JP3114278B2 - Chisso reflow device - Google Patents

Chisso reflow device

Info

Publication number
JP3114278B2
JP3114278B2 JP26444591A JP26444591A JP3114278B2 JP 3114278 B2 JP3114278 B2 JP 3114278B2 JP 26444591 A JP26444591 A JP 26444591A JP 26444591 A JP26444591 A JP 26444591A JP 3114278 B2 JP3114278 B2 JP 3114278B2
Authority
JP
Japan
Prior art keywords
zone
heating chamber
chissogasu
cooling
nitrogen gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP26444591A
Other languages
Japanese (ja)
Other versions
JPH05111754A (en
Inventor
壽雄 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP26444591A priority Critical patent/JP3114278B2/en
Publication of JPH05111754A publication Critical patent/JPH05111754A/en
Application granted granted Critical
Publication of JP3114278B2 publication Critical patent/JP3114278B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はチッソリフロー装置に係
り、詳しくは加熱室の均熱ゾーンおよびまたは冷却ゾー
の温度を低下させて、理想的な温度プロファイルを実
現するためのチッソリフロー装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nitrogen reflow apparatus, and more particularly to a nitrogen reflow apparatus for lowering the temperature of a soaking zone and / or a cooling zone of a heating chamber to realize an ideal temperature profile.

【0002】[0002]

【従来の技術】基板に電子部品を実装するにあたって
は、基板に形成された銅箔などの回路パターンの電極部
にクリーム半田を塗布し、このクリーム半田上に電子部
品を接着した後、この基板をリフロー装置へ送りクリー
ム半田の加熱処理が行われる。従来、このような半田の
加熱処理は、空気の加熱手段を有するエアリフロー装置
により行われていた。
2. Description of the Related Art When mounting an electronic component on a board, cream solder is applied to an electrode portion of a circuit pattern such as a copper foil formed on the board, and the electronic component is bonded onto the cream solder. Is sent to the reflow device, and the heat treatment of the cream solder is performed. Conventionally, such a heat treatment of solder has been performed by an air reflow device having an air heating means.

【0003】図2を参照しながら、従来のエアリフロー
装置を説明する。ヒータ1およびファン2が配設された
加熱室3内に、コンベア4により基板5を搬送し、この
ヒータ1により電子部品Pを基板5に接着するクリーム
半田の加熱処理を行う。この加熱室3の内部は、仕切壁
により予熱ゾーン6、均熱ゾーン7、クリーム半田を溶
融する高温の溶融ゾーン8に区画され、この加熱室3の
下流側に低温の冷却ゾーン9が並設されており、外部か
ら常温の空気を均熱ゾーン7に供給して均熱ゾーン7の
温度を略一定に保持させるとともに、予熱ゾーン6およ
び冷却ゾーン9の高温空気を排出して、破線矢印に示す
ように入口部12と出口部13から常温空気を導入する
ことにより入口部12と出口部13付近の温度を下げ
て、同図実線Tに示すような理想的な温度プロファイル
が実現される。
A conventional air reflow device will be described with reference to FIG. The substrate 5 is transported by the conveyor 4 into the heating chamber 3 in which the heater 1 and the fan 2 are provided, and the heater 1 performs a heating process of cream solder for bonding the electronic component P to the substrate 5. The interior of the heating chamber 3 is partitioned by a partition wall into a preheating zone 6, a soaking zone 7, and a high-temperature melting zone 8 for melting cream solder, and a low-temperature cooling zone 9 is provided downstream of the heating chamber 3. The room temperature air is supplied from the outside to the soaking zone 7 to keep the temperature in the soaking zone 7 substantially constant, and the high-temperature air in the preheating zone 6 and the cooling zone 9 is discharged, and the dashed arrow As shown in the drawing, by introducing normal-temperature air from the inlet 12 and the outlet 13, the temperature near the inlet 12 and the outlet 13 is lowered, and an ideal temperature profile as shown by the solid line T in FIG.

【0004】しかし、このようなエアリフロー装置で
は、加熱室1内に供給される空気中に酸素が含まれてい
るので、銅箔などから成る回路パターンやクリーム半田
等の金属部が加熱されて酸化しやすく、酸化すると半田
のヌレ性が低下し、電子部品Pを基板5に良好に接着で
きなくなりやすい問題があった。
However, in such an air reflow apparatus, since oxygen is contained in the air supplied into the heating chamber 1, a circuit pattern made of copper foil or the like or a metal part such as cream solder is heated. There is a problem in that the electronic component P is easily oxidized, and if oxidized, the wetting property of the solder is reduced, and the electronic component P cannot be satisfactorily bonded to the substrate 5.

【0005】その改善策として、回路パターンやクリー
ム半田が酸化する虞れのないチッソガス雰囲気中におい
て、加熱処理を行うチッソリフロー装置が提案されてい
る。
As a remedy, there has been proposed a nitrogen reflow apparatus for performing a heat treatment in a nitrogen gas atmosphere in which there is no possibility of oxidizing a circuit pattern or cream solder.

【0006】図3を参照しながら、従来のチッソリフロ
ー装置を説明する。なお、図2に示す構成部品と同じ部
品には同一符号を付して説明を省略する。14はチッソ
ガス供給部であり、このチッソガス供給部14から供給
されたチッソガスN2 は、加熱室3の各ゾーン6〜9内
に常時供給される。
Referring to FIG. 3, a conventional nitrogen reflow apparatus will be described. The same components as those shown in FIG. 2 are denoted by the same reference numerals, and description thereof is omitted. Reference numeral 14 denotes a nitrogen gas supply unit. The nitrogen gas N2 supplied from the nitrogen gas supply unit 14 is constantly supplied to each of the zones 6 to 9 of the heating chamber 3.

【0007】[0007]

【発明が解決しようとする課題】ところが、従来のチッ
ソリフロー装置は、チッソガス雰囲気中において加熱処
理を行うため、図2に示すエアリフロー装置のように酸
素を含んだ空気を加熱室1内に導入して上記温度プロフ
ァイルTを実現することはできず、破線T′に示すよう
な温度プロファイル、すなわち均熱ゾーン7でも温度は
次第に上昇し、また冷却ゾーン9では温度は十分に低下
しない温度プロファイルとなっていた。殊に、冷却ゾー
ン9における温度低下が不十分なことから、基板5は十
分に冷却されないまま加熱室1から排出され、このため
空気中の酸素と反応して基板5の回路パターンなどの金
属部が酸化しやすい問題点があった。
However, in the conventional nitrogen reflow apparatus, since heat treatment is performed in a nitrogen gas atmosphere, air containing oxygen is introduced into the heating chamber 1 as in an air reflow apparatus shown in FIG. Therefore, the temperature profile T cannot be realized, and the temperature profile as shown by the broken line T ′, that is, the temperature gradually increases even in the soaking zone 7 and the temperature profile in which the temperature does not sufficiently decrease in the cooling zone 9. Had become. In particular, since the temperature in the cooling zone 9 is not sufficiently lowered, the substrate 5 is discharged from the heating chamber 1 without being sufficiently cooled, and reacts with oxygen in the air to form a metal part such as a circuit pattern of the substrate 5. However, there was a problem that it was easily oxidized.

【0008】そこで本発明は、理想的な温度プロファイ
ルを実現することができるチッソリフロー装置を提供す
ることを目的とする。
Therefore, an object of the present invention is to provide a nitrogen reflow apparatus capable of realizing an ideal temperature profile.

【0009】[0009]

【課題を解決するための手段】本発明は、ヒータとファ
ンが配設され、且つ入口部から出口部に向かって、予熱
ゾーン、均熱ゾーン、溶融ゾーンに区画された加熱室お
よび冷却ゾーンと、この加熱室の入口部から出口部へ基
板を搬送するコンベアと、上記加熱室にチッソガスを供
給するチッソガス供給部とを備えたチッソリフロー装置
において、上記加熱室内の高温チッソガスを導出して再
度加熱室に戻すバイパス路を設けるとともに、このバイ
パス路の途中にチッソガスの冷却手段を設け、この冷却
手段で冷却されたチッソガスを上記均熱ゾーンおよびま
たは上記冷却ゾーンに戻すようにしたものである。
According to the present invention, there is provided a heating chamber and a cooling zone in which a heater and a fan are provided, and are divided into a preheating zone, a soaking zone, and a melting zone from an inlet to an outlet. a conveyor for conveying the substrate from the inlet portion of the heating chamber to the outlet portion, the nitrogen reflow apparatus having a Chissogasu supply unit for supplying Chissogasu in the heating chamber, to derive the hot Chissogasu above Symbol pressurized heat chamber Rutotomoni a bypass passage for returning again heating chamber, a cooling means Chissogasu in the middle of the bypass passage, the cooling
The nitrogen gas cooled by the
Alternatively, it is returned to the cooling zone .

【0010】[0010]

【作用】上記構成において、加熱室内の高温チッソガス
をバイパス路により導出し、このバイパス路の途中にお
いて、このチッソガスを冷却手段により冷却して均熱ゾ
ーンおよびまたは冷却ゾーンに戻すことにより、理想の
温度プロファイルを実現できる。
In the above construction, the high-temperature nitrogen gas in the heating chamber is led out by the bypass passage, and in the middle of the bypass passage, the nitrogen gas is cooled by the cooling means so as to form a soaking zone.
By returning the over emissions and or cooling zones, it can be realized ideal temperature profile.

【0011】[0011]

【実施例】次に、図面を参照しながら本発明の実施例を
説明する。なお、図2および図3に示す構成部品と同じ
部品には同一符号を付して説明を省略する。
Next, an embodiment of the present invention will be described with reference to the drawings. The same components as those shown in FIGS. 2 and 3 are denoted by the same reference numerals, and description thereof is omitted.

【0012】図1はチッソリフロー装置の側面図であ
る。15は冷却ゾーン9に設けられたシャワー部であ
り、コンベア4上の基板5に、チッソガス供給部14か
ら供給された新たなチッソガスN2 を吹き付けてこの基
板5を効果的に冷却するものである。16a,16bは
バイパス路であり、均熱ゾーン7と冷却ゾーン9に設け
られている。なお、本実施例ではバイパス路16a,1
6bの吸出部a,bは、熱効率を良くするためにチッソ
ガスN2 の温度が低い両ゾーン6,9の下部に設けられ
ている。
FIG. 1 is a side view of a nitrogen reflow device. Numeral 15 denotes a shower section provided in the cooling zone 9, which blows new nitrogen gas N2 supplied from the nitrogen gas supply section 14 onto the substrate 5 on the conveyor 4 to effectively cool the substrate 5. 16a and 16b are bypass paths provided in the soaking zone 7 and the cooling zone 9. In the present embodiment, the bypass paths 16a, 1
The suction portions a and b of the zone 6b are provided below the zones 6 and 9 where the temperature of the nitrogen gas N2 is low in order to improve the thermal efficiency.

【0013】17はチッソガスN2の吸引用のファンで
あって、各バイパス路16a,16bの途中に設けられ
ており、18は冷却手段としてのファンである。吸引用
のファン17を駆動して、加熱室3内の高温チッソガス
N2を一旦バイパス路16a,16bへ導出し、このバ
イパス路16a,16bの途中において、ファン18の
駆動により発生した空気を外部からバイパス路16a,
16bに吹き付けて、バイパス路16a,16b内を流
れるチッソガスN2を冷却し、再度均熱ゾーン7や冷却
ゾーン9に戻す。これにより、均熱ゾーン7の温度上昇
は抑えられて、均熱ゾーン7は略一定温度を保持し、ま
た出口部13付近の温度は低下し、理想の温度プロファ
イルTが実現できる。しかも本手段によれば、加熱室3
内のチッソガスN2をバイパス路16a,16bを循環
させながら、理想の温度プロファイルTを実現できるの
で、この理想の温度プロファイルTを実現するために新
たな冷却用のチッソガスN2を加熱室3に供給する必要
がなく、高価なチッソガスN2の消費量を節減して、低
いランニングコストで、理想的な温度プロファイルを実
現することができる。
Reference numeral 17 denotes a fan for sucking nitrogen gas N2, which is provided in the middle of each of the bypass passages 16a and 16b, and 18 denotes a fan as cooling means. By driving the suction fan 17, the high-temperature nitrogen gas N 2 in the heating chamber 3 is once led to the bypass passages 16 a and 16 b, and air generated by driving the fan 18 in the middle of the bypass passages 16 a and 16 b is supplied from the outside. Bypass path 16a,
The nitrogen gas N2 flowing in the bypass passages 16a and 16b is sprayed onto the cooling passage 16b, and then cooled again.
Return to zone 9. Thus, the temperature rise in the soaking zone 7 is suppressed, the soaking zone 7 is maintained at a substantially constant temperature, and the temperature near the outlet 13 is reduced, so that an ideal temperature profile T can be realized. Moreover, according to this means, the heating chamber 3
An ideal temperature profile T can be realized while circulating the nitrogen gas N2 in the inside of the bypass passages 16a and 16b, so that a new cooling nitrogen gas N2 is supplied to the heating chamber 3 in order to realize the ideal temperature profile T. There is no need to reduce the consumption of expensive nitrogen gas N2, and an ideal temperature profile can be realized at low running cost.

【0014】本発明は上記実施例に限定されないのであ
って、例えばバイパス路16aは、チッソガスN2 の戻
し口側をファン2上に結合すれば、吸引用ファン17を
使用しなくとも、このファン2の風圧を利用して、路内
のチッソガスN2 の流通ができる。
The present invention is not limited to the above-described embodiment. For example, if the return path of the nitrogen gas N2 is connected to the fan 2 on the bypass passage 16a, this fan 2 can be used without using the suction fan 17. The flow of nitrogen gas N2 in the road can be carried out using the wind pressure.

【0015】[0015]

【発明の効果】以上説明したように本発明は、加熱室内
の高温チッソガスを導出して再度加熱室に戻すバイパス
路を設けるとともに、このバイパス路の途中にチッソガ
スの冷却手段を設けているので、均熱ゾーンの温度上昇
を抑え、また冷却ゾーンの温度を低下させて、理想的な
温度プロファイルを実現することができる。しかも理想
の温度プロファイルを実現するために、新たにチッソガ
スを加熱室内に供給する必要がないので、高価なチッソ
ガスの消費量を削減し、ランニングコストを抑えること
ができる。
The present invention described above, according to the present invention is Rutotomoni a bypass passage for returning again heating chamber to derive the hot Chissogasu indoor pressurized heat is provided with a cooling means Chissogasu in the middle of the bypass passage the in, reduce the temperature rise of the soaking zone, also lowers the temperature of the cooling zone, Ru can achieve ideal temperature profile. Moreover, since it is not necessary to newly supply nitrogen gas to the heating chamber in order to realize an ideal temperature profile, consumption of expensive nitrogen gas can be reduced and running cost can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るチッソリフロー装置の側面図FIG. 1 is a side view of a nitrogen reflow device according to the present invention.

【図2】従来手段に係るエアリフロー装置の側面図FIG. 2 is a side view of an air reflow device according to a conventional means.

【図3】従来手段に係るチッソリフロー装置の側面図FIG. 3 is a side view of a chisso reflow device according to a conventional means.

【符号の説明】[Explanation of symbols]

1 ヒータ 2 ファン 3 加熱室 5 基板 6 予熱ゾーン 7 均熱ゾーン 8 溶融ゾーン 9 冷却ゾーン 12 入口部 13 出口部 14 チッソガス供給部 16 バイパス路 18 冷却手段 N2 チッソガス DESCRIPTION OF SYMBOLS 1 Heater 2 Fan 3 Heating chamber 5 Substrate 6 Preheating zone 7 Uniform heating zone 8 Melting zone 9 Cooling zone 12 Inlet 13 Outlet 14 Nitrogen gas supply 16 Bypass passage 18 Cooling means N2 Nitrogen gas

フロントページの続き (56)参考文献 特開 昭64−83395(JP,A) 特開 平3−216272(JP,A) 特開 昭64−71571(JP,A) 特開 平3−216273(JP,A) 特開 平4−274868(JP,A) 特開 平3−8564(JP,A) 特開 平4−46666(JP,A) 実開 平2−87557(JP,U) (58)調査した分野(Int.Cl.7,DB名) B23K 1/012 B23K 31/02 B23K 101:42 Continuation of front page (56) References JP-A-64-83395 (JP, A) JP-A-3-216272 (JP, A) JP-A-64-71571 (JP, A) JP-A-3-216273 (JP) JP-A-4-274868 (JP, A) JP-A-3-8564 (JP, A) JP-A-4-46666 (JP, A) JP-A-2-87557 (JP, U) Field surveyed (Int.Cl. 7 , DB name) B23K 1/012 B23K 31/02 B23K 101: 42

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】ヒータとファンが配設され、且つ入口部か
ら出口部に向かって、予熱ゾーン、均熱ゾーン、溶融ゾ
ーンに区画された加熱室および冷却ゾーンと、この加熱
室の入口部から出口部へ基板を搬送するコンベアと、上
記加熱室にチッソガスを供給するチッソガス供給部とを
備えたチッソリフロー装置において、上記加熱室内の高
温チッソガスを導出して再度加熱室に戻すバイパス路を
設けるとともに、このバイパス路の途中にチッソガスの
冷却手段を設け、この冷却手段で冷却されたチッソガス
を上記均熱ゾーンおよびまたは上記冷却ゾーンに戻すよ
うにしたことを特徴とするチッソリフロー装置。
1. A heating chamber and a cooling zone which are provided with a heater and a fan, and are divided into a preheating zone, a soaking zone, and a melting zone from an inlet to an outlet. a conveyor for conveying the substrate to the outlet portion, the nitrogen reflow apparatus having a Chissogasu supply unit for supplying Chissogasu in the heating chamber, a bypass passage for returning again heating chamber to derive the above SL pressurized heat indoor hot Chissogasu <br/> provided Rutotomoni, a cooling means Chissogasu in the middle of the bypass passage, which is cooled by the cooling means Chissogasu
Return to the soaking zone and / or the cooling zone.
A chisso reflow device characterized by the following.
JP26444591A 1991-10-14 1991-10-14 Chisso reflow device Expired - Fee Related JP3114278B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26444591A JP3114278B2 (en) 1991-10-14 1991-10-14 Chisso reflow device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26444591A JP3114278B2 (en) 1991-10-14 1991-10-14 Chisso reflow device

Publications (2)

Publication Number Publication Date
JPH05111754A JPH05111754A (en) 1993-05-07
JP3114278B2 true JP3114278B2 (en) 2000-12-04

Family

ID=17403299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26444591A Expired - Fee Related JP3114278B2 (en) 1991-10-14 1991-10-14 Chisso reflow device

Country Status (1)

Country Link
JP (1) JP3114278B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06254184A (en) * 1993-03-03 1994-09-13 Bullet Golf Ball Inc Cover device
KR20180065225A (en) * 2016-12-07 2018-06-18 동양피스톤 주식회사 Piston for vehicle engine and method for manufacturing the same
KR101874560B1 (en) * 2016-12-08 2018-07-04 동양피스톤 주식회사 Piston for vehicle engine and method for manufacturing the same

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005014074A (en) * 2003-06-27 2005-01-20 Tamura Seisakusho Co Ltd Reflowing plant
JP6336707B2 (en) * 2013-02-14 2018-06-06 株式会社タムラ製作所 Reflow device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06254184A (en) * 1993-03-03 1994-09-13 Bullet Golf Ball Inc Cover device
KR20180065225A (en) * 2016-12-07 2018-06-18 동양피스톤 주식회사 Piston for vehicle engine and method for manufacturing the same
KR101874559B1 (en) * 2016-12-07 2018-08-02 동양피스톤 주식회사 Piston for vehicle engine and method for manufacturing the same
US10724466B2 (en) 2016-12-07 2020-07-28 Dong Yang Piston Co., Ltd. Piston for vehicle engine and method for manufacturing the same
KR101874560B1 (en) * 2016-12-08 2018-07-04 동양피스톤 주식회사 Piston for vehicle engine and method for manufacturing the same

Also Published As

Publication number Publication date
JPH05111754A (en) 1993-05-07

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