JPH05233069A - Mass flow controller - Google Patents

Mass flow controller

Info

Publication number
JPH05233069A
JPH05233069A JP3118592A JP3118592A JPH05233069A JP H05233069 A JPH05233069 A JP H05233069A JP 3118592 A JP3118592 A JP 3118592A JP 3118592 A JP3118592 A JP 3118592A JP H05233069 A JPH05233069 A JP H05233069A
Authority
JP
Japan
Prior art keywords
flow rate
circuit
sensors
variable valve
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP3118592A
Other languages
Japanese (ja)
Inventor
Takahiro Ito
孝博 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Yamaguchi Ltd
Original Assignee
NEC Yamaguchi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Yamaguchi Ltd filed Critical NEC Yamaguchi Ltd
Priority to JP3118592A priority Critical patent/JPH05233069A/en
Publication of JPH05233069A publication Critical patent/JPH05233069A/en
Withdrawn legal-status Critical Current

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  • Measuring Volume Flow (AREA)
  • Flow Control (AREA)

Abstract

PURPOSE:To enable detection and correction even when any deviation is generated in the value of one flow rate sensor by providing plural flow rate sensors, variable valve and control part and providing a mechanism to correct respective flow rate sensor values. CONSTITUTION:The thermal amount move of gas branched by a bypass pipe 4 is detected by respective flow rate sensors 3. The values of a flow rate detection circuit 5 inputting signals from the respective flow rate sensors 3 are respectively inputted to a correcting circuit 9 for correcting the values from these plural flow rate sensors 3 and detecting abnormality, and error is corrected. The correcting circuit 9 outputs this result to a comparator circuit 6 as an exact value showing the quantity of gas. This signal is compared with a signal from a flow rate setting circuit 7 to set a prescribed flow rate by the comparator circuit 6, and the result is fed back and inputted to a valve control circuit 8. The variable valve 2 is driven by the output signal of the valve control circuit 8, and the flow rate is controlled. Thus, even when any deviation is generated in the value of one flow rate sensor 3, detection or correction is enabled.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はマスフローコントローラ
の流量制御に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to mass flow controller flow control.

【0002】[0002]

【従来の技術】従来のマスフローコントローラは図3に
示す様に、メイン配管1の可変バルブ2の前段のみにバ
イパス配管4を設け、そこに流量センサー3を設置して
いた。流量センサー3からの信号を入力する流量検出回
路5からの出力信号と所定の流量を設定する流量設定回
路7からの出力信号とを入力し、両者を比較する比較回
路6からの信号をバルブ制御回路8に入力し、これによ
るバルブ制御回路8からの信号により可変バルブ2を駆
動して流量のコントロールを行なっている。
2. Description of the Related Art In a conventional mass flow controller, as shown in FIG. 3, a bypass pipe 4 is provided only in front of a variable valve 2 of a main pipe 1, and a flow sensor 3 is installed there. The output signal from the flow rate detection circuit 5 for inputting the signal from the flow rate sensor 3 and the output signal from the flow rate setting circuit 7 for setting a predetermined flow rate are input and the signal from the comparison circuit 6 for comparing the two is controlled by the valve. The variable valve 2 is driven by a signal from the valve control circuit 8 which is input to the circuit 8 to control the flow rate.

【0003】[0003]

【発明が解決しようとする課題】この様な従来技術のマ
スフローコントローラでは、可変バルブの前段にある1
つの流量センサーのみによって制御を行なうため、流量
センサーの感度のずれが発生して流量がずれてもわから
ないという問題点があった。
In such a conventional mass flow controller, there is a 1
Since the control is performed by only one flow rate sensor, there is a problem that the sensitivity of the flow rate sensor is deviated and the flow rate is not recognized.

【0004】[0004]

【課題を解決するための手段】本発明の特徴は、流量セ
ンサーと可変バルブと制御部とを具備した気体の流量制
御を行なうマスフローコントローラにおいて、前記流量
センサーを複数有し、かつ、それぞれの流量センサ値を
校正する機構を有するマスフローコントローラにある。
この複数の流量センサーは前記可変バルブの前段に直列
に配置することができる。あるいは、この複数の流量セ
ンサーを前記可変バルブの前段と後段に配置するができ
る。
A feature of the present invention is to provide a mass flow controller for controlling the flow rate of a gas, which comprises a flow rate sensor, a variable valve and a control section, and has a plurality of the flow rate sensors, and each flow rate is The mass flow controller has a mechanism for calibrating the sensor value.
The plurality of flow rate sensors can be arranged in series before the variable valve. Alternatively, the plurality of flow rate sensors can be arranged at the front stage and the rear stage of the variable valve.

【0005】[0005]

【実施例】次に本発明について図面を参照して説明す
る。図1は本発明の第1の実施例のマスフローコントロ
ーラの構成図である。メイン配管1を流れるガスは、流
量を変化させる可変バルブ2の前段(上流)と後段(下
流)とにそれぞれ設けられた、ガスを一部分流させるバ
イパス配管4によって分流され、この分流されたガスに
よる熱量移動をそれぞれの流量センサー3により検出す
る。各流量センサー3からの信号を入力した流量検出回
路5から出た値をそれぞれ、複数の流量センサーからの
値を校正、異常検出する校正回路9に入力しそこで誤差
が校正される。両流量センサーからの値が校正されガス
量を示す正確な一つの値として、校正回路9から比較回
路6に信号が送られる。この信号と所定の流量を設定す
る流量設定回路7から信号とを比較回路6で比較し、そ
の結果を出力してバルブ制御回路8にフィードバック入
力し、それによるバルブ制御回路8の出力信号により可
変バルブ2を駆動して流量のコントロールを行う。
The present invention will be described below with reference to the drawings. FIG. 1 is a configuration diagram of a mass flow controller according to a first embodiment of the present invention. The gas flowing through the main pipe 1 is diverted by bypass pipes 4 for partially flowing the gas, which are respectively provided in the front stage (upstream) and the rear stage (downstream) of the variable valve 2 that changes the flow rate. The amount of heat transfer is detected by each flow sensor 3. The value output from the flow rate detection circuit 5 to which the signal from each flow rate sensor 3 is input is input to a calibration circuit 9 that calibrates values from a plurality of flow rate sensors and detects an abnormality, and the error is calibrated there. A signal is sent from the calibration circuit 9 to the comparison circuit 6 as one accurate value indicating the gas amount after the values from both flow rate sensors are calibrated. This signal and the signal from the flow rate setting circuit 7 for setting a predetermined flow rate are compared by the comparison circuit 6, the result is output and fed back to the valve control circuit 8, and is varied by the output signal of the valve control circuit 8 thereby. The valve 2 is driven to control the flow rate.

【0006】図2は本発明の第2の実施例のマスフロー
コントローラの構成図である。尚、図2において図1と
同一もしくは類似の箇所は同じ符号で示してある。この
第2の実施例では、複数の流量センサー3は前段(上
流)に直列に配置されている。
FIG. 2 is a block diagram of the mass flow controller of the second embodiment of the present invention. 2 that are the same as or similar to those in FIG. 1 are denoted by the same reference numerals. In the second embodiment, the plurality of flow rate sensors 3 are arranged in series in the preceding stage (upstream).

【0007】[0007]

【発明の効果】以上説明した本発明によれば、複数の流
量センサーと可変バルブと制御部とを有して構成され、
それぞれの流量センサー値を校正する機構を有するの
で、1つの流量センサーの値がずれた時に検出、校正が
できるという効果を有する。
According to the present invention described above, a plurality of flow rate sensors, a variable valve and a control unit are provided,
Since there is a mechanism for calibrating each flow sensor value, there is an effect that detection and calibration can be performed when the value of one flow sensor is deviated.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例を示す構成図。FIG. 1 is a configuration diagram showing a first embodiment of the present invention.

【図2】本発明の第2の実施例を示す構成図。FIG. 2 is a configuration diagram showing a second embodiment of the present invention.

【図3】従来技術を示す構成図。FIG. 3 is a configuration diagram showing a conventional technique.

【符号の説明】[Explanation of symbols]

1 メイン配管 2 可変バルブ 3 流量センサ 4 バイパス配管 5 流量検出回路 6 比較回路 7 流量設定回路 8 バルブ制御回路 9 校正回路 1 Main Pipe 2 Variable Valve 3 Flow Sensor 4 Bypass Pipe 5 Flow Rate Detection Circuit 6 Comparison Circuit 7 Flow Rate Setting Circuit 8 Valve Control Circuit 9 Calibration Circuit

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 流量センサーと可変バルブと制御部とを
具備した気体の流量制御を行なうマスフローコントロー
ラにおいて、前記流量センサーを複数有し、かつ、それ
ぞれの流量センサ値を校正する機構を有することを特徴
とするマスフローコントローラ。
1. A mass flow controller having a flow sensor, a variable valve, and a control unit for controlling the flow rate of a gas, comprising a plurality of the flow sensors and a mechanism for calibrating each flow sensor value. Characteristic mass flow controller.
【請求項2】 前記複数の流量センサーを前記可変バル
ブの前段に直列に配置することを特徴とする請求項1に
記載のマスフローコントローラ。
2. The mass flow controller according to claim 1, wherein the plurality of flow rate sensors are arranged in series in front of the variable valve.
【請求項3】 前記複数の流量センサーを前記可変バル
ブの前段と後段に配置することを特徴とする請求項1に
記載のマスフローコントローラ。
3. The mass flow controller according to claim 1, wherein the plurality of flow rate sensors are arranged in a front stage and a rear stage of the variable valve.
JP3118592A 1992-02-19 1992-02-19 Mass flow controller Withdrawn JPH05233069A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3118592A JPH05233069A (en) 1992-02-19 1992-02-19 Mass flow controller

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3118592A JPH05233069A (en) 1992-02-19 1992-02-19 Mass flow controller

Publications (1)

Publication Number Publication Date
JPH05233069A true JPH05233069A (en) 1993-09-10

Family

ID=12324386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3118592A Withdrawn JPH05233069A (en) 1992-02-19 1992-02-19 Mass flow controller

Country Status (1)

Country Link
JP (1) JPH05233069A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000259255A (en) * 1999-03-11 2000-09-22 Ckd Corp Gas supply controller
JP2015194421A (en) * 2014-03-31 2015-11-05 日立金属株式会社 Mass flowmeter, and mass flow rate controller using the mass flowmeter
WO2019065611A1 (en) * 2017-09-29 2019-04-04 日立金属株式会社 Mass flow rate control system, and semiconductor manufacturing device and vaporizer including said system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000259255A (en) * 1999-03-11 2000-09-22 Ckd Corp Gas supply controller
JP2015194421A (en) * 2014-03-31 2015-11-05 日立金属株式会社 Mass flowmeter, and mass flow rate controller using the mass flowmeter
WO2019065611A1 (en) * 2017-09-29 2019-04-04 日立金属株式会社 Mass flow rate control system, and semiconductor manufacturing device and vaporizer including said system
CN111417913A (en) * 2017-09-29 2020-07-14 日立金属株式会社 Mass flow control system, semiconductor manufacturing apparatus including the same, and vaporizer
US11550341B2 (en) 2017-09-29 2023-01-10 Hitachi Metals, Ltd. Mass flow control system, and semiconductor manufacturing equipment and vaporizer including the system

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Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 19990518