JPH05216254A - Washing method for conductive base body for electrophotographic sensitive body - Google Patents

Washing method for conductive base body for electrophotographic sensitive body

Info

Publication number
JPH05216254A
JPH05216254A JP2249592A JP2249592A JPH05216254A JP H05216254 A JPH05216254 A JP H05216254A JP 2249592 A JP2249592 A JP 2249592A JP 2249592 A JP2249592 A JP 2249592A JP H05216254 A JPH05216254 A JP H05216254A
Authority
JP
Japan
Prior art keywords
cleaning
washing
base body
substrate
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2249592A
Other languages
Japanese (ja)
Inventor
Hiroshi Matsumoto
浩史 松本
Masayuki Sakamoto
雅遊亀 坂元
Tatsuhiro Morita
竜廣 森田
Masanori Matsumoto
雅則 松本
Kazuyuki Arai
和幸 新居
Mitsuhiro Shinobu
充弘 忍
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP2249592A priority Critical patent/JPH05216254A/en
Publication of JPH05216254A publication Critical patent/JPH05216254A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the generation of spilling and staining due to washing failure by washing the surface of a conductive base body for an electrophotographic sensitive body with pure water, an ion-exchange water or surfactant-contg. water, then subjecting the base body to a rinsing treatment under air blowing. CONSTITUTION:A machined base body 1 is subjected to the washing treatment under the ultrasonic vibration by an ultrasonic oscillator 17 with the washing liquid 18 contg. a surfactant in a 1st washing tank 11. The base body is then subjected to the rinsing treatment with pure water or an ion-exchange water in respective 2nd, 3rd, 4th washing tanks 21, 31, 41. Bubble generating mechanisms by air blow are respectively mounted to the respective washing tanks 21, 31, 41, by which the surfactant, swarf dust, etc., sticking to the washed base body surface are completely removed. Ultrasonic waves are not used at the time of the rinsing treatment in such a manner and, therefore, the generation of pinholes by the cavitation generated by the ultrasonic waves is prevented and a non-defective rate is improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電子写真感光体の導電性
基体の洗浄方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning a conductive substrate of an electrophotographic photoreceptor.

【0002】[0002]

【従来の技術】一般的に電子写真感光体は、ドラム状導
電性基体上に感光層を形成したものである。このドラム
状導電性基体は円筒状のアルミを鏡面加工又は板状のア
ルミをインパクト成形することにより作成される。鏡面
加工又はインパクト成形中に基体表面には、切削油のミ
スト、空気中のダスト、切粉等が付着するため、基体表
面を洗浄処理して除去した後に、縮合多環顔料、アゾ顔
料等の電荷発生物質、樹脂の結着剤等から成る電荷発生
層及びヒドラゾン系又はアリールアミン系電荷輸送物
質、樹脂の結着剤、酸化防止剤等から成る電荷輸送層を
順次塗布・積層し、乾燥して感光層を形成する。
2. Description of the Related Art Generally, an electrophotographic photosensitive member is one in which a photosensitive layer is formed on a drum-shaped conductive substrate. This drum-shaped conductive substrate is formed by mirror-finishing cylindrical aluminum or impact-molding plate-shaped aluminum. Cutting oil mist, dust in the air, chips, etc. adhere to the surface of the substrate during mirror processing or impact molding, so after removing the substrate surface by washing, condensation polycyclic pigments, azo pigments, etc. A charge generation layer composed of a charge generation material, a resin binder, etc. and a charge transport layer composed of a hydrazone or arylamine charge transport material, a resin binder, an antioxidant, etc. are successively applied, laminated and dried. To form a photosensitive layer.

【0003】電荷発生層及び電荷輸送層は、上述した電
荷発生層及び電荷輸送層を構成する物質をそれぞれ含有
する塗布液にドラム状導電性基体を公知の方法で浸漬す
ることによって該基体の表面に形成される。ここで行な
う浸漬塗布方法としては、特に制限はなく公知の方法が
使用し得るが、例えば特開昭49−130736、特開
昭57−5047及び特開昭59−46171に開示さ
れる方法が挙げられる。
The charge-generating layer and the charge-transporting layer are prepared by immersing the drum-shaped conductive substrate in a coating method containing the above-mentioned substances constituting the charge-generating layer and the charge-transporting layer by a known method. Formed in. The dip coating method carried out here is not particularly limited and known methods can be used. Examples thereof include the methods disclosed in JP-A-49-130736, JP-A-57-5047 and JP-A-59-46171. Be done.

【0004】浸漬塗布方法において、前処理である導電
性基体表面の洗浄が不十分であると、その表面に油、ダ
スト等が残り、塗布の際にハジキ、シミ等の塗布欠陥の
原因となる。このような電子写真感光体上に発生した欠
陥は、コピー画像に黒ポチ、白ポチ、ハーフトーン画像
のムラ等となって現われ、画像品質に悪影響を及ぼし、
かような電子写真感光体は実用に適さないものである。
In the dip coating method, if the surface of the conductive substrate, which is a pretreatment, is insufficiently cleaned, oil, dust and the like remain on the surface and cause coating defects such as cissing and stains during coating. .. Defects generated on such an electrophotographic photosensitive member appear as black spots, white spots, and halftone image unevenness in a copy image, and adversely affect image quality.
Such an electrophotographic photoreceptor is not suitable for practical use.

【0005】基体表面の洗浄としては、通常有機溶媒
中、又は必要に応じて加温された有機溶媒中に基体を浸
漬処理又は超音波の作用下で浸漬処理する浸漬洗浄;基
体を溶媒に浸漬中又は基体に溶媒をシャワーリングしな
がらブラシ、スポンジ等により物理的に擦する接触洗
浄;溶媒を高圧下でスリットより基体表面に噴出するジ
ェット洗浄及び溶媒蒸気中に基体を挿入する蒸気洗浄が
挙げられ、これらの単独又は組合せにより基体表面の洗
浄が行なわれている。
The surface of the substrate is usually washed by dipping the substrate in an organic solvent or, if necessary, in an organic solvent heated, or by sonication; dipping the substrate in a solvent. Contact cleaning in which the solvent is physically rubbed with a brush, sponge or the like while showering the solvent on the inside or the substrate; jet cleaning in which the solvent is jetted from the slit to the surface of the substrate under high pressure and vapor cleaning in which the substrate is inserted into the solvent vapor. The cleaning of the surface of the substrate is carried out singly or in combination.

【0006】ここで使用される溶媒としては、メチレン
クロライド、エチレンクロライド、1,1,1−トリク
ロルエタン、トリクロルエチレン、パークロルエチレン
等の塩素系溶剤、フロン−112、フロン−113等の
フッ素系溶剤、該フッ素系溶剤とメタノール、メチレン
クロライド等との混合溶剤、ベンゼン、トルエン、メタ
ノール、エタノール、イソプロピルアルコール、石油系
炭化水素等及びこれらの混合物が挙げられる。これらの
溶剤中には引火性、発火性を有するもの、人体に有害で
あるので使用許容濃度が低いもの、洗浄能力が低いもの
が含まれており、最も一般的に使用されている溶剤は、
1,1,1−トリクロルエタンである。しかしながら、
1,1,1−トリクロルエタンは、洗浄能力が高い、取
扱いが容易等の長所があるものの、地球温暖化、オゾン
層の破壊等を引起す物質の一つであると推考され、フロ
ンとともに全世界でその削減が決定されており、1,
1,1−トリクロルエタンの代替洗浄液の提供又は代替
洗浄法の開発が要求されている。
Examples of the solvent used here include chlorine-based solvents such as methylene chloride, ethylene chloride, 1,1,1-trichloroethane, trichloroethylene and perchlorethylene, and fluorine-based solvents such as Freon-112 and Freon-113. Solvents, mixed solvents of the fluorine-based solvent with methanol, methylene chloride, etc., benzene, toluene, methanol, ethanol, isopropyl alcohol, petroleum hydrocarbons, etc., and mixtures thereof. These solvents include those that are flammable and ignitable, those that have a low permissible concentration because they are harmful to the human body, and those that have a low cleaning ability.The most commonly used solvents are:
It is 1,1,1-trichloroethane. However,
Although 1,1,1-trichloroethane has the advantages of high cleaning ability and easy handling, it is considered to be one of the substances that cause global warming and ozone layer depletion. The reduction has been decided in the world,
It is required to provide an alternative cleaning solution for 1,1-trichloroethane or to develop an alternative cleaning method.

【0007】1,1,1−トリクロルエタン等の有機溶
媒を用いる洗浄の代替として、純水又は界面活性剤含有
水に浸漬洗浄する、所謂水洗浄が提案されている。
As an alternative to cleaning using an organic solvent such as 1,1,1-trichloroethane, so-called water cleaning has been proposed in which immersion cleaning is performed in pure water or water containing a surfactant.

【0008】電子写真感光体の導電性基体としては、ア
ルミニウム、銅、ニッケル、ステンレス、真ちゅう等の
金属の円筒状基体又は薄膜シート、又はアルミニウム、
錫合金、酸化インジウム等をポリエステルフィルムある
いは紙、金属フィルムの円筒状基体等に蒸着したものが
挙げられるが、低価格、加工し易さ、強度及び重量等の
観点から、アルミニウムが最も一般的である。しかしな
がら、アルミニウムは反応性が高く柔らかいという性質
を有しており、アルミニウムの純度が高くなるとこの傾
向が著しく、加工し易さ及び感光層との接着性の観点か
ら純度の高いアルミニウムが導電性基体の材料として用
いられている。
As the conductive substrate of the electrophotographic photoreceptor, a cylindrical substrate or thin film sheet of metal such as aluminum, copper, nickel, stainless steel, brass, or aluminum,
Examples include tin alloy, indium oxide, and the like deposited on a polyester film, paper, or a cylindrical substrate of a metal film, but aluminum is the most common from the viewpoints of low price, ease of processing, strength, and weight. is there. However, aluminum has a property of being highly reactive and soft, and this tendency is remarkable when the purity of aluminum becomes high. From the viewpoint of ease of processing and adhesion to the photosensitive layer, aluminum of high purity is a conductive substrate. It is used as a material for.

【0009】このような高純度のアルミニウムから成る
導電性基体を超音波照射下で水洗浄すると、有機溶媒の
洗浄液に比べて水は表面張力が高くキャビテーションが
強いので、長時間の水洗浄・濯ぎ処理により、基体表面
にピンホールが生じやすく、且つ水と反応して基体表面
の腐食が起りやすい。従って、長時間の水洗浄をした導
電性基体に感光層を形成した電子写真感光体は黒ポチ、
白ポチの画像欠陥を有することがある。
When such a conductive substrate made of high-purity aluminum is washed with water under ultrasonic irradiation, the surface tension of water is higher and the cavitation is stronger than that of an organic solvent washing solution, so that washing and rinsing with water for a long time are performed. By the treatment, pinholes are likely to be formed on the surface of the base material, and the surface of the base material is likely to be corroded by reacting with water. Therefore, an electrophotographic photoreceptor having a photosensitive layer formed on a conductive substrate that has been washed with water for a long time has a black spot.
May have white spot image defects.

【0010】[0010]

【発明が解決しようとする課題】水洗浄におけるピンホ
ールの発生や洗浄液との反応による表面腐食を抑制しな
がら基体表面の洗浄が十分行なわれて、ハジキ、シミ等
の画像欠陥の発生がほとんどない電子写真感光体を得る
ための導電性基体の洗浄方法の開発が強く望まれてい
る。
The substrate surface is sufficiently cleaned while suppressing the occurrence of pinholes in water cleaning and surface corrosion due to the reaction with the cleaning liquid, and image defects such as cissing and stains are hardly generated. There is a strong demand for development of a method for cleaning a conductive substrate to obtain an electrophotographic photosensitive member.

【0011】[0011]

【課題を解決するための手段】本発明者等の鋭意研究の
結果、電子写真感光体用導電性基体の水洗浄において、
エアブローによりバブルが発生している純水又はイオン
交換水中で濯ぎ処理をすると、超音波を使用することが
ないので超音波によるキャビテーションがほとんどない
のに伴ってピンホールの発生もなく、且つ基体表面の洗
浄が十分に行なわれてハジキ、シミ等の画像欠陥のほと
んどない電子写真感光体が得られることを見出し、この
知見に基づいて本発明を成すに至った。
Means for Solving the Problems As a result of intensive studies by the present inventors, in washing a conductive substrate for an electrophotographic photoreceptor with water,
When rinsing is performed in pure water or ion-exchanged water in which bubbles are generated by air blow, ultrasonic waves are not used, so there is almost no cavitation due to ultrasonic waves and pin holes do not occur, and the substrate surface It was found that an electrophotographic photosensitive member having almost no image defects such as cissing and stains can be obtained by sufficiently washing the above-mentioned, and based on this finding, the present invention has been accomplished.

【0012】[0012]

【作用】図1は本発明の洗浄方法の概略を示す図であ
る。
1 is a diagram showing the outline of the cleaning method of the present invention.

【0013】(i)「洗浄工程」:切削加工又はインパ
クト成形された基体1はレール3に配置されたロボット
ハンド2に支持されている。第1の洗浄槽11は純水又
はイオン交換水、好ましくは界面活性剤が溶解した純水
又はイオン交換水の洗浄液18で満たされており、該洗
浄液はヒーター16により40〜60℃に加熱されてお
り、且つ洗浄槽11底部には超音波発振器17が備付け
られ、基体浸漬時に超音波が発振するようになってい
る。洗浄槽11にはパイプ12から洗浄液がタンク(図
示せず)より定常的に送り込まれている。洗浄によって
基体表面から除去された油、ダスト、切粉が分散してい
る洗浄液は配管19からポンプ14によりフィルター1
5を経て循環し、ダスト、切粉等はフィルター15に補
足される。基体の浸漬によりオーバーフローする液は配
管13から排出される。排出された洗浄液は排液処理装
置(図示せず)により処理される。
(I) "Cleaning step": The base body 1 cut or impact-formed is supported by a robot hand 2 arranged on a rail 3. The first cleaning tank 11 is filled with a cleaning liquid 18 of pure water or ion-exchanged water, preferably pure water or ion-exchanged water in which a surfactant is dissolved, and the cleaning liquid is heated to 40 to 60 ° C. by a heater 16. In addition, an ultrasonic oscillator 17 is provided at the bottom of the cleaning tank 11 so that ultrasonic waves oscillate when the substrate is immersed. A cleaning liquid is constantly fed into the cleaning tank 11 from a pipe (not shown) through a pipe 12. The cleaning liquid in which the oil, dust, and chips removed from the substrate surface by the cleaning is dispersed is supplied from the pipe 19 to the filter 1 by the pump 14.
It circulates after passing through 5, and dust, cutting chips, etc. are captured by the filter 15. The liquid that overflows due to the immersion of the substrate is discharged from the pipe 13. The discharged cleaning liquid is processed by a drainage processing device (not shown).

【0014】本発明で使用する界面活性剤としては、基
体を腐食することのないノニオン系界面活性剤及び/又
はアニオン系界面活性剤が使用し得、その具体例として
は、ポリオキシエチレンアルキルフェニルエーテル、ポ
リオキシエチレン・ポリオキシプロピレン・ブロックコ
ポリマー型及びノニルフェノールポリオキシエチレンエ
ーテルのノニオン系界面活性剤及びアルキルベンゼン、
高級アルコール、α−オレフィン等の硫酸塩、ケイ酸
塩、炭酸塩又はリン酸塩のアニオン系界面活性剤が挙げ
られる。
As the surfactant used in the present invention, nonionic surfactants and / or anionic surfactants that do not corrode the substrate can be used, and specific examples thereof include polyoxyethylene alkylphenyl. Ether, polyoxyethylene / polyoxypropylene / block copolymer type and nonylphenol polyoxyethylene ether nonionic surfactant and alkylbenzene,
Examples include anionic surfactants such as higher alcohols, sulfates such as α-olefins, silicates, carbonates or phosphates.

【0015】又、洗浄助剤(ビルダー)として、炭酸ナ
トリウム、トリポリリン酸ナトリウム、ピロリン酸カリ
ウム、ケイ酸ナトリウム、硫酸ナトリウム等の無機ビル
ダー、カルボキシメチルセルロース、メチルセルロー
ス、有機アミン等の有機ビルダーを洗浄液に添加しても
良い。
As a cleaning aid (builder), an inorganic builder such as sodium carbonate, sodium tripolyphosphate, potassium pyrophosphate, sodium silicate or sodium sulfate, or an organic builder such as carboxymethyl cellulose, methyl cellulose or organic amine is added to the cleaning liquid. You may.

【0016】本発明の洗浄液の界面活性剤の濃度は0.
5〜30%、好ましくは4〜15%である。
The concentration of the surfactant in the cleaning solution of the present invention is 0.
It is 5 to 30%, preferably 4 to 15%.

【0017】本発明における洗浄時間(浸漬時間)は、
0.5〜10分間、好ましくは1.5〜5分間である。
尚、浸漬中、必要に応じて基体を揺動させても良い。
The cleaning time (immersion time) in the present invention is
It is 0.5 to 10 minutes, preferably 1.5 to 5 minutes.
The substrate may be swung if necessary during the immersion.

【0018】(ii)「濯ぎ工程」:第2の洗浄槽21、
第3の洗浄槽31及び第4の洗浄槽41にはそれぞれ洗
浄液25,35,45として純水又はイオン交換水が満
たされていて濯ぎ処理がなされる。各洗浄槽の洗浄液
は、それぞれ配管26,36,46からポンプ22,3
2,42によりフィルター23,33,43を経て循環
し、該フィルターによって、ダスト、切粉等が補足され
る。洗浄液はタンク47より洗浄槽41に供給され、第
4の洗浄槽41からのオーバーフローにより第3の洗浄
槽31に洗浄液が供給され、第3の洗浄槽31からのオ
ーバーフローにより、第2の洗浄槽21に洗浄液が供給
され、且つ第2の洗浄槽21からオーバーフローする液
は配管27から排出され、排液処理装置で処理される。
(Ii) "Rinsing step": the second cleaning tank 21,
The third cleaning tank 31 and the fourth cleaning tank 41 are filled with pure water or ion-exchanged water as cleaning liquids 25, 35, 45, respectively, and rinsed. The cleaning liquid in each cleaning tank is supplied from the pipes 26, 36, 46 to the pumps 22, 3, respectively.
2, 42 circulate through the filters 23, 33, 43, and the filters trap dust, chips, and the like. The cleaning liquid is supplied from the tank 47 to the cleaning tank 41, the cleaning liquid is supplied to the third cleaning tank 31 by the overflow from the fourth cleaning tank 41, and the second cleaning tank is supplied by the overflow from the third cleaning tank 31. The cleaning liquid is supplied to 21 and the liquid overflowing from the second cleaning tank 21 is discharged from the pipe 27 and treated by the drainage treatment device.

【0019】第2〜第4の洗浄槽にはエアブローにより
バブルが発生しており、発生したバブルによって基体表
面上の付着物を除去する。
Bubbles are generated in the second to fourth cleaning tanks by air blow, and the generated bubbles remove the deposits on the surface of the substrate.

【0020】図2及び図3は、第2〜4の洗浄槽のバブ
ル発生機構の具体図で、濯ぎ液中にバブルを発生する手
段はこれらの方式に限定されるものではない。
2 and 3 are specific views of the bubble generating mechanism of the second to fourth cleaning tanks, and the means for generating bubbles in the rinsing liquid is not limited to these methods.

【0021】図2において、洗浄槽21の洗浄液25を
上部から抜きフローメータで制御しながら下部から洗浄
槽中に導入する。洗浄槽下部への導入にあたっては、置
換水槽24にその下部から水を導入することによって上
部の空気をノズル部44に供給しバブル34を濯ぎ液中
に発生せしめる。
In FIG. 2, the cleaning liquid 25 in the cleaning tank 21 is extracted from the upper portion and introduced into the cleaning tank from the lower portion while being controlled by a flow meter. When the water is introduced into the lower portion of the cleaning tank, water is introduced into the replacement water tank 24 from the lower portion thereof to supply the air in the upper portion to the nozzle portion 44 to generate bubbles 34 in the rinsing liquid.

【0022】図3はバブル発生機構の別な態様で、洗浄
槽21の底部から抜き出した洗浄液をフローメータで制
御しながら、洗浄液25の液面から斜めに(30〜60
°の角度をもって)導入する。液面への導入にあたって
は、置換水槽24にその下部から水を導入することによ
って上部の空気をノズル部44に供給しバブル34を濯
ぎ液中に発生せしめる。
FIG. 3 shows another mode of the bubble generating mechanism, in which the cleaning liquid extracted from the bottom of the cleaning tank 21 is controlled obliquely from the liquid surface of the cleaning liquid 25 (30 to 60) while controlling the cleaning liquid with a flow meter.
Introduced at an angle of °. At the time of introduction to the liquid surface, water is introduced into the replacement water tank 24 from its lower portion to supply the air in the upper portion to the nozzle portion 44 and generate bubbles 34 in the rinsing liquid.

【0023】図2及び図3においてノズル部44に供給
される空気(圧縮空気)の圧力は1〜10kg/cm2
G、好ましくは2〜8kg/cm2 ・Gで、10kg/cm2
Gを超える圧縮空気を導入すると圧縮空気圧によりピン
ホールを生ずることがあり、又1kg/cm2 ・G未満であ
ると濯ぎ効果が十分でない。
2 and 3, the pressure of the air (compressed air) supplied to the nozzle portion 44 is 1 to 10 kg / cm 2 ·.
G, preferably 2~8kg / cm 2 · G, 10kg / cm 2 ·
If compressed air exceeding G is introduced, pin holes may be generated due to compressed air pressure, and if it is less than 1 kg / cm 2 · G, the rinsing effect is not sufficient.

【0024】尚、撹拌羽根を具備した洗浄槽を用いて、
撹拌しながらエアブローすると濯ぎ効果がより向上す
る。
A cleaning tank equipped with stirring blades is used.
If air blowing is performed while stirring, the rinsing effect is further improved.

【0025】第2〜第4の洗浄槽における浸漬時間はそ
れぞれ0.5〜10分間、好ましくは1.5〜5.0分
間である。尚、浸漬中、必要に応じて、基体を揺動させ
ても良い。
Immersion times in the second to fourth cleaning tanks are respectively 0.5 to 10 minutes, preferably 1.5 to 5.0 minutes. Note that the base body may be rocked during dipping, if necessary.

【0026】(iii)「乾燥工程」:濯ぎ処理が終了した
基体は、公知の方法、例えばクリーン度100に保たれ
たクリーンブース50内で80℃のクリーンエアーを吹
き付けて乾燥される。
(Iii) "Drying step": The substrate after the rinsing treatment is dried by a known method, for example, by blowing clean air of 80 ° C. in a clean booth 50 maintained at a clean degree of 100.

【0027】洗浄処理された導電性基体表面に公知の方
法で感光層を形成する。例えば、浸漬塗布法、リング方
式塗布法又はスプレー塗布法によって、洗浄処理された
導電性基体表面に電荷発生層を形成し、次いで、電荷発
生層の上に浸漬塗布法又はスプレー塗布法によって電荷
輸送層を形成する。
A photosensitive layer is formed on the surface of the conductive substrate that has been washed by a known method. For example, a charge generation layer is formed on the surface of the conductive substrate that has been subjected to the cleaning treatment by a dip coating method, a ring method coating method or a spray coating method, and then the charge transport layer is formed on the charge generating layer by a dip coating method or a spray coating method. Form the layers.

【0028】本発明で用いる電子写真感光体の導電性基
体としては、アルミニウム、銅、ニッケル、ステンレ
ス、真ちゅう等の金属の円筒状基体又は薄膜シート、又
はアルミニウム、錫合金、酸化インジウム等をポリエス
テルフィルムあるいは紙、金属フィルムの円筒状基体等
に蒸着したものが挙げられる。
As the conductive substrate of the electrophotographic photosensitive member used in the present invention, a cylindrical substrate or a thin film sheet of a metal such as aluminum, copper, nickel, stainless steel or brass, or a polyester film of aluminum, tin alloy, indium oxide or the like is used. Alternatively, it may be vapor-deposited on paper or a cylindrical substrate of a metal film.

【0029】感光体層の接着性改良、塗布性改良、基体
上の欠陥の被覆及び基体から電荷発生層への電荷注入性
改良等のために下引き層が設けられることが有る。下引
き層の材料としては、ポリアミド、共重合ナイロン、カ
ゼイン、ポリビニルアルコール、セルロース、ゼラチン
等の樹脂が知られている。これらを各種有機溶媒に溶解
し、膜厚が0.1〜5μm程度になるように導電性円筒
状基体上に塗布される。
An undercoat layer may be provided for the purpose of improving the adhesion of the photosensitive layer, improving the coating property, covering defects on the substrate, improving the charge injection property from the substrate to the charge generating layer, and the like. Resins such as polyamide, copolymerized nylon, casein, polyvinyl alcohol, cellulose and gelatin are known as materials for the undercoat layer. These are dissolved in various organic solvents and coated on a conductive cylindrical substrate so that the film thickness is about 0.1 to 5 μm.

【0030】電荷発生層は、光照射により電荷を発生す
る電荷発生材料を主成分とし、必要に応じて公知の結合
剤、可塑剤、増感剤を含有し、膜厚が1.0μm以下
(乾燥膜厚)となるように導電性円筒状基体又は下引き
層の上に塗布される。
The charge generation layer contains a charge generation material which generates a charge upon irradiation with light as a main component, and if necessary, a known binder, plasticizer and sensitizer, and has a film thickness of 1.0 μm or less ( It is applied on the conductive cylindrical substrate or the undercoat layer so as to have a dry film thickness).

【0031】電荷発生材料としては、ペリレン系顔料、
多環キノン系顔料、フタロシアニン顔料、金属フタロシ
アニン系顔料、スクエアリウム色素、アズレニウム色
素、チアピリリウム色素、及びカルバゾール骨格、スチ
リルスチルベン骨格、トリフェニルアミン骨格、ジベン
ゾチオフェン骨格、オキサジアゾール骨格、フルオレノ
ン骨格、ビススチルベン骨格、ジスチリルオキサジアゾ
ール骨格又はジスチリルカルバゾール骨格を有するアゾ
顔料等が挙げられる。
As the charge generating material, a perylene pigment,
Polycyclic quinone pigments, phthalocyanine pigments, metal phthalocyanine pigments, squarylium dyes, azurenium dyes, thiapyrylium dyes, and carbazole skeletons, styrylstilbene skeletons, triphenylamine skeletons, dibenzothiophene skeletons, oxadiazole skeletons, fluorenone skeletons, bis Examples thereof include azo pigments having a stilbene skeleton, a distyryl oxadiazole skeleton, or a distyryl carbazole skeleton.

【0032】電荷輸送層は、電荷発生材料が発生した電
荷を受け入れこれを輸送する能力を有する電荷輸送材料
及び結着剤を必須成分とし、必要に応じて公知のレベリ
ング剤、可塑剤、増感剤等を含有し、乾燥膜厚5〜70
μmとなるように電荷発生層の上に塗布される。
The charge-transporting layer contains a charge-transporting material capable of receiving and transporting charges generated by the charge-generating material and a binder as essential components, and if necessary, known leveling agents, plasticizers and sensitizers. 5 to 70 including dry agent
It is coated on the charge generation layer so as to have a thickness of μm.

【0033】電荷輸送材料としては、ポリ−N−ビニル
カルバゾール及びその誘導体、ポリ−γ−カルバゾリル
エチルグルタメート及びその誘導体、ピレン−ホルムア
ルデヒド縮合物及びその誘導体、ポリビニルピレン、ポ
リビニルフェナントレン、オキサゾール誘導体、オキソ
ジアゾール誘導体、イミダゾール誘導体、9−(p−ジ
エチルアミノスチリル)アントラセン、1,1−ビス
(4−ジベンジルアミノフェニル)プロパン、スチリル
アントラセン、スチリルピラゾリン、フェニルヒドラゾ
ン類、ヒドラゾン誘導体等の電子供与性物質、或いはフ
ルオレノン誘導体、ジベンゾチオフェン誘導体、インデ
ノチオフェン誘導体、フェナンスレンキノン誘導体、イ
ンデノピリジン誘導体、チオキサントン誘導体、ベンゾ
〔c〕シンノリン誘導体、フェナジンオキサイド誘導
体、テトラシアノエチレン、テトラシアノキノジメタ
ン、プロマニル、クロラニル、ベンゾキノン等の電子受
容性物質等が挙げられる。
As the charge transport material, poly-N-vinylcarbazole and its derivative, poly-γ-carbazolylethylglutamate and its derivative, pyrene-formaldehyde condensate and its derivative, polyvinylpyrene, polyvinylphenanthrene, oxazole derivative, Electron donation of oxodiazole derivatives, imidazole derivatives, 9- (p-diethylaminostyryl) anthracene, 1,1-bis (4-dibenzylaminophenyl) propane, styrylanthracene, styrylpyrazoline, phenylhydrazones, hydrazone derivatives, etc. Substances, or fluorenone derivatives, dibenzothiophene derivatives, indenothiophene derivatives, phenanthrenequinone derivatives, indenopyridine derivatives, thioxanthone derivatives, benzo [c] cinnoline derivatives Body, phenazine oxide derivatives, tetracyanoethylene, tetracyanoquinodimethane, Puromaniru, chloranil, electron-accepting substance such as benzoquinone, and the like.

【0034】電荷輸送層を構成する結着剤としては、電
荷輸送材料と相溶性を有するものであれば良く、例えば
ポリカーボネート、ポリビニルブチラール、ポリアミ
ド、ポリエステル、ポリケトン、エポキシ樹脂、ポリウ
レタン、ポリビニルケトン、ポリスチレン、ポリアクリ
ルアミド、フェノール樹脂、フェノキシ樹脂等が挙げら
れる。
As the binder constituting the charge transport layer, any binder having compatibility with the charge transport material may be used, and examples thereof include polycarbonate, polyvinyl butyral, polyamide, polyester, polyketone, epoxy resin, polyurethane, polyvinyl ketone and polystyrene. , Polyacrylamide, phenol resin, phenoxy resin and the like.

【0035】本発明の方法で製造された電子写真感光体
はハジキ、シミ等による画像への黒ポチ、白ポチの発生
がほとんどなく、良品率が高い。更に、洗浄工程におい
て、有機溶媒を使用しないので、有機溶媒の使用による
大気汚染、人体への影響、高い引火性及び発火性による
爆発の危険等がない。
The electrophotographic photosensitive member produced by the method of the present invention has almost no black spots or white spots on the image due to cissing or stains, and has a high yield rate. Furthermore, since no organic solvent is used in the cleaning process, there is no risk of air pollution due to the use of organic solvent, effects on the human body, high flammability, and explosion due to ignition.

【0036】[0036]

【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明はこれら実施例に限定されるものではな
い。
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.

【0037】実施例1 図1で示した方法により、切削加工した円筒状基体を洗
浄処理した。図1の方法において、第1の洗浄槽の洗浄
液として、ポラークリーン690(田中インポートグル
ープ(株))の5%純水溶液を用い、第2〜4の洗浄槽
の洗浄液として、純水を用いた。第1の洗浄槽の洗浄液
は50℃に加温されており、第2〜4の洗浄槽の洗浄液
の温度はそれぞれ25℃であった。第1乃至第4の洗浄
槽への浸漬時間はそれぞれ2分間であった。第2〜第4
の洗浄槽は図2に示されるような構成をしており、約5
kg/cm2 ・Gの圧縮空気を送り込むことによって、洗浄
液内にバブルを発生させ洗浄した。
Example 1 A cylindrical substrate that had been cut was washed by the method shown in FIG. In the method of FIG. 1, a 5% pure aqueous solution of Polar Clean 690 (Tanaka Import Group Co., Ltd.) was used as the cleaning liquid for the first cleaning tank, and pure water was used as the cleaning liquid for the second to fourth cleaning tanks. .. The cleaning liquid in the first cleaning tank was heated to 50 ° C, and the temperatures of the cleaning liquids in the second to fourth cleaning tanks were 25 ° C. The immersion time in each of the first to fourth cleaning tanks was 2 minutes. 2nd-4th
The cleaning tank has a structure as shown in FIG.
By blowing in compressed air of kg / cm 2 · G, bubbles were generated in the cleaning liquid for cleaning.

【0038】洗浄処理された基体はクリーン度100に
保たれたクリーンブース内で80℃のクリーンエアーを
吹き付けて乾燥した。
The washed substrate was dried by blowing clean air at 80 ° C. in a clean booth maintained at a clean degree of 100.

【0039】得られた円筒状基体を公知の浸漬塗布方法
により下記A液を円筒状基体の表面に乾燥後の膜厚0.
5μmになるように浸漬塗布し、75℃の温度で1時間
乾燥し、更に下記B液をA液が塗布された円筒状基体の
表面に乾燥後の膜厚20μmになるように浸漬塗布し、
75℃の温度で1時間乾燥した。
The obtained cylindrical substrate was coated with the following solution A on the surface of the cylindrical substrate by a known dip coating method to obtain a film thickness of 0.
It is applied by dip coating to have a thickness of 5 μm and dried at a temperature of 75 ° C. for 1 hour. Further, the following liquid B is dip-coated on the surface of the cylindrical substrate coated with liquid A so that the film thickness after drying is 20 μm,
It was dried at a temperature of 75 ° C. for 1 hour.

【0040】A液 ジブロムアンスアンスロン2重量部、ブチラール樹脂
〔エスレックBM−2,セキスイ化学(株)製〕2重量
部、シクロヘキサノン230重量部をボールミルにて8
時間分散処理して得られた液。
2 parts by weight of liquid A dibromoanthanthrone, 2 parts by weight of butyral resin [S-REC BM-2, manufactured by Sekisui Chemical Co., Ltd.], and 230 parts by weight of cyclohexanone were mixed with a ball mill to obtain 8 parts.
Liquid obtained by time dispersion treatment.

【0041】B液 ヒドラゾン系電荷輸送材〔ABPH,日本化薬(株)
製〕1重量部、ポリカーボネート樹脂〔パンライトL−
1250,帝人化成(株)製〕1重量部をジクロルエタ
ン8重量部で溶解して得られた液。
Liquid B hydrazone type charge transport material [ABPH, Nippon Kayaku Co., Ltd.
1 part by weight, polycarbonate resin [Panlite L-
1250, manufactured by Teijin Chemicals Ltd.] 1 part by weight dissolved in 8 parts by weight of dichloroethane.

【0042】得られた電子写真感光体30本を回転用治
具に装着し複写機〔SF−8100,シャープ(株)
製〕に搭載してコピーを取り画像評価を行なった。結果
を表1に示す。
The obtained 30 electrophotographic photoconductors were mounted on a rotating jig, and a copying machine [SF-8100, manufactured by Sharp Corporation] was used.
The image was evaluated by making a copy of the product. The results are shown in Table 1.

【0043】比較例1 切削加工した円筒状基体を、有機溶剤として60℃の
1,1,1−トリクロルエタンを用い超音波・温浴洗浄
処理を30秒間行なった。20℃の1,1,1−トリク
ロルエタンに30秒間冷浴した後、1,1,1−トリク
ロルエタンを用いて蒸気洗浄を30秒間行ない、クリー
ンルームで20分間放冷した。得られた円筒状基体の表
面に実施例1と同様の方法で感光体層を形成した。
Comparative Example 1 The cut cylindrical substrate was subjected to ultrasonic / warm bath cleaning treatment for 30 seconds by using 1,1,1-trichloroethane at 60 ° C. as an organic solvent. After cooling in 1,1,1-trichloroethane at 20 ° C. for 30 seconds, steam cleaning was performed for 30 seconds using 1,1,1-trichloroethane, and the mixture was allowed to cool in a clean room for 20 minutes. A photoreceptor layer was formed on the surface of the obtained cylindrical substrate by the same method as in Example 1.

【0044】得られた電子写真感光体30本を実施例1
と同様の方法で画像評価を行なった。結果を表1に示
す。
Thirty electrophotographic photosensitive members thus obtained were used in Example 1.
Image evaluation was performed in the same manner as in. The results are shown in Table 1.

【0045】比較例2 洗浄処理をしない円筒状基体の表面に実施例1と同様の
方法で感光体層を形成した。得られた電子写真感光体3
0本を実施例1と同様の方法で画像評価を行なった。結
果を表1に示す。
Comparative Example 2 A photoreceptor layer was formed on the surface of a cylindrical substrate which was not washed by the same method as in Example 1. Obtained electrophotographic photoreceptor 3
The image evaluation was performed on 0 of them in the same manner as in Example 1. The results are shown in Table 1.

【0046】参考例1 第2乃至第4洗浄槽でエアブローのかわりに、第2乃至
第4洗浄槽に超音波発振器を設けて30kHz の超音波を
発振してそれぞれ2分間濯ぎ処理したことを除いて実施
例1と同様の洗浄処理をし、得られた基体の表面に実施
例1と同様の方法で感光体を形成した。
Reference Example 1 Except that instead of air blowing in the second to fourth cleaning tanks, ultrasonic oscillators were provided in the second to fourth cleaning tanks and ultrasonic waves of 30 kHz were oscillated and rinsed for 2 minutes each. Then, the same cleaning treatment as in Example 1 was performed, and a photoreceptor was formed on the surface of the obtained substrate by the same method as in Example 1.

【0047】得られた電子写真感光体30本を実施例1
と同様の方法で画像評価を行なった。結果を表1に示
す。
Thirty electrophotographic photoreceptors obtained were used in Example 1.
Image evaluation was performed in the same manner as in. The results are shown in Table 1.

【0048】[0048]

【表1】 [Table 1]

【0049】[0049]

【発明の効果】本発明の方法は、洗浄不良によるハジ
キ、シミ及び濯ぎ処理中の超音波発振によるキャビテー
ションに基づくピンホールの発生が防止され、良品率に
おいても、従来の1,1,1−トリクロルエタン洗浄液
を使用する場合とほとんど同じで良品率の低下が防止さ
れ、実用可能な高収率で電子写真感光体が得られる。更
に、洗浄液として有機溶剤を使用しないので、有機溶剤
の使用による大気汚染、人体への影響、高い引火性及び
発火性による爆発の危険、特に1,1,1−トリクロル
エタン、フロンの洗浄液としての使用による地球温暖化
及びオゾン層の破壊等の問題が解消される。
EFFECTS OF THE INVENTION The method of the present invention prevents repelling due to poor cleaning, stains, and pinholes due to cavitation due to ultrasonic oscillation during rinsing treatment, and the yield rate is 1,1,1- Almost the same as when using a trichloroethane cleaning solution, the reduction of the yield rate is prevented, and an electrophotographic photoreceptor can be obtained in a practically high yield. Furthermore, since an organic solvent is not used as a cleaning liquid, air pollution due to the use of an organic solvent, effects on the human body, explosion hazard due to high flammability and ignition, especially 1,1,1-trichloroethane, as a cleaning liquid for CFCs Problems such as global warming and ozone depletion due to use can be solved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の洗浄方法の概略図である。FIG. 1 is a schematic view of a cleaning method of the present invention.

【図2】本発明の第2〜第4洗浄槽の詳細図である。FIG. 2 is a detailed view of second to fourth cleaning tanks of the present invention.

【図3】本発明の第2〜第4洗浄槽の別の態様の詳細図
である。
FIG. 3 is a detailed view of another embodiment of second to fourth cleaning tanks of the present invention.

【符号の説明】[Explanation of symbols]

1 導電性基体 11 第1の洗浄槽 17 第1の洗浄槽の超音波発振器 18 第1の洗浄槽の洗浄液 21 第2の洗浄槽 24 置換水槽 31 第3の洗浄槽 41 第4の洗浄槽 44 ノズル部 50 クリーンブース 1 Conductive Substrate 11 First Cleaning Tank 17 Ultrasonic Oscillator for First Cleaning Tank 18 Cleaning Solution for First Cleaning Tank 21 Second Cleaning Tank 24 Replacement Water Tank 31 Third Cleaning Tank 41 Fourth Cleaning Tank 44 Nozzle part 50 clean booth

───────────────────────────────────────────────────── フロントページの続き (72)発明者 松本 雅則 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内 (72)発明者 新居 和幸 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内 (72)発明者 忍 充弘 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Masanori Matsumoto 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Within Sharp Corporation (72) Kazuyuki Arai 22-22 Nagaike-cho, Abeno-ku, Osaka, Osaka Co., Ltd. (72) Inventor Mitsuhiro Shinobu 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Prefecture

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 電子写真感光体用導電性基体表面を純
水、イオン交換水又は界面活性剤含有水で洗浄し、エア
ブローによりバブルが発生している濯ぎ液で処理し、乾
燥することを特徴とする電子写真感光体用導電性基体の
洗浄方法。
1. The surface of a conductive substrate for an electrophotographic photoreceptor is washed with pure water, ion-exchanged water or water containing a surfactant, treated with a rinsing liquid in which bubbles are generated by air blowing, and dried. And a method for cleaning a conductive substrate for an electrophotographic photoreceptor.
JP2249592A 1992-02-07 1992-02-07 Washing method for conductive base body for electrophotographic sensitive body Pending JPH05216254A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2249592A JPH05216254A (en) 1992-02-07 1992-02-07 Washing method for conductive base body for electrophotographic sensitive body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2249592A JPH05216254A (en) 1992-02-07 1992-02-07 Washing method for conductive base body for electrophotographic sensitive body

Publications (1)

Publication Number Publication Date
JPH05216254A true JPH05216254A (en) 1993-08-27

Family

ID=12084321

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2249592A Pending JPH05216254A (en) 1992-02-07 1992-02-07 Washing method for conductive base body for electrophotographic sensitive body

Country Status (1)

Country Link
JP (1) JPH05216254A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015221417A (en) * 2014-05-23 2015-12-10 シャープ株式会社 Washing apparatus and washing method for electrically conductive substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015221417A (en) * 2014-05-23 2015-12-10 シャープ株式会社 Washing apparatus and washing method for electrically conductive substrate

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