JPH05163464A - Coating liquid for forming film, its production and substrate with film - Google Patents

Coating liquid for forming film, its production and substrate with film

Info

Publication number
JPH05163464A
JPH05163464A JP3351648A JP35164891A JPH05163464A JP H05163464 A JPH05163464 A JP H05163464A JP 3351648 A JP3351648 A JP 3351648A JP 35164891 A JP35164891 A JP 35164891A JP H05163464 A JPH05163464 A JP H05163464A
Authority
JP
Japan
Prior art keywords
coating
film
forming
coating liquid
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3351648A
Other languages
Japanese (ja)
Other versions
JP3139093B2 (en
Inventor
Masayuki Matsuda
田 政 幸 松
Michio Komatsu
松 通 郎 小
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JGC Catalysts and Chemicals Ltd
Original Assignee
Catalysts and Chemicals Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by Catalysts and Chemicals Industries Co Ltd filed Critical Catalysts and Chemicals Industries Co Ltd
Priority to JP03351648A priority Critical patent/JP3139093B2/en
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Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
    • C04B41/5027Oxide ceramics in general; Specific oxide ceramics not covered by C04B41/5029 - C04B41/5051
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844Uses not provided for elsewhere in C04B2111/00 for electronic applications

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Magnetic Record Carriers (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)

Abstract

PURPOSE:To obtain the subject coating liquid capable of forming a film, having uniform unevennesses and excellent in durability on a substrate by including inorganic colloidal particles and a specific film-forming component in an organic solvent and reducing the ionic concentration. CONSTITUTION:The objective coating liquid containing (A) colloidal particles of an inorganic compound (e.g. colloidal particles of silica), (B) a partial hydrolyzate of a compound selected from acetylacetonato chelates (preferably dibutoxy-bisacetylacetonatozirconium, etc.), alkoxysilanes (preferably tetramethoxysilane, etc.) and metallic alkoxides (preferably tetrabutoxyzirconium, etc.) in (C) an organic solvent. The ionic concentration in the coating liquid is <=1mmol/l. This coating liquid is prepared by subjecting any of a sol containing the component (A), a liquid containing the component (B) and a film-forming coating liquid prepared by adding the components (A) and (B) to the component (C) to treatment with a cation exchange resin and anion exchange resin.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の技術分野】本発明は、被膜形成用塗布液、その
製造方法およびこの塗布液から形成された被膜を基材上
に有する被膜付基材に関し、さらに詳しくは、均一な凹
凸を有すると同時に耐久性に優れている被膜を形成でき
るような被膜形成用塗布液、その製造方法およびこのよ
うな被膜が基材上に積層された磁気ディスク、光磁気デ
ィスク、反射防止板などの被膜付基材に関する。
TECHNICAL FIELD The present invention relates to a coating solution for forming a coating film, a method for producing the coating solution, and a coated substrate having a coating film formed from the coating solution on a substrate. More specifically, it has uniform unevenness. A coating solution for forming a coating capable of simultaneously forming a coating having excellent durability, a method for producing the coating, and a coating base for a magnetic disk, a magneto-optical disk, an antireflection plate, or the like in which such a coating is laminated on a substrate. Regarding materials

【0002】[0002]

【発明の技術的背景】従来より、ガラス、プラスチッ
ク、金属などの基板の表面に耐久性、耐擦傷性などを付
与すると同時にグレアを防止できるような凹凸付被膜形
成用コーティング組成物が開発されている。たとえば、
特開平2−3468号公報には、一般式RSi(O
1 3 (式中、Rは炭素数1〜6の炭化水素基であ
り、R1 は炭素数1〜6のアルキル基である。)で表わ
されるトリアルコキシシラン100重量部と一般式Si
(OR2 4 (式中、R2 は炭素数1〜6のアルキル基
である。)で表わされるテトラアルコキシシラン20〜
130重量部とからなる有機ケイ素化合物の部分縮合物
と、シリカ微粒子とを含むこのようなコーティング組成
物が記載されている。
TECHNICAL BACKGROUND OF THE INVENTION Conventionally, a coating composition for forming a concavo-convex film capable of imparting durability, scratch resistance and the like to a surface of a substrate made of glass, plastic, metal or the like and at the same time preventing glare has been developed. There is. For example,
Japanese Unexamined Patent Publication No. 2-3468 discloses a general formula RSi (O
R 1 ) 3 (wherein R is a hydrocarbon group having 1 to 6 carbon atoms, and R 1 is an alkyl group having 1 to 6 carbon atoms), and 100 parts by weight of a trialkoxysilane and the general formula Si
(OR 2 ) 4 (in the formula, R 2 is an alkyl group having 1 to 6 carbon atoms) tetraalkoxysilane 20 to
Such a coating composition is described which comprises a partial condensate of an organosilicon compound consisting of 130 parts by weight and silica particles.

【0003】また、磁気ディスクなどの磁気記録媒体を
製造する際にも、無機酸化物微粒子を含むコロイド溶液
とテトラヒドロキシシランとの混合溶液からなる被膜形
成用塗布液(特開昭61−229227号公報、特開昭
64−33724号公報、特開平2−137120号公
報等)が用いられている。このような被膜形成用塗布液
を用いて形成された磁気ディスク、光磁気ディスクなど
の被膜付磁気記録媒体は、表面に微細な凹凸を有し、表
面が平滑である磁気記録媒体に比較して記録装置または
再生装置内で磁気ヘッドとの間に生じる摩擦力の大きさ
を表わす静摩擦係数が低い。
Also, when manufacturing a magnetic recording medium such as a magnetic disk, a coating solution for forming a coating film, which is composed of a mixed solution of a colloidal solution containing fine particles of inorganic oxide and tetrahydroxysilane (JP-A-61-2229227). JP-A-64-33724, JP-A-2-137120, etc.) are used. A coated magnetic recording medium such as a magnetic disk or a magneto-optical disk formed using such a coating solution for forming a coating has fine irregularities on the surface and has a smooth surface as compared with a magnetic recording medium. The static friction coefficient, which represents the magnitude of the frictional force generated between the magnetic head and the recording device or the reproducing device, is low.

【0004】しかしながら、上記のような従来の被膜形
成用塗布液から得られた被膜付基材は、被膜中に含まれ
ている無機酸化物微粒子の分布が不均一であり、しかも
この無機酸化物微粒子同士が凝集していることがあり、
このため、この被膜付基材の表面に形成された凹凸が不
均一になってしまうという問題点がある。すなわち無機
酸化物微粒子によって形成される凸部の間隔および高さ
が不均一になってしまうという問題点がある。
However, the coated substrate obtained from the conventional coating solution for forming a coating as described above has an uneven distribution of the fine particles of inorganic oxide contained in the coating, and moreover, this inorganic oxide. Particles may aggregate with each other,
For this reason, there is a problem in that the unevenness formed on the surface of the coated substrate becomes uneven. That is, there is a problem that the intervals and heights of the convex portions formed by the inorganic oxide fine particles become uneven.

【0005】なお被膜付磁気記録媒体の表面に形成され
た凹凸が不均一であると、記録装置または再生装置内で
磁気ヘッドが磁気記録媒体表面上を摺動する際に生じる
静摩擦係数および磁気ディスクの表面粗さが増大する傾
向がある。特に最近では磁気記録媒体の記録密度が高密
度化され、これに伴って磁気ヘッドの浮上高さ、すなわ
ち記録再生中の磁気記録媒体と磁気ヘッドとの間隔は、
小さくなっており、最近では0.3μm以下に設定され
ている。このため、より一層均一な凹凸が表面に形成さ
れた被膜付磁気記録媒体が求められている。
If the irregularities formed on the surface of the coated magnetic recording medium are not uniform, the coefficient of static friction and the magnetic disk generated when the magnetic head slides on the surface of the magnetic recording medium in the recording device or the reproducing device. The surface roughness tends to increase. Particularly, recently, the recording density of the magnetic recording medium has been increased, and along with this, the flying height of the magnetic head, that is, the distance between the magnetic recording medium and the magnetic head during recording / reproduction,
It has become smaller and has recently been set to 0.3 μm or less. For this reason, there is a demand for a coated magnetic recording medium having a more uniform unevenness on the surface.

【0006】このような情況下で、本発明者らは、均一
な凹凸を有すると同時に耐久性に優れている被膜を基板
上に形成できるような被膜形成用塗布液およびこのよう
な被膜付基板を用いて高密度記録が可能な磁気記録媒体
を提供するため、鋭意研究を行なったところ、従来、注
目されていなかった被膜形成用塗布液中に存在する微量
のイオン(陰イオンおよび陽イオン)が、均一な凹凸を
有する被膜の形成に重要な因子として作用していること
を見出し、本発明を完成するに至った。
Under such circumstances, the present inventors have found that a coating solution for forming a coating capable of forming a coating having uniform unevenness and excellent durability on a substrate, and such a coated substrate. In order to provide a magnetic recording medium capable of high-density recording by using, the present inventors have conducted extensive studies and found that trace amounts of ions (anions and cations) present in coating liquids for film formation, which have not been noticed in the past, Has been found to act as an important factor in forming a coating film having uniform unevenness, and has completed the present invention.

【0007】すなわち、本発明者が従来の被膜形成用塗
布液を分析したところ、通常、分散媒として有機溶媒を
用いた無機化合物コロイド溶液には、コロイドの安定化
のためにアルカリ金属が添加され、このためNa+ イオ
ンなどのイオンが約10〜30ミリモル/リットル程度
含まれている。またアセチルアセトナトキレート、アル
コキシシラン、金属アルコキシドなどの部分加水分解物
を製造する際に、酸またはアンモニア水が用いられるた
めに、得られた被膜形成成分を含む液中にも多量のイオ
ンが存在している。このため、このような無機化合物コ
ロイド溶液および被膜形成成分を含む液を原料として用
いて得られたほとんどの被膜形成塗布液のイオン濃度
は、1.0ミリモル/リットルを超えている。
That is, when the present inventor analyzed a conventional coating solution for forming a film, it is usually found that an alkali metal is added to a colloidal solution of an inorganic compound using an organic solvent as a dispersion medium in order to stabilize the colloid. Therefore, about 10 to 30 millimoles / liter of ions such as Na + ions are contained. In addition, since acids or aqueous ammonia are used in the production of partial hydrolysates such as acetylacetonato chelates, alkoxysilanes, and metal alkoxides, a large amount of ions are present in the liquid containing the film-forming components obtained. is doing. Therefore, the ion concentration of most of the film-forming coating liquids obtained by using as a raw material a liquid containing such an inorganic compound colloidal solution and a film-forming component exceeds 1.0 millimol / liter.

【0008】ところが被膜形成用塗布液を製造する際
に、有機溶媒中に、無機化合物コロイド粒子と、アセチ
ルアセトナトキレート、アルコキシシラン、金属アルコ
キシドなどから得られた部分加水分解物とを配合して調
製された被膜形成用塗布液中のイオン濃度を1.0ミリ
モル/リットル以下に減少させた場合、この塗布液から
形成された被膜中に含まれている無機酸化物微粒子の分
布は均一となり、しかもこの被膜の表面には、ほとんど
凝集粒子の痕跡が観察されず、その上このようにして得
られた被膜は、耐擦傷性に優れていることが見出され
た。
However, when the coating solution for forming a film is produced, the inorganic compound colloidal particles and a partial hydrolyzate obtained from acetylacetonato chelate, alkoxysilane, metal alkoxide, etc. are mixed in an organic solvent. When the ion concentration in the prepared coating liquid for forming a coating is reduced to 1.0 mmol / liter or less, the distribution of the inorganic oxide fine particles contained in the coating formed from this coating liquid becomes uniform, Moreover, almost no traces of agglomerated particles were observed on the surface of this coating, and it was further found that the coating thus obtained had excellent scratch resistance.

【0009】本発明は、上記知見に基づいて完成された
ものである。
The present invention has been completed based on the above findings.

【0010】[0010]

【発明の目的】本発明は、上記従来技術の問題点を解決
するためになされたものであって、均一な凹凸を有する
と同時に耐擦傷性などのような耐久性に優れている被膜
を、ガラス、プラスチック、金属、セラミックスなどの
基材上に形成できるような被膜形成用塗布液およびその
製造方法を提供することを目的としている。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art, and provides a coating film having uniform unevenness and at the same time excellent durability such as scratch resistance. It is an object of the present invention to provide a coating liquid for forming a film that can be formed on a substrate such as glass, plastic, metal, ceramics, etc., and a method for producing the same.

【0011】また、本発明は、このような被膜が基材上
に積層された被膜付基材、特に被膜付磁気記録媒体を提
供することをも目的としている。
Another object of the present invention is to provide a film-coated substrate having such a film laminated on a substrate, particularly a film-coated magnetic recording medium.

【0012】[0012]

【発明の概要】本発明に係る被膜形成用塗布液は、無機
化合物コロイド粒子(a)と、アセチルアセトナトキレ
ート、アルコキシシランおよび金属アルコキシドの部分
加水分解物から選ばれた少なくとも1種の被膜形成成分
(b)とが有機溶媒(c)中に含まれ、この被膜形成用
塗布液中のイオン濃度が1.0ミリモル/リットル以下
であることを特徴としている。
SUMMARY OF THE INVENTION A coating solution for forming a coating film according to the present invention comprises at least one coating film selected from inorganic compound colloidal particles (a) and a partial hydrolyzate of acetylacetonato chelate, alkoxysilane and metal alkoxide. The component (b) and the organic solvent (c) are contained, and the ion concentration in the coating liquid for forming a film is 1.0 mmol / liter or less.

【0013】上記被膜形成用塗布液は、被膜形成用塗布
液の製造過程で、被膜形成用塗布液の原料として用いら
れる無機化合物コロイド粒子(a)を含むゾルおよび被
膜形成成分(b)を含む液ならびにこれらの原料から得
られた被膜形成用塗布液のいずれかに、陽イオン交換樹
脂による処理と陰イオン交換樹脂による処理とを行なっ
て、被膜形成用塗布液中のイオン濃度を1.0ミリモル
/リットル以下とすることによって製造できる。
The coating solution for forming a coating film contains a sol containing inorganic compound colloidal particles (a) used as a raw material of the coating solution for forming a coating film and a coating forming component (b) in the process of producing the coating solution for forming a coating film. The cation exchange resin and the anion exchange resin are applied to either the solution or the coating solution for forming a film obtained from these raw materials to adjust the ion concentration in the coating solution for forming a film to 1.0. It can be produced by adjusting the amount to be less than mmol / liter.

【0014】また、本発明に係る被膜付基材は、上記の
ような被膜形成用塗布液から形成された被膜が基材上に
積層されていることを特徴としている。特にディスク基
板と、その上に形成された磁性層とを含み、前記ディス
ク基板と磁性層との間または前記磁性層上に、このよう
な被膜を有する磁気記録媒体は、高密度記録用磁気ディ
スクまたは高密度記録用光磁気ディスクとして好まし
い。
Further, the coated substrate according to the present invention is characterized in that the coating formed from the coating solution for forming a coating as described above is laminated on the substrate. In particular, a magnetic recording medium including a disk substrate and a magnetic layer formed thereon and having such a coating between the disk substrate and the magnetic layer or on the magnetic layer is a magnetic disk for high density recording. Alternatively, it is preferable as a magneto-optical disk for high density recording.

【0015】[0015]

【発明の具体的説明】以下、本発明に係る被膜形成用塗
布液、その製造方法および被膜付基板について具体的に
説明する。
DETAILED DESCRIPTION OF THE INVENTION The coating liquid for forming a coating film, the method for producing the same and the substrate with a coating film according to the present invention will be specifically described below.

【0016】被膜形成用塗布液 まず、本発明に係る被膜形成用塗布液について具体的に
説明する。本発明に係る被膜形成用塗布液は、無機化合
物コロイド粒子(a)と、アセチルアセトナトキレー
ト、アルコキシシランおよび金属アルコキシドの部分加
水分解物から選ばれた少なくとも1種の被膜形成成分
(b)とが有機溶媒(c)中に含有されている。
Coating Liquid for Forming a Coating First, the coating liquid for forming a coating according to the present invention will be specifically described. The coating liquid for forming a film according to the present invention comprises inorganic compound colloidal particles (a) and at least one film forming component (b) selected from acetylacetonato chelate, alkoxysilane and a partial hydrolyzate of a metal alkoxide. Are contained in the organic solvent (c).

【0017】本発明に係る被膜形成用塗布液中に用いら
れる無機化合物コロイド粒子(a)としては、具体的に
は、シリカ、チタニア、ジルコニア、アルミナ、酸化
鉄、酸化タングステンなどの無機化合物のコロイド粒
子、これら無機化合物の2種以上からなる複合化合物の
コロイド粒子およびこれらコロイド粒子の混合物が挙げ
られる。また、本発明に係る被膜形成用塗布液は、これ
ら以外の無機化合物コロイド粒子を含んでいてもよい。
Specific examples of the inorganic compound colloidal particles (a) used in the coating liquid for forming a film according to the present invention include colloids of inorganic compounds such as silica, titania, zirconia, alumina, iron oxide and tungsten oxide. Examples thereof include particles, colloidal particles of a composite compound composed of two or more kinds of these inorganic compounds, and a mixture of these colloidal particles. Further, the coating liquid for forming a coating film according to the present invention may contain colloidal particles of an inorganic compound other than these.

【0018】本発明で用いられる無機化合物コロイド粒
子は、平均粒子径が10〜300nm、好ましくは10
〜100nmであり、粒子径の変動係数が30%以下、
好ましくは20%以下、さらに好ましくは10%以下で
あることが望ましい。
The inorganic compound colloidal particles used in the present invention have an average particle size of 10 to 300 nm, preferably 10
˜100 nm, the coefficient of variation of particle size is 30% or less,
It is preferably 20% or less, more preferably 10% or less.

【0019】また本発明に係る被膜形成用塗布液中に
は、アセチルアセトナトキレート、アルコキシシランお
よび金属アルコキシドの部分加水分解物から選ばれた少
なくとも1種の被膜形成成分(b)が含まれている。
The coating solution for forming a film according to the present invention contains at least one film forming component (b) selected from acetylacetonato chelate, alkoxysilane and a partial hydrolyzate of a metal alkoxide. There is.

【0020】前記成分(b)として用いられるアセチル
アセトナトキレートの部分加水分解物は、アセチルアセ
トンを配位子とするキレート化合物で、下記化学式1で
表される化合物の縮合体である。
The partial hydrolyzate of the acetylacetonato chelate used as the component (b) is a chelate compound having acetylacetone as a ligand, and is a condensate of the compound represented by the following chemical formula 1.

【0021】[0021]

【化1】 [Chemical 1]

【0022】〔ただし、式中、a+bは2〜4であり、
aは0〜3であり、bは1〜4であり、Rは−Cn
2n+1(n=3または4)であり、Xは−CH3 、−OC
3 、−C2 5 または−OC2 5 である。M1 は周
期率表第IB族、第IIA、B族、第III A、B族、第IV
A、B族、第VA、B族、第VIA族、第VII A族、第VI
II族から選ばれる元素またはバナジル(VO)である。
この内、これらの元素などとa、bの好ましい組み合わ
せは、次表の通りである。〕
[Wherein a + b is 2 to 4,
a is 0 to 3, b is 1 to 4, R is -C n H
2n + 1 (n = 3 or 4) and X is —CH 3 , —OC.
H 3, a -C 2 H 5 or -OC 2 H 5. M 1 is the periodic table, group IB, group IIA, group B, group IIIA, group B, group IV
Group A, Group B, Group VA, Group B, Group VIA, Group VII Group A, Group VI
It is an element selected from Group II or vanadyl (VO).
Among these, preferable combinations of these elements and the like and a and b are as shown in the following table. ]

【0023】[0023]

【表1】 [Table 1]

【0024】このようなアセチルアセトナトキレートの
具体例としては、たとえばジブトキシ−ビスアセチルア
セトナトジルコニウム、トリブトキシ−モノアセチルア
セトナトジルコニウム、ビスアセチルアセトナト鉛、ト
リスアセチルアセトナト鉄、ジブトキシ−ビスアセチル
アセトナトハフニウム、モノアセチルアセトナト−トリ
ブトキシハフニウムなどが挙げられる。
Specific examples of such an acetylacetonato chelate include, for example, dibutoxy-bisacetylacetonatozirconium, tributoxy-monoacetylacetonatozirconium, lead bisacetylacetonato, iron trisacetylacetonato, and dibutoxy-bisacetylacetonate. Examples include natohafnium and monoacetylacetonato-tributoxyhafnium.

【0025】また前記成分(b)として用いられるアル
コキシシランの部分加水分解物は、加水分解性を示す任
意のアルコキシシランから得られるが、本発明では、一
般式 R1 n Si(OR2 4-n (式中、R1 、R2 は、同一であっても異なっていても
よく、アリール基、アクリル基、ビニル基、炭素数1〜
8のアルキル基および−C24OCm2m+1から選ばれ
る基であり、mは1〜4の整数であり、nは0〜3の整
数である)で表わされるアルコキシシランから得られた
部分加水分解物が好ましい。
The partial hydrolyzate of the alkoxysilane used as the component (b) can be obtained from any alkoxysilane exhibiting hydrolyzability. In the present invention, the general formula R 1 n Si (OR 2 ) 4 is used. -n (In the formula, R 1 and R 2 may be the same or different and may be an aryl group, an acryl group, a vinyl group, or a carbon number of 1 to 1.
8 is an alkyl group and a group selected from —C 2 H 4 OC m H 2m + 1 , where m is an integer of 1 to 4 and n is an integer of 0 to 3). The partially hydrolyzed products obtained are preferred.

【0026】上記一般式で表わされるアルコキシシラン
としては、具体的には、テトラメトキシシラン、テトラ
エトキシシラン、テトライソプロポキシシラン、テトラ
ブトキシシラン、テトラオクチルシラン、メチルトリメ
トキシシラン、メチルトリエトキシシラン、エチルトリ
エトキシシラン、メチルトリイソプロポキシシラン、ジ
メチルジメトキシシラン、メチルトリブトキシシラン、
オクチルトリエトキシシラン、フェニルトリメトキシシ
ラン、ビニルトリメトキシシランなどが挙げられる。
Specific examples of the alkoxysilane represented by the above general formula include tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, tetraoctylsilane, methyltrimethoxysilane and methyltriethoxysilane. Ethyltriethoxysilane, methyltriisopropoxysilane, dimethyldimethoxysilane, methyltributoxysilane,
Examples include octyltriethoxysilane, phenyltrimethoxysilane and vinyltrimethoxysilane.

【0027】さらに前記成分(b)として金属アルコキ
シドの部分加水分解物を用いることもできる。金属アル
コキシドの部分加水分解物は、M2(OR)n (式中、
2は金属原子であり、Rはアルキル基または−Cm2m
2であり、mは3〜10の整数であり、nはM2の原子
価と同じ整数である。)で表わされる化合物の縮合体で
あり、これらの縮合体から選ばれる1種または2種以上
を組み合わせて用いることができる。上記式中のM
2は、金属原子であれば特に限定されないることはない
が、好ましいM2は、Be、Al、Sc、Ti、V、C
r、Fe、Ni、Zn、Ga、Ge、As、Se、Y、
Zr、Nb、In、Sn、Sb、Te、Hf、Ta、
W、Pb、Bi、CeまたはCuである。
Further, a partial hydrolyzate of a metal alkoxide can be used as the component (b). The partial hydrolyzate of the metal alkoxide is M 2 (OR) n (wherein
M 2 is a metal atom, R is an alkyl group or —C m H 2m
O 2 ; m is an integer of 3 to 10; n is the same integer as the valence of M 2 . ) Is a condensate of the compound represented by the formula (1), and one kind or a combination of two or more kinds selected from these condensates can be used. M in the above formula
2 is not particularly limited as long as it is a metal atom, but preferable M 2 is Be, Al, Sc, Ti, V, C.
r, Fe, Ni, Zn, Ga, Ge, As, Se, Y,
Zr, Nb, In, Sn, Sb, Te, Hf, Ta,
W, Pb, Bi, Ce or Cu.

【0028】このような加水分解性を示す金属アルコキ
シドとしては、具体的には、テトラブトキシジルコニウ
ム、テトラオクチルオキシチタニウム、ジイソプロポキ
シ−ジオクチルオキシチタニウムなどが挙げられる。
Specific examples of such hydrolyzable metal alkoxides include tetrabutoxyzirconium, tetraoctyloxytitanium, and diisopropoxy-dioctyloxytitanium.

【0029】アセチルアセトナトキレート、アルコキシ
シランおよび金属アルコキシドの部分加水分解物は、公
知の方法、例えばメタノールまたはエタノールなどのア
ルコールに加水分解性のアセチルアセトナトキレート、
アルコキシシランおよび金属アルコキシドから選ばれた
1種または2種以上の化合物を混合し、この混合液に水
と酸またはアンモニア水を加える方法によって得られ
る。前記成分(b)として用いられる部分加水分解物の
分子量は、約500〜20000、好ましくは1000
〜7000(ポリスチレン換算分子量)であることが均
一な膜厚を有する薄膜を形成する上で望ましい。
Acetylacetonato chelates, partial hydrolysates of alkoxysilanes and metal alkoxides can be prepared by known methods, for example, acetylacetonato chelates which are hydrolyzable to alcohols such as methanol or ethanol.
It is obtained by mixing one or more compounds selected from alkoxysilane and metal alkoxide, and adding water and an acid or aqueous ammonia to this mixed solution. The molecular weight of the partial hydrolyzate used as the component (b) is about 500 to 20,000, preferably 1,000.
It is desirable that the molecular weight is 7,000 (molecular weight in terms of polystyrene) in order to form a thin film having a uniform film thickness.

【0030】本発明に係る被膜形成用塗布液に含まれて
いる無機化合物コロイド粒子(a)と被膜形成成分
(b)との配合比率は、それぞれの成分を酸化物で換算
した際の重量%、すなわち、次式 {成分(a)/〔成分(a)+成分(b)〕}×100 で表わされる値が0.0005〜55、好ましくは0.
01〜25の範囲にあることが望ましい。
The compounding ratio of the inorganic compound colloidal particles (a) and the film-forming component (b) contained in the coating solution for forming a film according to the present invention is such that the respective components are expressed in weight% in terms of oxide. That is, the value represented by the following formula {component (a) / [component (a) + component (b)]} × 100 is 0.0005 to 55, preferably 0.
It is preferably in the range of 01 to 25.

【0031】また、本発明に係る被膜形成用塗布液で
は、無機化合物コロイド粒子および被膜形成成分(b)
を良好に分散し得るような有機溶媒(c)が用いられ
る。このような有機溶媒(c)としては、具体的には、
メタノール、エタノール、プロパノール、ブタノールな
どのアルコール類、メチルセロソルブ、エチルセロソル
ブなどのエチレングリコールエーテル類、エチレングリ
コール、プロピレングリコールなどのグリコール類、酢
酸メチル、酢酸エチル、乳酸メチルなどのエステル類、
アセトン、メチルエチルケトンなどのケトン類、ブチル
エーテル、テトラヒドロフランなどエーテル類等が挙げ
られる。
Further, in the coating liquid for forming a film according to the present invention, the inorganic compound colloidal particles and the film forming component (b) are used.
An organic solvent (c) that can disperse satisfactorily is used. As such an organic solvent (c), specifically,
Alcohols such as methanol, ethanol, propanol and butanol, ethylene glycol ethers such as methyl cellosolve and ethyl cellosolve, glycols such as ethylene glycol and propylene glycol, esters such as methyl acetate, ethyl acetate and methyl lactate,
Examples thereof include ketones such as acetone and methyl ethyl ketone, and ethers such as butyl ether and tetrahydrofuran.

【0032】本発明に係る被膜形成用塗布液は、上述し
たように有機溶媒中(c)に無機化合物コロイド粒子
(a)および被膜形成成分(b)を含んでなり、その固
形分濃度は、0.1〜30重量%、好ましくは0.5〜
10重量%の範囲にあることが望ましい。
As described above, the coating liquid for forming a film according to the present invention comprises the inorganic compound colloidal particles (a) and the film forming component (b) in the organic solvent (c), and the solid content concentration is 0.1 to 30% by weight, preferably 0.5 to
It is preferably in the range of 10% by weight.

【0033】また、本発明に係る被膜形成用塗布液のイ
オン濃度は、前記固形分濃度に関係なく、1.0ミリモ
ル/リットル以下、好ましくは0.6ミリモル/リット
ル以下、さらに好ましくは0.1ミリモル/リットル以
下である。
The ion concentration of the coating solution for forming a film according to the present invention is 1.0 mmol / liter or less, preferably 0.6 mmol / liter or less, and more preferably 0. It is 1 mmol / liter or less.

【0034】このイオン濃度は、陽イオンおよび陰イオ
ンの合計イオン濃度を意味し、本発明では陽イオン濃度
および陰イオン濃度は、次のようにして測定される。被
膜形成用塗布液10mlを90mlの精製蒸留水と混合し、
室温で1時間攪拌した後、この混合液を濾過し、さらに
濾過後の濾材に100mlの精製蒸留水を通して濾液を回
収する。
This ion concentration means the total ion concentration of cations and anions. In the present invention, the cation concentration and anion concentration are measured as follows. Mix 10 ml of the coating solution for film formation with 90 ml of purified distilled water,
After stirring at room temperature for 1 hour, this mixed solution is filtered, and 100 ml of purified distilled water is further passed through the filter material after filtration to collect the filtrate.

【0035】この回収濾液に含まれている金属イオン濃
度を原子吸光法で測定し、アンモニウムイオン濃度およ
び陰イオン濃度をイオンクロマトグラフィー法で測定す
る。このような方法で測定される被膜形成用塗布液中の
イオン濃度が1.0ミリモル/リットルを超えると、こ
のような被膜形成用塗布液を基板上に塗布して得られた
被膜には凝集粒子の痕跡および瘡蓋状の隆起が観察さ
れ、また被膜表面には均一な凹凸が形成されていない。
被膜形成過程でこのような凝集粒子の痕跡が生じる原因
は、塗布液中に存在するイオンにより無機化合物コロイ
ド粒子の表面電位が小さくなり、このため反発力が小さ
くなり、このため塗布液中で無機化合物コロイド粒子同
士の凝集が起こりやすくなるためと推定される。また被
膜形成過程でこのような瘡蓋状の隆起が生じる原因は、
乾燥過程で溶媒が除去されるに従って、上記のようなコ
ロイド粒子同士の凝集に加えて被膜形成成分による膜厚
の不均一化が起こるためと推定される。これに対し、被
膜形成用塗布液中のイオン濃度が1.0ミリモル/リッ
トル以下の場合には、このような被膜形成用塗布液を基
板上に塗布して得られた被膜には凝集粒子の痕跡は観察
されず、また被膜の膜厚は均一になり、被膜表面に均一
な凹凸が形成されている。
The metal ion concentration contained in this recovered filtrate is measured by the atomic absorption method, and the ammonium ion concentration and the anion concentration are measured by the ion chromatography method. When the ion concentration in the coating solution for forming a film measured by such a method exceeds 1.0 mmol / liter, the coating obtained by applying the coating solution for forming a film on the substrate is aggregated. Particle traces and scab-like ridges were observed, and no uniform irregularities were formed on the coating surface.
The cause of such traces of agglomerated particles during the film formation process is that the ions present in the coating solution reduce the surface potential of the inorganic compound colloidal particles, which reduces the repulsion force, and thus the inorganic particles in the coating solution. It is presumed that this is because the compound colloidal particles are likely to aggregate with each other. In addition, the cause of such scab-like ridges during the film formation process is
It is presumed that, as the solvent is removed during the drying process, in addition to the agglomeration of colloidal particles as described above, the film-forming component causes non-uniformity of the film thickness. On the other hand, when the ion concentration in the coating liquid for forming a coating is 1.0 mmol / liter or less, the coating obtained by coating the coating liquid for forming a coating on the substrate as described above contains agglomerated particles. No trace is observed, the film thickness of the film is uniform, and uniform unevenness is formed on the film surface.

【0036】被膜形成用塗布液の製造方法 以下に本発明に係る被膜形成用塗布液の製造方法につい
て具体的に説明する。本発明に係る被膜形成用塗布液
は、被膜形成用塗布液の製造過程で、被膜形成用塗布液
の原料として用いられる無機化合物コロイド粒子(a)
を含むゾルおよび被膜形成成分(b)を含む液ならびに
これらの原料から得られた被膜形成用塗布液のいずれか
に、陽イオン交換樹脂による処理と陰イオン交換樹脂に
よる処理とを行なって、被膜形成用塗布液中のイオン濃
度を1.0ミリモル/リットル以下とすることによって
製造することができる。
Method for Producing Coating Liquid for Forming Coating Hereinafter, the method for producing the coating liquid for forming a film according to the present invention will be specifically described. The coating liquid for forming a coating film according to the present invention is an inorganic compound colloidal particle (a) used as a raw material for the coating liquid for forming a coating film in the process of producing the coating liquid for forming a coating film.
A sol containing sol and a liquid containing the film-forming component (b) and a film-forming coating liquid obtained from these raw materials are treated with a cation exchange resin and an anion exchange resin to form a film. It can be produced by adjusting the ion concentration in the forming coating liquid to 1.0 mmol / liter or less.

【0037】上記本発明に係る被膜形成用塗布液の製造
方法を具体的に示すと以下の通りである。本発明に係る
被膜形成用塗布液は、例えば、以下の方法で製造され
る。
The method for producing the coating solution for forming a coating film according to the present invention will be specifically described as follows. The coating liquid for forming a coating film according to the present invention is produced, for example, by the following method.

【0038】先ずアルコール系の有機溶媒を分散媒とす
る無機化合物コロイド粒子の分散液を陽イオン交換樹脂
および陰イオン交換樹脂で交互に処理し、該分散液の分
散媒中に存在する陽イオンおよび陰イオンを除去し、必
要に応じて、イオン濃度が1.0ミリモル/リットル以
下であるアルコール系以外の有機溶媒と混合または置換
して所望の有機溶媒を分散媒とする無機化合物コロイド
粒子の分散液を得る。
First, a dispersion liquid of inorganic compound colloidal particles having an alcoholic organic solvent as a dispersion medium is alternately treated with a cation exchange resin and an anion exchange resin, and the cations and the cations existing in the dispersion medium of the dispersion liquid are treated. Dispersion of inorganic compound colloidal particles using a desired organic solvent as a dispersion medium by removing anions and, if necessary, mixing or substituting with an organic solvent other than an alcoholic solvent having an ion concentration of 1.0 mmol / liter or less. Get the liquid.

【0039】次にアセチルアセトナトキレート、アルコ
キシシランおよび金属アルコキシドから選ばれる1種ま
たは2種以上の加水分解性化合物を有機溶媒に溶解し、
水と酸とを加えて反応させるか、あるいはアンモニア水
を加えて反応させ、所望の分子量を有する部分加水分解
物が得られたところで、この部分加水分解物を含む液を
陽イオン交換樹脂および陰イオン交換樹脂で処理する。
Next, one or more hydrolyzable compounds selected from acetylacetonato chelate, alkoxysilane and metal alkoxide are dissolved in an organic solvent,
When water and an acid are added to react with each other or ammonia water is added to react with each other to obtain a partial hydrolyzate having a desired molecular weight, a liquid containing the partial hydrolyzate is treated with a cation exchange resin and an anion. Treat with ion exchange resin.

【0040】上記のような工程を経て得られた無機化合
物コロイド粒子の分散液と部分加水分解物を含む液とを
混合する。また、本発明に係る被膜形成用塗布液は、以
下の方法でも製造できる。
The dispersion liquid of the inorganic compound colloidal particles obtained through the above steps is mixed with a liquid containing a partial hydrolyzate. The coating liquid for forming a coating film according to the present invention can also be produced by the following method.

【0041】有機溶媒を分散媒とする無機化合物コロイ
ド粒子の分散液と上記のようにして得られた部分加水分
解物を含む未処理の液とを混合するか、あるいは無機化
合物コロイド粒子の分散液と前記加水分解性化合物とを
混合した後にこの加水分解性化合物を部分加水分解し、
得られた混合液を陽イオン交換樹脂および陰イオン交換
樹脂で処理する。この混合液の処理は、陽イオン交換樹
脂と陰イオン交換樹脂とを交互に用いてもよく、また陽
イオン交換樹脂と陰イオン交換樹脂との混合樹脂を用い
てもよい。
A dispersion liquid of inorganic compound colloidal particles using an organic solvent as a dispersion medium is mixed with an untreated liquid containing the partial hydrolyzate obtained as described above, or a dispersion liquid of inorganic compound colloidal particles. And partially hydrolyzing the hydrolyzable compound after mixing with the hydrolyzable compound,
The resulting mixture is treated with a cation exchange resin and an anion exchange resin. In the treatment of this mixed solution, a cation exchange resin and an anion exchange resin may be used alternately, or a mixed resin of a cation exchange resin and an anion exchange resin may be used.

【0042】被膜付基材 以下に本発明に係る被膜付基材について具体的に説明す
る。本発明に係る被膜付基材は、上記のような被膜形成
用塗布液から形成された被膜が基材上に積層されてい
る。
Coated Substrate The coated substrate according to the present invention will be specifically described below. In the coated substrate according to the present invention, a coating formed from the coating liquid for coating as described above is laminated on the substrate.

【0043】このような被膜付基材の基材として、被膜
付基材の用途などに応じて、適宜、ガラス、プラスチッ
ク、金属、セラミックなどからなる平板、立体物、フィ
ルムなどを用いることができる。
As the substrate of such a coated substrate, a flat plate, a three-dimensional object, a film or the like made of glass, plastic, metal, ceramic or the like can be appropriately used depending on the use of the coated substrate. ..

【0044】特にディスク基板と、その上に形成された
磁性層とを含み、ディスク基板と磁性層との間および/
または磁性層上に、このような被膜を有する磁気記録媒
体は、高密度記録用磁気ディスクまたは高密度記録用光
磁気ディスクとして用いられる。
In particular, it includes a disk substrate and a magnetic layer formed on the disk substrate, and between the disk substrate and the magnetic layer and / or
Alternatively, a magnetic recording medium having such a coating on the magnetic layer is used as a high density recording magnetic disk or a high density recording magneto-optical disk.

【0045】本発明に係る被膜付基材は、基材上に、直
接または磁性層などを形成した後、基材の形状などに応
じて、上記本発明に係る被膜形成用塗布液をディッピン
グ法、スピナー法、スプレー法、ロールコーター法、フ
レキソ印刷などの方法で塗布し、次いで常温〜90℃で
乾燥し、さらに200℃以上、好ましくは300℃以上
に加熱して硬化するなどの方法で被膜を形成して得られ
る。さらに必要に応じて、上記塗布工程または乾燥工程
の後に、あるいは乾燥工程中に、未硬化段階の被膜に可
視光線よりも波長の短い電磁波を照射するかあるいは未
硬化段階の被膜を硬化反応を促進するガス雰囲気に晒す
ことにより、得られた被膜の硬化が促進され、被膜硬度
が高められる。このガス処理は、加熱硬化後に行なって
も同様の効果が得られる。
The coated substrate according to the present invention is formed by dipping the coating liquid according to the present invention according to the shape of the substrate directly or after forming a magnetic layer or the like on the substrate. Coating by a method such as a spinner method, a spray method, a roll coater method, or flexographic printing, followed by drying at room temperature to 90 ° C. and further curing by heating at 200 ° C. or higher, preferably 300 ° C. or higher. Is obtained. Further, if necessary, after the coating step or the drying step, or during the drying step, the coating in the uncured stage is irradiated with an electromagnetic wave having a wavelength shorter than visible light, or the coating in the uncured stage is accelerated in curing reaction. By exposing to a gas atmosphere for curing, hardening of the obtained coating film is promoted and the coating film hardness is increased. The same effect can be obtained by performing this gas treatment after heat curing.

【0046】このような加熱前の未硬化段階の被膜に照
射する電磁波としては、具体的には紫外線、電子線、X
線、γ線などが例示されるが、紫外線が好ましい。たと
えば、発光強度が約250nmと360nmとにおいて
極大となり、光強度が10mW/cm2以上である高圧
水銀ランプを紫外線源として使用し、100mJ/cm
2以上、好ましくは1000mJ/cm2以上のエネルギ
ー量の紫外線を未硬化段階の被膜に照射すると、未硬化
段階の被膜の硬化反応が促進される。
The electromagnetic waves with which the coating film in the uncured stage before heating is irradiated are specifically ultraviolet rays, electron beams, X rays.
Rays and γ rays are exemplified, but ultraviolet rays are preferable. For example, a high pressure mercury lamp having a maximum emission intensity of about 250 nm and 360 nm and a light intensity of 10 mW / cm 2 or more is used as an ultraviolet ray source, and 100 mJ / cm 2
2 or more, preferably by irradiation with ultraviolet rays of 1000 mJ / cm 2 or more energy in the coating of the uncured stage, the curing reaction of the uncured stage coating is promoted.

【0047】また、加熱前の未硬化段階の被膜の硬化反
応を促進するガスとしては、たとえばアンモニア、オゾ
ンなどが例示される。またこのようなガス雰囲気による
被膜の硬化促進は、未硬化段階の被膜を、ガス濃度が1
00〜100,000ppm、好ましくは1000〜1
0,000ppmであるような上記活性ガス雰囲気下
で、1〜60分処理することによって達成される。
Examples of the gas that accelerates the curing reaction of the coating film in the uncured stage before heating include ammonia and ozone. Further, the acceleration of the curing of the coating film in such a gas atmosphere is performed when the coating film in the uncured stage has a gas concentration of 1
00-100,000 ppm, preferably 1000-1
It can be achieved by treating for 1 to 60 minutes under the above-mentioned active gas atmosphere such that the concentration is 10,000 ppm.

【0048】本発明に係る被膜付基材は、さらに必要に
応じて、このようにして形成された被膜上に別の被膜が
形成される。例えばディスク基板上に、上記本発明に係
る被膜形成用塗布液を塗布・乾燥して被膜を形成し、得
られた被膜上に磁性層を形成することによっても磁気デ
ィスク、光磁気ディスクなどの磁気記録媒体が製造され
る。
In the coated substrate according to the present invention, another coating is further formed on the coating thus formed, if necessary. For example, a coating liquid for forming a coating film according to the present invention may be applied to a disk substrate and dried to form a coating film, and a magnetic layer may be formed on the obtained coating film. A recording medium is manufactured.

【0049】[0049]

【発明の効果】本発明に係る被膜形成用塗布液によれ
ば、均一な凹凸を有し、表面に凝集粒子の痕跡がほとん
ど観察されず、耐擦傷性などの耐久性に優れ、しかも光
反射防止性能に優れている被膜を基材上に形成すること
ができる。
EFFECT OF THE INVENTION According to the coating solution for forming a coating film of the present invention, it has uniform unevenness, almost no traces of aggregated particles are observed on the surface, it has excellent durability such as scratch resistance, and light reflection. A coating film having excellent prevention performance can be formed on a substrate.

【0050】また、本発明に係る被膜形成用塗布液の製
造方法によれば、このような優れた性質を有する被膜を
形成することができる被膜形成用塗布液を簡単かつ確実
に製造できる。
Further, according to the method for producing the coating liquid for forming a coating film of the present invention, a coating liquid for forming a coating film capable of forming a coating film having such excellent properties can be easily and reliably produced.

【0051】本発明に係る被膜付基材は、基材上に上記
のような優れた性質を有する被膜が形成されており、磁
気ディスク、光磁気ディスクなどの磁気記録媒体、表示
装置の表示パネル、カメラのレンズなどとして好適であ
る。このような被膜が表面に設けられた磁気ディスク、
光磁気ディスクなどの磁気記録媒体では、この被膜上に
均一な凹凸が形成されているため、記録装置または再生
装置内で磁気記録媒体上を磁気ヘッドが摺動する際の静
摩擦係数が小さく、また磁気ヘッドが損傷することもな
く、浮上高さを小さい値に維持することができる。
The film-coated substrate according to the present invention has a film having the above-mentioned excellent properties formed on the substrate, and is used for magnetic recording media such as magnetic disks and magneto-optical disks, and display panels for display devices. It is suitable as a camera lens. A magnetic disk provided with such a coating on its surface,
In a magnetic recording medium such as a magneto-optical disk, since uniform unevenness is formed on this coating, the coefficient of static friction when the magnetic head slides on the magnetic recording medium in the recording device or the reproducing device is small, and The flying height can be maintained at a small value without damaging the magnetic head.

【0052】[0052]

【実施例】以下、本発明を実施例により説明するが、本
発明はこれら実施例に限定されるものではない。
EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to these examples.

【0053】[0053]

【実施例1】イオン濃度が20ミリモル/リットルの市
販のオルガノシリカゾル[触媒化成工業(株)製、商品
名「オスカル」;平均粒径45nm、粒径の変動係数
9.0%、濃度10重量%、溶媒イソプロパノール]
を、陽イオン交換樹脂[三菱化成工業(株)製、商品名
「ダイヤイオンSK−1B」]と陰イオン交換樹脂[三
菱化成工業(株)製、商品名「ダイヤイオンSA−2
0」]中にそれぞれ10回通し、コロイド溶液中のイオ
ン除去を行なった。次いでコロイド溶液の溶媒をヘキシ
レングリコールに加熱減圧蒸留法で溶媒置換して、濃度
5重量%のシリカコロイド分散液を得た。
Example 1 Commercially available organosilica sol having an ion concentration of 20 mmol / liter [manufactured by Catalysts & Chemicals Industry Co., Ltd., trade name "Oscar"; average particle size 45 nm, particle size variation coefficient 9.0%, concentration 10 wt. %, Solvent isopropanol]
Cation exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion SK-1B"] and anion exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion SA-2"
0 "] for 10 times to remove ions in the colloidal solution. Then, the solvent of the colloidal solution was replaced with hexylene glycol by a heating vacuum distillation method to obtain a silica colloidal dispersion having a concentration of 5% by weight.

【0054】一方、テトラエトキシシラン[多摩化学工
業(株)製、商品名「エチルシリケート40」;SiO
2 換算で40重量%]198g、濃硝酸0.8g、ヘキ
シレングリコール2020gおよびイオン交換水63.
7gを混合した後、これにテトラオクチルオキシチタニ
ウムのイソプロパノール溶液(TiO2 換算で10重量
%)990gおよびトリブトキシ−モノアセチルアセナ
トジルコニウムのブタノール溶液(ZrO2 換算で10
重量%)198gを混合し、室温で48時間攪拌して、
部分加水分解物(ポリスチレン換算で分子量4500)
を得た。
On the other hand, tetraethoxysilane [manufactured by Tama Chemical Industry Co., Ltd., trade name "ethyl silicate 40"; SiO
40% by weight in terms of 2 ] 198 g, concentrated nitric acid 0.8 g, hexylene glycol 2020 g, and ion-exchanged water 63.
After mixing 7 g, 990 g of an isopropanol solution of tetraoctyloxytitanium (10% by weight in terms of TiO 2 ) and a butanol solution of tributoxy-monoacetylacenatozirconium (10% in terms of ZrO 2).
Wt%) 198 g, and stirred at room temperature for 48 hours,
Partial hydrolyzate (molecular weight 4500 in terms of polystyrene)
Got

【0055】この部分加水分解物と上記シリカコロイド
分散液80.8gとを混合し、この混合物に、イソプロ
パノール2380g、ブタノール2380g、ヘキシレ
ングリコール2380gをさらに混合して、固形分濃度
が1.9重量%、全固形分中に占めるシリカコロイド粒
子の割合が2.0重量%である被膜形成用塗布液を得
た。
This partial hydrolyzate was mixed with 80.8 g of the above silica colloid dispersion, and to this mixture were further mixed 2380 g of isopropanol, 2380 g of butanol and 2380 g of hexylene glycol to give a solid content of 1.9 wt. %, And the ratio of silica colloid particles in the total solid content was 2.0% by weight to obtain a coating liquid for forming a film.

【0056】この被膜形成用塗布液中に含まれている全
イオン濃度を前述の方法で測定した結果、0.9ミリモ
ル/リットルであった。次いで、この被膜形成用塗布液
を外径95mm、内径25mm、厚さ1.20mm、表面平均
粗さ50オングストロームのソーダライムガラス製ディ
スク基板上にスピンコーターで塗布し、80℃で乾燥し
た後、400mJの紫外線を照射し、さらに300℃の
温度で1時間焼成することにより、被膜平坦部の膜厚が
270オングストロームである被膜付基材を得た。
The total ion concentration contained in this coating solution for forming a film was measured by the above-mentioned method and was found to be 0.9 mmol / liter. Then, this coating solution for forming a coating film was applied on a soda lime glass disk substrate having an outer diameter of 95 mm, an inner diameter of 25 mm, a thickness of 1.20 mm and a surface average roughness of 50 Å by a spin coater and dried at 80 ° C. By irradiating with ultraviolet rays of 400 mJ and further baking at a temperature of 300 ° C. for 1 hour, a coated substrate having a film flat portion with a film thickness of 270 Å was obtained.

【0057】この被膜付基材の被膜特性を次のようにし
て測定評価したところ、表2に示す結果が得られた。A.粒子の凝集状態; 被膜表面の電子顕微鏡写真を撮影
し、得られた写真から、被膜表面上に観察された粒子の
凝集状態を次の4段階に分けて表示した。
The coating characteristics of this coated substrate were measured and evaluated as follows, and the results shown in Table 2 were obtained. A. Aggregation state of particles: An electron micrograph of the surface of the coating film was taken, and from the obtained photograph, the aggregation state of particles observed on the surface of the coating film was divided into the following four stages and displayed.

【0058】◎…凝集粒子の痕跡がほとんど観察され
ず、粒子の分布が均一である。 〇…観察された凝集粒子の痕跡が少なく、粒子の分布が
均一である。 △…凝集粒子の痕跡が多少観察されるが、3個以上の凝
集粒子の痕跡は少なく、粒子の分布が均一である。
A: Almost no trace of aggregated particles is observed, and the distribution of particles is uniform. ◯: There are few traces of aggregated particles observed, and the distribution of particles is uniform. Δ: Some traces of aggregated particles are observed, but traces of three or more aggregated particles are few, and the distribution of particles is uniform.

【0059】×…凝集粒子の痕跡が多く観察され、粒子
の分布が不均一である。B.平均凸部間隔; 電子顕微鏡写真で隣接する凸部間の
距離をノギスで測定し、その平均値(d)および標準偏
差(σ)を求めた。なお測定数は100個である。C.被膜の硬度; JIS D 0212−88により鉛
筆硬度で評価した。D.被膜の耐擦傷性; 事務用消しゴム(LION製 N
o.50−50)を被膜上に置き、2kgの荷重をかけて
往復回数で300回摺動させた後、被膜の剥離状態を目
視と光学顕微鏡で観察した。E.静摩擦係数; JIS K 7125に従って測定し
た。
X: Many traces of agglomerated particles are observed, and the distribution of particles is non-uniform. B. Average convex portion interval: The distance between adjacent convex portions in an electron micrograph was measured with a caliper, and the average value (d) and standard deviation (σ) were obtained. The number of measurements is 100. C. Hardness of coating: Pencil hardness was evaluated according to JIS D 0212-88. D. Scratch resistance of coating: Office eraser (LION N
o. 50-50) was placed on the coating and was slid 300 times with a load of 2 kg. The peeled state of the coating was observed visually and with an optical microscope. E. Static friction coefficient: Measured according to JIS K 7125.

【0060】次いで実施例1の被膜付基材に直流マグネ
トロンスパッタで厚さ1500オングストロームのCr
からなる下地膜と、厚さ700オングストロームのCo
Niからなる磁性膜と、厚さ300オングストロームの
カーボンからなる保護膜を積層した。さらにパーフロロ
ポリエーテルからなる潤滑剤を保護膜上にスピンコータ
ーで厚さ30オングストローム塗布し、実施例1の磁気
ディスクを得た。
Then, the coated substrate of Example 1 was subjected to DC magnetron sputtering to form Cr having a thickness of 1500 angstroms.
Base film made of Co and 700 Å thick Co
A magnetic film made of Ni and a protective film made of carbon having a thickness of 300 Å were laminated. Further, a lubricant made of perfluoropolyether was applied on the protective film with a spin coater to a thickness of 30 Å to obtain a magnetic disk of Example 1.

【0061】この磁気ディスクの表面粗さ[表面の平均
凹凸差;トンネル顕微鏡で測定]と、初期の静摩擦係数
を求めて特性を評価した。結果を表2に併記する。
The characteristics of the magnetic disk were evaluated by obtaining the surface roughness [average surface unevenness difference; measured by a tunnel microscope] and the initial coefficient of static friction. The results are also shown in Table 2.

【0062】[0062]

【実施例2】実施例1と同様にして、市販のオルガノシ
リカゾル[触媒化成工業(株)製、商品名「オスカ
ル」;平均粒径45nm、粒径の変動係数9.0%、濃
度10重量%、溶媒イソプロパノール]を、陽イオン交
換樹脂[三菱化成工業(株)製、商品名「ダイヤイオン
SK−1B」]と陰イオン交換樹脂[三菱化成工業
(株)製、商品名「ダイヤイオンSA−20」]中にそ
れぞれ10回通し、コロイド溶液中のイオン除去を行な
った後、コロイド溶液の溶媒をヘキシレングリコールに
加熱減圧蒸留法で溶媒置換して、濃度5重量%のシリカ
コロイド分散液を得た。
Example 2 In the same manner as in Example 1, a commercially available organosilica sol [manufactured by Catalysts & Chemicals Industry Co., Ltd., trade name "Oscar"; average particle size 45 nm, particle size variation coefficient 9.0%, concentration 10 wt. %, Solvent isopropanol], cation exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion SK-1B"] and anion exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion SA" -20 "] to remove the ions in the colloidal solution 10 times each, and then replace the solvent of the colloidal solution with hexylene glycol by the heating vacuum distillation method to obtain a silica colloidal dispersion having a concentration of 5% by weight. Got

【0063】一方、テトラエトキシシラン[多摩化学工
業(株)製、商品名「エチルシリケート40」;SiO
2 換算で40重量%]198g、濃硝酸0.8g、ヘキ
シレングリコール2020gおよびイオン交換水63.
7gを混合した後、これにテトラオクチルオキシチタニ
ウムのイソプロパノール溶液(TiO2 換算で10重量
%)990gおよびトリブトキシ−モノアセチルアセナ
トジルコニウムのブタノール溶液(ZrO2 換算で10
重量%)198gを混合し、室温で48時間攪拌して、
部分加水分解物(ポリスチレン換算で分子量4500)
を得た。
On the other hand, tetraethoxysilane [manufactured by Tama Chemical Industry Co., Ltd., trade name "ethyl silicate 40"; SiO
40% by weight in terms of 2 ] 198 g, concentrated nitric acid 0.8 g, hexylene glycol 2020 g, and ion-exchanged water 63.
After mixing 7 g, 990 g of an isopropanol solution of tetraoctyloxytitanium (10% by weight in terms of TiO 2 ) and a butanol solution of tributoxy-monoacetylacenatozirconium (10% in terms of ZrO 2).
Wt%) 198 g, and stirred at room temperature for 48 hours,
Partial hydrolyzate (molecular weight 4500 in terms of polystyrene)
Got

【0064】この部分加水分解物を直ちに陽イオン交換
樹脂[三菱化成工業(株)製、商品名「ダイヤイオンS
K−1B」]と陰イオン交換樹脂[三菱化成工業(株)
製、商品名「ダイヤイオンSA−20」]中にそれぞれ
2回通し、イオン除去を行なった。
This partial hydrolyzate was immediately converted into a cation exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion S"].
K-1B ”] and anion exchange resin [Mitsubishi Kasei Co., Ltd.]
Ion removal was carried out by passing each twice through the product, trade name "Diaion SA-20".

【0065】このイオン除去を行なった部分加水分解物
と上記シリカコロイド分散液80.8gを混合し、この
混合物に、イソプロパノール2380g、ブタノール2
380g、ヘキシレングリコール2380gをさらに混
合して、固形分濃度が1.9重量%、全固形分中に占め
るシリカコロイド粒子の割合が2.0重量%である被膜
形成用塗布液を得た。
The partially hydrolyzed product from which the ions had been removed was mixed with 80.8 g of the above silica colloidal dispersion, and 2380 g of isopropanol and 2 parts of butanol were added to this mixture.
380 g and 2380 g of hexylene glycol were further mixed to obtain a coating solution for forming a film having a solid content concentration of 1.9% by weight and a ratio of silica colloid particles in the total solid content of 2.0% by weight.

【0066】この被膜形成用塗布液のイオン濃度、この
塗布液を用いて実施例1と同様にして得られた被膜付基
材の被膜特性、およびこの基材から実施例1と同様にし
て得られた磁気ディスクの特性を実施例1と同様にして
測定評価した。
Ion concentration of the coating solution for forming the coating, coating characteristics of the coated substrate obtained in the same manner as in Example 1 using this coating solution, and obtained from this substrate in the same manner as in Example 1 The characteristics of the obtained magnetic disk were measured and evaluated in the same manner as in Example 1.

【0067】結果を表2に併記する。The results are also shown in Table 2.

【0068】[0068]

【実施例3】市販のオルガノシリカゾル[触媒化成工業
(株)製、商品名「オスカル」;平均粒径45nm、粒
径の変動係数9.0%、濃度10重量%、溶媒イソプロ
パノール]をコロイド粒子中の陽イオンを溶出させるた
めに、オートクレーブを使用して150℃で2時間、熱
処理を行なった後、陽イオン交換樹脂[三菱化成工業
(株)製、商品名「ダイヤイオンSK−1B」]と陰イ
オン交換樹脂[三菱化成工業(株)製、商品名「ダイヤ
イオンSA−20」]中にそれぞれ10回通し、イオン
除去を行なった後、溶媒をヘキシレングリコールに加熱
減圧蒸留法で溶媒置換して、濃度5重量%のシリカコロ
イド分散液を得た。
EXAMPLE 3 Commercially available organosilica sol [Catalyst Kasei Kogyo KK, trade name "Oscar"; average particle size 45 nm, particle size variation coefficient 9.0%, concentration 10% by weight, solvent isopropanol] was used as colloidal particles. In order to elute the cations in the solution, a heat treatment was performed at 150 ° C. for 2 hours using an autoclave, and then a cation exchange resin [trade name “DIAION SK-1B” manufactured by Mitsubishi Kasei Co., Ltd.]. And anion exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion SA-20"] 10 times each to remove ions, and then the solvent is heated to hexylene glycol by heating under reduced pressure. Substitution was performed to obtain a silica colloidal dispersion having a concentration of 5% by weight.

【0069】一方、テトラエトキシシラン[多摩化学工
業(株)製、商品名「エチルシリケート40」;SiO
2 換算で40重量%]198g、濃硝酸0.8g、ヘキ
シレングリコール2020gおよびイオン交換水63.
7gを混合した後、これにテトラオクチルオキシチタニ
ウムのイソプロパノール溶液(TiO2 換算で10重量
%)990gおよびトリブトキシ−モノアセチルアセナ
トジルコニウムのブタノール溶液(ZrO2 換算で10
重量%)198gを混合し、室温で48時間攪拌して、
部分加水分解物(ポリスチレン換算で分子量4500)
を得た。
On the other hand, tetraethoxysilane [manufactured by Tama Chemical Industry Co., Ltd., trade name "ethyl silicate 40"; SiO
40% by weight in terms of 2 ] 198 g, concentrated nitric acid 0.8 g, hexylene glycol 2020 g, and ion-exchanged water 63.
After mixing 7 g, 990 g of an isopropanol solution of tetraoctyloxytitanium (10% by weight in terms of TiO 2 ) and a butanol solution of tributoxy-monoacetylacenatozirconium (10% in terms of ZrO 2).
Wt%) 198 g, and stirred at room temperature for 48 hours,
Partial hydrolyzate (molecular weight 4500 in terms of polystyrene)
Got

【0070】この部分加水分解物を直ちに陽イオン交換
樹脂[三菱化成工業(株)製、商品名「ダイヤイオンS
K−1B」]と陰イオン交換樹脂[三菱化成工業(株)
製、商品名「ダイヤイオンSA−20」]中にそれぞれ
2回通し、イオン除去を行なった。
This partial hydrolyzate was immediately converted to a cation exchange resin [Mitsubishi Kasei Kogyo KK, trade name "Diaion S"
K-1B ”] and anion exchange resin [Mitsubishi Kasei Co., Ltd.]
Ion removal was carried out by passing each twice through the product, trade name "Diaion SA-20".

【0071】このイオン除去を行なった部分加水分解物
と上記シリカコロイド分散液80.8gを混合し、この
混合物に、イソプロパノール2380g、ブタノール2
380g、ヘキシレングリコール2380gをさらに混
合して、固形分濃度が1.9重量%、全固形分中に占め
るシリカコロイド粒子の割合が2.0重量%である被膜
形成用塗布液を得た。
The partially hydrolyzed product from which the ions had been removed was mixed with 80.8 g of the above silica colloid dispersion, and 2380 g of isopropanol and 2 parts of butanol were added to this mixture.
380 g and 2380 g of hexylene glycol were further mixed to obtain a coating solution for forming a film having a solid content concentration of 1.9% by weight and a ratio of silica colloid particles in the total solid content of 2.0% by weight.

【0072】この被膜形成用塗布液のイオン濃度、この
塗布液を用いて実施例1と同様にして得られた被膜付基
材の被膜特性、およびこの基材から実施例1と同様にし
て得られた磁気ディスクの特性を実施例1と同様にして
測定評価した。
Ion concentration of the coating solution for forming a coating, coating characteristics of a coated substrate obtained in the same manner as in Example 1 using this coating solution, and obtained from this substrate in the same manner as in Example 1 The characteristics of the obtained magnetic disk were measured and evaluated in the same manner as in Example 1.

【0073】結果を表2に併記する。The results are also shown in Table 2.

【0074】[0074]

【実施例4】実施例3で得られた被膜形成用塗布液をさ
らに陽イオン交換樹脂[三菱化成工業(株)製、商品名
「ダイヤイオンSK−1B」]と陰イオン交換樹脂[三
菱化成工業(株)製、商品名「ダイヤイオンSA−2
0」]中に通し、被膜形成用塗布液中のイオン濃度が
0.05ミリモル/リットルになるまでイオン除去を行
ない、実施例4の被膜形成用塗布液を得た。なお、この
実施例4の被膜形成用塗布液の固形分濃度は1.9重量
%であり、全固形分中に占めるシリカコロイド粒子の割
合が2.0重量%であった。
[Example 4] The coating solution for forming a film obtained in Example 3 was further added with a cation exchange resin [trade name "Diaion SK-1B" manufactured by Mitsubishi Kasei Kogyo Co., Ltd.] and an anion exchange resin [Mitsubishi Kasei]. Product name "Diaion SA-2" manufactured by Kogyo Co., Ltd.
0 "] to remove ions until the concentration of ions in the coating solution for forming a coating reaches 0.05 mmol / liter to obtain a coating solution for forming a coating of Example 4. The solid content concentration of the coating liquid for forming a film of Example 4 was 1.9% by weight, and the ratio of the silica colloid particles in the total solid content was 2.0% by weight.

【0075】この被膜形成用塗布液のイオン濃度、この
塗布液を用いて実施例1と同様にして得られた被膜付基
材の被膜特性、およびこの基材から実施例1と同様にし
て得られた磁気ディスクの特性を実施例1と同様にして
測定評価した。
Ion concentration of the coating solution for forming the coating, coating characteristics of the coated substrate obtained in the same manner as in Example 1 using this coating solution, and obtained from this substrate in the same manner as in Example 1 The characteristics of the obtained magnetic disk were measured and evaluated in the same manner as in Example 1.

【0076】結果を表2に併記する。The results are also shown in Table 2.

【0077】[0077]

【実施例5】市販のチタニアゾル[触媒化成工業(株)
製、商品名「ネオサンベール」;平均粒径15nm、粒
径の変動係数19.0%、濃度10重量%、溶剤イソプ
ロパノール]を陽イオン交換樹脂[三菱化成工業(株)
製、商品名「ダイヤイオンSK−1B」]と陰イオン交
換樹脂[三菱化成工業(株)製、商品名「ダイヤイオン
SA−20」]中にそれぞれ10回通し、イオン除去を
行なった後、溶媒をヘキシレングリコールに加熱減圧蒸
留法で溶媒置換して、濃度5重量%のチタニアコロイド
分散液を得た。
Example 5 Commercially available titania sol [Catalyst Kasei Kogyo Co., Ltd.]
Product name “Neo Sunveil”; average particle size 15 nm, particle size variation coefficient 19.0%, concentration 10% by weight, solvent isopropanol] cation exchange resin [Mitsubishi Kasei Kogyo Co., Ltd.]
Manufactured by the trade name "Diaion SK-1B"] and anion exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion SA-20"] 10 times each to remove ions, The solvent was replaced with hexylene glycol by a heating vacuum distillation method to obtain a titania colloidal dispersion having a concentration of 5% by weight.

【0078】一方、テトラエトキシシラン[多摩化学工
業(株)製、商品名「エチルシリケート28」;SiO
2 換算で28重量%]31g、濃硝酸0.5g、ヘキシ
レングリコール203gおよびイオン交換水10gを混
合した後、これにジブトキシ−ビスアセチルアセトナト
チタンのブタノール溶液(TiO2 換算で10重量%)
12gを混合し、室温で12時間攪拌して、部分加水分
解物(ポリスチレン換算で分子量3000)を得た。
On the other hand, tetraethoxysilane [manufactured by Tama Chemical Industry Co., Ltd., trade name "ethyl silicate 28"; SiO
28% by weight in terms of 2 ] 31 g, 0.5 g of concentrated nitric acid, 203 g of hexylene glycol and 10 g of ion-exchanged water, and then mixed with butanol solution of dibutoxy-bisacetylacetonatotitanium (10% by weight in terms of TiO 2 ).
12 g was mixed and stirred at room temperature for 12 hours to obtain a partial hydrolyzate (molecular weight 3000 in terms of polystyrene).

【0079】この部分加水分解物を直ちに陽イオン交換
樹脂[三菱化成工業(株)製、商品名「ダイヤイオンS
K−1B」]と陰イオン交換樹脂[三菱化成工業(株)
製、商品名「ダイヤイオンSA−20」]中にそれぞれ
3回通し、イオン除去を行なった。
This partial hydrolyzate was immediately converted into a cation exchange resin [Mitsubishi Kasei Kogyo KK, trade name "Diaion S".
K-1B ”] and anion exchange resin [Mitsubishi Kasei Co., Ltd.]
Manufactured by trade name "DIAION SA-20"], and each ion was removed three times.

【0080】この部分加水分解物と上記チタニアコロイ
ド分散液0.2gを混合し、この混合物に、イソプロパ
ノール385g、ブタノール385g、ヘキシレングリ
コール385gを混合し、さらに前記イオン交換樹脂で
イオン除去して、固形分が0.7重量%、全固形分中に
占めるチタニアコロイドの割合が0.1重量%である被
膜形成用塗布液を得た。
This partial hydrolyzate was mixed with 0.2 g of the above titania colloidal dispersion, 385 g of isopropanol, 385 g of butanol and 385 g of hexylene glycol were mixed with this mixture, and the ions were removed with the ion exchange resin. A coating solution for forming a film having a solid content of 0.7% by weight and a proportion of titania colloid in the total solid content of 0.1% by weight was obtained.

【0081】この被膜形成用塗布液のイオン濃度、この
塗布液を用いて実施例1と同様にして得られた被膜付基
材の被膜特性、およびこの基材から実施例1と同様にし
て得られた磁気ディスクの特性を実施例1と同様にして
測定評価した。
Ion concentration of the coating solution for forming a coating, coating characteristics of a coated substrate obtained in the same manner as in Example 1 using this coating solution, and obtained from this substrate in the same manner as in Example 1 The characteristics of the obtained magnetic disk were measured and evaluated in the same manner as in Example 1.

【0082】結果を表2に併記する。The results are also shown in Table 2.

【0083】[0083]

【実施例6】市販のオルガノシリカゾル[触媒化成工業
(株)製、商品名「オスカル」;平均粒径25nm、粒
径の変動係数9.5%、濃度10重量%、溶媒イソプロ
パノール]を、陽イオン交換樹脂[三菱化成工業(株)
製、商品名「ダイヤイオンSK−1B」]と陰イオン交
換樹脂[三菱化成工業(株)製、商品名「ダイヤイオン
SA−20」]中にそれぞれ10回通し、イオン除去を
行なった後、溶媒をプロピレングリコールに加熱減圧蒸
留法で溶媒置換して、濃度5重量%のシリカコロイド分
散液を得た。
Example 6 A commercially available organosilica sol [Catalyst Kasei Kogyo KK, trade name "Oscar"; average particle size 25 nm, particle size variation coefficient 9.5%, concentration 10% by weight, solvent isopropanol] Ion exchange resin [Mitsubishi Chemical Industries, Ltd.]
Manufactured by the trade name "Diaion SK-1B"] and anion exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion SA-20"] 10 times each to remove ions, The solvent was replaced with propylene glycol by a heating vacuum distillation method to obtain a silica colloidal dispersion having a concentration of 5% by weight.

【0084】一方、テトラメトキシシラン[多摩化学工
業(株)製、商品名「メチルシリケート51」;SiO
2 換算で51重量%]27.6g、モノメチルトリメト
キシシラン(SiO2 換算で40重量%)19.5g、
濃硝酸0.5g、プロピレングリコール730gおよび
イオン交換水28gを混合した後、これにジブトキシ−
ビスアセチルアセナトジルコニウムのブタノール溶液
(ZrO2 換算で10重量%)779gを混合し、室温
で24時間攪拌して、部分加水分解物(ポリスチレン換
算で分子量4000)を得た。
On the other hand, tetramethoxysilane [manufactured by Tama Chemical Industry Co., Ltd., trade name "methyl silicate 51"; SiO
51% by weight in terms of 2 ] 27.6 g, monomethyltrimethoxysilane (40% by weight in terms of SiO 2 ) 19.5 g,
After mixing 0.5 g of concentrated nitric acid, 730 g of propylene glycol and 28 g of ion-exchanged water, dibutoxy-
779 g of a butanol solution of bisacetylacenatozirconium (10% by weight in terms of ZrO 2 ) was mixed and stirred at room temperature for 24 hours to obtain a partial hydrolyzate (molecular weight in terms of polystyrene of 4000).

【0085】この部分加水分解物を直ちに陽イオン交換
樹脂[三菱化成工業(株)製、商品名「ダイヤイオンS
K−1B」]と陰イオン交換樹脂[三菱化成工業(株)
製、商品名「ダイヤイオンSA−20」]中にそれぞれ
3回通し、イオン除去を行なった。
This partial hydrolyzate was immediately converted to a cation exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion S"].
K-1B ”] and anion exchange resin [Mitsubishi Kasei Co., Ltd.]
Manufactured by trade name "DIAION SA-20"], and each ion was removed three times.

【0086】このイオン除去を行なった部分加水分解物
と上記シリカコロイド分散液4.0gを混合し、この混
合物に、イソプロパノール2650g、ブタノール26
50g、プロピレングリコール3111gをさらに混合
して、固形分濃度が1.0重量%、全固形分中に占める
シリカコロイド粒子の割合が0.2重量%である被膜形
成用塗布液を得た。
The ion-removed partial hydrolyzate was mixed with 4.0 g of the silica colloidal dispersion, and 2650 g of isopropanol and 26 of butanol were added to the mixture.
50 g and 3111 g of propylene glycol were further mixed to obtain a coating liquid for forming a film having a solid content concentration of 1.0% by weight and a ratio of silica colloid particles in the total solid content of 0.2% by weight.

【0087】この被膜形成用塗布液のイオン濃度、この
塗布液を用いて外径95mm、内径25mm、厚さ1.
20mm、表面平均粗さ80オングストロームのアルミ
ニウム製ディスク基板上に実施例1と同様に塗布して得
られた被膜付基材の被膜特性、およびこの基材から実施
例1と同様にして得られた磁気ディスクの特性を実施例
1と同様にして測定評価した。
Ion concentration of the coating solution for forming the film, using this coating solution, outer diameter 95 mm, inner diameter 25 mm, thickness 1.
Coating properties of a coated substrate obtained by coating in the same manner as in Example 1 on an aluminum disc substrate having a surface average roughness of 20 Å and a surface roughness of 80 Å, and obtained from this substrate in the same manner as in Example 1. The characteristics of the magnetic disk were measured and evaluated in the same manner as in Example 1.

【0088】結果を表2に併記する。The results are also shown in Table 2.

【0089】[0089]

【実施例7】市販のオルガノシリカゾル[触媒化成工業
(株)製、商品名「オスカル」;平均粒径80nm、粒
径の変動係数10.0%、濃度5重量%、溶媒エタノー
ル]を陽イオン交換樹脂[三菱化成工業(株)製、商品
名「ダイヤイオンSK−1B」]と陰イオン交換樹脂
[三菱化成工業(株)製、商品名「ダイヤイオンSA−
20」]中にそれぞれ10回通し、イオン除去を行な
い、濃度5重量%のシリカコロイド分散液を得た。
[Example 7] A commercially available organosilica sol [Catalyst Chemical Co., Ltd., trade name "Oscar"; average particle size 80 nm, particle size variation coefficient 10.0%, concentration 5% by weight, solvent ethanol] was used as a cation. Exchange resin [Mitsubishi Kasei Industry Co., Ltd., trade name "Diaion SK-1B"] and anion exchange resin [Mitsubishi Kasei Co., Ltd., trade name "Diaion SA-"
20 "] to remove ions to obtain a silica colloidal dispersion having a concentration of 5% by weight.

【0090】一方、ジブトキシ−ビスアセチルアセナト
ジルコニウムのブタノール溶液(ZrO2 換算で10重
量%)990g、濃硝酸0.2g、イオン交換水128
gを混合した後、室温で12時間攪拌して、部分加水分
解物(ポリスチレン換算で分子量3000)を得た。
On the other hand, dibutoxy-bisacetylacenatozirconium butanol solution (10% by weight in terms of ZrO 2 ) 990 g, concentrated nitric acid 0.2 g, ion-exchanged water 128
After mixing g, the mixture was stirred at room temperature for 12 hours to obtain a partial hydrolyzate (molecular weight 3000 in terms of polystyrene).

【0091】この部分加水分解物を直ちに陽イオン交換
樹脂[三菱化成工業(株)製、商品名「ダイヤイオンS
K−1B」]と陰イオン交換樹脂[三菱化成工業(株)
製、商品名「ダイヤイオンSA−20」]中にそれぞれ
3回通し、イオン除去を行なった。
This partial hydrolyzate was immediately converted to a cation exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion S
K-1B ”] and anion exchange resin [Mitsubishi Kasei Co., Ltd.]
Manufactured by trade name "DIAION SA-20"], and each ion was removed three times.

【0092】この部分加水分解物と上記シリカコロイド
分散液20.0gを混合し、固形分濃度が3.0重量
%、全固形分中に占めるシリカコロイド粒子の割合が
1.0重量%である被膜形成用塗布液を得た。
This partial hydrolyzate was mixed with 20.0 g of the above silica colloidal dispersion, and the solid content concentration was 3.0% by weight, and the ratio of silica colloidal particles in the total solid content was 1.0% by weight. A coating liquid for forming a film was obtained.

【0093】この被膜形成用塗布液のイオン濃度、この
塗布液を用いて実施例1と同様にして得られた被膜付基
材の被膜特性、およびこの基材から実施例1と同様にし
て得られた磁気ディスクの特性を実施例1と同様にして
測定評価した。
Ion concentration of the coating solution for forming a coating, coating characteristics of a coated substrate obtained in the same manner as in Example 1 using this coating solution, and obtained from this substrate in the same manner as in Example 1 The characteristics of the obtained magnetic disk were measured and evaluated in the same manner as in Example 1.

【0094】結果を表2に併記する。The results are also shown in Table 2.

【0095】[0095]

【実施例8】市販のオルガノシリカゾル[触媒化成工業
(株)製、商品名「オスカル」;平均粒径100nm、
粒径の変動係数9.8%、濃度10重量%、溶媒イソプ
ロパノール]を、陽イオン交換樹脂[三菱化成工業
(株)製、商品名「ダイヤイオンSK−1B」]と陰イ
オン交換樹脂[三菱化成工業(株)製、商品名「ダイヤ
イオンSA−20」]中にそれぞれ10回通し、イオン
除去を行なった後、溶媒をプロピレングリコールに加熱
減圧蒸留法で溶媒置換して、濃度5重量%のシリカコロ
イド分散液を得た。
Example 8 Commercially available organosilica sol [Catalyst Chemical Co., Ltd., trade name "Oscar"; average particle size 100 nm,
The variation coefficient of particle size is 9.8%, the concentration is 10% by weight, and the solvent is isopropanol. Cation exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion SK-1B"] and anion exchange resin [Mitsubishi Chemical industry Co., Ltd., trade name "Diaion SA-20"] each 10 times, after removing the ions, the solvent was replaced by propylene glycol by heating under reduced pressure distillation method, the concentration of 5% by weight. A silica colloidal dispersion of was obtained.

【0096】一方、テトラエトキシシラン[多摩化学工
業(株)製、商品名「エチルシリケート28」;SiO
2 換算で28重量%)714.3g、酢酸2g、プロピ
レングリコール2554gおよびイオン交換水60gを
混合した後、40℃で5時間攪拌して、部分加水分解物
(ポリスチレン換算で分子量5000)を得た。
On the other hand, tetraethoxysilane [manufactured by Tama Chemical Industry Co., Ltd., trade name "ethyl silicate 28"; SiO
2 in terms of 28 wt%) 714.3g, acetate 2g, after mixing the propylene glycol 2554g of ion-exchanged water 60 g, and stirred for 5 hours at 40 ° C., to obtain partial hydrolyzate (molecular weight 5000 in terms of polystyrene) ..

【0097】この部分加水分解物を直ちに陽イオン交換
樹脂[三菱化成工業(株)製、商品名「ダイヤイオンS
K−1B」]と陰イオン交換樹脂[三菱化成工業(株)
製、商品名「ダイヤイオンSA−20」]中にそれぞれ
3回通し、イオン除去を行なった。
This partial hydrolyzate was immediately converted into a cation exchange resin [Mitsubishi Kasei Kogyo Co., Ltd., trade name "Diaion S"].
K-1B ”] and anion exchange resin [Mitsubishi Kasei Co., Ltd.]
Manufactured by trade name "DIAION SA-20"], and each ion was removed three times.

【0098】この部分加水分解物と上記シリカコロイド
分散液83.4gを混合し、この混合物にヘキシレング
リコール670gをさらに混合して、固形分濃度が5.
0重量%、全固形分中に占めるシリカコロイド粒子の割
合が0.4重量%である被膜形成用塗布液を得た。
This partial hydrolyzate was mixed with 83.4 g of the above silica colloidal dispersion, and 670 g of hexylene glycol was further mixed with this mixture to give a solid content of 5.
A coating liquid for forming a film was obtained in which the content of silica colloid particles in the total solid content was 0% by weight and 0.4% by weight.

【0099】この被膜形成用塗布液のイオン濃度、この
塗布液を用いて実施例1と同様にして得られた被膜付基
材の被膜特性、およびこの基材から実施例1と同様にし
て得られた磁気ディスクの特性を実施例1と同様にして
測定評価した。
Ion concentration of the coating solution for forming a coating, coating characteristics of a coated substrate obtained in the same manner as in Example 1 using this coating solution, and obtained from this substrate in the same manner as in Example 1 The characteristics of the obtained magnetic disk were measured and evaluated in the same manner as in Example 1.

【0100】結果を表2に併記する。The results are also shown in Table 2.

【0101】[0101]

【実施例9】外径95mm、内径25mm、厚さ1.20m
m、表面平均粗さ50オングストロームのソーダライム
ガラス製のディスク基板に直流マグネトロンスパッタで
厚さ1500オングストロームのCrからなる下地膜
と、厚さ700オングストロームのCoNiからなる磁
性膜とを順次積層し、得られた積層膜上に実施例4の被
膜形成用塗布液をスピンコーターで塗布し、80℃で乾
燥した後、4000mJの紫外線を照射し、さらに30
0℃の温度で1時間焼成することにより、被膜平坦部の
膜厚が300オングストロームである被膜付基材を得
た。
[Embodiment 9] Outer diameter 95 mm, inner diameter 25 mm, thickness 1.20 m
m, a surface film of soda lime glass having an average surface roughness of 50 angstrom, a 1500 angstrom-thick Cr undercoat film and a 700 angstrom-thick CoNi magnetic film were sequentially laminated by DC magnetron sputtering to obtain a film. The coating solution for forming a film of Example 4 was applied onto the obtained laminated film by a spin coater, dried at 80 ° C., and then irradiated with ultraviolet rays of 4000 mJ, and further 30
By baking at a temperature of 0 ° C. for 1 hour, a film-coated substrate having a film flat portion with a film thickness of 300 Å was obtained.

【0102】次いでこの被膜付基材の被膜上にさらにパ
ーフロロポリエーテルからなる潤滑剤をスピンコーター
で厚さ30オングストローム塗布し、磁気ディスクを得
た。得られた被膜付基材の被膜特性、および得られた磁
気ディスクの特性を実施例1と同様にして測定評価し
た。
Then, a lubricant made of perfluoropolyether was further coated on the coating of the coated substrate with a spin coater to a thickness of 30 Å to obtain a magnetic disk. The coating characteristics of the obtained coated substrate and the characteristics of the obtained magnetic disk were measured and evaluated in the same manner as in Example 1.

【0103】結果を表2に併記する。The results are also shown in Table 2.

【0104】[0104]

【実施例10】市販のオルガノシリカゾル[触媒化成工
業(株)製、商品名「オスカル」;平均粒径45nm、
粒径の変動係数9.5%、濃度10重量%、溶媒イソプ
ロパノール]の溶媒をヘキシレングリコールに加熱減圧
蒸留法で溶媒置換して、イオン除去処理を行っていない
濃度5重量%のシリカコロイド分散液を得た。
Example 10 Commercially available organosilica sol [Catalyst Kasei Kogyo KK, trade name "Oscar"; average particle size 45 nm,
Particle size variation coefficient 9.5%, concentration 10% by weight, solvent isopropanol] The solvent was replaced with hexylene glycol by heating under reduced pressure distillation method, and the concentration of the silica colloid was 5% by weight without ion removal treatment. A liquid was obtained.

【0105】一方、テトラエトキシシラン[多摩化学工
業(株)製、商品名「エチルシリケート40」;SiO
2 換算で40重量%]198g、濃硝酸0.8g、ヘキ
シレングリコール2020gおよびイオン交換水63.
7gを混合した後、これにテトラオクチルオキシチタニ
ウムのイソプロパノール溶液(TiO2 換算で10重量
%)990gおよびトリブトキシ−モノアセチルアセナ
トジルコニウムのブタノール溶液(ZrO2 換算で10
重量%)198gを混合し、室温で48時間攪拌して、
部分加水分解物(ポリスチレン換算で分子量4500)
を得た。
On the other hand, tetraethoxysilane [manufactured by Tama Chemical Industry Co., Ltd., trade name "ethyl silicate 40"; SiO
40% by weight in terms of 2 ] 198 g, concentrated nitric acid 0.8 g, hexylene glycol 2020 g, and ion-exchanged water 63.
After mixing 7 g, 990 g of an isopropanol solution of tetraoctyloxytitanium (10% by weight in terms of TiO 2 ) and a butanol solution of tributoxy-monoacetylacenatozirconium (10% in terms of ZrO 2).
Wt%) 198 g, and stirred at room temperature for 48 hours,
Partial hydrolyzate (molecular weight 4500 in terms of polystyrene)
Got

【0106】この部分加水分解物と上記シリカコロイド
分散液80.8gを混合し、この混合物にイソプロピノ
ール2380g、ブタノール2380g、ヘキシレング
リコール2380gを混合して、固形分濃度が1.9重
量%、全固形分中に占めるシリカコロイド粒子の割合が
2.0重量%である被膜形成用塗布液を得た。
This partial hydrolyzate was mixed with 80.8 g of the above silica colloid dispersion, and 2380 g of isopropynol, 2380 g of butanol and 2380 g of hexylene glycol were mixed with this mixture to give a solid content of 1.9% by weight. A coating liquid for forming a film was obtained in which the ratio of silica colloidal particles in the total solid content was 2.0% by weight.

【0107】この被膜形成用塗布液を、陽イオン交換樹
脂[三菱化成工業(株)製、商品名「ダイヤイオンSK
−1B」]と陰イオン交換樹脂[三菱化成工業(株)
製、商品名「ダイヤイオンSA−20」]中にそれぞれ
20回通して、被膜形成用塗布液中のイオン濃度を0.
2ミリモル/リットルとした。
This coating solution for forming a film was used as a cation exchange resin [manufactured by Mitsubishi Kasei Kogyo Co., Ltd. under the trade name "Diaion SK".
-1B ”] and anion exchange resin [Mitsubishi Kasei Co., Ltd.]
Co., Ltd., trade name “Diaion SA-20”] and passed 20 times each to adjust the ion concentration in the coating solution for film formation to 0.
It was set to 2 mmol / liter.

【0108】このようにして得られた被膜形成用塗布液
のイオン濃度、この塗布液を用いて実施例1と同様にし
て得られた被膜付基材の被膜特性、およびこの基材から
実施例1と同様にして得られた磁気ディスクの特性を実
施例1と同様にして測定評価した。
The ion concentration of the coating solution for forming a coating film thus obtained, the coating characteristics of the coated substrate obtained in the same manner as in Example 1 using this coating solution, and the examples from this substrate The characteristics of the magnetic disk obtained in the same manner as in Example 1 were measured and evaluated in the same manner as in Example 1.

【0109】結果を表2に併記する。また上記被膜付基
材の被膜表面における電子顕微鏡写真を図1に示す。
The results are also shown in Table 2. An electron micrograph of the surface of the coated substrate is shown in FIG.

【0110】[0110]

【比較例1】実施例10で陽イオン交換樹脂による処理
と陰イオン交換樹脂による処理とを行なう前の被膜形成
用塗布液のイオン濃度は、2.0ミリモル/リットルで
あった。
Comparative Example 1 The ion concentration of the coating liquid for forming a film before the treatment with the cation exchange resin and the treatment with the anion exchange resin in Example 10 was 2.0 mmol / liter.

【0111】この被膜形成用塗布液のイオン濃度、この
塗布液を用いて実施例1と同様にして得られた被膜付基
材の被膜特性、およびこの基材から実施例1と同様にし
て得られた磁気ディスクの特性を実施例1と同様にして
測定評価した。
Ion concentration of the coating solution for forming a coating, coating characteristics of a coated substrate obtained in the same manner as in Example 1 using this coating solution, and obtained from this substrate in the same manner as in Example 1 The characteristics of the obtained magnetic disk were measured and evaluated in the same manner as in Example 1.

【0112】結果を表2に併記する。また上記被膜付基
材の被膜表面における電子顕微鏡写真を図2に示す。
The results are also shown in Table 2. An electron micrograph of the surface of the coated substrate is shown in FIG.

【0113】[0113]

【比較例2】市販のオルガノシリカゾル[触媒化成工業
(株)製、商品名「オスカル」;平均粒径45nm、粒
径の変動係数9.5%、濃度10重量%、溶媒イソプロ
パノール]の溶媒をヘキシレングリコールに加熱減圧蒸
留法で溶媒置換して、イオン除去処理を行っていない濃
度5重量%のシリカコロイド分散液を得た。
Comparative Example 2 A solvent of commercially available organosilica sol [Catalyst Chemical Co., Ltd., trade name "Oscar"; average particle diameter 45 nm, particle diameter variation coefficient 9.5%, concentration 10% by weight, solvent isopropanol] was used. Hexylene glycol was subjected to solvent substitution by a heating vacuum distillation method to obtain a silica colloidal dispersion liquid having a concentration of 5% by weight, which was not subjected to ion removal treatment.

【0114】一方、テトラエトキシシラン[多摩化学工
業(株)製、商品名「エチルシリケート40」;SiO
2 換算で40重量%]198g、濃硝酸2.4g、ヘキ
シレングリコール1846.9gおよびイオン交換水6
3.7gを混合した後、これにテトラオクチルオキシチ
タニウムのイソプロパノール溶液(TiO2 換算で10
重量%)990gおよびトリブトキシ−モノアセチルア
セナトジルコニウムのブタノール溶液(ZrO2 換算で
10重量%)198gを混合し、室温で48時間攪拌し
て、部分加水分解物(ポリスチレン換算で分子量500
0)を得た。
On the other hand, tetraethoxysilane [manufactured by Tama Chemical Industry Co., Ltd., trade name "ethyl silicate 40"; SiO
40% by weight in terms of 2 ] 198 g, concentrated nitric acid 2.4 g, hexylene glycol 1846.9 g, and ion-exchanged water 6
After mixing 3.7 g, an isopropanol solution of tetraoctyloxytitanium (10 in terms of TiO 2) was added to this.
% By weight) and 198 g of a butanol solution of tributoxy-monoacetylacenatozirconium (10% by weight in terms of ZrO 2 ) are mixed and stirred at room temperature for 48 hours to partially hydrolyze (molecular weight in terms of polystyrene: 500).
0) was obtained.

【0115】この部分加水分解物と上記シリカコロイド
分散液252.2gを混合し、この混合物に、イソプロ
パノール2380g、ブタノール2380g、ヘキシレ
ングリコール2380gを混合して、固形分濃度が2.
0重量%、全固形分中に占める無機化合物コロイド粒子
の割合が6.0重量%である被膜形成用塗布液を得た。
This partial hydrolyzate was mixed with 252.2 g of the above silica colloid dispersion, and 2380 g of isopropanol, 2380 g of butanol and 2380 g of hexylene glycol were mixed with this mixture to give a solid content of 2.
A coating liquid for forming a film was obtained in which the proportion of the inorganic compound colloidal particles in the total solid content was 0% by weight and 6.0% by weight.

【0116】この被膜形成用塗布液のイオン濃度、この
塗布液を用いて実施例1と同様にして得られた被膜付基
材の被膜特性、およびこの基材から実施例1と同様にし
て得られた磁気ディスクの特性を実施例1と同様にして
測定評価した。
Ion concentration of the coating solution for forming a coating, coating characteristics of a coated substrate obtained in the same manner as in Example 1 using this coating solution, and obtained from this substrate in the same manner as in Example 1 The characteristics of the obtained magnetic disk were measured and evaluated in the same manner as in Example 1.

【0117】結果を表2に併記する。The results are also shown in Table 2.

【0118】[0118]

【表2】 [Table 2]

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は、本発明に係る被膜付磁気ディスクの被
膜表面状態を示す電子顕微鏡写真である。
FIG. 1 is an electron micrograph showing a coating surface state of a coated magnetic disk according to the present invention.

【図2】図2は、比較例の被膜付磁気ディスクの被膜表
面状態を示す電子顕微鏡写真である。
FIG. 2 is an electron micrograph showing a coating surface state of a coated magnetic disk of a comparative example.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】無機化合物コロイド粒子(a)と、 アセチルアセトナトキレート、アルコキシシランおよび
金属アルコキシドの部分加水分解物から選ばれた少なく
とも1種の被膜形成成分(b)とが、有機溶媒(c)中
に含まれ、 この被膜形成用塗布液中のイオン濃度が1.0ミリモル
/リットル以下であることを特徴とする被膜形成用塗布
液。
1. An inorganic compound colloidal particle (a) and at least one film-forming component (b) selected from an acetylacetonato chelate, an alkoxysilane and a partial hydrolyzate of a metal alkoxide, and an organic solvent (c). ), And the ion concentration of the coating liquid for forming a coating film is 1.0 mmol / liter or less.
【請求項2】被膜形成用塗布液の製造過程で、少なくと
も前記無機化合物コロイド粒子(a)を含むゾル、前記
被膜形成成分(b)を含む液および被膜形成用塗布液の
いずれかに、陽イオン交換樹脂による処理と陰イオン交
換樹脂による処理とを行なって、得られる被膜形成用塗
布液の中のイオン濃度を1.0ミリモル/リットル以下
とすることを特徴とする請求項1記載の被膜形成用塗布
液の製造方法。
2. In the process of producing a coating liquid for forming a film, a sol containing at least the inorganic compound colloidal particles (a), a liquid containing the component (b) for forming a film, and a coating liquid for forming a film, The coating according to claim 1, wherein the treatment with an ion exchange resin and the treatment with an anion exchange resin are carried out so that the ion concentration in the coating liquid for film formation obtained is 1.0 mmol / liter or less. Method for producing coating liquid for forming.
【請求項3】 請求項1記載の被膜形成用塗布液から形
成された被膜が基材上に積層されていることを特徴とす
る被膜付基材。
3. A substrate with a coating, wherein a coating formed from the coating liquid for forming a coating according to claim 1 is laminated on the substrate.
【請求項4】 ディスク基板と、その上に形成された磁
性層とを含み、前記ディスク基板と前記磁性層との間お
よび/または前記磁性層上に、請求項1記載の被膜形成
用塗布液から形成された被膜を有する磁気記録媒体。
4. A coating solution for forming a coating film according to claim 1, comprising a disk substrate and a magnetic layer formed thereon, and between the disk substrate and the magnetic layer and / or on the magnetic layer. A magnetic recording medium having a coating formed from.
JP03351648A 1991-12-12 1991-12-12 Coating liquid for forming a film, method for producing the same, and substrate with a film Expired - Lifetime JP3139093B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03351648A JP3139093B2 (en) 1991-12-12 1991-12-12 Coating liquid for forming a film, method for producing the same, and substrate with a film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03351648A JP3139093B2 (en) 1991-12-12 1991-12-12 Coating liquid for forming a film, method for producing the same, and substrate with a film

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Publication Number Publication Date
JPH05163464A true JPH05163464A (en) 1993-06-29
JP3139093B2 JP3139093B2 (en) 2001-02-26

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Cited By (9)

* Cited by examiner, † Cited by third party
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JPH05263045A (en) * 1992-03-17 1993-10-12 Catalysts & Chem Ind Co Ltd Film-forming coating liquid and its production
GB2288184A (en) * 1994-03-31 1995-10-11 Catalysts & Chem Ind Co Coating composition
JPH0848416A (en) * 1994-08-03 1996-02-20 Shinko Electric Co Ltd Orderly feeding device for short sword shape article
JP2007238950A (en) * 2007-03-30 2007-09-20 Univ Nihon Cured product
JP2007272966A (en) * 2006-03-30 2007-10-18 Fujifilm Corp Magnetic recording medium
US7604866B2 (en) 2003-06-18 2009-10-20 Asahi Kasei Kabushiki Kaisha Antireflection film
JP2015108087A (en) * 2013-12-05 2015-06-11 東京応化工業株式会社 Composition for forming silica-based film and manufacturing method of silica-based film
WO2022196218A1 (en) * 2021-03-19 2022-09-22 日本電気硝子株式会社 Coating fluid for spray coating, production method therefor, and method for producing substrate coated with antiglare layer
CN116897194A (en) * 2021-03-19 2023-10-17 日本电气硝子株式会社 Coating liquid for spraying, method for producing same, and method for producing base material with antiglare layer

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05263045A (en) * 1992-03-17 1993-10-12 Catalysts & Chem Ind Co Ltd Film-forming coating liquid and its production
GB2288184A (en) * 1994-03-31 1995-10-11 Catalysts & Chem Ind Co Coating composition
JPH0848416A (en) * 1994-08-03 1996-02-20 Shinko Electric Co Ltd Orderly feeding device for short sword shape article
US7604866B2 (en) 2003-06-18 2009-10-20 Asahi Kasei Kabushiki Kaisha Antireflection film
JP2007272966A (en) * 2006-03-30 2007-10-18 Fujifilm Corp Magnetic recording medium
JP2007238950A (en) * 2007-03-30 2007-09-20 Univ Nihon Cured product
JP2015108087A (en) * 2013-12-05 2015-06-11 東京応化工業株式会社 Composition for forming silica-based film and manufacturing method of silica-based film
WO2022196218A1 (en) * 2021-03-19 2022-09-22 日本電気硝子株式会社 Coating fluid for spray coating, production method therefor, and method for producing substrate coated with antiglare layer
CN116897194A (en) * 2021-03-19 2023-10-17 日本电气硝子株式会社 Coating liquid for spraying, method for producing same, and method for producing base material with antiglare layer

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