JPH0515857A - Washing device - Google Patents

Washing device

Info

Publication number
JPH0515857A
JPH0515857A JP3173975A JP17397591A JPH0515857A JP H0515857 A JPH0515857 A JP H0515857A JP 3173975 A JP3173975 A JP 3173975A JP 17397591 A JP17397591 A JP 17397591A JP H0515857 A JPH0515857 A JP H0515857A
Authority
JP
Japan
Prior art keywords
cleaning
liquid
cleaning liquid
work
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3173975A
Other languages
Japanese (ja)
Inventor
Tsunanori Kitou
綱範 鬼頭
Takayuki Urabe
孝之 占部
Hiroi Oketani
大亥 桶谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP3173975A priority Critical patent/JPH0515857A/en
Publication of JPH0515857A publication Critical patent/JPH0515857A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide the washing device which can improve the washing capacity to a work and prevents the state of contamination of washing members for washing the work. CONSTITUTION:A washing liquid is supplied from a washing liquid supplying device 32 into a liquid pooling groove 23 of a rotating body 19 coated with a cover 14 via tubes 31a to 31d. A part of the washing liquid flows over an outside wall 22 and flows downward between this wall and the cover 14. The remaining washing liquid in the liquid pooling groove 23 falls via through holes 25a to 25d onto the work 12 and diffuses radically outward through the inside of a brush 15.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体製造工程、液晶
表示装置製造工程あるいは各種電子部品などの製造工程
において、ガラス基板、シリコンウエハあるいは印刷配
線基板などの板状体上のごみや汚れなどを洗浄して除去
する際に用いられる洗浄装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to dust and dirt on a plate-like body such as a glass substrate, a silicon wafer or a printed wiring board in a semiconductor manufacturing process, a liquid crystal display device manufacturing process or a manufacturing process of various electronic parts. The present invention relates to a cleaning device used for cleaning and removing a material.

【0002】[0002]

【従来の技術】液晶表示装置の製造工程や印刷配線基板
の製造工程などにおいて、例として基板上に回路配線を
周知のホトプロセスでパターン形成する際に、洗浄工程
が必須である。図10は、典型的な従来例の洗浄装置1
の断面図である。例として表面にITO(インジウムス
ズ酸化物)の薄膜が形成され、これが所望の回路配線形
状にエッチングされた段階のガラス基板などである洗浄
の対象となるワーク2は、回転保持部材3に真空吸着な
どによって固定され、高精度に矢符A1方向に回転駆動
される。このようなワーク2および回転保持部材3は、
飛散防止枠4内に収納され、上方から矢符A2方向に回
転駆動される回転部材5が挿入され、また回転部材5の
ブラシ6付近に洗浄液を噴射する一対のノズル7,8が
設けられる。
2. Description of the Related Art In a manufacturing process of a liquid crystal display device, a manufacturing process of a printed wiring board, etc., for example, a cleaning process is indispensable when patterning circuit wiring on a substrate by a well-known photo process. FIG. 10 shows a typical conventional cleaning device 1.
FIG. As an example, a work 2 to be cleaned, which is a glass substrate at a stage where an ITO (indium tin oxide) thin film is formed on the surface and is etched into a desired circuit wiring shape, is vacuum-adsorbed on the rotation holding member 3. It is fixed by, for example, and is rotationally driven in the direction of arrow A1 with high precision. The work 2 and the rotation holding member 3 as described above are
A rotating member 5 housed in the scattering prevention frame 4 and driven to rotate in the arrow A2 direction is inserted from above, and a pair of nozzles 7 and 8 for injecting a cleaning liquid are provided near the brush 6 of the rotating member 5.

【0003】この従来例では、ノズル7,8からワーク
2上に洗浄液を噴出し、この洗浄液と矢符A2方向に回
転駆動しつつ矢符A3方向に走行する回転部材5により
洗浄作用を達成するようにしている。
In this conventional example, a cleaning liquid is ejected from the nozzles 7 and 8 onto the work 2, and the cleaning liquid and the rotating member 5 which is rotationally driven in the arrow A2 direction and travels in the arrow A3 direction achieve the cleaning action. I am trying.

【0004】[0004]

【発明が解決しようとする課題】従来の洗浄装置1で
は、ワーク2の汚れやごみなどを除去する際に、その汚
れやごみなどにより回転部材5のブラシ6を汚損してし
まい、またそのような汚れやごみなどは一般に除去が困
難であり、このためブラシ6に残存しているごみや汚れ
などが次に洗浄されるガラス基板に再付着してしまうこ
とになる。その結果、ブラシ6によるごみなどの除去能
力が低下してしまう。またノズル7,8はブラシ6に対
して外部から洗浄液を吐出するため、ブラシ6がワーク
2に接触する範囲の全体に亘って洗浄液を行き渡らせる
ことが困難であり、ごみなどの除去効率が低下するとい
う課題を有している。
In the conventional cleaning device 1, when the work 2 is cleaned of dirt and dust, the brush 6 of the rotating member 5 is soiled by the dirt and dust, and It is generally difficult to remove such dirt and dust, so that the dirt and dust remaining on the brush 6 will reattach to the glass substrate to be cleaned next. As a result, the ability of the brush 6 to remove dust and the like decreases. Further, since the nozzles 7 and 8 discharge the cleaning liquid from the outside to the brush 6, it is difficult to spread the cleaning liquid over the entire range in which the brush 6 contacts the work 2, and the efficiency of removing dust and the like decreases. There is a problem of doing.

【0005】本発明の目的は、上述の技術的課題を解消
し、対象物に対する洗浄能力を向上できると共に対象物
に洗浄する洗浄部材が汚損される事態を防止する洗浄装
置を提供することである。
An object of the present invention is to solve the above technical problems and to provide a cleaning device capable of improving the cleaning ability for an object and preventing the cleaning member for cleaning the object from being contaminated. ..

【0006】[0006]

【課題を解決するための手段】本発明は、回転軸線まわ
りに回転駆動され、軸線方向一方側端部における回転中
心位置付近以外の範囲に洗浄部材が装着され、他方側端
部から前記一方側端部に亘り、前記回転中心位置付近の
範囲内部に開口する透孔が形成される回転部材と、回転
部材を外囲して回転自在に保持し、前記洗浄部材側が開
口し、かつ回転部材の前記他方端部に向けて洗浄液を供
給する洗浄液供給部材が設けられるカバー部材とを含む
ことを特徴とする洗浄装置である。
According to the present invention, a cleaning member is driven to rotate about a rotation axis, and a cleaning member is mounted in a range other than the vicinity of a rotation center position at one end in the axial direction, and the one end from the other end. A rotating member having a through-hole that is open to the inside of the vicinity of the rotation center position over the end portion, and a rotating member that surrounds and rotatably holds the rotating member, and the cleaning member side is open, and And a cover member provided with a cleaning liquid supply member that supplies the cleaning liquid toward the other end.

【0007】[0007]

【作用】本発明の洗浄装置で、対象物を洗浄しようとす
る場合、回転部材の一方側端部に装着された洗浄部材が
対象物に摺動して洗浄作用を行う。このとき洗浄のため
の洗浄液は、カバー部材を介して回転部材の他方側端部
に供給され、当該他方側端部から一方側端部に亘って形
成されている透孔を通り、回転部材の一方側端部におけ
る回転中心位置付近に流出する。したがって対象物上の
洗浄液は、洗浄部材を経て外方に拡散する。これにより
洗浄部材には、洗浄液を用いて洗浄作用が行われる。
When the object to be cleaned is to be cleaned by the cleaning apparatus of the present invention, the cleaning member mounted on one end of the rotating member slides on the object to perform the cleaning operation. At this time, the cleaning liquid for cleaning is supplied to the other side end of the rotating member through the cover member, passes through the through hole formed from the other side end to the one side end, and passes through the rotating member. It flows out near the rotation center position at one end. Therefore, the cleaning liquid on the object diffuses outward through the cleaning member. As a result, the cleaning operation is performed on the cleaning member using the cleaning liquid.

【0008】また、洗浄液は前記回転部材の回転中心位
置付近から外方に広がるので、前記洗浄部材が対象物と
接触する前面に亘って、洗浄液を行き渡らせるこがで
き、洗浄能力を格段に向上することができる。また洗浄
部材は、内方から外方に流過する洗浄液によってそれ自
信洗浄されるので、対象物から除去した除去物質が洗浄
部材に付着する事態が防止でき、新たな対象物を洗浄部
材が汚損することになる事態を防止できる。
Further, since the cleaning liquid spreads outward from the vicinity of the rotation center position of the rotating member, the cleaning liquid can be spread over the front surface where the cleaning member comes into contact with the object, and the cleaning performance is remarkably improved. can do. Further, since the cleaning member is self-cleaning by the cleaning liquid flowing from the inside to the outside, it is possible to prevent the removed substance removed from the target object from adhering to the cleaning member, and the new target member is contaminated by the cleaning member. It is possible to prevent a situation that would occur.

【0009】[0009]

【実施例】図1は本発明の一実施例の洗浄装置11の拡
大断面図であり、図2は洗浄装置11の断面図である。
本実施例は、たとえば液晶表示装置を製造する際に用い
られるガラス基板の表面を洗浄する例について説明する
が、本発明はこのような実施例に限定されるものではな
い。洗浄されるガラス基板などのワーク12は、真空吸
着などにより回転保持部材13に固定され、この回転保
持部材13は矢符B1方向に高精度に回転駆動される。
ワーク12上には、カバー部材としてのカバー14で被
覆された洗浄部材としてのブラシ15が摺接し、ナイロ
ン樹脂などから成るブラシ15は後述するような構成に
よって連結される回転軸16によって矢符B2方向に回
転駆動されつつ、矢符B3で示す図2の左右方向あるい
は紙面垂直方向に平行移動する。このカバー14内に
は、後述するように純水などの洗浄液が供給される。こ
のようなワーク12、回転保持部材13およびカバー1
4などは洗浄液などが周囲に飛散するのを防止するため
の飛散防止枠17内に収納される。
1 is an enlarged sectional view of a cleaning apparatus 11 according to an embodiment of the present invention, and FIG. 2 is a sectional view of the cleaning apparatus 11.
This embodiment describes an example of cleaning the surface of a glass substrate used in manufacturing a liquid crystal display device, for example, but the present invention is not limited to such an embodiment. A workpiece 12 such as a glass substrate to be cleaned is fixed to a rotation holding member 13 by vacuum suction or the like, and the rotation holding member 13 is rotationally driven with high precision in the arrow B1 direction.
A brush 15 as a cleaning member, which is covered with a cover 14 as a cover member, is slidably contacted on the work 12, and the brush 15 made of nylon resin or the like is indicated by an arrow B2 by a rotary shaft 16 connected by a structure described later. While being rotationally driven in the direction, the camera moves in parallel in the left-right direction of FIG. A cleaning liquid such as pure water is supplied into the cover 14 as described later. Such a work 12, the rotation holding member 13, and the cover 1
4 and the like are stored in a scattering prevention frame 17 for preventing cleaning liquid and the like from scattering around.

【0010】洗浄装置11の前記回転軸16は、モータ
18によって矢符B2方向に回転駆動され、その先端は
回転体19の軸部20に同軸に固定される。軸部20の
回転軸16と反対側端部は、板厚t1の回転部材として
の円板部21に同軸に一体に固定される。円板部21の
周縁部には、高さh1の外壁22が全周に亘って形成さ
れ、円環状の液溜め溝23を構成する。この円板部21
には、後述するように周方向に複数箇所に亘って形成さ
れ、かつ液溜め溝23側から円板部21の軸部20と反
対側になるに従い、回転体19の回転中心位置24寄り
に傾斜した状態に形成される複数の透孔25a,25
b,25c,25dが形成される。
The rotating shaft 16 of the cleaning device 11 is rotationally driven by a motor 18 in the direction of arrow B2, and its tip is coaxially fixed to the shaft portion 20 of the rotating body 19. An end portion of the shaft portion 20 on the side opposite to the rotation shaft 16 is coaxially and integrally fixed to a disk portion 21 as a rotating member having a plate thickness t1. An outer wall 22 having a height h1 is formed over the entire circumference at the peripheral edge of the disc portion 21 to form an annular liquid storage groove 23. This disk part 21
Is formed at a plurality of locations in the circumferential direction, as will be described later, and becomes closer to the rotation center position 24 of the rotating body 19 as it goes from the liquid reservoir groove 23 side to the side opposite to the shaft portion 20 of the disc portion 21. A plurality of through holes 25a, 25 formed in an inclined state
b, 25c and 25d are formed.

【0011】円板部21の軸部20と反対側の下端部2
1aには、透孔25a,25dの下端部21a側開口部
の形成範囲よりも、半径方向外方の植設領域26に前記
ブラシ15が植設される。
A lower end portion 2 of the disc portion 21 opposite to the shaft portion 20.
In 1a, the brush 15 is planted in a planting region 26 radially outward of the formation range of the openings of the through holes 25a and 25d on the lower end 21a side.

【0012】このような回転体19およびブラシ15を
外囲するカバー14は、円板部21を外囲する大径部2
7と、軸部20を外囲する中径部28と、回転軸16を
外囲する小径部29とが同軸に一体に形成されて成る。
前記軸部20と中径部28との間には、たとえば磁気シ
ールトベアリングなど、洗浄液に対して密封性を有する
軸受30が介在され、カバー14は回転体19を回転自
在に支承する。カバー14の大径部27と中径部28と
を連結する連結部33と、円板部21の外壁22の上端
部とは、微少な間隔dを隔てる状態に構成される。前記
カバー14の大径部27の下端部は、ブラシ15の先端
部よりも高さh2だけ上方となるように構成される。
The cover 14 which surrounds the rotating body 19 and the brush 15 has a large diameter portion 2 which surrounds the disc portion 21.
7, a medium diameter portion 28 that surrounds the shaft portion 20, and a small diameter portion 29 that surrounds the rotary shaft 16 are coaxially and integrally formed.
A bearing 30 having a sealing property against the cleaning liquid, such as a magnetically sealed bearing, is interposed between the shaft portion 20 and the medium diameter portion 28, and the cover 14 rotatably supports the rotating body 19. The connecting portion 33 that connects the large-diameter portion 27 and the medium-diameter portion 28 of the cover 14 and the upper end portion of the outer wall 22 of the disc portion 21 are configured to be separated by a minute distance d. The lower end of the large diameter portion 27 of the cover 14 is configured to be higher than the tip of the brush 15 by a height h2.

【0013】このカバー14に沿って、洗浄液供給部材
であるたとえば4本のチューブ31a,31b,31
c,31dが固着され、その先端部はカバー14を挿通
して円板部21の液溜め溝23に臨み、さらに好ましく
は透孔25a〜25dの液溜め溝23側の開口部に臨む
位置に配置される。各チューブ31a〜31dは、洗浄
液供給装置32に接続され洗浄液が供給される。
Along the cover 14, for example, four tubes 31a, 31b, 31 which are cleaning liquid supply members.
c and 31d are fixed, and the tip end thereof is inserted into the cover 14 to face the liquid storage groove 23 of the disk portion 21, and more preferably, to a position facing the opening of the through holes 25a to 25d on the liquid storage groove 23 side. Will be placed. Each of the tubes 31a to 31d is connected to the cleaning liquid supply device 32 and supplied with the cleaning liquid.

【0014】図3は図1の切断面線X3−X3から見た
断面図であり、図4は回転体19の前記下端部21aの
底面図であり、図5は回転体19の底面における洗浄液
の流過方向を示す図である。液溜め溝23には、前述し
たようにたとえば4つの透孔25a〜25dが等間隔を
隔てて形成され、その前記円板部21の下端部21a側
の開口部は、回転中心位置24寄りに形成される。
3 is a sectional view taken along the section line X3-X3 in FIG. 1, FIG. 4 is a bottom view of the lower end 21a of the rotating body 19, and FIG. 5 is a cleaning liquid on the bottom surface of the rotating body 19. It is a figure which shows the flowing direction of. As described above, for example, four through holes 25a to 25d are formed at equal intervals in the liquid reservoir groove 23, and the opening of the disc portion 21 on the lower end portion 21a side is closer to the rotation center position 24. It is formed.

【0015】以下、洗浄装置11の動作について説明す
る。洗浄装置11が図2に示すように、ワーク12に摺
接するとき、洗浄液供給装置32から洗浄液がチューブ
31a〜31dを介して、前記液溜め溝23内に供給さ
れる。これと共に、回転保持部材13が矢符B1方向に
回転駆動され、かつ回転軸16が矢符B2方向に回転駆
動される。これにより液溜め溝23内に供給された洗浄
液の一部分は、外壁22を越えてカバー14と円板部2
1との間を落下し、ワーク12上を半径方向外方に移動
し、ワーク12上でこれからブラシ15によって洗浄し
ようとする領域を予め予備洗浄する。一方、液溜め溝2
3内の洗浄液の残余の部分は、各透孔25a〜25dを
介して下方に落下し、ワーク12上を図5矢符B4に示
すように半径方向外方に拡散しつつ矢符B2方向に旋回
し、回転駆動されているブラシ15と共にワーク12上
を洗浄する。
The operation of the cleaning device 11 will be described below. As shown in FIG. 2, when the cleaning device 11 is in sliding contact with the workpiece 12, the cleaning liquid is supplied from the cleaning liquid supply device 32 into the liquid reservoir groove 23 via the tubes 31a to 31d. At the same time, the rotation holding member 13 is rotationally driven in the arrow B1 direction, and the rotary shaft 16 is rotationally driven in the arrow B2 direction. As a result, a part of the cleaning liquid supplied into the liquid reservoir groove 23 crosses over the outer wall 22 and the cover 14 and the disc portion 2
1 to move radially outward on the work 12 and preliminarily clean the area on the work 12 to be cleaned by the brush 15 in advance. On the other hand, the liquid reservoir groove 2
The remaining portion of the cleaning liquid in 3 drops downward through each of the through holes 25a to 25d and diffuses outward on the work 12 in the radial direction as shown by arrow B4 in FIG. The work 12 is cleaned together with the brush 15 which is rotated and driven to rotate.

【0016】これにより回転体19で被覆されるワーク
12の領域の全体に亘って洗浄液を行き渡らせることが
でき、洗浄作用を効率的に行うことができる。また透孔
25a〜25dからの洗浄液は、ワーク12上を半径方
向外方に移動しつつブラシ15中を通過するので、ブラ
シ15を洗浄する作用も実現する。したがってワーク1
2から除去された除去物質が再びブラシ15に付着し
て、再びワーク12を汚損する事態や、新たに洗浄すべ
くセットされたワーク12を汚損する事態を防止でき
る。この点でも、洗浄能力を向上することができる。
As a result, the cleaning liquid can be spread over the entire area of the work 12 covered with the rotating body 19, and the cleaning action can be performed efficiently. Further, since the cleaning liquid from the through holes 25a to 25d passes through the brush 15 while moving outward on the work 12 in the radial direction, the effect of cleaning the brush 15 is also realized. Therefore, work 1
It is possible to prevent a situation in which the removed substance removed from 2 again adheres to the brush 15 and stains the work 12 again, or the work 12 newly set for cleaning is polluted. Also in this respect, the cleaning ability can be improved.

【0017】図6は本発明の他の実施例の回転体19a
の前記図3に対応する断面図であり、図7は回転体19
aの底面図である。本実施例は前述の実施例に類似し、
対応する部分には同一の参照符を付す。本実施例の注目
すべき点は、円板部21を板厚方向に貫通して設けられ
る前記透孔25a〜25dを液溜め溝23側開口部から
下端部21a側開口部へかけて、回転中心位置24寄り
に斜めに傾斜すると共に、周方向に沿って矢符B2方向
に斜めに傾斜して構成することである。
FIG. 6 shows a rotating body 19a according to another embodiment of the present invention.
7 is a sectional view corresponding to FIG. 3 of FIG.
It is a bottom view of a. This embodiment is similar to the previous embodiment,
Corresponding parts are designated by the same reference numerals. The remarkable point of this embodiment is that the through holes 25a to 25d penetrating the disc portion 21 in the plate thickness direction are rotated from the liquid reservoir groove 23 side opening portion to the lower end portion 21a side opening portion. It is configured to be inclined toward the center position 24 and also to be inclined toward the arrow B2 direction along the circumferential direction.

【0018】これにより透孔21a〜25bからの洗浄
液は、図7に矢符B5で示すように周方向の運動量成分
を有し、ワーク12上に落下して渦流を構成する。この
ような洗浄液は、ワーク12上を図8に示す矢符B5の
ように渦巻き状に旋回しつつ、半径方向外方に拡散す
る。したがって洗浄液がブラシ15中を通過する時間が
増大し、かつ洗浄液の過流によってワーク12およびブ
ラシ15の洗浄効率がさらに向上される。
As a result, the cleaning liquid from the through holes 21a to 25b has a momentum component in the circumferential direction as shown by the arrow B5 in FIG. 7 and falls on the work 12 to form a vortex. Such a cleaning liquid is swirled on the work 12 as shown by an arrow B5 in FIG. 8 and diffuses outward in the radial direction. Therefore, the time for the cleaning liquid to pass through the brush 15 increases, and the cleaning liquid overflow further improves the cleaning efficiency of the workpiece 12 and the brush 15.

【0019】図9は、本発明のさらに他の実施例の回転
体19bの断面図である。本実施例は前述の実施例に類
似し、対応する部分には同一の参照符を付す。本実施例
の注目すべき点は、液溜め溝23に開口する透孔25a
〜25dは円板部21内で、半径方向内方に向かって屈
曲して形成され、回転中心部で共通孔35に連通され
る。
FIG. 9 is a sectional view of a rotating body 19b according to still another embodiment of the present invention. This embodiment is similar to the above-mentioned embodiment, and corresponding parts are designated by the same reference numerals. The point to be noted in this embodiment is that the through hole 25a opening to the liquid reservoir groove 23 is formed.
˜25d are formed by bending inward in the radial direction inside the disk portion 21, and communicate with the common hole 35 at the center of rotation.

【0020】すなわち本実施例では、円板部21の下端
部21aに各透孔25a〜25dに対応した4つの開口
部を形成する必要が解消され、回転中心部付近に単一の
共通孔35を形成するればよく、ブラシ15が植設され
る植設領域26を拡大することができる。すなわち本実
施例によっても、前述の実施例で述べた効果と同様な効
果を達成できると共に、ブラシ15の設置面積を拡大で
き、この点においても洗浄効率を拡大することができ
る。
That is, in this embodiment, it is not necessary to form the four openings corresponding to the respective through holes 25a to 25d in the lower end portion 21a of the disk portion 21, and the single common hole 35 is provided near the center of rotation. Can be formed, and the planting region 26 in which the brush 15 is planted can be enlarged. That is, according to this embodiment as well, the same effects as the effects described in the above-described embodiments can be achieved, the installation area of the brush 15 can be increased, and the cleaning efficiency can be increased in this respect as well.

【0021】[0021]

【発明の効果】以上のように本発明に従えば、洗浄装置
で、対象物を洗浄しようとする場合、回転部材の一方側
端部に装着された洗浄部材が対象物に摺動して洗浄作用
を行う。このとき洗浄のための洗浄液は、カバー部材を
介して回転部材の他方側端部に供給され、当該他方側端
部から一方側端部に亘って形成されている透孔を通り、
回転部材の一方側端部における回転中心位置付近に流出
する。したがって対象物上の洗浄液は、洗浄部材を経て
外方に拡散する。これにより洗浄部材には、洗浄液を用
いて洗浄作用が行われる。
As described above, according to the present invention, when an object is to be washed by the washing apparatus, the washing member mounted on one end of the rotary member slides on the object. To act. At this time, the cleaning liquid for cleaning is supplied to the other side end of the rotating member through the cover member, and passes through the through hole formed from the other side end to the one side end,
It flows out near the rotation center position at one end of the rotating member. Therefore, the cleaning liquid on the object diffuses outward through the cleaning member. As a result, the cleaning operation is performed on the cleaning member using the cleaning liquid.

【0022】また、洗浄液は前記回転部材の回転中心位
置付近から外方に広がるので、前記洗浄部材が対象物と
接触する前面に亘って、洗浄液を行き渡らせるこがで
き、洗浄能力を格段に向上することができる。また洗浄
部材は、内方から外方に流過する洗浄液によってそれ自
信洗浄されるので、対象物から除去した除去物質が洗浄
部材に付着する事態が防止でき、新たな対象物を洗浄部
材が汚損することになる事態を防止できる。
Further, since the cleaning liquid spreads outward from the vicinity of the rotation center position of the rotating member, the cleaning liquid can be spread over the front surface where the cleaning member comes into contact with the object, and the cleaning ability is remarkably improved. can do. Further, since the cleaning member is self-cleaning by the cleaning liquid flowing from the inside to the outside, it is possible to prevent the removed substance removed from the target object from adhering to the cleaning member, and the new target member is contaminated by the cleaning member. It is possible to prevent a situation that would occur.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の洗浄装置11の拡大断面図
である。
FIG. 1 is an enlarged sectional view of a cleaning device 11 according to an embodiment of the present invention.

【図2】洗浄装置11の断面図である。FIG. 2 is a cross-sectional view of a cleaning device 11.

【図3】回転体19の断面図である。FIG. 3 is a cross-sectional view of a rotating body 19.

【図4】回転体19の底面図である。FIG. 4 is a bottom view of a rotating body 19.

【図5】回転体19の底面における洗浄液の流過方向を
示す図である。
FIG. 5 is a diagram showing a flowing direction of a cleaning liquid on a bottom surface of a rotating body 19.

【図6】本発明の第2実施例の回転体19aの断面図で
ある。
FIG. 6 is a sectional view of a rotating body 19a according to a second embodiment of the present invention.

【図7】回転体19aの底面図である。FIG. 7 is a bottom view of a rotating body 19a.

【図8】本実施例の洗浄液の流過方向を示す図である。FIG. 8 is a diagram showing the flow direction of the cleaning liquid of the present embodiment.

【図9】本発明の第2実施例の回転体19bの断面図で
ある。
FIG. 9 is a sectional view of a rotating body 19b according to a second embodiment of the present invention.

【図10】従来例の洗浄装置1の断面図である。FIG. 10 is a cross-sectional view of a conventional cleaning device 1.

【符号の説明】[Explanation of symbols]

11 洗浄装置 12 ワーク 14 カバー 19,19a,19b 回転体 21 円板部 21a 下端部 23 液溜め溝 24 回転中心位置 25a〜25d 透孔 31a〜31d チューブ 11 Cleaning Device 12 Work 14 Cover 19, 19a, 19b Rotating Body 21 Disc Part 21a Lower End 23 Liquid Reservoir Groove 24 Rotation Center Position 25a-25d Through Hole 31a-31d Tube

Claims (1)

【特許請求の範囲】 【請求項1】 回転軸線まわりに回転駆動され、軸線方
向一方側端部における回転中心位置付近以外の範囲に洗
浄部材が装着され、他方側端部から前記一方側端部に亘
り、前記回転中心位置付近の範囲内部に開口する透孔が
形成される回転部材と、 回転部材を外囲して回転自在に保持し、前記洗浄部材側
が開口し、かつ回転部材の前記他方端部に向けて洗浄液
を供給する洗浄液供給部材が設けられるカバー部材とを
含むことを特徴とする洗浄装置。
Claim: What is claimed is: 1. A cleaning member is driven to rotate about a rotation axis, and a cleaning member is mounted in a range other than the vicinity of a rotation center position at one end in the axial direction, and the other end to the one end. A rotating member formed with a through hole that opens inside the area near the rotation center position, and the rotating member is surrounded and rotatably held, and the cleaning member side is open, and the other of the rotating members. A cleaning device, comprising: a cover member provided with a cleaning liquid supply member for supplying a cleaning liquid toward an end portion.
JP3173975A 1991-07-15 1991-07-15 Washing device Pending JPH0515857A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3173975A JPH0515857A (en) 1991-07-15 1991-07-15 Washing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3173975A JPH0515857A (en) 1991-07-15 1991-07-15 Washing device

Publications (1)

Publication Number Publication Date
JPH0515857A true JPH0515857A (en) 1993-01-26

Family

ID=15970491

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3173975A Pending JPH0515857A (en) 1991-07-15 1991-07-15 Washing device

Country Status (1)

Country Link
JP (1) JPH0515857A (en)

Cited By (11)

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Publication number Priority date Publication date Assignee Title
KR100797436B1 (en) * 2005-10-14 2008-01-29 태화일렉트론(주) Washing brush and the apparatus of glass washing equipment
CN100421210C (en) * 2003-12-23 2008-09-24 拉姆研究公司 Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foam, bubbles, and/or liquids
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US8388762B2 (en) 2007-05-02 2013-03-05 Lam Research Corporation Substrate cleaning technique employing multi-phase solution
US8480810B2 (en) 2005-12-30 2013-07-09 Lam Research Corporation Method and apparatus for particle removal
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Publication number Priority date Publication date Assignee Title
CN100421210C (en) * 2003-12-23 2008-09-24 拉姆研究公司 Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foam, bubbles, and/or liquids
US7441299B2 (en) * 2003-12-23 2008-10-28 Lam Research Corporation Apparatuses and methods for cleaning a substrate
US7568490B2 (en) 2003-12-23 2009-08-04 Lam Research Corporation Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids
KR100797436B1 (en) * 2005-10-14 2008-01-29 태화일렉트론(주) Washing brush and the apparatus of glass washing equipment
US8480810B2 (en) 2005-12-30 2013-07-09 Lam Research Corporation Method and apparatus for particle removal
US8388762B2 (en) 2007-05-02 2013-03-05 Lam Research Corporation Substrate cleaning technique employing multi-phase solution
JP2009130122A (en) * 2007-11-22 2009-06-11 Dainippon Screen Mfg Co Ltd Apparatus and method for processing substrate
JP2009140961A (en) * 2007-12-03 2009-06-25 Dainippon Screen Mfg Co Ltd Substrate processing apparatus and substrate processing method
CN102242400A (en) * 2011-06-29 2011-11-16 浙江大学 Method for preparing monocrystalline CaTiO3 dendrite
JP2018142738A (en) * 2014-11-20 2018-09-13 株式会社荏原製作所 Cleaning tool, cleaning tool manufacturing method and substrate cleaning device
US10625308B2 (en) 2014-11-20 2020-04-21 Ebara Corporation Cleaning device, method of manufacturing the same and substrate cleaning apparatus
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KR20170110008A (en) * 2016-03-22 2017-10-10 도쿄엘렉트론가부시키가이샤 Substrate cleaning apparatus
CN107221491B (en) * 2016-03-22 2021-10-22 东京毅力科创株式会社 Substrate cleaning device
CN117002139A (en) * 2023-07-27 2023-11-07 深圳市恒昇光电科技有限公司 Silk screen printing cleaning head and silk screen printing cleaner of Mini LED
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