JPH05111656A - Dip coating device - Google Patents
Dip coating deviceInfo
- Publication number
- JPH05111656A JPH05111656A JP30270391A JP30270391A JPH05111656A JP H05111656 A JPH05111656 A JP H05111656A JP 30270391 A JP30270391 A JP 30270391A JP 30270391 A JP30270391 A JP 30270391A JP H05111656 A JPH05111656 A JP H05111656A
- Authority
- JP
- Japan
- Prior art keywords
- dip coating
- substrate
- coating
- coated
- cover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、被塗布基体に塗膜を形
成するための浸漬塗布装置に関する。さらに詳しくは、
塗膜の均一性を向上させる浸漬塗布装置に関する。FIELD OF THE INVENTION The present invention relates to a dip coating apparatus for forming a coating film on a substrate to be coated. For more details,
The present invention relates to a dip coating device that improves the uniformity of a coating film.
【0002】[0002]
【従来の技術】従来より、塗布液中に被塗布基体を浸漬
し、液面に対して垂直方向に引き上げて塗布する方法
は、浸漬塗布法として知られている。浸漬塗布方法は、
円筒状の被塗布基体表面に、所望の塗膜を簡便に形成で
きるため、例えば、電子写真用感光体等の製造に広く実
施されている。上記のような浸漬塗布法においては、被
塗布基体表面上に塗布された塗布液が、乾燥するまでの
間に垂れたり、形成された塗膜に膜厚むらが生じること
がある。このような塗布基体を、たとえば、電子写真感
光体として用いた場合、画像むら、白抜けやトナー付着
による地肌汚れが生じて、鮮明な画像を供給することが
できない。一般に、垂れと膜厚むらは表裏一体の関係に
あることが知られており、垂れと膜厚むらを共に抑える
ことは困難である。垂れを抑えるために、有機溶剤蒸発
による塗膜指触乾燥を早める方法が用いられている。し
かしながら、有機溶剤蒸発による塗膜指触乾燥が早すぎ
ると、塗膜のレベリングが追いつかず、膜厚むらが大き
くなってしまう。また、塗膜の指触乾燥領域での塗布基
体周方向の溶剤蒸気濃度に分布むらが存在すると、前記
指触乾燥速度が場所によって異なってしまい、膜厚むら
が発生してしまう。このように、同時に制御することが
困難な垂れと膜厚むらを、できるだけ抑えようとする試
みが数多く提案されている。垂れと膜厚むらを同時に抑
制するためには、指触乾燥領域の塗布基体周方向の溶剤
蒸気濃度を均一にし、指触乾燥速度を制御することに尽
きるが、従来の浸漬塗布法および装置では、指触乾燥速
度を制御することは困難であった。2. Description of the Related Art Conventionally, a method of immersing a substrate to be coated in a coating liquid and pulling it up in a direction perpendicular to the liquid surface for coating is known as a dip coating method. The dip coating method is
Since a desired coating film can be easily formed on the surface of a cylindrical substrate to be coated, it is widely used for manufacturing, for example, electrophotographic photoreceptors. In the dip coating method as described above, the coating liquid coated on the surface of the substrate to be coated may drips before it is dried, or the formed coating film may have uneven film thickness. When such a coated substrate is used as, for example, an electrophotographic photosensitive member, image unevenness, white spots or background stains due to toner adhesion occur, and a clear image cannot be supplied. In general, it is known that the sagging and the film thickness unevenness are in an integrated relationship, and it is difficult to suppress both the sagging and the film thickness unevenness. In order to suppress the sagging, a method of accelerating the touch-sensitive film drying by evaporation of an organic solvent is used. However, if the coating film is dried too quickly to the touch by evaporation of the organic solvent, the leveling of the coating film cannot be caught up and the unevenness of the film thickness becomes large. Further, if there is uneven distribution of the solvent vapor concentration in the coating substrate circumferential direction in the finger-drying area of the coating film, the finger-drying speed will vary depending on the location, resulting in uneven film thickness. As described above, many attempts have been proposed to suppress sag and film thickness unevenness that are difficult to control at the same time. In order to suppress the sagging and the film thickness unevenness at the same time, the solvent vapor concentration in the circumferential direction of the coating substrate in the finger-drying area should be made uniform and the finger-drying speed should be controlled. It was difficult to control the touch dry speed.
【0003】従来の浸漬塗布装置の多くは、浸漬塗布槽
上部、すなわち、指触乾燥領域に覆いをつけ、かつ、指
触乾燥中に気流を生じさせて指触乾燥速度を制御するも
のである。たとえば、特開昭62−225266号公報
に開示されているものは、指触乾燥中に溶剤蒸気エアー
の上昇流を生じさせるものである。また、下降エアー流
れにより、基体周方向の溶剤蒸気濃度の均一化をはかる
方法が特開昭63−7873号公報に開示されている。Most of the conventional dip coating apparatuses cover the upper part of the dip coating tank, that is, the touch-drying area, and generate an air flow during touch-drying to control the touch-drying speed. .. For example, the one disclosed in Japanese Unexamined Patent Publication No. 62-225266 causes an upward flow of solvent vapor air during touch-drying. Further, Japanese Patent Application Laid-Open No. 63-7873 discloses a method for making the solvent vapor concentration uniform in the circumferential direction of the substrate by a descending air flow.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、特開昭
62−225266号公報に開示された装置では、上昇
気流発生部にノズルを用いているために、基体周方向の
溶剤蒸気濃度を均一にするのは困難である。また、特開
昭63−7873号公報に開示された装置は、下降流に
よって浸漬塗布槽中の塗布液面が乱され、かえって塗膜
に膜厚むらを生じさせることになるという問題がある。
本発明は、従来の技術における上記のような欠点を改良
することを目的としてなされたものである。すなわち、
本発明の目的は、垂れと膜厚むらの発生を最小限に抑え
ることのできる浸漬塗布装置を提供することにある。However, in the apparatus disclosed in Japanese Patent Laid-Open No. 62-225266, since the nozzle is used in the ascending airflow generating portion, the solvent vapor concentration in the circumferential direction of the substrate is made uniform. Is difficult. Further, the apparatus disclosed in Japanese Patent Laid-Open No. 63-7873 has a problem that the downflow causes disturbance of the coating liquid surface in the dip coating tank, which causes unevenness of the coating film.
The present invention has been made for the purpose of ameliorating the above-mentioned drawbacks of the prior art. That is,
An object of the present invention is to provide a dip coating device that can minimize the occurrence of sagging and film thickness unevenness.
【0005】[0005]
【課題を解決するための手段】本発明の上記目的は、浸
漬塗布装置を構成する浸漬塗布槽の上部に覆いを設け、
溶剤蒸気濃度制御手段によって、塗膜指触乾燥中に周方
向の溶剤濃度が均一であるような上昇エアー流を作るこ
とによって達成される。すなわち、本発明は、浸漬塗布
槽と、被塗布基体を上下方向に移動可能に支持する基体
支持手段を備えた浸漬塗布装置において、浸漬塗布槽の
上に覆いを設け、該覆いの下部に、浸漬塗布槽の塗布液
面より相対的に下方に位置して、被塗布基体の周方向全
体から気体を吸入できる吸入機構を設けたことを特徴と
する。The above object of the present invention is to provide a cover on the upper part of a dip coating tank which constitutes a dip coating device,
The solvent vapor concentration control means achieves this by creating an ascending air stream such that the solvent concentration in the circumferential direction is uniform during touch dry of the coating. That is, the present invention is a dip coating tank, in a dip coating apparatus provided with a substrate supporting means for movably supporting the substrate to be coated in the vertical direction, a cover is provided on the dip coating tank, and a lower part of the cover is provided. It is characterized in that a suction mechanism, which is located relatively below the surface of the coating liquid in the dip coating tank, is capable of sucking gas from the entire circumferential direction of the substrate to be coated.
【0006】本発明の浸漬塗布装置において、浸漬塗布
槽には、例えば、電子写真感光体を構成する下引き層形
成用塗布液、感光層形成用塗布液、あるいは保護層形成
用塗布液等が注入される。これらの塗布液には、塗膜を
生成する樹脂成分と有機溶剤が主成分として含有されて
おり、また、感光層形成用塗布液には、さらに感光成
分、例えば、硫化カドミウム、酸化亜鉛、ジスアゾ顔料
あるいはピラゾリン化合物、ヒドラゾン化合物、ポリビ
ニルカルバゾール等が分散或いは溶解して含有される。
有機溶剤としては、例えば、メタノール、エタノール、
イソプロパノール等のアルコール類、アセトン、メチル
エチルケトン等のケトン類、N,N−ジメチルアセトア
ミド等のアミド類、テトラヒドロフラン、ジオキサン等
のエーテル類、酢酸メチル、酢酸エチル等のエステル
類、クロロホルム、塩化メチレン、ジクロルエチレン、
四塩化炭素、トリクロルエチレン、モノクロルベンセン
等のハロゲン化炭化水素類や、ヘキサン、シクロヘキサ
ン、ベンゼン、トルエン、リグロイン等の炭化水素等を
が使用される。また、塗布液は、セルロース系樹脂、ビ
ニル系樹脂、アクリル酸系樹脂、フェノール系樹脂、エ
ポキシ系樹脂、あるいはポリビニルカルバゾール、ポリ
ビニルアントラセン等の有機光導電性ポリマーを、上記
したもののうちの蒸発速度の速い有機溶剤を単独あるい
は2種以上組み合わせて、または蒸発速度の遅い有機溶
剤と組み合わせて溶解させることによって調製すること
ができる。In the dip coating apparatus of the present invention, the dip coating tank contains, for example, a coating liquid for forming an undercoat layer, a coating liquid for forming a photosensitive layer, or a coating liquid for forming a protective layer, which constitutes an electrophotographic photoreceptor. Injected. These coating liquids contain a resin component for forming a coating film and an organic solvent as main components, and the coating liquid for forming a photosensitive layer further contains photosensitive components such as cadmium sulfide, zinc oxide and disazo. A pigment, a pyrazoline compound, a hydrazone compound, polyvinylcarbazole, or the like is contained in a dispersed or dissolved state.
As the organic solvent, for example, methanol, ethanol,
Alcohols such as isopropanol, ketones such as acetone and methyl ethyl ketone, amides such as N, N-dimethylacetamide, ethers such as tetrahydrofuran and dioxane, esters such as methyl acetate and ethyl acetate, chloroform, methylene chloride and dichloro. ethylene,
Halogenated hydrocarbons such as carbon tetrachloride, trichloroethylene and monochlorobenzene, and hydrocarbons such as hexane, cyclohexane, benzene, toluene and ligroin are used. Further, the coating liquid is a cellulose resin, a vinyl resin, an acrylic acid resin, a phenol resin, an epoxy resin, or an organic photoconductive polymer such as polyvinylcarbazole or polyvinylanthracene, which has It can be prepared by dissolving a fast organic solvent alone or in combination of two or more kinds, or in combination with an organic solvent having a slow evaporation rate.
【0007】[0007]
【作用】本発明の浸漬塗布装置においては、基体支持手
段に被塗布基体を支持して下方に移動させ、被塗布基体
を浸漬塗布槽内の塗布液中に浸漬した後、引上げて被塗
布基体上に塗布層を形成するが、その際、浸漬塗布槽の
上部の覆いに取り付けられた溶剤蒸気濃度制御手段によ
って、浸漬塗布槽上部の溶剤濃度が制御され、引き上げ
られる被塗布基体の全周に均一に上昇気流が接触するよ
うになる。即ち、覆いの下部の、浸漬塗布槽の塗布液面
より相対的に下方に設けられ吸入機構によって、引き上
げられる被塗布基体の周方向全体にわたって気体が吸入
されるので、被塗布基体の周方向における溶剤蒸気濃度
に分布むらがなくなる。したがって、垂れや膜厚むらの
発生が抑制される。In the dip coating apparatus of the present invention, the substrate to be coated is supported by the substrate supporting means and moved downward, the substrate to be coated is dipped in the coating liquid in the dip coating tank, and then pulled up. A coating layer is formed on the upper surface of the dip coating tank by the solvent vapor concentration control means attached to the upper cover of the dip coating tank. Updrafts come into contact with each other uniformly. That is, since the gas is sucked over the entire circumferential direction of the substrate to be pulled up by the suction mechanism provided below the surface of the coating liquid in the dip coating tank in the lower part of the cover, the gas is sucked in the circumferential direction of the substrate to be coated. Eliminates uneven distribution in solvent vapor concentration. Therefore, the occurrence of sagging and uneven film thickness is suppressed.
【0008】[0008]
【実施例】以下、本発明の実施例を図面によって説明す
る。図1ないし図3は、本発明の浸漬塗布装置の要部の
断面図であり、図1は浸漬前、図2は浸漬時、図3は引
上げ時の状態をそれぞれ模式的に示すものである。図に
おいて、1は被塗布基体であり、基体支持手段2に支持
されている。3は覆いであって、下部に、流入エアー量
調節多孔板4を備えており、覆い取り付け治具5によっ
て浸漬塗布槽6の上部に取り付けられている。浸漬塗布
槽6は、塗布液7で満たされている。なお、図において
は、被塗布基体の浸漬塗布槽に対する相対的な移動手段
は省略してある。Embodiments of the present invention will be described below with reference to the drawings. 1 to 3 are cross-sectional views of essential parts of the dip coating device of the present invention. FIG. 1 schematically shows a state before dipping, FIG. 2 shows a state during dipping, and FIG. 3 shows a state during pulling up. .. In the figure, reference numeral 1 denotes a substrate to be coated, which is supported by a substrate supporting means 2. Reference numeral 3 denotes a cover, which is provided with an inflow air amount adjusting porous plate 4 at a lower portion thereof, and is attached to an upper portion of the dip coating tank 6 by a cover attachment jig 5. The dip coating tank 6 is filled with a coating liquid 7. It should be noted that, in the drawing, the relative moving means of the substrate to be coated with respect to the dip coating tank is omitted.
【0009】浸漬塗布操作は、図1の状態から開始さ
れ、先ず、被塗布基体1を下方に移動させて、浸漬塗布
槽6内の塗布液7中に、覆い3に対して実質的に気密状
態を保持しつつ浸漬する。このとき、図2の矢印で示す
ように、覆い3の基体外容積と同量の溶剤蒸気を含んだ
エアーが、流入エアー量調節多孔板4を介して、覆い3
の外に排出される。The dip coating operation is started from the state shown in FIG. 1. First, the substrate 1 to be coated is moved downward to be substantially airtight to the cover 3 in the coating liquid 7 in the dip coating tank 6. Soak while maintaining the condition. At this time, as shown by the arrow in FIG. 2, the air containing the same amount of solvent vapor as the outer volume of the base of the cover 3 is passed through the inflow air amount adjusting porous plate 4 to cover the cover 3
Is discharged to the outside.
【0010】次に、被塗布基体1は、覆い3に対して実
質的に気密状態を保持しつつ引き上げられる。このと
き、図3の矢印で示すように、被塗布基体1の外容積分
の量の外気エアーが、流入エアー調節多孔板4を介し
て、浸漬塗布槽6の周囲全体から吸入される。このよう
に、浸漬塗布槽6の周囲全体から外気エアーが吸入され
るので、塗布面周囲に均一な気体上昇流が生じる。この
場合、基体支持体2と覆い3との間の隙間は、上昇流を
生じさせるためにできるだけ狭い方が好ましい。塗布後
の未乾燥の塗膜周囲の溶剤濃度は、流入エアー調節多孔
板4の孔径を適宜変更して、流入エアー量を変えること
によって制御することができる。なお、流入エアー調節
多孔板4の材質は、耐溶剤性かつ細孔分布の均一なもの
が望ましい。また、覆い取り付け治具5は、流入エアー
によって塗布液表面が乱されず、かつ、浸漬塗布槽6か
ら被塗布基体が出た直後の塗膜からの急激な溶剤蒸発を
抑えるために、図1に示すような傾斜角Aを設けて取り
付けることが望ましい。Next, the substrate 1 to be coated is pulled up while maintaining a substantially airtight state with respect to the cover 3. At this time, as shown by the arrow in FIG. 3, outside air in an amount corresponding to the outer volume of the substrate 1 to be coated is sucked from the entire periphery of the dip coating tank 6 through the inflow air adjusting porous plate 4. In this way, the outside air is sucked from the entire periphery of the dip coating tank 6, so that a uniform upward flow of gas is generated around the coating surface. In this case, the gap between the base support 2 and the cover 3 is preferably as narrow as possible in order to generate an upward flow. The solvent concentration around the undried coating film after coating can be controlled by appropriately changing the pore diameter of the inflow air regulating porous plate 4 to change the inflow air amount. The material for the inflow air regulating perforated plate 4 is preferably solvent resistant and has a uniform pore distribution. Further, in order to prevent the coating liquid surface from being disturbed by the inflowing air and to suppress the rapid evaporation of the solvent from the coating film immediately after the substrate to be coated comes out of the dip coating tank 6, the cover mounting jig 5 has a structure shown in FIG. It is desirable that the inclination angle A as shown in FIG.
【0011】本発明の浸漬塗布装置は、上記図1〜図3
に示すものに限定されるものではなく、被塗布面周囲に
均一な気体上昇流を生じさせるものであれば、如何なる
手段を用いてもよい。図4は、本発明の浸漬塗布装置の
他の一実施例の要部の断面図であって、流入エアー調節
多孔板4の下部に、強制気体供給装置8を設けて、強制
的に気体を供給するように構成したものである。この浸
漬塗布装置においては、供給される気体は、乾燥空気の
みでも、また溶剤蒸気と空気の混合ガスでもよく、その
混合比は、塗布液に使用されている溶剤の種類、塗布液
粘度および塗布速度によって変化する。本発明の上記浸
漬塗布装置によれば、非塗布面周囲の周方向の溶剤蒸気
濃度を均一にし、垂れと膜厚むらを同時に制御すること
が可能となる。次に、本発明の浸漬塗布装置を使用して
浸漬塗布操作を行った場合の具体例を示す。The dip coating apparatus of the present invention is the same as that shown in FIGS.
However, the means is not limited to the one shown in (2), and any means may be used as long as it can generate a uniform upward flow of gas around the surface to be coated. FIG. 4 is a cross-sectional view of the essential part of another embodiment of the dip coating device of the present invention, in which a forced gas supply device 8 is provided below the inflow air regulating porous plate 4 to force the gas to flow. It is configured to be supplied. In this dip coating device, the gas to be supplied may be only dry air or a mixed gas of solvent vapor and air, and the mixing ratio may be the kind of solvent used in the coating liquid, the viscosity of the coating liquid and the coating liquid. Varies with speed. According to the above dip coating apparatus of the present invention, it is possible to make the solvent vapor concentration in the circumferential direction around the non-coated surface uniform and simultaneously control sagging and film thickness unevenness. Next, a specific example of the case where the dip coating operation is performed using the dip coating device of the present invention will be shown.
【0012】(例1)被塗布基体として、84mmφ×
340mmのアルミニウムドラムを、図1〜図3に示さ
れる浸漬塗布装置を用いて浸漬塗布した。塗布液として
は、下記の材料を混合したものを用いた。 ポリカーボネート 9重量部 電荷輸送剤(注) 6重量部 塩化メチレン 85重量部 (注) N,N′−ジフェニル−N,N′−ビス(3−
メチルフェニル)−4,4′−ジアミン 先ず、図1に示すように、アルミニウムドラムを浸漬塗
布槽6内の塗布液7に浸漬し、覆い3の下部に設けた流
入エアー調節多孔板4である孔径0.5μmの塗布液調
節フィルターから、溶剤蒸気を含んだエアーを排出し
た。次に、被塗布基体1を150mm/minの速度で
引き上げた。このときの塗布環境は、気温24℃、相対
湿度50%であった。以上の操作の後、指触乾燥領域を
150mm/minの速度で通過させ、その後、100
℃の温度で40分間加熱乾燥を行った。乾燥終了後、塗
布基体の膜厚をダイヤルゲージを用いて測定した。その
結果を図5に示す。図5から、本発明の浸漬塗布装置を
用いた場合には、膜厚分布は、むらが小さいことが分か
る。この場合、塗膜上端から2cm以下の塗膜の上下方
向の膜厚の最大値と最小値の差は、1.5μmに抑える
ことができた。(Example 1) As a substrate to be coated, 84 mmφ ×
A 340 mm aluminum drum was dip coated using the dip coating device shown in FIGS. As the coating liquid, a mixture of the following materials was used. Polycarbonate 9 parts by weight Charge transfer agent (note) 6 parts by weight Methylene chloride 85 parts by weight (note) N, N'-diphenyl-N, N'-bis (3-
Methylphenyl) -4,4′-diamine First, as shown in FIG. 1, an aluminum drum is immersed in the coating solution 7 in a dipping coating tank 6 to form an inflow air regulating porous plate 4 provided below the cover 3. Air containing solvent vapor was discharged from the coating solution control filter having a pore size of 0.5 μm. Next, the substrate 1 to be coated was pulled up at a speed of 150 mm / min. The coating environment at this time was an air temperature of 24 ° C. and a relative humidity of 50%. After the above operation, the dry area for touch is passed at a speed of 150 mm / min, and then 100
It heat-dried at the temperature of 40 degreeC for 40 minutes. After drying, the film thickness of the coated substrate was measured using a dial gauge. The result is shown in FIG. From FIG. 5, it can be seen that when the dip coating device of the present invention is used, the film thickness distribution has small unevenness. In this case, the difference between the maximum value and the minimum value in the vertical direction of the coating film 2 cm or less from the upper end of the coating film could be suppressed to 1.5 μm.
【0013】(例2)(比較例) 比較のために、覆い3を付けなかった以外は、例1と同
様にして浸漬塗布を行った。その結果を図5に示す。図
5から、覆いをつけなかった場合は、膜厚が安定せず、
下端に近付くほど塗膜が厚くなっていることが分かる。
この場合、塗膜上端から2cm以下の塗膜の上下方向の
膜厚の最大値と最小値の差は、3.5μmになった。ま
た、塗布基体の下部に白化が生じた。Example 2 (Comparative Example) For comparison, dip coating was performed in the same manner as in Example 1 except that the cover 3 was not attached. The result is shown in FIG. From FIG. 5, when the cover is not attached, the film thickness is not stable,
It can be seen that the coating film becomes thicker as it gets closer to the lower end.
In this case, the difference between the maximum value and the minimum value in the vertical direction of the coating film 2 cm or less from the upper end of the coating film was 3.5 μm. Also, whitening occurred at the bottom of the coated substrate.
【0014】[0014]
【発明の効果】本発明の浸漬塗布装置は、上記の構成を
有するから、塗布組成物を塗布した後の被塗布基体周囲
の溶剤蒸気濃度を制御して、塗膜を均一な溶剤上昇流中
に配置することができ、垂れを生じることなく均一性が
あり、膜厚むらの小さい塗膜を得ることが可能になる。Since the dip coating apparatus of the present invention has the above-mentioned constitution, the concentration of the solvent vapor around the substrate to be coated after coating the coating composition is controlled to make the coating film in a uniform upward flow of solvent. It is possible to obtain a coating film having uniform thickness without sagging and having a small thickness unevenness.
【図1】 本発明の浸漬塗布装置の一実施例の浸漬前の
状態を示す断面図。FIG. 1 is a sectional view showing a state before dipping of an embodiment of the dip coating device of the present invention.
【図2】 本発明の浸漬塗布装置の一実施例の浸漬時の
状態を示す断面図。FIG. 2 is a cross-sectional view showing a state during immersion of an embodiment of the dip coating device of the present invention.
【図3】 本発明の浸漬塗布装置の一実施例の引上げ時
の状態を示す断面図。FIG. 3 is a cross-sectional view showing a state at the time of pulling up of one embodiment of the dip coating device of the present invention.
【図4】 本発明の浸漬塗布装置の他の一実施例の断面
図。FIG. 4 is a sectional view of another embodiment of the dip coating device of the present invention.
【図5】 浸漬塗布によって形成された塗膜の膜厚分布
をしめすグラフ。FIG. 5 is a graph showing a film thickness distribution of a coating film formed by dip coating.
1…被塗布基体、2…基体支持手段、3…覆い、4…流
入エアー調節多孔板、5…覆い取り付け治具、6…浸漬
塗布槽、7…塗布液、8…強制気体供給装置。DESCRIPTION OF SYMBOLS 1 ... Substrate to be coated, 2 ... Substrate supporting means, 3 ... Cover, 4 ... Inflow air control porous plate, 5 ... Cover mounting jig, 6 ... Immersion coating tank, 7 ... Coating liquid, 8 ... Forced gas supply device.
Claims (2)
移動可能に支持する基体支持手段とを備えた浸漬塗布装
置において、浸漬塗布槽の上に覆いを設け、該覆いの下
部に、浸漬塗布槽の塗布液面より相対的に下方に位置し
て、被塗布基体の周方向全体から気体を吸入できる吸入
機構を設けたことを特徴とする浸漬塗布装置。1. A dip coating apparatus comprising a dip coating tank and a substrate supporting means for movably supporting a substrate to be coated in a vertical direction, wherein a cover is provided on the dip coating tank, and a lower part of the cover is provided. An immersion coating apparatus, which is provided below an application liquid surface of an immersion coating tank and is provided with a suction mechanism capable of sucking gas from the entire circumferential direction of a substrate to be coated.
浸漬塗布装置。2. The dip coating device according to claim 1, wherein the suction mechanism is a perforated plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30270391A JPH05111656A (en) | 1991-10-23 | 1991-10-23 | Dip coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30270391A JPH05111656A (en) | 1991-10-23 | 1991-10-23 | Dip coating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05111656A true JPH05111656A (en) | 1993-05-07 |
Family
ID=17912174
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30270391A Pending JPH05111656A (en) | 1991-10-23 | 1991-10-23 | Dip coating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05111656A (en) |
-
1991
- 1991-10-23 JP JP30270391A patent/JPH05111656A/en active Pending
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