JPH05210023A - Optical waveguide - Google Patents

Optical waveguide

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Publication number
JPH05210023A
JPH05210023A JP1541692A JP1541692A JPH05210023A JP H05210023 A JPH05210023 A JP H05210023A JP 1541692 A JP1541692 A JP 1541692A JP 1541692 A JP1541692 A JP 1541692A JP H05210023 A JPH05210023 A JP H05210023A
Authority
JP
Japan
Prior art keywords
optical waveguide
refractive index
added
sapphire
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1541692A
Other languages
Japanese (ja)
Inventor
Akihiro Murata
明弘 村田
Yasuharu Nakagawa
康晴 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yokogawa Electric Corp
Original Assignee
Yokogawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Electric Corp filed Critical Yokogawa Electric Corp
Priority to JP1541692A priority Critical patent/JPH05210023A/en
Publication of JPH05210023A publication Critical patent/JPH05210023A/en
Pending legal-status Critical Current

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  • Optical Integrated Circuits (AREA)

Abstract

PURPOSE:To obtain the optical waveguide which can partially vary the refractive index of the optical waveguide layer of a sapphire-based substrate by adding Ga to part of the surface of the sapphire-based substrate and increasing the refractive index of the added part. CONSTITUTION:The optical waveguide has its optical waveguide layer formed of sapphire or sapphire containing an extremely small amount of added element and Ga is added to part of the surface of the sapphire-based substrate 4 to increase the refractive index of the added part. Namely, when this optical waveguide is applied to a waveguide type Ti:Al2O3 laser, a Ti:Al2O3 substrate 4 becomes a laser medium and a waveguide layer consisting of a Ga-added part 5 is provided at a nearly center part on the top surface of the substrate 4. Thus, Ga is added to the substrate 4 to increase the refractive index, and a three-dimensional optical waveguide can be constituted. High-reflectivity films 6 and 7 are adhered to both end surfaces to form a laser resonator.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光導波路に関し、更に詳
しくは、サファイア系の光導波路の改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical waveguide, and more particularly to improvement of a sapphire optical waveguide.

【0002】[0002]

【従来の技術】光導波路は光波を所望の経路に閉じ込め
て伝搬させる機能を持つものであり、レーザー発振器を
構成する光共振器の構成要素等として重要である。
2. Description of the Related Art An optical waveguide has a function of confining and propagating a light wave in a desired path, and is important as a constituent element of an optical resonator constituting a laser oscillator.

【0003】図5は基本的な光導波路の構造図である。
屈折率nを有する基板1の表面に屈折率nを有する
導波層2が形成され、該導波層2の表面には屈折率n
を有する上部クラッド層3が形成されている。
FIG. 5 is a structural diagram of a basic optical waveguide.
A waveguide layer 2 having a refractive index n f is formed on the surface of a substrate 1 having a refractive index n s, and a refractive index n c is formed on the surface of the waveguide layer 2.
Is formed on the upper clad layer 3.

【0004】このような構造において、導波層2の屈折
率nを基板1の屈折率n及び上部クラッド層3の屈
折率nよりも大きくする(n>n,n)ことに
よって導波層2の内部に光波を閉じこめることができ
る。
[0004] In this structure, the refractive index n f of the waveguide layer 2 larger than the refractive index n c of the refractive index n s and the upper cladding layer 3 of the substrate 1 (n f> n s, n c) As a result, the light wave can be confined inside the waveguide layer 2.

【0005】図6は図5の構造の屈折率特性例図であ
り、(a)はステップ形、(b)はグレーデッド形であ
る。代表例として、LiNbO導波路は、導波層2と
する部分にTi(チタン)を拡散させたり、プロトン
(H)変換することで屈折率を増加させて導波路構造
を実現している。
FIG. 6 is an example of the refractive index characteristic of the structure of FIG. 5, where (a) is a step type and (b) is a graded type. As a typical example, the LiNbO 3 waveguide realizes a waveguide structure by increasing the refractive index by diffusing Ti (titanium) in the portion to be the waveguide layer 2 or converting protons (H + ). .

【0006】[0006]

【発明が解決しようとする課題】しかしながら、可変波
長レーザや超短波パルスレーザ等に応用できるサファイ
ア(Al)系の光導波路を形成する方法は確立さ
れていない。
However, a method for forming a sapphire (Al 2 O 3 ) optical waveguide applicable to a variable wavelength laser, an ultrashort pulse laser, etc. has not been established.

【0007】これは、LiNbOのように容易に屈折
率を変化させる方法が見出されていないためと考えられ
る。本発明は、このような問題点に鑑みてなされたもの
であり、その目的は、サファイア系の光導波層の屈折率
を部分的に変化させることができる光導波路を提供する
ことにある。
It is considered that this is because no method has been found for easily changing the refractive index like LiNbO 3 . The present invention has been made in view of such problems, and an object thereof is to provide an optical waveguide capable of partially changing the refractive index of a sapphire-based optical waveguide layer.

【0008】[0008]

【課題を解決するための手段】このような課題を解決す
る本発明は、光導波層がサファイアまたは微量の添加元
素を含むサファイアで形成された光導波路において、サ
ファイア系基板の表面の一部にGaを添加し、該添加部
分の屈折率を増加させたことを特徴とするものである。
SUMMARY OF THE INVENTION The present invention which solves such a problem is an optical waveguide in which an optical waveguide layer is formed of sapphire or sapphire containing a small amount of an additive element. It is characterized in that Ga is added to increase the refractive index of the added portion.

【0009】[0009]

【作用】Gaが添加された部分の屈折率は基板の他の部
分に比べて大きくなり光導波層が形成される。
The refractive index of the portion to which Ga is added is larger than that of the other portion of the substrate, and the optical waveguide layer is formed.

【0010】この結果、Gaの添加部の端面から光波を
入射させると光波は導波路内を広がることなく導波モー
ドで伝搬することになり、導波層の内部に閉じこめられ
る。
As a result, when a light wave is made incident from the end face of the Ga-added portion, the light wave propagates in the guided mode without spreading in the waveguide and is confined inside the waveguide layer.

【0011】[0011]

【実施例】以下、図面を参照して、本発明の実施例を詳
細に説明する。図1はAlにGaを添加し
たときのGa濃度と屈折率変化の特性図である。
本特性は、無添加のサファイア基板上にGa+A
の混合物層を形成し、上部をCOレーザで加
熱溶融再結晶化した試料のサファイア基板と再結晶化部
の相対屈折率差及び再結晶化部のGa濃度を分析
することにより得られた。図1の特性から明らかなよう
に、サファイアにGaを添加することで屈折率を増加さ
せることができ、本物質(以下この物質をGa:Al
という)は少なくとも可視光波長域では透明なた
め、良好な導波層材料となり得る。
Embodiments of the present invention will now be described in detail with reference to the drawings.
I will explain in detail. Figure 1 shows AlTwoOThreeGaTwoOThreeAdded
Ga whenTwoOThreeIt is a characteristic view of concentration and refractive index change.
This property is due to Ga on an undoped sapphire substrate.TwoOThree+ A
lTwoO ThreeTo form a mixture layer ofTwoAdd with laser
Sapphire substrate and recrystallization part of hot melt recrystallized sample
Relative refractive index difference and Ga of recrystallized partTwoOThreeAnalyze concentration
It was obtained by doing. As is clear from the characteristics of Figure 1.
In addition, increasing the refractive index by adding Ga to sapphire
This substance (hereinafter referred to as Ga: AlTwo
OThreeIs transparent at least in the visible wavelength range.
Therefore, a good waveguide layer material can be obtained.

【0012】なお、図2はAlにGaを添
加したときの状態図である。図1の特性図から、例えば
相対屈折率差Δnを0.3%にしたいときは、Ga
を8wt%(mol換算で4.5mol%)添加する
ことにより得られると推定できる。そして、図2の状態
図から、αAl(サファイア)の結晶形をとり得
るGaの添加限界量は30mol%である。
In addition, FIG. 2 shows AlTwoOThreeGaTwoOThreeWith
It is a state diagram when it is added. From the characteristic diagram of FIG. 1, for example,
To make the relative refractive index difference Δn 0.3%, Ga TwoO
ThreeOf 8 wt% (4.5 mol% in terms of mol) is added
It can be estimated that it can be obtained by And the state of FIG.
From the figure, αAlTwoOThreeCan take the crystal form of (sapphire)
GaTwoOThreeThe addition limit amount of is 30 mol%.

【0013】図3は本発明に基づく一実施例の構成図で
あり、導波路形のTi:Alレーザに適用したも
のである。図中、4はTi:Al基板であって、
レーザ媒質になる。5はGaの添加部よりなる導波層で
あり、基板4の上面のほぼ中央部分に設けられている。
基板4にGa5を添加することで屈折率を増加させるこ
とができ、3次元光導波路が構成できる。6,7は高反
射率膜で、レーザ共振器とするために両端面に被着され
ている。
FIG. 3 is a block diagram of an embodiment according to the present invention, which is applied to a waveguide type Ti: Al 2 O 3 laser. In the figure, 4 is a Ti: Al 2 O 3 substrate,
It becomes a laser medium. Reference numeral 5 denotes a waveguiding layer formed of a Ga-added portion, which is provided on the upper surface of the substrate 4 substantially in the center thereof.
By adding Ga5 to the substrate 4, the refractive index can be increased and a three-dimensional optical waveguide can be constructed. Reference numerals 6 and 7 are high-reflectance films, which are attached to both end faces to form a laser resonator.

【0014】図3の構造において、Ga添加部5の端面
から波長500nm付近の励起光を入射させると、励起
光は導波路内を広がることなく導波モードで伝搬するの
で長い区間において高光パワー密度を実現でき、低いレ
ーザ発振閾値を得ることができる。発振光もGa添加の
光導波路内で導波モードとして発振する。
In the structure of FIG. 3, when pumping light having a wavelength of about 500 nm is made incident from the end face of the Ga-doped portion 5, the pumping light propagates in the guided mode without spreading in the waveguide, so that the high optical power density in a long section. And a low laser oscillation threshold can be obtained. The oscillated light also oscillates as a guided mode in the Ga-doped optical waveguide.

【0015】図4はGa添加の工程図である。(a)は
第1の工程で、例えばスパッタリングによりTi:Al
基板4の表面上にGa+Alの混合
物層8を形成する。
FIG. 4 is a process diagram of Ga addition. (A) is the first step, for example, Ti: Al is formed by sputtering.
A mixture layer 8 of Ga 2 O 3 + Al 2 O 3 is formed on the surface of the 2 O 3 substrate 4.

【0016】(b)は第2の工程で、例えば熱拡散によ
り所望の深さまでGa5を基板4の内部に拡散させる。
熱拡散の代わりに、レーザ照射等により表面部を加熱溶
融再結晶化させてもよい。
(B) is a second step in which Ga5 is diffused into the substrate 4 to a desired depth by, for example, thermal diffusion.
Instead of thermal diffusion, the surface portion may be heated, melted and recrystallized by laser irradiation or the like.

【0017】ここで、混合物層8を例えば(a)のよう
にパターニングしておくことにより、図3のような所望
の3次元光導波路が構成できる。なお、上述実施例では
Ti:Alレーザの例を説明したが、Cr:Al
(ルビー)レーザにも同様に適用できる。
Here, the mixture layer 8 is formed as shown in (a), for example.
By patterning the
The three-dimensional optical waveguide can be constructed. In the above-mentioned embodiment,
Ti: AlTwoOThreeThe example of the laser is explained, but Cr: Al
TwoOThreeThe same can be applied to a (ruby) laser.

【0018】[0018]

【発明の効果】以上詳細に説明したように、本発明によ
れば、以下のような効果が得られる。 Al中にGaを比較的容易に添加できるので、
これまで困難とされていたAl導波路の形成が容
易になる。
As described in detail above, according to the present invention, the following effects can be obtained. Since Ga can be relatively easily added to Al 2 O 3 ,
It becomes easy to form an Al 2 O 3 waveguide, which has been difficult until now.

【0019】Gaの添加量やGa+Al
の混合物層のパターニング形状を制御することにより、
所望の光導波路を比較的自由に形成できる。
The amount of Ga added and Ga 2 O 3 + Al 2 O 3
By controlling the patterning shape of the mixture layer of
The desired optical waveguide can be formed relatively freely.

【図面の簡単な説明】[Brief description of drawings]

【図1】AlにGaを添加したときのGa
濃度と屈折率変化の特性図
FIG. 1 shows the Ga when Ga 2 O 3 is added to Al 2 O 3 .
Characteristic diagram of 2 O 3 concentration and refractive index change

【図2】AlにGaを添加したときの状態
FIG. 2 is a state diagram when Ga 2 O 3 is added to Al 2 O 3 .

【図3】本発明に基づく一実施例の構成図FIG. 3 is a block diagram of an embodiment according to the present invention.

【図4】Ga添加の工程図FIG. 4 is a process diagram of Ga addition.

【図5】基本的な光導波路の構造図[Figure 5] Basic optical waveguide structure diagram

【図6】図5の構造の屈折率特性例図6 is a diagram showing an example of a refractive index characteristic of the structure shown in FIG.

【符号の説明】[Explanation of symbols]

4 Ti:Al基板 5 Ga添加部 6,7 高反射率膜 8 混合物層(Ga+Al4 Ti: Al 2 O 3 Substrate 5 Ga Addition Part 6, 7 High Reflectivity Film 8 Mixture Layer (Ga 2 O 3 + Al 2 O 3 )

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 光導波層がサファイアまたは微量の添加
元素を含むサファイアで形成された光導波路において、 サファイア系基板の表面の一部にGaを添加し、該添加
部分の屈折率を増加させたことを特徴とする光導波路。
1. In an optical waveguide in which an optical waveguide layer is formed of sapphire or sapphire containing a trace amount of an additive element, Ga is added to a part of the surface of a sapphire substrate to increase the refractive index of the added part. An optical waveguide characterized by the above.
JP1541692A 1992-01-30 1992-01-30 Optical waveguide Pending JPH05210023A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1541692A JPH05210023A (en) 1992-01-30 1992-01-30 Optical waveguide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1541692A JPH05210023A (en) 1992-01-30 1992-01-30 Optical waveguide

Publications (1)

Publication Number Publication Date
JPH05210023A true JPH05210023A (en) 1993-08-20

Family

ID=11888155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1541692A Pending JPH05210023A (en) 1992-01-30 1992-01-30 Optical waveguide

Country Status (1)

Country Link
JP (1) JPH05210023A (en)

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