JPH0518250B2 - - Google Patents

Info

Publication number
JPH0518250B2
JPH0518250B2 JP59066064A JP6606484A JPH0518250B2 JP H0518250 B2 JPH0518250 B2 JP H0518250B2 JP 59066064 A JP59066064 A JP 59066064A JP 6606484 A JP6606484 A JP 6606484A JP H0518250 B2 JPH0518250 B2 JP H0518250B2
Authority
JP
Japan
Prior art keywords
cooling
reaction
transparent plate
chamber
reaction gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59066064A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60208824A (ja
Inventor
Masato Mitani
Koji Ichanagi
Junichi Nozaki
Masaki Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59066064A priority Critical patent/JPS60208824A/ja
Publication of JPS60208824A publication Critical patent/JPS60208824A/ja
Publication of JPH0518250B2 publication Critical patent/JPH0518250B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
    • H10P14/3411—Silicon, silicon germanium or germanium
JP59066064A 1984-04-03 1984-04-03 気相成長装置 Granted JPS60208824A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59066064A JPS60208824A (ja) 1984-04-03 1984-04-03 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59066064A JPS60208824A (ja) 1984-04-03 1984-04-03 気相成長装置

Publications (2)

Publication Number Publication Date
JPS60208824A JPS60208824A (ja) 1985-10-21
JPH0518250B2 true JPH0518250B2 (enExample) 1993-03-11

Family

ID=13305048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59066064A Granted JPS60208824A (ja) 1984-04-03 1984-04-03 気相成長装置

Country Status (1)

Country Link
JP (1) JPS60208824A (enExample)

Also Published As

Publication number Publication date
JPS60208824A (ja) 1985-10-21

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