JPH05147224A - Manufacture of ink jet recording head, ink jet recording head manufactured by the manufacturing technique and ink jet recording device equipped with the head - Google Patents

Abstract

PURPOSE:To ensure that a photosensitive dry development resin material can be developed and removed without the use of a solvent by using the material which is arranged against a pattern of ink flow paths. CONSTITUTION:A substrate 1 is made of, e.g. glass, ceramic or metal, and functions as part of a flow path constituent member for an ink liquid. In addition, the substrate 1 works as a support of a photosensitive material layer, and can be used without restrictions on shape, material quality, etc. A specified number of energy generation elements 2 which generates energy used for discharging liquid such as an electricity/heat conversion element or a piezoelectric element, are arranged on the substrate 1. Thus the energy used for discharging a recording liquid in droplets using the energy generation element 2 is applied to the ink liquid, so that the ink liquid is ejected to record data.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an ink jet recording head, an ink jet recording head manufactured by the manufacturing method, and an ink jet recording apparatus having the head. More specifically, ink jet recording that forms an ink passage in which an energy generator that generates energy used for ejecting ink is disposed correspondingly by performing development or the like using light or heat. The present invention relates to a method for manufacturing a head, an inkjet recording head manufactured by the manufacturing method, and an inkjet recording apparatus including the head.

[0002]

2. Description of the Related Art As an ink jet recording head for recording using an ink jet (liquid jet) recording system,
Those having the following structures are typical. That is, the ink passages that correspond to the energy generators that communicate with the fine ejection openings for ejecting ink and that generate the energy used for ejecting ink An ink jet recording head having an ink passage including a common liquid chamber for storing.

Conventionally, as one of the relatively effective methods for manufacturing such an ink jet recording head, for example, Japanese Patent Application Laid-Open No. 61-154947 (or corresponding U).
Those having the following steps described in SP 4,657,631) are known. (A) A positive type photosensitive resin layer is provided on a substrate, pattern exposure is performed using a mask having a pattern corresponding to an ink passage, and a light irradiation portion by this is dissolved and developed by using a developer, Forming a solid layer corresponding to the pattern of passages. (B) Next, the solid layer is coated with, for example, an active energy ray-curable material or a thermosetting material, and the active energy ray-curable material or the active energy ray-curable material is irradiated by irradiating the active energy ray from above or by heating. Is a step of curing a thermosetting material. (C) A step of dissolving and removing the solid layer with a solvent to form an ink path.

[0004]

However, in such a conventional method for manufacturing an ink jet recording head as described above, the following problems mainly arise in developing and removing the solid layer. (1) Since the solvent is used when developing the solid layer or when forming the ink passage by removing the patterned solid layer, a developing device and a removing device for handling these solvents are required. (2) Along with this, the work process becomes relatively complicated and the workability deteriorates. (3) When the patterned solid layer is removed, the solvent comes into contact with the ink passage wall forming member made of an active energy ray curable material, a thermosetting material, or the like. As a result, the ink passage wall forming member swells or in some cases dissolves, and as a result, fine separation may occur between the substrate and the ink passage wall forming member. This leads to a reduction in dimensional accuracy of the ink passage and a reduction in strength of the inkjet recording head.

Further, these problems may cause problems such as uneven printing density due to variations in ink droplet diameter and printing deviation due to variations in ink ejection speed.

By the way, the peripheral portion of the ejection port of the ink jet recording head is usually subjected to a water repellent treatment in order to maintain a good ink ejection state, but before the solid layer is removed by immersing the substrate in a solvent. When the water repellent treatment is performed, there is a problem that the function of the water repellent agent applied to the ejection port surface may be deteriorated by the solvent or the water repellent agent may be peeled off.

When water repellent treatment is performed by removing the solid layer and then transferring the water repellent agent from the support of the water repellent agent to the ejection port surface, the water repellent agent is transferred from the ejection port to the inside of the ink passage. In this case, the water repellent that has entered will change the ejection speed of the ink, the size of the ink droplets, the ejection direction of the ink, etc., making it impossible to obtain the desired performance. There was a problem.

[0008]

One of the objects of the present invention is to:
A method for manufacturing an ink jet recording head which solves these problems and is highly reliable such as dimensional accuracy and has a high yield and mass productivity, a high precision and high strength ink jet recording head manufactured by the manufacturing method, and the head. An ink jet recording apparatus including the above is provided.

Another object of the present invention is to provide an ink jet recording which can surely apply a water repellent treatment to a desired portion without deteriorating the function of the water repellent agent and without intruding into the ink passage. A method of manufacturing a head, a high-precision and high-strength inkjet recording head manufactured by the manufacturing method, and an inkjet recording apparatus including the head.

Another object of the present invention is to provide the first material, which is volatilized by applying active energy, in the form of a layer on a substrate, and the pattern of an ink path communicating with an ejection port for ejecting ink. Patterning the layer of the first material by applying the activation energy to the layer of the first material, and providing the second material so as to cover the patterned layer of the first material formed by the step. And a step of forming the ink path by volatilizing a layer of the patterned first material coated with the second material by applying the active energy, and forming the ink path. It is to provide a manufacturing method of.

Yet another object of the present invention is to provide a step of providing a layer of a first material which is volatilized by applying active energy and heat on a substrate and a pattern of an ink path communicating with an ejection port for ejecting ink. Accordingly, the step of patterning the layer of the first material by applying the activation energy to the layer of the first material, and the second material so as to cover the patterned layer of the first material formed by the step. And a step of volatilizing the patterned layer of the first material coated with the second material by applying the activation energy and the heat to form the ink path. A method of manufacturing a characteristic inkjet recording head.

The present invention also includes an ink jet recording head manufactured by the above-described manufacturing method and an ink jet recording apparatus having the head.

[0013]

According to the present invention, a dry developing (or self-developing) material that volatilizes and sublimes only by applying light or heat, and among them, preferably a photosensitive dry developing (or self-developing)
Since the resin material is used as the material arranged corresponding to the pattern of the ink passage, it is possible to perform development and removal without using a solvent.

Therefore, according to the present invention, it is not necessary to use a large-scale manufacturing apparatus such as a developing apparatus and a removing apparatus, the process is further simplified, and workability and productivity can be improved. Furthermore, since there is no need to use a solvent, the risk of production is reduced. Further, since a dry developing (or self-developing) material is used, the range of selection of the coating material which has been narrowed due to the relationship with the solvent is widened. In addition, the problem of swelling of the ink passage wall forming member is eliminated, and the problem of minute separation from the substrate is solved. Therefore, an inkjet recording head with high dimensional accuracy can be easily obtained.

[0015]

EXAMPLES As a result of earnest studies to achieve the above-mentioned object, the present inventor has found that a dry developing (or self-developing) material that volatilizes and sublimes only by applying light or heat, preferably a dry photosensitive material is preferable. If a developing (or self-developing) resin material is used as a material arranged corresponding to the pattern of the ink passage, development and removal can be performed without using a solvent. The present inventors have completed the present invention by finding that various problems that may occur by using a solvent during removal can be solved.

Embodiments of the present invention will be described in detail below with reference to the drawings.

1 to 5 are schematic perspective views for explaining a method of manufacturing an ink jet recording head according to a typical embodiment of the present invention in the order of steps. The head according to the present invention is formed on the substrate 1 shown in FIG. The substrate 1 is made of, for example, glass, ceramics, plastic, metal, or the like, and functions as a part of a liquid flow path forming member for an ink liquid described later and also as a support for a photosensitive material layer described later. The shape, material, and the like of the material can be used without any particular limitation as long as they meet the above purpose. In the example of FIG. 1, a predetermined number (9 in this figure) of energy generating elements 2 such as electrothermal conversion elements or piezoelectric elements that generate energy used for ejecting liquid are provided on the substrate 1. It is provided (however, in the case of a piezoelectric element, it is usually provided on the back side of the substrate 1). Energy used for ejecting the recording liquid as small droplets is applied to the ink liquid by such an energy generating element 2, whereby the ink liquid is ejected and recording is performed. Incidentally, for example, when an electrothermal conversion element is used as the energy generation element 2, the ink liquid is ejected by heating the recording liquid in the vicinity of this element. Further, for example, when a piezoelectric element is used, the ink liquid is ejected by the mechanical vibration of this element.

Incidentally, these energy generating elements 2 include
A control signal input electrode (not shown) for operating these elements 2 is connected and provided. Further, generally, various functional layers such as a protective layer are often provided for the purpose of improving the durability of these energy generating elements.

Next, a layer 3 of a first material, particularly a first photosensitive material, is formed on the substrate 1 on which the energy generating element 2 is arranged. As a method for forming the first photosensitive material layer 3, a solution in which the photosensitive material is dissolved may be applied by a solvent coating method, or a dry film coated with the photosensitive material may be prepared and a substrate may be applied by a laminating method. It may be laminated on top.

The solvent coating method is a method in which a photosensitive material solution is applied onto a substrate by a spin coater, a roll coater, a wire bar or the like, and then the solvent is dried and removed to form a photosensitive material layer. Here, in the present invention, as the first photosensitive material layer 3, for example, a resin that volatilizes when irradiated with an active energy ray and then heated is used.
As a photosensitive material having such a property, Poly is available.
mer Journal, 19 (1) 31 (1987)
The following formula [1] described in

[0021]

[Outer 1] There is a liquid photosensitive material in which a photoacid generator is mixed with a polycarbonate containing the above structural unit as a main component and dissolved in a solvent. This photosensitive material is of a positive type, and when irradiated with an active energy ray, an acid is generated in the irradiated portion, and when heated in this state, the polycarbonate decomposes and volatilizes. Therefore, this photosensitive material can remove the active energy ray-irradiated portion by simply heating it without using a solvent during development. Examples of the polycarbonate of the above formula [1] include those having a structure shown in Table 1 below.

[0022]

[Table 1]

The photoacid generator is preferably an onium salt such as triphenylsulfonium hexafluoroacenate or triphenyliodonium hexafluorophosphate, or a polyhalogen compound, and its compounding amount is 1 to 25 with respect to the polycarbonate. It is preferable to set it to be wt%. Further, as a solvent for dissolving them, those which are usually used can be used.

In a typical embodiment of the present invention, the first photosensitive material layer 3 is formed by coating the substrate 1 with a resin solution which is volatilized by heating in the active energy ray irradiation section and then removing the solvent. Is formed on the substrate 1. The method of forming the material layer 3 is not limited to this, and may be, for example, a laminating method.

First photosensitive material layer 3 formed by the above method
Then, the portion other than the planned ink passage formation portion including the ink liquid flow path and the common liquid chamber communicating with the ink ejection port described later is exposed to obtain the pattern latent image 4 as shown in FIG.

In this case, active energy rays are used as the irradiation light, which includes ultraviolet rays, far ultraviolet rays, electron beams, radiation and the like. The irradiation is preferably for 1 to 15 minutes.

Next, by heating the substrate 1 on which the first photosensitive material layer 3 on which the pattern latent image 4 is formed is laminated, the portion of the first photosensitive material layer 3 other than the portion where the ink passage is planned to be formed. Is volatilized and removed to obtain the solid layer 5 having the pattern shown in FIG. Here, the heating temperature is preferably 60 to 100 ° C., and the heating time is preferably about 1 to 20 minutes, though it varies depending on the material used, for example, the type of polycarbonate or photoacid generator and the film thickness.
Further, the heating may be carried out under normal pressure or reduced pressure.

In the present invention, a layer 6 of a second material, especially a second photosensitive material, is further laminated on the solid layer 5 thus obtained, as shown in FIG. As the resin used for the second photosensitive material layer 6, a negative resist that is cured by irradiation with the active energy ray is preferably used.
As the negative resist, for example, an epoxy resin which initiates cationic polymerization by light, an acrylic oligomer having an acrylic ester group which radically polymerizes by light, an unsaturated cycloacetal resin, a photoaddition polymerization type resin using polythiol and polyene, etc. preferable.

In the present invention, active energy rays are then irradiated from above the second photosensitive material layer 6 laminated as described above (in the direction of arrow A in FIG. 4). The irradiation conditions are almost the same as above. In this way, by irradiating with the active energy ray, the second photosensitive material layer 6 is cross-linked and insolubilized, and an acid is generated by the irradiation in the portion where the ink passage is to be formed (solid layer 5).

Finally, the solid layer 5 is volatilized and removed by heating the material irradiated with active energy as described above, thereby forming an ink passage as shown in FIG. Inkjet recording head 10 as described above
To manufacture.

Incidentally, examples of the self-developing photosensitive material include those described in J. Vac, Sci. Te
chnol. , B1 (4), 1178 (1983), B7 (6), 1778 (1989), and the like, SPIE, 539,166 (1985).
And the polysilane compounds described in J. Elect
rochen. Sov. , 133 (1), 181 (19
86), Polym. Eng. Sci. , 23 (1
8), 1012 (1983) and the like, and the like in which a compound capable of generating an acid by light is added to poly (O-phthalaldehyde) whose terminal is blocked with an acetyl group or pyridine. These are polymers that are decomposed and gasified in the light-irradiated portion, or acids are generated in the light-irradiated portion and decomposed and gasified into monomers, that is, a positive-type self-developing photosensitive material. Is.

By using such a photosensitive material that can be developed and removed only by irradiation with light, it is not necessary to use a solvent, and the above-mentioned problems can be solved.

As the ink passage wall forming member provided on the solid layer, for example, a thermosetting resin material or a naturally curable resin material is melted, or these resin materials are dissolved in an appropriate solvent. Can be mentioned as a suitable material. Of these, epoxy and acrylic resin materials are preferable.

Further, as the photosensitive material capable of self-developing, Polym. Eng. Sci. , 14 (7), 52
5 (1974), or Polymers in El
The poly (olefin sulfone) described in Electronics, 55 (1984) and the like can be mentioned. This material is obtained by adding a sensitizer such as pyridine-N-oxide, P-nitropyridine-N-oxide or benzophenone to poly (2-methylpentene-1 sulfone) or poly (1-butene sulfone). It is a material that decomposes and scatters due to subsequent heating when irradiated with light. That is, while the above-mentioned photosensitive material is decomposed and scattered only by light irradiation, this material is decomposed and scattered by light irradiation and heating.

Since such a photosensitive material can also be developed and removed by light irradiation and heating, it is not necessary to use a solvent, and the problem of the present invention is solved.

In using such a photosensitive material,
As the ink passage wall forming material coated on the photosensitive material, for example, a photocurable material, a thermosetting resin material or a natural curable resin material is melted, or these resin materials are used in an appropriate solvent. Examples of suitable materials include melted materials. In particular, the photocurable material is advantageous in that the curing is performed simultaneously with the irradiation of the solid layer with light.

Examples of the self-developing photosensitive material include those described in J. Electrochem. Sci. , 1
Poly (4-chlorophthalaldehyde) or poly (4-bromophthalaldehyde) described in 36 (1), 241 (1989) is mentioned as a more preferable material. These are synthesized by anionic polymerization of 4-chlorophthalaldehyde and 4-bromophthalaldehyde, which are in a gas state at room temperature, in the presence of a catalyst at a low temperature of -78 ° C.

These compounds become materials having photosensitivity by mixing with compounds which generate an acid upon irradiation with light. That is, an acid is generated in the light-irradiated portion, and when this is heated, the acid decomposes the polymer and becomes a thermally developable positive photosensitive material that becomes a gasified monomer. In the case of this material, the degree of removal of the solid layer is further improved. Further, this photosensitive material is also relatively excellent in terms of sensitivity.

Other examples of such a material include: Ele
ctrochem. Soc. , 136 (1), 245
(1989) or the like, or poly (4-trimethylsilylphthalaldehyde), or SPIE. 920,13
The poly [4,5-bis (trimethylsilyl) phthalaldehyde] described in (1988) and the like can be mentioned.

The advantage of these materials is that the light irradiation amount and the heating temperature during development or removal can be set to a desired temperature depending on the ratio of the photo-acid generator to be mixed.

As the ink passage wall forming material, for example, a photocurable material, a thermosetting resin material or a natural curable resin material melted, or a material obtained by dissolving these resin materials in an appropriate solvent is used. It can be mentioned as a suitable material. In particular, the photocurable material is advantageous in that the curing is performed simultaneously with the irradiation of the solid layer with light.

Here, when a material requiring a relatively large amount of light irradiation, such as an epoxy resin, is used as the active energy ray-curable material for coating the solid layer, the material is required to be cured. A large amount of light energy is also applied to the solid layer. For this reason, it may be necessary to reduce the sensitivity by reducing the proportion of the photo-acid generator and prevent self-development in the course of curing the coating material of these photosensitive materials that are solid layers.

On the other hand, when an active energy ray-curable material such as an acrylic resin that does not require a large amount of light irradiation for curing the active energy ray-curable material is used, The sensitivity can be increased by increasing the ratio. It is also useful to adjust the proportion of the photo-acid generator by adjusting the coating thickness of these curable materials.

As described above, according to this example, a desired material suitable for the manufacturing process can be used as the active energy ray-curable material with which the solid layer is coated, and liquid jet recording with a desired thickness can be performed. The head can be manufactured more easily.

As the compound which generates an acid upon irradiation with light, many compounds such as onium salts and polychloro compounds can be used. Of these, onium salts having a photosensitive region in the far ultraviolet region are effective in terms of sensitivity. In particular,
When the photosensitizing wavelength of the initiator in the active energy ray-curable material that is the coating material is in the far-ultraviolet range, it is possible to more surely suppress self-development of the solid layer during curing of the curable material. Photoacid generators are described in, for example, US Pat. No. 3,954,
It is also possible to use a compound having an absorption wavelength in the ultraviolet region such as the polyhalogen compound described in 475.

By the way, in order to provide the ink passage wall forming member on the patterned solid layer, in addition to the so-called casting method in which the liquid material serving as the ink passage wall forming member is flown onto the solid layer, potting, injection molding, transfer Molding or the like may be used. Above all, transfer molding is more effective in terms of work efficiency, mass productivity, and dimensional accuracy.

That is, a pattern-like solid layer made of a self-developing material is formed on the substrate at a position to be an ink passage, and the ink passage wall forming member is formed on the substrate by transfer molding so as to cover the solid layer. And then the solid layer is removed. Since the positioning accuracy of the ink passage with respect to the substrate is the same as the positioning accuracy of the solid layer with respect to the substrate, it is possible to achieve high accuracy, and the strength of the close contact between the ink passage wall forming member and the substrate becomes sufficient. The number of steps is small. If the surface of one of the molds that holds the substrate is in contact with the substrate with a flexible member, the force applied to the substrate during molding will be a more even pressure, and there will be sufficient cracking of the substrate and damage to the energy generating elements on the substrate. Can be prevented.

If the ink passage wall forming members corresponding to the two ink jet recording heads arranged opposite to each other are integrally formed on the substrate, and then cut.
The work amount per head is further reduced.

Another embodiment of the present invention will be described with reference to the accompanying drawings.

FIGS. 6 and 7 are schematic cross-sectional views for explaining the step of forming the patterned solid layer 43 on the portion of the substrate 41 to be the ink passage. 8 and 9 are schematic cross-sectional views showing a step of covering the solid layer 43 with the ink passage wall forming material 44 and a step of gasifying the solid layer 43 to form an ink passage, respectively. Figure 1
Reference numeral 0 is a schematic perspective view showing the ink jet recording head manufactured as described above.

A positive type dry developing photosensitive resin (hereinafter referred to as "DD") is formed on a substrate 41 for forming a plurality of heads.
R ”) to form a layer of photosensitive resin (corresponding to reference numeral 3 in FIG. 1). Next, as shown in FIG.
This layer is irradiated with ultraviolet rays 49. At that time, a mask 48 is used for a portion which should be an ink passage, and the portion other than the portion is irradiated with the ultraviolet ray 49, and the portion irradiated with the ultraviolet ray 49 is gasified 50. Result As shown in FIG. 7, a patterned solid layer 43 is formed on the substrate 41.

The DDR used in the present invention is Poly
m. J. 19 (1) 31, 1987, Polym E
ng. Sci 23, 102, 1983, and J.
Electrochem. Soc. 136 (1) 24
1, 1989 etc., (a) a combination of a photo-acid generator (onium salt) and a carbonate resin (b) a combination of a photo-acid generator (onium salt) and a phthalaldehyde resin However, the present invention is not limited to these.

At this time, if the DDR has photo-developing property,
In this process development is completed and a solid layer is formed. On the other hand, when the DDR has heat developability, the development is completed when the DDR is put in a heating mold (molding mold) into which the mold resin is injected, when the next process is performed.

As the next step, as shown in FIG.
On the substrate 41 on which the solid layer 43 is provided, transfer molding is performed using a mold resin (hereinafter, referred to as “MR”) as the ink passage wall forming member 44 so as to cover the solid layer 43. Next, the solid layer 43 of the DDR is heated and gasified 50 to be removed. As a result, an ink passage is formed on the substrate 41 by the ink passage wall forming member 44 as shown in FIG.

As the material of the MR, crosslinkable urethane, epoxy, melamine, unsaturated resin and the like and thermoplastic resin such as acrylic, polyolefin, polyester and polysulfone can be used.

As a method using the transfer molding of the present embodiment, the substrate on which the DDR solid layer is formed is inserted into a molding die composed of an upper die and a lower die. The molding conditions include epoxy resin, for example NT
-8500 series (manufactured by NITTO), EME-70
When using 0 series and EME-500 series (Sumitomo Bakelite Co., Ltd.), molding temperature is 130 to 180 ° C., curing time is 1 to 5 minutes, and injection pressure is 30 to 100 Kgf / cm ² in terms of moldability (foam, flash). , Burrs etc.) and set appropriate points for each. The higher the molding temperature, the shorter the curing time.
Further, the higher the injection pressure is, the less bubbles are generated, but excessive pressure causes burrs and flashes.

The mold substrate molded under the above-mentioned molding conditions needs to be fully cured before it becomes a final product form.
Of course, depending on the usage of the product, the main curing step can be omitted.

Since DDR is used as the solid layer in this embodiment, it is necessary to finally remove the solid layer. Since heating is performed as a removing means, the solid layer is removed and the mold resin is fully cured. By performing the post-cure that also serves as the above, the number of steps is further reduced and the optimum characteristics of the molded resin body can be obtained. The conditions for post-care are 180 to 25
Generally, the temperature is 0 ° C. for 30 minutes to 2 hours, but if the temperature is raised, the treatment can be performed in a short time. Further, it is more effective to irradiate ultraviolet rays before heating as a means for promoting removal of the solid layer. However, the molding resin used in this case must be transparent or semitransparent.

If it is necessary to cut and form the discharge port, it can be performed after transfer molding or post-curing. The method may be a known method such as dicing a wafer. When performing after transfer molding, the solid layer is clogged in the ink passage when the ejection port is cut, so factors such as cutting powder and dust that cause clogging of the ejection port of the inkjet recording head enter the ejection port inward. There is an advantage that can be prevented.

An example of the method of using the self-developing type photosensitive resin will be described in more detail. First, a positive type self-developing resist is applied on a substrate by a known method. The photo-developing resist, which is a self-developing resist, gasifies and scatters as it is in the photo-irradiated portion, and the acid generated by photo-irradiation disperses the compound. As such a substance, a compound obtained by adding an onium salt as a photo-acid generator to polyphthalaldehyde having an alkylated or acylated terminal is preferably used in terms of sensitivity, heat resistance and the like (H. It.
o et al, Polym. Eng. Sci. , 2
3, 1012 1983).

The light irradiation part of this self-developing resist is 200
It is stable up to about ℃, and above that temperature, decomposition and gasification proceed rapidly. When coating, cellosolve acetate, which is a general resist solvent, can be used. Further, especially when an excimer laser (KγF) is used as a light source, no photoacid generator is required.

First, a resist comprising alkyl-terminated polyphthalaldehyde + triphenylsulfonium hexafluoroantimonate + cellosolve acetate is applied on a substrate and baked to form a film.

The layer is then patterned by irradiating it with deep UV radiation from a Hg lamp. Next, the substrate is inserted into a molding die, a molding resin is injected, and heating is performed to pre-cure the resin. If the temperature is 200 ° C. or lower, the resist is stable.

Next, regarding the removal of the resist, when the molding resin transmits light (far infrared rays in this case), the resist can be removed by directly irradiating the light.
The removal rate is accelerated by the combined use of heating. Further, even when light is not transmitted, it can be removed by heating at 200 ° C. or higher. In this case, it is convenient that post-curing of the molding resin is carried out at the same time.

Among the self-developing type resists, the positive type heat developing resist gasifies only the light irradiation portion by heating,
It is scattered.

Examples of such a material include polycarbonate to which an onium salt is added as a photoacid generator (Pol.
ym. J. 19 (1) 31, 1987), poly (4-
Chlorophthalaldehyde), poly (4-bromophthalaldehyde), poly (4-trimethylsilylphthalaldehyde) plus onium salt (J. Electro.
chem. Soc. 136 (1) 241,1989 etc.)
Etc., but the latter is particularly preferably used in terms of sensitivity and the like.

This heat-developable resist has a light non-irradiated area of about 2
It is stable up to 20 ° C, and if it is higher than that, decomposition and gasification proceed rapidly. The light irradiation portion, that is, the portion where the acid is generated, is decomposed and gasified by heating at about 100 ° C. or higher, and safe development is achieved by heating at about 160 ° C. At this time, no heat flow occurs and the heat resistance is very excellent.

The photoacid generator is not limited to an onium salt, and a polychloro compound or nitrobenzyl sulfonate may be used.

First, a resist composed of poly (4-chlorophthalaldehyde) + triphenylsulfonium hexafluoroantimonate + cyclohexane is coated on a substrate and baked to form a film.

Next, after irradiating with deep ultraviolet rays, it is kept at 160 ° C. for 3
Development is completed by heating for 5 minutes (vacuum is preferred). At this time, if the light irradiation amount is large, the heating time can be shortened accordingly. Then, the substrate on which the solid layer is formed is inserted into a mold and a molding resin is injected. At this time, if the mold is preheated at 160 ° C., the main curing of the molding resin can be performed simultaneously with the precuring. If the temperature at this time is 220 ° C. or lower, the resist is stably present. The removal of the resist is achieved by irradiating light from above when the molding resin transmits far ultraviolet rays and heating at 160 ° C. in vacuum. Even when the molding resin does not transmit far-ultraviolet rays, it can be removed by heating in vacuum at 220 ° C. or higher. At this time, post-curing of the molding resin can be performed at the same time, which leads to simplification of the process.

Now, still another embodiment of the present invention will be described. First, the manufactured inkjet recording head will be described with reference to FIG.

In FIG. 12, a heat generating portion 62a and an electrode 62, which constitute an electrothermal converter, are formed on a device surface 61a of a substrate 61 made of a glass or silicon wafer using a semiconductor manufacturing process such as etching, vapor deposition, and sputtering. Then, they are formed into a film and arranged at a predetermined interval. Further, an ink passage wall forming member 63 made of a thermosetting resin such as epoxy resin or silicon resin is formed on the element surface 61a by transfer molding or the like.

In the ink passage wall forming member 63, a plurality of groove portions are formed corresponding to the positions of the heat generating portions 62a of the electrothermal converter, and the spaces surrounded by the groove portions and the element surface 61a are respectively ink flow passages 63b. And the ink flow path 6
The openings that open to the outside of 3b form discharge ports 63a, respectively. A water repellent agent (not shown) that repels the ink is applied to the ejection port surface 66 where each of the ejection ports 63a is opened to prevent the ink from staying, and is subjected to a water repellent treatment by application or transfer. There is. The ink passage wall forming member 63 has an ink passage 63b formed by each groove.
A cavity having an element surface 61a is formed as a bottom wall in communication with the cavity, and the cavity constitutes a liquid chamber 63c.
Further, an opening that connects the liquid chamber 63c and the outside (such as a connector 64 described later) is formed so as to open in the same direction as the element surface 61a faces, and the opening is provided.
It is 3d.

A supply pipe 65 connected to an ink tank or the like (not shown) is connected to the supply port 63d via a connector 64, and ink is supplied from the ink tank to the supply port 63d.
The liquid is supplied to the liquid chamber 63c through d.

Here, the operation when ink is ejected from each ejection port 63a will be explained. The ink supplied to the liquid chamber 63c and temporarily stored invades the ink flow passage 63b due to the capillary phenomenon, and The meniscus 63a is formed to keep the ink flow path 63b filled. At this time, when the heat-generating portion 62a of the electrothermal converter is energized via the electrode 62 to generate heat, the ink on the heat-generating portion 62a is rapidly heated to generate bubbles in the ink flow passage 63b, and the bubbles expand. Thus, the ink is ejected from the ejection port 63a.

Although the electrothermal converter is shown as the energy generating element for generating the energy used for ejecting the ink, it is not limited to this, and mechanical energy for instantaneously applying the ejection pressure to the ink is generated. A piezoelectric element or the like may be used. Also, the number of discharge ports 63a is 16 / mm
For example, 128 or 256 pieces can be formed at a high density, and a full line type can be formed by forming only a number that covers the entire width of the recording area of the recording medium.

Next, a method of manufacturing the ink jet recording head according to this embodiment will be described.

As shown in FIG. 13, a device surface 121a of a substrate 121 made of a glass or silicone wafer or the like.
Then, the electrothermal converter including the heat generating portion 122a and the electrode 122 is formed at a predetermined interval by using a semiconductor manufacturing process such as etching, vapor deposition, and sputtering.

In the present embodiment, the description will be made on the case where three energy generating elements are provided, but the number of the energy generating elements and the ink flow paths and the ejection ports corresponding thereto is not limited to three, and other It goes without saying that the number can be appropriately changed and provided. Although not shown, various functional layers such as a protective film are generally provided on the electrothermal converter for the purpose of improving durability.

FIG. 14 shows a state in which a patterned solid layer 126 made of a dry-developing resist is formed on the element surface 121a of the substrate 121, which is to be an ink flow path and a liquid chamber, by using a photoforming process. Is shown. In the solid layer 126, each ink flow path portion 126b serves as a mold for forming a wall of the ink flow path, and the solid layer 12
The liquid chamber part 126c of 6 serves as a mold that forms the wall of the liquid chamber. Each ink flow path portion 1 of the solid layer 126
26b coats each electrothermal converter. The dry developable resist will be described later.

Next, a process of providing a resin which will be an ink passage wall forming member on the element surface 121a of the substrate 121 on which the solid layer 126 is formed will be described. In this embodiment, an example of transfer molding is shown, but the method of providing the resin is not limited to transfer molding.

First, the mold used for transfer molding will be described. As shown in FIG. 15, the mold is the first mold 127.
And a second mold 128.

The first die 127 is formed with a recess having a depth equivalent to the thickness of the substrate 121 for fitting and fixing the substrate 121. When the substrate 121 is fitted into this recess. The element surface 121a of the substrate 121 is configured to be flush with the parting surface. Second mold 1
28 is a cavity portion 1 for molding a resin serving as an ink passage wall forming member that forms an ink flow path and a liquid chamber.
28a is formed. Inside the cavity portion 128a, a protrusion 128b for forming a liquid chamber and a supply port for supplying ink to the liquid chamber from the outside is formed.
The tip end surface of the protruding portion 128b abuts the illustrated upper surface of the liquid chamber portion 126c of the solid layer 126 during mold clamping. Electrical connection portion 122b of each electrode 122 on the element surface 121a of the substrate 121
The part including the part is configured to protrude from the cavity portion 128a to the parting surface side of the second die 128 when the die is clamped.

First mold 127 and second mold 1 described above
As shown in FIG. 16, the ink passage wall forming member 129, which is a resin molded from 28, covers each ink flow passage portion 126b of the solid layer 126, and a part of the liquid chamber portion 126c of the solid layer 126. Is exposed. Further, after the mold release, predetermined portions of the substrate 121 and the ink passage wall forming member 129 are cut to form the ejection port surface 130, and the ejection port surface 130 has a surface corresponding to the ejection port of the solid layer 126. Exposed.

Although a part has been described above, in transfer molding, for example, a thermosetting epoxy resin is used as the material of the ink passage wall forming member 129, and the resin preheating temperature 6
It can be performed according to general molding conditions of 0 to 90 ° C., injection pressure of 20 to 140 Kgf / cm ² , mold temperature of 100 to 180 ° C., curing time of 1 to 10 minutes, and post cure after molding. As the other material of the ink passage wall forming member 129, a liquid material having room temperature curability, heat curability, or UV curability can be used.
For example, epoxy resin, acrylic resin, diglycol dialkyl carbonate resin, unsaturated polyester resin,
Examples thereof include polyurethane resin, polyimide resin, melamine resin, phenol resin and urea resin.

FIG. 11A shows the periphery of the surface of the substrate 121 and the ink passage wall forming member 129 corresponding to the ejection port of the solid layer 126, that is, the ejection port surface 130.
In the figure, the state in which the water repellent 131 is attached is shown including the surface corresponding to the ejection port of the solid layer 126.

As a method of attaching the water repellent 131 to the discharge port surface 130, conventionally known means can be used. For example, a water-repellent agent 131 is applied to a support such as a coating roller, a plate-shaped one, or a film-shaped one, and the support is pressed against the ejection port surface 130 to transfer the water repellent 131 to the ejection port surface 130. There is a method. Further, a means for spraying the water repellent 131 to adhere it to the ejection port surface 130, a means for immersing only the portion of the ejection port surface 130 in the water repellent 131, or the like may be used. The film thickness of the water repellent 131 is preferably 1 μm or less.

FIG. 11B shows a state in which the solid layer 126 is removed from at least one of light and heat from the substrate 121 and the ink passage wall forming member 129 to which the water repellent 131 is attached on the ejection port surface 130. Shows. A space is formed by removing the solid layer 126 inside the ink passage wall forming member 129, and the space constitutes an ink flow passage 129b, a liquid chamber 129c, and a supply port 129d, and the opening end of the ink flow passage 129b. Is the discharge port 129a. Further, the water repellent 131 is directly attached to the ejection port surface 130, and the water repellent 131 attached to the surface of the solid layer 126 corresponding to the ejection port is removed together with the solid layer 126.

Hereinafter, the present invention will be described more specifically with reference to Examples. Unless otherwise specified, the ratio is based on weight.

Example 1 A liquid jet recording head was manufactured according to the manufacturing process shown in FIGS.

First, on the glass substrate 1 on which the electrothermal converter 2 (material of the heating resistance layer: HfB ₂ ) as the energy generating element is formed, the polycarbonate 1. having the structure (a) shown in Table 1 is formed. 35 parts by weight Triphenylsulfonium hexafluoroarsenate 0.13 parts by weight Methyl cellosolve acetate 10 parts by weight A solution of the solution is applied with an applicator, dried at 80 ° C. for 10 minutes, and is a first photosensitive material having a thin film of about 15 μm. Layer 3 was formed (Figure 1). A mask having a pattern corresponding to the ink passage shown by the dotted line in FIG. 2 is overlaid on the photosensitive material layer 3, and the active energy is applied to the portion excluding the planned formation portion of the ink passage including the ink liquid passage and the common liquid chamber. The rays were irradiated with deep ultraviolet rays.

Next, the substrate provided with the first photosensitive material layer on which a latent image is formed is heated to 80 ° C., and the portion irradiated with deep ultraviolet rays is removed by volatilization to perform pattern development,
A solid layer 5 as shown in FIG. 3 was formed on a portion of the glass substrate where ink passages were to be formed.

On the substrate on which this solid layer 5 is formed, epoxy resin Cyvacure UVR-6110 40 parts Cyvacure UVR-6200 20 parts Cyvacure UVR-6351 40 parts manufactured by Nippon Union Carbide Co., Ltd. 40 parts triphenylsulfonium hexafluoro as a catalyst. Using a mixture of 2.5 parts of antimonate as an active energy ray-curable material, an applicator of about 70
The second photosensitive material layer 6 was formed by coating with a thickness of micron (FIG. 4). The active energy ray curable material was cured by irradiating ultraviolet rays, which are active energy rays, from the upper surface direction of the substrate 1 with an ultrahigh pressure mercury lamp. At this time, the solid layer 5 is also irradiated with ultraviolet rays through the second photosensitive material layer 6.

Next, the solid layer 5 is removed by heating the thus formed material to 80 ° C. in vacuum,
A liquid flow path 8 and a common liquid chamber 9 communicating with the ink ejection port 7 are formed. At this time, the second photosensitive material layer 6 was further cured by heating in vacuum.

No residue of the solid layer was present in the ink liquid flow path 8 and the common liquid chamber 9 of the liquid jet recording head 10 of FIG. 5 manufactured as described above.

Since no solvent is used for development, the second
No swelling of the photosensitive material layer 6 was observed, and no minute peeling from the substrate was confirmed.

[Example 2] A liquid jet recording head was manufactured in substantially the same manner as in Example 1. However, as the material of the first photosensitive material layer, polycarbonate having the structure (b) shown in Table 1 1.40 parts by weight triphenylsulfonium hexafluoroarsenate 0.13 parts by weight methyl cellosolve acetate 10 parts by weight The first photosensitive material layer 3 was formed by drying the solution containing the above at 80 ° C. for 10 minutes. Development is 70
The solid layer 5 was heated at 70 ° C. to form the ink passage, and the solid layer 5 was removed by heating at 70 ° C. in vacuum. There was no residue of the solid layer 5 in the liquid flow path, common liquid chamber, etc. of the liquid jet recording head manufactured in this manner.

No swelling of the second photosensitive material layer (active energy ray curable material) was observed, and no minute peeling from the substrate was observed.

[Example 3] A liquid jet recording head was manufactured in substantially the same manner as in Example 1. First, 1.40 parts by weight of polycarbonate having the structure of (c) shown in Table 1 1.40 parts by weight of triphenylsulfonium hexafluoroarsenate on a glass substrate to which a piezoelectric material PbTiO ₃ (not shown) is bonded from the back side as an energy generating element. A solution of 0.13 parts by weight of ethyl cellosolve acetate 10 parts by weight was applied with an applicator and dried at 80 ° C. for 10 minutes to form a first photosensitive material layer as a thin film of about 15 μm. A mask having a pattern corresponding to the ink passage shown by the dotted line in FIG. 2 was overlaid on this first photosensitive material layer, and far-ultraviolet irradiation was performed on the portion other than the ink passage formation planned portion. Next, this substrate is heated to 80 ° C., and pattern development is performed by volatilizing and removing the portion irradiated with far ultraviolet rays.
A solid layer 5 as shown in was formed. On the substrate on which the solid layer 5 is formed, a mixture of acrylic resin Photomer 4149 50 parts Photomer 3016 50 parts acrylic resin manufactured by San Nopco Co., Ltd. and 3.0 parts by weight of benzyl dimethyl ketal as a catalyst is used as an active energy ray curable material. To form a second photosensitive material layer 6 (FIG. 4). The active energy ray curable material was cured by irradiating with ultraviolet rays from the upper surface direction of this substrate. At this time, the solid layer 5 was also irradiated with ultraviolet rays through the active energy ray-curable material. Next, the thus-formed material is vacuumed to 8
By heating to 0 ° C., the solid layer 5 was volatilized and removed, and the ink liquid flow path 8 and the common liquid chamber 9 were formed (FIG. 5). At this time, the active energy ray curable material was further cured by heating in vacuum. No solid layer residue was present in the ink liquid flow path and common liquid chamber of the liquid jet recording head thus manufactured.

No swelling of the active energy ray-curable material was observed, and no minute peeling from the substrate was observed.

[Example 4] A liquid jet recording head was manufactured in substantially the same manner as in Example 3. However, as the material of the first photosensitive material layer, a solution of polycarbonate having the structure (d) shown in Table 1 1.40 parts by weight triphenyliodonium hexafluorophosphate 0.15 parts by weight ethyl cellosolve acetate 10 parts by weight Was dried at 80 ° C. for 10 minutes to form a thin film of the first photosensitive material layer. Further, the development was carried out by heating at 70 ° C., and the solid layer for forming the liquid flow path and the like was removed by heating at 70 ° C. in vacuum.

No residue of the solid layer was present in the ink liquid flow path and the common liquid chamber of the liquid jet recording head thus manufactured.

No swelling of the active energy ray-curable material was observed, and no minute peeling from the substrate was observed.

Example 5 As shown in FIG. 1, a solution having the following composition was applied on the substrate 1 by the spin coating method. Acetyl-terminated poly (O-phthalaldehyde) 5 parts by weight Triphenylsulfonium hexafluoroarsenate 0.5 parts by weight Cyclohexanone 20 parts by weight

Then, the substrate 1 was dried at 80 ° C. for 10 minutes to form a photosensitive material layer 3 having a thickness of about 10 μm.

Further, a mask having a pattern of the shape shown by reference numeral 4 in FIG. 2 is overlaid on the photosensitive material layer 3, and about 50 mJ · cm ^{−2 is applied} to a portion excluding the ink passage and the planned formation portion of the common liquid chamber. Was irradiated with far-ultraviolet light under vacuum. As a result, the photosensitive material layer 3 at the portion irradiated with the far ultraviolet rays is decomposed and gasified, and the solid layer 5 corresponding to the ink passage on the glass substrate and the portion where the common liquid chamber is to be formed is formed as shown in FIG. It remained.

Next, as shown in FIG. 4, a substrate 1 on which a solid layer 5 is formed is defoamed with a thermosetting epoxy resin Araldite CY230 / HY956 (trade name, manufactured by Ciba-Geigy). Was applied with an applicator to a thickness of about 30 μm. After that, these are heated at 100 ° C. for 30 minutes to cure the thermosetting resin, and the ink passage wall forming member 6
Formed.

Next, from the ejection port 7 side, and subsequently from the ink supply port (both sides of the common liquid chamber 9) side, about 1 J.
Far-ultraviolet rays of cm ^-2 were irradiated in vacuum, and further far-ultraviolet rays of about 5 J · cm ^-2 were irradiated in vacuum from the upper surface side of the substrate. The solid layer 5 was dissolved and removed by these irradiations. The cavity of the removed portion is replaced with the ink passage 8 and the common liquid chamber 9
(Fig. 5). The removal rate may be increased by simultaneously performing heating during this irradiation.

In the ink jet recording head manufactured as described above, the ink passage wall forming member was not exposed to the solvent, so that no swelling was observed and no minute peeling from the substrate was confirmed at all.

[Example 6] In this example, an ink jet recording head was manufactured in substantially the same manner as in Example 5.

However, as a material for forming the photosensitive material layer 3, a solution containing 3.5 parts by weight of nitrocellulose and 50 parts by weight of amyl acetate was used, and heat-dried at 80 ° C. for 30 minutes in a nitrogen atmosphere to perform photosensitivity. The material layer 3 was formed (FIG. 1).

Next, the solid layer 5 shown in FIG. 3 was formed by irradiating an ArF laser of about 3 keV in a vacuum through a mask (FIG. 3).

Then, a thermosetting material was applied and cured on the solid layer formed on the substrate in the same manner as in Example 5 (FIG. 4). Furthermore, about 10 keV in vacuum from the top surface of the substrate
Then, the solid layer 5 was removed, and the ink passage 8 and the common liquid chamber 9 were formed (FIG. 5). Note that heating may be performed at the same time during this irradiation to increase the removal rate.

Also according to this example, a good ink jet recording head could be manufactured.

[Embodiment 7] In this embodiment, an ink jet recording head is manufactured in substantially the same manner as in Embodiment 5.

First, the piezoelectric body P is used as an energy generating element.
Glass substrate 1 with bTiO ₃ (not shown) bonded from the back side
A solution having the following composition was applied onto the above by spin coating. Copolymer of isopropylmethylsilane and n-propylmethylsilane 5 parts by weight THF 10 parts by weight O-xylene 10 parts by weight

The substrate 1 coated with this solution was dried at 180 ° C. for 10 minutes to form a photosensitive material layer 5 of about 7 μm (FIG. 1). By overlaying a mask having a pattern shown by reference numeral 4 in FIG. 2 on this photosensitive material layer, far ultraviolet rays of about 3 J · cm ⁻² are applied in a vacuum to a portion excluding the ink passage and the planned formation portion of the common liquid chamber. Irradiated. As a result, the photosensitive material layer in the far ultraviolet ray irradiation portion was decomposed and gasified, and the solid layer 5 corresponding to the ink passage on the glass substrate 1 and the portion where the common liquid chamber was to be formed remained (FIG. 3).

On the substrate 1 on which the solid layer 5 is formed, acryl wrap SY-105 which is a thermosetting acrylic resin.
(: Trade name, manufactured by Mitsubishi Rayon Co., Ltd.) and defoamed was applied to a thickness of about 20 μm with an applicator.

Then, the substrate was heated at 70 ° C. for 1 hour to cure the liquid thermosetting resin on the substrate 1 to form the ink passage wall forming member 6 (FIG. 4).

Next, from the ejection port 7 side, and then from the ink supply port (both sides of the common liquid chamber 9) side, about 5 J · c respectively.
Far-ultraviolet light of m ^-2 was applied in vacuum, and further far-ultraviolet light of about 40 J · cm ^-2 was applied from the upper surface of the substrate in vacuum. The solid layer 5 was removed by these irradiations. The removed portion was used as the ink passage 8 and the common liquid chamber 9 (FIG. 5).

Also according to this example, a good ink jet recording head could be manufactured.

Example 8 As shown in FIG. 1, a solution containing 5 parts by weight of poly (1-butenesulfone), 1 part by weight of P-nitropyridine-N-oxide and 20 parts by weight of nitromethane was placed on a glass substrate 1. 100 by spin coating
It was dried at 0 ° C. for 15 minutes to form a photosensitive material layer 3 having a thickness of about 10 μm (FIG. 1).

A mask having a pattern shown by reference numeral 4 in FIG. 2 was superposed on the photosensitive material layer 3, and far-ultraviolet irradiation was performed on the portion excluding the ink passage and the planned site for forming the common liquid chamber.

Next, the substrate on which the photosensitive material layer was formed was heated to 100 ° C. to decompose, scatter and remove the material in the portion irradiated with deep ultraviolet rays. As a result, pattern development was performed, and the solid layer 5 corresponding to the ink passage on the glass substrate 1 and the portion where the common liquid chamber was to be formed was formed (FIG. 3).

On the substrate 1 on which this solid layer 5 was formed, epoxy resin Cyvacure UVR-6110 40 parts Cyvacure UVR-6200 20 parts Cyvacure UVR-6351 40 parts manufactured by Japan Union Carbide Co., Ltd., and triphenyl as a catalyst. A mixture of a small amount of sulfonium hexafluoroantimonate was used as an active energy ray-curable material, and it was applied with an applicator to a thickness of about 40 microns. The active energy ray curable material was cured by irradiating the surface of the substrate 1 with ultraviolet rays from the upper surface side of the substrate with an ultra-high pressure mercury lamp to form the ink passage wall forming member 6 (FIG. 4). At this time, the solid layer 5 was also irradiated with ultraviolet rays through the active energy ray-curable material.

Next, the solid layer 5 was decomposed and removed by heating the thus-produced product to 100 ° C. in vacuum to form the ink passage 8 and the common liquid chamber 9 (FIG. 5). At this time, the active energy ray curable material was further cured by heating in vacuum.

The solid layer 5 is formed in the ink passage and the common liquid chamber of the ink jet recording head thus manufactured.
No residue was present.

Example 9 In this example, an ink jet recording head was manufactured in substantially the same manner as in Example 8.

However, as a material for forming the photosensitive material layer 3, a solution containing 4.5 parts by weight of poly (2-methylpentene-1sulfone), 1 part by weight of polyzine-N-oxide and 20 parts by weight of nitromethane was used.

Development, removal of the solid layer, etc. were carried out in the same manner as in the eighth embodiment.

Also according to this example, a good ink jet recording head could be manufactured.

[Example 10] Poly (1-butenesulfone) 5 parts by weight benzophenone 1.2 parts by weight nitromethane 20 was formed on a glass substrate 1 having a piezoelectric body PbTiO ₃ (not shown) as an energy generating element adhered to its back side. A solution of 1 part by weight is applied by spin coating,
It was dried for 15 minutes to form a photosensitive material layer 3 having a thickness of about 10 μm (FIG. 1).

A mask having a pattern shown by reference numeral 4 in FIG. 2 was superposed on the photosensitive material layer 3, and far ultraviolet rays were irradiated to the portion excluding the ink passage and the planned formation portion of the common liquid chamber. Next, the substrate 1 on which the photosensitive material layer is formed is
By heating to 0 ° C., the portion irradiated with deep ultraviolet rays was removed. As a result, pattern development was performed, and the solid layer 5 shown in FIG. 3 was formed in the ink passage on the glass substrate 1 and the portion where the common liquid chamber was to be formed (FIG. 3).

On the substrate on which the solid layer 5 was formed, an active energy ray-curable material having the composition shown below was defoamed and applied to a thickness of about 40 μm using an applicator. Asahi Denka Kogyo KRM2410 70 parts by weight Kyoeisha Yushi-Kagaku Kogyo Epolite 3002 30 parts by weight Nippon Unicar A-187 5 parts by weight Asahi Denka Kogyo SP-170 1.5 parts by weight

The active energy ray curable material was cured by irradiating it with ultraviolet rays from the upper surface side of the substrate coated with this material (FIG. 4). At this time, the solid layer 5 was also irradiated with ultraviolet rays through the active energy ray curable material.

Next, the solid layer 2 was removed by heating the thus-produced product to 100 ° C. in vacuum. The cavity formed by this removal was used as the ink passage 8 and the common liquid chamber 9 (FIG. 5).

Also according to this example, a good ink jet recording head could be manufactured.

[Example 11] 10 parts by weight of poly (4-chlorophthalaldehyde) (in the following structural formula, R ₁ is Cl and R ₂ is H) on the glass substrate 1.

[0139]

[Outside 2] A solution of 0.02 parts by weight of triphenylsulfonium hexafluoroantimonate and 50 parts by weight of cyclohexanone was applied by a spin coating method and dried at 100 ° C. for 10 minutes to form a photosensitive material layer 3 having a thickness of about 7 μm (FIG. 1). ).

A mask having a pattern 4 shown in FIG. 2 is superposed on the photosensitive material layer 3, and about 80 mJ · cm ^{−2 is} applied to the portion excluding the ink passage and the planned formation portion of the common liquid chamber.
Was irradiated with far ultraviolet rays.

Next, the substrate 1 on which this photosensitive material layer is formed is heated at 130 ° C., and pattern development is performed by removing the portion irradiated with far ultraviolet rays.
The solid layer 5 corresponding to the ink passage and the planned formation portion of the common liquid chamber was formed (FIG. 3).

On the substrate 1 on which the solid layer 5 was formed, the active energy ray-curable material obtained by mixing the following composition was defoamed by a vacuum pump, and a material having a thickness of about 30 μm was used with an applicator. It was applied to a thickness. Asahi Denka Kogyo KRM2410 70 parts by weight Kyoeisha Yushi-Kagaku Kogyo Epolite 3002 30 parts by weight Nippon Unicar A-187 5 parts by weight Asahi Denka Kogyo SP-170 1.5 parts by weight

Thereafter, the active energy ray-curable material was irradiated with ultraviolet rays of about 8 J · cm ⁻² to cure the active energy ray-curable material to form the ink passage wall forming member 6 (FIG. 4). .. At this time, the solid layer 5 is also irradiated with ultraviolet rays through the active energy ray curable material,
Since the sensitivity of the solid layer 5 was well controlled, the solid layer 5 could sufficiently remain as a solid without self-developing.

Next, the solid layer 5 was decomposed and removed by heating the thus-produced one to 130 ° C. in vacuum to form the ink passage 8 and the common liquid chamber 9 (FIG. 5). At this time, the curing of the active energy ray-curable material could be further advanced by heating in vacuum.

Also according to this example, a good ink jet recording head could be manufactured.

[Embodiment 12] In this embodiment, Embodiment 11 will be described.
An ink jet recording head was manufactured in substantially the same manner as.

However, as a material for forming the photosensitive material layer 3, 10 parts by weight of poly (4-bromophthalaldehyde) (in the following structural formula, R ₁ is Br and R ₂ is H) is used.

[0148]

[Outside 3] Triphenylsulfonium hexafluoroantimonate 0.2 parts by weight Cyclohexanone 50 parts by weight was used, and the far-ultraviolet irradiation dose was about 5 mJ · cm.
^-2 . As the active energy ray curable material, a mixture of acrylic resin Photomer 4149 50 parts Photomer 3016 50 parts made by San Nopco Ltd. and a small amount of benzyl methyl ketal as a catalyst was used, and about 30 μm was formed on the patterned solid layer 5.
It was applied at a thickness of.

Also, it takes about ² J · cm ^{−2 to} cure this material.
However, the solid layer 5 could sufficiently remain as a solid without self-developing at this time. Development is by heating at 100 ° C., ink path 8,
The removal of the solid layer for forming the common liquid chamber 9 was performed by heating at 100 ° C. in vacuum.

Also according to this example, a good ink jet recording head could be manufactured.

[0151] on the piezoelectric PbTiO ₃ glass substrate 1 (not shown) adhered to the back side of the Example 13 energy generating device, in poly (4-methyl-Shi yl phthalaldehyde) (the following structural formula, R ₁ Is Si (CH ₃ ) ₃ and R ₂ is H) 10 parts by weight

[0152]

[Outside 4] Triphenylsulfonium triflate 0.5 parts by weight Cyclohexanone 50 parts by weight A solution was applied by a spin coating method at 100 ° C.
And dried for 10 minutes to form a photosensitive material layer 3 having a thickness of about 7 μm (FIG. 1).

A mask having a pattern indicated by reference numeral 4 in FIG. 2 is superposed on the photosensitive material layer 3, and a far ultraviolet ray of about 3 mJ · cm ⁻² is irradiated to a portion excluding an ink passage and a planned formation portion of the common liquid chamber. did.

Next, the substrate on which the photosensitive material layer is formed is heated at 110 ° C. to remove the portion irradiated with far ultraviolet rays to perform pattern development, and the ink path on the glass substrate 1 and the common liquid. The solid layer 5 corresponding to the part where the chamber was to be formed was formed.

On the substrate 1 on which the solid layer 5 is formed, a thermosetting epoxy resin Araldite CY230 / H is used.
A mixture of Y956 (trade name, manufactured by Ciba-Geigy Co., Ltd.) and a catalyst was defoamed and applied to a thickness of about 30 μm using an applicator. Then, the substrate was heated at 100 ° C. for 30 minutes to cure the liquid curable material on the substrate (FIG. 4).

Then, about 1 J / c from the upper side of this substrate
Irradiated with deep ultraviolet rays of m ^-2 . Further, this substrate was heated to 110 ° C. in vacuum to remove the solid layer 5, and the ink passage 8 and the common liquid chamber 9 were formed (FIG. 5).

Also according to this example, a good ink jet recording head could be manufactured.

[Embodiment 14] In this embodiment, Embodiment 11 will be described.
An ink jet recording head was manufactured in substantially the same manner as.

However, as a material for forming the photosensitive material layer 3, poly [4,5-bis (trimethylsilyl) phthalaldehyde] (in the following structural formula, both R ₁ and R ₂ are Si (CH ₃ ) ₃ ) 10 wt. Department

[0160]

[Outside 5] Asahi Denka Kogyo SP-170 0.2 parts by weight Cyclohexanone 50 parts by weight was used, and the far-ultraviolet irradiation dose was about 10 mJ · c.
m ^-2 . Further, the heating during development and removal of the solid layer 5 or the heating in vacuum was 120 ° C.

Also according to this example, a good ink jet recording head could be manufactured.

[Embodiment 15] In this embodiment, Embodiment 11 will be described.
An ink jet recording head was manufactured in substantially the same manner as.

However, as a material for forming the photosensitive material layer 3, 10 parts by weight of poly (4-chlorophthalaldehyde) (in the following structural formula, R ₁ is Cl and R ₂ is H) is used.

[0164]

[Outside 6] A solution of 2,4-bis (trichloromethyl) -6-P-methoxystyryl-S-triazine 0.1 part by weight cyclohexanone 50 parts by weight was used, and the irradiation dose of ultraviolet rays for patterning was about 15 mJ · cm ^-2. And As the active energy ray curing material, 70 parts by weight of KRM2410 manufactured by Asahi Denka Co., Ltd., 30 parts by weight of Epolite 3002 manufactured by Kyoeisha Oil and Fat Chemical Co., Ltd., 5 parts by weight of A-187 manufactured by Unicar Japan 2 parts by weight of triphenylsulfonium hexafluoroantimonate were mixed. The defoamed product was used, and the irradiation dose of far ultraviolet rays for curing was set to about 10 mJ · cm ⁻² . At this time, since the photoacid generator in the solid layer has almost no wavelength region in the far ultraviolet region, self-development of the solid layer 5 at the curing stage of the active energy ray-curable material did not occur at all.

Next, about 2 J · c from the upper side of this substrate
The solid layer 5 is removed by irradiating with m ⁻² ultraviolet rays and heating in vacuum at 130 ° C., and the ink passage 8 and the common liquid chamber 9 are removed.
Was formed (FIG. 5).

Also according to this example, a good ink jet recording head could be manufactured.

FIG. 17 is an external perspective view showing an example of an ink jet recording apparatus (IJRA) in which the ink jet recording head manufactured by the manufacturing method of the present invention is mounted as an ink jet head cartridge (IJC).

In the figure, reference numeral 20 is an ink jet head cartridge (IJC) having ejection port groups for ejecting ink, which oppose the recording surface of the recording paper conveyed onto the platen 24. Reference numeral 16 is a carriage HC that holds the IJC 20, and is connected to a part of a drive belt 18 that transmits the driving force of the drive motor 17, and is slidable with two guide shafts 19A and 19B arranged in parallel with each other. By doing so, reciprocating movement over the entire width of the recording paper of the IJC 20 is possible.

Reference numeral 26 is a head recovery device, which is an IJC20.
Is arranged at one end of the movement path of, for example, at a position facing the home position. The drive force of the motor 22 via the transmission mechanism 23 causes the head recovery device 26 to operate, and
Capping the JC20. This head recovery device 26
In association with the capping of the IJC 20 by the cap portion 26A, the ink is sucked by an appropriate suction means provided in the head recovery device 26 or the ink is pressure-fed by an appropriate pressure means provided in the ink supply path to the IJC 20, Ejection recovery processing such as removing the thickened ink inside the ejection port by forcibly ejecting the ink from the ejection port is performed. Further, the IJC is protected by capping at the end of recording or the like.

Reference numeral 30 denotes a blade as a wiping member which is disposed on the side surface of the head recovery device 26 and is made of, for example, silicon rubber. The blade 31 is held by the blade holding member 31A in the form of a cantilever, and is operated by the motor 22 and the transmission mechanism 23 similarly to the head recovery device 26, and can be engaged with the ejection port surface of the IJC 20.
As a result, the blade 31 is projected into the movement path of the IJC 20 at an appropriate timing in the recording operation of the IJC 20 or after the ejection recovery process using the head recovery device 26, and the ejection port surface of the IJC 20 is accompanied by the movement operation of the IJC 20. It removes dew condensation, wetness, dust, etc.

The present invention brings excellent effects particularly in a recording head and a recording apparatus of the type which ejects ink by utilizing thermal energy among the ink jet recording systems.

Regarding its typical structure and principle, see, for example, US Pat. Nos. 4,723,129 and 4740.
What is done using the basic principles disclosed in 796 is preferred. This method is a so-called on-demand type,
It can be applied to any of the continuous types, but it is compatible with the recorded information and the nucleate boiling is applied to the electrothermal converter arranged in correspondence with the sheet or liquid path holding the liquid (ink). By applying at least one drive signal that gives a rapid temperature rise exceeding 0, heat energy is generated in the electrothermal converter, film boiling occurs on the heat-acting surface of the recording head, and as a result, a pair of signals is applied to this drive signal. Correspondingly, it is effective because bubbles can be formed in the liquid (ink). Liquid (ink) is ejected through the ejection openings by the growth and contraction of the bubbles to form at least one droplet. It is more preferable to make this drive signal into a pulse shape, because the bubble growth and contraction are immediately and appropriately performed, so that the ejection of the liquid (ink) with excellent responsiveness can be achieved. As the pulse-shaped drive signal, those described in US Pat. Nos. 4,463,359 and 4,345,262 are suitable. If the conditions described in US Pat. No. 4,313,124, which is an invention relating to the rate of temperature rise on the heat acting surface, are adopted, further excellent recording can be performed.

As the constitution of the recording head, in addition to the combination constitution of the discharge port, the liquid passage, and the electrothermal converter (the linear liquid passage or the right-angled liquid passage) as disclosed in the above-mentioned respective specifications, U.S. Pat. No. 4,558,333, U.S. Pat. No. 44, which discloses a configuration in which a heat acting portion is arranged in a bending region.
The configuration using the specification of No. 59600 is also included in the present invention. In addition, Japanese Patent Laid-Open No. 123670/1984 discloses a configuration in which a common slit is used as a discharge portion of the electrothermal converter for a plurality of electrothermal converters, and an opening for absorbing a pressure wave of thermal energy. The present invention is also effective when the hole is used as the structure corresponding to the discharge unit, which is based on Japanese Patent Laid-Open No. 138461/1984.

Further, as a full line type recording head having a length corresponding to the width of the maximum recording medium which can be recorded by the recording apparatus, by combining a plurality of recording heads as disclosed in the above-mentioned specification, The present invention can exert the above-mentioned effects more effectively, although it may have a configuration satisfying the length or a configuration as one recording head integrally formed.

In addition, by being mounted on the apparatus main body, it can be electrically connected to the apparatus main body and can be supplied with ink from the apparatus main body by a replaceable chip type recording head or the recording head itself. The present invention is also effective when a cartridge-type recording head that is specially provided is used.

Further, it is preferable to add recovery means for the recording head, preliminary auxiliary means, etc., which are provided as the constitution of the recording apparatus of the present invention, because the effects of the present invention can be further stabilized. Specific examples thereof include capping means, cleaning means, pressurizing or suctioning means, electrothermal converters or heating elements other than these, or preheating means for the recording head. ,
It is also effective to perform stable recording by performing a preliminary ejection mode in which ejection is performed separately from recording.

Further, the recording mode of the recording apparatus is not limited to the recording mode of only the mainstream color such as black, but the recording head may be integrally configured or a plurality of combinations may be used. The present invention is also extremely effective for a device provided with at least one of full color by color mixing.

In the embodiments of the present invention described above, the liquid ink is used for the description. However, in the present invention, either an ink which is solid at room temperature or an ink which is in a softened state at room temperature is used. Can be used. In the above-mentioned inkjet device, the temperature of the ink itself is generally adjusted within the range of 30 ° C. or higher and 70 ° C. or lower to control the temperature of the ink so that the viscosity of the ink is within the stable ejection range. Any liquid may be used as long as the ink is liquid.
In addition, it is possible to prevent the temperature rise due to thermal energy from being positively used as energy for changing the state of the ink from a solid state to a liquid state, or to use an ink that solidifies when left standing for the purpose of preventing ink evaporation. However, in any case, by applying heat energy such as ink that is liquefied by being applied according to a recording signal of heat energy and ejected as an ink liquid or that has already started to solidify when it reaches the recording medium. The use of an ink having a property of liquefying for the first time is also applicable to the present invention. In such a case, the ink is retained as a liquid or solid in the recesses or through holes of the porous sheet as described in JP-A-54-56847 or JP-A-60-71260, It may be configured to face the electrothermal converter. In the present invention, the most effective one for each of the above-mentioned inks is to execute the above-mentioned film boiling method.

[0179]

As is apparent from the above description, according to the present invention, a dry developing (or self-developing) material that volatilizes and sublimes only by applying light or heat, and among them, a dry photosensitive material is preferable. Since the developing (or self-developing) resin material is used as the material arranged corresponding to the pattern of the ink passage, it is possible to perform development and removal without using a solvent.

Therefore, according to the present invention, it is not necessary to use a large-scale manufacturing device such as a developing device or a removing device, the process is further simplified, and workability and productivity can be improved. Furthermore, since there is no need to use a solvent, the risk of production is reduced. Further, since a dry developing (or self-developing) material is used, the range of selection of the coating material which has been narrowed due to the relationship with the solvent is widened. In addition, the problem of swelling of the ink passage wall forming member is eliminated, and the problem of minute separation from the substrate is solved. Therefore, an inkjet recording head with high dimensional accuracy can be easily obtained.

Further, if the water repellent treatment is applied to the ejection port surface before removing the solid layer, the water repellent does not enter the inside of the ejection port, so that a highly accurate ink jet recording head can be obtained. .. Moreover, since it is not necessary to use a solvent, it is possible to prevent the functional deterioration of the water repellent that may be caused by the solvent, and the range of selection of the water repellent narrowed in relation to the solvent is widened.

[Brief description of drawings]

FIG. 1 is a schematic perspective view showing a state in which a first photosensitive material layer is formed on a substrate.

FIG. 2 is a schematic perspective view showing a state in which a pattern latent image of a solid layer is formed on a first photosensitive material layer.

FIG. 3 is a schematic perspective view showing a state in which the pattern latent image of FIG. 2 is developed.

FIG. 4 is a schematic perspective view showing a state in which a second photosensitive material layer is laminated on a solid layer.

FIG. 5 is a schematic perspective view showing an inkjet recording head obtained by volatilizing and removing a solid layer.

FIG. 6 is a schematic cross-sectional view for explaining a step of irradiating a dry-developable photosensitive resin applied on a substrate with ultraviolet rays to form a solid layer using a mask.

FIG. 7 is a schematic cross-sectional view showing a state after the solid layer is formed by gasifying the portion other than the portion to be the flow channel by the operation of FIG.

FIG. 8 is a schematic cross-sectional view showing a state after a liquid curable material is used as the ink passage wall type material, after the material is cured.

9 is a schematic cross-sectional view showing a state after removing the solid layer in FIG.

FIG. 10 is a schematic perspective view showing a completed state of an example of an inkjet recording head.

FIG. 11A is a schematic cross-sectional view showing a state in which a water repellent agent is attached to a discharge port surface, and FIG. 11B is a schematic cross-sectional view showing a state in which a solid layer is removed.

FIG. 12 is a schematic perspective view in which a part of an example of an inkjet recording head is broken away.

FIG. 13 is a schematic perspective view showing an example of a substrate used.

FIG. 14 is a schematic perspective view showing a substrate on which a solid layer is formed.

FIG. 15 is a schematic cross-sectional view showing a mold used.

FIG. 16 is a schematic cross-sectional view showing a state in which resin is molded on a substrate using a mold.

FIG. 17 is a perspective view showing a main part of an example of an inkjet recording apparatus to which the manufactured inkjet recording head is attached.

[Explanation of symbols]

 1,41 Substrate 2,42 Energy Generator 3 First Material 4 Ink Passage Pattern 5,43 Solid Layer 6,44 Second Material (Ink Passage Wall Forming Material) 7,45 Ejection Port 8 Ink Flow Path 9 Ink Chamber 10 , 20 inkjet recording head

 ─────────────────────────────────────────────────── ─── Continuation of the front page (31) Priority claim number Japanese Patent Application No. 3-257663 (32) Priority date Hei 3 (1991) October 4 (33) Priority claim country Japan (JP) (72) Inventor Masatsune Kobayashi, Canon 3-30-2 Shimomaruko, Ota-ku, Tokyo (72) Inventor Ryuichi Arai 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc.

Claims (25)

[Claims] 1. A step of providing a layer of a first material which is volatilized by applying active energy on a substrate, and a layer of the first material depending on a pattern of an ink path communicating with an ejection port for ejecting ink. Patterning the layer of the first material by applying the activation energy; providing a second material so as to cover the patterned layer of the first material formed by the step; and the second material The patterned first covered by
A step of volatilizing a layer of a material by applying the active energy to form the ink path, and a method for manufacturing an ink jet recording head. 2. The method for manufacturing an ink jet recording head according to claim 1, wherein the first material contains at least one of nitrocellulose, a polysilane compound, and poly (0-phthalaldehyde). 3. The inkjet according to claim 1, wherein the first material contains at least one of an onium salt, a polyhalogen compound, and nitrobenzyl sulfonate as a photoacid generator that generates an acid when irradiated with light. Recording head manufacturing method. 4. The step of providing the second material comprises:
The method for manufacturing an inkjet recording head according to claim 1, wherein the method is performed by transfer molding of a material. 5. The method according to claim 1, further comprising a step of subjecting a surface on which the ejection port is provided to a liquid repellent treatment after the step of providing the second material and before the step of forming the ink passage. Inkjet recording head manufacturing method. 6. In the step of forming the ink path,
The method for manufacturing an inkjet recording head according to claim 5, wherein the liquid repellent treatment agent adhered to a portion corresponding to the ejection port is removed together with the patterned first material layer. 7. An ink jet recording head manufactured by the manufacturing method according to claim 1. 8. The ink jet recording head according to claim 7, wherein an energy generator that generates energy used for ejecting ink is provided corresponding to the ink path. 9. The ink jet recording head according to claim 8, wherein the energy generator is an electrothermal converter that generates heat energy as the energy. 10. The ink jet recording head according to claim 8, wherein the energy generator is a piezoelectric element. 11. An ink jet recording apparatus comprising: the ink jet recording head according to claim 7; and a conveying unit that conveys a recording member on which recording is performed by the ink jet recording head. 12. A step of providing a layered first material on a substrate which is volatilized by applying active energy and heat, and a step of forming the first material according to a pattern of an ink path communicating with an ejection port for ejecting ink. Patterning the layer of the first material by applying the activation energy to the layer; providing a second material so as to cover the patterned layer of the first material formed by the step; The pattern-shaped first coated with two materials
Vaporizing a layer of material by applying the activation energy and the heat to form the ink path;
A method for manufacturing an ink jet recording head, comprising: 13. The method for manufacturing an ink jet recording head according to claim 12, wherein the first material contains polycarbonate. 14. The method of manufacturing an ink jet recording head according to claim 12, wherein the first material contains poly (olefin sulfone). 15. The method of manufacturing an ink jet recording head according to claim 12, wherein the first material contains at least one of poly (4-chlorophthalaldehyde) and poly (4-bromophthalaldehyde). 16. The ink jet recording head according to claim 12, wherein the first material contains at least one of poly (4-trimethylsilylphthalaldehyde) and poly [4,5-bis (trimethylsilyl) phthalaldehyde]. Manufacturing method. 17. The inkjet according to claim 12, wherein the first material contains at least one of an onium salt, a polyhalogen compound, and nitrobenzyl sulfonate as a photoacid generator that generates an acid by irradiation with light. Recording head manufacturing method. 18. The method according to claim 1, wherein the step of providing the second material is performed by transfer molding of the second material.
2. The method for manufacturing an inkjet recording head according to 2. 19. The method according to claim 12, further comprising a step of subjecting a surface provided with the ejection port to a liquid repellent treatment after the step of providing the second material and before the step of forming the ink passage. Inkjet recording head manufacturing method. 20. In the step of forming the ink path, the liquid repellent treatment agent adhered to a portion corresponding to the ejection port is removed together with the patterned first material layer.
9. The method for manufacturing an inkjet recording head according to item 9. 21. An ink jet recording head manufactured by the manufacturing method according to claim 12. 22. The ink jet recording head according to claim 21, wherein an energy generator that generates energy used for ejecting ink is provided corresponding to the ink path. 23. The ink jet recording head according to claim 22, wherein the energy generator is an electrothermal converter that generates heat energy as the energy. 24. The ink jet recording head according to claim 22, wherein the energy generator is a piezoelectric element. 25. An ink jet recording apparatus comprising: the ink jet recording head according to claim 21; and a conveying unit that conveys a recording member on which recording is performed by the ink jet recording head.