JPH05232715A - Washing method for electroconductive base for electrophotographic sensitive member - Google Patents

Washing method for electroconductive base for electrophotographic sensitive member

Info

Publication number
JPH05232715A
JPH05232715A JP3486792A JP3486792A JPH05232715A JP H05232715 A JPH05232715 A JP H05232715A JP 3486792 A JP3486792 A JP 3486792A JP 3486792 A JP3486792 A JP 3486792A JP H05232715 A JPH05232715 A JP H05232715A
Authority
JP
Japan
Prior art keywords
cleaning
water
substrate
tank
water vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3486792A
Other languages
Japanese (ja)
Inventor
Tatsuhiro Morita
竜廣 森田
Masanori Matsumoto
雅則 松本
Kazuyuki Arai
和幸 新居
Masayuki Sakamoto
雅遊亀 坂元
Hiroshi Matsumoto
浩史 松本
Mitsuhiro Shinobu
充弘 忍
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP3486792A priority Critical patent/JPH05232715A/en
Publication of JPH05232715A publication Critical patent/JPH05232715A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide an electrophotographic sensitive member, i.e., photoreceptor, having excellent image forming ability by equipping a rinsing effect approx. the same as 1,1,1-trichlorethane, preventing formation of hydroxides, hydrates, etc., due to contact with water vapor in the drying process, and suppressing generation of uneven performance of drying, stains, etc. CONSTITUTION:Prior to formation of a sensitive layer, the surface of a base 1 is immersed in water containing surface active agent under application of ultrasonic waves, and after rinsing, the water vapor is condensed on the surface of warm water by a cooling means 53, or otherwise the water vapor on the surface of warm water is absorbed by an appropriate means furnished in a warm water bath, which is filled with a warm water 51 at 50-90 deg.C, followed by pulling up and drying.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電子写真感光体の導電性
基体の洗浄方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning a conductive substrate of an electrophotographic photoreceptor.

【0002】[0002]

【従来の技術】一般的に電子写真感光体は、ドラム状導
電性基体上に感光層を形成したものである。このドラム
状導電性基体は円筒状のアルミを鏡面加工又は板状のア
ルミをインパクト成形することにより作成される。鏡面
加工又はインパクト成形中に基体表面には、切削油のミ
スト、空気中のダスト、切粉等が付着するため、基体表
面を洗浄処理して除去した後に、縮合多環顔料、アゾ顔
料等の電荷発生物質、樹脂の結着剤から成る電荷発生層
及びヒドラゾン系又はアリールアミン系電荷輸送物質、
樹脂の結着剤、酸化防止剤等から成る電荷輸送層を順次
塗布・積層し、乾燥して感光層を形成する。
2. Description of the Related Art Generally, an electrophotographic photosensitive member is one in which a photosensitive layer is formed on a drum-shaped conductive substrate. This drum-shaped conductive substrate is formed by mirror-finishing cylindrical aluminum or impact-molding plate-shaped aluminum. Cutting oil mist, dust in the air, chips, etc. adhere to the surface of the substrate during mirror processing or impact molding, so after removing the substrate surface by washing, condensation polycyclic pigments, azo pigments, etc. A charge generating material, a charge generating layer comprising a resin binder and a hydrazone or arylamine charge transporting material,
A charge transport layer composed of a resin binder, an antioxidant and the like is sequentially applied and laminated, and dried to form a photosensitive layer.

【0003】電荷発生層及び電荷輸送層は、上述した電
荷発生層及び電荷輸送層を構成する物質をそれぞれ含有
する塗布液にドラム状導電性基体を公知の方法で浸漬す
ることによって該基体の表面に形成される。ここで行な
う浸漬塗布方法としては、特に制限はなく公知の方法が
使用し得るが、例えば特開昭49−130736、特開
昭57−5047及び特開昭59−46171に開示さ
れる方法が挙げられる。
The charge-generating layer and the charge-transporting layer are prepared by immersing the drum-shaped conductive substrate in a coating method containing the above-mentioned substances constituting the charge-generating layer and the charge-transporting layer by a known method. Formed in. The dip coating method carried out here is not particularly limited and known methods can be used. Examples thereof include the methods disclosed in JP-A-49-130736, JP-A-57-5047 and JP-A-59-46171. Be done.

【0004】浸漬塗布法において、前処理である導電性
基体表面の洗浄が不十分であると、その表面に油、ダス
ト等が残り、塗布の際にハジキ、シミ等の塗布欠陥の原
因となる。このような電子写真感光体上に発生した欠陥
は、コピー画像に黒ポチ、白ポチ、ハーフトーン画像の
ムラ等となって現われ、画像品質に悪影響を及ぼし、か
ような電子写真感光体は実用に適さないものである。
In the dip coating method, if the pretreatment of the surface of the conductive substrate is insufficient, oil, dust, etc. remain on the surface and cause coating defects such as cissing and spots during coating. .. Such defects on the electrophotographic photosensitive member appear as black spots, white spots, and halftone image unevenness on the copy image, and adversely affect the image quality. It is not suitable for.

【0005】基体表面の洗浄としては、通常有機溶媒
中、又は必要に応じて加温された有機溶媒中に基体を浸
漬処理及び/又は超音波の作用下で浸漬処理する浸漬洗
浄;基体を溶媒に浸漬中又は基体に溶媒をシャワーリン
グしながらブラシ、スポンジ等により物理的に擦する接
触洗浄;溶媒を高圧下でスリットより基体表面に噴出す
るジェット洗浄及び溶媒蒸気中に基体を挿入する蒸気洗
浄が挙げられ、これらの単独又は組合せにより基体表面
の洗浄が行なわれている。
For cleaning the surface of the substrate, dipping cleaning is usually carried out by dipping the substrate in an organic solvent or, if necessary, in an organic solvent heated and / or under the action of ultrasonic waves; Contact cleaning in which the solvent is physically rubbed with a brush, sponge, etc. while being immersed in the bath or showering the solvent to the substrate; jet cleaning in which the solvent is jetted from the slit to the substrate surface under high pressure and vapor cleaning in which the substrate is inserted into the solvent vapor The surface of the substrate is cleaned by using these alone or in combination.

【0006】ここで使用される溶媒としては、メチレン
クロライド、エチレンクロライド、1,1,1−トリク
ロルエタン、トリクロルエチレン、パークロルエチレン
等の塩素系溶剤、フロン−112、フロン−113等の
フッ素系溶剤、該フッ素系溶剤とメタノール、メチレン
クロライド等の混合溶剤、ベンゼン、トルエン、メタノ
ール、エタノール、イソプロピルアルコール、石油系炭
化水素等及びそれらの混合物が挙げられる。これらの溶
剤中には引火性、発火性を有するもの、人体に有害であ
るので使用許容濃度が低いもの、洗浄能力が低いものが
含まれており、最も一般的に使用されている溶剤は、
1,1,1−トリクロルエタンである。
Examples of the solvent used here include chlorine-based solvents such as methylene chloride, ethylene chloride, 1,1,1-trichloroethane, trichloroethylene and perchlorethylene, and fluorine-based solvents such as Freon-112 and Freon-113. Examples thereof include solvents, mixed solvents of the fluorine-based solvent and methanol, methylene chloride, etc., benzene, toluene, methanol, ethanol, isopropyl alcohol, petroleum hydrocarbons, etc., and mixtures thereof. These solvents include those that are flammable and ignitable, those that have a low permissible concentration because they are harmful to the human body, and those that have a low cleaning ability.The most commonly used solvents are:
It is 1,1,1-trichloroethane.

【0007】しかしながら、1,1,1−トリクロルエ
タンは、洗浄能力が高い、取扱いが容易等の長所がある
ものの、地球温暖化、オゾン層の破壊等を引起す物質の
一つであると推考され、フロンとともに全世界でその削
減が決定されており、1,1,1−トリクロルエタンの
代替洗浄液の提供又は代替洗浄法の開発が要求されてい
る。
However, although 1,1,1-trichloroethane has advantages such as high cleaning ability and easy handling, it is presumed that it is one of the substances causing global warming and ozone layer depletion. It has been decided to reduce the amount of chlorofluorocarbons worldwide, and it is required to provide an alternative cleaning solution for 1,1,1-trichloroethane or to develop an alternative cleaning method.

【0008】1,1,1−トリクロルエタンを用いる洗
浄の代替として、界面活性剤含有水を用いる洗浄方法が
提案されている。例えば、導電性基体表面に付着してい
るダストや油等を超音波の作用下、界面活性剤含有純水
中で浸漬洗浄する方法であるこの方法においては、浸漬
洗浄後、導電性基体表面に付着している界面活性剤を純
水で洗い流している。しかしながら、常温の純水による
濯ぎ処理後、乾燥処理をするのであるが、水の蒸発速度
が遅いので、乾燥ムラ、シミ等が導電性基体表面に生じ
たりする傾向があり、この導電性基体を用いて製造した
電子写真感光体は、コピー画像に黒ポチ、白ポチ、ハー
フトーン等の画像ムラを生じることが度々ある。
As an alternative to cleaning with 1,1,1-trichloroethane, a cleaning method using water containing a surfactant has been proposed. For example, in this method, which is a method of immersing dust or oil adhering to the surface of the conductive substrate in the surfactant-containing pure water under the action of ultrasonic waves, in this method, the surface of the conductive substrate is cleaned after the immersion cleaning. The adhering surfactant is washed off with pure water. However, although the drying process is performed after the rinsing process with pure water at room temperature, since the evaporation rate of water is slow, unevenness in drying, stains and the like tend to occur on the surface of the conductive substrate. The electrophotographic photosensitive member produced by using the electrophotographic photosensitive member often causes image unevenness such as black spots, white spots, and halftones in a copy image.

【0009】洗浄処理された導電性基体表面の乾燥を早
く行なうために、エアーを該基体表面に吹き付ける方法
が考えられる。しかしながら、エアーを基体表面に吹き
付ける方法は、エアーを円筒状基体の周方向に均一に吹
き付けるために大がかりな装置が必要となり、コスト高
の原因となるばかりでなく、導電性基体の内面の乾燥が
不十分となり、その結果残水分が塗布液に混入し、塗布
液の劣化の原因となる。
In order to quickly dry the surface of the conductive substrate that has been washed, a method of blowing air onto the surface of the substrate can be considered. However, the method of blowing air onto the surface of the substrate requires a large-scale device for uniformly blowing the air in the circumferential direction of the cylindrical substrate, which not only causes a high cost but also prevents the inner surface of the conductive substrate from being dried. This becomes insufficient, and as a result, residual water is mixed in the coating liquid, which causes deterioration of the coating liquid.

【0010】濯ぎ処理の際に導電性基体表面に付着した
水の蒸発を促進させるために濯ぎ処理後に、35〜90
℃の温水に該基体を浸漬・引上げることにより乾燥を促
進させる方法が提案されている。
35 to 90 after the rinsing treatment in order to accelerate evaporation of water adhering to the surface of the conductive substrate during the rinsing treatment.
A method of accelerating the drying by immersing and pulling the substrate in warm water at ℃ has been proposed.

【0011】導電性基体材料としてのアルミニウム合金
としてはその加工性、画像形成能等を考慮して比較的純
度の高いアルミニウム合金が使用されている。純度の高
いアルミニウムは反応性が高く、温水浸漬槽内に溜まる
水蒸気と基体の表面が反応して水酸化物、水和物等が生
成することがある。この表面に生成した水酸化物、水和
物等はぬれ性等の物理的特性の変化を生じせしめ、感光
材塗布の際の塗布欠陥の原因となり、コピー画像におい
て黒点、白点の画像欠陥原因となり、且つ良品率の低下
の原因となる。
As the aluminum alloy as the conductive substrate material, an aluminum alloy having a relatively high purity is used in consideration of its workability and image forming ability. Aluminum with high purity has high reactivity, and the water vapor accumulated in the hot water immersion tank may react with the surface of the substrate to form a hydroxide, a hydrate or the like. Hydroxides, hydrates, etc. formed on this surface cause changes in physical properties such as wettability, which causes coating defects when coating photosensitive materials, and causes of image defects such as black spots and white spots in copy images. And also causes a decrease in the yield rate.

【0012】[0012]

【発明が解決しようとする課題】公害を発生することの
ない水洗浄において、乾燥処理の際の水蒸気との接触に
よる水酸化物、水和物等の生成を防止し画像欠陥のな
い、且つ良品率のより向上した電子写真感光体を得るた
めの導電性基体の洗浄方法の確立が望まれている。
In water washing without causing pollution, generation of hydroxides, hydrates and the like due to contact with water vapor during drying treatment is prevented, and there is no image defect, and it is a non-defective product. It is desired to establish a method for cleaning a conductive substrate to obtain an electrophotographic photosensitive member having a higher rate.

【0013】[0013]

【課題を解決するための手段】本発明者等の鋭意研究の
結果、電子写真感光体用導電性基体表面の水洗浄におい
て、温水浸漬槽の温水面上に冷却手段を設けて該槽内に
溜まる水蒸気を凝縮し又はポンプにより該槽内に溜まる
水蒸気を吸引し水蒸気が該導電性基体表面に接触しない
ようにして該導電性基体を50〜90℃の温水に浸漬・
引上げて乾燥処理すると、温水引上げ直後の導電性基体
表面に水蒸気が接触しないので、導電性基体材料のアル
ミニウムと水蒸気との反応による該導電性基体表面への
水酸化物、水和物等の生成を防止して塗布欠陥、画像欠
陥等の生じない電子写真感光体を高良品率で製造し得る
ことを見出し、この知見に基づいて本発明を成すに至っ
た。
As a result of earnest research by the present inventors, in cleaning the surface of a conductive substrate for an electrophotographic photoreceptor with water, a cooling means is provided on the hot water surface of a hot water dipping tank and the water is immersed in the tank. The condensed water vapor is condensed or the water vapor accumulated in the tank is sucked by a pump so that the water vapor does not come into contact with the surface of the electrically conductive substrate, and the electrically conductive substrate is immersed in warm water at 50 to 90 ° C.
Since water vapor does not come into contact with the surface of the conductive substrate immediately after pulling up with hot water when pulled up and dried, formation of hydroxides, hydrates, etc. on the surface of the conductive substrate due to reaction of aluminum of the conductive substrate material with water vapor It has been found that an electrophotographic photosensitive member can be manufactured with a high yield rate by preventing the occurrence of coating defects and image defects, and based on this finding, the present invention has been accomplished.

【0014】[0014]

【作用】図2は本発明の洗浄方法の概略を示す図であ
る。切削加工又はインパクト成形された基体1はレール
3に配置されたロボットハンド2に支持されている。第
1の洗浄槽11は純水、イオン交換水又は界面活性剤含
有イオン交換水又は純水の洗浄液18で満たされてお
り、該洗浄液はヒーター16により40〜60℃に加熱
されており、且つ洗浄槽11底部には超音波発振器17
が備付けられ、基体浸漬時に超音波が発振するようにな
っている。洗浄槽11にはパイプ12から洗浄液がタン
ク(図示せず)より定常的に送り込まれている。洗浄に
よって基体表面から除去された油、ダスト、切粉が分散
している洗浄液は配管19からポンプ14によりフィル
ター15を経て循環し、ダスト、切粉等はフィルター1
5に補足される。基体の浸漬によりオーバーフローする
液は配管13から排出される。排出された洗浄液は排液
処理装置(図示せず)により処理される。
2 is a diagram showing the outline of the cleaning method of the present invention. The base body 1 that has been cut or impact-molded is supported by a robot hand 2 arranged on a rail 3. The first cleaning tank 11 is filled with a cleaning liquid 18 of pure water, ion-exchanged water, or ion-exchanged water containing a surfactant or pure water, and the cleaning liquid is heated to 40 to 60 ° C. by a heater 16, and An ultrasonic oscillator 17 is provided at the bottom of the cleaning tank 11.
Is provided so that ultrasonic waves are oscillated when the substrate is immersed. A cleaning liquid is constantly fed into the cleaning tank 11 from a pipe (not shown) through a pipe 12. The cleaning liquid in which the oil, dust, and chips removed from the surface of the substrate by the cleaning is dispersed is circulated from the pipe 19 through the filter 15 by the pump 14, and the dust, chips, etc. are filtered by the filter 1.
5 is supplemented. The liquid that overflows due to the immersion of the substrate is discharged from the pipe 13. The discharged cleaning liquid is processed by a drainage processing device (not shown).

【0015】第2の洗浄槽21、第3の洗浄槽31及び
第4の洗浄槽41にはそれぞれ洗浄液25,35,45
としてイオン交換水又は純水が満されていて濯ぎ処理が
なされる。それぞれの洗浄槽底部には超音波発振器2
4,34,44が配備され、各洗浄槽の洗浄液は、それ
ぞれ配管26,36,46からポンプ22,32,42
によりフィルター23,33,43を経て循環し、該フ
ィルターによって、ダスト、切粉等が補足される。洗浄
液はタンク60より洗浄槽41に供給され、第4の洗浄
槽41からのオーバーフローにより第3の洗浄槽31に
洗浄液が供給され、第3の洗浄槽31からのオーバーフ
ローにより、第2の洗浄槽21に洗浄液が供給され、且
つ第2の洗浄槽21からオーバーフローする液は配管2
7から排出され、排液処理装置で処理される。図2の方
法において界面活性剤含有水の洗浄液で満された洗浄槽
は少なくとも1槽あれば良い。
The second cleaning tank 21, the third cleaning tank 31, and the fourth cleaning tank 41 have cleaning solutions 25, 35, and 45, respectively.
As a result, ion exchange water or pure water is filled and a rinsing process is performed. An ultrasonic oscillator 2 is installed at the bottom of each cleaning tank.
4, 34, 44 are provided, and the cleaning liquids in the respective cleaning tanks are pumps 22, 32, 42 from the pipes 26, 36, 46, respectively.
Circulates through the filters 23, 33, 43, and dust, chips, etc. are captured by the filter. The cleaning liquid is supplied to the cleaning tank 41 from the tank 60, the cleaning liquid is supplied to the third cleaning tank 31 by the overflow from the fourth cleaning tank 41, and the second cleaning tank is supplied by the overflow from the third cleaning tank 31. The cleaning liquid is supplied to the pipe 21, and the liquid overflowing from the second cleaning tank 21 is supplied to the pipe 2
The liquid is discharged from No. 7 and is processed by the drainage processing device. In the method of FIG. 2, at least one cleaning tank may be filled with the cleaning liquid containing the surfactant-containing water.

【0016】本発明で使用する界面活性剤としては、基
体を腐蝕することのないノニオン系界面活性剤及び/又
はアニオン系界面活性剤が使用し得、その具体例として
は、ポリオキシエチレンアルキルフェニルエーテル、ポ
リオキシエチレン・ポリオキシプロピレン・ブロックコ
ポリマー型及びノニルフェノールポリオキシエチンエー
テルのノニオン系界面活性剤及びアルキルベンゼン、高
級アルコール、α−オレフィン等の硫酸塩、ケイ酸塩、
炭酸塩又はリン酸塩のアニオン系界面活性剤が挙げられ
る。
As the surfactant used in the present invention, a nonionic surfactant and / or an anionic surfactant which does not corrode the substrate can be used. Specific examples thereof include polyoxyethylene alkylphenyl. Nonionic surfactants of ether, polyoxyethylene / polyoxypropylene / block copolymer type and nonylphenol polyoxyethyne ether, and alkylbenzene, higher alcohols, sulfates such as α-olefins, silicates,
Examples include carbonate or phosphate anionic surfactants.

【0017】又、洗浄助剤(ビルダー)として、炭酸ナ
トリウム、トリポリリン酸ナトリウム、ピロリン酸カリ
ウム、ケイ酸ナトリウム、硫酸ナトリウム等の無機ビル
ダー、カルボキシメチルセルロース、メチルセルロー
ス、有機アミン等の有機ビルダーを洗浄液に添加しても
良い。
As a cleaning aid (builder), an inorganic builder such as sodium carbonate, sodium tripolyphosphate, potassium pyrophosphate, sodium silicate or sodium sulfate, or an organic builder such as carboxymethyl cellulose, methyl cellulose or organic amine is added to the cleaning liquid. You may.

【0018】本発明の洗浄液の界面活性剤の濃度は0.
5〜30%、好ましくは4〜15%である。
The concentration of the surfactant in the cleaning solution of the present invention is 0.
It is 5 to 30%, preferably 4 to 15%.

【0019】本発明の第1の洗浄槽における洗浄時間
(浸漬時間)は、0.5〜10分間、好ましくは1.5
〜5分間で、第2〜第4の洗浄槽における浸漬時間もそ
れぞれ0.5〜10分間、好ましくは1.5〜5分間で
ある。尚、浸漬中、必要に応じて、基体を揺動させても
良い。
The cleaning time (immersion time) in the first cleaning tank of the present invention is 0.5 to 10 minutes, preferably 1.5.
~ 5 minutes, the immersion time in the second to fourth cleaning tanks is also 0.5 to 10 minutes, preferably 1.5 to 5 minutes. Note that the base body may be rocked during dipping, if necessary.

【0020】洗浄槽21,31,41で濯ぎ処理がなさ
れた基体1は、温純水又はイオン交換水が満されている
温水浸漬槽50に浸漬され、引き上げられて、乾燥処理
が施される。温水浸漬槽50の底部には加熱装置(ヒー
ター)52が取り付けられており、純水又はイオン交換
水が50〜90℃、好ましくは60〜80℃に保たれて
いる。浸漬槽には、供給装置53から純水又はイオン交
換水が供給されている。
The substrate 1 that has been rinsed in the cleaning tanks 21, 31, 41 is immersed in a warm water immersion tank 50 filled with warm pure water or ion-exchanged water, pulled up, and dried. A heating device (heater) 52 is attached to the bottom of the warm water immersion tank 50, and pure water or ion-exchanged water is maintained at 50 to 90 ° C, preferably 60 to 80 ° C. Pure water or ion-exchanged water is supplied from the supply device 53 to the immersion tank.

【0021】純水又はイオン交換水の温度が90℃を超
えると、水による基体(アルミ)の腐食が生じ易くな
り、又50℃未満になると、乾燥に時間がかかり乾燥ム
ラやシミが生じ易くなる。本発明の温純水への浸漬時間
は0.5〜5分、好ましくは1〜3分である。尚、浸漬
中に必要に応じて基体を揺動させても良い。
If the temperature of pure water or ion-exchanged water exceeds 90 ° C., the substrate (aluminum) is likely to be corroded by water, and if the temperature is less than 50 ° C., it takes a long time to dry and uneven drying and stains are likely to occur. Become. The immersion time in the warm pure water of the present invention is 0.5 to 5 minutes, preferably 1 to 3 minutes. The substrate may be rocked during the immersion if necessary.

【0022】図1は本発明の温水浸漬槽50の具体例を
示す図である。温水浸漬槽50の温水51液面上に、基
体の上下移動する周囲に冷媒を通した冷却パイプ53か
ら成る冷却手段を設け、濯ぎ処理された導電性基体1が
冷却手段の中を下降し、50〜90℃の温純水又は温イ
オン交換水に浸漬され、冷却手段の中を引き上げられ
る。冷却パイプの最下部には水滴受け皿54が設けられ
温水浸漬槽50内に溜まっている水蒸気が冷却パイプ5
3に接触して凝縮し水滴となり水滴受け皿54に溜まる
ので、上昇する導電性基体1に水蒸気が接触することが
なく、その結果、乾燥処理においての水蒸気との接触に
よる水酸化物、水和物等が導電性基体1表面に生じるこ
とがない。冷媒の温度は5〜25℃で、冷却手段と基体
表面との間の距離は5〜100mmである。
FIG. 1 is a diagram showing a specific example of a warm water immersion tank 50 of the present invention. On the liquid surface of the hot water 51 of the hot water immersion tank 50, a cooling means consisting of a cooling pipe 53 through which a refrigerant is passed is provided around the vertically moving periphery of the substrate, and the rinsed conductive substrate 1 descends in the cooling means. It is immersed in warm pure water or warm ion-exchanged water at 50 to 90 ° C., and the inside of the cooling means is pulled up. A water drop tray 54 is provided at the bottom of the cooling pipe, so that the water vapor accumulated in the warm water immersion tank 50 can cool the cooling pipe 5.
3 is condensed to form water droplets in the water droplet receiving tray 54, so that water vapor does not come into contact with the ascending conductive substrate 1, and as a result, hydroxides and hydrates due to contact with water vapor in the drying process. Etc. do not occur on the surface of the conductive substrate 1. The temperature of the cooling medium is 5 to 25 ° C., and the distance between the cooling means and the surface of the substrate is 5 to 100 mm.

【0023】図3は本発明の温水浸漬槽50の他の具体
例を示す図である。温水浸漬槽50の温水51の液面よ
り上の位置の温水浸漬槽内壁の吸引口55からポンプ5
6により水蒸気を引き込み外部に放出する。
FIG. 3 is a diagram showing another specific example of the warm water immersion tank 50 of the present invention. From the suction port 55 on the inner wall of the warm water immersion tank at a position above the liquid surface of the warm water 51 of the warm water immersion tank 50 to the pump 5
6 draws water vapor and releases it to the outside.

【0024】温水浸漬槽から引き上げられた基体は、例
えばクリーン度100に保たれたクリーンブース内で放
冷される。
The substrate pulled up from the warm water immersion tank is allowed to cool in a clean booth maintained at a cleanness of 100, for example.

【0025】洗浄処理された基体表面に公知の方法で感
光層を形成する。例えば、浸漬塗布法、リング方式塗布
法又はスプレー塗布法によって、洗浄処理された円筒状
基体表面に電荷発生層を形成する。次いで、電荷発生層
の上に浸漬塗布法又はスプレー塗布法で電荷輸送層を形
成する。
A photosensitive layer is formed on the surface of the washed substrate by a known method. For example, the charge generation layer is formed on the surface of the cleaned cylindrical substrate by the dip coating method, the ring coating method or the spray coating method. Then, a charge transport layer is formed on the charge generation layer by a dip coating method or a spray coating method.

【0026】本発明で用いる電子写真感光体の導電性基
体としては、アルミニウム、銅、ニッケル、ステンレ
ス、真ちゅう等の金属の円筒状基体又は薄膜シート、又
はアルミニウム、錫合金、酸化インジウム等をポリエス
テルフィルムあるいは紙、金属フィルムの円筒状基体等
に蒸着したものが挙げられる。
As the electroconductive substrate of the electrophotographic photosensitive member used in the present invention, a cylindrical substrate or a thin film sheet of a metal such as aluminum, copper, nickel, stainless steel or brass, or a polyester film of aluminum, tin alloy, indium oxide or the like. Alternatively, it may be vapor-deposited on paper or a cylindrical substrate of a metal film.

【0027】感光体層の接着性改良、塗布性改良、基体
上の欠陥の被覆及び基体から電荷発生層への電荷注入性
改良等のために下引き層が設けられることが有る。下引
き層の材料としては、ポリアミド、共重合ナイロン、カ
ゼイン、ポリビニルアルコール、セルロース、ゼラチン
等の樹脂が知られている。これらを各種有機溶媒に溶解
し、膜厚が0.1〜5μm程度になるように導電性円筒
状基体上に塗布される。
An undercoat layer may be provided for the purpose of improving the adhesion of the photosensitive layer, improving the coating property, covering defects on the substrate and improving the charge injection property from the substrate to the charge generating layer. Resins such as polyamide, copolymerized nylon, casein, polyvinyl alcohol, cellulose and gelatin are known as materials for the undercoat layer. These are dissolved in various organic solvents and coated on a conductive cylindrical substrate so that the film thickness is about 0.1 to 5 μm.

【0028】電荷発生層は、光照射により電荷を発生す
る電荷発生材料を主成分とし、必要に応じて公知の結合
剤、可塑剤、増感剤を含有し、膜厚が1.0μm以下
(乾燥膜厚)となるように導電性円筒状基体又は下引き
層の上に塗布されている。
The charge generation layer contains a charge generation material which generates charges upon irradiation with light as a main component, and if necessary, a known binder, plasticizer and sensitizer, and has a film thickness of 1.0 μm or less ( It is coated on the conductive cylindrical substrate or the undercoat layer so as to have a dry film thickness).

【0029】電荷発生材料としては、ペリレン系顔料、
多環キノン系顔料、フタロシアニン顔料、金属フタロシ
アニン系顔料、スクエアリウム色素、アズレニウム色
素、チアピリリウム色素、及びカルバゾール骨格、スチ
リルスチルベン骨格、トリフェニルアミン骨格、ジベン
ゾチオフェン骨格、オキサジアゾール骨格、フルオレノ
ン骨格、ビススチルベン骨格、ジスチリルオキサジアゾ
ール骨格又はジスチリルカルバゾール骨格を有するアゾ
顔料等が挙げられる。
As the charge generating material, a perylene pigment,
Polycyclic quinone pigments, phthalocyanine pigments, metal phthalocyanine pigments, squarylium dyes, azurenium dyes, thiapyrylium dyes, and carbazole skeletons, styrylstilbene skeletons, triphenylamine skeletons, dibenzothiophene skeletons, oxadiazole skeletons, fluorenone skeletons, bis Examples thereof include azo pigments having a stilbene skeleton, a distyryl oxadiazole skeleton, or a distyryl carbazole skeleton.

【0030】電荷輸送層は、電荷発生材料が発生した電
荷を受け入れこれを輸送する能力を有する電荷輸送材料
及び結着剤を必須成分とし、必要に応じて公知のレべリ
ング剤、可塑剤、増感剤等を含有し、乾燥膜厚5〜70
μmとなるように電荷発生層の上に塗布されている。
The charge-transporting layer contains a charge-transporting material having the ability to receive and transport the charge generated by the charge-generating material and a binder as essential components, and if necessary, known leveling agents, plasticizers, Contains a sensitizer and the like, and has a dry film thickness of 5 to 70.
It is coated on the charge generation layer so as to have a thickness of μm.

【0031】電荷輸送材料としては、ポリ−N−ビニル
カルバゾール及びその誘導体、ポリ−γ−カルバゾリル
エチルグルタメート及びその誘導体、ピレン−ホルムア
ルデヒド縮合物及びその誘導体、ポリビニルピレン、ポ
リビニルフェナントレン、オキサゾール誘導体、オキソ
ジアゾール誘導体、イミダゾール誘導体、9−(p−ジ
エチルアミノスチリル)アントラセン、1,1−ビス
(4−ジベンジルアミノフェニル)プロパン、スチリル
アントラセン、スチリルピラゾリン、フェニルヒドラゾ
ン類、ヒドラゾン誘導体等の電子供与性物質、或いはフ
ルオレノン誘導体、ジベンゾチオフェン誘導体、インデ
ノチオフェン誘導体、フェナンスレンキノン誘導体、イ
ンデノピリジン誘導体、チオキサントン誘導体、ベンゾ
〔c〕シンノリン誘導体、フェナジンオキサイド誘導
体、テトラシアノエチレン、テトラシアノキノジメタ
ン、プロマニル、クロラニル、ベンゾキノン等の電子受
容性物質等が挙げられる。
As the charge transport material, poly-N-vinylcarbazole and its derivative, poly-γ-carbazolylethylglutamate and its derivative, pyrene-formaldehyde condensate and its derivative, polyvinylpyrene, polyvinylphenanthrene, oxazole derivative, Electron donation of oxodiazole derivatives, imidazole derivatives, 9- (p-diethylaminostyryl) anthracene, 1,1-bis (4-dibenzylaminophenyl) propane, styrylanthracene, styrylpyrazoline, phenylhydrazones, hydrazone derivatives, etc. Substances, or fluorenone derivatives, dibenzothiophene derivatives, indenothiophene derivatives, phenanthrenequinone derivatives, indenopyridine derivatives, thioxanthone derivatives, benzo [c] cinnoline derivatives Body, phenazine oxide derivatives, tetracyanoethylene, tetracyanoquinodimethane, Puromaniru, chloranil, electron-accepting substance such as benzoquinone, and the like.

【0032】電荷輸送層を構成する結着剤としては、電
荷輸送材料と相溶性を有するものであれば良く、例えば
ポリカーボネート、ポリビニルブチラール、ポリアミ
ド、ポリエステル、ポリケトン、エポキシ樹脂、ポリウ
レタン、ポリビニルケトン、ポリスチレン、ポリアクリ
ルアミド、フェノール樹脂、フェノキシ樹脂等が挙げら
れる。
As the binder constituting the charge transport layer, any binder having compatibility with the charge transport material may be used, and examples thereof include polycarbonate, polyvinyl butyral, polyamide, polyester, polyketone, epoxy resin, polyurethane, polyvinyl ketone and polystyrene. , Polyacrylamide, phenol resin, phenoxy resin and the like.

【0033】本発明の方法で製造された電子写真感光体
はハジキ、シミ等による画像への黒ポチ、白ポチの発生
がほとんどなく、良品率が高い。更に、洗浄工程におい
て、有機溶媒を使用しないので、有機溶媒の使用による
大気汚染、人体への影響、高い引火性及び発火性による
爆発の危険等がない。
The electrophotographic photosensitive member produced by the method of the present invention has almost no black spots or white spots on the image due to cissing or stains, and has a high yield rate. Furthermore, since no organic solvent is used in the cleaning process, there is no risk of air pollution due to the use of organic solvent, effects on the human body, high flammability, and explosion due to ignition.

【0034】[0034]

【実施例】以下、実施例による本発明を具体的に説明す
るが、本発明はこれら実施例に限定されるものではな
い。
The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.

【0035】実施例1 図2で示した方法により、切削加工した円筒状基体を洗
浄処理した。図2の方法において、第1の洗浄槽の洗浄
液として、ポラークリーン690(田中インポートグル
ープ(株))の5%純水溶液を用い、第2〜4の洗浄槽
の洗浄液として、純水を用いた。第1の洗浄槽の洗浄液
は50℃に加温されており、第2〜4の洗浄槽の洗浄液
の温度はそれぞれ25℃であった。第1乃至第4の洗浄
槽への浸漬時間はそれぞれ2分間であった。
Example 1 By the method shown in FIG. 2, the cut cylindrical substrate was washed. In the method of FIG. 2, a 5% pure aqueous solution of Polar Clean 690 (Tanaka Import Group Co., Ltd.) was used as the cleaning liquid for the first cleaning tank, and pure water was used as the cleaning liquid for the second to fourth cleaning tanks. . The cleaning liquid in the first cleaning tank was heated to 50 ° C, and the temperatures of the cleaning liquids in the second to fourth cleaning tanks were 25 ° C. The immersion time in each of the first to fourth cleaning tanks was 2 minutes.

【0036】濯ぎ処理された基体を図1で示された温水
浸漬槽で基体表面から20mm離れた位置に設けられた1
0℃の冷却パイプの中を下降させ65℃に保たれた純水
中に2分間浸漬し、10mm/秒で引き上げ、クリーン度
100に保たれたクリーンブース内で20分間放冷し
た。
The rinsed substrate was placed in the hot water immersion tank shown in FIG. 1 at a position 20 mm away from the substrate surface.
It was lowered in a cooling pipe at 0 ° C., immersed in pure water kept at 65 ° C. for 2 minutes, pulled up at 10 mm / sec, and allowed to cool in a clean booth kept at a clean degree of 100 for 20 minutes.

【0037】得られた円筒状基体は公知の浸漬塗布方法
により下記A液を円筒状基体の表面に乾燥後の膜厚0.
5μmになるように浸漬塗布し、75℃の温度で1時間
乾燥し、更に下記B液をA液が塗布された円筒状基体の
表面に乾燥後の膜厚20μmになるように浸漬塗布し、
75℃の温度で1時間乾燥した。
The obtained cylindrical substrate was coated with the following solution A on the surface of the cylindrical substrate by a known dip coating method to obtain a film thickness of 0.
It is applied by dip coating to have a thickness of 5 μm and dried at a temperature of 75 ° C. for 1 hour. Further, the following liquid B is dip-coated on the surface of the cylindrical substrate coated with liquid A so that the film thickness after drying is 20 μm,
It was dried at a temperature of 75 ° C. for 1 hour.

【0038】A液 ジブロムアンスアンスロン2重量部、ブチラール樹脂
〔エスレックBM−2,セキスイ化学(株)製〕2重量
部、シクロヘキサノン230重量部をボールミルにて8
時間分散処理して得られた液。
2 parts by weight of liquid A dibrom anthanthrone, 2 parts by weight of butyral resin [ESREC BM-2, manufactured by Sekisui Chemical Co., Ltd.], and 230 parts by weight of cyclohexanone were mixed with a ball mill to obtain 8 parts.
Liquid obtained by time dispersion treatment.

【0039】B液 ヒドラゾン系電荷輸送材〔ABPH,日本化薬(株)
製〕1重量部、ポリカーボネート樹脂〔パンライトL−
1250,帝人化成(株)製〕1重量部をジクロロエタ
ン8重量部で溶解して得られた液。
Liquid B hydrazone type charge transport material [ABPH, Nippon Kayaku Co., Ltd.
1 part by weight, polycarbonate resin [Panlite L-
1250, manufactured by Teijin Chemicals Ltd.] 1 part by weight dissolved in 8 parts by weight of dichloroethane.

【0040】得られた電子写真感光体30本を回転用治
具に装着し複写機〔SF−8100、シャープ(株)
製〕に搭載してコピーを取り画像評価を行なった。結果
を表1に示す。
The obtained 30 electrophotographic photoconductors were mounted on a rotating jig, and a copying machine [SF-8100, Sharp Co., Ltd.] was used.
The image was evaluated by making a copy of the product. The results are shown in Table 1.

【0041】比較例1 切削加工した円筒状基体を、有機溶剤として60℃の
1,1,1−トリクロルエタンを用いた超音波・温浴洗
浄処理を30秒間行なった。20℃の1,1,1−トリ
クロルエタンで30秒間冷浴した後、1,1,1−トリ
クロルエタンを用いた蒸気洗浄を30秒間行ない、クリ
ーンルームで20分間放冷した。得られた円筒状基体の
表面に実施例1と同様の方法で感光体層を形成した。
Comparative Example 1 The cut cylindrical substrate was subjected to ultrasonic wave / warm bath cleaning treatment using 1,1,1-trichloroethane at 60 ° C. as an organic solvent for 30 seconds. After cooling with 1,1,1-trichloroethane at 20 ° C. for 30 seconds, steam cleaning with 1,1,1-trichloroethane was performed for 30 seconds, and the mixture was allowed to cool in a clean room for 20 minutes. A photoreceptor layer was formed on the surface of the obtained cylindrical substrate by the same method as in Example 1.

【0042】得られた電子写真感光体30本を実施例と
同様の方法で画像評価を行なった。結果を表1に示す。
Image evaluation was performed on 30 obtained electrophotographic photoconductors in the same manner as in the examples. The results are shown in Table 1.

【0043】比較例2 洗浄処理をしない円筒状基体の表面に実施例1と同様の
方法で感光体層を形成した。得られた電子写真感光体3
0本を実施例と同様の方法で画像評価を行なった。結果
を表1に示す。
Comparative Example 2 A photoreceptor layer was formed on the surface of a cylindrical substrate which was not washed by the same method as in Example 1. Obtained electrophotographic photoreceptor 3
Image evaluation was carried out on 0 of them in the same manner as in the example. The results are shown in Table 1.

【0044】参考例 冷却パイプを設けていない温水浸漬槽に浸漬する以外は
実施例1と同様の方法にて水洗浄・乾燥し、得られた導
電性基体表面に実施例1と同様の方法にて感光層を形成
し、実施例1と同様の方法によって画像評価を行なっ
た。結果を表1に示す。
Reference Example Water was washed and dried in the same manner as in Example 1 except that it was immersed in a warm water dipping bath without a cooling pipe, and the obtained conductive substrate surface was treated in the same manner as in Example 1. Then, a photosensitive layer was formed, and image evaluation was performed by the same method as in Example 1. The results are shown in Table 1.

【0045】実施例2 図2で示した方法により、切削加工した円筒状基体を洗
浄処理した。図2の方法において、第1の洗浄槽の洗浄
液として、ポラークリーン690(田中インポートグル
ープ(株))の5%純水溶液を用い、第2〜4の洗浄槽
の洗浄液として、純水を用いた。第1の洗浄槽の洗浄液
は50℃に加温されており、第2〜4の洗浄槽の洗浄液
の温度はそれぞれ25℃であった。第1乃至第4の洗浄
槽への浸漬時間はそれぞれ2分間であった。
Example 2 A cylindrical substrate that had been machined was washed by the method shown in FIG. In the method of FIG. 2, a 5% pure aqueous solution of Polar Clean 690 (Tanaka Import Group Co., Ltd.) was used as the cleaning liquid for the first cleaning tank, and pure water was used as the cleaning liquid for the second to fourth cleaning tanks. . The cleaning liquid in the first cleaning tank was heated to 50 ° C, and the temperatures of the cleaning liquids in the second to fourth cleaning tanks were 25 ° C. The immersion time in each of the first to fourth cleaning tanks was 2 minutes.

【0046】濯ぎ処理された基体を図3で示された温水
浸漬槽に、ポンプ56により液面上に溜まっている水蒸
気を吸引しながら下降させ65℃に保たれた純水中に2
分間浸漬し、10mm/秒で引き上げ、クリーン度100
に保たれたクリーンブース内で20分間放冷した。
The rinsed substrate was lowered into the warm water dipping tank shown in FIG. 3 while sucking the water vapor accumulated on the liquid surface by the pump 56, and then the pure water kept at 65 ° C.
Soak for 10 minutes, pull up at 10 mm / sec, cleanliness 100
It was left to cool in the clean booth kept at 20 minutes.

【0047】得られた円筒状基体は公知の浸漬塗布方法
により下記A液を円筒状基体の表面に乾燥後の膜厚0.
5μmになるように浸漬塗布し、75℃の温度で1時間
乾燥し、更に下記B液をA液が塗布された円筒状基体の
表面に乾燥後の膜厚20μmになるように浸漬塗布し、
75℃の温度で1時間乾燥した。
The obtained cylindrical substrate was coated with the following solution A on the surface of the cylindrical substrate by a known dip coating method to obtain a film thickness of 0.
It is applied by dip coating to have a thickness of 5 μm and dried at a temperature of 75 ° C. for 1 hour. Further, the following liquid B is dip-coated on the surface of the cylindrical substrate coated with liquid A so that the film thickness after drying is 20 μm,
It was dried at a temperature of 75 ° C. for 1 hour.

【0048】得られた電子写真感光体30本を回転用治
具に装着し複写機[SF−8100、シャープ(株)
製]に搭載してコピーを取り画像評価を行なった。結果
を表1に示す。
30 electrophotographic photoconductors thus obtained were mounted on a rotating jig and used as a copying machine [SF-8100, manufactured by Sharp Corporation].
[Production] and made a copy for image evaluation. The results are shown in Table 1.

【0049】[0049]

【表1】 [Table 1]

【0050】[0050]

【発明の効果】本発明の方法は、洗浄不良によるハジ
キ、シミ及び乾燥ムラ、シミ等の発生が防止され、良品
率においても、従来の1,1,1−トリクロルエタン洗
浄液を使用する場合とほとんど同じで、良品率の低下が
防止されて、実用可能な高収率で電子写真感光体が得ら
れる。更に、洗浄液として有機溶剤を使用しないので、
有機溶剤の使用による大気汚染、人体への影響、高い引
火性及び高い発火性による爆発の危険、特に1,1,1
−トリクロルエタン、フロンの洗浄液としての使用によ
る地球温暖化及びオゾン層の破壊等の問題が解消され
る。
EFFECTS OF THE INVENTION The method of the present invention prevents the occurrence of cissing, stains, drying unevenness, stains, etc. due to poor cleaning, and even in the non-defective rate, the conventional 1,1,1-trichloroethane cleaning solution is used. Almost the same, the reduction of the yield rate is prevented, and the electrophotographic photosensitive member can be obtained in a practically high yield. Furthermore, since no organic solvent is used as a cleaning liquid,
Air pollution due to the use of organic solvents, effects on humans, risk of explosion due to high flammability and ignition, especially 1,1,1
-The problems such as global warming and ozone layer depletion due to the use of trichloroethane and freon as a cleaning solution are solved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の温水浸漬槽の概略図である。FIG. 1 is a schematic view of a hot water immersion tank of the present invention.

【図2】本発明の洗浄方法の概略図である。FIG. 2 is a schematic view of a cleaning method of the present invention.

【図3】本発明の温水浸漬槽の別の態様の概略図であ
る。
FIG. 3 is a schematic view of another embodiment of the hot water immersion tank of the present invention.

【符号の説明】[Explanation of symbols]

1 導電性基体 11 第1の洗浄槽 17 第1の洗浄槽の超音波発振器 18 第1の洗浄槽の洗浄液 21 第2の洗浄槽 31 第3の洗浄槽 41 第4の洗浄槽 50 温水浸漬槽 52 加熱装置 53 冷却パイプ 55 吸収口 56 ポンプ 1 Conductive Substrate 11 First Cleaning Tank 17 Ultrasonic Oscillator for First Cleaning Tank 18 Cleaning Solution for First Cleaning Tank 21 Second Cleaning Tank 31 Third Cleaning Tank 41 Fourth Cleaning Tank 50 Hot Water Soaking Tank 52 heating device 53 cooling pipe 55 absorption port 56 pump

───────────────────────────────────────────────────── フロントページの続き (72)発明者 坂元 雅遊亀 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内 (72)発明者 松本 浩史 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内 (72)発明者 忍 充弘 大阪府大阪市阿倍野区長池町22番22号 シ ャープ株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Mayu Sakamoto 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Within Sharp Corporation (72) Hiroshi Matsumoto 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Incorporation (72) Inventor Mitsuhiro Shinobu 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Prefecture

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 電子写真感光体用導電性基体表面を純
水、イオン交換水又は界面活性剤含有水で浸漬洗浄し、
濯ぎ処理後、温水浸漬槽の温水面上に冷却手段を設けて
該槽内に溜まる水蒸気を凝縮し又はポンプにより該槽内
に溜まる水蒸気を吸引し水蒸気が該導電性基体表面に接
触しないようにして温水浸漬槽中の50〜90℃の温水
に浸漬・引上げて乾燥することを特徴とする電子写真感
光体用導電性基体の洗浄方法。
1. A surface of a conductive substrate for an electrophotographic photoreceptor is immersed and washed in pure water, ion-exchanged water or water containing a surfactant,
After the rinsing treatment, a cooling means is provided on the hot water surface of the hot water immersion tank to condense the water vapor accumulated in the tank or to suck the water vapor accumulated in the tank by a pump so that the water vapor does not come into contact with the surface of the conductive substrate. A method for cleaning a conductive substrate for an electrophotographic photoreceptor, which comprises immersing in a hot water immersion tank at 50 to 90 ° C., pulling it up and drying.
JP3486792A 1992-02-21 1992-02-21 Washing method for electroconductive base for electrophotographic sensitive member Pending JPH05232715A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3486792A JPH05232715A (en) 1992-02-21 1992-02-21 Washing method for electroconductive base for electrophotographic sensitive member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3486792A JPH05232715A (en) 1992-02-21 1992-02-21 Washing method for electroconductive base for electrophotographic sensitive member

Publications (1)

Publication Number Publication Date
JPH05232715A true JPH05232715A (en) 1993-09-10

Family

ID=12426115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3486792A Pending JPH05232715A (en) 1992-02-21 1992-02-21 Washing method for electroconductive base for electrophotographic sensitive member

Country Status (1)

Country Link
JP (1) JPH05232715A (en)

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