JPH04235611A - Mass flow controller - Google Patents
Mass flow controllerInfo
- Publication number
- JPH04235611A JPH04235611A JP3001823A JP182391A JPH04235611A JP H04235611 A JPH04235611 A JP H04235611A JP 3001823 A JP3001823 A JP 3001823A JP 182391 A JP182391 A JP 182391A JP H04235611 A JPH04235611 A JP H04235611A
- Authority
- JP
- Japan
- Prior art keywords
- flow rate
- circuit
- output signal
- valve
- comparison
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 238000001514 detection method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000005856 abnormality Effects 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Measuring Volume Flow (AREA)
- Flow Control (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は気体の流量を調整するマ
スフローコントローラに関し、特に半導体製造装置のプ
ロセスガスの流量を調整するマスフローコントローラに
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mass flow controller that adjusts the flow rate of gas, and more particularly to a mass flow controller that adjusts the flow rate of process gas in semiconductor manufacturing equipment.
【0002】0002
【従来の技術】従来のマスフローコントローラは、図3
のブロック構成図に示すように、センサー管2に巻かれ
た自己発熱抵抗体3a,3bの抵抗値が、ガスが流れた
時の熱変化により変化し、その変化を検出する検出回路
5と、検出回路5の出力信号を増幅する為の増幅回路6
と、増幅回路6の出力信号を表示する流量表示器9と、
増幅回路6の出力信号と流量設定信号8とを比較し流量
調整バルブ4を制御する比較制御回路7とから構成され
ている。[Prior art] A conventional mass flow controller is shown in Fig. 3.
As shown in the block diagram of FIG. Amplification circuit 6 for amplifying the output signal of detection circuit 5
and a flow rate indicator 9 that displays the output signal of the amplifier circuit 6.
It is comprised of a comparison control circuit 7 that compares the output signal of the amplifier circuit 6 and the flow rate setting signal 8 and controls the flow rate adjustment valve 4.
【0003】次に動作について説明する。マスフローコ
ントローラのIN側から入ってきたガスは、センサー管
2を流れるガスとバイパス部1を流れるガスとに分流さ
れた後再び合流し、流量調整バルブ4を通過しマスフロ
ーコントローラのOUT側より出てくる。この時、あら
かじめ発熱された自己発熱抵抗体3a,3bが被測定ガ
スによって冷却され、その時の自己発熱抵抗体3a,3
bの抵抗値の変化を検出回路5により検出した後、増幅
回路6の出力信号と流量設定信号8とを比較し、流量調
整バルブ4を制御することにより流量調整が可能となっ
ている。検出回路5に生じる出力は、質量流量に比例し
た出力が生じる為、正確な質量流量の調整ができる。Next, the operation will be explained. The gas entering from the IN side of the mass flow controller is divided into the gas flowing through the sensor pipe 2 and the gas flowing through the bypass section 1, and then joins again, passes through the flow rate adjustment valve 4, and exits from the OUT side of the mass flow controller. come. At this time, the self-heating resistors 3a, 3b that have generated heat in advance are cooled by the gas to be measured.
After the detection circuit 5 detects a change in the resistance value of b, the output signal of the amplifier circuit 6 is compared with the flow rate setting signal 8, and the flow rate adjustment valve 4 is controlled, thereby making it possible to adjust the flow rate. Since the output generated in the detection circuit 5 is proportional to the mass flow rate, the mass flow rate can be adjusted accurately.
【0004】0004
【発明が解決しようとする課題】この従来のマスフロー
コントローラの回路構成では、特にBcl3 ,cl2
のような腐食性の高いガスや、SiH4 のような詰
まりやすいガスを使用する場合、長期間使用する時や配
管系にリークが生じた場合は、センサー管2又はバイパ
ス部1に詰まりが発生し、センサー管2とバイパス部1
との分流比がくずれる。センサー管2内部に被測定ガス
等の生成物が付着した場合は、センサー管2での流量が
とれない為、流量調整バルブ4は開く方向に進み、実際
の実流量が設定流量より多く流れる。又、この時の流量
表示器9の表示は、センサー管2のみの流量を検知して
いる為設定流量と同じ表示となり、異常は発見できない
。このように、センサー管2又はバイパス部1での生成
物等の付着により分流比がくずれ、被測定ガスの実流量
が変化した場合でも流量表示器9での異常は見られず、
そのまま使用され製品の異常、トラブルの原因となって
いた。Problems to be Solved by the Invention In the circuit configuration of this conventional mass flow controller, in particular, Bcl3, cl2
When using a highly corrosive gas such as SiH4 or a gas that easily clogs, such as SiH4, when using it for a long period of time, or when a leak occurs in the piping system, the sensor pipe 2 or bypass section 1 may become clogged. , sensor tube 2 and bypass section 1
The diversion ratio with the current flow will collapse. If a product such as a gas to be measured adheres to the inside of the sensor tube 2, the flow rate in the sensor tube 2 cannot be maintained, so the flow rate adjustment valve 4 moves in the direction of opening, so that the actual flow rate is greater than the set flow rate. Further, the display on the flow rate indicator 9 at this time is the same as the set flow rate because it detects the flow rate only in the sensor tube 2, and no abnormality can be detected. In this way, even if the splitting ratio is disrupted due to adhesion of products or the like in the sensor tube 2 or the bypass section 1 and the actual flow rate of the gas to be measured changes, no abnormality will be seen on the flow rate indicator 9.
If used as is, it would cause product abnormalities and troubles.
【0005】[0005]
【課題を解決するための手段】本発明のマスフローコン
トローラは、流量設定データを入力してバルブの初期設
定された出力信号を出力するバルブ初期データ回路と、
前記バルブ初期データ回路の出力信号と流量調整バルブ
への出力信号とを比較する比較回路と、この比較結果を
表示する流量ずれ表示器とから構成される。[Means for Solving the Problems] The mass flow controller of the present invention includes a valve initial data circuit that inputs flow rate setting data and outputs an initially set output signal of the valve;
It is comprised of a comparison circuit that compares the output signal of the valve initial data circuit and the output signal to the flow rate adjustment valve, and a flow rate deviation indicator that displays the comparison result.
【0006】[0006]
【実施例】次に本発明について図面を参照して説明する
。図1は本発明の第1実施例のマスフローコントローラ
のブロック構成図である。マスフローコントローラ内部
に入った被測定ガスは、まずセンサー管2とバイパス部
1とに分流される。センサー管2に被測定ガスが流れる
と自己発熱抵抗体3a,3bの熱平衡状態がくずれ、そ
れに応じた出力信号が検出回路5から増幅回路6に出力
される。増幅回路6の出力信号は流量表示器9に行く一
方、比較制御回路7で流量設定信号8と比較され、それ
に応じて流量調整バルブ4を制御する。又、この比較制
御回路7からの出力信号は、流量調整バルブ4へ出力さ
れる一方、比較回路11でバルブ初期データ回路10よ
りの出力と比較し、そのずれ量は流量ずれ表示器12に
て表示される。又、バルブ初期データ回路10には、あ
らかじめ被測定ガスの任意の圧力における流量調整バル
ブ4への出力信号の初期値(正常時)のデータが入力さ
れている。このように従来ではセンサー管2とバイパス
部1での分流比の変化で、被測定ガスの実流量が設定流
量と異なった場合でも、流量表示器では異常が認められ
ないが、本実施例はある任意の圧力下では、流量調整バ
ルブ4への出力信号のずれ量が表示される為、早期発見
が可能であり、又、製品へのトラブルも未然に防止でき
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be explained with reference to the drawings. FIG. 1 is a block diagram of a mass flow controller according to a first embodiment of the present invention. The gas to be measured that has entered the mass flow controller is first divided into the sensor tube 2 and the bypass section 1 . When the gas to be measured flows through the sensor tube 2, the thermal equilibrium state of the self-heating resistors 3a and 3b is disrupted, and an output signal corresponding to this is outputted from the detection circuit 5 to the amplifier circuit 6. The output signal of the amplifier circuit 6 is sent to a flow rate indicator 9, while being compared with a flow rate setting signal 8 in a comparison control circuit 7, and the flow rate regulating valve 4 is controlled accordingly. The output signal from the comparison control circuit 7 is output to the flow rate adjustment valve 4, and is compared with the output from the valve initial data circuit 10 in the comparison circuit 11, and the amount of deviation is displayed on the flow rate deviation indicator 12. Is displayed. Further, data of the initial value (normal state) of the output signal to the flow rate adjustment valve 4 at an arbitrary pressure of the gas to be measured is inputted into the valve initial data circuit 10 in advance. In this way, conventionally, even if the actual flow rate of the gas to be measured differs from the set flow rate due to a change in the split flow ratio between the sensor tube 2 and the bypass section 1, no abnormality is recognized on the flow rate indicator. Since the amount of deviation in the output signal to the flow rate adjustment valve 4 is displayed under a certain arbitrary pressure, early detection is possible and troubles to the product can be prevented.
【0007】次に第2実施例について説明する。図2の
ブロック構成図において、マスフローコントローラのI
N側に圧力センサー13が取付けられている。この圧力
センサー13からの出力信号は、比較回路11で比較制
御回路7の出力信号とバルブ初期データ回路10の出力
信号と比較し、その結果を流量ずれ表示器12に表示す
る。この実施例では、被測定ガスの圧力が変動した場合
でも、正確に初期値(正常時)とのずれ量が表示可能と
なっている。Next, a second embodiment will be explained. In the block diagram of FIG. 2, I of the mass flow controller
A pressure sensor 13 is attached to the N side. The output signal from the pressure sensor 13 is compared with the output signal of the comparison control circuit 7 and the output signal of the valve initial data circuit 10 in the comparison circuit 11, and the result is displayed on the flow rate deviation indicator 12. In this embodiment, even if the pressure of the gas to be measured fluctuates, the amount of deviation from the initial value (normal) can be accurately displayed.
【0008】[0008]
【発明の効果】以上説明したように本発明によれば、マ
スフローコントローラの分量比が変化し、被測定ガスの
実流量が変化した場合でも、流量調整バルブへの出力信
号の初期値(正常時)とのずれ量が表示される為、マス
フローコントローラの早期トラブルの発見及び製品トラ
ブルの未然防止が可能であり、歩留り向上製品トラブル
の未然防止等効果は大である。As explained above, according to the present invention, even when the quantity ratio of the mass flow controller changes and the actual flow rate of the gas to be measured changes, the initial value of the output signal to the flow rate adjustment valve (normal ), it is possible to detect troubles in the mass flow controller early and prevent product troubles, which is highly effective in improving yields and preventing product troubles.
【図1】本発明の第1実施例のブロック構成図である。FIG. 1 is a block diagram of a first embodiment of the present invention.
【図2】本発明の第2実施例のブロック構成図である。FIG. 2 is a block diagram of a second embodiment of the present invention.
【図3】従来のマスフローコントローラのブロック構成
図である。FIG. 3 is a block diagram of a conventional mass flow controller.
1 バイパス部 2 センサー管 3a,3b 自己発熱抵抗体 4 流量調整バルブ 5 検出回路 6 増幅回路 7 比較制御回路 8 流量設定信号 9 流量表示器 10 バルブ初期データ回路 11 比較回路 12 流量ずれ表示器 13 圧力センサー 1 Bypass section 2 Sensor tube 3a, 3b Self-heating resistor 4 Flow rate adjustment valve 5 Detection circuit 6 Amplifier circuit 7 Comparison control circuit 8 Flow rate setting signal 9 Flow rate indicator 10 Valve initial data circuit 11 Comparison circuit 12 Flow rate deviation indicator 13 Pressure sensor
Claims (1)
ブへの出力信号の初期データを保存しておくバルブ初期
データ回路と、前記バルブ初期データ回路の出力信号と
流量調整バルブへの出力信号とを比較する比較回路と、
この比較結果を表示する流量ずれ表示器とを備えること
を特徴とするマスフローコントローラ。1. A valve initial data circuit that stores initial data of an output signal to a flow rate adjustment valve corresponding to a flow rate setting signal, and an output signal of the valve initial data circuit and an output signal to the flow rate adjustment valve. A comparison circuit for comparison,
A mass flow controller comprising a flow rate deviation indicator that displays the comparison results.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3001823A JPH04235611A (en) | 1991-01-11 | 1991-01-11 | Mass flow controller |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3001823A JPH04235611A (en) | 1991-01-11 | 1991-01-11 | Mass flow controller |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04235611A true JPH04235611A (en) | 1992-08-24 |
Family
ID=11512285
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3001823A Pending JPH04235611A (en) | 1991-01-11 | 1991-01-11 | Mass flow controller |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04235611A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005001910A1 (en) * | 2003-06-27 | 2005-01-06 | Hyundai Calibration & Certification Technologies Co., Ltd | Apparatus for controlling flow rate of gases used in semiconductor device by differential pressure |
JP2009157578A (en) * | 2007-12-26 | 2009-07-16 | Hitachi Metals Ltd | Flow rate control device, flow rate control method and examination method for flow rate control device |
JP2009245132A (en) * | 2008-03-31 | 2009-10-22 | Hitachi Metals Ltd | Flow controller and test method therefor, and flow control method |
JP2012113581A (en) * | 2010-11-26 | 2012-06-14 | Jfe Steel Corp | Abnormality monitoring method for flow control system |
-
1991
- 1991-01-11 JP JP3001823A patent/JPH04235611A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005001910A1 (en) * | 2003-06-27 | 2005-01-06 | Hyundai Calibration & Certification Technologies Co., Ltd | Apparatus for controlling flow rate of gases used in semiconductor device by differential pressure |
JP2009157578A (en) * | 2007-12-26 | 2009-07-16 | Hitachi Metals Ltd | Flow rate control device, flow rate control method and examination method for flow rate control device |
JP2009245132A (en) * | 2008-03-31 | 2009-10-22 | Hitachi Metals Ltd | Flow controller and test method therefor, and flow control method |
JP2012113581A (en) * | 2010-11-26 | 2012-06-14 | Jfe Steel Corp | Abnormality monitoring method for flow control system |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10606285B2 (en) | System for and method of monitoring flow through mass flow controllers in real time | |
US9471066B2 (en) | System for and method of providing pressure insensitive self verifying mass flow controller | |
US9846074B2 (en) | System for and method of monitoring flow through mass flow controllers in real time | |
JP6677646B2 (en) | System and method for monitoring mass flow controller flow in real time | |
KR101616582B1 (en) | Flow controller | |
KR101707877B1 (en) | Flow volume control device equipped with flow rate monitor | |
US5141021A (en) | Mass flow meter and mass flow controller | |
TWI550376B (en) | Mass flow controller and method of controlling the mass flow rate of a gas with a mass flow controller | |
JP7131561B2 (en) | Mass flow control system and semiconductor manufacturing equipment and vaporizer including the system | |
CN111103020A (en) | Flow detection device, flow control system and flow detection method | |
JPH04235611A (en) | Mass flow controller | |
JPH05233068A (en) | Mass flow controller | |
JP2720634B2 (en) | Self-diagnosis device of mass flow controller | |
JPS63235800A (en) | Mass flow controller | |
JPH09222344A (en) | Mass flow controller | |
JPH04313107A (en) | Mass flow controller | |
JP2694294B2 (en) | Mass flow meter and mass flow controller | |
JPH07325625A (en) | Mass flow controller | |
JPH0296619A (en) | Mass flow controller | |
JP3191526B2 (en) | Gas flow control device and gas flow control method using the same | |
JPH05233069A (en) | Mass flow controller | |
JPH0199108A (en) | Control device | |
JPH0726727U (en) | Mass flow meter | |
JPH0530909U (en) | Mass flow controller | |
JPH109919A (en) | Mass flowmeter |