JPH05121395A - Surface treating apparatus - Google Patents

Abstract

PURPOSE:To prevent corrosion of a component in contact with treating fluid due to hydrochloric acid while maintaining a structural shape of a present surface treating apparatus by protecting the component in contact with the fluid with a material having excellent corrosion resistance and acid resistance. CONSTITUTION:A scavenger 13, a cooling tube 17, an elevation base 18, and a supporting base 20 are covered with film layers 21 covered with a Zr material having excellent corrosion resistance and acid, resistance. Accordingly, these components are not corroded with hydrochloric acid. A boat elevator having the base 18 for conveying a boat 19 in and out of a predetermined position in a quartz tube 12 provided in a reaction furnace 10 and the base 20 is provided, and the tube 12 is steamoxidized by using treating fluids of hydrochloric acid gas, steam, oxygen.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment apparatus equipped with a reaction furnace for heat treating semiconductor wafers.

[0002]

2. Description of the Related Art Referring to FIG. 2 for explaining the prior art with reference to the drawings, 10 is a furnace body of a vertical reactor, 11 is a heater, and 12 is a quartz tube. A scavenger 13 is an annular pipe through which cooling water circulates. Scavenger 1
3 is attached to the lower surface of the flange portion 12A of the quartz tube 12. Reference numeral 14 is a gas supply pipe for supplying the processing fluid into the quartz pipe 12, and 15 is an exhaust pipe, which is opened in the lower portion of the quartz pipe 12. Reference numeral 16 is a seal ring, and 17 is an annular cooling pipe for cooling the seal ring 16, which is provided on a lift 18 of the boat elevator.

Reference numeral 19 is a semiconductor wafer W to be subjected to oxidation diffusion treatment.
A boat for holding a large number of _P , dummy wafers W _D and filler wafers W _{F in} a stepwise manner, and is loaded on a boat support table 20 on an elevator platform 18 of the boat elevator.

In this structure, the boat elevator is configured so that the boat 19 is mounted on the boat support 2 by a transfer device (not shown).
0, the boat 19 is moved up, and the boat 19 is carried into the quartz tube 12. The wafer carried into the quartz tube 12 is placed in a high temperature processing fluid atmosphere and subjected to oxidation diffusion processing. After a lapse of a predetermined time, the elevator 18 of the boat elevator descends to its original position, the boat 19 is transferred to another place by the transfer device, and the semiconductor wafer subjected to the oxidation diffusion process is transferred to the position. W
_P of ball - ball retrieval and processing before the semiconductor wafer W _P from bets - to DOO 19 transfer is performed.

By the way, in the above diffusion treatment, the quartz tube 1
In order to make the inside of 2 an oxidized state, steam as a processing fluid,
It may be performed using a mixed gas of oxygen and hydrochloric acid gas. In this case, the scavenger 1 in which the cooling water circulates
3, the cooling pipe 17, and the elevator pedestal 18 and the support 20 of the low-temperature boat elevator are cooled by the water vapor in the process fluid flowing into the high temperature space in the quartz tube 12 as water droplets. Condensate. As a result, the hydrochloric acid gas in the treatment fluid dissolves in the water droplets, and the scavenger 13, the cooling pipe 17 and the like, which are usually made of stainless steel, are corroded and rust occurs. If this rust is made into particles (particulates) and fills the inside of the quartz tube 12, it may be attached to the processed semiconductor wafer W _P , which may adversely affect the oxidation diffusion process of the semiconductor wafer W _P.

[0006]

In order to solve this problem, a scavenger and a temperature adjusting device for raising the temperature of the cooling water circulating in the cooling pipe are provided so that the surface of the scavenger and the cooling pipe is condensed. Although it is possible to suppress water droplets, it causes a problem that the structure of the surface treatment device becomes large and complicated.

The present invention has been made to solve the above problems, and provides a surface treatment apparatus capable of preventing hydrochloric acid corrosion of a component in contact with a treatment fluid while maintaining the existing structure of the present surface treatment apparatus. The purpose is to do.

[0008]

In order to achieve the above object, the surface treatment apparatus of the present invention comprises a reaction furnace, a quartz tube provided in the reaction furnace, a scavenger attached to the lower part of the quartz tube, and a surface. A holder for holding a semiconductor wafer to be processed.
A quartz tube, a boat lifter for loading and unloading the boat to and from the quartz tube at a predetermined position, and a cooling tube mounted on the elevator table. In a surface treatment apparatus for performing steam oxidation using a treatment fluid of gas, steam, and oxygen, at least the surface portion of the cooling pipe, the scavenger, the lift table of the boat elevator and the support table in contact with the treatment fluid are corrosion-resistant, It is characterized by being protected by a material with excellent acid resistance.

[0009]

In the above-described surface treatment apparatus of the present invention, only the parts in contact with the treatment fluid are protected by the corrosion-resistant and acid-resistant materials, so that the structure of the surface treatment apparatus is not complicated and large-sized in the reactor. Hydrochloric acid corrosion of parts can be prevented.

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIG.

In FIG. 1, 13A is a scavenger 13.
, 13B is the inner peripheral surface of the scavenger 13, 17A is the upper surface of the cooling pipe 17, 17B is the inner peripheral surface of the cooling pipe 17,
A is the upper surface of the lift table 18 of the boat elevator, 20A is the upper surface of the support table 20, and 20B is the outer peripheral surface of the support table 20. Corrosion resistance and acid resistance are provided on each surface portion by physical vapor deposition or chemical vapor deposition. A film layer 21 covered with a material having excellent properties, for example, a zirconium material is formed. After forming this coating film, heat treatment is performed in vacuum or in an inert gas.

Further, using a zirconium plate, the scavenger 13, the cooling pipe 17, the lift 18 and the support 20 are used.
A film layer 21 is formed on each surface part of the so-called 2
A layered metal may be used, and in this case, the heat treatment is performed in vacuum or in an inert gas.

Further, the scavenger 13, the cooling pipe 17, the lift table 18 for the boat elevator, and the support table 20 are corrosion-resistant,
It may be made of a material having excellent acid resistance, for example, a zirconium material. Others are shown in FIG.
The configuration is the same as the above.

As described above, according to the present embodiment, the scavenger 13, the cooling pipe 17, the lift table 18 and the support table 20 for the boat elevator, which come into contact with the processing fluid, have water drops due to the cooling action on their respective surface portions. Even when the hydrochloric acid gas is condensed and dissolved in the water droplets, it is not corroded, so that it is possible to prevent the generation of rust which causes the formation of particles.

[0015]

As described above, the present invention protects parts in contact with a processing fluid with a material excellent in corrosion resistance and acid resistance, and does not complicate or enlarge the structure of the surface treatment apparatus, and the reaction furnace Since it is possible to prevent hydrochloric acid corrosion and rust generation of the internal parts, it is possible to eliminate the factor that rust and the like fills the inside of the quartz tube as particles (particulates).

[Brief description of drawings]

FIG. 1 is a schematic view of a vertical cross section of a surface treatment apparatus as an embodiment of the present invention.

FIG. 2 is a vertical cross-sectional schematic configuration diagram of a surface treatment apparatus as a conventional technique.

[Explanation of symbols]

 10 Furnace Body 11 Heater 12 Quartz Tube 13 Scavenger 13A Scavenger Lower Surface 13B Scavenger Inner Surface 14 Supply Pipe 15 Exhaust Pipe 16 Seal Ring 17 Water Cooling Pipe 17A Cooling Pipe Upper Surface 17B Cooling Pipe Inner Surface 18 Lifting Table 18A Lifting Platform Upper Surface 19 Boat 20 support base 20A support base upper surface 20B support base outer peripheral surface 21 membrane layer

Claims (1)

[Claims] 1. A reaction furnace, a quartz tube provided in the reaction furnace, a scavenger attached to the lower part of the quartz tube, a boat for holding a semiconductor wafer to be surface-treated, and the boat in the quartz tube. It is equipped with a boat elevator which is carried in and out of a predetermined position and a support base, and a cooling pipe which is mounted on the elevator, and a treatment fluid of hydrochloric acid gas, water vapor and oxygen is used in the quartz tube. In the surface treatment apparatus for performing steam oxidation by means of steam oxidation, it is necessary to protect at least the surface portions of the scavenger, the cooling pipe, the lift table of the boat elevator and the support table that come into contact with the treatment fluid with a material having excellent corrosion resistance and acid resistance. A characteristic surface treatment device.