JPH05111754A - Nitrogen re-flow device - Google Patents

Nitrogen re-flow device

Info

Publication number
JPH05111754A
JPH05111754A JP26444591A JP26444591A JPH05111754A JP H05111754 A JPH05111754 A JP H05111754A JP 26444591 A JP26444591 A JP 26444591A JP 26444591 A JP26444591 A JP 26444591A JP H05111754 A JPH05111754 A JP H05111754A
Authority
JP
Japan
Prior art keywords
zone
temperature
nitrogen gas
heating chamber
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26444591A
Other languages
Japanese (ja)
Other versions
JP3114278B2 (en
Inventor
Toshio Nishi
壽雄 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP26444591A priority Critical patent/JP3114278B2/en
Publication of JPH05111754A publication Critical patent/JPH05111754A/en
Application granted granted Critical
Publication of JP3114278B2 publication Critical patent/JP3114278B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To control the temperature rising of the uniform heating zone and lower the temperature of the cooling zone, by cooling the nitrogen gas and again returning it to each original zone on the way of the by-pass route which introduces the high temperature nitrogen gas of the uniform heating zone and the cooling zone. CONSTITUTION:A high temperature nitrogen gas N2 in an uniform heating zone and a cooling zone is once introduced to a by-pass routes 16a, 16b by driving a suction fan 17, the nitrogen gas N2 which flows in the bypass route 16a, 16b is cooled and returns again to each zones 7, 9 by blowing the air generated by driving the fan 18 against the bypass route 16a, 16b on the way of this bypass route. Therefore, the rising of temperature of the uniform heating zone 7 is controlled, the uniform heating zone 7 is kept in the almost uniform temperature, and the temperature of the neighbor of outlet part 13 is reduced, so the ideal temperature profile T can be realized.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はチッソリフロー装置に係
り、詳しくは加熱室の均熱ゾーンと冷却ゾーンを冷却し
て、リフロー装置の理想的な温度プロファイルを実現す
るための手段に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chisso reflow apparatus, and more particularly to a means for cooling a soaking zone and a cooling zone of a heating chamber to realize an ideal temperature profile of the reflow apparatus.

【0002】[0002]

【従来の技術】基板に電子部品を実装するにあたって
は、基板に形成された銅箔などの回路パターンの電極部
にクリーム半田を塗布し、このクリーム半田上に電子部
品を接着した後、この基板をリフロー装置へ送りクリー
ム半田の加熱処理が行われる。従来、このような半田の
加熱処理は、空気の加熱手段を有するエアリフロー装置
により行われていた。
2. Description of the Related Art When mounting electronic components on a substrate, cream solder is applied to the electrode portion of a circuit pattern such as a copper foil formed on the substrate, the electronic components are bonded onto the cream solder, and then this substrate is mounted. Is sent to the reflow device and the heat treatment of the cream solder is performed. Conventionally, such heat treatment of solder has been performed by an air reflow device having an air heating means.

【0003】図2を参照しながら、従来のエアリフロー
装置を説明する。ヒータ1およびファン2が配設された
加熱室3内に、コンベア4により基板5を搬送し、この
ヒータ1により電子部品Pを基板5に接着するクリーム
半田の加熱処理を行う。この加熱室3の内部は、仕切壁
により予熱ゾーン6、均熱ゾーン7、クリーム半田を溶
融する高温の溶融ゾーン8に区画され、この加熱室3の
下流側に低温の冷却ゾーン9が並設されており、外部か
ら常温の空気を均熱ゾーン7に供給して均熱ゾーン7の
温度を略一定に保持させるとともに、予熱ゾーン6およ
び冷却ゾーン9の高温空気を排出して、破線矢印に示す
ように入口部12と出口部13から常温空気を導入する
ことにより入口部12と出口部13付近の温度を下げ
て、同図実線Tに示すような理想的な温度プロファイル
が実現される。
A conventional air reflow apparatus will be described with reference to FIG. The substrate 5 is conveyed by the conveyor 4 into the heating chamber 3 in which the heater 1 and the fan 2 are arranged, and the heater 1 heats the cream solder for bonding the electronic component P to the substrate 5. The interior of the heating chamber 3 is divided by a partition wall into a preheating zone 6, a soaking zone 7, and a high-temperature melting zone 8 for melting the cream solder, and a low-temperature cooling zone 9 is arranged downstream of the heating chamber 3. The temperature of the soaking zone 7 is maintained substantially constant by supplying air at room temperature to the soaking zone 7 from the outside, and the high temperature air in the preheating zone 6 and the cooling zone 9 is discharged to the dashed arrow. As shown, by introducing room temperature air from the inlet portion 12 and the outlet portion 13, the temperature near the inlet portion 12 and the outlet portion 13 is lowered, and an ideal temperature profile as shown by the solid line T in the figure is realized.

【0004】しかし、このようなエアリフロー装置で
は、加熱室1内に供給される空気中に酸素が含まれてい
るので、銅箔などから成る回路パターンやクリーム半田
等の金属部が加熱されて酸化しやすく、酸化すると半田
のヌレ性が低下し、電子部品Pを基板5に良好に接着で
きなくなりやすい問題があった。
However, in such an air reflow apparatus, since the air supplied to the heating chamber 1 contains oxygen, the circuit pattern made of copper foil or the like and the metal portion such as cream solder are heated. There is a problem that it is easy to oxidize, and when it oxidizes, the wetting property of the solder deteriorates, and the electronic component P cannot be easily adhered to the substrate 5 well.

【0005】その改善策として、回路パターンやクリー
ム半田が酸化する虞れのないチッソガス雰囲気中におい
て、加熱処理を行うチッソリフロー装置が提案されてい
る。
As a remedy for this problem, there has been proposed a nitrogen reflow device for performing heat treatment in a nitrogen gas atmosphere in which there is no fear of oxidation of the circuit pattern or cream solder.

【0006】図3を参照しながら、従来のチッソリフロ
ー装置を説明する。なお、図2に示す構成部品と同じ部
品には同一符号を付して説明を省略する。14はチッソ
ガス供給部であり、このチッソガス供給部14から供給
されたチッソガスN2 は、加熱室3の各ゾーン6〜9内
に常時供給される。
A conventional chisso reflow apparatus will be described with reference to FIG. The same parts as those shown in FIG. 2 are designated by the same reference numerals and the description thereof will be omitted. Reference numeral 14 denotes a nitrogen gas supply section, and the nitrogen gas N2 supplied from the nitrogen gas supply section 14 is constantly supplied into each zone 6 to 9 of the heating chamber 3.

【0007】[0007]

【発明が解決しようとする課題】ところが、従来のチッ
ソリフロー装置は、チッソガス雰囲気中において加熱処
理を行うため、図2に示すエアリフロー装置のように酸
素を含んだ空気を加熱室1内に導入して上記温度プロフ
ァイルTを実現することはできず、破線T′に示すよう
な温度プロファイル、すなわち均熱ゾーン7でも温度は
次第に上昇し、また冷却ゾーン9では温度は十分に低下
しない温度プロファイルとなっていた。殊に、冷却ゾー
ン9における温度低下が不十分なことから、基板5は十
分に冷却されないまま加熱室1から排出され、このため
空気中の酸素と反応して基板5の回路パターンなどの金
属部が酸化しやすい問題点があった。
However, since the conventional nitrogen reflow apparatus performs the heat treatment in the nitrogen gas atmosphere, the air containing oxygen is introduced into the heating chamber 1 like the air reflow apparatus shown in FIG. Therefore, the temperature profile T cannot be realized, and the temperature profile as shown by the broken line T ′, that is, the temperature profile in the soaking zone 7 gradually increases, and the temperature profile in the cooling zone 9 does not sufficiently decrease. Was becoming. In particular, since the temperature drop in the cooling zone 9 is insufficient, the substrate 5 is discharged from the heating chamber 1 without being sufficiently cooled, and as a result, reacts with oxygen in the air to cause a metal portion such as a circuit pattern of the substrate 5. However, there was a problem that it was easily oxidized.

【0008】そこで本発明は、理想的な温度プロファイ
ルを実現することができるチッソリフロー装置を提供す
ることを目的とする。
Therefore, an object of the present invention is to provide a chisso reflow device which can realize an ideal temperature profile.

【0009】[0009]

【課題を解決するための手段】本発明は、ヒータとファ
ンが配設され、且つ入口部から出口部に向かって、予熱
ゾーン、均熱ゾーン、溶融ゾーンに区画された加熱室お
よび冷却ゾーンと、この加熱室の入口部から出口部へ基
板を搬送するコンベアと、上記加熱室にチッソガスを供
給するチッソガス供給部とを備えたチッソリフロー装置
において、上記均熱ゾーンおよびまたは冷却ゾーンに、
加熱室内の高温チッソガスを導出して再度加熱室に戻す
バイパス路を設け、このバイパス路の途中にチッソガス
の冷却手段を設けたものである。
According to the present invention, there is provided a heating chamber and a cooling zone which are provided with a heater and a fan and which are divided into a preheating zone, a soaking zone and a melting zone from an inlet portion toward an outlet portion. , A conveyor that conveys the substrate from the inlet to the outlet of the heating chamber, and in a Chisso reflow device having a Chisso gas supply unit that supplies Chisso gas to the heating chamber, in the soaking zone and or cooling zone,
A bypass passage is provided for discharging the high-temperature nitrogen gas in the heating chamber and returning it to the heating chamber again, and a cooling means for the nitrogen gas is provided in the middle of the bypass passage.

【0010】[0010]

【作用】上記構成において、上記均熱ゾーンおよびまた
は冷却ゾーンの高温チッソガスをバイパス路により導出
し、このバイパス路の途中において、このチッソガスを
冷却手段により冷却して再度各ゾーンに戻すことによ
り、均熱ゾーンの温度上昇を防止するとともに、出口部
付近の温度を極力低下させて、理想の温度プロファイル
を実現できる。
In the above structure, the high temperature nitrogen gas in the soaking zone and / or the cooling zone is led out by the bypass passage, and in the middle of the bypass passage, the nitrogen gas is cooled by the cooling means and returned to each zone again, so that the uniform temperature is maintained. An ideal temperature profile can be realized by preventing the temperature in the heat zone from rising and reducing the temperature near the outlet as much as possible.

【0011】[0011]

【実施例】次に、図面を参照しながら本発明の実施例を
説明する。なお、図2および図3に示す構成部品と同じ
部品には同一符号を付して説明を省略する。
Embodiments of the present invention will now be described with reference to the drawings. The same components as those shown in FIGS. 2 and 3 are designated by the same reference numerals and the description thereof will be omitted.

【0012】図1はチッソリフロー装置の側面図であ
る。15は冷却ゾーン9に設けられたシャワー部であ
り、コンベア4上の基板5に、チッソガス供給部14か
ら供給された新たなチッソガスN2 を吹き付けてこの基
板5を効果的に冷却するものである。16a,16bは
バイパス路であり、均熱ゾーン7と冷却ゾーン9に設け
られている。なお、本実施例ではバイパス路16a,1
6bの吸出部a,bは、熱効率を良くするためにチッソ
ガスN2 の温度が低い両ゾーン6,9の下部に設けられ
ている。
FIG. 1 is a side view of the chisso reflow apparatus. Reference numeral 15 denotes a shower unit provided in the cooling zone 9, which sprays new nitrogen gas N2 supplied from the nitrogen gas supply unit 14 onto the substrate 5 on the conveyor 4 to effectively cool the substrate 5. 16a and 16b are bypass passages, which are provided in the soaking zone 7 and the cooling zone 9. In this embodiment, the bypass paths 16a, 1
The suction portions a and b of 6b are provided below both zones 6 and 9 where the temperature of the nitrogen gas N2 is low in order to improve the thermal efficiency.

【0013】17はチッソガスN2 の吸引用のファンで
あって、各バイパス路16a,16bの途中に設けられ
ており、18は冷却手段としてのファンである。吸引用
のファン17を駆動して、均熱ゾーン7と冷却ゾーン9
内の高温チッソガスN2 を一旦バイパス路16a,16
bへ導出し、このバイパス路16a,16bの途中にお
いて、ファン18の駆動により発生した空気を外部から
バイパス路16a,16bに吹き付けて、バイパス路1
6a,16b内を流れるチッソガスN2 を冷却し、再度
各ゾーン7,9に戻す。これにより、均熱ゾーン7の温
度上昇は抑えられて、均熱ゾーン7は略一定温度を保持
し、また出口部13付近の温度は低下し、理想の温度プ
ロファイルTが実現できる。しかも本手段によれば、加
熱室3内のチッソガスN2 をバイパス路16a,16b
を循環させながら、理想の温度プロファイルTを実現で
きるので、この理想の温度プロファイルTを実現するた
めに新たな冷却用のチッソガスN2 を加熱室3に供給す
る必要がなく、高価なチッソガスN2 の消費量を節減し
て、低いランニングコストで、理想的な温度プロファイ
ルを実現することができる。
Reference numeral 17 is a fan for sucking nitrogen gas N2, which is provided in the middle of each bypass 16a, 16b, and 18 is a fan as a cooling means. By driving the suction fan 17, the soaking zone 7 and the cooling zone 9
The high temperature nitrogen gas N2 in the inside is once passed through the bypass passages 16a, 16
b, and the air generated by the drive of the fan 18 is blown from the outside to the bypass passages 16a, 16b in the middle of the bypass passages 16a, 16b to blow the bypass passages 1a, 16b.
The nitrogen gas N2 flowing in 6a and 16b is cooled and returned to the zones 7 and 9 again. As a result, the temperature rise in the soaking zone 7 is suppressed, the soaking zone 7 maintains a substantially constant temperature, and the temperature in the vicinity of the outlet 13 is lowered, so that an ideal temperature profile T can be realized. Moreover, according to this means, the nitrogen gas N2 in the heating chamber 3 is bypassed to the bypass passages 16a and 16b.
Since it is possible to realize the ideal temperature profile T while circulating the air, there is no need to supply new cooling nitrogen gas N2 to the heating chamber 3 in order to realize this ideal temperature profile T, and the consumption of expensive nitrogen gas N2 The amount can be reduced and an ideal temperature profile can be realized with low running cost.

【0014】本発明は上記実施例に限定されないのであ
って、例えばバイパス路16aは、チッソガスN2 の戻
し口側をファン2上に結合すれば、吸引用ファン17を
使用しなくとも、このファン2の風圧を利用して、路内
のチッソガスN2 の流通ができる。
The present invention is not limited to the above embodiment. For example, in the bypass passage 16a, if the return port side of the nitrogen gas N2 is connected to the fan 2, the fan 2 for suction can be used without using the suction fan 17. By utilizing the wind pressure of, the nitrogen gas N2 can be distributed in the road.

【0015】[0015]

【発明の効果】以上説明したように本発明は、加熱室の
均熱ゾーンおよびまたは冷却ゾーンに、この加熱室内の
高温チッソガスを導出して再度加熱室に戻すバイパス路
を設け、このバイパス路の途中にチッソガスの冷却手段
を設けてチッソリフロー装置を構成することで、均熱ゾ
ーンの温度上昇を抑えるとともに、冷却ゾーンの温度を
低下させて、理想的な温度プロファイルを実現すること
ができ、しかも理想の温度プロファイルを実現するため
に、新たにチッソガスを加熱室内に供給する必要がない
ので、高価なチッソガスの消費量を削減し、ランニング
コストを抑えることができる。
As described above, according to the present invention, in the soaking zone and / or the cooling zone of the heating chamber, a bypass passage is provided, in which the hot nitrogen gas in the heating chamber is led out and returned to the heating chamber again. By configuring a chisso reflow device by providing a cooling means for the nitrogen gas on the way, it is possible to suppress the temperature rise in the soaking zone and lower the temperature in the cooling zone to realize an ideal temperature profile. Since it is not necessary to newly supply the nitrogen gas into the heating chamber in order to realize the ideal temperature profile, the consumption amount of expensive nitrogen gas can be reduced and the running cost can be suppressed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係るチッソリフロー装置の側面図FIG. 1 is a side view of a chisso reflow device according to the present invention.

【図2】従来手段に係るエアリフロー装置の側面図FIG. 2 is a side view of an air reflow device according to a conventional means.

【図3】従来手段に係るチッソリフロー装置の側面図FIG. 3 is a side view of a conventional chisso reflow device.

【符号の説明】[Explanation of symbols]

1 ヒータ 2 ファン 3 加熱室 5 基板 6 予熱ゾーン 7 均熱ゾーン 8 溶融ゾーン 9 冷却ゾーン 12 入口部 13 出口部 14 チッソガス供給部 16 バイパス路 18 冷却手段 N2 チッソガス 1 Heater 2 Fan 3 Heating Chamber 5 Substrate 6 Preheating Zone 7 Soaking Zone 8 Melting Zone 9 Cooling Zone 12 Inlet 13 Outlet 14 Chisso Gas Supply 16 Bypass 18 Cooling Means N2 Chisso Gas

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】ヒータとファンが配設され、且つ入口部か
ら出口部に向かって、予熱ゾーン、均熱ゾーン、溶融ゾ
ーンに区画された加熱室および冷却ゾーンと、この加熱
室の入口部から出口部へ基板を搬送するコンベアと、上
記加熱室にチッソガスを供給するチッソガス供給部とを
備えたチッソリフロー装置において、上記均熱ゾーンお
よびまたは冷却ゾーンに、加熱室内の高温チッソガスを
導出して再度加熱室に戻すバイパス路を設け、このバイ
パス路の途中にチッソガスの冷却手段を設けたことを特
徴とするチッソリフロー装置。
1. A heating chamber and a cooling zone, which are provided with a heater and a fan, and are divided into a preheating zone, a soaking zone, and a melting zone from an inlet portion to an outlet portion, and an inlet portion of the heating chamber. In a Chisso reflow apparatus having a conveyor for conveying a substrate to the outlet and a Chisso gas supply unit for supplying Nisso gas to the heating chamber, the soaking zone and / or the cooling zone, the high temperature Chisso gas in the heating chamber is led out again. A chisso reflow device comprising a bypass passage for returning to the heating chamber, and a cooling means for the nitrogen gas provided in the middle of the bypass passage.
JP26444591A 1991-10-14 1991-10-14 Chisso reflow device Expired - Fee Related JP3114278B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26444591A JP3114278B2 (en) 1991-10-14 1991-10-14 Chisso reflow device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26444591A JP3114278B2 (en) 1991-10-14 1991-10-14 Chisso reflow device

Publications (2)

Publication Number Publication Date
JPH05111754A true JPH05111754A (en) 1993-05-07
JP3114278B2 JP3114278B2 (en) 2000-12-04

Family

ID=17403299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26444591A Expired - Fee Related JP3114278B2 (en) 1991-10-14 1991-10-14 Chisso reflow device

Country Status (1)

Country Link
JP (1) JP3114278B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005000513A1 (en) * 2003-06-27 2005-01-06 Kabushiki Kaisha Tamura Seisakusho Reflow device
JP2014157879A (en) * 2013-02-14 2014-08-28 Tamura Seisakusho Co Ltd Reflow device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5265894A (en) * 1993-03-03 1993-11-30 Bullet Golf Ball, Inc. Wheeled cover for golf bag or the like
KR101874559B1 (en) * 2016-12-07 2018-08-02 동양피스톤 주식회사 Piston for vehicle engine and method for manufacturing the same
KR101874560B1 (en) * 2016-12-08 2018-07-04 동양피스톤 주식회사 Piston for vehicle engine and method for manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005000513A1 (en) * 2003-06-27 2005-01-06 Kabushiki Kaisha Tamura Seisakusho Reflow device
JP2014157879A (en) * 2013-02-14 2014-08-28 Tamura Seisakusho Co Ltd Reflow device

Also Published As

Publication number Publication date
JP3114278B2 (en) 2000-12-04

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