JPH0511307U - Vacuum device - Google Patents
Vacuum deviceInfo
- Publication number
- JPH0511307U JPH0511307U JP6642491U JP6642491U JPH0511307U JP H0511307 U JPH0511307 U JP H0511307U JP 6642491 U JP6642491 U JP 6642491U JP 6642491 U JP6642491 U JP 6642491U JP H0511307 U JPH0511307 U JP H0511307U
- Authority
- JP
- Japan
- Prior art keywords
- flange
- vacuum
- gap
- yoke
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Abstract
(57)【要約】
【目的】 ベーキング処理を行ってもリークが発生しな
い真空装置を提供すること。
【構成】 集束レンズ1の上段に位置する電子銃室を、
例えば200℃でベーキング処理すると、鉄コバルトか
ら成るヨーク2,純鉄から成るフランジ3は200℃程
度に加熱される。この為、ヨーク2とフランジ3は熱膨
張する。純鉄の熱膨脹係数は鉄コバルトのそれよりも大
きいので、フランジ3の垂直方向の熱膨脹はヨーク2の
それよりも大きい。この為、メタルOリング6とフラン
ジ3間にΔlの隙間が生じる。ところで、ブッシュ7
は、200℃では常温の時と比べてΔlだけ熱膨張する
部材が選ばれているので、ベーキング処理時、該ブッシ
ュ7は熱膨脹してヨーク2をΔlだけ上方に持ち上げ
る。この為、メタルOリング6とフランジ3間に隙間は
発生せず、電子銃室は集束レンズ1のコイル部分から真
空シールされる。
(57) [Abstract] [Purpose] To provide a vacuum device in which leakage does not occur even if baking processing is performed. [Structure] The electron gun chamber located above the focusing lens 1 is
For example, when baking is performed at 200 ° C., the yoke 2 made of iron cobalt 2 and the flange 3 made of pure iron are heated to about 200 ° C. Therefore, the yoke 2 and the flange 3 are thermally expanded. Since the coefficient of thermal expansion of pure iron is larger than that of iron cobalt, the vertical thermal expansion of the flange 3 is larger than that of the yoke 2. Therefore, a gap of Δl is generated between the metal O-ring 6 and the flange 3. By the way, bush 7
Is selected as a member that thermally expands by Δl at 200 ° C. as compared with that at room temperature, so that the bush 7 thermally expands and lifts the yoke 2 by Δl during the baking process. Therefore, no gap is generated between the metal O-ring 6 and the flange 3, and the electron gun chamber is vacuum-sealed from the coil portion of the focusing lens 1.
Description
【0001】[0001]
【産業上の利用分野】 本考案は、電子顕微鏡などの真空装置に関する。TECHNICAL FIELD The present invention relates to a vacuum device such as an electron microscope.
【0002】[0002]
【従来の技術】 電子顕微鏡などの真空装置においては、高温でベーキング処理 を行う事から、真空シール部分には耐熱に適したメタルOリングが使用されてい る。例えば、電子銃室の下段に位置する電子レンズでは、コイルの周囲には鉄コ バルトや純鉄を繋ぎ合わせた磁路が形成されているが、その繋ぎ合わせ部分の真 空シール部分にはメタルOリングが使用されている。2. Description of the Related Art In a vacuum apparatus such as an electron microscope, a baking process is carried out at a high temperature, so that a metal O-ring suitable for heat resistance is used in a vacuum seal portion. For example, in the electron lens located in the lower stage of the electron gun chamber, a magnetic path formed by connecting iron cobalt and pure iron is formed around the coil. O-rings are used.
【0003】[0003]
【考案が解決しようとする課題】 さて、電子レンズを高温でベーキング処理す ると前記鉄コバルトや純鉄は膨脹する。そして、これらの部材の熱膨脹係数は異 なるため、メタルOリングと部材の間に隙間ができ、リークが発生する。このリ ークによって大量のガスが真空内に入り込み、真空内を汚染してしまう。When the electron lens is baked at a high temperature, the iron cobalt and pure iron expand. Since the thermal expansion coefficients of these members are different, a gap is created between the metal O-ring and the member, causing a leak. This leak causes a large amount of gas to enter the vacuum and contaminate the vacuum.
【0004】 本考案はこの様な問題を解決する新規な真空装置を提供するものである。The present invention provides a novel vacuum device that solves such a problem.
【0005】[0005]
【課題を解決するための手段】 本考案の真空装置は、ベーキング処理により金 属と耐熱真空シール部材の間に隙間が生ずるのを防ぐため、前記処理時に該隙間 分だけ熱膨脹する熱膨脹部材を、その膨脹により前記隙間をなくす位置に埋め込 んだ構造となっている。Means for Solving the Problems The vacuum device of the present invention comprises a thermal expansion member that expands by the amount of the gap at the time of the treatment in order to prevent a gap from occurring between the metal and the heat-resistant vacuum seal member during the baking treatment. Due to the expansion, the structure is embedded in a position where the gap is eliminated.
【0006】[0006]
【実施例】 図1は本考案の一実施例を示す断面図で、1は電子銃室の下段に位 置する電子顕微鏡の集束レンズである。この集束レンズ1は、鉄コバルトから成 るヨーク2,純鉄から成るフランジ3および励磁コイル4から成る。5はライナ ーチューブ、6は電子銃室と集束レンズ1を真空シールするためのメタルOリン グ、7は後述するブッシュである。Embodiment FIG. 1 is a cross-sectional view showing an embodiment of the present invention, in which reference numeral 1 is a focusing lens of an electron microscope located in the lower stage of the electron gun chamber. This focusing lens 1 comprises a yoke made of iron cobalt, a flange 3 made of pure iron, and an exciting coil 4. Reference numeral 5 is a liner tube, 6 is a metal O ring for vacuum-sealing the electron gun chamber and the focusing lens 1, and 7 is a bush described later.
【0007】 このような構成において、集束レンズ1を例えば200℃でベーキング処理す ると、ヨーク2,フランジ3は200℃程度に加熱される。この為、ヨーク2と フランジ3は熱膨張する。ところで、純鉄の熱膨脹係数は鉄コバルトのそれより も大きいので、フランジ3の垂直方向の熱膨脹はヨーク2のそれよりも大きい。 この為、図2に示すように、メタルOリング6とフランジ3間にΔlの隙間が生 じる。In such a structure, when the focusing lens 1 is baked at 200 ° C., for example, the yoke 2 and the flange 3 are heated to about 200 ° C. Therefore, the yoke 2 and the flange 3 are thermally expanded. By the way, since the coefficient of thermal expansion of pure iron is larger than that of iron cobalt, the vertical thermal expansion of the flange 3 is larger than that of the yoke 2. Therefore, as shown in FIG. 2, a gap of Δl is generated between the metal O-ring 6 and the flange 3.
【0008】 ところで、前記ブッシュ7は、200℃では常温の時と比べてΔlだけ熱膨張 する部材が選ばれている。そして、このブッシュ7は、フランジ3中の図1に示 す位置に埋め込まれているので、ブッシュ7は熱膨脹してヨーク2をΔlだけ上 方に持ち上げる。従って、メタルOリング6とフランジ3の間に隙間は発生せず 、電子銃室は集束レンズ1のコイル部分から真空シールされる。By the way, as the bush 7, a member is selected that thermally expands by Δl at 200 ° C. as compared with that at room temperature. Since the bush 7 is embedded in the flange 3 at the position shown in FIG. 1, the bush 7 thermally expands and lifts the yoke 2 upward by Δl. Therefore, no gap is generated between the metal O-ring 6 and the flange 3, and the electron gun chamber is vacuum-sealed from the coil portion of the focusing lens 1.
【0009】 また、ブッシュ7をヨーク2の上端もしくは下端に埋め込んでも、ベーキング 処理による隙間の発生を防止できる。また、ブッシュ7をフランジ3のメタルO リング6と接触する位置に埋め込んでも同様な効果が得られる。Further, even if the bush 7 is embedded in the upper end or the lower end of the yoke 2, it is possible to prevent the generation of the gap due to the baking process. Also, the same effect can be obtained by embedding the bush 7 at a position where it contacts the metal O-ring 6 of the flange 3.
【0010】[0010]
【考案の効果】 本考案によれば、ベーキング処理により金属と耐熱真空シール 部材の間に隙間が生ずるのを防ぐため、前記処理時に該隙間分だけ熱膨脹する熱 膨張部材を、その膨脹により前記隙間をなくす位置に埋め込んだので、ベーキン グ処理による隙間は発生しない。この為、リークは発生せず、真空室は真空に保 たれる。According to the present invention, in order to prevent a gap from being formed between the metal and the heat-resistant vacuum seal member by the baking process, the thermal expansion member that expands by the amount of the gap during the process is expanded by the expansion. Since it is embedded at the position where the bake is eliminated, no gap is created by the baking process. Therefore, no leak occurs and the vacuum chamber is kept in vacuum.
【図1】 本考案の一実施例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of the present invention.
【図2】 本考案を説明するために示したものである。FIG. 2 is provided to explain the present invention.
1…集束レンズ、2…ヨーク、3…フランジ、4…励磁
コイル、5…ライナーチューブ、6…メタルOリング、
7…ブッシュ1 ... Focusing lens, 2 ... Yoke, 3 ... Flange, 4 ... Excitation coil, 5 ... Liner tube, 6 ... Metal O-ring,
7 ... Bush
Claims (1)
に耐熱真空シール部材を配置して真空室の真空状態を維
持する真空装置において、ベーキング処理により前記金
属と耐熱真空シール部材の間に隙間が生ずるのを防ぐた
め、前記処理時に該隙間分だけ熱膨脹する熱膨脹部材
を、その膨脹により前記隙間をなくす位置に埋め込んだ
事を特徴とする真空装置。1. A vacuum device for maintaining a vacuum state of a vacuum chamber by disposing a heat-resistant vacuum seal member in a vacuum seal portion of a metal joining portion, wherein a gap is formed between the metal and the heat-resistant vacuum seal member by baking treatment. In order to prevent this from occurring, a vacuum device characterized in that a thermal expansion member that expands by the amount of the gap during the treatment is embedded in a position where the gap is eliminated by the expansion.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6642491U JPH0511307U (en) | 1991-07-26 | 1991-07-26 | Vacuum device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6642491U JPH0511307U (en) | 1991-07-26 | 1991-07-26 | Vacuum device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0511307U true JPH0511307U (en) | 1993-02-12 |
Family
ID=13315397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6642491U Withdrawn JPH0511307U (en) | 1991-07-26 | 1991-07-26 | Vacuum device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0511307U (en) |
-
1991
- 1991-07-26 JP JP6642491U patent/JPH0511307U/en not_active Withdrawn
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19951102 |