pores 25, it is possible to prevent large foreign matters and bubbles from flowing out of the first chamber 20. Further, the foreign matter that has passed through the pores 25 is
When the liquid overflows the second chamber 21, the third chamber 22 and the fourth chamber 23, the liquid is deposited in the chambers 21, 22 and 23, and the bubbles that are a problem in the overflow system are generated in the first chamber 20. Since the outflow is blocked, the waste liquid 3 can be efficiently cleaned.

【0011】[0011]

【実施例2】図4は、本発明の実施例2の液清浄循環装
置を示す断面図である。本実施例の循環槽26内には、
隔壁27,28,29,30が設けられ、循環槽26の
内部を図において右側から第1室20,第2室21,第
3室22,第4室23及び第5室24と分室してある。
各隔壁27,28,29,30には、それぞれ複数の細
孔31,32,33,34が開けられている。細孔3
1,32,33,34は各隔壁27,28,29,10
毎に大きさが異なるように形成され、細孔31の10分
の1が細孔32,細孔32の10分の1が細孔33及び
細孔33の10分の1が細孔34の大きさとなるように
設定されている。そして、細孔31の大きさは、概ね1
mm程度が望ましい。また、各隔壁27,28,29,
30は、その上端が循環槽26の上に乗せた蓋9の下面
に近接するように設けられている。蓋9には、上記実施
例1と同様に、汚液送液パイプ8及び送液ポンプ10が
配設され、汚液送液パイプ8は第1室20と、送液ポン
プ10は第5室24とそれぞれ対応する位置に設けられ
ている。
[Embodiment 2] FIG. 4 is a sectional view showing a liquid cleaning and circulating apparatus according to Embodiment 2 of the present invention. In the circulation tank 26 of this embodiment,
Partition walls 27, 28, 29, 30 are provided to divide the inside of the circulation tank 26 into the first chamber 20, the second chamber 21, the third chamber 22, the fourth chamber 23, and the fifth chamber 24 from the right side in the drawing. is there.
A plurality of pores 31, 32, 33, 34 are formed in each of the partition walls 27, 28, 29, 30. Pore 3
1, 32, 33 and 34 are partition walls 27, 28, 29 and 10 respectively.
Each of the pores 31 is formed to have a different size. One tenth of the pores 31 is the pore 32, one tenth of the pores 32 is the pore 33, and one tenth of the pores 33 is the pore 34. It is set to be large. The size of the pores 31 is about 1
About mm is desirable. In addition, each partition 27, 28, 29,
30 is provided such that its upper end is close to the lower surface of the lid 9 placed on the circulation tank 26. Similar to the first embodiment, the lid 9 is provided with the waste liquid sending pipe 8 and the liquid sending pump 10, the waste liquid sending pipe 8 is the first chamber 20, and the liquid sending pump 10 is the fifth chamber. 24 are provided at positions corresponding to each.

【0012】次に、本実施例の作用を説明する。汚液3
が汚液送液パイプ8により循環槽26内の第1室20に
供給されると、汚液3は、隔壁27に設けた細孔31を
通り、隣接した第2室21に流れ込む。以下、同様にし
て、第2室21に流れ込んだ汚液3は、第3室22,第
4室23及び第5室24へ細孔32,33及び34をそ
れぞれ通過して流れ込む。この時、各隔壁27,28,
29,30に設けた細孔31、32、33は、次第に小
さくなるように設定されているので、大きい異物から順
次第1室20,第2室21,第3室22,第4室23内
に沈澱物11及び気泡として残る。そして、最終室であ
る第5室24へは、隔壁30の細孔34を通過した清浄
液5が溜まり、送液ポンプ10により吸引されて送液パ
イプ13を通って所要箇所に供給される。なお、細孔3
1,32,33,34の大きさは、異物の大きさにより
変更して実施でき、これにより所望の大きさの異物を分
離除去することができる。
Next, the operation of this embodiment will be described. Dirty liquid 3
When the wastewater is supplied to the first chamber 20 in the circulation tank 26 by the wastewater delivery pipe 8, the wastewater 3 passes through the pores 31 provided in the partition wall 27 and flows into the adjacent second chamber 21. Hereinafter, similarly, the waste liquid 3 that has flowed into the second chamber 21 flows into the third chamber 22, the fourth chamber 23, and the fifth chamber 24 through the pores 32, 33, and 34, respectively. At this time, each partition 27, 28,
Since the pores 31, 32, 33 provided in 29, 30 are set to be gradually smaller, in the first chamber 20, the second chamber 21, the third chamber 22, and the fourth chamber 23 in order from the larger foreign matter. Remains as a precipitate 11 and bubbles. Then, in the fifth chamber 24, which is the final chamber, the clean liquid 5 that has passed through the pores 34 of the partition wall 30 is collected, sucked by the liquid feed pump 10 and supplied to the required location through the liquid feed pipe 13. The pores 3
The sizes of 1, 32, 33, and 34 can be changed depending on the size of the foreign matter, and thus the foreign matter of a desired size can be separated and removed.

【0013】本実施例によれば、汚液3の流れに従っ
て、細孔31,32,33,34の大きさを次第に小さ
くしてあるので、汚液3に含まれる塵埃等の異物が次第
に少なくなり、第5室24には清浄された清浄液5が流
れ込む。また、汚液3中に含まれる気泡も次第に小さく
なり、第5室24内には、より小さな気泡しか流れ込ま
ないため、気泡に含まれる塵埃等の異物も流れ込まず、
清浄された清浄液5が溜まる。さらに、細孔31,3
2,33,34の大きさを変えて、順次大きな異物から
通過を段階的に防止しているので、目詰まりが少なくな
り、汚液3及び清浄液5の流れがスムーズになる。
According to the present embodiment, the size of the pores 31, 32, 33, 34 is gradually reduced in accordance with the flow of the waste liquid 3, so that the foreign substances such as dust contained in the waste liquid 3 are gradually reduced. Then, the purified cleaning liquid 5 flows into the fifth chamber 24. Further, the bubbles contained in the waste liquid 3 are gradually reduced, and only smaller bubbles are allowed to flow into the fifth chamber 24. Therefore, foreign matters such as dust contained in the bubbles are prevented from flowing into the fifth chamber 24.
The cleaned cleaning liquid 5 collects. Further, the pores 31, 3
Since the sizes of 2, 33, and 34 are changed to sequentially prevent passage of large foreign matter in stages, clogging is reduced, and the flow of the dirty liquid 3 and the clean liquid 5 becomes smooth.

【0014】[0014]

【実施例3】図5及び図6は、本発明の実施例3の液清
浄循環装置を示し、図5は断面図、図6は蓋を取り除い
た状態の平面図である。本実施例の循環槽35内には、
径を次第に大きくした円筒状の隔壁36,37,38が
同心円状に設けられ、内側から第1室20,第2室2
1,第3室22及び第4室23と分室してある。各隔壁
36,37,38にはそれぞれ複数の細孔31,32,
33が開けられている。細孔31,32,33の大きさ
は、第2実施例に述べたと同様に形成されている。各隔
壁36,37,38は、その上端が循環槽35の上に乗
せた蓋9の下面に近接するように設けられている。蓋9
には、最終室である第4室23と対応して液送ポンプ1
0が配設されるとともに、第1室20と対応してロート
状の整流パイプ39が配置されている。整流パイプ39
は、大径の上部が蓋9に取付けられ、その下端部が第1
室20の下方まで延設されている。整流パイプ39の大
径部内には、汚液送液パイプ8の排液口が配設されてい
る。なお、整流パイプ39の形状はロート状に限定され
ず、単なる円筒状のものを用いて実施することができ
る。
Third Embodiment FIGS. 5 and 6 show a liquid cleaning and circulating apparatus according to a third embodiment of the present invention, FIG. 5 is a sectional view, and FIG. 6 is a plan view with a lid removed. In the circulation tank 35 of this embodiment,
Cylindrical partition walls 36, 37, 38 having a gradually increasing diameter are provided concentrically, and the first chamber 20 and the second chamber 2 are arranged from the inside.
It is divided into 1, a third chamber 22 and a fourth chamber 23. Each partition wall 36, 37, 38 has a plurality of pores 31, 32,
33 is open. The sizes of the pores 31, 32, 33 are formed in the same manner as described in the second embodiment. Each partition wall 36, 37, 38 is provided so that its upper end is close to the lower surface of the lid 9 placed on the circulation tank 35. Lid 9
The liquid feed pump 1 corresponds to the fourth chamber 23, which is the final chamber.
0 is arranged, and a funnel-shaped straightening pipe 39 is arranged corresponding to the first chamber 20. Rectifying pipe 39
Has a large-diameter upper portion attached to the lid 9 and a lower end portion of the first portion
It extends below the chamber 20. In the large diameter portion of the flow straightening pipe 39, the drainage port of the waste liquid feed pipe 8 is provided. The shape of the flow straightening pipe 39 is not limited to the funnel shape, and a simple cylindrical shape can be used.

【0015】次に、本実施例の作用を説明する。汚液送
液パイプ8から整流パイプ39に排出された汚液3は、
整流パイプ39を通って第1室20内に供給される。こ
の時、汚液送液パイプ8から流れ込む汚液3は、整流パ
イプ39により流れが整えられるとともに、流入する気
泡が押さえられる。第1室20内に供給された汚液3
は、隔壁36,37,38を通り、第1室20から第2
室21,第3室22,最終室である第4室23まで順次
流れ込む。このとき、汚液3中に含まれる気泡、塵埃等
の異物は隔壁36,37,38に設けた順次小さくなる
細孔31,32,33により、第2実施例と同様に分離
除去され、清浄された清浄液5が第4室に溜まる。
Next, the operation of this embodiment will be described. The waste liquid 3 discharged from the waste liquid supply pipe 8 to the flow straightening pipe 39 is
It is supplied into the first chamber 20 through the rectifying pipe 39. At this time, the flow of the sewage 3 flowing from the sewage liquid sending pipe 8 is adjusted by the rectifying pipe 39, and the inflowing air bubbles are suppressed. Waste liquid 3 supplied into the first chamber 20
Passes through the partition walls 36, 37, and 38, and goes from the first chamber 20 to the second chamber 20.
The chamber 21, the third chamber 22, and the final chamber, the fourth chamber 23, sequentially flow into the chamber. At this time, foreign matters such as air bubbles and dust contained in the waste liquid 3 are separated and removed by the small holes 31, 32, 33 provided in the partition walls 36, 37, 38 in the same manner as in the second embodiment, and cleaned. The cleaned liquid 5 thus collected is collected in the fourth chamber.

【0016】本実施例によれば、上記実施例2と同様な
効果を得ることができる。さらに、隔壁36,37,3
8を円筒状に形成し、同心円的に配置したので、各室の
スペースを押さえ省スペース化を図ることができる。
According to this embodiment, it is possible to obtain the same effect as that of the second embodiment. Further, the partition walls 36, 37, 3
Since 8 is formed in a cylindrical shape and arranged concentrically, space in each chamber can be suppressed and space can be saved.

【0017】上記実施例で述べた隔壁は網状のものを用
いて実施でき、隔壁に細孔をいちいち開ける手間を省く
ことができる。また、細孔の形状は、分離除去する異物
により、三角形、四角形等の多角形や丸星形等に形成、
変更して実施できる。さらに、各隔壁の設ける細孔の位
置は、分離除去する異物の大きさ、比重等の条件によ
り、上部のみまたは下部のみあるいは中間部のみと変更
して実施できる。
The partition wall described in the above embodiment can be implemented by using a mesh-shaped one, so that it is possible to save the labor of opening pores in the partition wall one by one. In addition, the shape of the pores is formed into a polygon such as a triangle or a quadrangle or a round star, depending on the foreign matter to be separated and removed.
It can be changed and implemented. Further, the position of the pores provided in each partition can be changed by changing only the upper part or only the lower part or only the intermediate part depending on the conditions such as the size and specific gravity of the foreign matter to be separated and removed.

【0018】[0018]

【発明の効果】以上のように、本発明によれば、汚液中
に含まれる気泡、塵埃の異物は、汚液が隔壁に設けた細
孔を通過する際に効率良く分離され、また、細孔を通過
させることにより、汚液の流速が緩和され、泡の発生や
沈澱物等の攪拌を押さえることができるので、清浄な液
体を供給することができる。さらに、異物の分離除去に
動力を用いないので、省エネルギー、省スペースな液清
浄循環装置を簡単かつ安価に提供することができる。
As described above, according to the present invention, the air bubbles and foreign matter contained in the waste liquid are efficiently separated when the waste liquid passes through the pores provided in the partition walls. By passing through the pores, the flow rate of the sewage can be moderated, and the generation of bubbles and the stirring of precipitates can be suppressed, so that a clean liquid can be supplied. Further, since no power is used for separating and removing foreign matter, it is possible to easily and inexpensively provide an energy-saving and space-saving liquid cleaning circulation device.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の液清浄循環装置を示す概念図である。FIG. 1 is a conceptual diagram showing a liquid cleaning and circulating apparatus of the present invention.

【図2】汚液の気泡を示す説明図である。FIG. 2 is an explanatory diagram showing bubbles of waste liquid.

【図3】本発明の実施例1を示す断面図である。FIG. 3 is a cross-sectional view showing a first embodiment of the present invention.

【図4】本発明の実施例2を示す断面図である。FIG. 4 is a sectional view showing a second embodiment of the present invention.

【図5】本発明の実施例3を示す断面図である。FIG. 5 is a cross-sectional view showing a third embodiment of the present invention.

【図6】本発明の実施例3を蓋を取った状態で示す平面
図である。
FIG. 6 is a plan view showing a third embodiment of the present invention with a lid removed.

【図7】従来のクーラントタンクを示す断面図である。FIG. 7 is a cross-sectional view showing a conventional coolant tank.

【図8】従来の油循環装置を示す断面図である。FIG. 8 is a cross-sectional view showing a conventional oil circulation device.

【符号の説明】[Explanation of symbols]

1,15,26,35 循環槽 2,16,27,28,29,30,36,37,38
隔壁 3 汚液 5 清浄液 7,25,31,32,33,34 細孔
1, 15, 26, 35 Circulating tank 2, 16, 27, 28, 29, 30, 36, 37, 38
Partition wall 3 Waste liquid 5 Clean liquid 7, 25, 31, 32, 33, 34 Pore

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 循環槽内を隔壁で複数の室に区分し、上
記室に異物を含む流体を順次通過させて液体の清浄を行
なう液清浄循環装置において、上記隔壁に液体通過用の
細孔を設けたことを特徴とする液清浄循環装置。
1. A liquid purifying circulation device for dividing a circulation tank into a plurality of chambers by partition walls and sequentially passing a fluid containing foreign matter through the chambers to clean the liquid, wherein the partition walls have pores for liquid passage. A liquid cleaning and circulating device characterized by being provided with.
JP10158592A 1992-03-27 1992-03-27 Equipment for clarifying and circulating liquid Withdrawn JPH05269308A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10158592A JPH05269308A (en) 1992-03-27 1992-03-27 Equipment for clarifying and circulating liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10158592A JPH05269308A (en) 1992-03-27 1992-03-27 Equipment for clarifying and circulating liquid

Publications (1)

Publication Number Publication Date
JPH05269308A true JPH05269308A (en) 1993-10-19

Family

ID=14304466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10158592A Withdrawn JPH05269308A (en) 1992-03-27 1992-03-27 Equipment for clarifying and circulating liquid

Country Status (1)

Country Link
JP (1) JPH05269308A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1369156A1 (en) * 2001-02-01 2003-12-10 Suikenkikou Co Ltd Aeration type underwater screen system
KR100921529B1 (en) * 2007-10-22 2009-10-12 주식회사 젠트로 Settling Pond

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1369156A1 (en) * 2001-02-01 2003-12-10 Suikenkikou Co Ltd Aeration type underwater screen system
EP1369156A4 (en) * 2001-02-01 2004-10-13 Suikenkikou Co Ltd Aeration type underwater screen system
KR100921529B1 (en) * 2007-10-22 2009-10-12 주식회사 젠트로 Settling Pond

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