JPH0525088B2 - - Google Patents

Info

Publication number
JPH0525088B2
JPH0525088B2 JP59246533A JP24653384A JPH0525088B2 JP H0525088 B2 JPH0525088 B2 JP H0525088B2 JP 59246533 A JP59246533 A JP 59246533A JP 24653384 A JP24653384 A JP 24653384A JP H0525088 B2 JPH0525088 B2 JP H0525088B2
Authority
JP
Japan
Prior art keywords
mirror
systems
optical axis
lens group
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59246533A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61123812A (ja
Inventor
Takamasa Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59246533A priority Critical patent/JPS61123812A/ja
Priority to US06/764,001 priority patent/US4701035A/en
Publication of JPS61123812A publication Critical patent/JPS61123812A/ja
Publication of JPH0525088B2 publication Critical patent/JPH0525088B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59246533A 1984-08-14 1984-11-20 反射光学系 Granted JPS61123812A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59246533A JPS61123812A (ja) 1984-11-20 1984-11-20 反射光学系
US06/764,001 US4701035A (en) 1984-08-14 1985-08-09 Reflection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59246533A JPS61123812A (ja) 1984-11-20 1984-11-20 反射光学系

Publications (2)

Publication Number Publication Date
JPS61123812A JPS61123812A (ja) 1986-06-11
JPH0525088B2 true JPH0525088B2 (ko) 1993-04-09

Family

ID=17149821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59246533A Granted JPS61123812A (ja) 1984-08-14 1984-11-20 反射光学系

Country Status (1)

Country Link
JP (1) JPS61123812A (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2603225B2 (ja) * 1986-07-11 1997-04-23 キヤノン株式会社 Ｘ線投影露光装置及び半導体製造方法
US4747678A (en) * 1986-12-17 1988-05-31 The Perkin-Elmer Corporation Optical relay system with magnification
US5071240A (en) * 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
JPH07147230A (ja) * 1994-08-04 1995-06-06 Canon Inc 縮小投影露光装置および半導体製造方法
DE602006014368D1 (de) * 2005-03-08 2010-07-01 Zeiss Carl Smt Ag Mikrolithographie-projektionssystem mit einer zugänglichen membran- oder aperturblende
JP4922254B2 (ja) * 2008-06-30 2012-04-25 本田技研工業株式会社 エンジンの潤滑構造

Also Published As

Publication number Publication date
JPS61123812A (ja) 1986-06-11

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