JPH05205314A - Optical disk - Google Patents

Optical disk

Info

Publication number
JPH05205314A
JPH05205314A JP4012281A JP1228192A JPH05205314A JP H05205314 A JPH05205314 A JP H05205314A JP 4012281 A JP4012281 A JP 4012281A JP 1228192 A JP1228192 A JP 1228192A JP H05205314 A JPH05205314 A JP H05205314A
Authority
JP
Japan
Prior art keywords
reading out
material layer
light
spot
reflectivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4012281A
Other languages
Japanese (ja)
Other versions
JP3158298B2 (en
Inventor
Koichi Yasuda
宏一 保田
Atsushi Fukumoto
敦 福本
Masumi Ono
真澄 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP01228192A priority Critical patent/JP3158298B2/en
Publication of JPH05205314A publication Critical patent/JPH05205314A/en
Application granted granted Critical
Publication of JP3158298B2 publication Critical patent/JP3158298B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To execute ultraresolution reproduction by creating phase pits on a transparent substrate, superposing an La-material layer thereon, reading out by the heat of reading out light, changing the reflectivity within a light spot and restoring the initial state after the passage of the reading out light. CONSTITUTION:The phase pits 1 are formed at a prescribed track pitch, pit depth and width on the glass substrate 2. A material which is a material to be changed in the reflectivity by generating an optical constant change in the high-temp. region within the light spot by the heat of the reading out light, is low in heat conduction, can be heated up to >=500 deg.C on a disk surface in spite of use of a laser and has >=795 deg.C m.p. is selected for the material layer 3 to be superposed thereon. Such material includes La, Y, Ce, etc., alone or the alloys thereof. The reflectivity is greatly increased in the high-temp. region within the scanning light spot of the reading out light and the reading out by, for example, diffraction, is made possible. The optical disk which obviates the deterioration in signals at the time of repetitive reading out and does not require any initiating means is obtd. according to this constitution. In addition, the recording density is exceedingly increased.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、例えば位相ピットが
形成された透明基板上に温度によって反射率が変化する
材料層が形成されてなり、高密度記録をするのに適用し
て好適な光ディスクに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is an optical disk suitable for high density recording, which is formed by forming a material layer whose reflectance changes with temperature on a transparent substrate having phase pits formed thereon. Regarding

【0002】[0002]

【従来の技術】例えばディジタルオーディオディスク
(いわゆるコンパクトディスク)や、ビデオディスク等
の光ディスクは、予め情報信号に応じて位相ピットが形
成された透明基板上にアルミニウム反射膜を成膜し、そ
の上に保護膜等を形成することで構成されている。
2. Description of the Related Art For optical discs such as digital audio discs (so-called compact discs) and video discs, an aluminum reflective film is formed on a transparent substrate on which phase pits are formed in advance according to an information signal, and an aluminum reflective film is formed thereon. It is configured by forming a protective film or the like.

【0003】このような光ディスクでは、ディスク面に
読み出し光を照射して位相ピットの形成部での光の回折
による反射光量の大幅な減少を検出することによって信
号の読み出し(再生)を行なうようにしている。
In such an optical disc, a signal is read (reproduced) by irradiating the disc surface with a reading light and detecting a large decrease in the amount of reflected light due to the diffraction of the light in the phase pit forming portion. ing.

【0004】ところで、上述のような光ディスクにおい
て、信号再生の分解能は、ほとんど再生光学系の光源の
波長λと対物レンズの開口数NAで決まり、空間周波数
2NA/λが再生限界となる。
By the way, in the optical disc as described above, the resolution of signal reproduction is almost determined by the wavelength λ of the light source of the reproduction optical system and the numerical aperture NA of the objective lens, and the spatial frequency 2NA / λ is the reproduction limit.

【0005】そのため、このような光ディスクにおいて
高密度化を実現するためには、再生光学系の光源(例え
ば半導体レーザ)の波長λを短くすること、あるいは対
物レンズの開口数NAを大きくすることが必要となる。
Therefore, in order to achieve high density in such an optical disc, it is necessary to shorten the wavelength λ of the light source (for example, semiconductor laser) of the reproducing optical system or increase the numerical aperture NA of the objective lens. Will be needed.

【0006】[0006]

【発明が解決しようとする課題】しかし、光源の波長λ
や対物レンズの開口数NAの改善には自ずと限界があ
り、これによって記録密度を飛躍的に高めることは難し
いのが実情である。
However, the wavelength λ of the light source is
There is a limit to the improvement of the numerical aperture NA of the objective lens and the objective lens, and it is difficult to dramatically increase the recording density by this.

【0007】そこで、本出願人は、読み出し光の走査ス
ポット内の部分的相変化による反射率変化を利用するこ
とで、上述した波長λや開口数NAによる制限以上の解
像度を得ることができる光ディスクを提案した(特願平
2−94452号、特願平3−249511号参照)。
Therefore, the applicant of the present invention can obtain a resolution higher than the above-mentioned limits by the wavelength λ and the numerical aperture NA by utilizing the reflectance change due to the partial phase change in the scanning spot of the reading light. (See Japanese Patent Application Nos. 2-94452 and 3-249511).

【0008】これら出願に係わる発明は、読み出し光の
レーザスポット内の部分的相変化により反射率を変化さ
せ超解像再生を行うようにした光ディスクあるいはその
再生方式に係わるものである。
The inventions according to these applications relate to an optical disk or a reproducing system thereof for performing super-resolution reproduction by changing the reflectance by a partial phase change in the laser spot of the reading light.

【0009】本発明においては、さらに相変化を伴わ
ず、本材料の光学定数の温度依存性を用いることによっ
て部分的な反射率変化を利用した超解像再生方式を採
り、相変化に伴う物質移動による劣化が無く、しかもよ
り安定確実に目的とする読み出し位相ピットと他部との
反射率の差を顕著にして安定、確実に高C/N(S/
N)をもって超解像再生を行うことができるようにした
光ディスクを提供する。
In the present invention, a super-resolution reproducing system utilizing a partial reflectance change by using the temperature dependence of the optical constant of the present material is adopted without further phase change, and a substance accompanying the phase change is adopted. No deterioration due to movement, and more stable and reliable Stable and reliable high C / N (S / S) by making the difference in reflectance between the target read phase pit and other parts noticeable.
N) is provided to provide an optical disk capable of performing super-resolution reproduction.

【0010】[0010]

【課題を解決するための手段】本発明は、図1にその要
部の概略的断面図を示すように、位相ピット1が形成さ
れた透明基板2上に温度変化により反射率変化し得る材
料層3が形成されてなり、読み出し光が照射されたとき
に材料層3が読み出し光の走査スポット内で温度分布に
より反射率が変化し、読み出し後温度が低下した状態で
反射率が初期状態に戻る構成とする。
The present invention, as shown in the schematic sectional view of the essential portion of FIG. 1, is a material whose reflectance can be changed by temperature change on a transparent substrate 2 on which phase pits 1 are formed. The layer 3 is formed, and when the reading light is irradiated, the reflectance of the material layer 3 changes depending on the temperature distribution in the scanning spot of the reading light, and the reflectance is returned to the initial state when the temperature is lowered after reading. Return to the configuration.

【0011】また、本発明の他の1は、材料層3をラン
タノイドより構成する。
In another aspect of the present invention, the material layer 3 is made of lanthanoid.

【0012】[0012]

【作用】本発明による光ディスクは、その材料層3がそ
の位相ピット1による記録の読み出しすなわち再生に当
たっては、その読み出し光の走査スポット内での温度分
布を利用して、そのスポット内に生じる高温領域で部分
的に材料層3における反射率が例えば著しく増加するよ
うにして例えばこの高温領域内にある位相ピットについ
ては、例えば回折による読み出しを可能とする。
In the optical disc according to the present invention, when the material layer 3 reads or reproduces the recording by the phase pit 1, the temperature distribution in the scanning spot of the reading light is used to generate a high temperature region in the spot. Thus, for example, the reflectance in the material layer 3 is remarkably increased, for example, so that the phase pits in this high temperature region can be read out by, for example, diffraction.

【0013】つまり、読み出し光スポット内において位
相スポットを光学的に出現させる領域を形成してこのス
ポット内で例えば1の位相スポットのみを読み出すこと
ができ、λ/2NAに制約されない超解像再生を行な
う。
That is, it is possible to form a region in which the phase spot optically appears in the read light spot and read only, for example, one phase spot in this spot, and to perform super-resolution reproduction not restricted by λ / 2NA. To do.

【0014】このように本発明においては、溶融を伴わ
ずに光学的に情報信号の読み出しが可能となために繰り
返し読み出した場合でも信号の劣化を伴わずそのため繰
り返し読み出し回数の多い用途に用いることが可能とな
るものであって、このようにすることによって確実に、
しかも特段の熱処理、冷却過程を採ることなく、またこ
の過程を採るための手段、すなわち初期化手段を設ける
ことなく常態で初期状態を形成するものである。
As described above, according to the present invention, since it is possible to optically read an information signal without being melted, even if the information signal is repeatedly read, the signal is not deteriorated, and therefore, it is used for a large number of times of repeated reading. Is possible, and by doing this,
In addition, the initial state is formed in a normal state without taking special heat treatment and cooling steps and without providing means for taking this step, that is, initialization means.

【0015】[0015]

【実施例】本発明は、図1にその一例の要部の断面図い
わば基本的構成における略線的断面図を示すように、位
相ピット1が形成された透明基板2上に、温度変化によ
り反射率変化し得る材料層3を形成する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As shown in FIG. 1 which is a schematic cross-sectional view of a basic structure of the essential part of the present invention, a transparent substrate 2 having phase pits 1 formed thereon is subjected to a temperature change. A material layer 3 whose reflectance can be changed is formed.

【0016】そして、読み出し光、例えばレーザ光がこ
の材料層3に照射されたときに、この材料層3の読み出
し光の走査スポット内で部分的に高温領域において反射
率が増加すると共に読み出し後温度が低下した状態で初
期状態の反射率に戻るようにする。
When the reading light, for example, a laser beam is irradiated on the material layer 3, the reflectance partially increases in a high temperature region within the scanning spot of the reading light of the material layer 3 and the post-reading temperature is increased. The reflectance is returned to the initial state in a state where the value is lowered.

【0017】図1に示した例においては、透明基板2上
に直接的に材料層3を形成するようにした場合である
が、例えば図2にその要部の略線的拡大断面図を示すよ
うに位相ピット1を有する透明基板2上に第1の誘電体
層4を介して材料層3が形成され、さらにこれの上に第
2の誘電体層5が形成され、これの上に反射膜6さらに
ある場合はこの上に保護膜(図示せず)が形成されてな
り、第1及び第2の誘電体層4及び5によって光学特性
例えば反射率等の設定がなされる構成とすることができ
る。
In the example shown in FIG. 1, the material layer 3 is formed directly on the transparent substrate 2. For example, FIG. 2 shows a schematic enlarged cross-sectional view of the main part thereof. As described above, the material layer 3 is formed on the transparent substrate 2 having the phase pits 1 via the first dielectric layer 4, the second dielectric layer 5 is further formed thereon, and the reflection is performed on the second dielectric layer 5. In the case where the film 6 is further provided, a protective film (not shown) is formed on the film 6, and the optical characteristics such as reflectance are set by the first and second dielectric layers 4 and 5. You can

【0018】実施例1 この例においては、図2で説明した構成を採った場合
で、透明基板2として、ガラス2P基板を使用した。こ
こでいう2Pとは、フォトポリマー法のことである。
Example 1 In this example, a glass 2P substrate was used as the transparent substrate 2 when the configuration described in FIG. 2 was adopted. The 2P referred to here is a photopolymer method.

【0019】そして、本例においては、トラックピッチ
P=1.6μm、ピット深さ約120nm、ピット幅W
=0.3μmの設定条件で形成した。そして、このピッ
ト1を有する透明基板2の一主面に厚さ90nmのAl
Nよりなる第1の誘電体膜4を被着形成し、これの上に
材料層3として厚さ17nmのTb単体金属を使用し
た。この材料層3の熱伝導率は、0.024J/cm・
sec・deg、融点は1356℃である。
In this example, the track pitch P is 1.6 μm, the pit depth is about 120 nm, and the pit width W is W.
= 0.3 μm. Then, on the main surface of the transparent substrate 2 having the pits 1, Al having a thickness of 90 nm is formed.
A first dielectric film 4 made of N was deposited, and a 17 nm thick Tb simple metal was used as the material layer 3 on the first dielectric film 4. The thermal conductivity of this material layer 3 is 0.024 J / cm.
sec · deg, melting point is 1356 ° C.

【0020】さらに、これの上に第2の誘電体膜5とし
て厚さ90nmのAlNによる第2の誘電体層5を被着
形成し、さらにこれの上にAl反射膜6を180nmの
厚さに被着形成した。
Further, a second dielectric layer 5 of AlN having a thickness of 90 nm is deposited and formed thereon as a second dielectric film 5, and an Al reflection film 6 having a thickness of 180 nm is further formed thereon. It was deposited on.

【0021】なお、透明基板2の材料としては、アクリ
ル系樹脂、ポリオレフィン系樹脂、ガラス等を用いるこ
とができる。
As the material of the transparent substrate 2, acrylic resin, polyolefin resin, glass or the like can be used.

【0022】また、材料層3としては、以下の条件を満
足するものが使用される。すなわち、読み出し光の熱に
より、読み出し光スポット内で部分的に高温領域と低温
領域の温度勾配がが生じ高温領域において光学定数変化
を起こすことによって反射率が変化するもので、半導体
レーザーを用いてもディスク盤面上で500℃以上に昇
温できる熱伝導率の小さいものであり、溶融による劣化
を避けるために融点が795℃以上必要である。
As the material layer 3, a material satisfying the following conditions is used. That is, due to the heat of the reading light, a temperature gradient between the high temperature region and the low temperature region is partially generated in the reading light spot, and the reflectance changes due to the change of the optical constant in the high temperature region. Also has a small thermal conductivity that can raise the temperature to 500 ° C. or higher on the disc surface, and a melting point of 795 ° C. or higher is required to avoid deterioration due to melting.

【0023】上述した条件を満足するものとして、Y、
La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、T
b、Dy、Ho、Er、Tm、Yb、Lu等の単体、も
しくはこれらの2種類以上を合金としたものが挙げられ
る。
If the above conditions are satisfied, Y,
La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, T
Examples include simple substances such as b, Dy, Ho, Er, Tm, Yb, and Lu, or alloys of two or more of these.

【0024】また、誘電体膜4及び5としては、Al、
Si等金属及び半導体元素の窒化物、酸化物、硫化物が
あげられ、これらの化合物で半導体レーザ波長領域にお
いて吸収の無いものならば何でもよい。
As the dielectric films 4 and 5, Al,
Examples thereof include nitrides, oxides, and sulfides of metals such as Si and semiconductor elements, and any compound that does not absorb in the semiconductor laser wavelength region may be used.

【0025】さらに、反射膜6としては、Al、Au等
反射率及び熱伝導率の良好な金属ならばなんでもよい。
Further, the reflection film 6 may be made of any metal such as Al and Au, which has a good reflectance and thermal conductivity.

【0026】このように形成された光ディスクに対し
て、その再生パワーを9mWとし、線速を6m/sに設
定してその再生を行なってその信号部分を再生したとこ
ろその信号のC/Nは35dBであった。そして、本発
明による光ディスクは、その再生に当たってこの光ディ
スクに対する走査スポット内における温度分布を利用し
て超解像をもって再生する。
With respect to the optical disk thus formed, the reproduction power was set to 9 mW, the linear velocity was set to 6 m / s, and the reproduction was performed to reproduce the signal portion. The C / N of the signal was It was 35 dB. Then, the optical disc according to the present invention is reproduced with super-resolution by utilizing the temperature distribution in the scanning spot on the optical disc upon reproduction.

【0027】すなわち、本発明による光ディスクにレー
ザスポットを照射した場合を図3を参照して説明する。
図3において横軸はスポットの走査方向に関する位置を
示したもので、今光ディスクにレーザの照射によるレー
ザ光スポットLが照射された状態についてみると、この
場合その光強度は同図中破線Aの分布を示し、このとき
スポットL内で相対的に上述したいわば高温領域Pxと
低温領域Pzが生ずる。これに対して材料層3における
温度分布に対応した反射率分布は、レーザスポットLの
走査速度に対応して僅かに矢印Cで示すスポットLの走
査方向に対し遅れた同図中実線Bの反射率分布となり、
この反射率分布において反射率が増加した部分で、情報
の読み出しが可能となる。
That is, a case where the optical disk according to the present invention is irradiated with a laser spot will be described with reference to FIG.
In FIG. 3, the horizontal axis indicates the position of the spot in the scanning direction. Looking at the state where the optical disk is irradiated with the laser light spot L by laser irradiation, in this case, the light intensity is shown by the broken line A in FIG. The distribution shows a distribution, and at this time, the above-mentioned high temperature region Px and low temperature region Pz relatively occur in the spot L. On the other hand, the reflectance distribution corresponding to the temperature distribution in the material layer 3 corresponds to the scanning speed of the laser spot L and is slightly delayed with respect to the scanning direction of the spot L indicated by the arrow C, and is reflected by the solid line B in the figure. Becomes a rate distribution,
Information can be read at the portion where the reflectance is increased in this reflectance distribution.

【0028】また、上述実施例においては、透明基板2
上に位相ピット1を形成するものであるが、この発明は
その他の光学的に読み出し可能な記録ピットを形成する
ものにも適用できる。
Further, in the above embodiment, the transparent substrate 2
Although the phase pit 1 is formed on the upper side, the present invention can be applied to other optical readable recording pits.

【0029】[0029]

【発明の効果】この発明によれば、溶融することなく信
号の読み出しが可能となるため溶融に起因する劣化例え
ば流動による膜厚不均一による信号出力の低下等が生じ
ないために繰り返し耐久性の向上が図られて繰り返し回
数の多い用途に対しても適用可能な記録密度の高い光デ
ィスクとなる。
According to the present invention, since the signal can be read out without melting, deterioration due to melting, for example, a decrease in signal output due to non-uniformity of the film thickness due to flow does not occur, so that the durability against repetition is increased. The optical disc has a high recording density that can be improved and can be applied to applications in which the number of repetitions is large.

【図面の簡単な説明】[Brief description of drawings]

【図1】光ディスクの一例の構成を示す要部概略断面図
である。
FIG. 1 is a schematic cross-sectional view of an essential part showing the configuration of an example of an optical disc.

【図2】実施例の構成を示す要部概略断面図である。FIG. 2 is a schematic cross-sectional view of a main part showing the configuration of the embodiment.

【図3】レーザスポットの光強度分布と光ディスクの温
度分布(反射率)との関係を示す図である。
FIG. 3 is a diagram showing a relationship between a light intensity distribution of a laser spot and a temperature distribution (reflectance) of an optical disc.

【符号の説明】[Explanation of symbols]

1 位相ピット 2 透明基板 3 材料層 4 第1の誘電体層 5 第2の誘電体層 6 反射膜 1 Phase Pit 2 Transparent Substrate 3 Material Layer 4 First Dielectric Layer 5 Second Dielectric Layer 6 Reflective Film

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 情報信号に応じて光学的に読み出し可能
な記録ピットが形成された透明基板上に温度によって反
射率が変化する材料層を形成したことを特徴とする光デ
ィスク。
1. An optical disk comprising a transparent substrate on which recording pits that can be optically read according to an information signal are formed, and a material layer whose reflectance changes with temperature is formed on the transparent substrate.
【請求項2】 請求項1に記載の光ディスクにおいて材
料層がランタノイドよりなることを特徴とする光ディス
ク。
2. The optical disc according to claim 1, wherein the material layer is made of lanthanoid.
JP01228192A 1992-01-27 1992-01-27 optical disk Expired - Fee Related JP3158298B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01228192A JP3158298B2 (en) 1992-01-27 1992-01-27 optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01228192A JP3158298B2 (en) 1992-01-27 1992-01-27 optical disk

Publications (2)

Publication Number Publication Date
JPH05205314A true JPH05205314A (en) 1993-08-13
JP3158298B2 JP3158298B2 (en) 2001-04-23

Family

ID=11800983

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01228192A Expired - Fee Related JP3158298B2 (en) 1992-01-27 1992-01-27 optical disk

Country Status (1)

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US6430128B1 (en) 1999-11-30 2002-08-06 Tdk Corporation Method for reading optical information medium and optical information medium
US6901036B2 (en) 2000-09-04 2005-05-31 National Institute Of Advanced Industrial Science And Technology Method and apparatus for reproducing an optical signal
US6965556B1 (en) 1999-07-02 2005-11-15 Tdk Corporation Optical information medium having high resolution beyond a diffraction limit and reading method
US7016290B2 (en) 2001-10-15 2006-03-21 Tdk Corporation Readout method and apparatus for optical information medium
CN100372001C (en) * 2003-04-01 2008-02-27 三星电子株式会社 Recording medium having super-resolution near-field structure and method and apparatus for reproducing the same
US7496019B2 (en) 2001-04-20 2009-02-24 Tdk Corporation Information readout method for non mask layer type optical information medium
US7830766B2 (en) 2006-03-14 2010-11-09 Ricoh Company, Ltd. Data reproduction method and apparatus, disk, and recording/reproduction apparatus, using PRML method

Cited By (9)

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US6965556B1 (en) 1999-07-02 2005-11-15 Tdk Corporation Optical information medium having high resolution beyond a diffraction limit and reading method
US7701838B2 (en) 1999-07-02 2010-04-20 Tdk Corporation Optical information medium including an information bearing surface and a functional layer, and reading method
US6430128B1 (en) 1999-11-30 2002-08-06 Tdk Corporation Method for reading optical information medium and optical information medium
US6901036B2 (en) 2000-09-04 2005-05-31 National Institute Of Advanced Industrial Science And Technology Method and apparatus for reproducing an optical signal
US7496019B2 (en) 2001-04-20 2009-02-24 Tdk Corporation Information readout method for non mask layer type optical information medium
US7859968B2 (en) 2001-04-20 2010-12-28 Tdk Corporation Information readout method for non mask layer type optical information medium
US7016290B2 (en) 2001-10-15 2006-03-21 Tdk Corporation Readout method and apparatus for optical information medium
CN100372001C (en) * 2003-04-01 2008-02-27 三星电子株式会社 Recording medium having super-resolution near-field structure and method and apparatus for reproducing the same
US7830766B2 (en) 2006-03-14 2010-11-09 Ricoh Company, Ltd. Data reproduction method and apparatus, disk, and recording/reproduction apparatus, using PRML method

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