JPH05210246A - Production of electrophotographic sensitive body - Google Patents

Production of electrophotographic sensitive body

Info

Publication number
JPH05210246A
JPH05210246A JP1657092A JP1657092A JPH05210246A JP H05210246 A JPH05210246 A JP H05210246A JP 1657092 A JP1657092 A JP 1657092A JP 1657092 A JP1657092 A JP 1657092A JP H05210246 A JPH05210246 A JP H05210246A
Authority
JP
Japan
Prior art keywords
water
cleaning
substrate
layer
electrophotographic sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1657092A
Other languages
Japanese (ja)
Inventor
Mitsuhiro Shinobu
充弘 忍
Masanori Matsumoto
雅則 松本
Masayuki Sakamoto
雅遊亀 坂元
Hiroshi Matsumoto
浩史 松本
Tatsuhiro Morita
竜廣 森田
Kazuyuki Arai
和幸 新居
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP1657092A priority Critical patent/JPH05210246A/en
Publication of JPH05210246A publication Critical patent/JPH05210246A/en
Pending legal-status Critical Current

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  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To provide the electrophotographic sensitive body which has decreased image defects, such as black spots, white spots and unequalness of halftone images even if a conductive base body for the electrophotographic sensitive body is subjected to a water washing treatment and has decreased characteristics defects at use for long time. CONSTITUTION:The conductive base body 1 for the electrophotographic sensitive body is washed with pure water, ion exchange water or surfactant-contg. water 18 and is subjected to a rinsing treatment; thereafter, the base body is immersed under the impression of ultrasonic wave into an aq. soln. 45 dissolved with a water-soluble resin and is pulled up under the non-impression of the wave to form an under coating layer. A photosensitive layer is formed thereon.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電子写真感光体の製造方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an electrophotographic photosensitive member.

【0002】[0002]

【従来の技術】一般的に電子写真感光体は、ドラム状導
電性基体上に感光層を形成したものである。このドラム
状導電性基体は円筒状のアルミを鏡面加工又は板状のア
ルミをインパクト成形することにより作成される。鏡面
加工又はインパクト成形中に基体表面には、切削油のミ
スト、空気中のダスト、切粉等が付着するため、基体表
面を洗浄処理して除去した後に、縮合多環顔料、アゾ顔
料等の電荷発生物質、樹脂の結着剤等から成る電荷発生
層及びヒドラゾン系又はアリールアミン系電荷輸送物
質、樹脂の結着剤、酸化防止剤等から成る電荷輸送層を
順次塗布・積層し、乾燥して感光層を形成する。
2. Description of the Related Art Generally, an electrophotographic photosensitive member is one in which a photosensitive layer is formed on a drum-shaped conductive substrate. This drum-shaped conductive substrate is formed by mirror-finishing cylindrical aluminum or impact-molding plate-shaped aluminum. Cutting oil mist, dust in the air, chips, etc. adhere to the surface of the substrate during mirror processing or impact molding, so after removing the substrate surface by washing, condensation polycyclic pigments, azo pigments, etc. A charge generation layer composed of a charge generation material, a resin binder, etc. and a charge transport layer composed of a hydrazone or arylamine charge transport material, a resin binder, an antioxidant, etc. are successively applied, laminated and dried. To form a photosensitive layer.

【0003】電荷発生層及び電荷輸送層は、上述した電
荷発生層及び電荷輸送層を構成する物質をそれぞれ含有
する塗布液にドラム状導電性基体を公知の方法で浸漬す
ることによって該基体の表面に形成される。ここで行な
う浸漬塗布方法としては、特に制限はなく公知の方法が
使用し得るが、例えば特開昭49−130736、特開
昭57−5047及び特開昭59−46171に開示さ
れる方法が挙げられる。
The charge-generating layer and the charge-transporting layer are prepared by immersing the drum-shaped conductive substrate in a coating method containing the above-mentioned substances constituting the charge-generating layer and the charge-transporting layer by a known method. Formed in. The dip coating method carried out here is not particularly limited and known methods can be used. Examples thereof include the methods disclosed in JP-A-49-130736, JP-A-57-5047 and JP-A-59-46171. Be done.

【0004】浸漬塗布方法において、前処理である導電
性基体表面の洗浄が不十分であると、その表面に油、ダ
スト等が残り、塗布の際にハジキ、シミ等の塗布欠陥の
原因となる。このような電子写真感光体上に発生した欠
陥は、コピー画像に黒ポチ、白ポチ、ハーフトーン画像
のムラ等となって現われ、画像品質に悪影響を及ぼし、
かような電子写真感光体は実用に適さないものである。
In the dip coating method, if the surface of the conductive substrate, which is a pretreatment, is insufficiently cleaned, oil, dust and the like remain on the surface and cause coating defects such as cissing and stains during coating. .. Defects generated on such an electrophotographic photosensitive member appear as black spots, white spots, and halftone image unevenness in a copy image, and adversely affect image quality.
Such an electrophotographic photoreceptor is not suitable for practical use.

【0005】基体表面の洗浄としては、通常有機溶媒
中、又は必要に応じて加温された有機溶媒中に基体を浸
漬処理又は超音波の作用下で浸漬処理する浸漬洗浄;基
体を溶媒に浸漬中又は基体に溶媒をシャワーリングしな
がらブラシ、スポンジ等により物理的に擦する接触洗
浄;溶媒を高圧下でスリットより基体表面に噴出するジ
ェット洗浄及び溶媒蒸気中に基体を挿入する蒸気洗浄が
挙げられ、これらの単独又は組合せにより基体表面の洗
浄が行なわれている。
The surface of the substrate is usually washed by dipping the substrate in an organic solvent or, if necessary, in an organic solvent heated, or by sonication; dipping the substrate in a solvent. Contact cleaning in which the solvent is physically rubbed with a brush, sponge or the like while showering the solvent on the inside or the substrate; jet cleaning in which the solvent is jetted from the slit to the surface of the substrate under high pressure and vapor cleaning in which the substrate is inserted into the solvent vapor. The cleaning of the surface of the substrate is carried out singly or in combination.

【0006】ここで使用される溶媒としては、メチレン
クロライド、エチレンクロライド、1,1,1−トリク
ロルエタン、トリクロルエチレン、パークロルエチレン
等の塩素系溶剤、フロン−112、フロン−113等の
フッ素系溶剤、該フッ素系溶剤とメタノール、メチレン
クロライド等との混合溶剤、ベンゼン、トルエン、メタ
ノール、エタノール、イソプロピルアルコール、石油系
炭化水素等及びこれらの混合物が挙げられる。これらの
溶剤中には引火性、発火性を有するもの、人体に有害で
あるので使用許容濃度が低いもの、洗浄能力が低いもの
が含まれており、最も一般的に使用されている溶剤は、
1,1,1−トリクロルエタンである。しかしながら、
1,1,1−トリクロルエタンは、洗浄能力が高い、取
扱いが容易等の長所があるものの、地球温暖化、オゾン
層の破壊等を引起す物質の一つであると推考され、フロ
ンとともに全世界でその削減が決定されており、1,
1,1−トリクロルエタンの代替洗浄液の提供又は代替
洗浄法の開発が要求されている。
Examples of the solvent used here include chlorine-based solvents such as methylene chloride, ethylene chloride, 1,1,1-trichloroethane, trichloroethylene and perchlorethylene, and fluorine-based solvents such as Freon-112 and Freon-113. Solvents, mixed solvents of the fluorine-based solvent with methanol, methylene chloride, etc., benzene, toluene, methanol, ethanol, isopropyl alcohol, petroleum hydrocarbons, etc., and mixtures thereof. These solvents include those that are flammable and ignitable, those that have a low permissible concentration because they are harmful to the human body, and those that have a low cleaning ability.The most commonly used solvents are:
It is 1,1,1-trichloroethane. However,
Although 1,1,1-trichloroethane has the advantages of high cleaning ability and easy handling, it is considered to be one of the substances that cause global warming and ozone layer depletion. The reduction has been decided in the world,
It is required to provide an alternative cleaning solution for 1,1-trichloroethane or to develop an alternative cleaning method.

【0007】1,1,1−トリクロルエタン等の有機溶
媒を用いる洗浄の代替として、純水又は界面活性剤含有
水に浸漬洗浄する、所謂水洗浄が提案されている。
As an alternative to cleaning using an organic solvent such as 1,1,1-trichloroethane, so-called water cleaning has been proposed in which immersion cleaning is performed in pure water or water containing a surfactant.

【0008】前述の有機溶媒による洗浄後の乾燥は、空
気中への開放により溶媒が瞬時に蒸発して乾燥が完了す
るが、水洗浄の場合は、常温における水の蒸発速度が遅
いので、空気中のダストが付着したり、乾燥ムラ、シミ
が導電性基体表面に生じたりする傾向があり、この導電
性基体を用いて製造した電子写真感光体は、コピー画像
に黒ポチ、白ポチ、ハーフトーン画像のムラ等の画像欠
陥を生じることが度々ある。
In the drying after washing with the organic solvent described above, the solvent is instantly evaporated by opening to the air and the drying is completed. However, in the case of washing with water, the evaporation rate of water at room temperature is slow, There is a tendency for dust inside to adhere, drying unevenness, and spots to occur on the surface of the conductive base material.Electrophotographic photoreceptors produced using this conductive base material have black spots, white spots, and half spots on copy images. Image defects such as unevenness of a toned image often occur.

【0009】また、従来の洗浄液としてトリクロルエタ
ン、フロン等を用いる洗浄においては超音波発振時に生
ずるキャビテーションが弱いので、導電性基体に与える
ダメージは小さい。しかしながら、水は上述の有機溶剤
に比べ表面張力が大きく、蒸気圧が高く、且つ粘度が高
いので、生ずるキャビテーションが強く、特に基体が比
較的柔らかい材料から成る場合には、洗浄中に基体表面
にピンホールが発生することがある。
Further, in the conventional cleaning using trichloroethane, chlorofluorocarbon, etc., cavitation generated during ultrasonic oscillation is weak, so that damage to the conductive substrate is small. However, water has a higher surface tension, a higher vapor pressure, and a higher viscosity than the above-mentioned organic solvents, so that cavitation that occurs is strong, and especially when the substrate is made of a relatively soft material, the surface of the substrate may be washed during cleaning. Pinholes may occur.

【0010】導電性基体材料としてコスト、加工しやす
さ、強度、重量等の観点から最も一般的に使用されてい
るアルミニウムは、洗浄液が中性であっても反応が起
り、更に酸性又はアルカリ性の場合には、その反応が加
速する。また、洗浄液の温度を高くした場合も、その反
応は加速する。このような洗浄液との反応によりアルミ
ニウム基体の表面には、アルミニウムの酸化物、水酸化
物、水和物等が生成し、該化合物の生成した基体表面は
微小部分で物理的ぬれ性の変化(接触角の違い)を生じ
る。
Aluminum, which is most commonly used as a conductive substrate material from the viewpoints of cost, workability, strength, weight, etc., causes a reaction even if the cleaning liquid is neutral, and is more acidic or alkaline. In some cases, the reaction will accelerate. The reaction also accelerates when the temperature of the cleaning liquid is increased. Oxides, hydroxides, hydrates, etc. of aluminum are produced on the surface of the aluminum substrate by the reaction with such a cleaning liquid, and the substrate surface produced by the compound changes in physical wettability in a minute portion ( Difference in contact angle) occurs.

【0011】そのような導電性基体の表面に電荷発生層
及び電荷輸送層の感光体層を形成すると、塗布ムラ、塗
布ヌケを生じ、製造された電子写真感光体は、暗部電位
の低下及び電位のバラツキ、明部電位の低下等を招き、
コピー画像に黒ポチ、白ポチ等の画像欠陥を生ずること
がある。
When a photoconductor layer of a charge generation layer and a charge transport layer is formed on the surface of such a conductive substrate, coating unevenness and coating missing occur, and the manufactured electrophotographic photoreceptor has a lowered dark area potential and potential. Variation, a decrease in the bright part potential, etc.
Image defects such as black spots and white spots may occur in the copy image.

【0012】濯ぎ処理後の導電性基体の乾燥する方法と
して、熱風エアブロー法、温純水浸漬法、イソプロピル
アルコール(IPA)蒸気乾燥法等が提案されている
が、乾燥中に水滴が濃縮し水中に含まれるダスト等がシ
ミとなったり、空気中のダストが付着したり、温水浸漬
の水蒸気と反応して水酸化物、水和物等が生成したりし
て塗布欠陥を生じ、コピー画像に、黒ポチ、色ポチの画
像欠陥を生じる原因となり、良品率を低下させたり、ま
た水とIPAの分離が困難でコスト高の要因となる欠点
を有している。
As a method for drying the conductive substrate after the rinsing treatment, a hot air blowing method, a hot pure water immersion method, an isopropyl alcohol (IPA) vapor drying method and the like have been proposed. The dust that is generated becomes stains, the dust in the air adheres, and it reacts with the steam in hot water to form hydroxides, hydrates, etc., causing coating defects, and black images appear on the copy image. This has the drawback of causing image defects such as spots and color spots, lowering the rate of non-defective products, and making separation of water and IPA difficult, which causes a high cost.

【0013】[0013]

【発明が解決しようとする課題】純水、イオン交換水又
は界面活性剤含有水を洗浄液として用いて導電性基体を
洗浄した後に感光層を形成する電子写真感光体の製造に
おいて、コピー画像に黒ポチ、白ポチ、ハーフトーン画
像のムラ等の画像欠陥が生じない電子写真感光体を製造
する方法の開発が強く望まれる。
In the production of an electrophotographic photosensitive member in which a photosensitive layer is formed after cleaning a conductive substrate using pure water, ion-exchanged water or water containing a surfactant as a cleaning liquid, a black copy image is produced. It is strongly desired to develop a method for producing an electrophotographic photosensitive member that does not cause image defects such as spots, white spots, and unevenness of halftone images.

【0014】[0014]

【課題を解決するための手段】本発明者等の鋭意研究の
結果、導電性基体表面を純水、イオン交換水又は界面活
性剤含有水で浸漬洗浄し、純水又はイオン交換水で濯ぎ
処理後、乾燥処理することなく直ちに水可溶性樹脂が溶
解している水溶液中に超音波の作用下で浸漬し、超音波
非作用下で引上げて下引き層を形成することによって、
水洗浄による乾燥ムラに基づく画像欠陥発生の問題を解
消することができ、且つ生成した感光体の表面電位及び
膜厚のバラツキを抑制することができることを見出し、
この知見に基づいて本発明を成すに至った。
As a result of intensive studies by the present inventors, the surface of a conductive substrate is immersed and washed in pure water, ion-exchanged water or water containing a surfactant, and rinsed with pure water or ion-exchanged water. After that, by immediately immersing the water-soluble resin in an aqueous solution in which the water-soluble resin is dissolved without drying treatment under the action of ultrasonic waves, and pulling up under the action of ultrasonic waves to form an undercoat layer,
It has been found that it is possible to solve the problem of image defects due to uneven drying due to water washing, and to suppress the variation in the surface potential and the film thickness of the photoconductor that is generated,
The present invention has been completed based on this finding.

【0015】[0015]

【作用】図1は本発明の洗浄方法の概略を示す図であ
る。
1 is a diagram showing the outline of the cleaning method of the present invention.

【0016】(i)「洗浄工程」:切削加工又はインパ
クト成形された基体1はレール3に配置されたロボット
ハンド2に支持されている。第1の洗浄槽11は純水又
はイオン交換水、好ましくは界面活性剤が溶解した純水
又はイオン交換水の洗浄液18で満たされており、該洗
浄液はヒーター16により40〜60℃に加熱されてお
り、且つ洗浄槽11底部には超音波発振器17が備付け
られ、基体浸漬時に超音波が発振するようになってい
る。洗浄槽11にはパイプ12から洗浄液がタンク(図
示せず)より定常的に送り込まれている。洗浄によって
基体表面から除去された油、ダスト、切粉が分散してい
る洗浄液は配管19からポンプ14によりフィルター1
5を経て循環し、ダスト、切粉等はフィルター15に補
足される。基体の浸漬によりオーバーフローする液は配
管13から排出される。排出された洗浄液は廃液処理装
置(図示せず)により処理される。
(I) "Cleaning step": The base body 1 that has been cut or impact-formed is supported by a robot hand 2 arranged on a rail 3. The first cleaning tank 11 is filled with a cleaning liquid 18 of pure water or ion-exchanged water, preferably pure water or ion-exchanged water in which a surfactant is dissolved, and the cleaning liquid is heated to 40 to 60 ° C. by a heater 16. In addition, an ultrasonic oscillator 17 is provided at the bottom of the cleaning tank 11 so that ultrasonic waves oscillate when the substrate is immersed. A cleaning liquid is constantly fed into the cleaning tank 11 from a pipe (not shown) through a pipe 12. The cleaning liquid in which the oil, dust, and chips removed from the substrate surface by the cleaning is dispersed is supplied from the pipe 19 to the filter 1 by the pump 14.
It circulates after passing through 5, and dust, cutting chips, etc. are captured by the filter 15. The liquid that overflows due to the immersion of the substrate is discharged from the pipe 13. The discharged cleaning liquid is processed by a waste liquid processing device (not shown).

【0017】(ii)「濯ぎ工程」:第2の洗浄槽21及
び第3の洗浄槽31にはそれぞれ洗浄液25,35とし
て純水又はイオン交換水が満たされていて濯ぎ処理がな
される。それぞれの洗浄槽底部には超音波発振器24,
34が配備され、各洗浄槽の洗浄液は、それぞれ配管2
6,36からポンプ22,32、フィルター23,33
を経て循環し、該フィルターによって、ダスト、切粉等
が補足される。洗浄液はタンク60より第3の洗浄槽3
1に供給され、第3の洗浄槽31からのオーバーフロー
により、第2の洗浄槽21に洗浄液が供給され、且つ第
2の洗浄槽21からオーバーフローする液は配管27か
ら排出され、廃液処理装置で処理される。
(Ii) "Rinse step": The second cleaning tank 21 and the third cleaning tank 31 are filled with pure water or ion-exchanged water as the cleaning liquids 25 and 35, respectively, and a rinsing process is performed. An ultrasonic oscillator 24 is provided at the bottom of each cleaning tank,
34 is provided, and the cleaning liquid in each cleaning tank is connected to the pipe 2 respectively.
6,36 to pumps 22,32, filters 23,33
And is circulated, and dust, cutting chips, etc. are captured by the filter. The cleaning liquid is supplied from the tank 60 to the third cleaning tank 3
1, the cleaning liquid is supplied to the second cleaning tank 21 due to the overflow from the third cleaning tank 31, and the liquid overflowing from the second cleaning tank 21 is discharged from the pipe 27, and is discharged by the waste liquid treatment device. It is processed.

【0018】本発明で使用する界面活性剤としては、基
体を腐食することのないノニオン系界面活性剤及び/又
はアニオン系界面活性剤が使用し得、その具体例として
は、ポリオキシエチレンアルキルフェニルエーテル、ポ
リオキシエチレン・ポリオキシプロピレン・ブロックコ
ポリマー型及びノニルフェノールポリオキシエチレンエ
ーテルのノニオン系界面活性剤及びアルキルベンゼン、
高級アルコール、α−オレフィン等の硫酸塩、ケイ酸
塩、炭酸塩又はリン酸塩のアニオン系界面活性剤が挙げ
られる。
As the surfactant used in the present invention, a nonionic surfactant and / or an anionic surfactant which does not corrode the substrate can be used. Specific examples thereof include polyoxyethylene alkylphenyl. Nonionic surfactants of ether, polyoxyethylene / polyoxypropylene / block copolymer type and nonylphenol polyoxyethylene ether, and alkylbenzene,
Examples include anionic surfactants such as higher alcohols, sulfates such as α-olefins, silicates, carbonates or phosphates.

【0019】又、洗浄助剤(ビルダー)として、炭酸ナ
トリウム、トリポリリン酸ナトリウム、ピロリン酸カリ
ウム、ケイ酸ナトリウム、硫酸ナトリウム等の無機ビル
ダー、カルボキシメチルセルロース、メチルセルロー
ス、有機アミン等の有機ビルダーを洗浄液に添加しても
良い。
As a cleaning aid (builder), an inorganic builder such as sodium carbonate, sodium tripolyphosphate, potassium pyrophosphate, sodium silicate or sodium sulfate, or an organic builder such as carboxymethyl cellulose, methyl cellulose or organic amine is added to the cleaning liquid. You may.

【0020】本発明の洗浄液の界面活性剤の濃度は0.
5〜30%、好ましくは4〜15%である。
The concentration of the surfactant in the cleaning solution of the present invention is 0.
It is 5 to 30%, preferably 4 to 15%.

【0021】本発明の第1の洗浄槽における洗浄時間
(浸漬時間)は、0.5〜10分間、好ましくは1.5
〜5分間で、第2及び第3の洗浄槽における浸漬時間も
それぞれ0.5〜10分間、好ましくは1.5〜5分間
である。尚、浸漬中、必要に応じて、基体を揺動させて
も良い。
The cleaning time (immersion time) in the first cleaning tank of the present invention is 0.5 to 10 minutes, preferably 1.5.
-5 minutes, the immersion time in the second and third cleaning tanks is also 0.5-10 minutes, preferably 1.5-5 minutes. Note that the base body may be rocked during dipping, if necessary.

【0022】(iii)「下引き層の形成工程」:第4の浸
漬槽41には水可溶性樹脂が溶解した水溶液45が充填
されており、その底部には超音波発振器46が配備さ
れ、水可溶性樹脂水溶液は配管46からポンプ42によ
りフィルター43を経て循環している。センサーにて第
4の浸漬槽41の液面を検知しながら、撹拌機70付タ
ンク50から水可溶性樹脂水溶液を第4の浸漬槽41へ
供給している。
(Iii) "Undercoat layer forming step": The fourth dipping tank 41 is filled with an aqueous solution 45 in which a water-soluble resin is dissolved, and an ultrasonic oscillator 46 is installed at the bottom of the aqueous solution 45. The soluble resin aqueous solution is circulated from a pipe 46 by a pump 42 through a filter 43. The water-soluble resin aqueous solution is supplied from the tank 50 with the agitator 70 to the fourth immersion tank 41 while the sensor detects the liquid level of the fourth immersion tank 41.

【0023】濯ぎ処理後の基体を超音波作用下で浸漬す
ると、基体表面に付着している水分を基体表面より切り
離し、水溶液中に拡散させ得る。引上げる時は基体表面
に水可溶性樹脂が下引き層として塗布されるので塗布ム
ラが発生しないように、且つ塗布膜厚が不均一とならな
いように振動や波を液中及び液面に生じさせないために
超音波を照射しない。
When the rinsed substrate is immersed under the action of ultrasonic waves, the water adhering to the substrate surface can be separated from the substrate surface and diffused into the aqueous solution. When pulling up, the water-soluble resin is applied as a subbing layer on the surface of the substrate, so that uneven coating does not occur and vibration and waves do not occur in the liquid and the liquid surface so that the coating film thickness is not uneven Therefore, do not irradiate ultrasonic waves.

【0024】下引き層の水可溶性結着剤樹脂としては、
感光層形成塗布液を構成する溶剤(有機溶剤)に対して
耐溶解性の高い樹脂で、カゼイン、ポリビニルアルコー
ル、ポリビニルエーテル、ポリアクリル酸ナトリウム、
ポリメタアクリル酸等の水溶性樹脂が挙げられる。
As the water-soluble binder resin for the undercoat layer,
A resin having high resistance to dissolution in the solvent (organic solvent) that constitutes the photosensitive layer forming coating liquid, such as casein, polyvinyl alcohol, polyvinyl ether, sodium polyacrylate,
Water-soluble resins such as polymethacrylic acid may be mentioned.

【0025】下引き層の厚さは0.1〜30μm、好ま
しくは0.2〜20μmである。下引き層の厚さが0.
1μm未満であると、感光層の塗布ヌケが起り、30μ
mを超えると残留電位が上昇することがある。
The thickness of the undercoat layer is 0.1 to 30 μm, preferably 0.2 to 20 μm. The thickness of the undercoat layer is 0.
If it is less than 1 μm, coating loss of the photosensitive layer may occur, resulting in 30 μm.
If it exceeds m, the residual potential may increase.

【0026】第1〜第3の洗浄槽及び第4の浸漬槽の照
射する超音波は20〜100kHz である。
The ultrasonic waves emitted from the first to third cleaning tanks and the fourth immersion tank are 20 to 100 kHz.

【0027】下引き層が形成された導電性基体に公知の
方法で感光層を形成する。例えば、浸漬塗布法又はスプ
レー塗布法によって、下引き層が塗布された導電性基体
表面に電荷発生層を形成し、次いで、電荷発生層の上に
浸漬塗布法又はスプレー塗布法によって電荷輸送層を形
成する。
A photosensitive layer is formed on the conductive substrate having the undercoat layer by a known method. For example, by a dip coating method or a spray coating method, a charge generation layer is formed on the surface of the conductive substrate coated with the undercoat layer, and then a charge transport layer is formed on the charge generation layer by a dip coating method or a spray coating method. Form.

【0028】本発明で用いる電子写真感光体の導電性基
体としては、アルミニウム、銅、ニッケル、ステンレ
ス、真ちゅう等の金属の円筒状基体又は薄膜シート、又
はアルミニウム、錫合金、酸化インジウム等をポリエス
テルフィルムあるいは紙、金属フィルムの円筒状基体等
に蒸着したものが挙げられる。
As the conductive substrate of the electrophotographic photosensitive member used in the present invention, a cylindrical substrate or a thin film sheet of a metal such as aluminum, copper, nickel, stainless steel or brass, or a polyester film of aluminum, tin alloy, indium oxide or the like is used. Alternatively, it may be vapor-deposited on paper or a cylindrical substrate of a metal film.

【0029】電荷発生層は、光照射により電荷を発生す
る電荷発生材料を主成分とし、必要に応じて公知の結合
剤、可塑剤、増感剤を含有し、膜厚が1.0μm以下
(乾燥膜厚)となるように下引き層の上に塗布される。
The charge generation layer contains a charge generation material which generates charges upon irradiation with light as a main component, and if necessary, a known binder, plasticizer and sensitizer, and has a film thickness of 1.0 μm or less ( It is applied on the undercoat layer so as to have a dry film thickness).

【0030】電荷発生材料としては、ペリレン系顔料、
多環キノン系顔料、フタロシアニン顔料、金属フタロシ
アニン系顔料、スクエアリウム色素、アズレニウム色
素、チアピリリウム色素、及びカルバゾール骨格、スチ
リルスチルベン骨格、トリフェニルアミン骨格、ジベン
ゾチオフェン骨格、オキサジアゾール骨格、フルオレノ
ン骨格、ビススチルベン骨格、ジスチリルオキサジアゾ
ール骨格又はジスチリルカルバゾール骨格を有するアゾ
顔料等が挙げられる。
As the charge generating material, a perylene pigment,
Polycyclic quinone pigments, phthalocyanine pigments, metal phthalocyanine pigments, squarylium dyes, azurenium dyes, thiapyrylium dyes, and carbazole skeletons, styrylstilbene skeletons, triphenylamine skeletons, dibenzothiophene skeletons, oxadiazole skeletons, fluorenone skeletons, bis Examples thereof include azo pigments having a stilbene skeleton, a distyryl oxadiazole skeleton, or a distyryl carbazole skeleton.

【0031】電荷輸送層は、電荷発生材料が発生した電
荷を受入れこれを輸送する能力を有する電荷輸送材料、
及び結着剤を必須成分とし、必要に応じて公知のレベリ
ング剤、可塑剤、増感剤等を含有し、乾燥膜厚5〜70
μmとなるように電荷発生層の上に塗布される。
The charge transport layer is a charge transport material capable of receiving and transporting charges generated by the charge generation material,
And a binder as an essential component, and if necessary, known leveling agents, plasticizers, sensitizers, etc. are contained, and a dry film thickness of 5 to 70
It is coated on the charge generation layer so as to have a thickness of μm.

【0032】電荷輸送材料としては、ポリ−N−ビニル
カルバゾール及びその誘導体、ポリ−γ−カルバゾリル
エチルグルタメート及びその誘導体、ピレン−ホルムア
ルデヒド縮合物及びその誘導体、ポリビニルピレン、ポ
リビニルフェナントレン、オキサゾール誘導体、オキソ
ジアゾール誘導体、イミダゾール誘導体、9−(p−ジ
エチルアミノスチリル)アントラセン、1,1−ビス
(4−ジベンジルアミノフェニル)プロパン、スチリル
アントラセン、スチリルピラゾリン、フェニルヒドラゾ
ン類、ヒドラゾン誘導体等の電子供与性物質、或いはフ
ルオレノン誘導体、ジベンゾチオフェン誘導体、インデ
ノチオフェン誘導体、フェナンスレンキノン誘導体、イ
ンデノピリジン誘導体、チオキサントン誘導体、ベンゾ
〔c〕シンノリン誘導体、フェナジンオキサイド誘導
体、テトラシアノエチレン、テトラシアノキノジメタ
ン、プロマニル、クロラニル、ベンゾキノン等の電子受
容性物質が挙げられる。
As the charge transport material, poly-N-vinylcarbazole and its derivative, poly-γ-carbazolylethylglutamate and its derivative, pyrene-formaldehyde condensate and its derivative, polyvinylpyrene, polyvinylphenanthrene, oxazole derivative, Electron donation of oxodiazole derivatives, imidazole derivatives, 9- (p-diethylaminostyryl) anthracene, 1,1-bis (4-dibenzylaminophenyl) propane, styrylanthracene, styrylpyrazoline, phenylhydrazones, hydrazone derivatives, etc. Substances, or fluorenone derivatives, dibenzothiophene derivatives, indenothiophene derivatives, phenanthrenequinone derivatives, indenopyridine derivatives, thioxanthone derivatives, benzo [c] cinnoline derivatives Body, phenazine oxide derivatives, tetracyanoethylene, tetracyanoquinodimethane, Puromaniru, chloranil, and an electron-accepting substance benzoquinone.

【0033】本発明の電子写真感光体の製造方法は公知
の浸漬塗布方法を適用し得る。その一例を以下に述べ
る。
A known dip coating method can be applied to the method for producing the electrophotographic photosensitive member of the present invention. An example will be described below.

【0034】アゾ系顔料等の電荷発生材料が、必要に応
じて、結合剤、可塑剤、増感剤と共に適当な溶剤、例え
ば、シクロヘキサノン、ベンゼン、クロロホルム、ジク
ロロエタン、エチルエーテル、アセトン、クロルベンゼ
ン、メチルエチルケトン等に分散した塗布液に導電性基
体を公知の方法で浸漬し、引き上げ、乾燥して下引き層
が塗布された導電性基体上に電荷発生層を形成する。
A charge generating material such as an azo pigment may be used together with a binder, a plasticizer and a sensitizer, if necessary, in a suitable solvent such as cyclohexanone, benzene, chloroform, dichloroethane, ethyl ether, acetone, chlorobenzene, and the like. A conductive substrate is dipped in a coating solution dispersed in methyl ethyl ketone or the like by a known method, pulled up and dried to form a charge generating layer on the conductive substrate coated with the undercoat layer.

【0035】次いで、ヒドラゾン系化合物等の電荷輸送
材料及び結着剤が、必要に応じてレベリング剤、可塑
剤、増感剤と共に適当な溶剤、例えば、ジクロロエタ
ン、ベンゼン、クロロホルム、シクロヘキサノン、エチ
ルエーテル、アセトン、ジクロロベンゼン、メチルエチ
ルケトン等に溶解した塗布液に電荷発生層が塗布された
導電性基体を公知の方法で浸漬し、引き上げ、乾燥して
電荷輸送層を形成する。
Next, a charge transporting material such as a hydrazone compound and a binder, together with a leveling agent, a plasticizer, and a sensitizer, if necessary, a suitable solvent such as dichloroethane, benzene, chloroform, cyclohexanone, ethyl ether, A conductive substrate coated with a charge generation layer is dipped in a coating solution dissolved in acetone, dichlorobenzene, methyl ethyl ketone, or the like by a known method, pulled up, and dried to form a charge transport layer.

【0036】本発明の方法で製造された電子写真感光体
は黒ポチ、白ポチの画像欠陥がほとんどなく、長期間の
使用においても特性の劣化が少なく、且つ優れた環境安
定性を示す。更に、洗浄工程において有機溶媒を使用し
ないので、有機溶媒の使用による大気汚染、人体への影
響、高い引火性及び発火性による爆発の危険等がない。
The electrophotographic photosensitive member produced by the method of the present invention has almost no image defects such as black spots and white spots, shows little deterioration in characteristics even after long-term use, and exhibits excellent environmental stability. Further, since the organic solvent is not used in the washing process, there is no risk of air pollution due to the use of the organic solvent, effects on the human body, high flammability and explosion due to ignition.

【0037】[0037]

【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明はこれら実施例に限定されるものではな
い。
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.

【0038】実施例1 図1で示した方法により、切削加工した円筒状基体を洗
浄処理した。第1の洗浄槽の洗浄液として、CW−55
20(第一工業製薬(株)製)の5%純水を用い、第2
及び第3の洗浄槽の洗浄液として、純水を用いた。第1
の洗浄槽の洗浄液は40℃に加温されており、第2及び
第3の洗浄槽の洗浄液の温度はそれぞれ25℃であっ
た。第1乃至第3の洗浄槽への浸漬時間はそれぞれ2分
間であった。
Example 1 A cylindrical substrate machined by cutting was washed by the method shown in FIG. As the cleaning liquid for the first cleaning tank, CW-55
20% (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.) 5% pure water
Pure water was used as the cleaning liquid for the third cleaning tank. First
The cleaning liquid in the cleaning tank of No. 2 was heated to 40 ° C., and the temperatures of the cleaning liquids in the second and third cleaning tanks were 25 ° C., respectively. The immersion time in each of the first to third cleaning tanks was 2 minutes.

【0039】第4の浸漬槽には28%のアンモニア水1
重量部、カゼイン10重量部及び純水250重量部を5
0℃で溶解し、常温まで冷却した水溶液が充填されてお
り、浸漬時は超音波照射し、引上げ時は超音波を照射せ
ずに、乾燥膜厚1μmになるように下引き層を塗布し、
80℃で 時間乾燥した。
In the fourth immersion tank, 28% ammonia water 1
5 parts by weight, casein 10 parts by weight and pure water 250 parts by weight
It is filled with an aqueous solution that melts at 0 ° C and is cooled to room temperature. When it is immersed, it is irradiated with ultrasonic waves, and when it is pulled up, it is not irradiated with ultrasonic waves. ,
It was dried at 80 ° C. for an hour.

【0040】第1〜第3の洗浄槽及び第4の浸漬槽の照
射した超音波は40kHz であった。
The ultrasonic waves emitted from the first to third cleaning tanks and the fourth immersion tank were 40 kHz.

【0041】続いて、公知の浸漬塗布方法により下記A
液を下引き塗布液が塗布された円筒状基体に乾燥膜厚
0.3μmとなるように浸漬塗布し、90℃で30分間
乾燥し、更に下記B液をA液が塗布された円筒状基体に
乾燥膜厚20μmになるように浸漬塗布し、80℃で1
時間乾燥した。
Subsequently, the following A was applied by a known dip coating method.
Cylindrical substrate coated with liquid A is applied by dip coating to a cylindrical substrate coated with the undercoating coating liquid so that the dry film thickness is 0.3 μm, and dried at 90 ° C. for 30 minutes. Dip coating to a dry film thickness of 20 μm and apply at 80 ° C for 1
Dried for hours.

【0042】A液 ジブロムアンスアンスロン2重量部、ブチラール樹脂
〔エスレックBM−2,セキスイ化学(株)製〕2重量
部、シクロヘキサノン230重量部をボールミルにて8
時間分散処理して得られた液。
2 parts by weight of liquid A dibromoanthanthrone, 2 parts by weight of butyral resin [S-REC BM-2, manufactured by Sekisui Chemical Co., Ltd.], and 230 parts by weight of cyclohexanone were mixed with a ball mill to obtain 8 parts.
Liquid obtained by time dispersion treatment.

【0043】B液 ヒドラゾン系電荷輸送材〔ABPH,日本化薬(株)
製〕1重量部、ポリカーボネート樹脂〔パンライトL−
1250,帝人化成(株)製〕1重量部をジクロルエタ
ン8重量部で溶解して得られた液。
Liquid B hydrazone type charge transport material [ABPH, Nippon Kayaku Co., Ltd.
1 part by weight, polycarbonate resin [Panlite L-
1250, manufactured by Teijin Chemicals Ltd.] 1 part by weight dissolved in 8 parts by weight of dichloroethane.

【0044】得られた電子写真感光体を回転治具に装着
し複写機〔SF−8100,シャープ(株)製〕に搭載
してコピーを取り画像評価を行なった。結果を表1に示
す。 参考例1 実施例1の第4の浸漬槽に浸漬処理して下引き層を形成
するかわりに、濯ぎ処理後、クリーブース内で80℃の
クリーンエアで30分間乾燥した以外は実施例1と同様
に電子写真感光体を製造した。
The obtained electrophotographic photosensitive member is mounted on a rotating jig.
Installed on a copier [SF-8100, manufactured by Sharp Corporation]
Then, a copy was taken and the image was evaluated. The results are shown in Table 1.
You Reference example 1 Immersion treatment in the fourth immersion tank of Example 1 to form an undercoat layer
Instead of rinsing, after rinsing,
Same as Example 1 except that it was dried with clean air for 30 minutes
An electrophotographic photosensitive member was manufactured.

【0045】参考例2 参考例1の80℃のクリーンエアで30分間乾燥した導
電性基体表面に乾燥膜厚1μmとなるようにカゼインの
下引き層を形成し、その上に実施例1と同じ方法で電子
写真感光体を製造した。
Reference Example 2 A casein undercoat layer was formed on the surface of a conductive substrate dried in clean air at 80 ° C. for 30 minutes in Reference Example 1 so as to have a dry film thickness of 1 μm, and the same as in Example 1 above. An electrophotographic photoreceptor was manufactured by the method.

【0046】参考例1及び2で得られた電子写真感光体
の画像評価を実施例1と同様の方法で行なった。結果を
表1に示す。
Image evaluation of the electrophotographic photosensitive members obtained in Reference Examples 1 and 2 was carried out in the same manner as in Example 1. The results are shown in Table 1.

【0047】[0047]

【表1】 [Table 1]

【0048】暗部電位、明部電位及び残留電位の測定は
次の通り行なった。
The dark potential, the bright potential and the residual potential were measured as follows.

【0049】複写機(SF−8100、シャープ(株)
製)の現像ユニットを取り出し、電位計(Model3
44,トレック(株)製)プローブを現像部分に取り付
けた。現像ユニットを複写機にセットし、光学系ランプ
を点灯せずにコピーを行ない帯電後の表面電位をプロー
ブにて測定し、暗部電位とした。
Copier (SF-8100, Sharp Corporation)
Take out the development unit (made by
44, Trek Corp. probe was attached to the developing portion. The developing unit was set in a copying machine, copying was performed without turning on the optical system lamp, and the surface potential after charging was measured with a probe to obtain the dark part potential.

【0050】複写機の原稿台に白紙を置き、光学系ラン
プを点灯させて、コピーを行ない、帯電・露光後の表面
電位をプローブにて測定し、明部電位とした。
A blank sheet was placed on the platen of the copying machine, the optical system lamp was turned on, copying was performed, and the surface potential after charging and exposure was measured with a probe, which was defined as the bright portion potential.

【0051】[0051]

【発明の効果】本発明の方法によれば、水洗浄において
純水、イオン交換水での濯ぎ処理後乾燥処理することな
しに直ちに下引き層を形成するので感光体の表面電位及
び塗布膜厚のバラツキが少なく、黒ポチ、白ポチ、ハー
フトーン画像のムラ等の画像欠陥の少ない、且つ長時間
の使用においても特性の劣化の少ない、環境安定性の優
れた電子写真感光体を得ることができる。更に、洗浄液
として有機溶剤を使用しないので、有機溶剤の使用によ
る大気汚染、人体への影響、高い引火性及び発火性によ
る爆発の危険、特に1,1,1−トリクロルエタン、フ
ロンの洗浄液としての使用による地球温暖化及びオゾン
層の破壊等の問題が解消される。又、乾燥処理を省略し
得るので製造コストをダウンすることができる。
According to the method of the present invention, the undercoat layer is immediately formed without rinsing with pure water or ion-exchanged water in water washing and then with drying. It is possible to obtain an electrophotographic photosensitive member excellent in environmental stability with little variation in image quality, little image defects such as black spots, white spots, and unevenness in halftone images, and little deterioration in characteristics even after long-term use. it can. Furthermore, since an organic solvent is not used as a cleaning liquid, air pollution due to the use of an organic solvent, effects on the human body, explosion hazard due to high flammability and ignition, especially 1,1,1-trichloroethane, as a cleaning liquid for CFCs Problems such as global warming and ozone depletion due to use can be solved. Moreover, since the drying process can be omitted, the manufacturing cost can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の電子写真感光体用導電性基体の洗浄及
び下引き層の製造方法の概略を示す図である。
FIG. 1 is a diagram schematically showing a method for cleaning a conductive substrate for an electrophotographic photoreceptor and a method for producing an undercoat layer according to the present invention.

【符号の説明】[Explanation of symbols]

1 導電性基体 11 第1の洗浄槽 17 第1の洗浄槽超音波発振器 18 第1の洗浄槽の洗浄液 21 第2の洗浄槽 31 第3の洗浄槽 41 第4の浸漬槽 45 水可溶性樹脂水溶液 1 Conductive Substrate 11 First Cleaning Tank 17 First Cleaning Tank Ultrasonic Oscillator 18 First Cleaning Tank Cleaning Solution 21 Second Cleaning Tank 31 Third Cleaning Tank 41 Fourth Immersion Tank 45 Water-Soluble Resin Aqueous Solution

───────────────────────────────────────────────────── フロントページの続き (72)発明者 松本 浩史 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内 (72)発明者 森田 竜廣 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内 (72)発明者 新居 和幸 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroshi Matsumoto 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Within Sharp Corporation (72) Inventor Ryuhiro Morita 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka (72) Inventor Kazuyuki Arai 22-22 Nagaike-cho, Abeno-ku, Osaka City, Osaka Prefecture

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 電子写真感光体用導電性基体表面を純
水、イオン交換水又は界面活性剤含有水で浸漬洗浄し、
純水又はイオン交換水で濯ぎ処理し、水可溶性樹脂を溶
解した水溶液中に超音波作用下で浸漬し、超音波非作用
下引上げて下引き層を形成し、その上に感光体層を形成
することを特徴とする電子写真感光体の製造方法。
1. A surface of a conductive substrate for an electrophotographic photoreceptor is immersed and washed in pure water, ion-exchanged water or water containing a surfactant,
Rinse with pure water or ion-exchanged water, immerse in an aqueous solution in which water-soluble resin is dissolved under ultrasonic action, pull up under ultrasonic non-action to form an undercoat layer, and form a photoreceptor layer on it A method of manufacturing an electrophotographic photosensitive member, comprising:
JP1657092A 1992-01-31 1992-01-31 Production of electrophotographic sensitive body Pending JPH05210246A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1657092A JPH05210246A (en) 1992-01-31 1992-01-31 Production of electrophotographic sensitive body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1657092A JPH05210246A (en) 1992-01-31 1992-01-31 Production of electrophotographic sensitive body

Publications (1)

Publication Number Publication Date
JPH05210246A true JPH05210246A (en) 1993-08-20

Family

ID=11919954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1657092A Pending JPH05210246A (en) 1992-01-31 1992-01-31 Production of electrophotographic sensitive body

Country Status (1)

Country Link
JP (1) JPH05210246A (en)

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