JPH05198407A - Thick film thermistor composition - Google Patents

Thick film thermistor composition

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Publication number
JPH05198407A
JPH05198407A JP35141491A JP35141491A JPH05198407A JP H05198407 A JPH05198407 A JP H05198407A JP 35141491 A JP35141491 A JP 35141491A JP 35141491 A JP35141491 A JP 35141491A JP H05198407 A JPH05198407 A JP H05198407A
Authority
JP
Japan
Prior art keywords
thick film
whose
oxide powder
film thermistor
precipitate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP35141491A
Other languages
Japanese (ja)
Other versions
JP2774890B2 (en
Inventor
Tomoaki Futakuchi
友昭 二口
Katsumi Yano
克巳 谷野
Sada Doi
貞 土肥
Takaaki Hotta
孝章 堀田
Kenichi Honda
憲市 本田
Hiroto Nakamura
博人 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOYAMA PREF GOV
Toyama Prefecture
Tateyama Kagaku Kogyo Co Ltd
Original Assignee
TOYAMA PREF GOV
Toyama Prefecture
Tateyama Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOYAMA PREF GOV, Toyama Prefecture, Tateyama Kagaku Kogyo Co Ltd filed Critical TOYAMA PREF GOV
Priority to JP3351414A priority Critical patent/JP2774890B2/en
Publication of JPH05198407A publication Critical patent/JPH05198407A/en
Application granted granted Critical
Publication of JP2774890B2 publication Critical patent/JP2774890B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To obtain a product whose resistance variation is small, whose cost is low and whose quality is excellent by a method wherein oxide powder which is obtained by the thermal decomposition of the precipitate of oxalate at a specific temperature and has a spinel structure is employed. CONSTITUTION:Oxalic acid solution is added to solution in which ions of Mn, Co, Ni and Cu are mixed so as to form coprecipitate whose composition is expressed by a formula MnpCoqNirCusO4, wherein p+q+r+s=3, pnot equal to 0 and q, r and s are not simultaneously zero to obtain oxalate precipitate. The oxalate precipitate is refined and thermally decomposed at a temperature about 600-800 deg.C to obtain oxide powder having a spinel structure. 60-98wt.% of the oxide powder and 2-40wt.% of glass powder are mixed and baked to obtain a thick film thermistor element. With this constitution, the product whose resistance variation is small, whose cost is low and whose quality is excellent can be obtained without using a trimming process and a thermal aging treatment.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、特性のバラツキが少な
く、且つ熱に対する安定性にも優れた厚膜サーミスタ組
成物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thick film thermistor composition having little variation in properties and excellent stability against heat.

【0002】[0002]

【従来の技術】従来の厚膜サーミスタ組成物としては、
次に挙げる(1)乃至(3)のものがある。
As a conventional thick film thermistor composition,
There are the following (1) to (3).

【0003】(1)化2、CoO、NiO、CuO等の
酸化物粉末をそれぞれ所定のスピネル構造の組成物と成
るように混合した後、高温に置ける固相反応により合成
し、これを粉砕した粉末(平均粒径約2μm)とガラス
粉末を用いたもの。
(1) Oxide powders of chemical formula 2, CoO, NiO, CuO, etc. are mixed so as to form a composition having a predetermined spinel structure, and then they are synthesized by a solid phase reaction at a high temperature and pulverized. Powder (average particle diameter of about 2 μm) and glass powder are used.

【化2】 [Chemical 2]

【0004】(2)微粉の化3、CoO、NiO、Cu
O等の酸化物粉末(平均粒径1μm以下)とガラス粉末
を用いて、厚膜焼成時においてスピネル構造の酸化物を
生成させるもの。
(2) Fine powder 3, CoO, NiO, Cu
An oxide powder having an average particle diameter of 1 μm or less and glass powder such as O is used to generate an oxide having a spinel structure during thick film firing.

【化3】 [Chemical 3]

【0005】(3)Mn、Co、Ni、Cuの塩酸塩ま
たは硝酸塩の混合水溶液にアルカリ水溶液を加えて共沈
させ、この沈澱物を精製し、これを熱分解して得られる
スピネル構造の酸化物粉末とガラス粉末を用いたもの。
(3) An alkaline aqueous solution is added to a mixed aqueous solution of hydrochlorides or nitrates of Mn, Co, Ni, and Cu to coprecipitate, the precipitate is purified, and the spinel structure obtained by thermal decomposition is oxidized. Material powder and glass powder are used.

【0006】さらに、抵抗値を下げる場合には、化4な
どの金属導電性物質をこれらに添加する方法も採られて
いる。
Further, in order to lower the resistance value, a method of adding a metal conductive material such as Chemical formula 4 to these is also adopted.

【化4】 [Chemical 4]

【0007】しかしながら、これらのサーミスタ組成物
で作製されるサーミスタ素子は、抵抗値やB定数のバラ
ツキが大きく、また、熱に対する安定性(例えば、15
0℃放置における抵抗値の変化)も悪く、製品として信
頼性に欠けるものであった。
However, the thermistor elements made of these thermistor compositions have large variations in resistance value and B constant, and are stable to heat (eg, 15).
The change in resistance value when left at 0 ° C.) was also poor, and the product lacked reliability.

【0008】すなわち、前記(1)の固相反応で得られ
た粉末は、粒径が大きく且つ不均一であるため、厚膜焼
成時における焼結性が乏しく、また厚膜の構造が不均一
になって抵抗値のバラツキが大きくなる。さらに、粉末
合成時の反応温度が高いために、組成によっては高温相
が残存し、高温放置において相変化が生じ、熱安定性が
悪くなる。
That is, since the powder obtained by the solid-phase reaction of the above (1) has a large particle size and is non-uniform, the sinterability during thick film firing is poor, and the thick film structure is non-uniform. As a result, the variation in the resistance value increases. Furthermore, since the reaction temperature during powder synthesis is high, a high temperature phase remains depending on the composition, and a phase change occurs when left at high temperature, resulting in poor thermal stability.

【0009】また、(2)の微粉末酸化物を用いる方法
では、厚膜焼成時におけるスピネル生成反応が不安定
(温度依存性、雰囲気依存性が大きい)であるため、抵
抗値及びB定数の厚膜依存性があり、抵抗値のバラツキ
が大きくなる。
Further, in the method (2) using the finely powdered oxide, the spinel formation reaction during thick film firing is unstable (the temperature dependence and the atmosphere dependence are large). There is a thick film dependency, and the variation in the resistance value becomes large.

【0010】さらに、(3)の水酸化物沈澱を用いる方
法は、沈澱物が微細であるため、ろ過及び精製が行い難
く、アルカリ元素の混入するおそれもある。また、熱分
解して得られる酸化物の粉末は微細すぎるため、かえっ
て凝集が生じたり焼結性が悪くなったりして、抵抗値の
バラツキは比較的小さいものの熱安定性に欠けることに
なる。
Further, in the method (3) of using hydroxide precipitation, since the precipitate is fine, it is difficult to carry out filtration and purification, and there is a possibility that alkaline elements may be mixed. In addition, since the oxide powder obtained by thermal decomposition is too fine, it may rather agglomerate or the sinterability may deteriorate, resulting in a relatively small variation in resistance value, but lacking in thermal stability.

【0011】以上の理由から、金属の酸化粉末に有機ビ
ヒクルを加えてプレス成形した後1200℃〜1500
℃で焼結して得られるいわゆるバルク焼結体型のサーミ
スタに比べて、厚膜タイプのサーミスタはあまり利用さ
れていないのが現状である。
For the above-mentioned reasons, 1200 ° C. to 1500 ° C. after the organic vehicle is added to the metal oxide powder and press-molded.
At present, thick film type thermistors are not used much as compared with so-called bulk sintered body type thermistors obtained by sintering at ° C.

【0012】[0012]

【発明が解決しようとする課題】ところで、厚膜サーミ
スタを製造する場合には、通常一度の印刷でアルミナ基
板に多数の素子を作製するものであるが、1枚の基板に
おける各サーミスタ素子の抵抗値のバラツキは、従来の
ものでは±15%程度あったために、レーザー加工など
により抵抗トリミングを施すことによって、所定の値の
抵抗値にする必要があった。しかも、トリミング処理を
する際に受ける熱がもたらす温度変化によって、感温抵
抗素子であるサーミスタ素子の抵抗値が変化してしまう
ので、その変化を考慮しながらトリミングを行わなけれ
ばならず、通常の厚膜固定抵抗器の場合に比べて、正確
にトリミング処理を行うために時間が掛かり、製造工程
が煩雑なものになる。
By the way, in the case of manufacturing a thick film thermistor, usually, a large number of elements are manufactured on an alumina substrate by printing once, but the resistance of each thermistor element on one substrate is increased. Since the variation in the value was about ± 15% in the conventional one, it was necessary to make the resistance value to a predetermined value by performing resistance trimming by laser processing or the like. Moreover, since the resistance value of the thermistor element, which is a temperature-sensitive resistance element, changes due to the temperature change caused by the heat received during the trimming process, it is necessary to perform trimming in consideration of the change. Compared with the case of the thick film fixed resistor, it takes time to perform the trimming process accurately, and the manufacturing process becomes complicated.

【0013】そこで、本発明の目的の一つは、製造工程
中のトリミング処理を省くと共に、抵抗値のバラツキを
±5%以下に押さえることができ、安価で品質の優れた
製品を得ることのできる厚膜サーミスタ組成物を提供す
ることにある。
Therefore, one of the objects of the present invention is to eliminate the trimming process during the manufacturing process and to suppress the variation in the resistance value to ± 5% or less, thereby obtaining an inexpensive and excellent quality product. A thick film thermistor composition is provided.

【0014】また、従来のものは、150℃放置におい
て、1000時間で抵抗値が10%程度変化するため、
予め熱エージング処理を行った後に製品とする煩雑さも
あった。
In the conventional case, the resistance value changes about 10% in 1000 hours when left at 150 ° C.,
There is also the complexity of making the product after the heat aging treatment in advance.

【0015】そこで、本発明のもう一つの目的は、15
0℃放置において、予め熱エージング処理を行なわなく
ても、1000時間で抵抗値変化を3%以下にできる厚
膜サーミスタ組成物を提供することにある。
Therefore, another object of the present invention is to
It is an object of the present invention to provide a thick film thermistor composition capable of achieving a resistance change of 3% or less in 1000 hours even if it is left at 0 ° C. without performing a heat aging treatment in advance.

【0016】[0016]

【課題を解決するための手段】従前より、高機能な焼結
体を低温焼成するために、各種の化学的な原料粉末合成
法が検討されてきている。本発明者らは、種々の研究実
験を重ねた結果、これらのなかで、しゅう酸塩沈澱を6
00℃〜800℃で熱分解して得られるスピネル構造の
酸化物粉末に着目し、これが特に、ガラス粉末の存在下
における液相焼結性に非常に優れていることを見い出し
た。さらに、このことが、通常のバルク焼結体サーミス
タに利用するよりも、むしろ厚膜サーミスタの組成物に
用いることの方が遥かに有効であることを見い出し、遂
に発明を完成するに至った。
[Means for Solving the Problems] Various chemical raw material powder synthesizing methods have been studied in order to sinter a high-performance sintered body at a low temperature. As a result of various research experiments, the present inventors have found that among these, oxalate precipitates
Focusing on the oxide powder having a spinel structure obtained by thermal decomposition at 00 ° C. to 800 ° C., it has been found that this is extremely excellent in liquid phase sinterability particularly in the presence of glass powder. Furthermore, they have found that this is far more effective when used in the composition of a thick film thermistor, rather than in a normal bulk sintered body thermistor, and finally completed the invention.

【0017】すなわち、従来から化学合成粉末は固相焼
結性が優れ、1160℃程度で焼結することが既に知ら
れており、これによってバルク焼結体サーミスタを得る
ことができるが、組成によっては、前記焼成温度でもス
ピネル相以外の相が生成し、熱に対して不安定なものに
なりやすく、従って、熱に対して安定なものを得るに
は、B定数の範囲が限られたものになってしまう。
That is, it has been already known that the chemically synthesized powder has excellent solid-phase sinterability and sinters at about 1160 ° C., whereby a bulk sintered body thermistor can be obtained. Is likely to be unstable with respect to heat because phases other than the spinel phase are generated even at the above-mentioned firing temperature. Therefore, in order to obtain a stable one against heat, the range of B constant is limited. Become.

【0018】ところがMn、Co、Ni、Cuの各イオ
ンの混合水溶液にしゅう酸水溶液を加え、MnにCo、
Ni、Cuのうち少なくとも1つからなる、一般式化5
(ただし、p+q+r+s=3、p≠0、q、r、sの
うち少なくとも1つは0でない)で示される組成となる
割合に共沈させて精製したしゅう酸塩沈澱を600℃〜
800℃で熱分解して得られる酸化物粉末は、適度な粒
度分布が得られ、特にガラス粉末の存在下における液相
焼結性が非常に優れているために、広い組成範囲におい
てスピネル相のみが存在するので、熱に対しても大へん
安定したものが広いB定数の範囲にわたって得られた。
However, an oxalic acid aqueous solution is added to a mixed aqueous solution of Mn, Co, Ni, and Cu ions, and Mn is mixed with Co,
General formula 5 comprising at least one of Ni and Cu
(However, p + q + r + s = 3, at least one of p ≠ 0, q, r, and s is not 0).
The oxide powder obtained by thermal decomposition at 800 ° C. has an appropriate particle size distribution, and since the liquid phase sinterability is extremely excellent especially in the presence of glass powder, only the spinel phase is present in a wide composition range. , Which is very stable to heat, was obtained over a wide range of B constants.

【化5】 [Chemical 5]

【0019】実際に、800℃〜950℃で厚膜として
十分な焼結性を示し、抵抗値及びB定数のいずれも再現
性が良く、バラツキがきわめて小さいものであった。そ
して前記スピネル構造の酸化物粉末を60〜98重量%
の割合にし、残り2〜40重量%の割合でガラス粉末を
混合して得た厚膜サーミスタの組成物が、シート抵抗値
のバラツキがきわめて小さく、電気的特性に優れている
ものであった。
Actually, it showed sufficient sinterability as a thick film at 800 ° C. to 950 ° C., both the resistance value and the B constant had good reproducibility, and the variation was extremely small. And 60 to 98% by weight of the oxide powder having the spinel structure
The composition of the thick film thermistor obtained by mixing the glass powder in the ratio of 2 to 40% by weight and the remaining ratio was extremely small and the electrical characteristics were excellent.

【0020】[0020]

【発明の効果】本発明の組成物によれば、抵抗値のバラ
ツキが小さく然も熱に対しての安定性に優れた均質な厚
膜サーミスタを、トリミング処理や熱エージング処理を
することなく簡略化した製造工程により安価に得ること
ができる。特に、電子機器の小形化が進む現状におい
て、強く求められているチップタイプなどの厚膜サーミ
スタとして、有効に利用することが可能である。
EFFECT OF THE INVENTION According to the composition of the present invention, a uniform thick film thermistor having a small variation in resistance value and excellent stability against heat can be simplified without trimming treatment or heat aging treatment. It can be obtained at a low cost by the changed manufacturing process. In particular, in the current situation where electronic devices are becoming smaller, it can be effectively used as a thick film thermistor such as a chip type which is strongly demanded.

【0021】[0021]

【実施例】実施例1 化6及び化7をそれぞれスピネル構造の所定の組成物と
なるように秤量し、水に溶かして0.5mol/1の水
溶液とする。これに0.2mol/1のしゅう酸アンモ
ニウム水溶液を所定量加え、室温で攪拌し、しゅう酸塩
を共沈させる。この沈澱物を吸引ろ過して120℃で乾
燥した後、空気中800℃で2時間熱分解する。
EXAMPLES Example 1 Chemical formulas 6 and 7 were weighed so as to give a predetermined composition having a spinel structure, and dissolved in water to prepare a 0.5 mol / 1 aqueous solution. A predetermined amount of 0.2 mol / 1 ammonium oxalate aqueous solution is added thereto, and the mixture is stirred at room temperature to coprecipitate oxalate. The precipitate is suction filtered, dried at 120 ° C., and then pyrolyzed in air at 800 ° C. for 2 hours.

【化6】 [Chemical 6]

【化7】 [Chemical 7]

【0022】このようにして得られたスピネル酸化物粉
末に、所定量のバインダーガラスと有機ビヒクルを加え
て自動混合機で混練し、印刷可能な厚膜サーミスタペー
ストを作り上げる。
A predetermined amount of binder glass and an organic vehicle are added to the spinel oxide powder thus obtained, and the mixture is kneaded with an automatic mixer to prepare a printable thick film thermistor paste.

【0023】作製したペーストをアルミナ基板(純度9
6%)上に焼き付けたAg/pd系電極間に橋渡しする
状態で印刷し、これを800℃〜950℃の所定温度で
10分間焼成し厚膜サーミスタ素子を作製した。
The prepared paste was applied to an alumina substrate (purity 9
(6%) was printed in a state of bridging between the Ag / pd-based electrodes burned on top, and this was baked at a predetermined temperature of 800 ° C. to 950 ° C. for 10 minutes to produce a thick film thermistor element.

【0024】このようにして得られた厚膜サーミスタ素
子の諸特性を、次の表1に示す。
The characteristics of the thick film thermistor device thus obtained are shown in Table 1 below.

【0025】[0025]

【表1】 [Table 1]

【0026】また、従来のものを表2に示す。Table 2 shows conventional ones.

【0027】[0027]

【表2】 [Table 2]

【0028】表1と表2から、本発明によるものは従来
のものに比べて、シート抵抗値のバラツキが遥かに小さ
いことが判かる。また、表1から、ガラス粉末の混合量
が多くなるのに伴なって抵抗値のバラツキが大きくなる
傾向にあり、No7のケースのように、混合量が50wt%
になると、抵抗値のバラツキが5%を大きく超えること
になる。さらに、No9のケースのように、スピネル構造
酸化物粉末の合成温度が900℃になった場合にも、抵
抗値のバラツキが5%を超えることになる。
From Tables 1 and 2, it can be seen that the sheet according to the present invention has a much smaller variation in sheet resistance value than the conventional sheet. Also, from Table 1, there is a tendency for the variation in the resistance value to increase as the mixing amount of the glass powder increases, and as in the case of No. 7, the mixing amount is 50 wt%.
Then, the variation of the resistance value greatly exceeds 5%. Furthermore, as in the case of No. 9, even when the synthesis temperature of the spinel structure oxide powder reaches 900 ° C., the variation in resistance value exceeds 5%.

【0029】実施例2 組成によっては、1つのしゅう酸塩水溶液で定量的な沈
澱物を得ることができない場合がある。このような場合
には、pHの異なる複数のしゅう酸塩水溶液によって、複
数の沈澱物を作製し、これらを混合した後、熱分解する
ことによって得られたスピネル酸化物粉末を用いること
ができる。これによって、幅広い組成の利用が可能とな
り、幅広い特性の厚膜サーミスタを得ることができる。
Example 2 Depending on the composition, it may not be possible to obtain a quantitative precipitate with one aqueous solution of oxalate. In such a case, a spinel oxide powder obtained by preparing a plurality of precipitates with a plurality of aqueous oxalate solutions having different pHs, mixing them, and then thermally decomposing them can be used. As a result, a wide range of compositions can be used, and a thick film thermistor with a wide range of characteristics can be obtained.

【0030】さらに、化8等の金属導電性を示すものを
添加することによって、より低い抵抗のものを得ること
も可能である。
Further, it is possible to obtain a material having a lower resistance by adding a material having a metal conductivity such as Chemical formula 8 below.

【化8】 [Chemical 8]

【0031】このようにして得られた厚膜サーミスタの
諸特性を表3に示す。
Table 3 shows various characteristics of the thick film thermistor thus obtained.

【0032】[0032]

【表3】 [Table 3]

【0033】また、従来のものを表4に示す。Table 4 shows the conventional one.

【0034】[0034]

【表4】 [Table 4]

【0035】表3と表4から、本発明によるものは従来
のものに比べて、シート抵抗値の低い組成においても、
抵抗値のバラツキの小さいものを得ることができる。ま
た、スピネル構造酸化物の組成や化9混合比を選ぶこと
によって、幅広い特性において抵抗値のバラツキの小さ
なものを得ることができる。
From Tables 3 and 4, the composition according to the present invention has a sheet resistance lower than that of the conventional composition.
It is possible to obtain a device having a small variation in resistance value. Further, by selecting the composition of the spinel structure oxide and the mixing ratio of the chemical formula 9, it is possible to obtain one having a small variation in the resistance value in a wide range of characteristics.

【化9】 [Chemical 9]

【0036】熱安定性に関する測定結果を示す図1か
ら、本発明品C(表3のNo4のもの)及び本発明品B
(表3のNo6のもの)によるものは、従来品A(表4の
No1のもの)に比べて、熱に対する安定性が遥かに優れ
ていることが判かる。
From FIG. 1 showing the measurement results concerning the thermal stability, the product C of the present invention (No. 4 in Table 3) and the product B of the present invention
The one according to (No. 6 in Table 3) is the conventional product A (in Table 4).
It can be seen that the thermal stability is far superior to that of No. 1).

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明品と従来品との熱安定性に関する比較結
果をグラフで示す説明図である。
FIG. 1 is an explanatory diagram showing, in the form of a graph, a comparison result regarding thermal stability between a product of the present invention and a conventional product.

フロントページの続き (72)発明者 土肥 貞 富山県富山市月岡町3丁目6番地 立山科 学工業株式会社南工場内 (72)発明者 堀田 孝章 富山県富山市月岡町3丁目6番地 立山科 学工業株式会社南工場内 (72)発明者 本田 憲市 富山県富山市月岡町3丁目6番地 立山科 学工業株式会社南工場内 (72)発明者 中村 博人 富山県富山市月岡町3丁目6番地 立山科 学工業株式会社南工場内Front Page Continuation (72) Inventor Tei Tei 3-6 Tsukioka-cho, Toyama City, Toyama Prefecture Tateyama Science Co., Ltd. Minami Plant (72) Inventor Takaaki Hotta 3-6 Tsukioka-cho, Toyama City, Toyama Prefecture Industrial Co., Ltd. Minami Factory (72) Inventor Ken Ken Honda 3-6 Tsukioka-cho, Toyama City, Toyama Prefecture Tateyama Science Co., Ltd. Minami Factory (72) Inventor Hiroto Nakamura 3-6 Tsukioka-cho, Toyama City, Toyama Prefecture Address Tateyama Kagaku Kogyo Co., Ltd. South factory

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 Mn、Co、Ni、Cuの各イオンの混
合水溶液にしゅう酸水溶液を加え、MnにCo、Ni、
Cuのうち少なくとも1つからなる、一般式化1(ただ
し、p+q+r+s=3、p≠0、q、r、sのうち少
なくとも1つは0でない)で示される組成となる割合に
共沈させ、この沈澱物を精製し、これを600℃〜80
0℃で熱分解して得られるスピネル構造の酸化物粉末が
60〜98重量%の割合で含有しており、残りの2〜4
0重量%にはガラス粉末が含有していることにより焼成
後においてB定数の膜厚の依存性がないことを特徴とす
る厚膜サーミスタ組成物。 【化1】
1. An oxalic acid aqueous solution is added to a mixed aqueous solution of respective ions of Mn, Co, Ni, and Cu to add Mn, Co, Ni, and
Coprecipitated to a ratio of at least one of Cu, represented by the general formula 1 (provided that p + q + r + s = 3, p ≠ 0, at least one of q, r, and s is not 0). The precipitate was purified and it was heated to 600 ° C-80 ° C.
The oxide powder having a spinel structure obtained by thermal decomposition at 0 ° C. is contained in a proportion of 60 to 98% by weight, and the remaining 2 to 4
A thick film thermistor composition characterized in that 0% by weight contains glass powder so that the B constant does not depend on the film thickness after firing. [Chemical 1]
JP3351414A 1991-12-11 1991-12-11 Method for producing thick film thermistor composition Expired - Lifetime JP2774890B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3351414A JP2774890B2 (en) 1991-12-11 1991-12-11 Method for producing thick film thermistor composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3351414A JP2774890B2 (en) 1991-12-11 1991-12-11 Method for producing thick film thermistor composition

Publications (2)

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JPH05198407A true JPH05198407A (en) 1993-08-06
JP2774890B2 JP2774890B2 (en) 1998-07-09

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006332192A (en) * 2005-05-24 2006-12-07 Tateyama Kagaku Kogyo Kk Thick-film thermistor composition and its manufacturing method, and thick-film thermistor element
JP2008294326A (en) * 2007-05-28 2008-12-04 Tateyama Kagaku Kogyo Kk Thick-film thermistor composition and method of manufacturing the same, and thick-film thermistor element
JP2020112701A (en) * 2019-01-11 2020-07-27 東芝ライテック株式会社 Heater and image forming device
CN112992449A (en) * 2020-12-09 2021-06-18 中国科学院新疆理化技术研究所 Low-temperature spinel oxide negative temperature coefficient thermistor and preparation method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5019354A (en) * 1973-06-12 1975-02-28
JPS54119695A (en) * 1978-03-08 1979-09-17 Hitachi Ltd Composite material for thick film thermistor
JPS6230625A (en) * 1985-06-04 1987-02-09 ユニヴエルシテ・ポ−ル・サバチエ・(トウ−ル−ズ・3) Novel manganite composition and manufacture
JPS63248774A (en) * 1987-04-03 1988-10-17 科学技術庁無機材質研究所長 Manufacture of polycomponent ceramics

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5019354A (en) * 1973-06-12 1975-02-28
JPS54119695A (en) * 1978-03-08 1979-09-17 Hitachi Ltd Composite material for thick film thermistor
JPS6230625A (en) * 1985-06-04 1987-02-09 ユニヴエルシテ・ポ−ル・サバチエ・(トウ−ル−ズ・3) Novel manganite composition and manufacture
JPS63248774A (en) * 1987-04-03 1988-10-17 科学技術庁無機材質研究所長 Manufacture of polycomponent ceramics

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006332192A (en) * 2005-05-24 2006-12-07 Tateyama Kagaku Kogyo Kk Thick-film thermistor composition and its manufacturing method, and thick-film thermistor element
JP2008294326A (en) * 2007-05-28 2008-12-04 Tateyama Kagaku Kogyo Kk Thick-film thermistor composition and method of manufacturing the same, and thick-film thermistor element
JP2020112701A (en) * 2019-01-11 2020-07-27 東芝ライテック株式会社 Heater and image forming device
CN112992449A (en) * 2020-12-09 2021-06-18 中国科学院新疆理化技术研究所 Low-temperature spinel oxide negative temperature coefficient thermistor and preparation method thereof

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