JPH05134246A - Production of liquid crystal display element - Google Patents

Production of liquid crystal display element

Info

Publication number
JPH05134246A
JPH05134246A JP32403691A JP32403691A JPH05134246A JP H05134246 A JPH05134246 A JP H05134246A JP 32403691 A JP32403691 A JP 32403691A JP 32403691 A JP32403691 A JP 32403691A JP H05134246 A JPH05134246 A JP H05134246A
Authority
JP
Japan
Prior art keywords
insulating film
liquid crystal
glass substrate
crystal display
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32403691A
Other languages
Japanese (ja)
Other versions
JP2524272B2 (en
Inventor
Kazuhiko Shibata
和彦 柴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to JP3324036A priority Critical patent/JP2524272B2/en
Publication of JPH05134246A publication Critical patent/JPH05134246A/en
Application granted granted Critical
Publication of JP2524272B2 publication Critical patent/JP2524272B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To enable the formation of the surface of an insulating film to a rugged shape in a process for drying the film. CONSTITUTION:The insulating film 3 for preventing shorting with a counter electrode is tentatively dried by a hot plate 4 provided with many projections 41 on the surface to nonuniformly heat a glass substrate 1 with transparent electrodes 2 at the time of tentatively drying the insulating film 3 after the application thereof in the process of forming the insulating film 3. The surface of the insulating film 3 is thereby formed to the rugged shape.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、液晶表示素子に利用
される液晶表示素子の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal display element used for a liquid crystal display element.

【0002】[0002]

【従来の技術】従来の液晶表示素子は、図3に図示した
ように、ガラス基板1自体の表面をサンドブラストやエ
ッチング処理等にて表面を荒らして凹凸面に形成してい
る。
2. Description of the Related Art In a conventional liquid crystal display device, as shown in FIG. 3, the surface of a glass substrate 1 itself is roughened by sandblasting or etching to form an uneven surface.

【0003】その後、透明電極2、対向電極との短絡防
止用の有機金属化合物の絶縁膜3、配向膜5を順次形成
し、液晶層に接する配向膜5の表面を、ガラス基板1表
面の荒れに沿った凹凸面に形成している(例えば、特開
昭63−71830号公報)。
After that, a transparent electrode 2, an insulating film 3 of an organometallic compound for preventing a short circuit with a counter electrode, and an alignment film 5 are sequentially formed, and the surface of the alignment film 5 in contact with the liquid crystal layer is roughened on the surface of the glass substrate 1. Is formed on the uneven surface (see, for example, JP-A-63-71830).

【0004】また、透明電極2の付いたガラス基板1
に、図4に図示したように、有機金属化合物による絶縁
膜3を塗布してあり、ホットプレート4で仮乾燥を行
う。
A glass substrate 1 having a transparent electrode 2 is also provided.
As shown in FIG. 4, the insulating film 3 made of an organometallic compound is applied to the substrate, and the hot plate 4 is used for temporary drying.

【0005】[0005]

【発明が解決しようとする課題】しかし、前記従来の技
術では、前者の場合は、ガラス基板1の表面を荒らす工
程があるため、専用の処理装置が必要となり、更に、処
理時間や工数がかかる等により、コストが高くなるとい
う問題点がある。
However, in the case of the former technique, in the former case, since there is a step of roughening the surface of the glass substrate 1, a dedicated processing device is required, and further processing time and man-hours are required. Therefore, there is a problem that the cost becomes high.

【0006】また、後者の場合は、ホットプレートで有
機金属化合物による絶縁膜の仮乾燥時にホットプレート
の表面が均一であるため、温度分布も均一になり、仮乾
燥も均一となり、均一な絶縁膜が形成され、凹凸状に形
成されないという問題点がある。
Further, in the latter case, since the surface of the hot plate is uniform during the temporary drying of the insulating film by the organic metal compound on the hot plate, the temperature distribution becomes uniform and the temporary drying becomes uniform, so that the uniform insulating film is formed. However, there is a problem in that it is not formed in an uneven shape.

【0007】そこで、本発明は上記従来の技術の問題点
に鑑み案出されたもので、絶縁膜の乾燥工程で該膜表面
を凹凸状に形成可能な液晶表示素子の製造方法の提供を
目的としている。
Therefore, the present invention has been devised in view of the above-mentioned problems of the prior art, and an object thereof is to provide a method of manufacturing a liquid crystal display device capable of forming a concave-convex shape on the surface of an insulating film during the drying process. I am trying.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
に、本発明における液晶表示素子の製造方法において
は、透明電極付きガラス基板に、対向電極との短絡を防
止するための絶縁膜を形成する際の絶縁膜塗布後の仮乾
燥時において、表面に多数の突起を設けたホットプレー
トで仮乾燥を行ってガラス基板を不均一に加熱し、絶縁
膜表面を凹凸状に形成することを特徴としている。
In order to achieve the above object, in the method of manufacturing a liquid crystal display device according to the present invention, an insulating film for preventing a short circuit with a counter electrode is formed on a glass substrate with a transparent electrode. During the temporary drying after coating the insulating film, the glass substrate is unevenly heated by performing temporary drying with a hot plate provided with a large number of protrusions on the surface, and the insulating film surface is formed in an uneven shape. I am trying.

【0009】[0009]

【作用】ホットプレートとの接触部分の温度の高い箇所
は充分に加熱されて膜厚が薄くなり、ホットプレートと
無接触部分の温度の低い箇所では、加熱が充分に行われ
ない為に膜厚が厚いまま乾燥し、膜表面形状は凹凸状態
となる。これに配向膜を塗布・乾燥を行うことによって
配向膜表面も凹凸状に形成できる。
[Function] The high temperature portion of the contact portion with the hot plate is sufficiently heated to reduce the film thickness, and the low temperature portion of the hot plate and the non-contact portion is not heated sufficiently, so that the film thickness is reduced. Is dried while being thick, and the surface shape of the film becomes uneven. By applying and drying an alignment film on this, the surface of the alignment film can also be formed in an uneven shape.

【0010】また、凹凸状になったガラス基板を用いて
液晶表示素子を製作すると、対向する基板との間隔(ス
ペース又はギャップ)は不均一となり、凹部分では広
く、凸部分では狭い現象となる。
Further, when a liquid crystal display element is manufactured by using a glass substrate having an uneven surface, the space (space or gap) between the substrates facing each other becomes non-uniform, and the concave portion is wide and the convex portion is narrow. ..

【0011】[0011]

【実施例】実施例について図1及び図2を参照して説明
する。符号の一部は従来例と共通の符号を用いている。
EXAMPLES Examples will be described with reference to FIGS. 1 and 2. Some of the codes are the same as those in the conventional example.

【0012】先ず、本発明は、透明電極2付きガラス基
板1に、対向電極との短絡を防止するための絶縁膜3を
形成する際の、該絶縁膜3塗布後の仮乾燥のものであ
る。
First, the present invention relates to provisional drying after coating of the insulating film 3 when the insulating film 3 for preventing a short circuit with the counter electrode is formed on the glass substrate 1 with the transparent electrode 2. ..

【0013】上記絶縁膜3塗布後の仮乾燥時において、
表面に多数の突起41を設けたホットプレート4で仮乾
燥を行ってガラス基板1を不均一に加熱し、絶縁膜3表
面を凹凸状に形成している。
At the time of temporary drying after coating the insulating film 3,
Temporary drying is performed by the hot plate 4 having a large number of protrusions 41 on the surface to heat the glass substrate 1 unevenly, thereby forming the surface of the insulating film 3 in an uneven shape.

【0014】また、絶縁膜3は有機金属化合物とした
が、該絶縁膜3は熱により乾燥を行う他の化合物でもよ
く、更に、絶縁膜3の材料は、仮乾燥後の焼成等の工程
で膜厚の減少例えば、仮焼成で3000Aのものを本焼
成で800〜1000位に膜厚が減少するのが望まし
い。
Although the insulating film 3 is made of an organometallic compound, the insulating film 3 may be another compound which is dried by heat, and the material of the insulating film 3 is used in a process such as firing after temporary drying. Decrease of film thickness For example, it is desirable that the film thickness of 3000 A by calcination is decreased to about 800 to 1000 by main calcination.

【0015】上記有機金属化合物とは、炭素−金属結合
を持つ有機化合物をいい、例えば、CH3 −CO−CH
2 −CO−CH2 −Meあり、Meは金属でZr、T
i、Si等である。例えば、前記化学式構造でMeがZ
rの場合は、ジルコニウムアセチルアセトナートとな
る。
The above-mentioned organometallic compound means an organic compound having a carbon-metal bond, for example, CH3 --CO--CH.
2-CO-CH2-Me, where Me is a metal Zr, T
i, Si, etc. For example, in the above chemical formula structure, Me is Z
In the case of r, zirconium acetylacetonate is obtained.

【0016】また、有機金属化合物の作成工程は、通
常、有機金属化合物を基板に塗布→70°C以下での仮
焼成→反応促進と分解のUV照射→300°C以上での
本焼成である。
The step of preparing the organometallic compound is usually coating of the organometallic compound on the substrate → preliminary calcination at 70 ° C. or lower → UV irradiation for reaction promotion and decomposition → main calcination at 300 ° C. or higher. ..

【0017】上記UV光は、前記有機金属化合物膜に含
まれる有機化合物を分解・除去するために用いるもの
で、254nm、185nm等の短波長側に強いピーク
を持ったもので、強いエネルギーのものが望ましい。
The UV light is used for decomposing / removing the organic compound contained in the organic metal compound film, has a strong peak on the short wavelength side such as 254 nm and 185 nm, and has a strong energy. Is desirable.

【0018】また、UV光を遮断するマスクは、Vの部
分にUV光を当てない為に使用するもので、設置位置は
光源側、ガラス基板1側(ガラス基板上を含む)どちら
でも良く、ガラス基板1上に置いても問題のない材質例
えば、SUSのものならば良い。
The mask for blocking the UV light is used to prevent the UV light from hitting the V portion, and the installation position may be on the light source side or the glass substrate 1 side (including the glass substrate). A material that does not cause a problem when placed on the glass substrate 1, for example, SUS may be used.

【0019】さらに、UV光を完全に遮断するマスクと
したが、該マスクはUV光の透過量を減衰するUVフィ
ルターとしてもよい。その場合、焼成後の膜が平滑とな
るように、UV照射光量、膜厚等に応じてUVフィルタ
ーの透過率を適宜変更する等して決定すれば良い。
Further, although the mask for completely blocking the UV light is used, the mask may be a UV filter for attenuating the transmission amount of the UV light. In that case, the transmittance of the UV filter may be appropriately changed depending on the UV irradiation light amount, the film thickness, etc. so that the film after baking becomes smooth.

【0020】そして、前記UV光の照射工程で、有機金
属化合物膜に含まれる有機物部分はほぼ分解・除去され
るが、UV光のエネルギーだけでは分解されないものも
あるので、次工程で加熱焼成して、有機金属化合物膜を
金属酸化膜としている。
In the step of irradiating with the UV light, the organic part contained in the organometallic compound film is almost decomposed / removed, but there are some which are not decomposed only by the energy of the UV light. Thus, the organometallic compound film is used as a metal oxide film.

【0021】[0021]

【発明の効果】本発明は上述の通り構成されているの
で、次に記載する効果を奏する。 A.有機金属化合物による絶縁膜を塗布後、ガラス基板
を突起を設けたホットプレートで加熱・乾燥するため、
ガラス基板の温度分布が不均一になる。すなわち、ホッ
トプレートとの接触部分の温度の高い箇所は充分に加熱
されて膜厚が薄くなり、ホットプレートと無接触部分の
温度の低い箇所では、加熱が充分に行われない為に膜厚
が厚いまま乾燥し、膜表面形状は凹凸状態となる。これ
に配向膜を塗布・乾燥を行うことによって配向膜表面も
凹凸状に形成できる。
Since the present invention is constructed as described above, it has the following effects. A. After applying an insulating film of an organometallic compound, the glass substrate is heated and dried on a hot plate provided with protrusions,
The temperature distribution of the glass substrate becomes non-uniform. That is, the high temperature portion of the contact portion with the hot plate is sufficiently heated to reduce the film thickness, and the low temperature portion of the hot plate and the non-contact portion is not heated sufficiently, and thus the film thickness is reduced. The film is dried while being thick, and the surface shape of the film becomes uneven. By applying and drying an alignment film on this, the surface of the alignment film can also be formed in an uneven shape.

【0022】B.表面が凹凸状になったガラス基板を用
いて液晶表示素子を製作すると、対向する基板との間隔
(スペース又はギャップ)は不均一となり、凹部分では
広く、凸部分では狭い現象となる。従って、同一面内で
部分的に違うギャップの液晶表示素子が製作でき、更
に、TNモードの液晶表示素子等では表示のコントラス
ト等を向上させることができる。
B. When a liquid crystal display element is manufactured using a glass substrate having an uneven surface, the gap (space or gap) with the opposing substrate becomes non-uniform, and the concave portion is wide and the convex portion is narrow. Therefore, a liquid crystal display device having a partially different gap in the same plane can be manufactured, and further, in a TN mode liquid crystal display device or the like, display contrast and the like can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の液晶表示素子の仮乾燥時の正面図であ
る。
FIG. 1 is a front view of a liquid crystal display element of the present invention during temporary drying.

【図2】本発明のホットプレートの斜視図である。FIG. 2 is a perspective view of a hot plate according to the present invention.

【図3】従来の液晶表示素子の構造図である。FIG. 3 is a structural diagram of a conventional liquid crystal display device.

【図4】従来の仮乾燥時の正面図である。FIG. 4 is a front view of conventional temporary drying.

【符号の説明】[Explanation of symbols]

1 ガラス基板 2 透明電極 3 絶縁膜 4 ホットプレート 41 突起 1 glass substrate 2 transparent electrode 3 insulating film 4 hot plate 41 protrusion

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】透明電極付きガラス基板に、対向電極との
短絡を防止するための絶縁膜を形成する際の絶縁膜塗布
後の仮乾燥時において、表面に多数の突起を設けたホッ
トプレートで仮乾燥を行ってガラス基板を不均一に加熱
し、絶縁膜表面を凹凸状に形成することを特徴とする液
晶表示素子の製造方法。
1. A hot plate having a large number of protrusions on its surface during provisional drying after coating an insulating film when forming an insulating film for preventing a short circuit with a counter electrode on a glass substrate with a transparent electrode. A method for manufacturing a liquid crystal display element, which comprises tentatively drying to heat a glass substrate non-uniformly to form an uneven surface of an insulating film.
JP3324036A 1991-11-13 1991-11-13 Liquid crystal display element manufacturing method Expired - Lifetime JP2524272B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3324036A JP2524272B2 (en) 1991-11-13 1991-11-13 Liquid crystal display element manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3324036A JP2524272B2 (en) 1991-11-13 1991-11-13 Liquid crystal display element manufacturing method

Publications (2)

Publication Number Publication Date
JPH05134246A true JPH05134246A (en) 1993-05-28
JP2524272B2 JP2524272B2 (en) 1996-08-14

Family

ID=18161442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3324036A Expired - Lifetime JP2524272B2 (en) 1991-11-13 1991-11-13 Liquid crystal display element manufacturing method

Country Status (1)

Country Link
JP (1) JP2524272B2 (en)

Also Published As

Publication number Publication date
JP2524272B2 (en) 1996-08-14

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