JPH0521874Y2 - - Google Patents

Info

Publication number
JPH0521874Y2
JPH0521874Y2 JP1989138671U JP13867189U JPH0521874Y2 JP H0521874 Y2 JPH0521874 Y2 JP H0521874Y2 JP 1989138671 U JP1989138671 U JP 1989138671U JP 13867189 U JP13867189 U JP 13867189U JP H0521874 Y2 JPH0521874 Y2 JP H0521874Y2
Authority
JP
Japan
Prior art keywords
plasma
sample
magnetic field
chamber
sample stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989138671U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0379420U (OSRAM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989138671U priority Critical patent/JPH0521874Y2/ja
Publication of JPH0379420U publication Critical patent/JPH0379420U/ja
Application granted granted Critical
Publication of JPH0521874Y2 publication Critical patent/JPH0521874Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Drying Of Semiconductors (AREA)
JP1989138671U 1989-12-01 1989-12-01 Expired - Lifetime JPH0521874Y2 (OSRAM)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989138671U JPH0521874Y2 (OSRAM) 1989-12-01 1989-12-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989138671U JPH0521874Y2 (OSRAM) 1989-12-01 1989-12-01

Publications (2)

Publication Number Publication Date
JPH0379420U JPH0379420U (OSRAM) 1991-08-13
JPH0521874Y2 true JPH0521874Y2 (OSRAM) 1993-06-04

Family

ID=31685755

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989138671U Expired - Lifetime JPH0521874Y2 (OSRAM) 1989-12-01 1989-12-01

Country Status (1)

Country Link
JP (1) JPH0521874Y2 (OSRAM)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0732134B2 (ja) * 1986-12-29 1995-04-10 住友金属工業株式会社 プラズマ装置

Also Published As

Publication number Publication date
JPH0379420U (OSRAM) 1991-08-13

Similar Documents

Publication Publication Date Title
KR920004912B1 (ko) 플라즈마 장치
US4610770A (en) Method and apparatus for sputtering
JP4422801B2 (ja) カソードスパッタリング装置
KR870006231A (ko) 진공 스퍼터링 장치
KR890003266A (ko) 플라즈마 처리방법 및 그 장치
EP0270667A1 (en) DOUBLE PLASMA MICROWAVE APPARATUS AND SURFACE TREATMENT METHOD.
KR850008359A (ko) 평면과 요면형 타깃을 갖는 마그네트론 스퍼터장치
JPH05247645A (ja) カソードスパッタ装置
US5089747A (en) Electron beam excitation ion source
JPH0521874Y2 (OSRAM)
JPS63155728A (ja) プラズマ処理装置
JP2567892B2 (ja) プラズマ処理装置
JPH03190126A (ja) プラズマエッチング装置
JP2576139B2 (ja) プラズマ装置
JPH01238020A (ja) プラズマ処理装置、及びその処理システム
JPH10144497A (ja) プラズマ発生装置
JP2920852B2 (ja) マイクロ波プラズマ装置
JP3010059B2 (ja) イオン源
JPH05106051A (ja) プラズマ処理装置
JPH0578849A (ja) 有磁場マイクロ波プラズマ処理装置
JP2909475B2 (ja) Ｅｃｒプラズマ発生装置
Underhill Considerations in the Design of Permanent Magnets for Use with Microwave Tubes
JP3045619B2 (ja) プラズマ発生装置
JP2876280B2 (ja) ビーム発生方法及び装置
JP2004079465A (ja) プラズマ生成装置およびプラズマ処理装置