JPH0520890B2 - - Google Patents

Info

Publication number
JPH0520890B2
JPH0520890B2 JP62280964A JP28096487A JPH0520890B2 JP H0520890 B2 JPH0520890 B2 JP H0520890B2 JP 62280964 A JP62280964 A JP 62280964A JP 28096487 A JP28096487 A JP 28096487A JP H0520890 B2 JPH0520890 B2 JP H0520890B2
Authority
JP
Japan
Prior art keywords
mask
pattern
mirrors
semiconductor substrate
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62280964A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01123419A (ja
Inventor
Tsuneaki Isozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP62280964A priority Critical patent/JPH01123419A/ja
Publication of JPH01123419A publication Critical patent/JPH01123419A/ja
Publication of JPH0520890B2 publication Critical patent/JPH0520890B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP62280964A 1987-11-09 1987-11-09 投影露光装置 Granted JPH01123419A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62280964A JPH01123419A (ja) 1987-11-09 1987-11-09 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62280964A JPH01123419A (ja) 1987-11-09 1987-11-09 投影露光装置

Publications (2)

Publication Number Publication Date
JPH01123419A JPH01123419A (ja) 1989-05-16
JPH0520890B2 true JPH0520890B2 (enrdf_load_stackoverflow) 1993-03-22

Family

ID=17632341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62280964A Granted JPH01123419A (ja) 1987-11-09 1987-11-09 投影露光装置

Country Status (1)

Country Link
JP (1) JPH01123419A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003253819A1 (en) 2002-07-22 2004-02-09 Comair Rotron, Inc. Energy store circuit for controlling rotor rotation

Also Published As

Publication number Publication date
JPH01123419A (ja) 1989-05-16

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