JPH05131191A - Treatment of drained cleaning water - Google Patents

Treatment of drained cleaning water

Info

Publication number
JPH05131191A
JPH05131191A JP3319618A JP31961891A JPH05131191A JP H05131191 A JPH05131191 A JP H05131191A JP 3319618 A JP3319618 A JP 3319618A JP 31961891 A JP31961891 A JP 31961891A JP H05131191 A JPH05131191 A JP H05131191A
Authority
JP
Japan
Prior art keywords
membrane
water
tank
treatment
treatment device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3319618A
Other languages
Japanese (ja)
Inventor
Mamoru Kanekawa
護 金川
Shigehiro Miyoda
茂弘 御代田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Swing Corp
Original Assignee
Ebara Infilco Engineering Service Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Infilco Engineering Service Co Ltd filed Critical Ebara Infilco Engineering Service Co Ltd
Priority to JP3319618A priority Critical patent/JPH05131191A/en
Publication of JPH05131191A publication Critical patent/JPH05131191A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Printed Wiring (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Separation Of Suspended Particles By Flocculating Agents (AREA)

Abstract

PURPOSE:To obtain treated water which can be recycled and thereby minimize industrial waste by allowing all the drained cleaning water used for a printed circuit board to pass through a membrane for efficient treatment. CONSTITUTION:The drained cleaning water used for a printed circuit board is entirely treated through coagulation process in a coagulation tank 1 using an inorganic coagulant 3, or through neutralization coagulation with the addition of an acid 4. Next, this treated water is passed through the MF membrane or the UF membrane of the first stage membrane treatment device 6. Then the water which has permeated through the membrane is passed through the RO membrane of the second membrane treatment device 10 to obtain a purified water. Thus the membrane-permeated water which can be recycled as a purified water is produced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、プリント基板の水洗浄
装置から排出される洗浄排水を処理する方法に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating cleaning waste water discharged from a water cleaning apparatus for printed circuit boards.

【0002】[0002]

【従来の技術】プリント配線板にICや、コンデンサ
ー、抵抗等の電気部品を半田付けする工程を実装工程と
呼び、実装したものをプリント基板と呼ぶ。実装工程に
おいては、丈夫な半田付けができるように、予めプリン
ト配線板にロジンフラックスを塗布しておき、実装後に
このロジンフラックス等を除去するために洗浄を行って
いる。プリント基板の洗浄には、従来、フロンや塩素系
有機溶剤が使用されていたが、これらの溶剤は地球環境
を汚染する物質として、西暦2,000年には製造が禁
止されることになっている。これらに代わって採用され
だした方法の1つが水洗浄法である。これは、界面活性
剤、有機溶剤(アルコール系又は炭素数5〜10からな
る炭化水素)、有機酸等と水とを混合した洗浄剤で洗浄
後、水ですすぐ方法である。水洗浄法では、当然に排水
中にこれらの界面活性剤や有機溶剤、プリント基板に付
着していたロジンフラックスや汚れ等が含まれている。
2. Description of the Related Art A process of soldering an electric component such as an IC, a capacitor and a resistor to a printed wiring board is called a mounting process, and the mounted one is called a printed circuit board. In the mounting process, a rosin flux is applied to the printed wiring board in advance so that the soldering can be performed robustly, and cleaning is performed to remove the rosin flux and the like after mounting. Conventionally, CFCs and chlorinated organic solvents have been used for cleaning printed circuit boards, but these solvents are substances that pollute the global environment, and their production will be banned in 2000. There is. One of the methods adopted in place of these is the water washing method. This is a method of rinsing with water after washing with a detergent, an organic solvent (alcohol or hydrocarbon having 5 to 10 carbon atoms), an organic acid and the like mixed with water. In the water cleaning method, naturally, the surface-active agent, the organic solvent, the rosin flux and the dirt attached to the printed circuit board are contained in the waste water.

【0003】従来、この水洗浄排水の処理は、通常次の
ような方法で処理されていた。1例として、図3に示す
ように、プリント基板の洗浄装置は、洗浄剤槽30、第
1すすぎ槽31、第2すすぎ槽32、第3すすぎ槽33
からなる。第1すすぎ槽31の洗浄排水は比較的汚れの
濃度が高く、この排水を生物処理装置34で活性汚泥処
理などの処理したのち、沈殿槽あるいは限外ろ過膜等を
使用した固液分離装置35で固液分離し、処理水として
放流している。また、比較的汚れの少ない第2,3すす
ぎ槽32,33は、図示のように直列向流洗浄方式と
し、第2すすぎ槽32の洗浄排水を活性炭塔36,イオ
ン交換樹脂塔37を通し、不純物を除去した後第3すす
ぎ槽33に戻して再利用する。他の例としては、図4に
示すように、第2,3のすすぎ槽42,43を直列向流
洗浄方式とし、第2すすぎ槽42の洗浄排水を限外ろ過
膜処理装置44と逆浸透膜処理装置45により2段膜処
理して不純物を除き、その処理水(膜透過水)を第3す
すぎ槽43に戻して再利用する。一方、限外ろ過膜処理
装置44及び逆浸透膜処理装置45の濃縮水は、第1す
すぎ槽41に戻し、第1すすぎ槽41の洗浄排水は処理
をせず産廃貯槽46に溜め、産業廃棄物として処理す
る。この第1すすぎ槽41の洗浄排水は、ロジンフラッ
クス濃度が高く、ロジンフラックスに含まれるポリマー
成分が限外ろ過膜の目詰まりを早く起こすため、第1す
すぎ槽41の洗浄排水は膜処理しないものとしている。
Conventionally, the treatment of the water for washing and washing has been usually performed by the following method. As an example, as shown in FIG. 3, a cleaning device for a printed circuit board includes a cleaning agent tank 30, a first rinse tank 31, a second rinse tank 32, and a third rinse tank 33.
Consists of. The cleaning wastewater of the first rinsing tank 31 has a relatively high concentration of dirt, and after the wastewater is treated by the biological treatment device 34 such as activated sludge treatment, a solid-liquid separation device 35 using a sedimentation tank or an ultrafiltration membrane or the like. Solid-liquid separation is carried out and discharged as treated water. In addition, the second and third rinse tanks 32 and 33, which are relatively less contaminated, have a serial countercurrent cleaning method as shown in the figure, and the cleaning wastewater of the second rinse tank 32 is passed through an activated carbon tower 36 and an ion exchange resin tower 37. After removing the impurities, it is returned to the third rinse tank 33 and reused. As another example, as shown in FIG. 4, the second and third rinsing tanks 42 and 43 are of a series countercurrent cleaning system, and the cleaning wastewater of the second rinsing tank 42 and the ultrafiltration membrane treatment device 44 and the reverse osmosis. The membrane treatment device 45 performs a two-stage membrane treatment to remove impurities, and the treated water (membrane permeated water) is returned to the third rinse tank 43 for reuse. On the other hand, the concentrated water of the ultrafiltration membrane treatment device 44 and the reverse osmosis membrane treatment device 45 is returned to the first rinsing tank 41, and the cleaning wastewater of the first rinsing tank 41 is not processed and is stored in the industrial waste storage tank 46 to be industrially discarded. Treat as a thing. The washing wastewater of the first rinse tank 41 has a high rosin flux concentration, and the polymer component contained in the rosin flux causes the clogging of the ultrafiltration membrane to occur quickly. I am trying.

【0004】[0004]

【発明が解決しようとする課題】上記図3に示す従来の
水洗浄排水処理においては、処理工程が多く、そのため
の設備が大規模になるばかりでなく、活性炭,イオン交
換樹脂等の再生を必要とし、操作も極めて複雑になると
いう問題点があり、また図4に示す従来の水洗浄排水処
理は、設備が小規模ですみ操作も容易であるが、膜処理
にとって障害となるポリマー成分等を避けるために、第
1すすぎ槽の水洗浄排水は処理せず、いたずらに産業廃
棄物の量を多くしているという問題点があった。本発明
は、水洗浄排水の処理に膜処理を適用し、上記従来の諸
問題を解消し、プリント基板の水洗浄排水の膜処理が困
難とされている第1すすぎ槽の洗浄排水を含めたすべて
の洗浄排水を同時に効果的に再利用可能な程度までに処
理できる方法を提供することを目的とするものである。
In the conventional water washing and drainage treatment shown in FIG. 3 described above, not only is there a large number of treatment steps and the equipment therefor becomes large-scale, but it is also necessary to regenerate activated carbon, ion exchange resin, etc. However, there is a problem that the operation becomes extremely complicated, and the conventional water washing and wastewater treatment shown in FIG. 4 requires a small facility and is easy to operate, but it does not require the polymer components which are obstacles to the membrane treatment. In order to avoid it, there is a problem in that the amount of industrial waste is unnecessarily increased without treating the water washing drainage of the first rinse tank. The present invention applies the membrane treatment to the treatment of the water washing drainage, solves the above-mentioned conventional problems, and includes the washing drainage of the first rinse tank in which the membrane treatment of the water washing drainage of the printed circuit board is difficult. It is an object of the present invention to provide a method capable of treating all the cleaning wastewater to the extent that it can be effectively reused at the same time.

【0005】[0005]

【課題を解決するための手段】本発明は、プリント基板
の水洗浄排水に無機凝集剤を添加して凝集反応を行わし
めた後、精密ろ過膜又は限外ろ過膜により膜分離し、得
られた膜透過水をさらに逆浸透膜により膜分離して膜透
過水を得ることを特徴とする洗浄排水の処理方法であ
り、また、前記無機凝集剤による凝集反応を行わしめる
に際し、前記水洗浄排水を酸により中和することを特徴
とする洗浄排水の処理方法である。
Means for Solving the Problems The present invention is obtained by adding an inorganic coagulant to water washing wastewater of a printed circuit board to cause a coagulation reaction and then performing membrane separation with a microfiltration membrane or an ultrafiltration membrane. A method for treating washing wastewater, characterized in that the membrane permeated water is further separated by a reverse osmosis membrane to obtain membrane permeated water, and the water washing wastewater is used when performing an aggregation reaction with the inorganic coagulant. Is a method for treating cleaning wastewater, which is characterized by neutralizing water with an acid.

【0006】[0006]

【作用】図1は本発明の一実施態様を示す系統説明図で
あって、プリント基板の水洗浄排水はすべて排水貯槽1
に貯留される。排水貯槽1に貯留された排水は、凝集槽
2に導かれ、ここで無機凝集剤(塩化第2鉄、硫酸アル
ミニウム、ポリ塩化アルミニウム等)3が加えられ、凝
集反応によって凝集フロックが形成され、排水中に溶解
しており膜の目詰まりを起こす成分を凝集フロックに取
り込む。凝集フロックを形成するための凝集剤として
は、一般に有機高分子凝集剤も知られているが、有機高
分子凝集剤を用いると、水中に残留するポリマー成分に
よってその後の膜処理において膜の目詰まりを早く起こ
すため、本発明では無機凝集剤を使用する。また、凝集
槽2では、無機凝集剤3のみの添加でよいが、同時に酸
(塩酸、硫酸、硝酸等)4で排水を中和することも好ま
しい。酸4で排水を中和することにより、無機凝集剤3
の添加量を減少させる効果があるとともに、後続する膜
処理における膜の目詰まり防止効果がある。次に、凝集
槽2で凝集した排水は、1段目ポンプ5で加圧されて1
段目膜処理装置6に送られ、膜分離される。1段目膜処
理装置6で使用される膜は、精密ろ過膜(MF膜)又は
限外ろ過膜(UF膜)である。1段目膜処理装置6で得
られた膜透過水は中間水槽7に送られる一方、凝集フロ
ックを含む濃縮水は排水貯槽1へ返送して循環処理され
る。所定濃度(5〜50倍)に濃縮した濃縮水は濃縮水
槽8に送られる。
FIG. 1 is a system explanatory view showing an embodiment of the present invention, in which all the cleaning and drainage water of the printed circuit board is a drainage storage tank 1.
Stored in. The wastewater stored in the wastewater storage tank 1 is guided to the flocculation tank 2, where an inorganic flocculant (ferric chloride, aluminum sulfate, polyaluminum chloride, etc.) 3 is added, and flocculation flocs are formed by a flocculation reaction, The components that are dissolved in the wastewater and cause the membrane to be clogged are incorporated into the floc. Organic polymer flocculants are also generally known as flocculants for forming floc, but when organic polymer flocculants are used, the polymer components remaining in water clog the membrane during subsequent membrane treatment. In the present invention, an inorganic coagulant is used in order to quickly cause Further, in the coagulation tank 2, only the inorganic coagulant 3 may be added, but it is also preferable to simultaneously neutralize the waste water with an acid (hydrochloric acid, sulfuric acid, nitric acid, etc.) 4. Inorganic coagulant 3 by neutralizing wastewater with acid 4
Has the effect of reducing the amount of addition of C. and the effect of preventing clogging of the film in the subsequent film treatment. Next, the waste water condensed in the coagulation tank 2 is pressurized by the first-stage pump 5 to
It is sent to the stage membrane treatment device 6 and membrane-separated. The membrane used in the first stage membrane treatment device 6 is a microfiltration membrane (MF membrane) or an ultrafiltration membrane (UF membrane). The membrane permeated water obtained in the first-stage membrane treatment device 6 is sent to the intermediate water tank 7, while the concentrated water containing the flocs of flocs is returned to the waste water storage tank 1 for circulation treatment. The concentrated water concentrated to a predetermined concentration (5 to 50 times) is sent to the concentrated water tank 8.

【0007】中間水槽7に送られた1段目膜処理装置6
の膜透過水は、2段目ポンプ9で加圧されて2段目膜処
理装置10に送られ、さらに膜分離される。2段目膜処
理装置10で使用される膜は逆浸透膜(RO膜)であ
る。この2段目膜処理装置10では、低分子量の溶解性
物質(溶解性有機物、溶解性無機物)等が除去され、そ
の膜透過水は処理水槽11に送られ、洗浄水として再利
用することも放流することも可能である。2段目膜処理
装置10の濃縮水は、中間水槽7へ返送して循環処理さ
れる。所定濃度まで溶解性物質が濃縮した濃縮水は濃縮
水槽8に送られる。
First stage membrane treatment device 6 sent to the intermediate water tank 7.
The membrane permeated water is pressurized by the second-stage pump 9 and is sent to the second-stage membrane treatment device 10 for further membrane separation. The membrane used in the second stage membrane processing apparatus 10 is a reverse osmosis membrane (RO membrane). In the second-stage membrane treatment device 10, low molecular weight soluble substances (soluble organic substances, soluble inorganic substances) and the like are removed, and the membrane permeated water is sent to the treated water tank 11 and can be reused as washing water. It is also possible to release it. The concentrated water of the second stage membrane treatment device 10 is returned to the intermediate water tank 7 and is circulated. The concentrated water in which the soluble substance is concentrated to a predetermined concentration is sent to the concentrated water tank 8.

【0008】[0008]

【実施例】次に実施例を示す。EXAMPLES Next, examples will be shown.

【0009】実施例1 表1に示す水質のプリント基板の水洗浄排水を凝集槽に
導き、硫酸275mg/L,塩化第2鉄30mg/L添
加し、UF膜を使用した1段目膜処理装置で膜分離して
表1に示す水質の1段目膜透過水を得た。この1段目膜
透過水をさらにRO膜を使用した2段目膜処理装置で膜
分離し、表1に示すような、洗浄水として再利用可能な
2段目膜透過水を得た。
Example 1 The first-stage membrane treatment apparatus using a UF membrane was conducted by introducing the water washing wastewater of the printed board having the water quality shown in Table 1 to a coagulation tank, adding 275 mg / L of sulfuric acid and 30 mg / L of ferric chloride. Membrane separation was performed to obtain the first-stage membrane permeate having the water quality shown in Table 1. This first-stage membrane permeated water was further subjected to membrane separation by a second-stage membrane treatment device using an RO membrane to obtain second-stage membrane permeated water that can be reused as washing water as shown in Table 1.

【0010】[0010]

【表1】 [Table 1]

【0011】実施例2 実施例1と同一のプリント基板の水洗浄排水を凝集槽に
導き、塩化第2鉄を300mg/L添加し、UF膜を使
用した1段目膜処理装置で膜分離して表2に示す水質の
1段目膜透過水を得、さらにこの1段目膜透過水をRO
膜を使用した2段目膜処理装置で膜分離し、表2に示す
水質の2段目膜透過水を得た。
Example 2 The same water washing and drainage of the printed circuit board as in Example 1 was introduced into a coagulation tank, ferric chloride was added at 300 mg / L, and the membrane separation was performed by a first stage membrane treatment apparatus using a UF membrane. The first-stage membrane permeate having the water quality shown in Table 2 was obtained.
Membrane separation was performed with a second-stage membrane treatment device using a membrane to obtain second-stage membrane permeated water having the water quality shown in Table 2.

【0012】[0012]

【表2】 [Table 2]

【0013】実施例3 実施例1と同一のプリント基板の水洗浄排水を用い、硫
酸275mg/L,塩化第2鉄30mg/Lで中和凝集
した場合(本発明)と、硫酸を加えず、塩化第2鉄30
0mg/Lで凝集した場合(本発明)と、中和凝集をし
なかった場合(比較例)の1段目膜処理装置(UF膜使
用)における各膜透過水量と回収率との関係を図2に示
す。このように、凝集をした場合は膜面の目詰まりがな
くなり、膜透過水量が増加したが、特に中和凝集した場
合に、その効果が著しかった。
Example 3 Using the same water washing and drainage of the printed circuit board as in Example 1, when neutralization and aggregation were carried out with 275 mg / L sulfuric acid and 30 mg / L ferric chloride (invention), sulfuric acid was not added, Ferric chloride 30
FIG. 3 is a graph showing the relationship between the amount of permeated water and the recovery rate in the first-stage membrane treatment device (using a UF membrane) in the case of aggregation at 0 mg / L (invention) and in the case of no neutralization aggregation (comparative example). 2 shows. Thus, when agglomerated, the clogging of the membrane surface disappeared and the amount of water permeated through the membrane increased, but the effect was particularly remarkable when neutralized and agglomerated.

【0014】[0014]

【発明の効果】以上述べたように、本発明は、プリント
基板の水洗浄排水を無機凝集剤による凝集処理後膜によ
る2段処理を行うことにより、再利用可能な清澄な処理
水を効率よく得ることができ、水洗浄排水のすべてを処
理して産業廃棄物の量を少なくし、しかも処理設備も小
規模ですむものである。
Industrial Applicability As described above, according to the present invention, by carrying out the two-stage treatment with the membrane after the coagulation treatment with the inorganic coagulant for the water washing and drainage of the printed circuit board, the reusable clear treated water is efficiently produced. The amount of industrial waste can be reduced by treating all of the washing water and wastewater, and the treatment facility can be small scale.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施態様を示す系統説明図である。FIG. 1 is a system explanatory view showing an embodiment of the present invention.

【図2】本発明と比較例の各UF膜処理における膜透過
水量と回収率の関係を示す線図である。
FIG. 2 is a diagram showing a relationship between a membrane permeated water amount and a recovery rate in each UF membrane treatment of the present invention and a comparative example.

【図3】従来の処理態様の一例を示す系統説明図であ
る。
FIG. 3 is a system explanatory view showing an example of a conventional processing mode.

【図4】従来の処理態様の他の例を示す系統説明図であ
る。
FIG. 4 is a system explanatory view showing another example of a conventional processing mode.

【符号の説明】[Explanation of symbols]

1 排水貯槽 2 凝集槽 3 無機凝集剤 4 酸 5 1段目ポンプ 6 1段目膜処理装置 7 中間水槽 8 濃縮水槽 9 2段目ポンプ 10 2段目膜処理装置 11 処理水槽 30 洗浄剤槽 31 第1すすぎ槽 32 第2すすぎ槽 33 第3すすぎ槽 34 生物処理装置 35 固液分離装置 36 活性炭塔 37 イオン交換樹脂塔 41 第1すすぎ槽 42 第2すすぎ槽 43 第3すすぎ槽 44 限外膜処理装置 45 逆浸透膜処理装置 46 産廃貯槽 1 Drainage storage tank 2 Coagulation tank 3 Inorganic coagulant 4 Acid 5 1st stage pump 6 1st stage membrane treatment device 7 Intermediate water tank 8 Concentrated water tank 9 2nd stage pump 10 2nd stage membrane treatment device 11 Treatment water tank 30 Cleaning agent tank 31 First rinse tank 32 Second rinse tank 33 Third rinse tank 34 Biological treatment device 35 Solid-liquid separation device 36 Activated carbon tower 37 Ion exchange resin tower 41 First rinse tank 42 Second rinse tank 43 Third rinse tank 44 Ultramembrane Treatment equipment 45 Reverse osmosis membrane treatment equipment 46 Industrial waste storage tank

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 プリント基板の水洗浄排水に無機凝集剤
を添加して凝集反応を行わしめた後、精密ろ過膜又は限
外ろ過膜により膜分離し、得られた膜透過水をさらに逆
浸透膜により膜分離して膜透過水を得ることを特徴とす
る洗浄排水の処理方法。
1. An inorganic coagulant is added to a water washing wastewater of a printed circuit board to cause a coagulation reaction, and then the resulting membrane is separated by a microfiltration membrane or an ultrafiltration membrane, and the resulting membrane-permeated water is further reverse osmosis. A method for treating cleaning wastewater, characterized in that membrane permeation water is obtained by membrane separation.
【請求項2】 前記無機凝集剤による凝集反応を行わし
めるに際し、前記水洗浄排水を酸により中和するもので
ある請求項1記載の洗浄排水の処理方法。
2. The method for treating cleaning wastewater according to claim 1, wherein the water cleaning wastewater is neutralized with an acid when the aggregation reaction by the inorganic coagulant is performed.
JP3319618A 1991-11-08 1991-11-08 Treatment of drained cleaning water Pending JPH05131191A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3319618A JPH05131191A (en) 1991-11-08 1991-11-08 Treatment of drained cleaning water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3319618A JPH05131191A (en) 1991-11-08 1991-11-08 Treatment of drained cleaning water

Publications (1)

Publication Number Publication Date
JPH05131191A true JPH05131191A (en) 1993-05-28

Family

ID=18112297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3319618A Pending JPH05131191A (en) 1991-11-08 1991-11-08 Treatment of drained cleaning water

Country Status (1)

Country Link
JP (1) JPH05131191A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0768259A (en) * 1993-09-01 1995-03-14 Ngk Insulators Ltd Membrane filtering method of polluted water
JP2002153871A (en) * 2000-11-21 2002-05-28 Mitsubishi Heavy Ind Ltd Apparatus for recycling waste water
WO2003037488A1 (en) * 2001-11-01 2003-05-08 Akzo Nobel N.V. Treatment of polyaluminium compounds
KR100429763B1 (en) * 2002-01-08 2004-05-03 정건용 Method for Recycling the Valuable Components from Cleaning Wastewater of Printed Circuit Board
KR100459861B1 (en) * 2001-04-27 2004-12-03 샤프 가부시키가이샤 Metal containing waste water treatment method and metal containing waste water treatment equipment
CN100450592C (en) * 2007-02-15 2009-01-14 三达膜科技(厦门)有限公司 Metal smelting factory sewage reclaiming method based on membrane filtering technique
JP2010502436A (en) * 2006-09-07 2010-01-28 ナルコ カンパニー Method for removing heavy metals from industrial wastewater using submerged ultrafiltration membranes or microfiltration membranes
CN105600962A (en) * 2015-10-28 2016-05-25 广德宝达精密电路有限公司 Water purification wastewater recycling apparatus
JP2019126767A (en) * 2018-01-24 2019-08-01 ダイセン・メンブレン・システムズ株式会社 Filtration treatment apparatus for contaminated water containing resin component and operational method thereof
WO2021215442A1 (en) * 2020-04-24 2021-10-28 ニプロ株式会社 Pretreatment method and pretreatment system for drainage

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0768259A (en) * 1993-09-01 1995-03-14 Ngk Insulators Ltd Membrane filtering method of polluted water
JP2002153871A (en) * 2000-11-21 2002-05-28 Mitsubishi Heavy Ind Ltd Apparatus for recycling waste water
KR100459861B1 (en) * 2001-04-27 2004-12-03 샤프 가부시키가이샤 Metal containing waste water treatment method and metal containing waste water treatment equipment
WO2003037488A1 (en) * 2001-11-01 2003-05-08 Akzo Nobel N.V. Treatment of polyaluminium compounds
EP1439898A1 (en) * 2001-11-01 2004-07-28 AKZO Nobel N.V. Treatment of polyaluminium compounds
KR100429763B1 (en) * 2002-01-08 2004-05-03 정건용 Method for Recycling the Valuable Components from Cleaning Wastewater of Printed Circuit Board
JP2010502436A (en) * 2006-09-07 2010-01-28 ナルコ カンパニー Method for removing heavy metals from industrial wastewater using submerged ultrafiltration membranes or microfiltration membranes
CN100450592C (en) * 2007-02-15 2009-01-14 三达膜科技(厦门)有限公司 Metal smelting factory sewage reclaiming method based on membrane filtering technique
CN105600962A (en) * 2015-10-28 2016-05-25 广德宝达精密电路有限公司 Water purification wastewater recycling apparatus
JP2019126767A (en) * 2018-01-24 2019-08-01 ダイセン・メンブレン・システムズ株式会社 Filtration treatment apparatus for contaminated water containing resin component and operational method thereof
WO2021215442A1 (en) * 2020-04-24 2021-10-28 ニプロ株式会社 Pretreatment method and pretreatment system for drainage

Similar Documents

Publication Publication Date Title
JP2001070989A (en) Method and apparatus for treating organic wastewater containing high concentration of salts
JP5564174B2 (en) Purification method and apparatus for purification of water containing metal components
JP2007130523A (en) Membrane washing method for water treatment system
JPH05131191A (en) Treatment of drained cleaning water
US6180009B1 (en) Method of filtering the organic solutions arising in the production of circuit boards
JPH10272495A (en) Treatment of organic waste water containing salts of high concentration
JP2873095B2 (en) Treatment method of waste water in final washing tank in cationic electrodeposition coating
JPH10272494A (en) Treatment of organic waste water containing salts of high concentration
JP2012210568A (en) Regeneration apparatus and regeneration method of development waste liquid
JP5245626B2 (en) Method and apparatus for recovering water-soluble organic solvent having amino group
JP2001149950A (en) Water treating method and water treating device
JP3417052B2 (en) Ultrapure water production method
JP2002346561A (en) Treating method for wastewater containing salt of high concentration
JPH11253968A (en) Water recovering apparatus
JP3028391B2 (en) Treatment of plating waste solution
JP2007098270A (en) Method and apparatus for producing pure water
JP3202506B2 (en) Cleaning wastewater treatment equipment
JP3444202B2 (en) Water treatment equipment
JPH05116B2 (en)
JP2002143850A (en) Device for treating waste water
KR100790370B1 (en) Recycling method and apparatus of waste etching solution
KR19980083856A (en) Recycling method of wastewater by electrodialysis and reverse osmosis membrane and its device
KR100398420B1 (en) A Removal Method of Organics in Zn-Cr Eletroplating Wastewater
KR100345725B1 (en) A Method for Purifying Wastewater Using Reverse Osmosis and Nanofiltration System
KR0153722B1 (en) Method of waste water treatment using chemical precipitation microfiltration nanofilteration hybrid system