JPH05121581A - Semiconductor device housing package - Google Patents

Abstract

PURPOSE:To provide a semiconductor device housing package capable of operating semiconductor devices housed inside in a normal and stabilized manner. CONSTITUTION:Sealing glass layers 6 and 8 which joint an alumina ceramics- made base material 1 with a cap 2, are specified to comprise 52.0 to 62.0wt.% of lead titanate, 0.5 to 3.0wt.% of silicon oxide, 2.0 to 7.0wt.% of boron oxide and 3.0 to 8.0wt.% of bismuth oxide to which 15.0 to 25.0wt.% of Willemite and 6.0 to 16.0wt.% of lead titanate based compound as a specific filler, thereby forming a glass material whose softening and melting temperature is low for the service. This construction makes it possible to protect a semiconductor device 4 from thermal breakdown caused by the heat generated when sealing the base material 1 and the cap 2 and prevent effectively the generation of thermal changes on the characteristics.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement of a semiconductor element housing package for housing a semiconductor element.

[0002]

2. Description of the Related Art Conventionally, a package for accommodating semiconductor elements such as LSI (Large Scale Integrated Circuit Element), for example, a glass-encapsulated semiconductor element accommodating package is usually made of an electrically insulating material such as alumina ceramics. , An insulating substrate having a concave portion for forming a cavity for accommodating a semiconductor element in the central portion, and an insulating substrate having a glass layer for sealing adhered to the upper surface, and the same electrically insulating material, and the semiconductor element in the central portion. For electrically connecting the semiconductor element housed inside with a lid body having a recess for forming a space housing the inside and a glass layer for sealing being attached to the lower surface, and an external electric circuit. The external lead terminals are placed on the insulating substrate by placing the external lead terminals on the upper surface of the insulating substrate and melting the glass layer for sealing which has been previously deposited on the insulating substrate. Temporary stop Then, the semiconductor element is attached to the bottom surface of the concave portion of the insulating base and each electrode of the semiconductor element is connected to an external lead terminal via a bonding wire. Thereafter, the insulating base and the lid are opposed to each other. Each glass layer for sealing that has been adhered to the main surface of
The semiconductor device as a final product is obtained by melt-integrating at a temperature of, and hermetically sealing a container composed of an insulating base and a lid.

The sealing glass layer adhered to the upper surface of the insulating base and the lower surface of the lid has a coefficient of thermal expansion so that the glass layer for sealing is firmly bonded to the insulating base and the lid. Is a glass that matches the coefficient of thermal expansion of alumina ceramics, such as lead oxide 70.0% by weight, boron oxide 8.6% by weight,
A glass containing 7.8% by weight of titanium oxide and 6.7% by weight of zirconium oxide is used.

[0004]

However, in recent years,
Higher density of semiconductor devices such as LSI (Large Scale Integrated Circuit Device)
High integration is rapidly progressing, and each transistor element forming the semiconductor element is also miniaturized, so that heat resistance is largely reduced. Therefore, when this semiconductor element is housed in a conventional semiconductor element housing package, the heat at the time of sealing the package is high, and when this is applied to the semiconductor element, thermal destruction occurs in each transistor element forming the semiconductor element. In addition, there is a drawback in that the semiconductor element housed inside cannot be operated normally and stably because the characteristics change due to heat.

Therefore, it is strongly desired to lower the sealing temperature as low as 1 ° C. as a package for accommodating semiconductor elements, which have recently been highly integrated and highly integrated, in order to reduce thermal destruction of the semiconductor elements. ing.

[0006]

According to the present invention, a semiconductor element and an external lead terminal to which each electrode of the semiconductor element is connected by a bonding wire are sandwiched between a base made of alumina ceramics and a lid, and sealed. In a package for housing a semiconductor element in which a semiconductor element is hermetically sealed by glass welding of a protective glass, the sealing glass comprises 52.0 to 62.0% by weight lead oxide, 0.5 to 3.0% by weight silicon oxide, and 2.0 to 2.0% boron oxide. 7.0% by weight, bismuth oxide 3.0
To 5.0% by weight of Willemite as a filler at 15.0
To 25.0% by weight and a tin titanate-based compound in the range of 6.0 to 16.0% by weight.

[0007]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will now be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing an embodiment of a semiconductor element storage package of the present invention, in which 1 is a base and 2 is a lid.
The base body 1 and the lid body 2 constitute a container 3 for housing a semiconductor element.

The base 1 is made of alumina ceramics, and a recess 1a for accommodating the semiconductor element 4 is provided in the center of the upper surface of the base 1, and the semiconductor element 4 is made of glass, resin, brazing material or the like on the bottom of the recess 1a. It is attached and fixed via an adhesive.

Substrate 1 made of the alumina ceramics
Is filled with ceramic raw material powder such as alumina (Al ₂ O ₃ ), silica (SiO ₂ ), magnesia (MgO) and calcia (CaO) in a press die corresponding to the shape of the base body 1 shown in FIG. It is manufactured by applying a constant pressure and molding, and then calcining the molded product at a temperature of about 1500 ° C.

On the upper surface of the substrate 1, kovar metal (Fe-
Ni-Co alloy) or 42 alloy (Fe-Ni alloy) or other metal is used to temporarily fix one end of an external lead terminal 5 through a glass layer 6 for sealing, and the external lead terminal 5 is a Kovar metal. It is manufactured by adopting a conventionally known rolling processing method and punching processing method to form an ingot (lump) such as the above into a predetermined plate shape.

The external lead terminal 5 has a function of connecting the semiconductor element 4 housed inside to an external electric circuit, and each electrode of the semiconductor element 4 is connected to one end of the external lead terminal via a bonding wire 7. By connecting the terminal 5 to an external electric circuit, the semiconductor element 4 is electrically connected to the external electric circuit.

It should be noted that the external lead terminal 5 is formed by plating the surface of the external lead terminal 5 with a metal of nickel, gold, etc., which has good conductivity and excellent corrosion resistance, and has a thickness of 1.0 to 20.0 μm. Oxidation and corrosion of the terminal 5 can be effectively prevented, and good electrical connection between the external lead terminal 5, the bonding wire 7 and the external electric circuit can be achieved.
Therefore, it is preferable that nickel, gold or the like is plated on the surface of the external lead terminal 5 to have a thickness of 1.0 to 20.0 μm.

A lid 2 is provided on the upper surface of the base 1 to which the external lead terminals 4 are temporarily fixed, and a sealing glass layer 8 attached to the lower surface of the lid 2 and the upper surface of the base 1. A container composed of the base body 1 and the lid body 2 is bonded by melting and adhering the deposited glass layer 6 for sealing.
3 The semiconductor element 4 is hermetically sealed inside.

The lid 2 is made of alumina ceramics, and the same method as that for the base 1, that is, alumina (Al ₂ O ₃ ) is used.
, Silica (SiO ₂ ), magnesia (MgO), calcia (CaO)
The ceramic raw material powder such as is filled in a press die corresponding to the shape of the lid body 2 shown in FIG. 1 and is applied with a constant pressure for molding, and then the molded product is fired at a temperature of about 1500 ° C. It is produced.

The sealing glass layer 6 applied to the upper surface of the base 1 and the sealing glass layer 8 applied to the lower surface of the lid 2 are made of lead oxide of 52.0 to 62.0% by weight and oxidized, respectively. Silicon 0.5 to 3.0% by weight, boron oxide 2.0 to 7.0% by weight, bismuth oxide 3.0 to 8.0% by weight, willemite as a filler 15.0 to 25.0% by weight, and tin titanate compound 6.0 to 16.0% by weight. Made of glass,
The semiconductor element 4 is hermetically sealed inside the container 3 composed of the base 1 and the lid 2 by heating and melting and integrating them.

Since the glass layers 6 and 8 for sealing have a low softening and melting temperature of 390 ° C. (about 95% of conventional glass for sealing), the glass layers 6 and 8 for sealing are melted and integrated. Let the base 1
When the semiconductor element 4 is hermetically sealed in the container 3 including the lid 2 and the lid 2, even if heat for melting the sealing glass layers 6 and 8 is applied to the semiconductor element 4, the semiconductor element 4 is not It is less likely that thermal destruction or thermal change in characteristics will occur, and the semiconductor element 4 housed inside can be operated normally and stably.

The glass layers 6 and 8 for sealing have a thermal expansion coefficient of 7.2 × 10 ^-6 / ° C., and the thermal expansion coefficient of the alumina ceramics (6.5 to 7.5 ×
10 ^-6 / ° C), the base 1 and the lid 2 are melted and integrated with the glass layers 6 and 8 for sealing to join the base 1 and the lid 2.
When the semiconductor element 4 is hermetically sealed in the container 3 consisting of the lid 2 and the lid 2, the base 1 and the lid 2 and the glass layer 6, 8 for sealing are used.
No large thermal stress is generated between the base 1 and the lid 2 and the glass layers 6 and 8 for encapsulation so that the semiconductor element 4 is completely sealed inside the container 3. It becomes possible to hermetically seal.

The glass layers 6 and 8 for sealing are made of lead oxide (P
If the amount of bO) is less than 52.0% by weight, the sealing glass layer 6,8
The softening and melting temperature of is high and low temperature sealing becomes difficult, and if it exceeds 62.0% by weight, crystallization of the sealing glass layers 6 and 8 progresses, making it difficult to hermetically seal the container 3 and chemical resistance. Deteriorates, and the reliability of hermetically sealing the container 3 is greatly reduced. Therefore, the amount of lead oxide (PbO) is specified in the range of 52.0 to 62.0% by weight.

If the amount of silicon oxide (SiO ₂ ) is less than 0.5% by weight, the glass layers 6 and 8 for sealing are crystallized to make it difficult to hermetically seal the container 3 and to improve the chemical resistance. It deteriorates and the reliability of hermetically sealing the container 3 is greatly reduced,
On the other hand, if it exceeds 3.0% by weight, the softening and melting temperature of the sealing glass layers 6 and 8 becomes high, which makes it difficult to perform low temperature sealing.

Therefore, the amount of silicon oxide (SiO ₂ ) is 0.5 to
It is specified in the range of 3.0% by weight.

The amount of boron oxide (B ₂ O ₃ ) is 2.0
If it is less than wt%, the coefficient of thermal expansion of the sealing glass layers 6 and 8 will be too large to match the coefficient of thermal expansion of the base 1 and the lid 2, and if it exceeds 7.0% by weight, the sealing glass layer 6 and The chemical resistance of No. 8 deteriorates, and the reliability of hermetically sealing the container 3 is greatly reduced. Therefore, the amount of boron oxide (B ₂ O ₃ ) is
It is specified in the range of 2.0 to 7.0% by weight.

The amount of bismuth oxide (Bi ₂ O ₃ ) is
If it is less than 3.0% by weight, the softening melting temperature of the sealing glass layers 6 and 8 becomes high, making it difficult to perform low-temperature sealing, and if it exceeds 8.0% by weight, crystallization of the sealing glass layers 6 and 8 proceeds. In a container
Airtight sealing of 3 becomes difficult. Therefore, the amount of bismuth oxide (Bi ₂ O ₃ ) is specified in the range of 3.0 to 8.0% by weight.

If the amount of willemite (2ZnO.SiO ₂ ) contained as a filler is less than 15.0% by weight, the coefficient of thermal expansion of the sealing glass layers 6 and 8 becomes large and the substrate 1
And the coefficient of thermal expansion of the lid 2 does not match, and when it exceeds 25.0% by weight, the sealing glass layers 6 and 8 are heated and melted to form a substrate.
When the 1 and the lid 2 are joined, the fluidity of the sealing glass layers 6 and 8 becomes extremely poor, and the base 1 and the lid 2 cannot be firmly joined. Therefore, willemite (2Zn
O · The amount of SiO ₂₎ is specified in the range of 15.0 to 25.0 wt%.

If the amount of tin titanate compound (SnO.TiO ₂ ) contained as a filler is less than 6.0% by weight, the coefficient of thermal expansion of the sealing glass layers 6 and 8 becomes large and the substrate 1 and The thermal expansion coefficient of Lid 2 does not match,
When the content exceeds 5% by weight, the sealing glass layers 6,8 are melted by heating to bond the base body 1 and the lid body 2 to each other.
The fluidity of is extremely poor, and it becomes impossible to firmly bond the base 1 and the lid 2. Therefore, the amount of the tin titanate compound (SnO.TiO ₂ ) is specified in the range of 6.0 to 16.0% by weight.

Thus, according to the package for accommodating a semiconductor element of the present invention, the semiconductor element 4 is attached and fixed to the bottom surface of the recess 1a of the base body 1 with an adhesive, and each electrode of the semiconductor element 4 is externally bonded by the bonding wire 7. The glass layers 6 and 8 for sealing, which were connected to the lead terminals 5 and then the base body 1 and the lid body 2 were adhered to the respective main surfaces facing each other.
The base 1 and lid are
The semiconductor element 4 is hermetically sealed in the container 3 composed of 2 and thereby a semiconductor device is completed as a product.

[0026]

According to the package for accommodating a semiconductor element of the present invention, a glass having a low softening and melting temperature as a sealing glass layer for joining a base and a lid and having a thermal expansion coefficient similar to those of the base and the lid. That is, lead oxide 52.0 to 62.0% by weight, silicon oxide 0.5 to 3.0% by weight, boron oxide 2.0 to 7.0% by weight, bismuth oxide 3.0 to 8.0% by weight, and willemite as a filler 15.0 to 25.0% by weight, titanic acid Since glass containing a tin compound in an amount of 6.0 to 16.0% by weight is used, when the semiconductor element is hermetically sealed in the container consisting of the base and the lid, the glass layer for sealing is melted in the semiconductor element. Even if the heat is applied to the semiconductor element, the semiconductor element is less likely to be thermally destroyed or the characteristic is thermally changed, and the semiconductor element accommodated inside can be normally and stably operated.

When the glass layer for sealing is melted and integrated to hermetically seal the inside of the container consisting of the base and the lid, the bonding between the base and the lid and the glass layer for sealing is extremely strong. As a result, it becomes possible to completely hermetically seal the semiconductor element inside the container.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing an example of a semiconductor element housing package of the present invention.

[Explanation of symbols]

 1 ... Base 2 ... Lid 3 ... Container 5 ... External lead terminals 6, 8 ... Glass layer for sealing

Claims (1)

[Claims] 1. A semiconductor element and an external lead terminal to which each electrode of the semiconductor element is connected by a bonding wire are sandwiched between a base made of alumina ceramics and a lid, and glass for sealing is glass-welded. In a package for housing a semiconductor element that hermetically seals a semiconductor element inside, the sealing glass is 52.0 to 62.0% by weight of lead oxide,
Silicon oxide 0.5 to 3.0% by weight, boron oxide 2.0 to 7.0
%, Bismuth oxide 3.0 to 8.0% by weight, glass containing 15.0 to 25.0% by weight of willemite as a filler, and 6.0 to 16.0% by weight of tin titanate compound for storing semiconductor elements package.