JPH05233069A - Mass flow controller - Google Patents
Mass flow controllerInfo
- Publication number
- JPH05233069A JPH05233069A JP3118592A JP3118592A JPH05233069A JP H05233069 A JPH05233069 A JP H05233069A JP 3118592 A JP3118592 A JP 3118592A JP 3118592 A JP3118592 A JP 3118592A JP H05233069 A JPH05233069 A JP H05233069A
- Authority
- JP
- Japan
- Prior art keywords
- flow rate
- circuit
- sensors
- variable valve
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Measuring Volume Flow (AREA)
- Flow Control (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明はマスフローコントローラ
の流量制御に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to mass flow controller flow control.
【0002】[0002]
【従来の技術】従来のマスフローコントローラは図3に
示す様に、メイン配管1の可変バルブ2の前段のみにバ
イパス配管4を設け、そこに流量センサー3を設置して
いた。流量センサー3からの信号を入力する流量検出回
路5からの出力信号と所定の流量を設定する流量設定回
路7からの出力信号とを入力し、両者を比較する比較回
路6からの信号をバルブ制御回路8に入力し、これによ
るバルブ制御回路8からの信号により可変バルブ2を駆
動して流量のコントロールを行なっている。2. Description of the Related Art In a conventional mass flow controller, as shown in FIG. 3, a bypass pipe 4 is provided only in front of a variable valve 2 of a main pipe 1, and a flow sensor 3 is installed there. The output signal from the flow rate detection circuit 5 for inputting the signal from the flow rate sensor 3 and the output signal from the flow rate setting circuit 7 for setting a predetermined flow rate are input and the signal from the comparison circuit 6 for comparing the two is controlled by the valve. The variable valve 2 is driven by a signal from the valve control circuit 8 which is input to the circuit 8 to control the flow rate.
【0003】[0003]
【発明が解決しようとする課題】この様な従来技術のマ
スフローコントローラでは、可変バルブの前段にある1
つの流量センサーのみによって制御を行なうため、流量
センサーの感度のずれが発生して流量がずれてもわから
ないという問題点があった。In such a conventional mass flow controller, there is a 1
Since the control is performed by only one flow rate sensor, there is a problem that the sensitivity of the flow rate sensor is deviated and the flow rate is not recognized.
【0004】[0004]
【課題を解決するための手段】本発明の特徴は、流量セ
ンサーと可変バルブと制御部とを具備した気体の流量制
御を行なうマスフローコントローラにおいて、前記流量
センサーを複数有し、かつ、それぞれの流量センサ値を
校正する機構を有するマスフローコントローラにある。
この複数の流量センサーは前記可変バルブの前段に直列
に配置することができる。あるいは、この複数の流量セ
ンサーを前記可変バルブの前段と後段に配置するができ
る。A feature of the present invention is to provide a mass flow controller for controlling the flow rate of a gas, which comprises a flow rate sensor, a variable valve and a control section, and has a plurality of the flow rate sensors, and each flow rate is The mass flow controller has a mechanism for calibrating the sensor value.
The plurality of flow rate sensors can be arranged in series before the variable valve. Alternatively, the plurality of flow rate sensors can be arranged at the front stage and the rear stage of the variable valve.
【0005】[0005]
【実施例】次に本発明について図面を参照して説明す
る。図1は本発明の第1の実施例のマスフローコントロ
ーラの構成図である。メイン配管1を流れるガスは、流
量を変化させる可変バルブ2の前段(上流)と後段(下
流)とにそれぞれ設けられた、ガスを一部分流させるバ
イパス配管4によって分流され、この分流されたガスに
よる熱量移動をそれぞれの流量センサー3により検出す
る。各流量センサー3からの信号を入力した流量検出回
路5から出た値をそれぞれ、複数の流量センサーからの
値を校正、異常検出する校正回路9に入力しそこで誤差
が校正される。両流量センサーからの値が校正されガス
量を示す正確な一つの値として、校正回路9から比較回
路6に信号が送られる。この信号と所定の流量を設定す
る流量設定回路7から信号とを比較回路6で比較し、そ
の結果を出力してバルブ制御回路8にフィードバック入
力し、それによるバルブ制御回路8の出力信号により可
変バルブ2を駆動して流量のコントロールを行う。The present invention will be described below with reference to the drawings. FIG. 1 is a configuration diagram of a mass flow controller according to a first embodiment of the present invention. The gas flowing through the main pipe 1 is diverted by bypass pipes 4 for partially flowing the gas, which are respectively provided in the front stage (upstream) and the rear stage (downstream) of the variable valve 2 that changes the flow rate. The amount of heat transfer is detected by each flow sensor 3. The value output from the flow rate detection circuit 5 to which the signal from each flow rate sensor 3 is input is input to a calibration circuit 9 that calibrates values from a plurality of flow rate sensors and detects an abnormality, and the error is calibrated there. A signal is sent from the calibration circuit 9 to the comparison circuit 6 as one accurate value indicating the gas amount after the values from both flow rate sensors are calibrated. This signal and the signal from the flow rate setting circuit 7 for setting a predetermined flow rate are compared by the comparison circuit 6, the result is output and fed back to the valve control circuit 8, and is varied by the output signal of the valve control circuit 8 thereby. The valve 2 is driven to control the flow rate.
【0006】図2は本発明の第2の実施例のマスフロー
コントローラの構成図である。尚、図2において図1と
同一もしくは類似の箇所は同じ符号で示してある。この
第2の実施例では、複数の流量センサー3は前段(上
流)に直列に配置されている。FIG. 2 is a block diagram of the mass flow controller of the second embodiment of the present invention. 2 that are the same as or similar to those in FIG. 1 are denoted by the same reference numerals. In the second embodiment, the plurality of flow rate sensors 3 are arranged in series in the preceding stage (upstream).
【0007】[0007]
【発明の効果】以上説明した本発明によれば、複数の流
量センサーと可変バルブと制御部とを有して構成され、
それぞれの流量センサー値を校正する機構を有するの
で、1つの流量センサーの値がずれた時に検出、校正が
できるという効果を有する。According to the present invention described above, a plurality of flow rate sensors, a variable valve and a control unit are provided,
Since there is a mechanism for calibrating each flow sensor value, there is an effect that detection and calibration can be performed when the value of one flow sensor is deviated.
【図1】本発明の第1の実施例を示す構成図。FIG. 1 is a configuration diagram showing a first embodiment of the present invention.
【図2】本発明の第2の実施例を示す構成図。FIG. 2 is a configuration diagram showing a second embodiment of the present invention.
【図3】従来技術を示す構成図。FIG. 3 is a configuration diagram showing a conventional technique.
1 メイン配管 2 可変バルブ 3 流量センサ 4 バイパス配管 5 流量検出回路 6 比較回路 7 流量設定回路 8 バルブ制御回路 9 校正回路 1 Main Pipe 2 Variable Valve 3 Flow Sensor 4 Bypass Pipe 5 Flow Rate Detection Circuit 6 Comparison Circuit 7 Flow Rate Setting Circuit 8 Valve Control Circuit 9 Calibration Circuit
Claims (3)
具備した気体の流量制御を行なうマスフローコントロー
ラにおいて、前記流量センサーを複数有し、かつ、それ
ぞれの流量センサ値を校正する機構を有することを特徴
とするマスフローコントローラ。1. A mass flow controller having a flow sensor, a variable valve, and a control unit for controlling the flow rate of a gas, comprising a plurality of the flow sensors and a mechanism for calibrating each flow sensor value. Characteristic mass flow controller.
ブの前段に直列に配置することを特徴とする請求項1に
記載のマスフローコントローラ。2. The mass flow controller according to claim 1, wherein the plurality of flow rate sensors are arranged in series in front of the variable valve.
ブの前段と後段に配置することを特徴とする請求項1に
記載のマスフローコントローラ。3. The mass flow controller according to claim 1, wherein the plurality of flow rate sensors are arranged in a front stage and a rear stage of the variable valve.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3118592A JPH05233069A (en) | 1992-02-19 | 1992-02-19 | Mass flow controller |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3118592A JPH05233069A (en) | 1992-02-19 | 1992-02-19 | Mass flow controller |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05233069A true JPH05233069A (en) | 1993-09-10 |
Family
ID=12324386
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3118592A Withdrawn JPH05233069A (en) | 1992-02-19 | 1992-02-19 | Mass flow controller |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05233069A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000259255A (en) * | 1999-03-11 | 2000-09-22 | Ckd Corp | Gas supply controller |
JP2015194421A (en) * | 2014-03-31 | 2015-11-05 | 日立金属株式会社 | Mass flowmeter, and mass flow rate controller using the mass flowmeter |
WO2019065611A1 (en) * | 2017-09-29 | 2019-04-04 | 日立金属株式会社 | Mass flow rate control system, and semiconductor manufacturing device and vaporizer including said system |
-
1992
- 1992-02-19 JP JP3118592A patent/JPH05233069A/en not_active Withdrawn
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000259255A (en) * | 1999-03-11 | 2000-09-22 | Ckd Corp | Gas supply controller |
JP2015194421A (en) * | 2014-03-31 | 2015-11-05 | 日立金属株式会社 | Mass flowmeter, and mass flow rate controller using the mass flowmeter |
WO2019065611A1 (en) * | 2017-09-29 | 2019-04-04 | 日立金属株式会社 | Mass flow rate control system, and semiconductor manufacturing device and vaporizer including said system |
CN111417913A (en) * | 2017-09-29 | 2020-07-14 | 日立金属株式会社 | Mass flow control system, semiconductor manufacturing apparatus including the same, and vaporizer |
US11550341B2 (en) | 2017-09-29 | 2023-01-10 | Hitachi Metals, Ltd. | Mass flow control system, and semiconductor manufacturing equipment and vaporizer including the system |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19990518 |