JPH05173001A - Optical parts having laminated antireflection film - Google Patents
Optical parts having laminated antireflection filmInfo
- Publication number
- JPH05173001A JPH05173001A JP3345028A JP34502891A JPH05173001A JP H05173001 A JPH05173001 A JP H05173001A JP 3345028 A JP3345028 A JP 3345028A JP 34502891 A JP34502891 A JP 34502891A JP H05173001 A JPH05173001 A JP H05173001A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- mgo
- optical
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、OA機器、光通信機
器、光情報処理機器、光学応用製造機器、光学的測定
器、カメラなどの光学機器において使用される部品に関
し、さらに詳しくは積層された反射防止膜を有するガラ
ス製および樹脂製の光学部品(以下単に光学部品とい
う)に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to parts used in optical equipment such as office automation equipment, optical communication equipment, optical information processing equipment, optical applied manufacturing equipment, optical measuring instruments and cameras, and more specifically, they are laminated. The present invention relates to an optical component made of glass or resin having an antireflection film (hereinafter simply referred to as an optical component).
【0002】[0002]
【従来技術とその問題点】光学部品には、通常1〜3層
からなる反射防止膜が形成されているが、公知の反射防
止膜には、以下の様な問題点がある。2. Description of the Related Art Generally, an antireflection film consisting of 1 to 3 layers is formed on an optical component, but the known antireflection film has the following problems.
【0003】(a)MgF2 などの単層膜では、反射率
が1.3%以上にもなり、反射防止効果が十分でない。(A) In a single layer film such as MgF 2 , the reflectance is 1.3% or more, and the antireflection effect is not sufficient.
【0004】(b)2層膜では、反射率を0.2%以下
に押さえることは可能であるが、反射率を抑制できる光
波長の帯域が狭く、分光特性のグラフがV型となる。(B) In the two-layer film, the reflectance can be suppressed to 0.2% or less, but the bandwidth of the light wavelength at which the reflectance can be suppressed is narrow, and the spectral characteristic graph becomes V-shaped.
【0005】(c)3層膜では、第1層膜として中程度
の屈折率を有する適切な材料がないので、高屈折率材料
と低屈折率材料との積層による等価膜手法が採用されて
いる。そのため、膜制御が複雑である。(C) In the three-layer film, since there is no suitable material having a medium refractive index as the first layer film, an equivalent film method by stacking a high refractive index material and a low refractive index material is adopted. There is. Therefore, membrane control is complicated.
【0006】(d)光学部品が樹脂製である場合には、
反射防止膜の基材への密着性が不良である。(D) When the optical component is made of resin,
The adhesion of the antireflection film to the substrate is poor.
【0007】[0007]
【発明が解決しようとする課題】従って、本発明は、全
ての基材への密着性に優れ且つ膜制御が容易である積層
反射防止膜を備え、光学的特性、耐久性などに優れた光
学部品を提供することを目的とする。SUMMARY OF THE INVENTION Therefore, the present invention provides an optical film having excellent optical characteristics, durability, etc., which is provided with a laminated antireflection film having excellent adhesion to all substrates and easy film control. The purpose is to provide parts.
【0008】[0008]
【課題を解決するための手段】本発明者は、上記のよう
な技術の現状に鑑みて鋭意研究を進めた結果、特定の3
層膜の組み合わせからなる反射防止膜を光学部品上に形
成する場合には、従来技術の問題点が実質的に解消乃至
大幅に軽減されることを見出した。The present inventor has conducted intensive research in view of the current state of the art as described above, and as a result, the specific 3
It has been found that, when an antireflection film composed of a combination of layer films is formed on an optical component, the problems of the prior art are substantially eliminated or greatly reduced.
【0009】即ち、本発明は、下記の光学部品を提供す
るものである: 1.積層反射防止膜を有する光学部品であって、 (1)CeO2 およびMgOからなる屈折率1.63〜
1.75の第1層、(2)TiO2 またはTiOからな
る第2層、および(3)MgF2 またはSiO2 からな
る第3層を順次積層してなる光学部品。That is, the present invention provides the following optical components: An optical component having a laminated antireflection film, comprising: (1) a refractive index of 1.63 consisting of CeO 2 and MgO.
An optical component formed by sequentially laminating a 1.75 first layer, (2) a second layer made of TiO 2 or TiO, and (3) a third layer made of MgF 2 or SiO 2 .
【0010】本発明が対象とする光学部品は、ガラス製
および樹脂製のいずれでも良い。樹脂としては、光学部
品として一般に使用されているポリカーボネート(P
C)、ポリメチルメタクリレート(PMMA)、ポリア
ミド、ポリスチレン、ジエチレングリコールビスアリル
カーボネート樹脂などが例示される。The optical component of the present invention may be made of glass or resin. As the resin, polycarbonate (P
C), polymethylmethacrylate (PMMA), polyamide, polystyrene, diethylene glycol bisallyl carbonate resin, etc. are exemplified.
【0011】本発明光学部品において、基材上に形成さ
れる第1層は、CeO2 およびMgOの混合物の蒸着層
からなり、屈折率が1.63〜1.75の範囲内にある
ことを必須とする。CeO2 とMgOの混合割合は、好
ましくはCeO2 :MgO=0.73:1〜0.86:
1程度(重量比)の範囲内にあり、特に好ましくはCe
O2 :MgO=0.82:1である。第1層の屈折率が
上記の特定範囲外となる場合には、所期の目的が達成さ
れない。第1層の厚さは、基材への密着性などを考慮し
て、光学的膜厚(=物理的膜厚×屈折率)として110
〜120nm程度とすることが好ましい。第1層は、Ce
O2 とMgOとの混合原料を使用して、蒸着法により形
成することができる。この第1層は、基材であるガラス
製および樹脂製光学部品への密着性に優れていることが
特徴である。In the optical component of the present invention, the first layer formed on the substrate is a vapor-deposited layer of a mixture of CeO 2 and MgO and has a refractive index of 1.63 to 1.75. Required. The mixing ratio of CeO 2 and MgO is preferably CeO 2 : MgO = 0.73: 1 to 0.86:
It is in the range of about 1 (weight ratio), particularly preferably Ce.
O 2 : MgO = 0.82: 1. When the refractive index of the first layer is out of the above specified range, the intended purpose is not achieved. The thickness of the first layer is 110 as an optical film thickness (= physical film thickness × refractive index) in consideration of adhesion to a substrate.
It is preferably about 120 nm. The first layer is Ce
It can be formed by a vapor deposition method using a mixed raw material of O 2 and MgO. The first layer is characterized by excellent adhesion to the glass and resin optical components that are the base material.
【0012】本発明光学部品において、第1層上に形成
される第2層は、TiO2 またはTiOからなってい
る。第2層の厚さは、光学的膜厚として180〜210
nm程度とすることが好ましい。第2層は、常法に従って
蒸着法により形成することができる。In the optical component of the present invention, the second layer formed on the first layer is made of TiO 2 or TiO. The thickness of the second layer is 180 to 210 as an optical film thickness.
It is preferably about nm. The second layer can be formed by a vapor deposition method according to a conventional method.
【0013】本発明光学部品において、第2層上に形成
される第3層は、MgF2 またはSiO2 からなってい
る。第3層の厚さは、光学的膜厚として110〜120
nm程度とすることが好ましい。第3層も、常法に従って
蒸着法により形成することができる。In the optical component of the present invention, the third layer formed on the second layer is made of MgF 2 or SiO 2 . The thickness of the third layer is 110 to 120 as an optical film thickness.
It is preferably about nm. The third layer can also be formed by a vapor deposition method according to a conventional method.
【0014】[0014]
【発明の効果】本発明によれば、以下のような効果が達
成される。According to the present invention, the following effects are achieved.
【0015】(1)CeO2 /MgO混合物を第1層と
するので、膜制御(組成および屈折率の制御)が容易で
ある。(1) Since the CeO 2 / MgO mixture is used as the first layer, film control (composition and refractive index control) is easy.
【0016】(2)第1層と基材との密着性が良好であ
る。特に従来密着性に劣るとされていた樹脂製基材に対
する第1層の密着性に優れている。(2) Good adhesion between the first layer and the substrate. In particular, the adhesion of the first layer to the resin-made base material, which was conventionally inferior in adhesion, is excellent.
【0017】(3)可視波長域における反射率を1%以
下に押さえることができる。(3) The reflectance in the visible wavelength range can be suppressed to 1% or less.
【0018】(4)悪条件下且つ長期にわたる耐久性に
優れている。(4) Excellent durability under bad conditions and for a long time.
【0019】[0019]
【実施例】以下に実施例および比較例を示し、本発明の
特徴とするところをより一層明確にする。EXAMPLES Examples and comparative examples will be shown below to further clarify the characteristics of the present invention.
【0020】実施例1 厚さ2mmのPMMA平板(屈折率nD=1.49)を真
空蒸着装置内に設置し、非加熱下に排気して、真空度5
×10-5Torrまで減圧した。次いで、電子ビームにより
CeO2 /MgO混合物(モル比=0.82/1)を蒸
発させ、光学的膜厚が113nmとなるように成膜して、
第1層を形成した。Example 1 A PMMA flat plate (refractive index nD = 1.49) having a thickness of 2 mm was placed in a vacuum vapor deposition apparatus, evacuated without heating, and a vacuum degree of 5 was obtained.
The pressure was reduced to × 10 -5 Torr. Then, the CeO 2 / MgO mixture (molar ratio = 0.82 / 1) is evaporated by an electron beam to form a film having an optical film thickness of 113 nm,
The first layer was formed.
【0021】次に、同様の条件で真空蒸着装置の減圧を
行ない、酸素を1.2×10-5Torrまで導入した後、T
iO2 を蒸発させて、光学的膜厚190nmの第2層を形
成した。Next, the vacuum deposition apparatus was depressurized under the same conditions to introduce oxygen up to 1.2 × 10 -5 Torr, and then T
The iO 2 was evaporated to form a second layer with an optical thickness of 190 nm.
【0022】次に、同様の条件で真空蒸着装置の減圧を
行なった後、MgF2 を蒸発させて、光学的膜厚110
nmの第3層を形成した。Next, after depressurizing the vacuum vapor deposition apparatus under the same conditions, MgF 2 is evaporated to obtain an optical film thickness 110.
A third layer of nm was formed.
【0023】PMMA平板の両面に上記の第1層乃至第
3層を形成した製品の分光特性を図1に示す。FIG. 1 shows the spectral characteristics of a product in which the above-mentioned first to third layers are formed on both sides of a PMMA flat plate.
【0024】また、形成された被膜層の各種の物性を表
1(所期物性)および表2(温度60℃×相対湿度80
%で168時間保持後の物性)に示す。なお、表1およ
び表2は、以下の実施例2〜3および比較例1〜4の結
果をも併せて示す。Various physical properties of the formed coating layer are shown in Table 1 (desired physical properties) and Table 2 (temperature 60 ° C. × relative humidity 80).
% After holding for 168 hours). In addition, Table 1 and Table 2 also show the results of Examples 2 to 3 and Comparative Examples 1 to 4 below.
【0025】実施例2 基材としてPC平板(屈折率nD=1.58)を使用
し、第1層乃至第3層の光学的膜厚を下記の通りとする
以外は実施例1と同様にして、両面に3層被膜を有する
製品を得た。その分光特性を図2に示す。Example 2 The same as Example 1 except that a PC flat plate (refractive index nD = 1.58) was used as the substrate and the optical thicknesses of the first to third layers were as follows. A product having a three-layer coating on both sides was obtained. The spectral characteristics are shown in FIG.
【0026】第1層…113nm 第2層…200nm 第3相…110nm 実施例3 基材として150℃に加熱したガラス平板(屈折率nD
=1.52)を使用し、第1層乃至第3層の厚さを下記
の通りとする以外は実施例1と同様にして、両面に3層
被膜を有する製品を得た。その分光特性を図3に示す。First layer: 113 nm Second layer: 200 nm Third phase: 110 nm Example 3 A glass plate (refractive index nD) heated to 150 ° C. as a base material
= 1.52) was used, and a product having a three-layer coating on both surfaces was obtained in the same manner as in Example 1 except that the thicknesses of the first to third layers were as follows. The spectral characteristics are shown in FIG.
【0027】比較例1 第1層としてAl2 O3 (屈折率nD=1.63)を使
用する以外は実施例1と同様にして、両面に3層被膜を
有する製品を得た。Comparative Example 1 A product having a three-layer coating on both sides was obtained in the same manner as in Example 1 except that Al 2 O 3 (refractive index nD = 1.63) was used as the first layer.
【0028】比較例2 第1層としてCeF3 (屈折率nD=1.62)を使用
する以外は実施例1と同様にして、両面に3層被膜を有
する製品を得た。Comparative Example 2 A product having a three-layer coating on both sides was obtained in the same manner as in Example 1 except that CeF 3 (refractive index nD = 1.62) was used as the first layer.
【0029】比較例3 第1層としてPbF2 (屈折率nD=1.75)を使用
する以外は実施例1と同様にして、両面に3層被膜を有
する製品を得た。Comparative Example 3 A product having a three-layer coating on both sides was obtained in the same manner as in Example 1 except that PbF 2 (refractive index nD = 1.75) was used as the first layer.
【0030】比較例4 第1層としてSiO(屈折率nD=1.67)を使用す
る以外は実施例1と同様にして、両面に3層被膜を有す
る製品を得た。Comparative Example 4 A product having a three-layer coating on both sides was obtained in the same manner as in Example 1 except that SiO (refractive index nD = 1.67) was used as the first layer.
【0031】 表 1 密着性 外観 光学特性 実施例1 良好 良好 良好 実施例2 良好 良好 良好 実施例3 良好 良好 良好 比較例1 不良 不良 不良 比較例2 良好 良好 不良 比較例3 良好 良好 不良 比較例4 不良 良好 不良 注:密着性…セロファンテープにて5回剥離試験する。Table 1 Adhesion Appearance Optical Properties Example 1 Good Good Good Good Example 2 Good Good Good Example 3 Good Good Good Good Comparative Example 1 Bad Bad Bad Bad Comparative Example 2 Good Good Bad Bad Comparative Example 3 Good Good Bad Comparative Example 4 Bad Good Poor Note: Adhesion: Perform 5 peel tests with cellophane tape.
【0032】外観…曇り、クラックなどの有無を肉眼で
判定する。Appearance: The presence or absence of cloudiness and cracks is visually judged.
【0033】光学特性…反射率1%未満を良好とし、1
%以上を不良とする。Optical characteristics: A reflectance of less than 1% is regarded as good and 1
% Or more is regarded as a defect.
【0034】 表 2 密着性 外観 光学特性 実施例1 良好 良好 変化なし 実施例2 良好 良好 変化なし 実施例3 良好 良好 変化なし 比較例1 不良 不良 測定不能 比較例2 良好 良好 変化大 比較例3 良好 良好 変化大 比較例4 不良 良好 変化大 注:比較例1は、クラックが多く、測定不可能であっ
た。Table 2 Adhesion Appearance Optical Properties Example 1 Good Good No Change Example 2 Good Good No Change Example 3 Good Good Good No Change Comparative Example 1 Poor Poor Unmeasurable Comparative Example 2 Good Good Large Comparative Example 3 Good Good Large Change Comparative Example 4 Poor Good Good Large Change Note: Comparative Example 1 had many cracks and could not be measured.
【0035】実施例4 第2層としてTiO膜を形成させる以外は実施例1と同
様にして本発明による光学部品を製造した。Example 4 An optical component according to the present invention was manufactured in the same manner as in Example 1 except that a TiO film was formed as the second layer.
【0036】形成された被膜層の物性は、実施例1のそ
れと殆ど変わりなかった。The physical properties of the formed coating layer were almost the same as those of Example 1.
【0037】実施例5 第3層としてSiO2 膜を形成させる以外は実施例1と
同様にして本発明による光学部品を製造した。Example 5 An optical component according to the present invention was manufactured in the same manner as in Example 1 except that a SiO 2 film was formed as the third layer.
【0038】形成された被膜層の物性は、実施例1のそ
れと殆ど変わりなかった。The physical properties of the formed coating layer were almost the same as those of Example 1.
【図1】実施例1で得られた製品の分光特性を示すグラ
フである。FIG. 1 is a graph showing the spectral characteristics of the product obtained in Example 1.
【図2】実施例2で得られた製品の分光特性を示すグラ
フである。FIG. 2 is a graph showing the spectral characteristics of the product obtained in Example 2.
【図3】実施例3で得られた製品の分光特性を示すグラ
フである。FIG. 3 is a graph showing the spectral characteristics of the product obtained in Example 3.
Claims (1)
て、 (1)CeO2 およびMgOからなる屈折率1.63〜
1.75の第1層、 (2)TiO2 またはTiOからなる第2層、および (3)MgF2 またはSiO2 からなる第3層を順次積
層してなる光学部品。1. An optical component having a laminated antireflection film, comprising: (1) a refractive index of 1.63 to CeO 2 and MgO.
An optical component formed by sequentially laminating a first layer of 1.75, (2) a second layer of TiO 2 or TiO, and (3) a third layer of MgF 2 or SiO 2 .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03345028A JP3111243B2 (en) | 1991-12-26 | 1991-12-26 | Optical component having laminated antireflection film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03345028A JP3111243B2 (en) | 1991-12-26 | 1991-12-26 | Optical component having laminated antireflection film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05173001A true JPH05173001A (en) | 1993-07-13 |
JP3111243B2 JP3111243B2 (en) | 2000-11-20 |
Family
ID=18373798
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP03345028A Expired - Fee Related JP3111243B2 (en) | 1991-12-26 | 1991-12-26 | Optical component having laminated antireflection film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3111243B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1020738A1 (en) * | 1999-01-14 | 2000-07-19 | Sumitomo Chemical Company, Limited | Three-layer anti-reflection filn containing a first layer of binder resin with ultrafine particles |
JP2012008297A (en) * | 2010-06-24 | 2012-01-12 | Nikon Corp | Optical element and optical apparatus |
-
1991
- 1991-12-26 JP JP03345028A patent/JP3111243B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1020738A1 (en) * | 1999-01-14 | 2000-07-19 | Sumitomo Chemical Company, Limited | Three-layer anti-reflection filn containing a first layer of binder resin with ultrafine particles |
JP2012008297A (en) * | 2010-06-24 | 2012-01-12 | Nikon Corp | Optical element and optical apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP3111243B2 (en) | 2000-11-20 |
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