JPH05145220A - Conductor film and manufacture thereof - Google Patents

Conductor film and manufacture thereof

Info

Publication number
JPH05145220A
JPH05145220A JP33004391A JP33004391A JPH05145220A JP H05145220 A JPH05145220 A JP H05145220A JP 33004391 A JP33004391 A JP 33004391A JP 33004391 A JP33004391 A JP 33004391A JP H05145220 A JPH05145220 A JP H05145220A
Authority
JP
Japan
Prior art keywords
substrate
conductor
mask
conductor film
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP33004391A
Other languages
Japanese (ja)
Other versions
JP3152469B2 (en
Inventor
Sakuo Kamata
策雄 鎌田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP33004391A priority Critical patent/JP3152469B2/en
Publication of JPH05145220A publication Critical patent/JPH05145220A/en
Application granted granted Critical
Publication of JP3152469B2 publication Critical patent/JP3152469B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Resistance Heating (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Surface Heating Bodies (AREA)

Abstract

PURPOSE:To prevent a conductor film formed on a substrate from coming off by forming the cross section of the conductor film into an angle shape with wide base. CONSTITUTION:An insulating layer 2 is thermally sprayed onto a substrate 1 so that an insulating substrate 10 is formed, and a mask 4 is arranged in front of this insulating substrate 10 with a gap of 0.2-1.5mm between. Then, when a conductor is sprayed by a thermally spraying gun from the front of this mask 4, a conductor layer 3 is formed on the insulating layer 2. As the substrate 1, metal substrates of Al, Fe, Cu, etc., and ceramic substrates of Al2O3, SiO2, etc., are used and ceramics such as Al2O3 and SiO2 are used as the insulating layer 2. Further, Ni-Cr, Fe-Cr, Ni-Al, etc., are used as the conductor layer 3. The cross section of the conductor layer 3 formed in this manner is shaped into an angle with wide base on the side, where the conductor layer comes into close contact with the insulating layer 2, and the contact area between the two layers is large so that a high bond strength can be obtained.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、暖房用、ヘアドライ
ヤ、ヘアカーラなどのヒータとして、また、プリント基
板に形成され配線用として用いられる導体膜および導体
膜の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductor film used as a heater for heating, a hair dryer, a hair curler, etc., and also used for wiring and a method for producing the conductor film.

【0002】[0002]

【従来の技術】この種、導体膜およびその製造方法とし
て、例えば特開平1−117287号公報に記載の技術
が知られており、この従来技術によれば、図3に示され
るように、金属体21の表面に絶縁膜22を形成し、次
にこの絶縁膜22に密接するようにマスク24を配置
し、このマスク24の前面から溶射ガン25により導体
膜23を形成していた。
2. Description of the Related Art As this type, a conductor film and a method for manufacturing the same, a technique described in, for example, Japanese Patent Application Laid-Open No. 1-117287 is known. According to this conventional technique, as shown in FIG. The insulating film 22 is formed on the surface of the body 21, then the mask 24 is arranged so as to be in close contact with the insulating film 22, and the conductor film 23 is formed from the front surface of the mask 24 by the spray gun 25.

【0003】[0003]

【発明が解決しようとする課題】しかし、前述した従来
の技術によると、図4(a)で明らかなように、マスク
24が絶縁基板26の表面に密接していると、その前面
から導体材料を溶射したとき、マスク孔の内壁に沿って
導体膜23が区画形成されるため、図4(b)のよう
に、導体膜23の断面は矩形状となり、絶縁膜22との
間の接触面積が小さくなることから、密着強度が低く剥
離し易いという課題があった。また、従来の技術による
と、溶射作業後、マスク24を取り外すとき、マスク2
4の壁面に導体が付着して絶縁膜22から剥離し易いと
いう課題があった。本発明は斯かる課題を解決するため
になされたもので、その目的とするところは、基板上に
形成された導体膜の剥離を防止することができる導体膜
および導体膜の製造方法を提供することにある。
However, according to the above-mentioned conventional technique, when the mask 24 is in close contact with the surface of the insulating substrate 26, as shown in FIG. When thermal spraying is performed, the conductor film 23 is formed along the inner wall of the mask hole, so that the conductor film 23 has a rectangular cross section and a contact area with the insulating film 22 as shown in FIG. 4B. Therefore, there is a problem that the adhesive strength is low and peeling is easy. Further, according to the conventional technique, when the mask 24 is removed after the thermal spraying work, the mask 2
There was a problem that the conductor adhered to the wall surface of No. 4 and was easily separated from the insulating film 22. The present invention has been made to solve such a problem, and an object thereof is to provide a conductor film and a method for manufacturing the conductor film, which can prevent the conductor film formed on a substrate from peeling off. Especially.

【0004】[0004]

【課題を解決するための手段】前記目的を達成するため
に、本発明は、第1の構成として、基板上に形成される
導体膜の断面を、裾野の広い山形としたことを特徴とす
る。また、第2の構成として、基板上に導体膜を溶射に
より形成する際、基板前面にマスクを配置し、このマス
クと基板との間に隙間を設けて溶射を行うことを特徴と
する。
In order to achieve the above-mentioned object, the present invention is characterized in that, as a first constitution, the cross section of a conductor film formed on a substrate is a mountain with a wide skirt. .. A second configuration is characterized in that when a conductor film is formed on a substrate by thermal spraying, a mask is arranged on the front surface of the substrate and a gap is provided between the mask and the substrate to perform thermal spraying.

【0005】[0005]

【作用】本発明によれば、前記第1の構成により、導体
膜の断面が裾野の広い山形となっているため、基板側の
接触面積が大きく、従って密着強度も高く、容易に剥離
することがないという利点を有する。また、前記第2の
構成により、基板上に導体膜を溶射により形成する際、
マスクと基板との間に適度な隙間を設けて溶射を行うこ
ととしているため、吹き付けられた導体材料は基板側に
広がり、これに伴い、形成される導体膜は基板に密接す
る側の裾野が広い山形となる。従って、基板側の接触面
積が大きくなり、密着強度も高く、剥離が生じるおそれ
がないと共に、マスクの壁面に導体が付着するおそれも
ない。
According to the present invention, since the cross section of the conductor film has a mountain shape with a wide skirt due to the first structure, the contact area on the substrate side is large, and therefore the adhesion strength is also high and peeling is easy. There is an advantage that there is no. Further, according to the second configuration, when the conductive film is formed on the substrate by thermal spraying,
Since an appropriate gap is provided between the mask and the substrate for thermal spraying, the sprayed conductor material spreads to the substrate side, and the conductor film thus formed has a skirt on the side close to the substrate. It becomes a wide Yamagata. Therefore, the contact area on the substrate side is increased, the adhesion strength is high, there is no risk of peeling, and there is no risk of the conductor adhering to the wall surface of the mask.

【0006】[0006]

【実施例】以下、図面に基づき本発明の好ましい実施例
を説明する。なお、本実施例において、「導体膜」の語
は、ヒータ等に用いられる抵抗膜をも含む概念で用いて
いる。図1は、溶射により絶縁基板10に導体パターン
を形成した状態を示す。すなわち、基板1の上に絶縁層
2を溶射して絶縁基板10を形成し、この絶縁基板10
の前面に0.2〜1.5mmの隙間を隔ててマスク4を
配置する。そして、このマスク4の前面から溶射ガンに
より導体を溶射すれば、絶縁層2の上に導体層3が形成
される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described below with reference to the drawings. In this embodiment, the term "conductor film" is used as a concept including a resistance film used for a heater or the like. FIG. 1 shows a state in which a conductor pattern is formed on the insulating substrate 10 by thermal spraying. That is, the insulating layer 2 is sprayed on the substrate 1 to form the insulating substrate 10, and the insulating substrate 10 is formed.
The mask 4 is arranged on the front surface of the above with a gap of 0.2 to 1.5 mm. Then, when a conductor is sprayed from the front surface of the mask 4 by a spray gun, the conductor layer 3 is formed on the insulating layer 2.

【0007】前記基板1としては、Al,Fe,Cu等
の金属基板や、Al2 3 やSiO2 等のセラミック基
板が用いられ、また、絶縁層2としては、Al2 3
SiO2 等のセラミックが用いられる。更に、導体層3
としては、Ni−Cr,Fe−Cr,Ni−Al等が用
いられる。こうして形成された導体層3は、その断面
が、絶縁層2に密接する側の裾野が広い山形となり、絶
縁層2との間の接触面積が大きいため、強い密着強度が
得られる。
As the substrate 1, a metal substrate of Al, Fe, Cu or the like or a ceramic substrate of Al 2 O 3 or SiO 2 is used, and as the insulating layer 2, Al 2 O 3 or SiO 2 is used. Etc. ceramics are used. Furthermore, the conductor layer 3
For example, Ni-Cr, Fe-Cr, Ni-Al, or the like is used. The conductor layer 3 formed in this manner has a cross section in a mountain shape with a wide skirt on the side in close contact with the insulating layer 2 and a large contact area with the insulating layer 2, so that a strong adhesion strength can be obtained.

【0008】図2(a)〜(f)は、前記導体層3の具
体的な製造工程を示している。すなわち、図2(a)の
ような金属基板1の表面に、図2(b)のように絶縁層
2を溶射して、絶縁基板10が形成される。なお、基板
1がセラミック基板の場合は、絶縁層2の溶射は必ずし
も必要ではない。基板自体が絶縁性を有しているからで
ある。
2A to 2F show specific manufacturing steps of the conductor layer 3. As shown in FIG. That is, as shown in FIG. 2B, the insulating layer 2 is sprayed on the surface of the metal substrate 1 as shown in FIG. 2A to form the insulating substrate 10. If the substrate 1 is a ceramic substrate, the thermal spraying of the insulating layer 2 is not always necessary. This is because the substrate itself has an insulating property.

【0009】次に、図2(c)のように、絶縁基板10
の前面にスペーサ5を介してマスク4をセットする。こ
のときのスペーサ5の厚さは、0.2〜1.5mm程度
が望ましい。次に、図2(d)のように、マスク4の前
面から溶射ガンを用いて基板1に向け導体を溶射する。
この場合、絶縁基板10とマスク4との間には適度なギ
ャップがあるため、溶射された導体は絶縁基板10側に
向かって広がり、その結果、形成される導体層3の断面
は、絶縁基板10に密接する側の裾野が広い山形とな
る。
Next, as shown in FIG. 2C, the insulating substrate 10
The mask 4 is set on the front surface of the through the spacer 5. At this time, the spacer 5 preferably has a thickness of about 0.2 to 1.5 mm. Next, as shown in FIG. 2D, a conductor is sprayed from the front surface of the mask 4 toward the substrate 1 using a spray gun.
In this case, since there is an appropriate gap between the insulating substrate 10 and the mask 4, the sprayed conductor spreads toward the insulating substrate 10 side, and as a result, the cross section of the formed conductor layer 3 has an insulating substrate. Yamagata has a wide skirt on the side close to 10.

【0010】このため、マスク4を取り外せば、図2
(e)のように、絶縁基板10上には断面が山形の導体
層3が形成される。しかも、このとき、溶射される導体
はマスク孔の壁面に沿って密着するおそれがないため、
マスク4の壁面には導体が付着せず、従って、マスク4
の取り外し時にも導体が絶縁層2から剥離することはな
い。このようにしてできた導体層3は、接触面積が大き
いため密着強度が強く、剥離しにくい導体パターンが得
られる。更に、図2(f)のように、形成された導体層
3の上から、更に絶縁層6を溶射して封止すれば、より
安定した密着強度が得られる。
For this reason, if the mask 4 is removed, as shown in FIG.
As shown in (e), the conductor layer 3 having a chevron cross section is formed on the insulating substrate 10. Moreover, at this time, since the conductor to be sprayed is not likely to adhere to the wall surface of the mask hole,
The conductor does not adhere to the wall surface of the mask 4, and therefore the mask 4
The conductor does not peel off from the insulating layer 2 even when it is removed. Since the conductor layer 3 thus formed has a large contact area, it has a high adhesion strength and a conductor pattern that is difficult to peel off is obtained. Further, as shown in FIG. 2F, if the insulating layer 6 is further sprayed and sealed on the formed conductor layer 3, more stable adhesion strength can be obtained.

【0011】なお、以上の実施例では、基板1の片面に
導体膜を形成する場合について説明したが、これ以外
に、例えば基板1の表裏両面に導体膜を形成する場合
は、基板1の片面に導体膜を形成した後、上記の工程を
繰り返したり、または、各工程ごとに基板1の両面に同
様の処理を行えば良い。
In the above embodiments, the case where the conductor film is formed on one side of the substrate 1 has been described. In addition to this, for example, when the conductor film is formed on both front and back surfaces of the substrate 1, one side of the substrate 1 is described. After the conductor film is formed on the substrate 1, the above steps may be repeated, or the same treatment may be performed on both surfaces of the substrate 1 in each step.

【0012】[0012]

【発明の効果】以上説明した通り、本発明は、基板上に
形成される導体膜の断面を、裾野の広い山形としたこと
により、接触面積が大きくなり、密着強度の強い導体膜
を得ることができる。また、基板上に導体膜を溶射によ
り形成する際、基板前面にマスクを配置し、このマスク
と基板との間に隙間を設けて溶射を行うことにより、導
体膜の断面が山形となり、前記と同様の効果が得られる
と共に、マスク孔の壁面に導体が付着するおそれがない
ため、導体を溶射した後のマスク取り外し時において
も、導体層の剥離のおそれがない。
As described above, according to the present invention, a conductor film formed on a substrate has a cross section with a chevron shape having a wide skirt, so that a contact area is increased and a conductor film having high adhesion strength is obtained. You can Further, when the conductor film is formed on the substrate by thermal spraying, a mask is arranged on the front surface of the substrate, and a space is provided between the mask and the substrate to perform thermal spraying. The same effect is obtained, and since the conductor is not attached to the wall surface of the mask hole, the conductor layer is not peeled off even when the mask is removed after spraying the conductor.

【図面の簡単な説明】[Brief description of drawings]

【図1】基板上に導体膜を形成した状態を示す図であ
る。
FIG. 1 is a diagram showing a state in which a conductor film is formed on a substrate.

【図2】(a)〜(f)は、導体膜の具体的な製造工程
を示す図である。
2 (a) to (f) are diagrams showing a specific manufacturing process of a conductor film.

【図3】従来における導体膜の製造工程の一部を示す外
観図である。
FIG. 3 is an external view showing a part of the conventional manufacturing process of the conductor film.

【図4】(a)は従来における導体膜の製造工程を示
し、(b)は基板上に形成された導体膜の断面を示す図
である。
FIG. 4A is a diagram showing a conventional conductive film manufacturing process, and FIG. 4B is a diagram showing a cross section of the conductive film formed on a substrate.

【符号の説明】[Explanation of symbols]

1・・・基板 2,6・・・絶縁層 3・・・導体層 4・・・マスク 5・・・スペーサ 10・・・絶縁基板 1 ... Substrate 2, 6 ... Insulating layer 3 ... Conductor layer 4 ... Mask 5 ... Spacer 10 ... Insulating substrate

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基板上に形成される導体膜の断面を、裾
野の広い山形としたことを特徴とする導体膜。
1. A conductor film formed by forming a cross section of the conductor film formed on a substrate into a mountain shape having a wide skirt.
【請求項2】 基板上に導体膜を溶射により形成する
際、基板前面にマスクを配置し、このマスクと基板との
間に隙間を設けて溶射を行うことを特徴とする導体膜の
製造方法。
2. A method of manufacturing a conductor film, comprising the steps of: when a conductor film is formed on a substrate by thermal spraying, a mask is arranged on the front surface of the substrate, and a gap is provided between the mask and the substrate. ..
JP33004391A 1991-11-19 1991-11-19 Manufacturing method of conductive film Expired - Fee Related JP3152469B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33004391A JP3152469B2 (en) 1991-11-19 1991-11-19 Manufacturing method of conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33004391A JP3152469B2 (en) 1991-11-19 1991-11-19 Manufacturing method of conductive film

Publications (2)

Publication Number Publication Date
JPH05145220A true JPH05145220A (en) 1993-06-11
JP3152469B2 JP3152469B2 (en) 2001-04-03

Family

ID=18228137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33004391A Expired - Fee Related JP3152469B2 (en) 1991-11-19 1991-11-19 Manufacturing method of conductive film

Country Status (1)

Country Link
JP (1) JP3152469B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001069326A1 (en) * 2000-03-15 2001-09-20 Fujitsu Limited Fixing device
KR100773414B1 (en) * 2000-05-26 2007-11-05 중소기업은행 Method for producting flat panel type thick film resistor
JP2016204675A (en) * 2015-04-15 2016-12-08 トヨタ自動車株式会社 Formation method of spray coating film
CN106573424A (en) * 2014-04-08 2017-04-19 威廉马歇莱思大学 Production and use of flexible conductive films and inorganic layers in electronic devices

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001069326A1 (en) * 2000-03-15 2001-09-20 Fujitsu Limited Fixing device
KR100773414B1 (en) * 2000-05-26 2007-11-05 중소기업은행 Method for producting flat panel type thick film resistor
CN106573424A (en) * 2014-04-08 2017-04-19 威廉马歇莱思大学 Production and use of flexible conductive films and inorganic layers in electronic devices
JP2016204675A (en) * 2015-04-15 2016-12-08 トヨタ自動車株式会社 Formation method of spray coating film

Also Published As

Publication number Publication date
JP3152469B2 (en) 2001-04-03

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