JPH05166965A - Package structure - Google Patents

Package structure

Info

Publication number
JPH05166965A
JPH05166965A JP3331042A JP33104291A JPH05166965A JP H05166965 A JPH05166965 A JP H05166965A JP 3331042 A JP3331042 A JP 3331042A JP 33104291 A JP33104291 A JP 33104291A JP H05166965 A JPH05166965 A JP H05166965A
Authority
JP
Japan
Prior art keywords
ground pattern
signal line
surface side
insulating substrate
side ground
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP3331042A
Other languages
Japanese (ja)
Inventor
Akikazu Toyoda
明和 豊田
Tsunetaro Nose
恒太郎 能勢
Hiroaki Yadokoro
博明 谷所
Sakae Koyata
栄 古屋田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP3331042A priority Critical patent/JPH05166965A/en
Publication of JPH05166965A publication Critical patent/JPH05166965A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance

Abstract

PURPOSE:To enable a package structure to be of surface mounting type and to be easily matched to an external circuit in impedance by a method wherein a transmission line such as a micro-strip line is formed throughout a surface-side signal line and a rear-side signal line and controlled in specific impedance by through-holes. CONSTITUTION:An insulating board 44 provided with through-holes 56 and 58 where a semiconductor chip 42 is mounted, a rear-side ground pattern 52 formed on the rear of the insulating board 44, and a front-side ground pattern 48 connected to the rear-side ground pattern 52 are provided. A surface-side signal line 46 which forms a transmission line with the surface-side ground pattern 48 and/or the rear-side ground pattern 52 and a rear-side signal line 50 which forms a micro-strip line with the surface-side ground pattern 48 connected to the surface-side signal line 46 are provided. By this setup, a package structure of this design can be easily matched to an outer circuit in impedance.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、パッケージ構造体に関
し、特に、マイクロ波の半導体チップ、モノリシック集
積回路、ハイブリッド集積回路等をパッケージするのに
適したパッケージ構造体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a package structure, and more particularly to a package structure suitable for packaging microwave semiconductor chips, monolithic integrated circuits, hybrid integrated circuits and the like.

【0002】[0002]

【従来の技術】半導体素子の容器であるパッケージ構造
体は、電気的端子を取り出すとともに、外気と半導体チ
ップとを遮断して半導体チップの故障や劣化を防ぐこと
等を目的としている。このようなパッケージ構造体に
は、従来例えば図6から図8に示されたものがある。
2. Description of the Related Art A package structure, which is a container for semiconductor devices, has the purpose of taking out electrical terminals and blocking the outside air from the semiconductor chip to prevent failure and deterioration of the semiconductor chip. Conventionally, such a package structure is, for example, one shown in FIGS. 6 to 8.

【0003】図6、図7に示すパッケージ構造体10
は、メタル12の上に載置された半導体チップ14とこ
の半導体チップ14の入出力端子と接続された4つのリ
ード端子16a、16b、16c、16dの一部とが、
セラミック、ガラス等の電気絶縁物18を介してメタル
キャップ20(図6では図示省略)により被冠されパッ
ケージされている。また、図7に示すように、リード端
子16a、16b、16c、16dのみがマイクロスト
リップラインとしてメタルキャップ20の外部に出てい
る。
A package structure 10 shown in FIGS. 6 and 7.
Is a semiconductor chip 14 placed on the metal 12 and a part of the four lead terminals 16a, 16b, 16c, 16d connected to the input / output terminals of the semiconductor chip 14,
It is capped and packaged by a metal cap 20 (not shown in FIG. 6) via an electrical insulator 18 such as ceramic or glass. Further, as shown in FIG. 7, only the lead terminals 16a, 16b, 16c, 16d are exposed to the outside of the metal cap 20 as a microstrip line.

【0004】また、図8に示すパッケージ構造体22
は、半導体チップ24は箱体26内に配置されており、
半導体チップ24の入出力端子と接続されたリード28
a、28b、28c、28dが、箱体26の壁30a、
30bを貫通して外部に取り出されている。
Further, the package structure 22 shown in FIG.
, The semiconductor chip 24 is arranged in the box 26,
Lead 28 connected to the input / output terminal of the semiconductor chip 24
a, 28b, 28c, 28d are walls 30a of the box 26,
It penetrates through 30b and is taken out to the outside.

【0005】[0005]

【発明が解決しようとする課題】従来上記に示すような
各種のパッケージ構造体が用いられているが、これらの
うち図7に示すパッケージ構造体10は、このパッケー
ジ構造体10が配置される回路基板にこのパッケージ構
造体10全体をネジで止める必要があり表面実装できな
いという問題がある。
Conventionally, various package structures as described above have been used. Among them, the package structure 10 shown in FIG. 7 is a circuit in which the package structure 10 is arranged. There is a problem that the entire package structure 10 needs to be fixed to the substrate with screws so that surface mounting cannot be performed.

【0006】図8に示すパッケージ構造体22は、パッ
ケージの製造工程においてリード28a,28b,28
c、28dを取り付ける必要があるため、製造工程が複
雑になり、また外部回路とのインピーダンスを整合させ
るのが難しいという問題がある。本発明は、上記問題点
に鑑み、表面実装できるとともにインピーダンス整合の
容易なパッケージ構造体を提供することを目的とする。
A package structure 22 shown in FIG. 8 has leads 28a, 28b, 28 in a package manufacturing process.
Since it is necessary to attach c and 28d, there are problems that the manufacturing process becomes complicated and it is difficult to match the impedance with an external circuit. In view of the above problems, it is an object of the present invention to provide a package structure which can be surface-mounted and whose impedance matching is easy.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
に、本発明のパッケージ構造体は、 (a)半導体チップ (b)表面に該半導体チップが載置された、信号ライン
用の第1のスルーホールとグランド用の第2のスルーホ
ールとを有する絶縁基板 (c)前記絶縁基板の裏面に形成された裏面側グランド
パターン (d)前記絶縁基板の表面の周縁部を含む領域に形成さ
れ前記第2のスルーホール内の導体を介して前記裏面側
グランドパターンと接続された表面側グランドパターン (e)前記絶縁基板の表面に形成され前記半導体チップ
の入力端子又は出力端子と接続された、前記表面側グラ
ンドパターン及び/又は前記裏面側グランドパターンと
の間で伝送線路を形成する表面側信号ライン (f)前記絶縁基板の裏面に形成され前記第1のスルー
ホール内の導体を介して前記表面側信号ラインと接続さ
れた、前記表面側グランドパターンとの間でマイクロス
トリップラインを形成する裏面側信号ライン (g)前記絶縁基板上の前記半導体チップと前記表面側
信号ラインとを被冠し前記表面側グランドパターンと接
続された導電性キャップ の各要素を備えたことを特徴とするものである。
In order to achieve the above object, the package structure of the present invention comprises: (a) a semiconductor chip; (b) a first semiconductor chip mounted on the surface for a signal line. Substrate having a through hole and a second through hole for ground (c) A ground pattern on the back side formed on the back surface of the insulating substrate (d) Formed in a region including a peripheral portion of the front surface of the insulating substrate A front surface side ground pattern connected to the back surface side ground pattern through a conductor in the second through hole (e) connected to an input terminal or an output terminal of the semiconductor chip formed on the front surface of the insulating substrate; Front-side signal line forming a transmission line between the front-side ground pattern and / or the back-side ground pattern (f) formed on the back surface of the insulating substrate A back side signal line which is connected to the front side signal line via a conductor in a through hole and forms a microstrip line with the front side ground pattern. (G) The semiconductor chip and the semiconductor chip on the insulating substrate. It is characterized in that each element of the conductive cap, which is covered with the signal line on the front surface side and is connected to the ground pattern on the front surface side, is provided.

【0008】[0008]

【作用】本発明のパッケージ構造体は、表面側信号ライ
ンは表面側グランドパターン及び/又は裏面側グランド
パターンとの間で、例えばマイクロストリップライン、
コプレーナ型ストリップライン等の伝送線路を形成し、
裏面側信号ラインは表面側グランドパターンとの間でマ
イクロストリップラインを形成し、しかも表面側信号ラ
インと裏面側信号ラインとはスルーホール内の導体を介
して接続されているため、このスルーホールの寸法等に
より特性インピーダンスが調整され、これにより外部回
路と容易にインピーダンスをマッチングさせることがで
きる。またこのパッケージ構造体を回路基板に載置して
裏面側信号ラインと回路基板上の配線パターンとをハン
ダ等で接続することにより表面実装される。
In the package structure of the present invention, the signal line on the front surface is provided between the ground pattern on the front surface and / or the ground pattern on the back surface, for example, a microstrip line,
Form a transmission line such as a coplanar stripline,
The back surface side signal line forms a microstrip line with the front surface side ground pattern, and since the front surface side signal line and the back surface side signal line are connected via the conductor in the through hole, this through hole The characteristic impedance is adjusted according to the size or the like, which allows the impedance to be easily matched with an external circuit. Further, the package structure is mounted on a circuit board, and the back surface side signal line and the wiring pattern on the circuit board are connected by soldering or the like to be surface mounted.

【0009】[0009]

【実施例】以下、本発明の実施例を示す添付図面を参照
しながら、本発明の実施例を説明する。図1は本発明の
一実施例に係るパッケージ構造体40の斜視図、図2は
図1のII−II断面図である。
Embodiments of the present invention will be described below with reference to the accompanying drawings showing the embodiments of the present invention. 1 is a perspective view of a package structure 40 according to an embodiment of the present invention, and FIG. 2 is a sectional view taken along line II-II of FIG.

【0010】このパッケージ構造体40は、半導体チッ
プ42が載置された絶縁基板44と、この絶縁基板44
の表面に形成された表面側信号ライン46と、絶縁基板
44の表面に表面側信号ライン46を取り巻くように形
成された表面側グランドパターン48と、絶縁基板44
の裏面に形成され表面側信号ライン46と接続された裏
面側信号ライン50(図2参照)と、絶縁基板44の裏
面に形成され表面側グランドパターン48と接続された
裏面側グランドパターン52(図2参照)と、絶縁基板
44上の半導体チップ42と表面側信号ライン46とを
被冠し表面側グランドパターン48と接続された導電性
キャップ54とを備えている。
The package structure 40 includes an insulating substrate 44 on which a semiconductor chip 42 is mounted, and the insulating substrate 44.
Surface side signal lines 46 formed on the surface of the insulating substrate 44, a surface side ground pattern 48 formed on the surface of the insulating substrate 44 so as to surround the surface side signal lines 46, and an insulating substrate 44.
Back side signal line 50 (see FIG. 2) formed on the back side of the insulating substrate 44 and the back side ground pattern 52 (see FIG. 2) formed on the back side of the insulating substrate 44 and connected to the front side ground pattern 48. 2)), and a conductive cap 54 that covers the semiconductor chip 42 on the insulating substrate 44 and the front surface side signal line 46 and is connected to the front surface side ground pattern 48.

【0011】絶縁基板44は、信号ライン用の複数の第
1のスルーホール56(図2参照)とグランド用の複数
の第2のスルーホール58(図1参照)とを有する。ま
た、表面側信号ライン46は半導体チップ42の入力端
子又は出力端子と接続されており、この表面側信号ライ
ン46は、裏面側グランドパターン52との間でマイク
ロストリップラインを形成している。また、裏面側信号
ライン50は第1のスルーホール56内の導体を介して
表面側信号ライン46と接続されており、表面側グラン
ドパターン48との間でマイクロストリップラインを形
成している。このマイクロストリップラインは、図1及
び図2に示すように、本実施例では突出部60に形成さ
れているため、表面実装時の位置が容易にわかりしたが
って歩留まりを向上させることができる。また、裏面側
グランドパターン52は第2のスルーホール58内の導
体を介して表面側グランドパターン48と接続されてい
る。
The insulating substrate 44 has a plurality of first through holes 56 for signal lines (see FIG. 2) and a plurality of second through holes 58 for ground (see FIG. 1). Further, the front surface side signal line 46 is connected to the input terminal or the output terminal of the semiconductor chip 42, and the front surface side signal line 46 forms a microstrip line with the back surface side ground pattern 52. Further, the back surface side signal line 50 is connected to the front surface side signal line 46 via the conductor in the first through hole 56 and forms a microstrip line with the front surface side ground pattern 48. As shown in FIGS. 1 and 2, the microstrip line is formed on the protrusion 60 in the present embodiment, so that the position at the time of surface mounting can be easily known and the yield can be improved. The back side ground pattern 52 is connected to the front side ground pattern 48 via the conductor in the second through hole 58.

【0012】次に、本実施例のパッケージ構造体40の
製造方法について説明する。まず、アルミナ基板などの
絶縁基板44の外形とスルーホール56、58がCO2
ガスレーザにより加工される。次に、表面側信号ライン
46のメタライズがAuの厚膜導体で形成され、表面側
グランドパターン48、裏面側信号ライン50、裏面側
グランドパターン52、およびスルーホールがAg−P
dの厚膜導体で形成される。次に、モノリシックマイク
ロウェーブ集積回路などの半導体チップ42がAu−S
n等の共晶ハンダで絶縁基板44上にダイボンディング
され、25μmφのAuワイヤでボンディング配線され
る。次に、導電性キャップ54が表面側グランドパター
ン48上にパラレルシーム溶接法で溶接され、パッケー
ジ構造体が完成する。その後、絶縁基板44の裏面側
が、この絶縁基板44の裏面のパターンと合致したパタ
ーンが形成されたマザーボードに、Sn−Pb等の共晶
ハンダによりはんだ付けされる。
Next, a method of manufacturing the package structure 40 of this embodiment will be described. First, the outer shape of the insulating substrate 44 such as an alumina substrate and the through holes 56 and 58 are set to CO 2
It is processed by a gas laser. Next, the metallization of the front surface side signal line 46 is formed by a thick film conductor of Au, and the front surface side ground pattern 48, the back surface side signal line 50, the back surface side ground pattern 52, and the through hole are Ag-P.
It is formed of a thick film conductor of d. Next, the semiconductor chip 42 such as a monolithic microwave integrated circuit is replaced with Au-S.
It is die-bonded onto the insulating substrate 44 with eutectic solder such as n, and is bonded with an Au wire of 25 μmφ. Next, the conductive cap 54 is welded onto the front side ground pattern 48 by the parallel seam welding method to complete the package structure. After that, the back surface side of the insulating substrate 44 is soldered to a mother board on which a pattern matching the pattern on the back surface of the insulating substrate 44 is formed by eutectic solder such as Sn-Pb.

【0013】尚、本実施例のパッケージ構造体40の突
出部60の形状は、図3に示すような突出部62の形状
としてもよい。絶縁基板44の変形例を、図4に示す。
図4からわかるように2枚の絶縁基板64、66を重ね
て基板とすることもできる。この場合は、夫々の絶縁基
板64、66にスルーホールが形成されて表面と裏面と
の信号ラインが接続される。
The shape of the protruding portion 60 of the package structure 40 of this embodiment may be the shape of the protruding portion 62 as shown in FIG. A modified example of the insulating substrate 44 is shown in FIG.
As can be seen from FIG. 4, two insulating substrates 64 and 66 can be stacked to form a substrate. In this case, through holes are formed in the respective insulating substrates 64 and 66 to connect the signal lines on the front surface and the back surface.

【0014】次に、キャップの材料をセラミックとした
例を図5に示す。このセラミック製のキャップ70は、
その内壁72または外壁74がメタライズされており
(図5では外壁がメタライズされている)、このメタラ
イズされた面が絶縁基板44の表面のグランドパターン
と接続されることによって、電磁遮蔽効果が得られる。
キャップ70のメタライズは、メッキ、導電塗料の塗
布、厚膜ペーストの塗布などにより行われる。
FIG. 5 shows an example in which the cap material is ceramic. This ceramic cap 70
The inner wall 72 or the outer wall 74 is metallized (the outer wall is metallized in FIG. 5), and the metallized surface is connected to the ground pattern on the surface of the insulating substrate 44 to obtain an electromagnetic shielding effect. ..
The metallization of the cap 70 is performed by plating, applying a conductive paint, applying a thick film paste, or the like.

【0015】尚、上記実施例のパッケージ構造体では、
表面側信号ライン46は、裏面側グランドパターン52
との間でマイクロストリップラインが形成されている
が、表面側グランドパターンとの間でコプレーナ型スト
リップライン、表面側及び裏面側グランドパターンとの
間でグランデッドコプレーナ型ストリップラインを形成
してもよい。
In the package structure of the above embodiment,
The front surface side signal line 46 is connected to the rear surface side ground pattern 52.
Although a microstrip line is formed between the ground plane pattern and the front side ground pattern, a coplanar strip line may be formed between the front side ground pattern and the grounded coplanar strip line between the front side ground pattern and the back side ground pattern. ..

【0016】また、表面側信号ラインと裏面側信号ライ
ンとの間はスルーホール内の導体を介して接続されてい
るため、このスルーホールの寸法等を調整することによ
って特性インピーダンスを例えば50Ωに合わせること
ができる。また、表面側グランドパターンと裏面側グラ
ンドパターンとの間もスルーホール内の導体を介して接
続されているため、このスルーホールの数を増やすこと
によって表面側のグランドを強化することができる。
Further, since the front surface side signal line and the back surface side signal line are connected through the conductor in the through hole, the characteristic impedance is adjusted to, for example, 50Ω by adjusting the size of the through hole. be able to. Further, since the front surface side ground pattern and the back surface side ground pattern are also connected via the conductors in the through holes, the front surface side ground can be strengthened by increasing the number of the through holes.

【0017】[0017]

【発明の効果】以上説明したように、本発明のパッケー
ジ構造体は、表面側信号ラインと裏面側信号ラインに亘
ってマイクロストリップライン等の伝送線路が形成され
しかもスルーホールによりその特性インピーダンスを調
整することができ、したがって外部回路のインピーダン
スを所定のインピーダンスに調整することにより容易に
外部回路との間でインピーダンスが整合される。
As described above, in the package structure of the present invention, a transmission line such as a microstrip line is formed over the front surface side signal line and the back surface side signal line, and the characteristic impedance is adjusted by the through hole. Therefore, by adjusting the impedance of the external circuit to a predetermined impedance, the impedance is easily matched with the external circuit.

【0018】また、このパッケージ構造体を回路基板に
載置して裏面側信号ラインと回路基板上の配線パターン
をハンダ等で接続することができ容易に表面実装が可能
となる。
Further, by mounting this package structure on a circuit board and connecting the rear surface side signal line and the wiring pattern on the circuit board with solder or the like, surface mounting can be easily performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】パッケージ構造体を示す斜視図である。FIG. 1 is a perspective view showing a package structure.

【図2】図1のII−II断面図である。FIG. 2 is a sectional view taken along the line II-II in FIG.

【図3】突出部の変形例を示す斜視図である。FIG. 3 is a perspective view showing a modified example of a protrusion.

【図4】絶縁基板を2枚重ねにした場合を示す断面図で
ある。
FIG. 4 is a cross-sectional view showing a case where two insulating substrates are stacked.

【図5】セラミック製のキャップを使用した場合を示す
断面図である。
FIG. 5 is a cross-sectional view showing a case where a ceramic cap is used.

【図6】キャップで被冠される前の、従来のパッケージ
構造体を示した図である。
FIG. 6 shows a conventional packaging structure before it is capped.

【図7】図6に示す基板にキャップが被冠された場合を
示す断面図である。
7 is a cross-sectional view showing a case where a cap is capped on the substrate shown in FIG.

【図8】従来の他のパッケージ構造体を示す斜視図であ
る。
FIG. 8 is a perspective view showing another conventional package structure.

【符号の説明】[Explanation of symbols]

40 パッケージ構造体 42 半導体チップ 44 絶縁基板 46 表面側信号ライン 48 表面側グランドパターン 50 裏面側信号ライン 52 裏面側グランドパターン 54 導電性キャップ 56、58 スルーホール 40 Package Structure 42 Semiconductor Chip 44 Insulating Substrate 46 Front Side Signal Line 48 Front Side Ground Pattern 50 Back Side Signal Line 52 Back Side Ground Pattern 54 Conductive Cap 56, 58 Through Hole

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/50 M 9272−4M H01P 3/08 7352−4M H01L 23/14 C (72)発明者 谷所 博明 埼玉県秩父郡横瀬町大字横瀬2270番地 三 菱マテリアル株式会社セラミックス研究所 内 (72)発明者 古屋田 栄 埼玉県秩父郡横瀬町大字横瀬2270番地 三 菱マテリアル株式会社セラミックス研究所 内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical indication location H01L 23/50 M 9272-4M H01P 3/08 7352-4M H01L 23/14 C (72) Inventor Hiroaki Tanisho 2270 Yokoze, Yokose-cho, Chichibu-gun, Saitama Sanritsu Materials Co., Ltd., Ceramics Laboratory (72) Inventor Sakae Furuyada 2270 Yokose, Yokose-cho, Chichibu-gun, Saitama Sanritsu Material Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 半導体チップ、 表面に該半導体チップが載置された、信号ライン用の第
1のスルーホールとグランド用の第2のスルーホールと
を有する絶縁基板、 前記絶縁基板の裏面に形成された裏面側グランドパター
ン、 前記絶縁基板の表面の周縁部を含む領域に形成され前記
第2のスルーホール内の導体を介して前記裏面側グラン
ドパターンと接続された表面側グランドパターン、 前記絶縁基板の表面に形成され前記半導体チップの入力
端子又は出力端子と接続された、前記表面側グランドパ
ターン及び/又は前記裏面側グランドパターンとの間で
伝送線路を形成する表面側信号ライン、 前記絶縁基板の裏面に形成され前記第1のスルーホール
内の導体を介して前記表面側信号ラインと接続された、
前記表面側グランドパターンとの間でマイクロストリッ
プラインを形成する裏面側信号ライン、および前記絶縁
基板上の前記半導体チップと前記表面側信号ラインとを
被冠し前記表面側グランドパターンと接続された導電性
キャップを備えたことを特徴とするパッケージ構造体。
1. A semiconductor chip, an insulating substrate having a first through hole for a signal line and a second through hole for a ground, the semiconductor chip being mounted on the front surface, the insulating substrate being formed on a back surface of the insulating substrate. A rear surface side ground pattern, a front surface side ground pattern formed in a region including a peripheral portion of a surface of the insulating substrate and connected to the rear surface side ground pattern via a conductor in the second through hole, the insulating substrate A front surface side signal line which is formed on the front surface of the semiconductor chip and is connected to an input terminal or an output terminal of the semiconductor chip and which forms a transmission line between the front surface side ground pattern and / or the back surface side ground pattern; Connected to the front surface side signal line via a conductor in the first through hole formed on the back surface,
A backside signal line that forms a microstrip line between the frontside ground pattern and a conductive material that covers the semiconductor chip on the insulating substrate and the frontside signal line and is connected to the frontside ground pattern. A package structure having a sex cap.
JP3331042A 1991-12-16 1991-12-16 Package structure Withdrawn JPH05166965A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3331042A JPH05166965A (en) 1991-12-16 1991-12-16 Package structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3331042A JPH05166965A (en) 1991-12-16 1991-12-16 Package structure

Publications (1)

Publication Number Publication Date
JPH05166965A true JPH05166965A (en) 1993-07-02

Family

ID=18239190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3331042A Withdrawn JPH05166965A (en) 1991-12-16 1991-12-16 Package structure

Country Status (1)

Country Link
JP (1) JPH05166965A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6441471B1 (en) * 2000-12-27 2002-08-27 Kyocera Corporation Wiring substrate for high frequency applications
US7560811B2 (en) 2005-12-08 2009-07-14 Yamaha Corporation Semiconductor device
US7619489B2 (en) 1999-09-20 2009-11-17 Nec Corporation Semiconductor integrated circuit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7619489B2 (en) 1999-09-20 2009-11-17 Nec Corporation Semiconductor integrated circuit
US8178974B2 (en) 1999-09-20 2012-05-15 Nec Corporation Microstrip structure including a signal line with a plurality of slit holes
US6441471B1 (en) * 2000-12-27 2002-08-27 Kyocera Corporation Wiring substrate for high frequency applications
US7560811B2 (en) 2005-12-08 2009-07-14 Yamaha Corporation Semiconductor device

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Effective date: 19990311