JPH08156273A - Production of ink jet head, ink jet head, and ink jet device - Google Patents

Abstract

PURPOSE: To produce an ink jet head superior in reliability and durability by improving an adhesion between materials forming a head. CONSTITUTION: In a method for producing an ink jet head, after an active energy beam-curing liquid material 6 is poured and cured on a photoresist of a pattern corresponding to ink flow paths and an ink liquid chamber, the resist is removed, and at this time the material 6 is cured with an uncured or semi-cured part 10' selectively remained for the reduction of a stress. An ink jet head is produced in this method.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an ink jet head for ejecting ink to record on a recording medium, an ink jet head manufactured by this method, and an ink jet apparatus having the ink jet head. .

[0002]

2. Description of the Related Art Generally, an ink jet head has an ejection port through which ink is ejected, an ink liquid chamber for temporarily storing ink to be supplied to the ejection port, and an ink which connects the ejection port and the ink liquid chamber. A channel, an energy generating element that generates energy for ejecting ink from an ejection port provided in a part of the ink channel, and a supply port for externally supplying ink to the ink liquid chamber are provided. There is.

The following is known as a conventional method for manufacturing an ink jet head.

(1) A first substrate provided with an energy generating element is provided, and a discharge port, a flow path and a liquid chamber are formed on a second substrate made of glass or metal by a processing means such as cutting or etching. And a supply port for communicating the liquid chamber with the outside are provided, and then the second substrate is bonded to the first substrate with an adhesive while aligning the positions of the energy generating element and the flow path. .

(2) A positive-type or negative-type photosensitive dry film is attached to a first substrate made of glass or the like on which an energy generating element is provided. Out of the photosensitive dry film, a discharge port, a flow path and a liquid chamber. Is exposed by exposing it with a mask or a pattern corresponding to the above, and is developed to form a solid layer having a pattern corresponding to the discharge port, the flow path and the liquid chamber on the first substrate. A liquid curable material in which a curing agent is mixed is applied to the solid layer and the first substrate in an appropriate thickness and left at a predetermined temperature for a long time to cure the curable material. Then, the first substrate on which the curable material is cured is cut at a position where a discharge port is formed to expose the end face of the solid layer, and then the first substrate is immersed in a solvent that dissolves the solid layer, and the first substrate on which the curable material is cured is cut. 1
Method of dissolving and removing the solid layer from the substrate to provide a space for forming a flow path and a liquid chamber therein (JP-A-61-154).
(See Japanese Patent Publication No. 97).

(3) A positive or negative photosensitive dry film is attached to the first substrate provided with the energy generating element, and a pattern corresponding to the discharge port, the flow path and the liquid chamber in the photosensitive dry film. Is exposed or exposed to light and developed to provide a solid layer having a pattern corresponding to the discharge port, the flow path and the liquid chamber on the first substrate. On this solid layer and the first substrate, an active energy ray-curable material that is hardened by an active energy ray was applied to an appropriate thickness, and a recess and a supply port for forming a part of a liquid chamber were provided. A second substrate, which is transparent to active energy rays, is attached on the active energy ray-curable material by aligning the concave portion with a position where a liquid chamber is to be formed to form a laminated body. Next, the second substrate is masked so as to hide a portion of the active energy ray-curable material where the liquid chamber is to be formed, and the active energy ray-curable material is irradiated with the active energy ray through the second substrate. And cure. Next, after cutting the laminated body in which the active energy ray-curable material is cured at a position where a discharge port is formed to expose the end surface of the solid layer, the solid layer and an uncured active energy ray-curable material Is dissolved in a solvent that dissolves the solid layer and the uncured active energy ray-curable material to remove the solid layer and the uncured active energy ray-curable material from the laminate to form a space for forming a flow path and a liquid chamber therein (JP-A-62-62) -253457 publication).

[0007]

However, in the conventional method (the method (3), etc.), when a liquid curable material is supplied onto the solid layer and the entire surface is cured, stress is generated by the curing reaction. However, the adhesion between the curable material and the substrate and the second substrate decreases, which causes a problem of deteriorating the reliability and durability of the inkjet head. In addition, the stress may cause warping and deteriorate the printing quality and the like.

The present invention has been made to solve the problems of the prior art as described above, and enhances the adhesive force between the constituent materials by a simple method without requiring a special process and causes warpage. An object of the present invention is to provide a method of manufacturing an inkjet head that is excellent in prevention, reliability, and durability, an inkjet head manufactured by this method, and an inkjet device including the inkjet head.

[0009]

The above object of the present invention is to supply a liquid active energy ray-curable material onto a solid layer previously formed at a position corresponding to an ink flow path and an ink liquid chamber on a substrate, In the method of manufacturing an inkjet head, which comprises the step of removing the solid layer after curing the active energy ray-curable material by irradiating the active energy ray, curing of the active energy ray-curable material is performed by stress relaxation. Therefore, it can be achieved by a method for manufacturing an inkjet head, which is characterized by selectively leaving an uncured or semi-cured state.

Further, the ink jet head of the present invention is
It is manufactured by the method of the present invention, and an ejection port through which ink is ejected, an ink liquid chamber for temporarily storing ink for supplying to the ejection port, the ejection port and the ink liquid chamber. An ink flow path communicating with each other, an energy generating element for generating energy for ejecting ink from the ejection port, and a supply port for externally supplying ink to the ink liquid chamber, and at least the ink flow An ink jet head in which a channel and the ink liquid chamber are constituted by constituent members obtained from an active energy ray-curable material, wherein the constituent members are in an uncured or semi-cured state of the active energy ray-curable material. It is characterized by including a part.

Further, the ink jet apparatus of the present invention comprises the above ink jet head of the present invention provided with an ejection port for ejecting ink to a recording surface of a recording medium, and a member for mounting the head. It is characterized by comprising at least.

[0012]

According to the present invention, the uncured or semi-cured state of the active energy ray-curable material is selectively left, and the stress generated during the curing is relaxed. It is intended to achieve the object of the present invention by preventing the decrease of the adhesion force and the occurrence of warpage.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. 1 to 7, (a) is a schematic plan view of the head in the manufacturing process, and (b) is a schematic cross-sectional view taken along the line AA in the plan view.

First, as illustrated in FIG. 1, an electrode 2 and an ejection energy generating element 3 are formed on a substrate 1 (that is, a first substrate) made of a silicon wafer or the like. The ink ejection energy generating element 3 is, for example, an electrothermal converter for generating heat by applying electric energy, causing the ink to change its state, and ejecting the ink. This electrode 2
The ejection energy generation element 3 and the ejection energy generation element 3 form an ink ejection energy generation section.

Next, as illustrated in FIG. 2, a positive photoresist 4 as a photosensitive material for forming a solid layer is applied to the substrate 1 by a method such as a spinner. This thickness may be appropriately determined, but is usually about 30 μm. Next, the latent image 4 ′ (unexposed portion) is formed by exposing the exposed portion through a photomask 5 provided with an optical pattern corresponding to the ink flow path and the ink liquid chamber to solubilize the exposed portion.

Next, as illustrated in FIG. 3, a development process is performed such as dissolving and removing the exposed portion of the positive photoresist 4 to develop the latent image 4 '. As a result, a desired pattern of the positive photoresist 4 (that is, a removable solid layer) such as an ink flow path and an ink liquid chamber can be obtained. This solid layer is a layer located at the position corresponding to the ink flow path and the ink liquid chamber on the substrate, that is, at the ink flow path and the ink liquid chamber formation planned site.

Further, in the patterned positive photoresist, the portion corresponding to the ink liquid chamber is not only the case where the entire ink liquid chamber is formed, but also a part of the ink liquid chamber (a lower portion or the like). The case is also included.

Next, as illustrated in FIG. 4, the substrate 1 on which the pattern of the positive photoresist 4 is formed is fitted and fixed in a mold (not shown). On top of that, a second substrate 7 such as an ultraviolet-transparent glass substrate having an ink supply port 8 formed in advance.
Are installed at desired intervals. Next, a liquid active energy ray curable resin 6 is injected into the mold (that is, the space between the pattern of the positive photoresist 4 and the second substrate 7). As a result, at least the pattern of the positive photoresist 4 is covered with the active energy ray curable resin 6.

In this embodiment, as the active energy ray-curable resin 6, a negative type liquid active energy ray-curable resin prepared by mixing the following components (epoxy resin and curing agent) is used.

-Epoxy epoxide (trade name Epicoat 828) 85 parts-Ciba Geigy epoxy (trade name DYO22) 10 parts-Epoxy silane (trade name KBM403) 5 parts-Shin-Etsu Chemical Co., Ltd.-Asahi Denka Co., Ltd. ) Made by ADEKA OPTOMER SP-170 (trade name) 2 parts However, as the active energy ray-curable material used in the present invention, various photocurable materials conventionally known in addition to the above-mentioned materials, cast mold Known materials used for molding and the like can also be used. Specifically, for example, acrylic resin, carbonate resin, unsaturated polyester resin, polyurethane resin, polyimide resin, melamine resin, phenol resin, urea resin and the like can be used.

Next, as illustrated in FIG. 5, the active energy ray-curable material 6 is cured by selectively leaving an uncured or semi-cured state for stress relaxation, which is a characteristic process of the present invention. Do.

In the example shown in FIG. 5, the activation energy
The linear curable material 6 is applied to the cured part 10 and the uncured part (or half).
(Cured part) 10 'has an optical pattern for setting
Using a photomask 9 for
It The exposure amount may be appropriately determined. Epoxy mentioned above
When using resin and curing agent, the exposure dose is 1 J / cm
² It is a degree. In addition, in the example shown in FIG.
In addition, a part unnecessary as a component (for example, an ink liquid chamber)
The corresponding part, electrode extraction part) will also be removed in a later process.
Mask so that it can be removed and leave it in an uncured state.

In the example shown in FIG. 5, the uncured portion (or semi-cured portion) 10 'is a circle having a diameter of about 10 μm to 100 μm, and the distance between adjacent circles (the distance between the center points) is about 40 μm to 400 μm. And However, in the present invention, the shape of the uncured portion or the like is not limited to a circular shape, and its pattern may be arbitrary. In addition, the uncured portion (or semi-cured portion) 1
An effective ratio of 0'is about half of the area where the active energy ray-curable material 6 is formed. However, the present invention is not limited to these, and any uncured (or semi-cured portion) 10 ′ pattern, arrangement, and ratio are selected as long as the stress caused by the curing of the active energy ray-curable material 6 can be relaxed. It is also possible to appropriately determine the linear expansion coefficient of the material forming the inkjet head and the stress of the active energy ray curable material. The uncured portion can be formed by completely masking as shown in FIG. 5, but the semi-cured portion is a layer in which the wraparound of active energy rays due to overexposure is used or the transmittance can be controlled by the mask. May be formed. The position where the uncured portion (or semi-cured portion) 10 'is left is particularly a portion where a large stress is likely to occur, that is,
It is effective to place the active energy ray-curable material in a relatively large area.

By a relatively simple process as shown in FIG.
A constituent member made of the active energy ray-curable material 6 is formed between the substrate 1 and the second substrate 7, and simultaneously with this molding, the constituent members are fused to the substrate 1 and the second substrate 7. In addition, various molding conditions other than the above may be appropriately selected according to a conventionally known cast molding method.

In the conventional method for manufacturing an ink jet head based on the casting method, the stress generated during curing was a serious problem due to the difference in the constituent materials and the coefficient of thermal expansion. Hardened part (or semi-hardened part) 10 '
Is left to relieve this stress and eliminate the problem.

When the ink jet head is used, the active energy ray-curable material in the portion constituting the surface that comes into contact with the ink is at least cured, that is, the uncured portion (or semi-cured portion) 10 'is formed. By devising the position so as to avoid the portion in contact with the ink liquid, an inkjet head having excellent reliability and durability can be obtained without impairing the function as a constituent material of the inkjet head. Of course, this does not apply if there is no problem depending on the characteristics of the active energy ray-curable material and the ink liquid used.

Next, as illustrated in FIG. 6, unnecessary portions of the active energy ray-curable material 6 such as the ink liquid chamber equivalent portion and the electrode lead-out portion (this portion is uncured) are removed by melting or the like. To do.

Next, as illustrated in FIG. 7, the second substrate 7 on the electrode take-out portion is cut at a predetermined position, and the positive photoresist 4 is removed by melting or the like.
Substrate 1 of structural member obtained from active energy ray curable material
A groove portion for forming the discharge port and the flow path is formed corresponding to the position of the energy generating element on the surface opposed to the element surface of the substrate for forming the ink liquid chamber communicating with the groove portion. A cavity that serves as a bottom wall is also formed. For example,
The second substrate 7 at the position of the electrode take-out portion may be cut by dicing or the like used for cutting a wafer. Further, the removal of the positive photoresist 4 may be performed using an organic solvent such as acetone or an alkaline aqueous solution.

In the ink jet head manufactured by the method of the present invention, as shown in FIG. 7, at least the ink flow path and the ink liquid chamber are composed of constituent members obtained from an active energy ray curable material, This component has a characteristic configuration in which it includes a portion in an uncured or semi-cured state selectively left for stress relaxation.

In FIG. 1 to FIG. 7, one ink jet head is shown in a simplified manner with three ejection energy generating elements, but of course, in the present invention, a large number of ink jet heads using a large plate substrate are taken. In the same time, or to provide a large number of discharge energy generating elements,
It is also possible to use a full line type in which a plurality of ejection openings are provided over the entire width of the recording area of the recording medium. Further, it is possible to easily form a multicolor ink jet head in which multicolor ink ejection ports are provided on the same substrate. Although the example using the second substrate 7 has been described, the upper portion can be configured by a constituent member or the like made of the active energy ray-curable material 6 instead of the second substrate 7.

In the embodiment shown in FIGS. 1 to 7, the photomask 5 (FIG. 2) used for forming the latent image 4'of the positive type photoresist 4 and the curing portion 10 of the active energy ray curable material, Two types of masks, the photomask 9 (FIG. 5) used for forming the uncured portion (or semi-cured portion) 10 ', are required, and the process is slightly complicated in this respect. However, in the present invention, the second optical element having a desired optical pattern
Positive photoresist 4 by using the substrate
And active energy ray curable material 6 (ie negative type material)
The process can be further simplified by utilizing the positive-type negative-type properties of and.

Such an embodiment will be described below with reference to FIGS. 8 and 9. In addition, in FIGS. 8 and 9, (a)
Is a schematic plan view of the head in the manufacturing process,
(B) is a schematic sectional drawing of the AA line in the plan view.

FIG. 8 is a diagram showing an embodiment using the second substrate 11 having an optical pattern corresponding to the ink flow path and the ink liquid chamber. In this embodiment, first, a photosensitive layer such as a positive photoresist is formed on the substrate 1.
The photosensitive layer is formed, for example, by spin-coating a liquid positive photoresist (for example, Hoechst, trade name AZ-4903) so as to have a film thickness of 30 μm, and 90 ° C. 40.
It can be formed by pre-baking the photoresist by heating and drying for minutes. Next, the second substrate 11 having a mask function required for pattern formation of the positive photoresist, that is, an optical pattern corresponding to the ink flow path and the ink liquid chamber, is laminated on the photosensitive layer. The second substrate 1
1 also has a desired mask function such as an electrode take-out portion, and an ink supply port 8 is provided in advance.

Then, the photosensitive layer is exposed through the second substrate 11 to form a latent image. Then, by developing, a pattern (that is, a removable solid layer) of the positive photoresist 4 in the ink flow path and the ink liquid chamber is obtained. Then, as shown in FIGS. 4 to 7, the inkjet head is completed through steps such as injection and curing of the active energy ray-curable material 6 and dissolution and removal of the solid layer.

In the embodiment shown in FIG. 8, the ink supply port 8 is closed with a UV opaque tape 12. This is because the ink supply port 8 has a hole shape, so that the positive photoresist 4 is hindered during the step of exposing and curing the active energy ray-curable material 6 with ultraviolet rays or the like (FIG. 5). Further, the UV impermeable tape 12 is used for the ink supply port 8
It also serves to prevent dust from entering the room. That is, if the ink supply port 8 is formed at a location relatively fast in the process, the probability of dust entering tends to increase as the process progresses, and it is difficult to prevent dust entering in the cutting process. Therefore, it is necessary to perform process control and dust cleaning, but the use of the UV opaque tape 12 can eliminate such a concern. Further, instead of the ultraviolet ray opaque tape 12, a resin, a filter, or the like that can block ultraviolet rays and can be packed in the ink supply port can be used.

The formation of the optical pattern of the second substrate 11 is
For example, an ultraviolet-transparent glass or the like is used as the second substrate, and this glass can be manufactured by a manufacturing method generally called a photomask used in a photolithography technique for manufacturing a semiconductor. Specifically, for example, a Cr metal film or the like is used as the ultraviolet mask material. It should be noted that in the present embodiment, the second substrate 11 is masked at a portion corresponding to the ink flow path, and therefore, as shown in FIG.
As illustrated in (b), it is desirable to stack so that the upper surface of the positive photoresist 4 and the second substrate 11 are in contact with each other. In the steps shown in FIGS. 6 to 7, for example,
The UV opaque tape 12 may be peeled off after the second substrate 11 is cut, and the Cr formed on the second substrate 11 may be removed.
The mask material such as metal may be removed or may be left as it is without being removed.

In the embodiment shown in FIG. 8, since the second substrate 11 has an optical pattern corresponding to the ink flow path and the ink liquid chamber, the latent image 4'of the positive type photoresist is formed.
It is possible to omit the use of the photomask 5 for forming the above, and thereby the manufacturing process of the inkjet head can be further simplified.

Further, in the embodiment shown in FIG. 8, the degassing step in the normal manufacturing process can be omitted, and the manufacturing process can be further simplified. When the positive photoresist 4 is also exposed in the step of exposing the active energy ray-curable material 6 as shown in FIG. 5, nitrogen gas is released due to the property of the positive photoresist. The release of the nitrogen gas is more remarkable as the exposure dose for irradiation is larger, and causes pattern defects and defects that become bubbles in the liquid active energy ray-curable resin 6. Therefore, in a normal manufacturing process, before the active energy ray curable resin 6 is injected, after the pattern formation of the positive photoresist 4,
It was necessary to perform a degassing treatment that promotes the release of nitrogen gas. On the other hand, in the embodiment shown in FIG. 8, when the active energy ray curable resin 6 is irradiated with ultraviolet rays, the mask used for patterning the positive photoresist 4 is provided on the second substrate 11. Therefore, the positive photoresist 4 is not irradiated with ultraviolet rays. Therefore, it is possible to omit the degassing step without adversely affecting the release of nitrogen gas.

FIG. 9 shows an optical pattern corresponding to the ink flow path and the ink liquid chamber similar to that shown in FIG. 8 and, in addition to this, an uncured or semi-cured state is left in the active energy ray curable material. FIG. 6 is a diagram showing an example in which a second substrate 13 having an optical pattern for use is used. In this embodiment, in addition to the above-described advantages of the embodiment shown in FIG. 8, a photomask 9 (FIG. 5) for forming a cured portion 10 and an uncured portion (or a semi-cured portion) 10 ′ is further added. Can be omitted, which can further simplify the manufacturing process of the inkjet head.

FIG. 10 shows the ink jet head obtained by the present invention as an ink jet head cartridge (I
Inkjet device (IJRA) installed as JC)
It is an appearance perspective view showing an example.

In the figure, reference numeral 20 is an ink jet head cartridge (IJRA) provided with a nozzle group for ejecting ink so as to face the recording surface of the recording paper fed onto the platen 24. Reference numeral 16 is a carriage HC that holds the IJC 20, and is connected to a part of a drive belt 18 that transmits the driving force of the drive motor 17, and is slidable with two guide shafts 19A and 19B arranged in parallel with each other. By doing so, reciprocating movement over the entire width of the recording paper of the IJC 20 is possible.

Reference numeral 26 is a head recovery device, which is an IJC 20.
Is arranged at one end of the movement path of, for example, at a position facing the home position. The head recovery device 26 is operated by the driving force of the motor 22 via the transmission mechanism 23, and I
Cap the JC20. This head recovery device 2
In association with capping of the IJC 20 by the cap portion 26A of No. 6, ink is sucked by an appropriate suction means provided in the head recovery device 26 or ink is pressure-fed by an appropriate pressure means provided in an ink supply path to the IJC 20. Then, a discharge recovery process such as removing the thickened ink in the nozzle by forcibly discharging it from the ink discharge port is performed. Further, the IJC is protected by capping at the end of recording or the like.

A blade 30 is provided on the side surface of the head recovery device 26 and is a wiping member made of silicon rubber. The blade 30 is a blade holding member 30.
The head recovery device 26 is held by A in a cantilever form.
Similarly to the above, the motor 22 and the transmission mechanism 23 operate to enable engagement with the ejection surface of the IJC 20. Thereby, the blade 30 is projected into the movement path of the IJC 20 at an appropriate timing in the recording operation of the IJC 20 or after the ejection recovery processing using the head recovery device 26, and the ejection surface of the IJC 20 is accompanied by the movement operation of the IJC 20. It removes dew condensation, wetness, dust, etc.

[0044]

As described above, according to the present invention, the following effects can be obtained. (1) By relaxing the stress generated when the liquid curable material is cured, the adhesion between the constituent materials is enhanced by an easy method without requiring a special process, and the reliability and durability are excellent. Inkjet head can be manufactured. (2) By relaxing the stress generated when the liquid curable material is cured, it is possible to prevent warpage and to manufacture an inkjet head with good printed products. (3) Even with a large inkjet head having a large number of ejection ports, the head has excellent reliability and durability.

[Brief description of drawings]

FIG. 1A is a schematic plan view showing a substrate on which an ejection energy generating element and an electrode are formed in an embodiment,
(B) is a schematic sectional drawing of the AA line in the plan view.

FIG. 2 (a) is a schematic plan view showing that a substrate coated with a positive photoresist is subjected to ultraviolet irradiation (exposure) using a photomask in Example, and FIG.
FIG. 4 is a schematic cross-sectional view taken along the line AA in the plan view.

3A is a schematic plan view showing a pattern formed by developing a positive photoresist in Example, and FIG. 3B is a schematic cross-sectional view taken along line AA in the plan view. It is a figure.

FIG. 4 (a) is a plan view of stacking a second substrate in the embodiment,
It is a schematic plan view showing a state where an active energy ray-curable material is injected, and (b) is a schematic cross-sectional view taken along the line AA in the plan view.

FIG. 5 (a) is a pattern formation and curing portion of an active energy ray curable material using a photomask in the example,
FIG. 3B is a schematic plan view showing a state where ultraviolet irradiation (exposure) for forming an uncured portion (or a semi-cured portion) is performed, (b)
FIG. 4 is a schematic cross-sectional view taken along the line AA in the plan view.

FIG. 6 (a) is a schematic plan view showing a portion where an unnecessary portion of active energy ray-curable material is removed in the example, and FIG. 6 (b) is a schematic view taken along the line AA in the plan view. FIG.

7A is a schematic plan view of an inkjet head finally completed in an example, and FIG. 7B is a schematic cross-sectional view taken along the line AA in the plan view.

FIG. 8A is a schematic plan view showing an embodiment using a second substrate having an optical pattern corresponding to an ink flow path and an ink liquid chamber, and FIG. 8B is a plan view showing A in the plan view. −
It is a typical sectional view of the A line.

FIG. 9A shows a second substrate having an optical pattern corresponding to an ink flow path and an ink liquid chamber, and an optical pattern for leaving an uncured or semi-cured state in an active energy ray curable material. It is a schematic plan view which shows the Example used, (b) is a schematic sectional drawing of the AA line in the plan view.

FIG. 10 is an external perspective view showing an example of an inkjet device in which the inkjet head of the present invention is mounted as an ink cartridge.

[Explanation of symbols]

1 Substrate 2 Electrode 3 Discharge Energy Generation Element 4 Positive Photoresist 4'Positive Photoresist Latent Image 5,9 Photomask 6 Active Energy Ray Curable Material 7, 11, 13 Second Substrate 8 Ink Supply Port 10 Active Cured part of energy ray curable material 10 ′ Uncured part (or semi-cured part) of active energy ray curable material 12 UV opaque tape 16 Carriage 17 Drive motor 18 Drive belt 19A, 19B Guide shaft 20 Inkjet head cartridge 22 Cleaning Motor 23 transmission mechanism 24 platen 26 cap member 30 blade 30A blade holding member

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁶ Identification code Internal reference number FI technical display location B41J 3/04 103 B

Claims (7)

[Claims] 1. An active energy ray curable material in a liquid state is supplied onto a solid layer formed in advance at a position corresponding to an ink flow path and an ink liquid chamber on a substrate, and the active energy ray is irradiated to irradiate the active energy. In a method for manufacturing an inkjet head having a step of removing the solid layer after curing a ray curable material, curing of the active energy ray curable material is performed in an uncured or semi-cured state for stress relaxation. A method for manufacturing an ink jet head, which is characterized in that it is selectively left. 2. The method for producing an ink jet head according to claim 1, wherein at least a portion of the active energy ray-curable material forming a surface which comes into contact with the ink when the ink jet head is used is cured. 3. A photosensitive layer is formed on a substrate, and a second substrate having an optical pattern corresponding to an ink flow path and an ink liquid chamber is laminated on the photosensitive layer, and the second substrate is interposed therebetween. 3. The method according to claim 1, further comprising the step of forming the solid layer corresponding to an ink flow path and an ink liquid chamber on the substrate by exposing the photosensitive layer and removing an exposed portion or an unexposed portion of the photosensitive layer. A method for manufacturing the inkjet head described. 4. A method for curing the active energy ray-curable material through a second substrate having an optical pattern for selectively leaving an uncured or semi-cured state of the active energy ray-curable material. The method for manufacturing an inkjet head according to claim 3, wherein irradiation with active energy rays is performed. 5. An ejection port through which ink is ejected, an ink liquid chamber for temporarily storing ink to be supplied to the ejection port, and an ink flow path which connects the ejection port and the ink liquid chamber with each other. An energy generating element that generates energy for ejecting ink from the ejection port and a supply port for supplying ink to the ink liquid chamber from the outside are provided, and at least the ink flow path and the ink liquid chamber are active. An ink jet head configured by a constituent member obtained from an energy ray curable material, wherein the constituent member includes a portion of the active energy ray curable material in an uncured or semi-cured state. Inkjet head. 6. The ink jet head according to claim 5, wherein at least a portion of the constituent member, which constitutes a surface which comes into contact with the ink when the ink jet head is used, is made of a hardened active energy ray curable material. 7. The ink jet head according to claim 5, wherein an ejection port for ejecting ink is provided on the recording surface of the recording medium, and a member for mounting the head. Characteristic inkjet device.