JPH0521869Y2 - - Google Patents
Info
- Publication number
- JPH0521869Y2 JPH0521869Y2 JP16774387U JP16774387U JPH0521869Y2 JP H0521869 Y2 JPH0521869 Y2 JP H0521869Y2 JP 16774387 U JP16774387 U JP 16774387U JP 16774387 U JP16774387 U JP 16774387U JP H0521869 Y2 JPH0521869 Y2 JP H0521869Y2
- Authority
- JP
- Japan
- Prior art keywords
- outer cylinder
- exhaust
- exhaust port
- exhaust pipe
- dilution chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010790 dilution Methods 0.000 claims description 20
- 239000012895 dilution Substances 0.000 claims description 20
- 238000004140 cleaning Methods 0.000 claims description 16
- 238000003780 insertion Methods 0.000 claims description 12
- 230000037431 insertion Effects 0.000 claims description 12
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 239000007789 gas Substances 0.000 description 21
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000010409 thin film Substances 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
Landscapes
- Cleaning In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16774387U JPH0521869Y2 (enExample) | 1987-10-30 | 1987-10-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16774387U JPH0521869Y2 (enExample) | 1987-10-30 | 1987-10-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0171435U JPH0171435U (enExample) | 1989-05-12 |
| JPH0521869Y2 true JPH0521869Y2 (enExample) | 1993-06-04 |
Family
ID=31456312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16774387U Expired - Lifetime JPH0521869Y2 (enExample) | 1987-10-30 | 1987-10-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0521869Y2 (enExample) |
-
1987
- 1987-10-30 JP JP16774387U patent/JPH0521869Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0171435U (enExample) | 1989-05-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4012818B2 (ja) | 排ガス管内付着固体生成物除去方法及び排ガス処理システム | |
| JPH0521869Y2 (enExample) | ||
| JPH0637074A (ja) | 半導体製造装置のクリーニング方法 | |
| JPS62127397A (ja) | 三フッ化窒素を使用して半導体ウエハを洗浄する方法 | |
| JPH0452612B2 (enExample) | ||
| JP4491696B2 (ja) | 排気ガス処理装置 | |
| US6539953B2 (en) | Method and apparatus for cleaning a heater bellow in a chemical vapor deposition chamber | |
| JPH05263248A (ja) | 配管クリーニング機構 | |
| JP2845422B2 (ja) | プラズマｃｖｄ装置 | |
| JPS62258740A (ja) | 半導体プロセスチユ−ブ浄化装置 | |
| JPH09186149A (ja) | 半導体製造装置のクリーニング方法及び半導体装置の製造方法 | |
| JPH03243688A (ja) | フッ化塩素ガスによるＳｉＯｘのクリーニング方法 | |
| JP2842744B2 (ja) | エピタキシャル成長装置のクリーニング方法 | |
| US7514371B2 (en) | Semiconductor substrate surface protection method | |
| JP2005003331A (ja) | 有害ガスの燃焼式除害装置 | |
| KR960006688B1 (ko) | 저압화학기상증착 반응실의 오염원 제거 방법 | |
| KR100295665B1 (ko) | 반도체웨이퍼증착장비의파우더제거장치 | |
| KR0156321B1 (ko) | 반도체용 저압 화학기상증착장치의 가스 배출관 | |
| JP2735649B2 (ja) | クリーニング用混合ガス組成物 | |
| JPH01158722A (ja) | 化学気相成長装置 | |
| JP2629447B2 (ja) | 薬液塗布装置 | |
| JP4452956B2 (ja) | 有機シリコン含有排気ガス処理方法 | |
| JP2000150442A (ja) | 洗浄装置 | |
| CN209597800U (zh) | 一种碎片清理装置 | |
| KR200162275Y1 (ko) | 화학기 상증착 장치의 이물질 부착방지 장치 |